A simulation control method, device and system

Abstract

The present application discloses a simulation control method, device and system. The simulation control method includes: establishing a reference time series and a wafer production list; the reference time series includes multiple time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of multiple batches of production that are arranged in sequence; every second preset time threshold, a time element is obtained from the reference time series in chronological order, and the instantaneous simulation time is determined based on the time element obtained from the reference time series; for any determined instantaneous simulation time, the following steps are performed before the next redetermination: the instantaneous simulation time is compared with each declaration time in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the batch of production that corresponds to the declaration time is controlled. The method can realize the control of semiconductor production simulation.

Description

Technical Field

[0001] The present application relates to the technical field of integrated circuit manufacturing, and in particular to a simulation control method, device and system. Background Art

[0002] The semiconductor manufacturing industry is a high-tech industry with high investment. In order to achieve its operational goals and improve productivity, semiconductor manufacturing plants have increasingly automated their production control activities. Among them, automated control of work dispatch is particularly important in the semiconductor manufacturing process.

[0003] Most advanced wafer fabs use a real-time dispatch system (RTD) to dispatch work on the production line. RTD can use built-in algorithms to make reasonable dispatch results for the batches (Lots) on the line. The manufacturing department (MA) only needs to produce according to the Lot sequence recommended by RTD, thereby improving the overall production efficiency within the Fab.

[0004] Fabs usually need to formulate wafer production plans so that the real-time dispatching system can dispatch work continuously and efficiently. If the wafer production plan is directly applied to the production line, unpredictable risks may occur, affecting the overall production efficiency. Therefore, it is necessary to perform semiconductor production simulation before actual production.

[0005] Therefore, how to provide a method to control semiconductor production simulation has important practical significance for the semiconductor manufacturing industry. Summary of the invention

[0006] The embodiments of the present application provide a simulation control method, device and system for controlling semiconductor production simulation.

[0007] In a first aspect, the present application provides a simulation control method, comprising:

[0008] Establish a reference time series and a wafer production list; the reference time series includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches that have been put into production and arranged in sequence; the production information includes a batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch that has been put into production determined by simulated dispatching;

[0009] At each interval of a second preset time threshold, one of the time elements is obtained from the reference time sequence in chronological order, and the instantaneous simulation time is determined based on the time element obtained from the reference time sequence; the second preset time threshold is less than the first preset time threshold;

[0010] For any determined real-time simulation time, the following steps are performed before the next redetermination: the real-time simulation time is compared one by one with each declared time in the wafer production list, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each declared time in the wafer production list one by one.

[0011] In an optional embodiment, the production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch that has been put into production has entered a production step and has not yet started to be put on the machine; the in-production state indicates that the corresponding batch that has been put into production has started to be put on the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

[0012] In an optional implementation, determining the instantaneous simulation time based on the time element obtained from the reference time series includes:

[0013] The time element obtained from the reference time series is assigned to the instantaneous simulation time.

[0014] In an optional implementation, comparing the instantaneous simulation time with each of the declared times in the wafer production list one by one, and controlling the cyclic switching of the production status of the production batch corresponding to the declared time according to the comparison result, includes:

[0015] Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment:

[0016] The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0017] In an optional implementation, the establishing of a reference time series includes:

[0018] In response to the simulation system being started, obtaining simulation parameters set by a user; the simulation parameters include simulation time length and simulation date parameters;

[0019] Determining the number of simulation scans based on the simulation time length and the second preset time length threshold;

[0020] According to the simulation time length and the simulation scan times, a plurality of first time elements arranged in sequence are obtained;

[0021] According to the simulation date parameter, the plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and the reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

[0022] In an optional implementation, the simulation parameters further include a scan duration adjustment coefficient; and determining the number of simulation scans based on the simulation time length and the second preset duration threshold includes:

[0023] Determining a corrected scanning duration according to the second preset duration threshold and the scanning duration adjustment coefficient;

[0024] The simulation scan times are determined according to the corrected scan time and the simulation time.

[0025] In an optional implementation, before obtaining one of the time elements from the reference time series in chronological order at each interval of the second preset time length threshold, and determining the instantaneous simulation time based on the time element obtained from the reference time series, the method further includes:

[0026] Dividing the wafer production list into groups to obtain a secondary wafer production list having a quantity equal to a first threshold;

[0027] Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of the child processes is the first threshold; each of the child processes corresponds to one of the wafer production secondary lists;

[0028] The method of obtaining a time element from the reference time series in chronological order at each interval of the second preset time length threshold, and determining the instantaneous simulation time based on the time element obtained from the reference time series, includes:

[0029] At intervals of a second preset time threshold, obtaining a time element from the reference time series in chronological order by the parent process, and determining the instantaneous simulation time based on the time element obtained from the reference time series;

[0030] For any determined instantaneous simulation time, the following steps are performed before the next redetermination: for each instantaneous simulation time, the instantaneous simulation time is compared with each of the declared times in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled, including:

[0031] For any determined instant simulation time, before the next redetermination, the parent process sends an action instruction to each of the child processes;

[0032] In response to the action instruction, each of the sub-processes compares the declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0033] The embodiments of the present application have at least the following advantages:

[0034] The above-mentioned simulation control method is adopted to establish a reference time series and a wafer production list, and obtain a time element from the reference time series in chronological order every second preset time threshold, and determine the instant simulation time based on the time element obtained from the reference time series. For any determined instant simulation time, the following steps are performed before the next redetermination: the instant simulation time is compared with each of the declaration times in the wafer production list one by one, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declaration time is controlled, so that the simulation time can be accurately controlled in the semiconductor production simulation, the simulation time can be accelerated, and the control of the semiconductor production simulation can be realized.

