A transparent display panel, preparation method and display device

Abstract

The present invention discloses a transparent display panel, a preparation method and a display device, wherein a bearing layer having a concave structure is provided, and a reflective layer is provided on the side of the bearing layer facing the liquid crystal layer, so that light incident on the reflective structure of the light guide substrate is reflected and then emitted through the light emitting area, thereby enabling the liquid crystal display panel to achieve a transparent display effect.

Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to a transparent display panel, a preparation method and a display device. Background Art

[0002] With the development of display technology, transparent display panels have been proposed as a novel display method. This transparent display panel allows you to see the displayed image from the front of the panel, and you can also see the objects on the back of the transparent display panel through the panel. Transparent display panels have many potential applications, such as windows of buildings or cars, and display windows in shopping malls. In addition to these large-scale device applications, small devices such as handheld tablets can also benefit from transparent display panels. Summary of the invention

[0003] Embodiments of the present invention provide a transparent display panel, a manufacturing method and a display device for realizing transparent display.

[0004] An embodiment of the present invention provides a transparent display panel, including a plurality of sub-pixels, and further including:

[0005] substrate substrate;

[0006] A light guide substrate is arranged opposite to the base substrate, and the light guide substrate comprises a plurality of light entrance areas and a plurality of light exit areas which are arranged at intervals from each other; wherein one sub-pixel comprises one light entrance area and one light exit area;

[0007] A liquid crystal layer, located between the base substrate and the light guide substrate;

[0008] A bearing layer, located between the base substrate and the liquid crystal layer, and the bearing layer includes a plurality of recessed structures; wherein one sub-pixel includes one recessed structure;

[0009] A reflective layer, located between the carrier layer and the liquid crystal layer, and comprising a plurality of reflective structures; wherein an orthographic projection of one of the recessed structures on the base substrate covers an orthographic projection of one of the reflective structures on the base substrate;

[0010] In the same sub-pixel, the reflective structure is used to reflect the incident light in the light incident area of ​​the light guide substrate to obtain outgoing light when the incident light passes through the liquid crystal layer and is incident on the reflective structure, so that the outgoing light passes through the light exit area of ​​the light guide substrate and is emitted.

[0011] In some examples, a cross-section of the recessed structure in a direction parallel to a row of the sub-pixels and in a direction perpendicular to the substrate is triangular.

[0012] In some examples, the triangle has a first side, a second side, and a third side connected in sequence; wherein the first side and the second side are side edges of the recessed structure, and the third side is an opening of the recessed structure;

[0013] The length of the second side is greater than that of the first side, and an angle between the second side and the third side is 20 to 40 degrees.

[0014] In some examples, the carrier layer includes a plurality of sub-carrier layers spaced apart from each other; wherein one sub-pixel includes one sub-carrier layer, and an orthographic projection of the sub-carrier layer on the base substrate covers an orthographic projection of the recessed structure on the base substrate.

[0015] In some examples, the material of the carrier layer is a photoresist having light-shielding properties.

[0016] In some examples, the transparent display panel further includes: a transistor layer located between the base substrate and the carrier layer, and a driving electrode layer located between the transistor layer and the carrier layer; wherein the transistor layer includes a plurality of thin film transistors; and the driving electrode layer includes a plurality of transparent pixel electrodes;

[0017] One of the sub-pixels includes one of the thin film transistors and one of the transparent pixel electrodes, and the thin film transistor and the transparent pixel electrode in the same sub-pixel are electrically connected to each other.

[0018] In some examples, in the same sub-pixel, the orthographic projection of the sub-carrier layer on the base substrate covers the orthographic projection of the thin film transistor on the base substrate; and / or,

[0019] In the same sub-pixel, the orthographic projection of the transparent pixel electrode on the base substrate covers the orthographic projection of the sub-carrier layer on the base substrate.

[0020] In some examples, the display panel further includes: a first planar layer located between the reflective layer and the liquid crystal layer; wherein the first planar layer covers the base substrate and the bearing layer, and fills the recessed structure.

[0021] In some examples, the light guide substrate includes: a light guide plate located on a side of the liquid crystal layer away from the base substrate, a light extraction layer located between the light guide plate and the liquid crystal layer, a transparent common electrode layer located between the light extraction layer and the liquid crystal layer, a black matrix layer located between the transparent common electrode layer and the liquid crystal layer, and a light source structure located on one side of the light guide plate; wherein the light extraction layer includes a plurality of openings arranged at intervals; an orthographic projection of one of the openings on the base substrate is located in one of the light incident regions;

[0022] The gap between the orthographic projection of the black matrix layer on the base substrate and the light exiting area overlaps with the orthographic projection of the base substrate, and the orthographic projection of the black matrix layer on the base substrate does not overlap with the orthographic projection of the light entrance area on the base substrate.

[0023] An embodiment of the present invention provides a method for preparing the above-mentioned transparent display panel, comprising:

[0024] forming the carrier layer on the base substrate;

[0025] forming a reflective layer on a side of the carrier layer away from the substrate;

[0026] After forming the liquid crystal layer between the base substrate and the light guide substrate, cell alignment is performed;

[0027] Among them, the base substrate includes multiple sub-pixels; the light-guiding substrate includes multiple light-entry areas and multiple light-exiting areas spaced apart from each other; the supporting layer includes multiple recessed structures; the reflective layer includes multiple reflective structures; wherein one sub-pixel includes one light-entry area, one light-exiting area and one recessed structure; and the orthographic projection of one recessed structure on the base substrate covers the orthographic projection of one reflective structure on the base substrate; and, in the same sub-pixel, the reflective structure is used to reflect the incident light in the light-entry area of ​​the light-guiding substrate to obtain exiting light when the incident light is incident on the reflective structure through the liquid crystal layer, so that the exiting light passes through the light-exiting area of ​​the light-guiding substrate and is emitted.

[0028] In some examples, forming the carrier layer on the base substrate specifically includes:

[0029] Using a photoresist with light-shielding properties, forming a carrier film layer on the substrate;

[0030] Using a first mask to expose and develop the carrier film layer to form a plurality of sub-carrier layers arranged at intervals; wherein one sub-pixel includes one sub-carrier layer;

[0031] The sub-carrier layers are exposed multiple times with different exposure light intensities using a second mask, and the recessed structures are formed on the sub-carrier layers after development.

