Substrate processing device

Abstract

This invention relates to a substrate processing apparatus, comprising: a rotary chuck rotatably disposed inside a cup-shaped housing and used to mount a substrate; a nozzle operating stage rotatably disposed inside the rotary chuck; a guide section disposed inside the nozzle operating stage; a moving module movably disposed within the guide section; a guide arm connected to the moving module and supporting a fluid supply line; a lower nozzle section coupled to the guide arm and connected to the fluid supply line, moving together with the moving module; a drive shaft connected to the rotary chuck and the nozzle operating stage to rotate the rotary chuck and the nozzle operating stage; a moving shaft rotatably disposed inside the drive shaft and connected to the moving module to move the moving module; and a drive section connected to the drive shaft and the moving shaft to drive the drive shaft and the moving shaft.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus, and more specifically, to a substrate processing apparatus capable of simultaneously processing both sides of a substrate and preventing liquid residue from remaining inside the nozzle operating table. Background Technology

[0002] Typically, in semiconductor devices, a defined thin film is formed on a silicon wafer used as a semiconductor substrate. As the silicon wafer undergoes unit processes such as chemical vapor deposition, sputtering, photolithography, etching, ion implantation, and chemical mechanical polishing, a thin film pattern is formed on the silicon wafer.

[0003] To manufacture semiconductor devices, multiple thin films are formed on a semiconductor wafer. Etching is typically used to form these films. During etching, foreign matter adheres to the backside of the semiconductor wafer; therefore, cleaning and drying processes are performed to remove this foreign matter.

[0004] However, in the past, when the processing liquid of the semiconductor device remained in the lower nozzle section and the nozzle drive module, fumes might be generated during the cleaning process due to the volatility of the processing liquid, or rebound of residual substances might occur during the drying process. Therefore, cleaning spray or substrate defects could occur. Thus, improvements are needed.

[0005] The background technology of this invention is disclosed in Korean Patent Publication No. 2017-0108158 (published on September 26, 2017, entitled "Wafer Processing System with Chuck Assembly Maintenance Module"). Summary of the Invention

[0006] Technical problems to be solved

[0007] The purpose of this invention is to provide a substrate processing apparatus that can simultaneously process both sides of a substrate and prevent liquid residue from remaining inside the nozzle operating table.

[0008] means of solving technical problems

[0009] The substrate processing apparatus of the present invention is characterized by comprising: a rotary chuck rotatably disposed inside a cup-shaped housing and used to mount a substrate; a nozzle operating stage rotatably disposed inside the rotary chuck; a guide section disposed inside the nozzle operating stage; a moving module movably disposed in the guide section; a guide arm connected to the moving module and supporting a fluid supply line; a lower nozzle section coupled to the guide arm movably together with the moving module and connected to the fluid supply line; a drive shaft connected to the rotary chuck and the nozzle operating stage to rotate the rotary chuck and the nozzle operating stage; a moving shaft rotatably disposed inside the drive shaft and connected to the moving module to move the moving module; and a drive section connected to the drive shaft and the moving shaft to drive the drive shaft and the moving shaft.

[0010] The guide may include a guide rail configured to traverse the interior of the nozzle operating table.

[0011] The moving module may include: a sliding part that is movable and engages with the guide rail part; and a rack connected to the sliding part and the guide arm part, the rack being configured to mesh with the moving shaft part.

[0012] The movable shaft portion may include: a movable shaft body portion, which is rotatably disposed at the center of the drive shaft portion and connected to the drive portion; and a pinion portion, which is connected to the movable shaft body portion in a manner that meshes with the rack.

[0013] The lower nozzle portion may include: a first lower nozzle, which is disposed on the guide arm portion in a manner that moves together with the rack and is connected to the fluid supply pipeline portion; and a second lower nozzle, which is disposed on the guide arm portion in a manner that moves together with the rack and is connected to the fluid supply pipeline portion.

[0014] The drive shaft portion may include: a first drive shaft connected to the rotary chuck and the drive portion; and a second drive shaft rotatably disposed between the first drive shaft and the movable shaft portion, and connected to the nozzle operating table portion and the drive portion.

[0015] The second drive shaft may include: a second outer shaft, which is arranged concentrically with the first drive shaft inside the first drive shaft; and a second inner shaft, which is arranged concentrically with the second outer shaft inside the second outer shaft and has a fluid flow pipeline connected to the fluid supply pipeline.

[0016] The driving unit may include: a first driving unit connected to the first driving shaft to rotate the first driving shaft; a second driving unit connected to the second outer shaft to rotate the second outer shaft; and a third driving unit connected to the moving shaft to rotate the moving shaft.