[0035] In a second aspect, the present application provides a simulation control device, comprising:

[0036] A simulation parameter construction unit, the simulation parameter construction unit is used to establish a reference time series and a wafer production list; the reference time series includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches of wafers that have been put into production and arranged in sequence; the production information includes a batch identification, a production status and a declaration time; the declaration time represents the end time point of the production status of the batch of wafers that have been put into production determined by simulating dispatching;

[0037] A simulation time control unit, the simulation time control unit is used to obtain one of the time elements from the reference time series in chronological order at intervals of a second preset time threshold, and determine the instantaneous simulation time based on the time element obtained from the reference time series; the second preset time threshold is less than the first preset time threshold;

[0038] A simulation operation control unit, wherein the simulation operation control unit is used to perform the following steps for any determined real-time simulation time before the next redetermination: comparing the real-time simulation time with each of the declared times in the wafer production list one by one, and according to the result of the comparison, controlling the cyclic switching of the production status of the production batch corresponding to the declared time; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each of the declared times in the wafer production list one by one.

[0039] In an optional embodiment, the production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch that has been put into production has entered a production step and has not yet started to be put on the machine; the in-production state indicates that the corresponding batch that has been put into production has started to be put on the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

[0040] In an optional implementation, the simulation time control unit is specifically used to:

[0041] The time element obtained from the reference time series is assigned to the instantaneous simulation time.

[0042] In an optional implementation manner, the simulation operation control unit is specifically used to:

[0043] Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment:

[0044] The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0045] In an optional implementation manner, the simulation parameter construction unit is specifically used to:

[0046] In response to the simulation system being started, obtaining simulation parameters set by a user; the simulation parameters include simulation time length and simulation date parameters;

[0047] Determining the number of simulation scans based on the simulation time length and the second preset time length threshold;

[0048] According to the simulation time length and the simulation scan times, a plurality of first time elements arranged in sequence are obtained;

[0049] According to the simulation date parameter, the plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and the reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

[0050] In an optional implementation manner, the simulation parameter further includes a scanning duration adjustment coefficient; and the simulation parameter construction unit is specifically used to:

[0051] Determining a corrected scanning duration according to the second preset duration threshold and the scanning duration adjustment coefficient;

[0052] The simulation scan times are determined according to the corrected scan time and the simulation time.

[0053] In an optional implementation manner, the simulation parameter construction unit is further used to:

[0054] At each interval of the second preset time threshold, one of the time elements is obtained from the reference time sequence in chronological order, and before determining the instantaneous simulation time based on the time element obtained from the reference time sequence, the wafer production list is divided into groups to obtain a wafer production secondary list with a quantity equal to a first threshold;

[0055] Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of the child processes is the first threshold; each of the child processes corresponds to one of the wafer production secondary lists;

[0056] The simulation time control unit is specifically used for:

[0057] At intervals of a second preset time threshold, obtaining a time element from the reference time series in chronological order by the parent process, and determining the instantaneous simulation time based on the time element obtained from the reference time series;

[0058] The simulation operation control unit is specifically used for:

[0059] For any determined instant simulation time, before the next redetermination, the parent process sends an action instruction to each of the child processes;

[0060] In response to the action instruction, each of the sub-processes compares the declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0061] In a third aspect, the present application provides a simulation control system, comprising:

[0062] A memory, the memory being used to store data or program codes used when the simulation control system is running;

[0063] A processor, the processor is used to: establish a reference time sequence and a wafer production list; the reference time sequence includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches that have been put into production arranged in sequence; the production information includes a batch identification, a production status and a declaration time; the declaration time represents the end time point of the production status of the batch that has been put into production determined by simulated dispatching;

[0064] At each interval of a second preset time threshold, one of the time elements is obtained from the reference time sequence in chronological order, and the instantaneous simulation time is determined based on the time element obtained from the reference time sequence; the second preset time threshold is less than the first preset time threshold;

[0065] For any determined real-time simulation time, the following steps are performed before the next redetermination: the real-time simulation time is compared one by one with each declared time in the wafer production list, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each declared time in the wafer production list one by one.

[0066] In an optional implementation manner, the processor is specifically configured to:

[0067] Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment:

[0068] The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0069] The technical effects brought about by any one of the implementation methods of the second aspect to the third aspect can refer to the technical effects brought about by the implementation method of the first aspect, and will not be repeated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0070] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0071] Figure 1 A flowchart of a simulation control method provided in an embodiment of the present application;

[0072] Figure 2 A schematic diagram of a flow chart of establishing a reference time series for a simulation control method provided in an embodiment of the present application;

[0073] Figure 3 A schematic diagram of a distributed operation structure provided in an embodiment of the present application;

[0074] Figure 4 A schematic diagram of the structure of a simulation control device provided in an embodiment of the present application;

[0075] Figure 5 A schematic diagram of the structure of a simulation control system provided in an embodiment of the present application. DETAILED DESCRIPTION

[0076] In order to make the purpose, technical solutions and advantages of this application clearer, this application will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of this application, not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0077] In the embodiments of the present application, the word “exemplary” is used to mean “used as an example, embodiment or illustration.” Any embodiment described as “exemplary” is not necessarily to be construed as being superior or better than other embodiments.

[0078] The terms "first" and "second" in this document are used for descriptive purposes only and should not be understood as explicitly or implicitly indicating relative importance or implicitly indicating the number of technical features indicated. Therefore, features defined as "first" and "second" may explicitly or implicitly include one or more of the features, and in the description of the embodiments of this application, unless otherwise specified, "plurality" means two or more.

[0079] Some of the terms used in the embodiments of the present application are explained below to facilitate understanding by those skilled in the art.

[0080] (1) Wafer: Wafer is made of pure silicon (Si). It is generally divided into 6-inch, 8-inch, and 12-inch specifications. Chips are produced based on this wafer. Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its round shape, it is called a wafer; various circuit component structures can be processed on the silicon wafer to become an integrated circuit product with specific electrical functions.

[0081] (2) Work in Process (WIP): Work in Process refers to products that are being processed but not yet completed in chip processing companies.