[0032] In some examples, the exposure of each sub-carrier layer with a second mask for multiple times at different light intensities specifically includes:

[0033] Disposing a second mask having a plurality of slits spaced apart from each other on a side of the carrier layer away from the base substrate; one of the sub-carrier layers corresponds to one of the slits;

[0034] The second mask is controlled to move along the row direction of the sub-pixels by adopting a set step, and exposure is performed after the second mask stops moving each time under the condition that the exposure light intensity increases in sequence;

[0035] The exposed base substrate is developed to form the recessed structure on each of the sub-carrier layers.

[0036] An embodiment of the present invention further provides a display device, comprising the above transparent display panel.

[0037] The beneficial effects of the present invention are as follows:

[0038] The transparent display panel, preparation method and display device provided by the embodiments of the present invention can make the light incident on the reflective structure of the light guide substrate reflect and then be emitted through the light emitting area by providing a bearing layer with a concave structure and providing a reflective layer on the side of the bearing layer facing the liquid crystal layer, so that the liquid crystal display panel can achieve a transparent display effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 is a schematic diagram of a top view of the transparent display panel in an embodiment of the present invention;

[0040] Figure 2a for Figure 1 Some schematic cross-sectional views of the transparent display panel along the AA' direction are shown;

[0041] Figure 2b for Figure 1 Some other cross-sectional structural schematic diagrams of the transparent display panel along the AA' direction are shown;

[0042] Figure 3 for Figure 1 Some further cross-sectional structural schematic diagrams of the transparent display panel along the AA' direction are shown;

[0043] Figure 4 is a flow chart of the preparation method in an embodiment of the present invention;

[0044] Figure 5a for Figure 1 Some further schematic diagrams of top views of the transparent display panel along the AA' direction are shown;

[0045] Figure 5b for Figure 1 Some further schematic diagrams of top views of the transparent display panel along the AA' direction are shown;

[0046] Figure 6 Some schematic diagrams of top views of the second mask in an embodiment of the present invention;

[0047] Figure 7a Some schematic diagrams of top views of the second mask and the base substrate in the embodiment of the present invention;

[0048] Figure 7b for Figure 7a The schematic diagram of the top view of the structure shown is a schematic diagram of the cross-sectional structure along the AA' direction;

[0049] Figure 8a are other schematic top views of the second mask and the base substrate in the embodiments of the present invention;

[0050] Figure 8b for Figure 8a The schematic diagram of the top view of the structure shown is a schematic diagram of the cross-sectional structure along the AA' direction;

[0051] Figure 9a Some further schematic top views of the second mask and the base substrate in the embodiment of the present invention;

[0052] Figure 9b for Figure 9a The schematic diagram of the top view of the structure shown is a schematic diagram of the cross-sectional structure along the AA' direction;

[0053] Fig.10a Some further schematic top views of the second mask and the base substrate in the embodiment of the present invention;

[0054] Fig.10b for Fig.10a The schematic diagram of the top view of the structure shown is a schematic diagram of the cross-sectional structure along the AA' direction;

[0055] Fig.11a Some further schematic top views of the second mask and the base substrate in the embodiment of the present invention;

[0056] Fig.11b for Fig.11a The schematic diagram of the top view of the structure shown is a schematic diagram of the cross-sectional structure along the AA' direction;

[0057] Fig.12a Some further schematic top views of the second mask and the base substrate in the embodiment of the present invention;

[0058] Figure 12b for Fig.12a The schematic diagram of the top view structure shown is a schematic diagram of the cross-sectional structure along the AA' direction. DETAILED DESCRIPTION

[0059] In order to make the purpose, technical solution and advantages of the embodiment of the present invention clearer, the technical solution of the embodiment of the present invention will be clearly and completely described below in conjunction with the drawings of the embodiment of the present invention. Obviously, the described embodiment is a part of the embodiment of the present invention, not all of the embodiments. And in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. Based on the described embodiments of the present invention, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present invention.

[0060] Unless otherwise defined, the technical or scientific terms used in the present invention shall have the usual meanings understood by persons with ordinary skills in the field to which the present invention belongs. The words "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "include" or "comprise" and the like mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" and the like are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.

[0061] It should be noted that the sizes and shapes of the figures in the accompanying drawings do not reflect the actual proportions, but are only intended to illustrate the content of the present invention. The same or similar reference numerals throughout represent the same or similar elements or elements with the same or similar functions.

[0062] Liquid Crystal Display (LCD) panels have the advantages of high color gamut, good image quality, thinness, and low power consumption, and are widely used in electronic display products such as tablet computers, televisions, mobile phones, and car displays. However, in general, a liquid crystal display panel generally includes a liquid crystal display substrate and a backlight source. Due to the existence of the backlight source, there are great obstacles when the liquid crystal display panel is applied to transparent display.

[0063] In view of this, an embodiment of the present invention provides a transparent display panel, such as Figure 1 to Figure 2b As shown, it may include:

[0064] The base substrate 100 includes a plurality of sub-pixels spx;

[0065] The light guide substrate 200 is arranged opposite to the base substrate 100, and the light guide substrate 200 includes a plurality of light incident regions RG and a plurality of light emitting regions CG arranged at intervals from each other; wherein one sub-pixel spx includes one light incident region RG and one light emitting region CG;

[0066] The liquid crystal layer 300 is located between the base substrate 100 and the light guide substrate 200;

[0067] The carrier layer 110 is located between the base substrate 100 and the liquid crystal layer 300, and the carrier layer 110 includes a plurality of recessed structures 112; wherein one sub-pixel spx includes one recessed structure 112;

[0068] The reflective layer 130 is located between the carrier layer 110 and the liquid crystal layer 300, and the reflective layer 130 includes a plurality of reflective structures 131; wherein the orthographic projection of one recessed structure 112 on the base substrate 100 covers the orthographic projection of one reflective structure 131 on the base substrate 100;

[0069] In the same sub-pixel spx, the reflective structure 131 is used to reflect the incident light to obtain the outgoing light when the incident light from the light incident area RG of the light guide substrate 200 is incident on the reflective structure 131 through the liquid crystal layer 300, so that the outgoing light passes through the light outgoing area CG of the light guide substrate 200 and is emitted. Figure 2a By controlling the deflection state of the liquid crystal molecules in the liquid crystal layer 300 in the sub-pixel spx, the refractive index of the liquid crystal layer 300 can be controlled, so that the light S1 incident on the light guide substrate 200 can be refracted through the light incident area RG to form light S2, and the light S2 can form light S3 after entering the liquid crystal layer 300, and light S3 can form light S4 after emitting the liquid crystal, and the light S4 can be incident on the reflective structure 131, and through the reflection effect of the reflective structure 131, the light S4 is reflected to obtain reflected light S5, and the reflected light S5 passes through the liquid crystal layer, the light emitting area CG, and the light guide substrate 200 and then emits. In this way, the image display effect can be achieved. It can be understood that Figure 2a The light paths are only for illustration.