[0017] When performing the liquid medicine supply process, the control can be as follows: the first drive unit causes the first drive shaft to rotate, the second drive unit causes the second outer shaft to stop, and the third drive unit causes the moving shaft to rotate.

[0018] When performing the cleaning process, the control can be as follows: the first drive unit causes the first drive shaft to rotate, the second drive unit causes the second outer shaft to rotate, and the third drive unit causes the moving shaft to stop.

[0019] During the drying process, the control can be as follows: the first drive unit rotates the first drive shaft, the second drive unit rotates the second outer shaft, and the third drive unit stops the moving shaft.

[0020] It may also include a cover component, which is provided to cover the upper side of the nozzle operating table portion, and the cover component forms a moving channel portion for the lower nozzle portion to move.

[0021] The cover component can be formed in a disc shape to cover the upper side of the nozzle operating table.

[0022] The moving channel portion can be formed along the guide portion to allow the lower nozzle portion to move.

[0023] The effects of the invention

[0024] According to the present invention, the upper nozzle portion and the lower nozzle portion spray fluid onto both sides of the substrate, thus allowing both sides of the substrate to be processed simultaneously.

[0025] Furthermore, according to the present invention, the guide arm supports the fluid supply pipeline, thus preventing damage to the fluid supply pipeline by means of the centrifugal force of the rotating chuck and nozzle operating table.

[0026] Furthermore, according to the present invention, the cover member covers the upper side of the nozzle operating table, so that the liquid medicine and cleaning liquid sprayed onto the substrate are blocked by the cover member and hardly flow into the interior of the nozzle operating table.

[0027] Furthermore, according to the present invention, when the liquid medicine supply process is performed, the rotary chuck rotates while the nozzle operating table and the cover component remain stationary. Therefore, even if a small amount of liquid medicine falls onto the cover component, it will hardly flow into the cover component. Thus, it is possible to prevent the liquid medicine from flowing into the interior of the nozzle operating table through the moving channel.

[0028] Furthermore, according to the present invention, during the liquid supply process, the liquid can be prevented from flowing into the interior of the nozzle operating table. Therefore, when performing the cleaning process, the generation of fumes can be prevented, and when performing the drying process, the rebound of residual liquid can be prevented. Consequently, the cleaning spray on the substrate and the defect rate can be significantly reduced. Attached Figure Description

[0029] Figure 1 A side view of a substrate processing apparatus according to an embodiment of the present invention is shown.

[0030] Figure 2 This is a cross-sectional view illustrating a substrate processing apparatus according to an embodiment of the present invention.

[0031] Figure 3 This is an enlarged view showing the rotary chuck and nozzle operating table of a substrate processing apparatus according to an embodiment of the present invention.

[0032] Figure 4 This is a top view illustrating a substrate processing apparatus according to an embodiment of the present invention.

[0033] Figure 5 This is a perspective view of a substrate processing apparatus according to an embodiment of the present invention.

[0034] Figure 6 This is a cross-sectional view showing the working state of the substrate processing apparatus during the liquid supply process according to an embodiment of the present invention.

[0035] Figure 7 This is a cross-sectional view showing the operating state of a substrate processing apparatus according to an embodiment of the present invention during a cleaning process.

[0036] Figure 8 This is a cross-sectional view showing the operating state of a substrate processing apparatus according to an embodiment of the present invention during a cleaning process.

[0037] Explanation of reference numerals in the attached figures

[0038] 100: Substrate processing apparatus; 101: Cup-shaped housing; 105: Upper nozzle section; 110: Rotary chuck; 112: Clamping pin section; 114: Discharge hole section; 120: Nozzle operating table section; 122: Operating table hole section; 130: Guide section; 131: Guide rail section; 133: Guide block; 140: Moving module; 141: Sliding section; 143: Gear rack; 143a: Gear rack section; 150: Guide arm section; 152: Guide connecting rod; 160: Lower nozzle section; 161: First lower nozzle; 163: Second lower nozzle; 165: Fluid Supply pipeline section; 165a: medicine supply pipeline; 165b: cleaning fluid supply pipeline; 170: drive shaft section; 171: first drive shaft; 173: second drive shaft; 174: second outer shaft; 175: second inner shaft; 176: fluid flow pipeline section; 180: moving shaft section; 181: moving shaft main body section; 183: pinion section; 183a: pinion tooth section; 190: drive section; 191: first drive section; 193: second drive section; 195: third drive section; 210: cover component; 212: moving channel section; W: substrate. Detailed Implementation

[0039] Hereinafter, an embodiment of the substrate processing apparatus of the present invention will be described with reference to the accompanying drawings. During the description of the substrate processing apparatus, for clarity and convenience, the thickness of the various lines or the size of structural elements shown in the drawings may be shown in enlarged form. Furthermore, the various terms used below are defined in a manner that takes into account the functions of the present invention, and may vary depending on the intent or convention of the user, application personnel, or other practitioners. Therefore, these terms should be defined according to the entire contents of this specification.

