Substrate storage container

Abstract

The present invention provides a substrate storage container that is less likely to retain cleaning liquid in a gas supply mechanism. The substrate storage container has an opening on the front surface and includes a gas supply mechanism on the bottom surface. The gas supply mechanism includes an inlet passage for receiving gas from the bottom surface; a check valve disposed at a position that does not overlap with the inlet passage in a horizontal plane along the bottom surface; and a flow path for supplying gas from the inlet passage toward the check valve.

Description

Technical Field

[0001] The present invention relates to a substrate storage container for storing a substrate. Background Art

[0002] Substrate storage containers, which hold substrates such as semiconductor wafers, are used for storage within warehouses, transport between semiconductor processing equipment, and transport between factories. The substrate storage container is designed to replace its interior with an inert gas such as nitrogen or dry air supplied by a gas replacement device to prevent oxidation and contamination of the stored substrates and to maintain a constant internal humidity. A gas supply mechanism is provided on the bottom of the substrate storage container to introduce the gas supplied by the gas replacement device.

[0003] Existing technology

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent No. 6265844 Summary of the Invention

[0006] Technical problem to be solved by the invention

[0007] Before storing substrates, substrate storage containers are pre-cleaned using a dedicated cleaning device. This cleaning process involves spraying cleaning liquid (water) into the container and drying any remaining cleaning liquid on the container's surface. However, existing substrate storage containers often suffer from the problem of residual cleaning liquid remaining on the air supply mechanism located on their bottom surface during the cleaning process.

[0008] An object of the present invention is to provide a substrate storage container in which cleaning liquid is unlikely to remain in an air supply mechanism.

[0009] Technical means to solve technical problems

[0010] A technical solution of the present invention is a substrate storage container having an opening on the front surface side and a gas supply mechanism on the bottom surface, wherein the gas supply mechanism includes: an inlet passage for receiving gas from the bottom surface side; and a check valve arranged at a position that does not overlap with the inlet passage in a horizontal plane along the bottom surface, and a flow path for supplying the gas from the inlet passage toward the check valve.

[0011] Effects of the Invention

[0012] According to the present invention, it is possible to provide a substrate storage container in which cleaning liquid is less likely to remain in the gas supply mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is an exploded perspective view showing a substrate storage container according to an embodiment.

[0014] Figure 2 It is a front view showing the container body.

[0015] Figure 3 It is a perspective view showing the air supply mechanism 50 .

[0016] Figure 4 It is a perspective view showing the air supply mechanism 50 .

[0017] Figure 5 It is a longitudinal sectional view showing the air supply mechanism 50 .

[0018] Figure 6 It is a cross-sectional perspective view showing the air supply mechanism 50 .

[0019] Figure 7A It is a perspective view showing the tower nozzle 70 .

[0020] Figure 7B It is a top view showing the positional relationship between the communication component 72 and the member 52B of the filter structure component 53 in the horizontal plane (from Figure 2 (Figure observed in the VIIb-VIIb direction).

[0021] Figure 8 It is a perspective view showing the air supply mechanism 150 .

[0022] Figure 9 It is a cross-sectional perspective view showing the air supply mechanism 150 . DETAILED DESCRIPTION

[0023] Hereinafter, various embodiments will be described with reference to the accompanying drawings.

[0024] Figure 1 1 is an exploded perspective view showing the substrate storage container of this embodiment. Figure 2 It is a front view showing the container body.

[0025] like Figure 1 As shown, a substrate storage container 1 includes a container body 2 for storing a plurality of substrates 10, and a lid 4 that is attachable to and detachable from the container body 2. Any substrate 10 can be stored, such as a semiconductor wafer or mask glass having a diameter of 300 mm or 450 mm. While the number of substrates 10 that can be stored is arbitrary, the substrate storage container 1 can accommodate, for example, a maximum of 25 substrates 10.

[0026] like Figure 1 as well as Figure 2 As shown, an opening 2A for taking out and putting in the substrate 10 is formed on the front surface side of the container body 2, so that the cover 4 can be mounted on the opening 2A while maintaining the airtightness of the substrate storage container 1. Figure 1, arrow F indicates the front surface side or front direction of the substrate storage container 1. Hereinafter, the direction of arrow F is referred to as the front surface side or front direction, and the direction opposite to arrow F is referred to as the rear surface side or rear direction.