[0070] The transparent display panel provided by the embodiment of the present invention can make the light incident on the reflective structure of the light guide substrate reflect and then be emitted through the light emitting area by providing a bearing layer with a concave structure and providing a reflective layer on the side of the bearing layer facing the liquid crystal layer, so that the liquid crystal display panel can achieve a transparent display effect.

[0071] Exemplarily, the carrier layer 110 has a light shielding effect. Figure 3 By controlling the deflection state of the liquid crystal molecules in the liquid crystal layer 300 in the sub-pixel spx, the refractive index of the liquid crystal layer 300 can be changed, so that the light S1 incident on the light guide substrate 200 can be refracted through the light incident area RG to form light S2, and the light S2 enters the liquid crystal layer 300 to form light S9, and the light S9 exits the liquid crystal to form light S10, and the light S10 is incident on the carrier layer 110. Through the light shielding effect of the carrier layer 110, the light S5 can be prevented from being emitted through the light exit area CG, thereby forming a black screen. It can be understood that Figure 3The light paths are only for illustration.

[0072] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2b As shown, the cross section of the recessed structure 112 in the row direction F1 parallel to the sub-pixel spx and in the direction F3 perpendicular to the substrate 100 is a triangle. Exemplarily, the triangle has a first side L1, a second side L2 and a third side L3 connected in sequence; wherein the first side L1 and the second side L2 are the side edges of the recessed structure 112, and the third side L3 is the opening of the recessed structure 112; the length of the second side L2 is greater than the length of the first side L1, and the angle β between the second side L2 and the third side L3 is 20 to 40 degrees. For example, the angle β may be 25 to 35 degrees. For example, the angle β may be 28 to 32 degrees. For example, the angle β may be 20 degrees. The angle β may also be 25 degrees. The angle β may also be 28 degrees. The angle β may also be 30 degrees. The angle β may also be 32 degrees. The angle β may also be 35 degrees. The angle β may also be 40 degrees. It should be noted that the reflection angle of the light S3 can be adjusted by adjusting the angle β so that the light S3 can be emitted through the light emitting area CG. Of course, in practical applications, the specific value of the angle β can be designed and determined according to the needs of the practical application and is not limited here.

[0073] In specific implementation, in the embodiment of the present invention, as Figure 1 and Figure 2a As shown, the reflective structure 131 can be arranged only on the second side L2 of the recessed structure 112. This can reduce the arrangement area of ​​the reflective structure, and the reflective structure is not arranged at the position where the recessed structure 112 does not play a reflective function, thereby reducing the generation of stray light. Figure 2b As shown, the reflective structure 131 may also be disposed on both the first side L1 and the second side L2 of the recessed structure 112. This can reduce the difficulty of the manufacturing process.

[0074] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2bAs shown, the sub-pixels are arranged in an array. For example, the sub-pixels are evenly arranged along the row direction F1 and the column direction F2. Further, the transparent display panel may include: a plurality of pixel units arranged in an array. Each pixel unit includes a plurality of sub-pixels. Exemplarily, the pixel unit may include a red sub-pixel, a green sub-pixel and a blue sub-pixel, so that red, green and blue can be mixed to achieve color display. Alternatively, the pixel unit may also include a red sub-pixel, a green sub-pixel, a blue sub-pixel and a white sub-pixel, so that red, green, blue and white can be mixed to achieve color display. Of course, in actual applications, the luminous color of the sub-pixels in the pixel unit can be designed and determined according to the actual application environment, and is not limited here. Exemplarily, each sub-pixel constitutes a pixel, that is, each sub-pixel displays the same color, so that a design can achieve monochrome display and increase the resolution of the display panel.

[0075] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2b As shown, the carrier layer 110 may include a plurality of sub-carrier layers 111 arranged at intervals; wherein, one sub-pixel spx includes one sub-carrier layer 111, and the orthographic projection of the sub-carrier layer 111 on the base substrate 100 covers the orthographic projection of the recessed structure 112 on the base substrate 100. In this way, by providing the sub-carrier layer 111, not only can the light incident on the reflective structure 131 from one side of the base substrate 100 be shielded, but also the transparent display effect can be achieved through the gaps between the sub-carrier layers 111.

[0076] For example, in order to enable the carrier layer 110 to achieve a light shielding effect, in a specific implementation, in an embodiment of the present invention, the material of the carrier layer 110 can be a material with light shielding properties. For example, the material of the carrier layer 110 can be a photoresist with light shielding properties. For example, the material of the carrier layer 110 can be a black photoresist. Of course, in actual applications, the material of the carrier layer 110 can be designed and determined according to the needs of actual applications, and is not limited here.

[0077] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2bAs shown, the transparent display panel may also include: a transistor layer 140 located between the base substrate 100 and the carrier layer 110, and a driving electrode layer 150 located between the transistor layer 140 and the carrier layer 110; wherein the transistor layer 140 includes a plurality of thin film transistors; the driving electrode layer 150 includes a plurality of transparent pixel electrodes 151; a sub-pixel spx includes a thin film transistor and a transparent pixel electrode 151, and the thin film transistor and the transparent pixel electrode 151 in the same sub-pixel spx are electrically connected to each other. It should be noted that the thin film transistor includes a gate, an active layer, a source electrode and a drain electrode. For example, the transistor layer 140 may also include a plurality of gate lines and data lines, the gate electrode of the thin film transistor of a row of sub-pixels spx is electrically connected to a gate line, the source electrode of the thin film transistor of a column of sub-pixels spx is electrically connected to a data line, and the drain electrode of the thin film transistor in each sub-pixel spx is electrically connected to the transparent pixel electrode 151.

[0078] Preferably, in the embodiment of the present invention, the material of the transparent pixel electrode 151 may be a transparent conductive material, such as indium tin oxide (ITO) material, indium zinc oxide (IZO) material, carbon nanotube or graphene, etc., which is not limited here.