[0040] Figure 1 To illustrate a side view of a substrate processing apparatus according to an embodiment of the present invention, Figure 2 A cross-sectional view of a substrate processing apparatus according to an embodiment of the present invention is shown. Figure 3 This is an enlarged view showing the rotary chuck and nozzle operating table of a substrate processing apparatus according to an embodiment of the present invention. Figure 4 To illustrate a top view of a substrate processing apparatus according to an embodiment of the present invention, Figure 5 This is a perspective view of a substrate processing apparatus according to an embodiment of the present invention.

[0041] Reference Figures 1 to 5 The substrate processing apparatus 100 of one embodiment of the present invention includes a rotary chuck 110, a nozzle operating table 120, a guide 130, a moving module 140, a guide arm 150, a lower nozzle 160, a drive shaft 170, a moving shaft 180, and a drive 190.

[0042] The cup-shaped housing 101 has a barrel shape with an open top. An upper nozzle portion 105 is formed on the upper side of the cup-shaped housing 101 to spray liquid medicine or cleaning solution onto the substrate W mounted on the rotary chuck 110. The upper nozzle portion 105 is rotated or moved by a moving device (not shown).

[0043] A rotary chuck 110 is rotatably disposed inside a cup-shaped housing 101 and is used to mount a substrate W. The rotary chuck 110 has a cylindrical shape that is open at the top and closed at the bottom and edges. A plurality of clamping pins 112 are provided on the upper edge of the rotary chuck 110 to support the edge of the substrate W. The plurality of clamping pins 112 can be arranged at equal intervals. The clamping pins 112 can correct the position of the substrate W in a manner that aligns the center of the substrate W with the rotation center of the rotary chuck 110.

[0044] Multiple discharge holes 114 for discharging fluid are formed on the edge of the rotary chuck 110. Therefore, when the rotary chuck 110 rotates, the fluid medicine and cleaning solution can be easily discharged by the centrifugal force of the rotary chuck 110.

[0045] The nozzle operating platform 120 is rotatably disposed inside the rotary chuck 110. The nozzle operating platform 120 is a cylindrical shape, open at the top and closed at the bottom and sides. Multiple operating platform holes 122 are formed on the bottom surface of the nozzle operating platform 120 to discharge the medicinal and cleaning solutions flowing into it. The multiple operating platform holes 122 are arranged along the edge of the nozzle operating platform 120.

[0046] A guide section 130 is disposed inside the nozzle operating platform section 120. A moving module 140, a fluid supply line section 165, a lower nozzle section 160, and a guide arm section 150 are disposed inside the nozzle operating platform section 120. In this case, the guide section 130 includes a guide rail section 131 arranged transversely through the interior of the nozzle operating platform section 120. The guide rail section 131 is disposed offset to one side from the rotation center of the nozzle operating platform section 120 and is arranged side-by-side with the diameter of the nozzle operating platform section 120. A pair of guide rail sections 131 are arranged side-by-side on a plane parallel to the bottom surface of the nozzle operating platform section 120. The two sides of the guide rail section 131 are disposed on the edge of the nozzle operating platform section 120 via guide blocks 133.

[0047] The moving module 140 is movably disposed on the guide section 130. The moving module 140 moves parallel to the nozzle operating table section 120 along the diameter of the guide rail section 131. The range of movement of the moving module 140 is slightly smaller than the radius of the nozzle operating table section 120. The moving module 140 can be adapted to various configurations that allow it to move along the guide section 130. An example of the moving module 140 will be described below.

[0048] The moving module 140 includes a sliding portion 141 and a rack bar 143. The sliding portion 141 is movably engaged with the guide rail portion 131. Multiple sliding portions 141 are block-shaped. The rack bar 143 is connected to the sliding portion 141 and is provided with a lower nozzle portion 160, which meshes with the moving shaft portion 180. A rack portion 143a is provided along the length of the rack bar 143. The sliding portion 141 is movably engaged with a pair of guide rail portions 131, thus preventing the rack bar 143 from wobbling when it moves.

[0049] The guide arm 150 is connected to the moving module 140 and supports the fluid supply line 165. The fluid supply line 165 includes a medicine supply line 155a and a cleaning fluid supply line 155b. The medicine supply line 155a is disposed inside the guide arm 150 and supplies medicine, while the cleaning fluid supply line 155b is disposed side-by-side with the medicine supply line 155a and supplies cleaning fluid. Because the guide arm 150 supports the fluid supply line 165, damage to the fluid supply line 165 due to the centrifugal force of the rotating chuck 110 and the nozzle operating table 120 can be prevented.