[0082] The semiconductor manufacturing industry is a high-tech industry with high investment. In order to achieve its operational goals and improve productivity, semiconductor manufacturing plants have increasingly automated their production control activities. Among them, automated control of work dispatch is particularly important in the semiconductor manufacturing process.

[0083] Most advanced wafer fabs use a real-time dispatch system (RTD) to dispatch work on the production line. RTD can use built-in algorithms to make reasonable dispatch results for the batches (Lots) on the line. The manufacturing department (MA) only needs to produce according to the Lot sequence recommended by RTD, thereby improving the overall production efficiency within the Fab.

[0084] Fabs usually need to formulate wafer production plans so that the real-time dispatching system can dispatch work continuously and efficiently. If the wafer production plan is directly applied to the production line, unpredictable risks may occur, affecting the overall production efficiency. Therefore, it is necessary to perform semiconductor production simulation before actual production.

[0085] Therefore, how to provide a method to control semiconductor production simulation has important practical significance for the semiconductor manufacturing industry.

[0086] The present application provides a simulation control method, device and system for realizing control of semiconductor production simulation. The simulation control method includes: establishing a reference time series and a wafer production list; the reference time series includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches of production that are arranged in sequence; the production information includes batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch of production that is determined by simulating dispatching; at each interval of a second preset time threshold, a time element is obtained from the reference time series in chronological order, and the instantaneous simulation time is determined based on the time element obtained from the reference time series; the second preset time threshold is less than the first preset time threshold; for any determined instantaneous simulation time, the following steps are performed before the next redetermination: the instantaneous simulation time is compared one by one with each announcement time in the wafer production list, and according to the comparison result, the cyclic switching of the production status of the batch of production that corresponds to the announcement time is controlled; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the instantaneous simulation time with each announcement time in the wafer production list one by one. The method establishes a reference time series and a wafer production list, obtains a time element from the reference time series in chronological order at intervals of a second preset time threshold, and determines the instantaneous simulation time based on the time element obtained from the reference time series. For any determined instantaneous simulation time, the following steps are performed before the next redetermination: the instantaneous simulation time is compared with each declared time in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the production batches corresponding to the declared time is controlled. The simulation time can be accurately controlled in semiconductor production simulation, the simulation time can be accelerated, and the control of semiconductor production simulation can be achieved.

[0087] In order to further illustrate the technical solution provided by the embodiment of the present application, the simulation control method provided by the embodiment of the present application is further described below.

[0088] Figure 1 FIG. 1 is a flow chart of a simulation control method provided by an embodiment of the present application. Figure 1 As shown, the simulation control method may include the following steps:

[0089] Step S101, establishing a reference time series and a wafer production list.

[0090] Among them, the benchmark time series includes multiple time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of multiple batches of production arranged in sequence; the production information includes batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch of production determined by simulated dispatching.

[0091] It can be understood that when performing simulation control of semiconductor production simulation, a reference time sequence is first established, wherein the reference time sequence can be a single-column time sequence, and the data in the time sequence are multiple time elements arranged in sequence, wherein the time difference between two adjacent rows is a first preset time threshold. In some embodiments, the reference time sequence can be established by a Timer controller. The format of the reference event sequence can be as shown in Table 1.

[0092] Table 1

[0093] Timer 1:01 1:02 1:03 … 2:00

[0094] Exemplarily, as shown in Table 1, the first preset time length threshold of the time difference between two adjacent rows may be 1 minute.

[0095] When performing simulation control of semiconductor production simulation, it is also necessary to establish a wafer production list. The wafer production list includes production information of multiple batches that have been put into production arranged in sequence. Among them, the production information includes batch identification, production status and claim time. In an embodiment of the present application, the claim time represents the end time point of the production status of the batch that has been put into production determined by the simulation dispatch. The format of the wafer production list can be as shown in Table 2.

[0096] Table 2

[0097]

[0098]

[0099] The wafer production list shown in Table 2 includes production information of multiple batches that have been put into production in sequence, wherein the production information includes but is not limited to the following information items: batch identification LotID, production status Status and claim time. In some embodiments, the production information of the wafer production list also includes the machine location Loca, and the recipe process number Recipe. Among them, the recipe process number Recipe can be used to determine the recipe time Process Time. For example, through Table 3, according to the recipe process number RecipeA, it can be determined that the value of the recipe time Process Time of the recipe process is 1 hour.

[0100] Table 3

[0101] Recipe Process Time RecipeA 1 hour Recipe B 2 hours … …

[0102] As shown in Table 2, the production information (Lot1, Run, 1:00, EqpIDx, RecipeA) of the production batch Lot1 included in the wafer production list indicates that the current production status of the production batch Lot1 is Run, the end time point corresponding to the current production status Run of the production batch Lot1 is 1:00, the current position is EqpIDx, and the corresponding recipe process number is RecipeA.

[0103] Step S102 : obtaining a time element from the reference time series in chronological order at intervals of a second preset time threshold, and determining the instant simulation time based on the time element obtained from the reference time series.

[0104] The second preset duration threshold is smaller than the first preset duration threshold.

[0105] In specific implementation, the system uses the second preset duration threshold as the execution cycle, reads a time element in the reference time sequence line by line, and determines the instantaneous simulation time according to the read time element. The instantaneous simulation time represents the current time of the simulation. For example, the instantaneous simulation time "1:01" represents that the current time of the simulation is 1:01.

[0106] In a possible implementation, the instantaneous simulation time is determined based on the time element obtained from the reference time series, specifically by assigning the time element obtained from the reference time series to the instantaneous simulation time.

[0107] For example, assuming that the second preset duration threshold is 100ms, which is less than the first preset duration threshold of 1min, the system can obtain a time element from the reference time series shown in Table 1 every 100ms. For example, the system obtains the time element "1:01" when it first obtains the time element, and assigns the time element "1:01" obtained from the reference time series to the instantaneous simulation time, thereby determining that the instantaneous simulation time is "1:01".