[0079] Preferably, in an embodiment of the present invention, Figure 1 to Figure 2b As shown, in the same sub-pixel spx, the orthographic projection of the sub-carrier layer 111 on the base substrate 100 covers the orthographic projection of the thin film transistor on the base substrate 100. This can reduce the problem of poor viewing effect caused by the thin film transistor when viewing objects through the transparent display panel.

[0080] Preferably, in an embodiment of the present invention, Figure 1 to Figure 2b As shown, in the same sub-pixel spx, the orthographic projection of the transparent pixel electrode 151 on the base substrate 100 covers the orthographic projection of the sub-carrier layer 111 on the base substrate 100. Preferably, in the same sub-pixel spx, the orthographic projection of the transparent pixel electrode 151 on the base substrate 100 covers the light incident area RG. In this way, the liquid crystal molecules can be controlled to deflect to the greatest extent.

[0081] In order to prevent the recessed structure 112 from affecting the arrangement of the liquid crystal molecules, preferably, in an embodiment of the present invention, Figure 1 to Figure 2bAs shown, the display panel may further include: a first flat layer 160 located between the reflective layer 130 and the liquid crystal layer 300; wherein the first flat layer 160 covers the base substrate 100 and the carrier layer 110, and is filled with the recessed structure 112. Further, the display panel may further include: a first alignment layer 170 located between the first flat layer 160 and the liquid crystal layer 300; wherein the first alignment layer 170 covers the base substrate 100. In this way, a flat effect can be achieved through the first flat layer 160. Thus, when the first alignment layer 170 is formed, the adverse effect of the recessed structure 112 on the first alignment layer 170 caused by rubbing the first alignment layer 170 can be reduced. In addition, due to the presence of the recessed structure, if the first flat layer 160 is not provided, the liquid crystal will be disordered, causing light leakage. By providing the first flat layer 160 and covering the entire surface, a flattening effect can be achieved.

[0082] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2b As shown, the light guide substrate 200 includes: a light guide plate 210 located on the side of the liquid crystal layer 300 away from the base substrate 100, a light extraction layer 220 located between the light guide plate 210 and the liquid crystal layer 300, and a transparent common electrode layer 240 located between the light extraction layer 220 and the liquid crystal layer 300, a black matrix layer 230 located between the transparent common electrode layer 240 and the liquid crystal layer 300, and a light source structure 250 located on one side of the light guide plate 210; wherein, the light extraction layer 220 includes a plurality of openings arranged at intervals; the orthographic projection of an opening on the base substrate 100 is located within a light incident area RG; the gap between the orthographic projection of the black matrix layer 230 on the base substrate 100 and the light emitting area CG overlaps with the orthographic projection of the base substrate 100, and the orthographic projection of the black matrix layer 230 on the base substrate 100 does not overlap with the orthographic projection of the light incident area RG on the base substrate 100.

[0083] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2b As shown, the transparent display panel may further include a color filter layer 290. Exemplarily, the orthographic projection of the color filter layer 290 on the light guide plate 210 overlaps with the light exit area CG. Preferably, the orthographic projection of the color filter layer 290 on the light guide plate 210 overlaps with the light exit area CG. Exemplarily, the color filter layer 290 in the red sub-pixel may adopt a red color filter layer. The color filter layer 290 in the green sub-pixel may adopt a green color filter layer. The color filter layer 290 in the blue sub-pixel may adopt a blue color filter layer. Exemplarily, the color filter layer 290 may be a colorless transparent film layer, such as a transparent resin.

[0084] Preferably, in an embodiment of the present invention, Figure 2a and Figure 2bAs shown, an etching stop layer may be provided between the light extraction layer 220 and the light guide plate 210. Exemplarily, the material of the etching stop layer may be indium gallium zinc oxide (IGZO). In this way, during subsequent etching, the surface of the light blocking plate may be prevented from being etched, making the surface of the light guide plate 210 rough and causing diffuse reflection.

[0085] Preferably, in an embodiment of the present invention, Figure 2a and Figure 2b As shown, an auxiliary layer 264 is further provided between the light extraction layer 220 and the transparent common electrode layer 240. Moreover, the orthographic projection of the auxiliary layer 264 on the light guide plate 210 overlaps with the orthographic projection of the light extraction layer 220 on the light guide plate 210. Furthermore, the orthographic projection of the auxiliary layer 264 on the light guide plate 210 overlaps with the orthographic projection of the light extraction layer 220 on the light guide plate 210. The function of the auxiliary layer 264 is to prevent the etching and stripping processes from damaging the upper surface of the light extraction layer 220. Exemplarily, the material of the auxiliary layer 264 may include SiO2. Of course, other materials may also be used to prepare the auxiliary layer 264, which can be designed and determined according to the needs of the actual application and is not limited here.

[0086] Preferably, in an embodiment of the present invention, Figure 2a and Figure 2b As shown, a third flat layer 263 is further disposed between the auxiliary layer 264 and the transparent common electrode layer 240. Furthermore, the third flat layer 263 covers the light guide plate 210, the light extraction layer 220 and the auxiliary layer 264, and fills the opening of the light extraction layer 220. In this way, a flat effect can be achieved by the third flat layer 263. Thus, when the transparent common electrode layer 240 is formed, the adverse effect of the opening of the light extraction layer 220 on the transparent common electrode layer 240 can be reduced.

[0087] Preferably, in an embodiment of the present invention, Figure 2a and Figure 2b As shown, a dielectric layer 265 is also provided between the transparent common electrode layer 240 and the black matrix layer 230. Furthermore, the dielectric layer 265 covers the transparent common electrode layer 240. The dielectric layer 265 can increase the adhesion of the black matrix layer 230, and insulate the black matrix layer 230 from the transparent common electrode layer 240, so as to prevent the black matrix layer 230 from interfering with the liquid crystal sensing electric field. Exemplarily, the material of the dielectric layer 265 may include SiO2. Of course, other materials may also be used to prepare the dielectric layer 265, which can be designed and determined according to the needs of actual applications and is not limited here.

[0088] Preferably, in an embodiment of the present invention, Figure 2a and Figure 2bAs shown, a second flat layer 262 is further provided between the black matrix layer 230 and the liquid crystal layer 300, so as to prevent liquid crystal disorder caused by the step difference and avoid light leakage or other display abnormalities.