[0050] The guide arm 150 includes a plurality of guide links 152 connected by an articulated structure.

[0051] For example, the guide arm 150 includes: a first guide link 152a, rotatably mounted on the nozzle operating table 120; and a second guide link 152b, linked to the first guide link 152a and rotatably connected to the rack 143, and having a lower nozzle portion 160. The guide arm 150 can be formed by three or more guide links 152, with a diameter similar to that of the nozzle operating table 120. When the rack 143 moves, the first and second guide links 152 rotate in an unfolding or folding direction. As the second guide link 152 rotates, the lower nozzle portion 160 moves along the guide portion 130.

[0052] The lower nozzle section 160 is coupled to the guide arm section 150 in a manner that moves together with the moving module 140, and is connected to the fluid supply line section 165. The lower nozzle section 160 includes a first lower nozzle 161 and a second lower nozzle 163. The first lower nozzle 161 is disposed on the guide arm section 150 in a manner that moves together with the rack 143, and is connected to the liquid supply line 165a of the fluid supply line section 165. A first spray hole (not shown) is formed in the first lower nozzle 161 for spraying liquid. The second lower nozzle 163 is disposed on the guide arm section 150 in a manner that moves together with the rack 143, and is connected to the cleaning fluid supply line 155a of the fluid supply line section 165. A plurality of second spray holes (not shown) are formed in the second lower nozzle 163 for spraying cleaning fluid. The first lower nozzle 161 is arranged concentrically with the rotation center of the nozzle operating table 120, and the second lower nozzle 163 is arranged eccentrically from the rotation center of the nozzle operating table 120.

[0053] The drive shaft 170 is connected to the rotary chuck 110 and the nozzle operating table 120 to rotate the rotary chuck 110 and the nozzle operating table 120. The drive shaft 170 includes a first drive shaft 171 and a second drive shaft 173.

[0054] The first drive shaft 171 is connected to the rotary chuck 110 and the drive unit 190. The first drive shaft 171 is vertically arranged in the up-down direction. The first drive shaft 171 is in the shape of a circular tube.

[0055] The second drive shaft 173 is rotatably disposed between the first drive shaft 171 and the movable shaft portion 180, and is connected to the nozzle operating table portion 120 and the drive portion 190. The second drive shaft 173 is arranged concentrically with the first drive shaft 171 and the movable shaft portion 180. The second drive shaft 173 is in the form of a circular tube. The first drive shaft 171, the second drive shaft 173, and the movable shaft portion 180 can rotate independently via the drive portion 190.

[0056] The second drive shaft 173 includes a second outer shaft 174 and a second inner shaft 175. The second outer shaft 174 is arranged concentrically with the first drive shaft 171 inside the first drive shaft 171. The second inner shaft 175 is arranged concentrically with the second outer shaft 174 inside the second outer shaft 174, forming a fluid flow pipeline 176 connected to the fluid supply pipeline 165. The second outer shaft 174 and the second inner shaft 175 are arranged concentrically in a tubular shape. The fluid flow pipeline 176 includes a medicine flow pipeline (not shown) and a cleaning fluid flow pipeline (not shown). The medicine flow pipeline is formed along the length direction of the second inner shaft 175 and supplies medicine. The cleaning fluid flow pipeline is arranged side by side with the medicine flow pipeline and supplies cleaning fluid. The medicine flow pipeline is connected to the medicine supply pipeline 165a, and the cleaning fluid flow pipeline is connected to the cleaning fluid supply pipeline 165b. The fluid flow pipeline is connected to a fluid supply device (not shown). The fluid supply device includes a medicine supply device (not shown) and a cleaning fluid supply device (not shown). A fluid flow line 176 is formed in the second inner shaft 175, so that even if the second inner shaft 175 rotates, fluid can be supplied to the fluid supply line 176 through the fluid flow line 176.

[0057] The movable shaft portion 180 is rotatably disposed inside the drive shaft portion 170 and connected to the movable module 140 to allow the movable module 140 to move. The movable shaft portion 180 includes a movable shaft body portion 181 and a pinion portion 183. The movable shaft body portion 181 is rotatably disposed at the center of the drive shaft portion 170 and connected to the drive portion 190. The pinion portion 183 is connected to the movable shaft body portion 181 in a manner that meshes with the rack portion 143. The pinion portion 183 is disposed at the upper end of the movable shaft body portion 181. Pinion teeth 183a are formed on the edge portion of the pinion portion 183 so as to mesh with the rack portion 143a. As the movable shaft portion 180 rotates, the pinion portion 183 rotates, and as the pinion portion 183 rotates, the rack 143 moves along the guide portion 130.