[0108] Step S103, for any determined instantaneous simulation time, perform the following steps before the next redetermination: compare the instantaneous simulation time with each declared time in the wafer production list one by one, and according to the comparison result, control the cyclic switching of the production status of the production batch corresponding to the declared time.

[0109] The first preset time threshold is greater than the time required to complete any process of comparing the instant simulation time with each declared time in the wafer production list one by one.

[0110] Exemplarily, the system can obtain a time element from the reference time sequence shown in Table 1 every 100ms, and determine the instantaneous simulation time according to the obtained time element. For example, the instantaneous simulation time can be determined as "1:01" when the time element is obtained for the first time. For the instantaneous simulation time "1:01", before the instantaneous simulation time is re-determined next time, the instantaneous simulation time "1:01" is compared with each declaration time in the wafer production list shown in Table 2 one by one, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declaration time is controlled. For example, for the production batch Lot1 shown in Table 2, the instantaneous simulation time "1:01" can be compared with the declaration time "1:00" of the production batch Lot1, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declaration time is controlled.

[0111] In a possible implementation, the instantaneous simulation time is compared with each declared time in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the production batches corresponding to the declared time is controlled, which is achieved by the following process:

[0112] Obtain the announcement time of each batch that has been put into production in the wafer production list one by one, and assign the announcement time obtained one by one to the pending announcement time in sequence; for any pending announcement time that has been assigned, perform the following steps before the next assignment:

[0113] The immediate simulation time is compared with the pending declaration time. If it is determined that the immediate simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0114] Exemplarily, the instantaneous simulation time "1:01" is compared one by one with each declaration time in the wafer production list shown in Table 2. According to the comparison result, the cyclic switching of the production status of the production batch corresponding to the declaration time is controlled. This can be achieved through the following process: the declaration time of each production batch in the wafer production list shown in Table 2 is obtained one by one, and the obtained declaration time is assigned to the pending declaration time DealTime in sequence; for any assigned pending declaration time DealTime, the following steps are performed before the next assignment of the pending declaration time DealTime: the instantaneous simulation time "1:01" is compared with the pending declaration time DealTime. If it is judged that the instantaneous simulation time "1:01" is not less than the pending declaration time DealTime, the production status of the production batch corresponding to the pending declaration time DealTime is cyclically switched. For example, for the production batch Lot1 shown in Table 2, the declaration time "1:00" of the production batch Lot1 is obtained, and the pending declaration time DealTime is assigned a value so that the pending declaration time DealTime is "1:00", and the instant simulation time "1:01" is compared with the pending declaration time DealTime "1:00", so as to judge that the instant simulation time "1:01" is not less than the pending declaration time DealTime "1:00", and the production status "Run" of the production batch Lot1 corresponding to the pending declaration time DealTime "1:00" is cyclically switched.

[0115] In one possible implementation, the production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch in production has entered a production step and has not yet started to be loaded onto the machine; the in-production state indicates that the corresponding batch in production has started to be loaded onto the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

[0116] Exemplarily, the production status includes the idle state Idle and the running state Run. The idle state Idle can indicate that the corresponding production batch has entered a production step and has not started to be put on the machine; the running state Run indicates that the corresponding production batch has started to be put on the machine and has not finished unloading; the cycle switching includes switching from the idle state Idle to the running state Run within the same production step, and switching from the running state Run of the previous production step to the idle state Idle of the next production step between two adjacent production steps.

[0117] The above-mentioned simulation control method is adopted to establish a reference time series and a wafer production list, obtain a time element from the reference time series in chronological order every second preset time threshold, and determine the instant simulation time based on the time element obtained from the reference time series. For any determined instant simulation time, perform the following steps before the next redetermination: compare the instant simulation time with each declared time in the wafer production list one by one, and according to the comparison result, control the cyclic switching of the production status of the production batch corresponding to the declared time, so as to accurately control the simulation time in the semiconductor production simulation, accelerate the simulation time, and realize the control of the semiconductor production simulation.

[0118] In one possible implementation, a reference time series is established, such as Figure 2 As shown, this is achieved through the following steps:

[0119] Step S201, in response to the simulation system starting up, obtaining simulation parameters set by the user.

[0120] The simulation parameters include simulation time length and simulation date parameters.

[0121] Exemplarily, assuming that the simulation system is started, the simulation parameters set by the user are obtained, and the simulation parameters include the simulation time length A and the simulation date parameter D. For example, the simulation time length A can be 1 hour, and the simulation date parameter D can be the current date of the system or a set future date. The simulation date parameter D represents the time difference between the real time of system startup and the first time element of the reference time series when the two are compared.

[0122] Step S202, determining the number of simulation scans based on the simulation time length and a second preset time length threshold.

[0123] Exemplarily, assuming that the second preset time threshold is 1 minute, the number of simulation scans is 60 times.

[0124] If the second preset time threshold is recorded as B, and the number of simulation scans is recorded as C, then the number of simulation scans C is determined by the following formula:

[0125]

[0126] It can be seen from the above formula that, since the simulation time length A is 1 hour and the second preset time threshold B is 1 minute, it can be determined that the number of simulation scans C is 60 times.

[0127] Step S203, obtaining a plurality of first time elements arranged in sequence according to the simulation time length and the number of simulation scans.

[0128] Exemplarily, based on the simulation time length of 1 hour and the number of simulation scans of 60, multiple first time elements arranged in sequence are obtained, for example, multiple first time elements as shown in Table 1 are obtained, and the multiple first time elements are a 60-row scan time generated by the system. It is assumed that the date of the first first time element in the multiple first time elements is the current date of the system, for example, November 1, 2020.

[0129] Step S204, according to the simulation date parameter, respectively perform time parallel shift on the plurality of first time elements arranged in sequence to obtain a plurality of second time elements arranged in sequence, and determine the reference time series based on the obtained plurality of second time elements arranged in sequence.