[0089] It should be noted that by turning on and off the thin film transistor, different data voltages can be input to the transparent pixel electrode 151, so that the electric field between the transparent pixel electrode 151 and the transparent common electrode layer can be different, thereby controlling the liquid crystal deflection to different degrees, achieving light emission and achieving different grayscale brightness. Furthermore, by setting the first flat layer 160 and the second flat layer 262, when using different grayscale displays, the light emission direction can be controlled to be consistent. Figure 5a As shown, θ1 is the refraction angle of light S2, θ2 is the refraction angle of light S3, θ3 is the refraction angle of light S4, n1 is the refractive index of the medium environment before the light enters the liquid crystal layer 300, n2 is the refractive index of the liquid crystal layer 300, and n3 is the refractive index of the first flat layer 160. Then the following formula can be satisfied: n1*sin(θ1)=n2*sin(θ2)=n3*sin(θ3). Among them, n1 and θ1 are fixed. The liquid crystal layer can be equivalent to a parallel plate of a multi-layer medium, then n2 is not a constant. And n3 and θ3 are fixed. Therefore, the final light output angle can be made a constant, so that the light output direction can be consistent.

[0090] In specific implementation, in the embodiment of the present invention, the refractive index of the light extraction layer 220 may be less than the refractive index of the light guide plate 210. Exemplarily, the refractive index of the light extraction layer 220 may be 1.20-1.30. The refractive index of the light guide plate 210 may be 1.50-1.60. For example, the refractive index of the light extraction layer 220 may be 1.20, and the refractive index of the light guide plate 210 may be 1.50. Alternatively, the refractive index of the light extraction layer 220 may be 1.25, and the refractive index of the light guide plate 210 may be 1.56. Alternatively, the refractive index of the light extraction layer 220 may be 1.30, and the refractive index of the light guide plate 210 may be 1.60. In actual applications, the refractive indices of the light extraction layer 220 and the light guide plate 210 may be designed and determined according to the requirements of the actual application, and are not limited here.

[0091] In a specific implementation, the second flat layer 262 may be equal to or approximately equal to the refractive index of the light guide plate 210, so that the light of the light guide plate 210 can effectively enter the light entrance region RG. For example, when the refractive index of the light guide plate 210 is 1.50, the refractive index of the second flat layer 262 may be 1.50, 1.52, or 1.55. The refractive index of the second flat layer 262 may also vary within the range of 1.52±0.05 as the wavelength of light changes.

[0092] In specific implementation, in the embodiment of the present invention, as Figure 1 to Figure 2bAs shown, the light guide substrate 200 may further include: a second alignment layer 280 located between the transparent common electrode layer 240 and the liquid crystal layer 300. In addition, the light source structure 250 may emit polarized light to the light guide plate 210. Exemplarily, the light source structure 250 may be an LED light source.

[0093] Preferably, in a specific implementation, in an embodiment of the present invention, the material of the transparent common electrode layer 240 may be a transparent conductive material, such as indium tin oxide (ITO) material, indium zinc oxide (IZO) material, carbon nanotubes or graphene, etc., which is not limited here.

[0094] In a specific implementation, in the embodiment of the present invention, a support portion may be further provided between the first alignment layer 170 and the second alignment layer 280, so that the space of the encapsulated liquid crystal layer 300 may be supported by the support portion. Furthermore, the orthographic projection of the sub-carrier layer 111 on the base substrate 100 may cover the orthographic projection of the support portion on the base substrate 100.

[0095] The embodiment of the present invention provides a method for preparing the transparent display panel, such as Figure 4 As shown, the following steps may be included:

[0096] S410, forming a carrier layer 110 on the base substrate 100;

[0097] S420, forming a reflective layer 130 on a side of the carrier layer 110 facing away from the base substrate 100;

[0098] S430, after forming the liquid crystal layer 300 between the base substrate 100 and the light guide substrate 200, performing cell assembly;

[0099] Among them, the base substrate 100 includes multiple sub-pixels spx; the light guide substrate 200 includes multiple light entrance areas RG and multiple light exit areas CG arranged at intervals from each other; the supporting layer 110 includes multiple recessed structures 112; the reflective layer 130 includes multiple reflective structures 131; wherein, one sub-pixel spx includes a light entrance area RG, a light exit area CG and a recessed structure 112; and the orthographic projection of one recessed structure 112 on the base substrate 100 covers the orthographic projection of one reflective structure 131 on the base substrate 100; and, in the same sub-pixel spx, the reflective structure 131 is used to reflect the incident light to obtain the exit light when the incident light of the light entrance area RG of the light guide substrate 200 is incident on the reflective structure 131 through the liquid crystal layer 300, so that the exit light passes through the light exit area CG of the light guide substrate 200 and is emitted.

[0100] In a specific implementation, in an embodiment of the present invention, forming a carrier layer 110 on the base substrate 100 may specifically include:

[0101] A photoresist having light shielding properties is used to form a supporting film layer on the base substrate 100;

[0102] The carrier film layer is exposed and developed using a first mask to form a plurality of sub-carrier layers 111 arranged at intervals; wherein one sub-pixel spx includes one sub-carrier layer 111;

[0103] Each sub-carrier layer 111 is exposed multiple times with different exposure light intensities using a second mask, and a recessed structure 112 is formed on each sub-carrier layer 111 after development.

[0104] Exemplarily, the second mask is used to expose each sub-carrier layer 111 multiple times with different light intensities, specifically including:

[0105] The second mask 10 having a plurality of slits 11 spaced apart from each other is disposed on the side of the carrier layer 110 away from the base substrate 100; Figure 6 As shown, one sub-carrier layer 111 corresponds to one slit 11;

[0106] The second mask is controlled to move along the row direction of the sub-pixels spx by adopting a set step, and exposure is performed after each movement of the second mask stops according to the condition that the exposure light intensity increases in sequence;

[0107] The exposed base substrate 100 is developed to form a recessed structure 112 on each sub-carrier layer 111 .

[0108] Exemplarily, the stepping can be set to control the second mask to move 1 to 3 microns each time. For example, the stepping can be set to control the second mask to move 1 micron each time. The stepping can also be set to control the second mask to move 2 microns each time. The stepping can also be set to control the second mask to move 3 microns each time. Of course, the stepping can be designed and determined according to the needs of the actual application, and is not limited here.