[0027] The container body 2 includes a rear wall 2B, a right side wall 2C, a left side wall 2D, a top surface 2E, and a bottom surface 2F on surfaces other than the front surface. When the lid 4 is attached to the opening 2A of the container body 2, the substrate storage container 1 has a generally rectangular parallelepiped shape. The substrate storage container 1 is a so-called front-opening box-type container having the opening 2A on the front surface.

[0028] A plurality of support pieces 21 are provided inside the container body 2, mounted on the right side wall 2C and the left side wall 2D. The number of support pieces 21 corresponds to the maximum number of substrates 10 that can be stored in the substrate storage container 1. The support pieces 21 are arranged at equal intervals in the vertical direction on the right side wall 2C and the left side wall 2D. A pair of support pieces 21, each located at the same height, supports the same substrate 10 from both sides, thereby keeping the substrate 10 stored horizontally in the container body 2.

[0029] Furthermore, a pair of left and right position restricting portions 22 extending in the vertical direction are attached to the right and left walls 2C and 2D, closer to the rear surface than the support piece 21. The position restricting portions 22 restrict the rearward movement of the substrate 10 supported by the support piece 21, thereby defining the front-to-back position of the substrate 10.

[0030] The container body 2 is appropriately equipped with accessories such as the following handle 23 , top flange 25 , and bottom plate 26 .

[0031] Handles 23 for gripping and operating are attached to the outer circumferences of the right side wall 2C and the left side wall 2D of the container body 2. Furthermore, a top flange 25 is attached to the upper surface of the top surface 2E of the container body 2. The top flange 25 is used, for example, by a top transport vehicle in a semiconductor manufacturing facility to transport the substrate storage container 1 between processes or to position it on semiconductor processing equipment. Furthermore, a base plate 26 can be attached to the bottom surface 2F of the container body 2.

[0032] The container body 2, lid 4, and the aforementioned accessories (handle 23, top flange 25, bottom plate 26, etc.) are formed by injection molding a molding material containing a resin. Examples of the resin contained in the molding material include thermoplastic resins such as polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, polybutylene terephthalate, polyacetal, and liquid crystal polymer, or alloys thereof.

[0033] Furthermore, conductive materials such as carbon fibers, carbon powder, carbon nanotubes, and conductive polymers, or various antistatic agents such as anionic, cationic, and nonionic antistatic agents may be added to these resins as needed. Furthermore, ultraviolet absorbers or reinforcing fibers to increase rigidity may be added as needed.

[0034] Figure 3 as well as Figure 4 1 is a perspective view showing the air supply mechanism 50. Figure 5 It is a longitudinal sectional view showing the air supply mechanism 50 . Figure 6 It is a cross-sectional perspective view showing the air supply mechanism 50 .

[0035] like Figures 3 to 6 As shown, a pair of left and right gas supply mechanisms 50 are installed on the bottom surface 2F of the container body 2. When the lid 4 is closed, gas can be introduced from the gas replacement device (not shown) into the interior of the substrate storage container 1 through the gas supply mechanism 50. Figure 3 as well as Figure 4 The right air supply mechanism 50 is shown as viewed from the front. The left air supply mechanism and the right air supply mechanism 50 are configured to have a bilaterally symmetrical shape.

[0036] The gas supply mechanism 50 is connected to the gas replacement device, and gas supplied from the gas replacement device is introduced into the interior of the substrate storage container 1 through the gas supply mechanism 50, thereby replacing the interior space of the substrate storage container 1 with a desired gas. Furthermore, an exhaust mechanism (not shown) is provided on the bottom surface 2F of the container body 2. This exhaust mechanism exhausts the gas inside the substrate storage container 1 to the gas replacement device to replace the introduced gas, thereby substantially completely replacing the interior of the substrate storage container 1 with the desired gas.

[0037] Examples of the gas introduced into the substrate storage container 1 include inert gas and dry air. Examples of the inert gas include nitrogen and argon.

[0038] like Figures 3 to 6 As shown, the air supply mechanism 50 includes a flow path forming portion 52 composed of a member 52A and a member 52B fitted into the member 52A, and a filter component 53 housed inside the flow path forming portion 52 .

[0039] The member 52A of the flow path forming portion 52 is formed with Figure 5 An introduction passage 52a that penetrates the filter in the vertical direction, a flow path 52b that communicates with the introduction passage 52a and extends to the lower end of the filter component 53, and a leg portion 52c.

[0040] A check valve 53a is formed within the filter structure 53, allowing gas to flow only in the supply direction. Normally, the check valve 53a remains closed to prevent fluctuations in the state of the gas filling the container body 2, such as its composition and humidity. The check valve 53a also functions as a filter to prevent foreign matter such as dust from entering the substrate storage container 1.