[0058] The drive unit 190 is connected to the drive shaft unit 170 and the movable shaft unit 180 so as to drive the drive shaft unit 170 and the movable shaft unit 180.

[0059] The drive unit 190 includes a first drive unit 191, a second drive unit 193, and a third drive unit 195. The first drive unit 191 is connected to a first drive shaft 171 to rotate the first drive shaft 171. The second drive unit 193 is connected to a second outer shaft 174 to rotate the second outer shaft 174. The third drive unit 195 is connected to a movable shaft unit 180 to rotate the movable shaft unit 180.

[0060] The first drive unit 191 can be a hollow motor unit connected to the first drive shaft 171 and the rotor unit (not shown), or a conveyor belt driven motor unit connected to the first drive shaft 171 via a conveyor belt. The second drive unit 193 can be a conveyor belt driven motor unit connected to the second outer shaft 174, or a clutch module that restricts or releases the restriction between the second outer shaft 174 and the first drive shaft 171. Furthermore, the third drive unit 195 can be a conveyor belt driven motor unit connected to the moving shaft unit 180, or a direct-connection motor unit where the rotating shaft and the moving shaft unit 180 are connected.

[0061] The first drive unit 191, the second drive unit 193, and the third drive unit 195 can enable the first drive shaft 171, the second outer shaft 174, and the moving shaft 180 to rotate individually or to rotate a portion of them simultaneously.

[0062] For example, during the liquid supply process, the control is as follows: the first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 stops the second outer shaft 174, and the third drive unit 195 rotates the moving shaft 180. In this case, the first lower nozzle 161 of the upper nozzle 105 and the lower nozzle 160 sprays liquid onto both sides of the substrate W, and the substrate W rotates as the rotating chuck 110 rotates. Furthermore, with the nozzle operating table 120 stopped, as the moving shaft 180 rotates, the pinion 183 of the moving shaft 180 meshes with the rack 143a of the rack 143 and rotates, and the lower nozzle 160 moves along the guide 130. The first lower nozzle 161 of the lower nozzle 160 sprays liquid onto the lower surface of the substrate W, while the second lower nozzle 163 is not driven. Therefore, the liquid flows towards the edges of both sides of the substrate W through the centrifugal force of the substrate W and processes the substrate W.

[0063] During the cleaning process, the control is as follows: the first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 rotates the second outer shaft 174, and the third drive unit 195 stops the moving shaft 180. In this case, the upper nozzle 105 and the second lower nozzle 163 of the lower nozzle 160 spray cleaning fluid onto both sides of the substrate W. As the rotary chuck 110 rotates, the substrate W rotates. The rotary chuck 110 and the nozzle operating table 120 rotate simultaneously, while the moving shaft 180 remains stationary. The second lower nozzle 163 of the lower nozzle 160 sprays cleaning fluid onto the lower surface of the substrate W. Therefore, the cleaning fluid flows towards the edges of both sides of the substrate W due to the centrifugal force of the substrate W, cleaning the substrate W. In this case, the moving module 140, the guide arm 150, and the lower nozzle 160 remain stationary.

[0064] During the drying process, the control is as follows: the first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 rotates the second outer shaft 174, and the third drive unit 195 stops the moving shaft 180. In this case, the upper nozzle 105 and the second lower nozzle 163 of the lower nozzle 160 spray drying gas (inactive gas) onto both sides of the substrate W according to the type of substrate W. As the rotary chuck 110 rotates, the substrate W rotates. Furthermore, the rotary chuck 110 and the nozzle operating table 120 rotate simultaneously, while the moving shaft 180 remains stationary. The second lower nozzle 163 of the lower nozzle 160 sprays drying gas onto the lower surface of the substrate W. Therefore, the drying gas flows towards the edges of both sides of the substrate W and dries the substrate W due to the centrifugal force of the substrate W. Inactive gases such as nitrogen can be used as the drying gas. In this case, the moving module 140, the guide arm 150, and the lower nozzle 160 remain stationary.

[0065] During the drying process, the upper nozzle 105 and the second lower nozzle 163 may not spray drying gas. In this case, the cleaning liquid remaining on the substrate W flows towards the edge of the substrate W by the centrifugal force of the substrate W and dries the substrate W.

[0066] The substrate processing apparatus 100 also includes a cover member 210, which is provided to cover the upper side of the nozzle operating table portion 120 and has a moving channel portion 212 for the lower nozzle portion 160 to move. Because the moving channel portion 212 is formed on the cover member 210, the lower nozzle portion 160 can move along the guide portion 130 and spray liquid onto the lower surface of the substrate W.