[0109] Combine the following Figure 2a The above-mentioned preparation method provided by the embodiment of the present invention is described through specific examples. The above-mentioned preparation method provided by the embodiment of the present invention may include the following steps:

[0110] (1) A transistor layer 140 is formed on a substrate 100 (e.g., a glass substrate). The thin film transistor in the present invention may be a metal oxide semiconductor field effect (MOS) transistor. In practical applications, the thin film transistor in the embodiment of the present invention may be formed by a process for forming a MOS transistor, and the specific process is not described in detail herein.

[0111] (2) A patterning process is used to form a plurality of transparent pixel electrodes 151 on the side of the transistor layer 140 away from the base substrate 100 through the ITO material. Exemplarily, the thickness of the transparent pixel electrode layer 140 can be 10 to 80 nanometers. For example, the thickness of the transparent pixel electrode layer can be 10 nanometers, 40 nanometers, 70 nanometers, or 80 nanometers. Preferably, the thickness of the transparent pixel electrode layer can be 70 nanometers.

[0112] (3) A photoresist having light shielding properties is used to form a carrier film layer covering the base substrate 100 on the base substrate 100. Exemplarily, the thickness of the carrier film layer in a direction perpendicular to the base substrate 100 may be 4 to 8 microns. For example, the thickness of the carrier film layer in a direction perpendicular to the base substrate 100 may be 4 microns, 6 microns, or 8 microns. Preferably, the thickness of the carrier film layer in a direction perpendicular to the base substrate 100 may be 6 microns.

[0113] (4) Expose and develop the carrier film layer using a first mask to form a plurality of spaced-apart sub-carrier layers 111. For example, the thickness of the sub-carrier layer 111 can be 6 micrometers.

[0114] (5) A second mask having a plurality of slits spaced apart from each other is disposed on a side of the carrier layer 110 away from the base substrate 100. The width of the slits may be 2 micrometers.

[0115] (6) According to the set step of controlling the second mask to move 2 microns each time, the second mask 10 is controlled to move along the row direction F1 of the sub-pixel spx, and exposure is performed after each movement of the second mask 11 stops according to the condition that the exposure light intensity decreases in sequence. The second mask can be controlled to move 5 times. For example, Figure 7a and Figure 7b As shown in FIG. 1 , after the second mask is placed on the base substrate 100, light with an exposure intensity of G6 is used for exposure. Figure 8a and Figure 8b As shown, the second mask 10 is controlled to move 2 micrometers along the row direction F1 of the sub-pixel spx, and light with an exposure intensity of G5 is used for exposure. Figure 9a and Figure 9b As shown, the second mask 10 is controlled to move 2 micrometers along the row direction F1 of the sub-pixel spx, and light with an exposure intensity of G4 is used for exposure. Fig.10a and Fig.10b As shown, the second mask 10 is controlled to move 2 micrometers along the row direction F1 of the sub-pixel spx, and light with an exposure intensity of G3 is used for exposure. Fig.11a and Fig.11bAs shown, the second mask 10 is controlled to move 2 micrometers along the row direction F1 of the sub-pixel spx, and light with exposure intensity G2 is used for exposure. Fig.12a and Figure 12b As shown, the second mask 10 is controlled to move 2 micrometers along the row direction F1 of the sub-pixel spx, and light with exposure intensity G1 is used for exposure. Among them, G6>G5>G4>G3>G2>G1.

[0116] (7) The exposed base substrate 100 is developed so that the sub-carrier layer 111 can be formed as follows: Figure 2a The recessed structure 112 is shown to be triangular in shape.

[0117] (8) A reflective structure 131 in the reflective layer 130 is formed on the side of the carrier layer 110 facing away from the base substrate 100 by using a patterning process. The reflective layer 130 may be made of a metal material, such as Al, Ag, Mo, etc., which is not limited here. For example, the reflective structure 131 may be formed on the second side L2, and the width of the reflective structure 131 in a direction parallel to the second side L2 may be 12 micrometers.

[0118] (9) A first flat layer 160 is formed on the side of the reflective layer 130 away from the base substrate 100, so as to reduce the influence of the recessed structure 112 on the arrangement of liquid crystal molecules. For example, the thickness of the first flat layer 160 located on the sub-carrier layer 111 can be 1 micron, and the first flat layer 160 at other positions can be filled to make the surface of the first flat layer away from the base substrate as flat as possible. For example, the thickness of the first flat layer 160 filled in the gap between the sub-carrier layers 111 can be 7 microns.

[0119] (10) A first alignment layer 170 is formed on the side of the first planar layer 160 facing away from the base substrate 100 .

[0120] (11) An IGZO material is used to form an etching stop layer 261 covering the light guide plate 210 on the light guide plate 210. For example, the thickness of the light guide plate is set to 0.5 mm. The thickness of the etching stop layer 261 is set to 0.08 μm.

[0121] (12) A light extraction layer 220 is formed on the side of the etching stop layer away from the light guide plate 210 by a patterning process. The material of the light extraction layer 220 may include photoresist and SiO2 dispersed in the photoresist. For example, the thickness of the light extraction layer 220 may be 0.8 micrometers.

[0122] Furthermore, SiO2 material may be used to form an auxiliary layer 264 on the light extraction layer 220, so as to prevent the etching and stripping processes from damaging the upper surface of the light extraction layer 220. For example, the thickness of the auxiliary layer 264 may be 0.1 micrometers.

[0123] (13) A third flat layer 263 is formed on the side of the auxiliary layer 264 away from the light guide plate 210. The third flat layer 263 covers the light guide plate 210, the light extraction layer 220 and the auxiliary layer 264, and fills into the opening of the light extraction layer 220. For example, the thickness of the third flat layer 263 on the auxiliary layer 264 can be 1.2 microns, and the third flat layer 263 at other positions can be filled so that the surface of the third flat layer 263 away from the light guide plate 210 is as flat as possible. For example, the thickness of the third flat layer 263 filled into the opening of the light extraction layer 220 can be 2.1 microns.

[0124] (14) Using ITO material, a transparent common electrode layer 240 is formed on the side of the third flat layer 263 away from the light guide plate 210. For example, the thickness of the transparent common electrode layer 240 may be 0.07 micrometers.

[0125] (15) A dielectric layer 265 is formed by using SiO2 material on the side of the transparent common electrode layer 240 facing away from the light guide plate 210. By way of example, the dielectric layer 265 may have a thickness of 0.12 micrometers.