[0041] The container body 2 is placed at a predetermined position on the gas replacement device via the bottom plate 26. At this time, the foot portion 52c of the component 52A abuts against the bottom plate 26 to support the flow path component 52. In addition, the lower end portion ( Figure 5 The left lower end portion) is engaged with the opening 26a of the bottom plate 26, and the opening 26a and the introduction passage 52a are connected to each other.

[0042] In addition, Figure 5 The upper end of the filter structure component 53 can be installed with a filter component 54 ( Figure 5 as well as Figure 6 ) In addition, the filter member 54 can be set at any position closer to the downstream side than the flow path 52b. In addition, the filter member can also be set at the upstream side than the flow path 52b.

[0043] Figure 7A It is a perspective view showing the tower nozzle 70 .

[0044] like Figure 1 、 Figure 2 、 Figure 5 as well as Figure 6 As shown, a tower nozzle 70 extending in the vertical direction is installed inside the container body 2. Figure 2 As shown, a pair of left and right tower nozzles 70 are provided inside the container body 2 , and these are configured to be bilaterally symmetrical with each other.

[0045] The tower nozzle 70 has a shell 71, and a space ( Figure 6 ). The shell 71 has a surface 71A and a surface 71B, and a plurality of blow-out holes 71a are opened on the surface 71A, and a plurality of blow-out holes 71b are opened on the surface 71B. The interior of the shell 71 is connected to the internal space of the container body 2 via the blow-out holes 71a and the blow-out holes 71b. In addition, as an alternative to the tower nozzle 70, a tower nozzle can be used that is formed by adding a blow-out hole on the rear surface side and blowing gas from the blow-out hole toward the rear surface side. In addition, the tower nozzle can also be formed by a porous body containing a resin material. Furthermore, a gas replacement unit of any shape can be used instead of the tower nozzle 70. For example, a gas replacement unit having a plate-shaped cover member with a plurality of blow-out holes formed therein and a structure in which gas is blown out from the blow-out holes can also be used.

[0046] Figure 7B It is a top view showing the positional relationship between the communication component 72 and the member 52B of the filter structure component 53 in the horizontal plane (from Figure 2 (Figure observed in the VIIb-VIIb direction).

[0047] like Figure 5 、 Figure 6 、 Figure 7A as well as Figure 7B As shown, a communication component 72 is provided at the lower end of the tower nozzle 70. The communication component 72 has a through hole 72a that communicates with the interior of the housing 71. The central axis of the through hole 72a is aligned with the central axis 53x ( Figure 5 ) are roughly consistent.

[0048] Next, the flow of the gas supplied into the interior of the container body 2 will be described.

[0049] The gas supplied from the gas replacement device is introduced into the inlet passage 52a, the flow path 52b, and the filter structure 53 in this order through the opening 26a of the bottom plate 26. When the check valve 53a of the filter structure 53 opens due to the pressure of the supplied gas, the gas passes through the filter structure 53. The gas is then supplied into the interior of the housing 71 through the through-hole 72a and is ejected from the blowout holes 71a and 71b, thereby diffusing into the interior of the container body 2.

[0050] In this embodiment, the flow path 52b of the air supply mechanism 50 is disposed between the inlet passage 52a and the filter structure 53. Therefore, the inlet passage 52a and the filter structure 53 are not coaxial, and the check valve 53a is positioned in a position that does not overlap with the inlet passage 52a within a horizontal plane along the bottom surface 2F. Therefore, during the process of spraying cleaning fluid (water) into the container body 2, the cleaning fluid is not directly sprayed onto the filter structure 53. This reduces the possibility that the check valve 53a will be opened by the water pressure of the sprayed cleaning fluid, allowing the cleaning fluid to pass through the filter structure 53.

[0051] Furthermore, the presence of the flow path 52 b reduces the possibility that the cleaning liquid enters the vicinity of the filter component 53 .

[0052] Therefore, in the process of drying the cleaning liquid, the cleaning liquid can be easily dried, and the possibility of the cleaning liquid remaining in the container body 2 can be reduced, especially the possibility of the cleaning liquid remaining closer to the inside than the filter structural component 53 or near the filter structural component 53 can be reduced.