[0067] The cover member 210 is formed in a disc shape to cover the upper side of the nozzle operating table portion 120. A moving channel portion 212 is formed along the guide portion 130 to allow the lower nozzle portion 160 to move. The moving channel portion 212 is disposed on the vertical upper part of the lower nozzle portion 160. The center portion of the cover member 210 may protrude slightly upwards. As the center portion of the cover member 210 protrudes upwards, any medicine or cleaning fluid that falls onto the cover member 210 can be easily discharged outwards. Of course, the cover member 210 may also be in the form of a flat plate.

[0068] The cover member 210 covers the upper side of the nozzle operating table portion 120, thus the liquid medicine sprayed onto the substrate W is blocked by the cover member 210 and hardly flows into the interior of the nozzle operating table portion 120. Furthermore, when the liquid medicine supply process is performed, the nozzle operating table portion 120 remains stationary, so any small amount of liquid medicine falling onto the cover member 210 will hardly flow into the cover member 210. Therefore, liquid medicine falling onto the cover member 210 can be prevented from flowing into the interior of the nozzle operating table portion 120 through the moving channel portion 212.

[0069] During the liquid supply process, the flow of liquid into the nozzle operating table 120 can be largely blocked. Therefore, liquid residue can be prevented from remaining in the moving module 140, fluid supply line 165, lower nozzle 160, and guide arm 150 located inside the nozzle operating table 120. Furthermore, by preventing liquid from flowing into the nozzle operating table 120 during the liquid supply process, the generation of fume can be prevented during the cleaning process, and the rebound of residual liquid can be prevented during the drying process. Moreover, the cleaning spray on the substrate W and the defect rate can be significantly reduced.

[0070] During the liquid supply process, even if a small amount of liquid seeps into the nozzle operating platform 120, during the cleaning process, as the nozzle operating platform 120 rotates, the residual liquid and cleaning fluid are discharged to the outside of the nozzle operating platform 120 along with it due to the centrifugal force of the nozzle operating platform 120. Furthermore, the upper side of the nozzle operating platform 120 is covered by the cover member 210, so even if a small amount of smoke occurs inside the nozzle operating platform 120, it is almost impossible for it to move upwards due to the cover member 210. Therefore, the smoke generated in the nozzle operating platform 120 is discharged to the outside of the nozzle operating platform 120 by the airflow generated when the nozzle operating platform 120 rotates, thus preventing the smoke from reaching the substrate W.

[0071] The operation of the substrate processing apparatus of an embodiment of the present invention as described above will be explained.

[0072] Figure 6 This is a cross-sectional view showing the working state of the substrate processing apparatus during the liquid supply process according to an embodiment of the present invention.

[0073] Reference Figure 6 The solutions used in the solution supply process include a lapping solution to smooth the surface of the substrate W, an etching solution to etch the substrate W, and a polishing solution to polish the surface of the substrate W.

[0074] If the liquid supply process begins, the upper nozzle 105 and the first lower nozzle 161 spray liquid onto both sides of the substrate W. The second lower nozzle 163 does not spray liquid.

[0075] The first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 rotates the second outer shaft 174, and the third drive unit 195 rotates the moving shaft 180. As the rotating chuck 110 rotates via the first drive shaft 171, the substrate W rotates. The nozzle operating table 120 remains stationary, while the moving shaft 180 rotates via the third drive unit 195. As the pinion 183 of the moving shaft 180 rotates by meshing with the rack 143a of the rack 143, the first lower nozzle 161 reciprocates along the guide 130. Therefore, the liquid medicine flows from both sides of the substrate W towards the edge side due to the centrifugal force of the substrate W, and performs surface treatment on the substrate W.

[0076] The cover member 210 covers the upper side of the nozzle operating table portion 120, excluding the moving channel portion 212. Therefore, the liquid medicine sprayed onto the substrate W is blocked by the cover member 210 and hardly flows into the interior of the nozzle operating table portion 120. In this case, the rotary chuck 110 rotates, so the liquid medicine sprayed from the first lower nozzle 161 is mostly discharged radially from the substrate W by the centrifugal force of the substrate W. Furthermore, the nozzle operating table portion 120 and the cover member 210 remain stationary, thus preventing the small amount of liquid medicine falling onto the cover member 210 from flowing into the cover member 210. The small amount of liquid medicine falling onto the cover member 210 is also prevented from flowing into the interior of the nozzle operating table portion 120 through the moving channel portion 212.