[0126] (16) A black matrix layer 230 is formed on the side of the dielectric layer 265 away from the light guide plate 210 by using a patterning process. This can prevent light leakage. In other words, by providing the black matrix layer 230, not only the impurity light reflected by the uneven surface of the reflective layer 130 can be shielded, but also the stray light caused by the action of the liquid crystal molecules can be shielded. Exemplarily, the thickness of the black matrix layer 230 can be 1 micron.

[0127] (17) A second flat layer 262 is formed on the side of the black matrix layer 230 away from the light guide plate 210. For example, the thickness of the second flat layer 262 on the black matrix layer 230 may be 1 micron, and the second flat layer 262 at other locations may be filled to make the surface of the second flat layer 262 away from the light guide plate as flat as possible.

[0128] (18) A second alignment layer 280 is formed on the side of the second planar layer 262 away from the light guide plate 210 .

[0129] (19) After forming the liquid crystal layer 300 between the base substrate 100 and the light guide substrate 200, the cell assembly is performed. Preferably, the thickness of the liquid crystal layer 300 is 30 micrometers.

[0130] It should be noted that steps (1) to (10) can be performed independently of steps (11) to (18), and the order in which steps (1) to (10) and steps (11) to (18) are performed is not limited.

[0131] An embodiment involving specific structure and size relationship is given below: Figure 5b As shown, Table 1 shows: the thickness H1 (micrometers) of the liquid crystal layer 300, the thickness H2 (micrometers) of the etching blocking layer 261, the thickness H3 (micrometers) of the light extraction layer 220, the thickness H4 (micrometers) of the auxiliary layer 264, the thickness H5 (micrometers) of the third flat layer 263 located on the auxiliary layer 264, the thickness H6 (micrometers) of the transparent common electrode layer 240, the thickness H7 (micrometers) of the dielectric layer 265, the thickness H8 (micrometers) of the black matrix layer 230, the thickness H9 (micrometers) of the second flat layer 262 located on the black matrix layer 230, the thickness H10 (micrometers) of the first flat layer 160 located on the sub-carrier layer 111, the thickness H11 (micrometers) of the sub-carrier layer 111, and the thickness H12 (micrometers) of the transparent pixel electrode 151.

[0132] H1 H2 H3 H4 H5 H6 H7 H8 H9 H10 H11 H12 30 0.08 0.8 0.1 1.2 0.07 0.12 1 1 1 6 0.07

[0133] Table 1

[0134] Combination Figure 5b As shown, Table 2 shows: the refractive index n261 of the etching stop layer 261, the refractive index n220 of the light extraction layer 220, the refractive index n264 of the auxiliary layer 264, the refractive index n263 of the third flat layer 263, the refractive index n240 of the transparent common electrode layer 240, the refractive index n265 of the dielectric layer 265, the refractive index n262 of the second flat layer 262, and the refractive index n160 of the first flat layer 160. It should be noted that the first flat layer 160, the second flat layer 262, and the third flat layer 263 can be made of the same material, and their refractive index varies within the range of 1.52±0.05 as the wavelength of light changes; it should be noted that, except for the film layers listed in Table 2, the refractive index of the remaining film layers can be ignored.

[0135] n261 n220 n264 n263 n240 n265 n262 n160 1.5 1.25 1.52 1.52 1.5 1.52 1.52 1.52

[0136] Table 2

[0137] Combination Figure 5bAs shown, Table 3 shows: the thickness H1 (micrometers) of the liquid crystal layer 300 in the F3 direction, the width D (micrometers) of the opening in the light incident region RG in the F1 direction, the angle β, the length LS (micrometers) of the reflective structure 131 along the second side L2, the distance LM (micrometers) between the left side of the orthographic projection of the reflective structure 131 on the substrate 100 and the left side of the orthographic projection of the light incident region RG on the substrate 100 in the F1 direction, and the light effect L255 when the display panel displays 255 grayscales (taking 0 to 255 grayscales as an example) (the light effect can be defined as the ratio of the light intensity emitted from a sub-pixel spx without a color filter layer 290 to the light intensity entering the light guide plate). The ratio of the light intensity of the sub-pixel to the light-entering area RG), the light efficiency L0 when the display panel displays 0 grayscale (taking 0 to 255 grayscale as an example), the contrast CR of the display panel (i.e., L255 / L0), the resolution PPI of the display panel, the width NS1 of the black matrix layer 230 in a sub-pixel in the left area of ​​the orthographic projection of the substrate substrate in the F1 direction (micrometers, that is, the difference between the first distance NS11 and the second distance NS12 between the left area of ​​the orthographic projection of the black matrix layer 230 in a sub-pixel on the substrate substrate and the left side of the orthographic projection of the light-entering area RG on the substrate substrate 100), and the width CS of the light-entering area RG in the F1 direction (micrometers). Exemplarily, the width NS2 of the black matrix layer 230 in a sub-pixel in the right area of ​​the orthographic projection of the substrate substrate can be set to 20 to 50 micrometers. For example, NS2 can be 20 micrometers, NS2 can also be 30 micrometers, and NS2 can also be 50 micrometers.

[0138]

[0139] Table 3

[0140] The width D of the opening in the light incident region RG in the F1 direction may gradually increase as the distance from the light source structure 250 increases, so that the light output of the light guide plate is uniform. When the width D of the opening in the RG in the F1 direction changes, the structural dimensions of the sub-pixel spx may be adjusted by the parameters in the above table, while the angle β does not need to be adjusted, so that the light intensity corresponding to the 255 grayscales of different light exit regions CG is consistent or approximately consistent, thereby improving the display uniformity of the display panel.

[0141] It should be noted that the positions and refractive indices of various technical features defined in Tables 1, 2 and 3 are merely examples, and the design of the display panels disclosed in some embodiments of the present invention may not be limited to the above sizes and refractive indices.

[0142] Based on the same inventive concept, an embodiment of the present invention further provides a display device, including the transparent display panel provided by the embodiment of the present invention. The principle of solving the problem by the display device is similar to that of the transparent display panel, so the implementation of the display device can refer to the implementation of the transparent display panel, and the repeated parts will not be repeated here.

[0143] In specific implementation, in the embodiment of the present invention, the display device can be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigator, etc. Other essential components of the display device are well understood by those skilled in the art, and are not described in detail here, nor should they be used as limitations on the present invention.