[0130] In a specific implementation, all first time elements are moved in parallel according to the simulation date parameter, so that the first one of the plurality of second time elements arranged in sequence is equal to the required simulation start time.

[0131] Exemplarily, it is assumed that the date of the first first time element among the multiple first time elements in Table 1 is the current date of the system, for example, November 1, 2020. The simulation date parameter is assumed to be 3 days, then the multiple first time elements arranged in sequence in Table 1 are respectively shifted in time in parallel, and the multiple second time elements arranged in sequence obtained may be, for example, "2020 / 11 / 4, 1:01, 2020 / 11 / 4, 1:02, 2020 / 11 / 4, 1:03, ..., 2020 / 11 / 4, 2:00", and based on the obtained "2020 / 11 / 4, 1:01, 2020 / 11 / 4, 1:02, 2020 / 11 / 4, 1:03, ..., 2020 / 11 / 4, 2:00", the reference time sequence is determined, for example, the reference time sequence shown in Table 4 is obtained.

[0132] Table 4

[0133] Timer 2021 / 11 / 4,1:01 2021 / 11 / 4,1:02 2021 / 11 / 4,1:03 … 2021 / 11 / 4,2:00

[0134] During the use of the simulation system, the simulation system ends when the benchmark time series shown in Table 4 is scanned. The simulation time length is equal to the planned time length (2021 / 11 / 4, 1:01-2:00).

[0135] By adopting the simulation control method, the simulation time length can be controlled in semiconductor production simulation, thereby achieving precise control of semiconductor production simulation.

[0136] In order to control the time accuracy of the simulation, the simulation parameters may also include a scan time adjustment coefficient, wherein the scan time adjustment coefficient is used to adjust the scan time of the simulation system, thereby controlling the scan density.

[0137] Since the simulation system is a fixed-frequency inquiry, there will inevitably be errors in the process of inquiring whether the planned time of the event has been reached. Specifically, the inquiry will eventually reach the planned time, but due to the existence of the scanning interval, there will be a time delay in the judgment. In some embodiments of the present application, the accuracy can be improved by controlling the density of the scan.

[0138] In a possible implementation, the simulation parameters further include a scan duration adjustment coefficient. Based on the simulation time length and the second preset duration threshold, the number of simulation scans is determined, which can be implemented by the following process:

[0139] Step A1, determining a corrected scanning duration according to a second preset duration threshold and a scanning duration adjustment coefficient.

[0140] Exemplarily, assuming that the scan duration adjustment coefficient λ is 1 / 10 and the second preset duration threshold B is 100 ms, the modified scan duration E is determined by the following formula according to the second preset duration threshold 100 ms and the scan duration adjustment coefficient 1 / 10:

[0141] E=B×λ

[0142] Therefore, the corrected scanning time E is 10 ms.

[0143] Step A2, determining the number of simulation scans according to the corrected scan time and the simulation time.

[0144] For example, assuming that the corrected scan time E is 10 ms and the simulation time A is 1 hour, the simulation scan times C′ are determined by the following formula according to the corrected scan time E value of 10 ms and the simulation time A value of 1 hour:

[0145]

[0146] Therefore, the simulation scan number C′ is 360,000 times.

[0147] In order to reduce the simulation operation time when the simulation system is running, in some embodiments of the present application, the following is adopted: Figure 3 The distributed operation structure shown creates a parent process and a child process, combines the parent clock of the parent process with the child clock of the child process, and divides the total task of "scanning the wafer production list" into multiple subtasks, each of which is "scanning a subtable of the wafer production list", so that multiple subprocesses can run subtasks at the same time, thereby reducing the operation time of the simulation process. In the embodiment of the present application, the subtable of the wafer production list can also be called the wafer production secondary list.

[0148] In a possible implementation, before obtaining a time element from the reference time series in chronological order at each interval of the second preset time length threshold, and determining the instantaneous simulation time based on the time element obtained from the reference time series, the method further includes:

[0149] Divide the wafer production list into groups to obtain a secondary wafer production list with a quantity equal to a first threshold;

[0150] Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of child processes is a first threshold; each child process corresponds to a wafer production secondary list;

[0151] At each interval of the second preset time threshold, a time element is obtained from the reference time series in chronological order, and the instant simulation time is determined based on the time element obtained from the reference time series, including:

[0152] At every interval of the second preset time threshold, a time element is obtained from the reference time series in chronological order by the parent process, and the instant simulation time is determined based on the time element obtained from the reference time series;

[0153] For any determined instantaneous simulation time, the following steps are performed before the next redetermination: for each instantaneous simulation time, the instantaneous simulation time is compared with each declared time in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled, which is specifically achieved by the following steps:

[0154] For any determined instant simulation time, before the next redetermination, the parent process sends action instructions to each child process;

[0155] In response to the action instruction, each sub-process compares each declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0156] For example, when the simulation system is started, a parent process and multiple child processes are created, and the wafer production list is divided according to the number of child processes to obtain multiple wafer production sub-lists. For example, the multiple wafer production sub-lists can be as follows: Figure 3As shown in (Area1, Area2, ..., AreaN), the wafer production secondary list (Area1, Area2, ..., AreaN) corresponds to the child process one by one; obtain the simulation time length A to be simulated; generate the parent clock Timer-Father corresponding to the parent process according to the simulation time length A and the number of simulation scans; make the child clocks Timer-Son1~Timer-SonN corresponding to the multiple child processes copy the parent clock Timer-Father, so as to keep the clocks of each child process consistent with the parent process. Every second preset time threshold, a time element is obtained from the reference time sequence in chronological order through the parent process, and the instant simulation time is determined based on the time element obtained from the reference time sequence; for any determined instant simulation time, before the next redetermination, an action instruction is issued to each child process through the parent process; in response to the action instruction, each child process compares each declaration time in its corresponding wafer production secondary list with the instant simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0157] The above simulation control method can reduce simulation operation time in semiconductor production simulation, improve simulation system performance, and achieve optimized control of semiconductor production simulation.