[0077] Therefore, when the liquid medicine supply process is performed, the liquid medicine can be largely blocked from flowing into the nozzle operating table 120. Thus, it is possible to prevent liquid medicine from remaining in the moving module 140, fluid supply line 165, lower nozzle 160 and guide arm 150 provided inside the nozzle operating table 120.

[0078] Figure 7 This is a cross-sectional view showing the operating state of a substrate processing apparatus according to an embodiment of the present invention during a cleaning process.

[0079] Reference Figure 7When the cleaning process begins, the upper nozzle 105 and the second lower nozzle 163 spray cleaning fluid onto both sides of the substrate W. The first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 rotates the second outer shaft 174, and the third drive unit 195 stops the moving shaft 180. In this situation, as the rotating chuck 110 rotates via the first drive shaft 171, the substrate W rotates; and as the second drive shaft 173 rotates, the nozzle operating table 120 rotates together with the rotating chuck 110. Since the upper nozzle 105 and the second lower nozzle 163 spray cleaning fluid onto both sides of the substrate W, the cleaning fluid flows from both sides of the substrate W towards the edge side due to the centrifugal force of the substrate W, thus cleaning the substrate W.

[0080] In this situation, most of the cleaning fluid on the lower surface of the substrate W is discharged towards the edge of the substrate W due to the centrifugal force of the substrate W. Therefore, a small amount of cleaning fluid may fall onto the cover member 210. The small amount of cleaning fluid that falls onto the cover member 210 is mostly discharged towards the edge of the cover member 210 due to the centrifugal force of the cover member 210, and a very small portion of the cleaning fluid that falls onto the cover member 210 flows into the interior of the nozzle operating table 120 through the moving channel 212. The very small amount of cleaning fluid that flows into the interior of the nozzle operating table 120, together with the residual medicine, is discharged outwards from the nozzle operating table 120 due to the centrifugal force of the nozzle operating table 120. Therefore, almost no medicine or cleaning fluid remains inside the nozzle operating table 120.

[0081] The upper side of the nozzle operating platform 120 is covered by the cover member 210. Therefore, even if a small amount of smoke is generated inside the nozzle operating platform 120, it cannot move upward due to the cover member 210. Thus, the smoke generated in the nozzle operating platform 120 can be discharged to the outside of the nozzle operating platform 120 by the centrifugal force of the nozzle operating platform 120, thereby preventing the smoke from reaching the substrate W.

[0082] Figure 8 This is a cross-sectional view showing the operating state of a substrate processing apparatus according to an embodiment of the present invention during a cleaning process.

[0083] Reference Figure 8When the drying process begins, the first drive unit 191 rotates the first drive shaft 171, the second drive unit 193 rotates the second outer shaft 174, and the third drive unit 195 stops the moving shaft 180. In this case, the upper nozzle 105 and the second lower nozzle 163 spray drying gas onto both sides of the substrate W according to the type of substrate W. As the rotary chuck 110 rotates, the substrate W rotates. Furthermore, the rotary chuck 110 and the internal operating table rotate simultaneously, while the moving shaft 180 remains stationary. Drying gas is sprayed onto the lower surface of the substrate W by the second lower nozzle 163 of the lower nozzle 160. Therefore, the drying gas flows towards the edges of both sides of the substrate W and dries the substrate W due to the centrifugal force of the substrate W. Inert gases such as nitrogen can be used as the drying gas.

[0084] During the drying process, the upper nozzle 105 and the second lower nozzle 163 may not spray drying gas. In this case, the cleaning liquid remaining on the substrate W flows towards the edge of the substrate W by centrifugal force and dries the substrate W.

[0085] As described above, during the liquid medicine supply process, a small amount of liquid medicine on the lower surface of the substrate W falls onto the cover member 210. The cover member 210 and the nozzle operating table 120 remain stationary. Therefore, a very small portion of the small amount of liquid medicine falling onto the cover member 210 flows into the interior of the nozzle operating table 120 through the moving channel 212 of the cover member 210. This prevents the moving module 140, fluid supply line 165, lower nozzle 160, and guide arm 150 provided on the nozzle operating table 120 from being contaminated by the liquid medicine.

[0086] A very small portion of the small amount of liquid medicine that falls onto the cover component 210 flows into the interior of the nozzle operating table 120 through the moving channel portion 212 of the cover component 210. Therefore, it is possible to prevent the moving module 140, fluid supply line portion 165, lower nozzle portion 160 and guide arm portion 150 provided on the nozzle operating table 120 from being contaminated by the liquid medicine.