[0053] In addition, in the process of drying the cleaning liquid, the opening 2A is usually directed downward to avoid the cleaning liquid from being retained in the interior of the container body 2. Figure 4 As shown, when the opening 2A faces downward, that is, when the front surface side indicated by the arrow F faces downward, the direction of the flow path 52b is set so that the cleaning liquid entering the flow path 52b flows to the introduction path 52a through the flow path 52b under its gravity. Figure 5 as well as Figure 6 ) flows along the wall surface FA3 toward the introduction passage 52a.

[0054] Furthermore, after drying, when the container body 2 is placed with the bottom surface 2F facing downward, the introduction passage 52a is open downward, so the remaining cleaning liquid can be easily discharged through the introduction passage 52a. Figure 5 as well as Figure 6 ) flows along the wall surface FB1 to the outside of the introduction passage 52a.

[0055] Furthermore, when the container body 2 is placed with the bottom surface 2F facing downward, the flow path 52b has a downward slope toward the inlet path 52a. Therefore, the cleaning liquid remaining in the flow path 52b flows toward the inlet path 52a through the flow path 52b due to its gravity. For example, the wall surface FA1 ( Figure 5 as well as Figure 6 ) flows along the wall surface FA1 toward the introduction passage 52a.

[0056] Therefore, during or after the process of drying the cleaning liquid, the cleaning liquid remaining around the filter component 53 is easily discharged and dried. Therefore, even when the cleaning liquid enters the vicinity of the filter component 53, the cleaning liquid can be easily discharged and dried.

[0057] Next, refer to Figure 8 as well as Figure 9 The structure of another air supply mechanism 150 will be described.

[0058] Figure 8 is a perspective view showing the air supply mechanism 150, Figure 9 It is a cross-sectional perspective view showing the air supply mechanism 150 .

[0059] like Figure 8 as well as Figure 9As shown, the gas supply mechanism 150 includes a flow path component 152 connected to the inlet portion 81 of the gas replacement device, a filter component 153 connected to the flow path component 152 , and a mounting component 154 for mounting the filter component 153 to the container body 102 .

[0060] The inlet portion 81 of the gas replacement device is formed with an edge Figure 9 The through hole 81a is formed in the vertical direction of the flow path component 152: an introduction path 152a is formed along the flow path component 152. Figure 9 The flow path 152b extends in the vertical direction and communicates with the through hole 81a; the flow path 152b extends in the direction of the bottom surface 102F of the container body 102 and communicates with the introduction path 152a; and the flow path 152c, which extends along Figure 9 Extends in the up-down direction and communicates with flow path 152b.

[0061] The filter structure component 153 is provided with a Figure 9 The valve body 153a and the valve body 153b move in the vertical direction. The valve body 153a is compressed between the mounting member 154 and the valve body 153a by the spring 153c. Figure 9 The valve body 153b is pressed upward by the spring 153d compressed between the valve body 153a and the valve body 153b. Figure 9 . The filter structure 153 thus acts as a check valve, allowing gas to flow in both directions—into the container body 102 and out of it—in other words, it functions as a two-way valve. Furthermore, when the pressure difference between the interior and exterior of the substrate storage container (container body 102) is small, the check valve of the filter structure 153 remains closed, thereby preventing changes in the state of the gas filling the substrate storage container, such as changes in gas composition or humidity. The filter structure 153 also functions as a filter to prevent foreign matter, such as dust, from entering the substrate storage container.

[0062] In addition, you can Figure 9 The upper end of the filter structure component 153 in the filter is installed with a filter member (not shown) that is air permeable and removes foreign matter such as dust. In addition, the filter member can be arranged at any position closer to the downstream side or upstream side than the flow path 152b.

[0063] The container body 102 is provided with a Figure 9 The cylindrical tower nozzle 170 is extended in the vertical direction. Figure 9 The central axis of the tower nozzle 170 extending in the vertical direction is consistent with the central axis 153x of the filter structure 153. Figure 9Blowing holes (not shown) are formed at equal intervals in the vertical direction of the substrate storage container, and the gas supplied into the interior of the substrate storage container is diffused through these blowing holes.

[0064] Next, the flow of the gas supplied into the interior of the substrate storage container (container body 102 ) will be described.

[0065] The gas supplied through the inlet passage 152a is introduced into the filter component 153 through the through hole 81a, the flow path 152b and the flow path 152c. When the valve body 153b of the filter component 153 is pushed downward by the pressure of the supplied gas, Figure 9 When the pressure is applied upward in the substrate storage container, the gas is supplied toward the tower nozzle 170 through the gap between the valve body 153a and the valve body 153b, and diffuses into the interior of the substrate storage container.