[0158] and Figure 1 The simulation control method shown is based on the same inventive concept, and a simulation control device is also provided in the embodiment of the present application. Since the device is the device corresponding to the simulation control method of the present application, and the principle of solving the problem by the device is similar to that of the method, the implementation of the device can refer to the implementation of the above method, and the repeated parts will not be repeated.

[0159] Figure 4 A schematic diagram of the structure of a simulation control device provided in an embodiment of the present application is shown. Figure 4 As shown, the simulation control device includes a simulation parameter construction unit 401, a simulation time control unit 402 and a simulation operation management and control unit 403.

[0160] Among them, the simulation parameter construction unit 401 is used to establish a reference time series and a wafer production list; the reference time series includes multiple time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of multiple batches that have been put into production arranged in sequence; the production information includes batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch that has been put into production determined by simulation dispatching;

[0161] The simulation time control unit 402 is used to obtain a time element from the reference time series in chronological order at intervals of a second preset time threshold, and determine the instantaneous simulation time based on the time element obtained from the reference time series; the second preset time threshold is less than the first preset time threshold;

[0162] The simulation operation control unit 403 is used to perform the following steps for any determined real-time simulation time before the next redetermination: compare the real-time simulation time with each declared time in the wafer production list one by one, and according to the comparison result, control the cyclic switching of the production status of the production batch corresponding to the declared time; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each declared time in the wafer production list one by one.

[0163] In an optional embodiment, the production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch in production has entered a production step and has not yet started to be put on the machine; the in-production state indicates that the corresponding batch in production has started to be put on the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

[0164] In an optional implementation, the simulation time control unit 402 is specifically configured to:

[0165] Assign the time element obtained from the base time series to the instantaneous simulation time.

[0166] In an optional implementation manner, the simulation operation control unit 403 is specifically configured to:

[0167] Obtain the announcement time of each batch that has been put into production in the wafer production list one by one, and assign the announcement time obtained one by one to the pending announcement time in sequence; for any pending announcement time that has been assigned, perform the following steps before the next assignment:

[0168] The immediate simulation time is compared with the pending declaration time. If it is determined that the immediate simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0169] In an optional implementation manner, the simulation parameter construction unit 401 is specifically configured to:

[0170] In response to the simulation system being started, obtaining simulation parameters set by the user; the simulation parameters include simulation time length and simulation date parameters;

[0171] Determine the number of simulation scans based on the simulation time length and the second preset time length threshold;

[0172] According to the simulation time length and the simulation scan number, a plurality of first time elements arranged in sequence are obtained;

[0173] According to the simulation date parameter, a plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and a reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

[0174] In an optional implementation, the simulation parameters further include a scanning duration adjustment coefficient; the simulation parameter construction unit 401 is specifically configured to:

[0175] Determining a corrected scanning duration according to a second preset duration threshold and a scanning duration adjustment coefficient;

[0176] The number of simulation scans is determined based on the corrected scan time and the simulation time.

[0177] In an optional implementation, the simulation parameter construction unit 401 is further configured to:

[0178] At each interval of a second preset time threshold, a time element is obtained from the reference time sequence in chronological order, and before determining the instantaneous simulation time based on the time element obtained from the reference time sequence, the wafer production list is divided into groups to obtain a secondary list of wafer production with a quantity equal to a first threshold;

[0179] Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of child processes is a first threshold; each child process corresponds to a wafer production secondary list;

[0180] The simulation time control unit 402 is specifically used for:

[0181] At every interval of the second preset time threshold, a time element is obtained from the reference time series in chronological order by the parent process, and the instant simulation time is determined based on the time element obtained from the reference time series;

[0182] The simulation operation control unit 403 is specifically used for:

[0183] For any determined instant simulation time, before the next redetermination, the parent process sends action instructions to each child process;

[0184] In response to the action instruction, each sub-process compares each declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0185] and Figure 1 The simulation control method shown is based on the same inventive concept, and a simulation control system is also provided in the embodiment of the present application. Since the system is the system corresponding to the simulation control method of the present application, and the principle of solving the problem by the system is similar to that of the method, the implementation of the system can refer to the implementation of the above method, and the repeated parts will not be repeated.

[0186] Figure 5 A schematic diagram of the structure of a simulation control system provided in an embodiment of the present application is shown. Figure 5 As shown, the simulation control system includes a memory 101 , a communication module 103 and one or more processors 102 .

[0187] The memory 101 is used to store computer programs executed by the processor 102. The memory 101 may mainly include a program storage area and a data storage area, wherein the program storage area may store an operating system and programs required for running the instant messaging function, etc.; the data storage area may store various instant messaging information and operation instruction sets, etc.

[0188] The memory 101 may be a volatile memory, such as a random-access memory (RAM); the memory 101 may also be a non-volatile memory, such as a read-only memory, a flash memory, a hard disk drive (HDD) or a solid-state drive (SSD), or the memory 101 is any other medium that can be used to carry or store the desired program code in the form of instructions or data structures and can be accessed by a computer, but is not limited thereto. The memory 101 may be a combination of the above memories.

[0189] The processor 102 may include one or more central processing units (CPU) or a digital processing unit, etc.

[0190] The processor 102 is configured to:

[0191] Establishing a reference time series and a wafer production list; the reference time series includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time length threshold; the wafer production list includes production information of a plurality of batches that have been put into production arranged in sequence; the production information includes batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch that has been put into production determined by simulating dispatching;

[0192] At each interval of a second preset time threshold, a time element is obtained from the reference time series in chronological order, and the instant simulation time is determined based on the time element obtained from the reference time series; the second preset time threshold is less than the first preset time threshold;

[0193] For any determined instantaneous simulation time, the following steps are performed before the next redetermination: the instantaneous simulation time is compared with each declared time in the wafer production list one by one, and based on the comparison result, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled; wherein the first preset time threshold is greater than the time required to complete any process of comparing the instantaneous simulation time with each declared time in the wafer production list one by one.