[0087] In the liquid supply process, the amount of liquid flowing into the nozzle operating platform 120 is significantly reduced. Therefore, the amount of smoke generated in the nozzle operating platform 120 during the cleaning process can be significantly reduced. Furthermore, the cover member 210 blocks the upper side of the nozzle operating platform 120, so the small amount of smoke generated in the nozzle operating platform 120 cannot reach the lower surface of the substrate W. Moreover, during the cleaning process, the nozzle operating platform 120 and the cover member 210 rotate, so the smoke generated inside the nozzle operating platform 120 is discharged to the outside of the nozzle operating platform 120 by the centrifugal force of the nozzle operating platform 120. Therefore, even if smoke is generated during the cleaning process, it has almost no impact on the lower surface of the substrate W, thus significantly reducing the cleaning spray and defect rate of the substrate W.

[0088] Although the invention has been described with reference to the embodiments shown in the accompanying drawings, these are merely illustrative, and those skilled in the art will understand that various modifications and equivalent embodiments may be implemented.

Claims

1. A substrate processing apparatus, characterized in that, include: A rotating chuck is rotatably mounted inside a cup-shaped housing and serves as a substrate mount. The nozzle operating table is rotatably disposed inside the rotary chuck. The guide section is located inside the nozzle operating table section; A movable module is disposed on the guide section in a movable manner; The guide arm is connected to the moving module and supports the fluid supply pipeline. The lower nozzle portion is coupled to the guide arm portion in a manner that moves together with the moving module, and the lower nozzle portion is connected to the fluid supply line portion; The drive shaft is connected to the rotary chuck and the nozzle operating table to make the rotary chuck and the nozzle operating table rotate; A movable shaft is rotatably disposed inside the drive shaft, and the movable shaft is connected to the movable module to enable the movable module to move; as well as A drive unit is connected to the drive shaft and the movable shaft to drive the drive shaft and the movable shaft. The guide section includes a guide rail section arranged to traverse the interior of the nozzle operating table section.

2. The substrate processing apparatus according to claim 1, characterized in that, The mobile module includes: The sliding part is movably engaged with the guide rail part; and A rack is connected to the sliding part and the guide arm part, and the rack is configured to mesh with the moving shaft part.

3. The substrate processing apparatus according to claim 2, characterized in that, The movable shaft includes: A movable shaft main body is rotatably disposed at the center of the drive shaft portion and connected to the drive portion; and The pinion is connected to the moving shaft body in a manner that meshes with the rack.

4. The substrate processing apparatus according to claim 2, characterized in that, The lower nozzle portion includes: A first lower nozzle is disposed on the guide arm portion in a manner that allows it to move together with the rack, and is connected to the fluid supply line portion; and The second lower nozzle is disposed on the guide arm in a manner that moves together with the rack and is connected to the fluid supply line.

5. The substrate processing apparatus according to claim 1, characterized in that, The drive shaft includes: A first drive shaft is connected to the rotary chuck and the drive unit; and The second drive shaft is rotatably disposed between the first drive shaft and the moving shaft, and is connected to the nozzle operating table and the drive unit.

6. The substrate processing apparatus according to claim 5, characterized in that, The second drive shaft includes: A second outer shaft is disposed concentrically with the first drive shaft inside the first drive shaft; and The second inner shaft is arranged concentrically with the second outer shaft inside the second outer shaft, and has a fluid flow pipeline connected to the fluid supply pipeline.

7. The substrate processing apparatus according to claim 6, characterized in that, The drive unit includes: A first drive unit is connected to the first drive shaft to rotate the first drive shaft; A second drive unit is connected to the second outer shaft to rotate the second outer shaft; and The third drive unit is connected to the moving shaft unit to cause the moving shaft unit to rotate.

8. The substrate processing apparatus according to claim 7, characterized in that, When the liquid medicine supply process is performed, the control is as follows: the first drive unit causes the first drive shaft to rotate, the second drive unit causes the second outer shaft to stop, and the third drive unit causes the moving shaft to rotate.

9. The substrate processing apparatus according to claim 7, characterized in that, During the cleaning process, the control is as follows: the first drive unit rotates the first drive shaft, the second drive unit rotates the second outer shaft, and the third drive unit stops the moving shaft.

10. The substrate processing apparatus according to claim 7, characterized in that, During the drying process, the control is as follows: the first drive unit rotates the first drive shaft, the second drive unit rotates the second outer shaft, and the third drive unit stops the moving shaft.

11. The substrate processing apparatus according to claim 1, characterized in that, It also includes a cover component, which is provided to cover the upper side of the nozzle operating table portion, and the cover component forms a moving channel portion for the lower nozzle portion to move.

12. The substrate processing apparatus according to claim 11, characterized in that, The cover component is formed in a disc shape to cover the upper side of the nozzle operating table.

13. The substrate processing apparatus according to claim 11, characterized in that, The moving channel is formed along the guide portion to allow the lower nozzle portion to move.

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