[0066] As described above, the air supply mechanism 150 includes the flow path 152b as the flow path for supplying air into the substrate storage container. The inlet passage 152a and the filter structure 153 are not coaxially located, and the filter structure 153 is positioned in a horizontal plane along the bottom surface 102F, so that it does not overlap with the inlet passage 152a. Therefore, during the process of spraying cleaning liquid (water) into the container body 102, the sprayed cleaning liquid does not directly reach the filter structure 153. This reduces the possibility that the valve body 153b will be pushed by the water pressure of the sprayed cleaning liquid, thereby allowing the cleaning liquid to pass through the filter structure 153.

[0067] Furthermore, the presence of the flow path 152 b reduces the possibility of the cleaning liquid entering the vicinity of the filter component 153 .

[0068] Therefore, in the process of drying the cleaning liquid, the cleaning liquid can be easily dried, and the possibility of the cleaning liquid remaining in the container body 102 can be reduced, especially the possibility of the cleaning liquid remaining closer to the inside than the filter structural component 153 or near the filter structural component 153 can be reduced.

[0069] In addition, in the process of drying the cleaning liquid, an opening (not shown, equivalent to Figure 1 The opening 2A in the container is directed downwards to dry the container so as to avoid the cleaning liquid from being retained inside the container body 102. Figure 9 As shown, when the opening is facing downward, that is, when Figure 8 When the front surface side indicated by the arrow F in FIG. 1 is directed downward, the direction of the flow path 152b is set so that the cleaning liquid entering the flow path 152b flows to the introduction path 152a through the flow path 152b due to its gravity. For example, the wall surface FA2 ( Figure 9 ) flows along the wall surface FA2 toward the inlet passage 152a.

[0070] Furthermore, after drying, when the container body 102 is placed with the bottom surface 102F facing downward, the inlet passage 152a is open downward, so the remaining cleaning liquid is easily discharged through the inlet passage 152a. Figure 9 ) flows along the wall surface FB2 to the outside of the introduction passage 152a.

[0071] Therefore, during or after the process of drying the cleaning liquid, the cleaning liquid remaining around the filter component 153 is easily discharged and dried. Therefore, even when the cleaning liquid enters the vicinity of the filter component 153, the cleaning liquid can be easily discharged and dried.

[0072] Although each embodiment has been described in detail above, the present invention is not limited to the specific embodiments and various modifications and changes can be made within the scope of the claims. In addition, all or multiple components of the above embodiments can also be combined.

[0073] Description of Reference Numerals

[0074] 1 substrate storage container

[0075] 2 Container body

[0076] 2A Opening

[0077] 2F Bottom

[0078] 50 Gas supply mechanism

[0079] 52a Introduction pathway

[0080] 52b flow path

[0081] 53a Check valve

[0082] 53 Filter structural parts (components with check valves)

[0083] 54 filter components

[0084] 102 container body

[0085] 102F Bottom

[0086] 150 gas supply mechanism

[0087] 152a Introduction pathway

[0088] 152b flow path

[0089] 153 Filter structural parts (with check valves, components with check valves)

Claims

1. A substrate storage container having an opening on the front surface side and an air supply mechanism on the bottom surface, wherein the substrate storage container is characterized in that: The air supply mechanism comprises: an inlet passage for receiving gas from the bottom surface side; as well as a check valve disposed at a position not overlapping with the introduction passage in a horizontal plane along the bottom surface, and a flow path for supplying the gas from the introduction path toward the check valve, In the longitudinal section with the bottom surface facing downward, The flow path has an upper inclined wall surface with a lower front side and a higher rear side, and a lower inclined wall surface with a lower front side and a higher rear side. The introduction passage has a downward inner wall surface, the downward inner wall surface is connected to the upper inclined wall surface and the lower inclined wall surface and extends downward. The introduction passage is arranged closer to the front surface than the check valve. When the front surface is facing downward, the cleaning liquid in the flow path flows toward the introduction path along the upper inclined wall due to gravity. When the bottom surface faces downward, the cleaning liquid in the flow path flows toward the introduction path along the lower inclined wall surface due to gravity. When the bottom surface faces downward, the cleaning liquid in the introduction passage flows toward the outside of the introduction passage along the downward inner wall surface due to gravity.

2. The substrate storage container according to claim 1, wherein: The flow path is formed in a component different from a component including the check valve.

3. The substrate storage container according to claim 1, wherein: The air supply mechanism includes a filter member disposed downstream of the flow path.

4. The substrate storage container according to claim 1, wherein: The non-return valve is designed as a two-way valve.

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