[0194] In an optional embodiment, the processor 102 is specifically configured to:

[0195] Obtain the announcement time of each batch that has been put into production in the wafer production list one by one, and assign the announcement time obtained one by one to the pending announcement time in sequence; for any pending announcement time that has been assigned, perform the following steps before the next assignment:

[0196] The immediate simulation time is compared with the pending declaration time. If it is determined that the immediate simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0197] In an optional embodiment, the production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch that has been put into production has entered a production step and has not yet started to be loaded onto the machine; the in-production state indicates that the corresponding batch that has been put into production has started to be loaded onto the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

[0198] In an optional embodiment, the processor 102 is specifically configured to:

[0199] Obtain the announcement time of each batch that has been put into production in the wafer production list one by one, and assign the announcement time obtained one by one to the pending announcement time in sequence; for any pending announcement time that has been assigned, perform the following steps before the next assignment:

[0200] The immediate simulation time is compared with the pending declaration time. If it is determined that the immediate simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

[0201] In an optional embodiment, the processor 102 is specifically configured to: in response to the simulation system being started, obtain simulation parameters set by the user; the simulation parameters include simulation time length and simulation date parameters;

[0202] Determine the number of simulation scans based on the simulation time length and the second preset time length threshold;

[0203] According to the simulation time length and the simulation scan number, a plurality of first time elements arranged in sequence are obtained;

[0204] According to the simulation date parameter, a plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and a reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

[0205] In an optional embodiment, the simulation parameters further include a scan duration adjustment coefficient; the processor 102 is specifically configured to: determine a modified scan duration according to the second preset duration threshold and the scan duration adjustment coefficient;

[0206] The number of simulation scans is determined based on the corrected scan time and the simulation time.

[0207] In an optional embodiment, the processor 102 is further configured to: obtain a time element from the reference time series in chronological order at each interval of a second preset time length threshold, and before determining the instantaneous simulation time based on the time element obtained from the reference time series, divide the wafer production list into groups to obtain a wafer production secondary list with a quantity equal to a first threshold;

[0208] Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of child processes is a first threshold; each child process corresponds to a wafer production secondary list;

[0209] The processor 102 is specifically configured to: obtain a time element from the reference time series according to the time sequence through the parent process at intervals of a second preset time length threshold, and determine the instantaneous simulation time based on the time element obtained from the reference time series;

[0210] For any determined instant simulation time, before the next redetermination, the parent process sends action instructions to each child process;

[0211] In response to the action instruction, each sub-process compares each declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

[0212] The communication module 103 is used to communicate with the database and other terminals.

[0213] The specific connection medium between the memory 101, the communication module 103 and the processor 102 is not limited in the embodiment of the present application. Figure 5 In the embodiment, the memory 101 and the processor 102 are connected via a bus 104. The bus 104 is Figure 5 The connections between other components are shown in bold lines, which are only for illustration and are not intended to be limiting. The bus 104 can be divided into an address bus, a data bus, a control bus, etc. For ease of illustration, Figure 5 Only one thick line is used in the diagram, but this does not mean that there is only one bus or only one type of bus.

[0214] Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is also intended to include these modifications and variations.

Claims

1. A simulation control method, characterized in that: include: Establish baseline time series and wafer production lists; The reference time series includes a plurality of time elements arranged in sequence; The time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches that have been put into production arranged in sequence; the production information includes batch identification, production status and announcement time; The declaration time represents the end time point of the production status of the production batch determined by simulated dispatching; At intervals of a second preset time threshold, one of the time elements is obtained from the reference time series in chronological order, and an instant simulation time is determined based on the time element obtained from the reference time series; The second preset time threshold is less than the first preset time threshold; For any determined real-time simulation time, the following steps are performed before the next redetermination: the real-time simulation time is compared one by one with each declared time in the wafer production list, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each declared time in the wafer production list one by one.

2. The method according to claim 1, characterized in that The production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch in production has entered a production step and has not yet started to be loaded onto the machine; the in-production state indicates that the corresponding batch in production has started to be loaded onto the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

3. The method according to claim 1, characterized in that The determining of the instantaneous simulation time based on the time element obtained from the reference time series comprises: The time element obtained from the reference time series is assigned to the instantaneous simulation time.

4. The method according to claim 1, characterized in that: The step of comparing the instantaneous simulation time with each of the announced times in the wafer production list one by one, and controlling the cyclic switching of the production status of the production batch corresponding to the announced time according to the comparison result, comprises: Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment: The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

5. The method according to claim 1, characterized in that: The establishing of the benchmark time series comprises: In response to the simulation system being started, obtaining simulation parameters set by a user; the simulation parameters include simulation time length and simulation date parameters; Determining the number of simulation scans based on the simulation time length and the second preset time length threshold; According to the simulation time length and the simulation scan times, a plurality of first time elements arranged in sequence are obtained; According to the simulation date parameter, the plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and the reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

6. The method according to claim 5, characterized in that The simulation parameters also include a scan duration adjustment coefficient; the determining of the number of simulation scans based on the simulation time length and the second preset duration threshold includes: Determining a corrected scanning duration according to the second preset duration threshold and the scanning duration adjustment coefficient; The simulation scan times are determined according to the corrected scan time and the simulation time.