[0144] The transparent display panel, preparation method and display device provided by the embodiments of the present invention can make the light incident on the reflective structure of the light guide substrate reflect and then be emitted through the light emitting area by providing a bearing layer with a concave structure and providing a reflective layer on the side of the bearing layer facing the liquid crystal layer, so that the liquid crystal display panel can achieve a transparent display effect.

[0145] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A transparent display panel, comprising a plurality of sub-pixels, characterized in that: Also includes: substrate substrate; A light guide substrate is arranged opposite to the base substrate, and the light guide substrate comprises a plurality of light entrance areas and a plurality of light exit areas which are arranged at intervals from each other; wherein one sub-pixel comprises one light entrance area and one light exit area; A liquid crystal layer, located between the base substrate and the light guide substrate; A bearing layer, located between the base substrate and the liquid crystal layer, and the bearing layer includes a plurality of recessed structures; wherein one sub-pixel includes one recessed structure; A reflective layer, located between the carrier layer and the liquid crystal layer, and comprising a plurality of reflective structures; wherein an orthographic projection of one of the recessed structures on the base substrate covers an orthographic projection of one of the reflective structures on the base substrate; In the same sub-pixel, the reflective structure is used to reflect the incident light to obtain outgoing light when the incident light in the light incident area of ​​the light guide substrate is incident on the reflective structure through the liquid crystal layer, so that the outgoing light passes through the light exit area of ​​the light guide substrate and is emitted; The carrier layer includes a plurality of sub-carrier layers arranged at intervals; wherein one sub-pixel includes one sub-carrier layer, and the orthographic projection of the sub-carrier layer on the base substrate covers the orthographic projection of the recessed structure on the base substrate; The bearing layer is a light-shielding material; The transparent display panel further comprises: a transistor layer located between the base substrate and the carrier layer, and a driving electrode layer located between the transistor layer and the carrier layer; wherein the transistor layer comprises a plurality of thin film transistors; and the driving electrode layer comprises a plurality of transparent pixel electrodes; One of the sub-pixels includes one of the thin film transistors and one of the transparent pixel electrodes, and the thin film transistor and the transparent pixel electrode in the same sub-pixel are electrically connected to each other; In the same sub-pixel, the orthographic projection of the sub-carrier layer on the base substrate covers the orthographic projection of the thin film transistor on the base substrate.

2. The transparent display panel according to claim 1, wherein: The cross section of the recessed structure in a direction parallel to the row of sub-pixels and in a direction perpendicular to the substrate is a triangle.

3. The transparent display panel according to claim 2, wherein: The triangle has a first side, a second side and a third side connected in sequence; wherein the first side and the second side are the side edges of the recessed structure, and the third side is the opening of the recessed structure; The length of the second side is greater than that of the first side, and an angle between the second side and the third side is 20 to 40 degrees.

4. The transparent display panel according to claim 1, wherein: The material of the carrier layer is a photoresist with light-shielding performance.

5. The transparent display panel according to claim 1, wherein: In the same sub-pixel, the orthographic projection of the transparent pixel electrode on the base substrate covers the orthographic projection of the sub-carrier layer on the base substrate.

6. The transparent display panel according to any one of claims 1 to 5, characterized in that: The display panel further includes: a first flat layer located between the reflective layer and the liquid crystal layer; wherein the first flat layer covers the base substrate and the bearing layer and is filled with the recessed structure.

7. The transparent display panel according to any one of claims 1 to 5, characterized in that: The light guide substrate comprises: a light guide plate located on the side of the liquid crystal layer away from the base substrate, a light extraction layer located between the light guide plate and the liquid crystal layer, a transparent common electrode layer located between the light extraction layer and the liquid crystal layer, a black matrix layer located between the transparent common electrode layer and the liquid crystal layer, and a light source structure located on one side of the light guide plate; wherein the light extraction layer comprises a plurality of openings arranged at intervals; an orthographic projection of one of the openings on the base substrate is located in one of the light incident regions; The gap between the orthographic projection of the black matrix layer on the base substrate and the light exiting area overlaps with the orthographic projection of the base substrate, and the orthographic projection of the black matrix layer on the base substrate does not overlap with the orthographic projection of the light entrance area on the base substrate.

8. A method for preparing a transparent display panel according to any one of claims 1 to 7, characterized in that: include: forming the carrier layer on the base substrate; forming a reflective layer on a side of the carrier layer away from the substrate; After forming the liquid crystal layer between the base substrate and the light guide substrate, cell alignment is performed; Among them, the base substrate includes multiple sub-pixels; the light-guiding substrate includes multiple light-entry areas and multiple light-exiting areas spaced apart from each other; the supporting layer includes multiple recessed structures; the reflective layer includes multiple reflective structures; wherein one sub-pixel includes one light-entry area, one light-exiting area and one recessed structure; and the orthographic projection of one recessed structure on the base substrate covers the orthographic projection of one reflective structure on the base substrate; and, in the same sub-pixel, the reflective structure is used to reflect the incident light in the light-entry area of ​​the light-guiding substrate to obtain exiting light when the incident light is incident on the reflective structure through the liquid crystal layer, so that the exiting light passes through the light-exiting area of ​​the light-guiding substrate and is emitted.

9. The preparation method according to claim 8, characterized in that: The step of forming the carrier layer on the base substrate specifically includes: Using a photoresist with light-shielding properties, forming a carrier film layer on the substrate; Using a first mask to expose and develop the carrier film layer to form a plurality of sub-carrier layers arranged at intervals; wherein one sub-pixel includes one sub-carrier layer; The sub-carrier layers are exposed multiple times with different exposure light intensities using a second mask, and the recessed structures are formed on the sub-carrier layers after development.

10. The preparation method according to claim 9, characterized in that: The step of using the second mask to expose each sub-bearing layer multiple times with different light intensities specifically includes: Disposing a second mask having a plurality of slits spaced apart from each other on a side of the carrier layer away from the base substrate; one of the sub-carrier layers corresponds to one of the slits; The second mask is controlled to move along the row direction of the sub-pixels by adopting a set step, and exposure is performed after the second mask stops moving each time under the condition that the exposure light intensity increases in sequence; The exposed base substrate is developed to form the recessed structure on each of the sub-carrier layers.

11. A display device, characterized in that: Comprising the transparent display panel as described in any one of claims 1-7.

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