7. The method according to claim 1, characterized in that Before obtaining one of the time elements from the reference time series in chronological order at each interval of the second preset time length threshold, and determining the instantaneous simulation time based on the time element obtained from the reference time series, the method further includes: Dividing the wafer production list into groups to obtain a secondary wafer production list having a quantity equal to a first threshold; Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of the child processes is the first threshold; each of the child processes corresponds to one of the wafer production secondary lists; The method of obtaining a time element from the reference time series in chronological order at each interval of the second preset time length threshold, and determining the instantaneous simulation time based on the time element obtained from the reference time series, includes: At intervals of a second preset time threshold, obtaining a time element from the reference time series in chronological order by the parent process, and determining the instantaneous simulation time based on the time element obtained from the reference time series; For any determined instantaneous simulation time, the following steps are performed before the next redetermination: for each instantaneous simulation time, the instantaneous simulation time is compared with each of the declared times in the wafer production list one by one, and according to the comparison result, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled, including: For any determined instant simulation time, before the next redetermination, the parent process sends an action instruction to each of the child processes; In response to the action instruction, each of the sub-processes compares the declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

8. A simulation control device, characterized in that: include: A simulation parameter construction unit, the simulation parameter construction unit is used to establish a reference time series and a wafer production list; The reference time series includes a plurality of time elements arranged in sequence; The time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of multiple batches that have been put into production arranged in sequence; the production information includes batch identification, production status and announcement time; the announcement time represents the end time point of the production status of the batch that has been put into production determined by simulated dispatching; A simulation time control unit, the simulation time control unit is used to obtain one of the time elements from the reference time series in chronological order at intervals of a second preset time threshold, and determine an instant simulation time based on the time element obtained from the reference time series; The second preset time threshold is less than the first preset time threshold; A simulation operation control unit, wherein the simulation operation control unit is used to perform the following steps for any determined real-time simulation time before the next redetermination: comparing the real-time simulation time with each of the declared times in the wafer production list one by one, and according to the result of the comparison, controlling the cyclic switching of the production status of the production batch corresponding to the declared time; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each of the declared times in the wafer production list one by one.

9. The device according to claim 8, characterized in that The production status includes an idle state and an in-production state; the idle state indicates that the corresponding batch in production has entered a production step and has not yet started to be loaded onto the machine; the in-production state indicates that the corresponding batch in production has started to be loaded onto the machine and has not yet finished unloading; the cyclic switching includes switching from the idle state to the in-production state within the same production step, and switching from the in-production state of the previous production step to the idle state of the next production step between two adjacent production steps.

10. The device according to claim 8, characterized in that The simulation time control unit is specifically used for: The time element obtained from the reference time series is assigned to the instantaneous simulation time.

11. The device according to claim 8, characterized in that The simulation operation control unit is specifically used for: Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment: The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

12. The device according to claim 8, characterized in that The simulation parameter construction unit is specifically used for: In response to the simulation system being started, obtaining simulation parameters set by a user; the simulation parameters include simulation time length and simulation date parameters; Determining the number of simulation scans based on the simulation time length and the second preset time length threshold; According to the simulation time length and the simulation scan times, a plurality of first time elements arranged in sequence are obtained; According to the simulation date parameter, the plurality of first time elements arranged in sequence are respectively shifted in time in parallel to obtain a plurality of second time elements arranged in sequence, and the reference time series is determined based on the obtained plurality of second time elements arranged in sequence.

13. The device according to claim 12, characterized in that The simulation parameters also include a scanning duration adjustment coefficient; the simulation parameter construction unit is specifically used to: Determining a corrected scanning duration according to the second preset duration threshold and the scanning duration adjustment coefficient; The simulation scan times are determined according to the corrected scan time and the simulation time.

14. The device according to claim 8, characterized in that The simulation parameter construction unit is also used for: At each interval of the second preset time threshold, one of the time elements is obtained from the reference time sequence in chronological order, and before determining the instantaneous simulation time based on the time element obtained from the reference time sequence, the wafer production list is divided into groups to obtain a wafer production secondary list with a quantity equal to a first threshold; Create a parent process and multiple child processes, and make the clocks of the child processes consistent with that of the parent process; the number of the child processes is the first threshold; each of the child processes corresponds to one of the wafer production secondary lists; The simulation time control unit is specifically used for: At intervals of a second preset time threshold, obtaining a time element from the reference time series in chronological order by the parent process, and determining the instantaneous simulation time based on the time element obtained from the reference time series; The simulation operation control unit is specifically used for: For any determined instant simulation time, before the next redetermination, the parent process sends an action instruction to each of the child processes; In response to the action instruction, each of the sub-processes compares the declaration time in the corresponding wafer production secondary list with the real-time simulation time one by one, and controls the cyclic switching of the production status of the production batch corresponding to the declaration time according to the comparison result.

15. A simulation control system, characterized in that: include: A memory, the memory being used to store data or program codes used when the simulation control system is running; A processor, the processor is used to: establish a reference time sequence and a wafer production list; the reference time sequence includes a plurality of time elements arranged in sequence; the time difference between any two adjacent time elements is a first preset time threshold; the wafer production list includes production information of a plurality of batches that have been put into production and arranged in sequence; the production information includes a batch identification, a production status and a declaration time; The declaration time represents the end time point of the production status of the production batch determined by simulated dispatching; At intervals of a second preset time threshold, one of the time elements is obtained from the reference time series in chronological order, and an instant simulation time is determined based on the time element obtained from the reference time series; The second preset time threshold is less than the first preset time threshold; For any determined real-time simulation time, the following steps are performed before the next redetermination: the real-time simulation time is compared one by one with each declared time in the wafer production list, and according to the result of the comparison, the cyclic switching of the production status of the production batch corresponding to the declared time is controlled; wherein the first preset time threshold is greater than the time taken to complete any process of comparing the real-time simulation time with each declared time in the wafer production list one by one.

16. The system according to claim 15, characterized in that The processor is specifically used for: Obtain the announcement time of each of the batches in the wafer production list, and assign the announcement times obtained one by one to the pending announcement time in sequence; for any of the pending announcement times after the assignment, perform the following steps before the next assignment: The instant simulation time is compared with the pending declaration time. If it is determined that the instant simulation time is not less than the pending declaration time, the production status of the production batch corresponding to the pending declaration time is cyclically switched.

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