Sputtering target, target assembly and method for manufacturing target assembly

Abstract

The present invention discloses a sputtering target, including a target body; the side surface of the target body bulges outward to form an annular bulge; the front surface of the target body bulges relative to the front surface of the annular bulge, and the back surface of the target body bulges relative to the back surface of the annular bulge. The present invention also discloses a target assembly, including the sputtering target and a back plate ring arranged on the back surface of the annular bulge, and a front ring that can be selectively arranged on the front surface of the annular bulge. The present invention also discloses a method for manufacturing the target assembly, wherein the annular bulge is welded to the back plate ring, or the back plate ring and the front ring, and the welding head is inserted from the back of the back plate ring close to the outer side surface until it contacts or extends into the annular bulge or the front ring, and the welding head gradually moves toward the inner side surface of the back plate ring during the welding process.

Description

Technical Field

[0001] The present invention relates to the technical field of sputtering target materials, and in particular to a sputtering target material, a target material assembly and a method for manufacturing the target material assembly. Background Art

[0002] In the target assembly in which the back plate and the sputtering target are integrally formed, the strength of the back plate portion cannot meet the design or use requirements because the back plate portion is made of high-purity material. Another alloy material can be provided on the back plate portion to improve the strength of the back plate portion of the finished target.

[0003] In the prior art, the welding methods of the target material and the back plate include friction stir welding (FSW), electron beam welding (EBW), etc. For example, the patent specifications with publication numbers CN 111660003 A and CN 111496366 A disclose the above welding methods.

[0004] The patent specification with publication number CN 113529030 A discloses a target material assembly and a method for manufacturing the target material assembly, the target material assembly includes: a target material and a back plate, the back plate is arranged at the periphery of the target material, and the sputtering surface of the target material protrudes relative to the front end surface of the back plate. The manufacturing method includes the following steps: joining the periphery of the target material with the back plate so that the back plate is located at the periphery of the target material, offsetting the welding drill from the joining center line of the periphery of the target material and the back plate to the back plate side by a preset distance, and welding the periphery of the target material and the back plate. From the welding manufacturing method of this patented technology, it can be seen that the welding area is narrow and the position is mainly concentrated in the target material body part, which affects the crystal phase structure and grain size of the target material body part. Moreover, due to the small area of ​​the welding area, the welding bonding strength still needs to be further improved. Summary of the invention

[0005] In view of the above-mentioned deficiencies in the prior art, the present invention provides a sputtering target, a target assembly and a method for manufacturing a target assembly, which cause little damage to the target body used for sputtering, and do not affect the physical and chemical state and properties such as the crystal phase structure and grain size of the sputtering part of the target body. The welding parts are mainly in the connection parts used for fixed connection with the base flange, the welding surface is large, and the bonding strength between the back plate ring, the front ring and the sputtering target is high.

[0006] The specific technical solutions are as follows:

[0007] A sputtering target comprises a target body;

[0008] The side surface of the target body is convex outward to form an annular convex portion;

[0009] The front surface of the target body is convex relative to the front surface of the annular convex portion, and the back surface of the target body is convex relative to the back surface of the annular convex portion.

[0010] The annular convex portion of the sputtering target material of the present invention can be welded with the back plate ring, or the back plate ring and the front ring, and the whole can be fixedly connected to the base flange as a high-strength connecting portion.

[0011] In the present invention, the front side of the target body is the surface for sputtering, and the back side of the target body is the other side opposite to the sputtering surface. The annular convex portion is located between the front side and the back side of the target body, and the front side is the surface relatively closer to the sputtering surface of the target body, and the back side is the surface opposite to the front side of the annular convex portion and relatively closer to the back side of the target body.

[0012] Based on the sputtering target with the above-mentioned shape and structure, the present invention also provides a target assembly, including the sputtering target and a backing ring arranged on the back side of the annular protrusion, which can improve the bonding strength with the base flange.

[0013] The backing plate ring is preferably made of an alloy material different from that of the sputtering target to increase strength so that it can be more firmly mounted on the base.

[0014] In a preferred example, in the target assembly, the outer side surface of the backing plate ring is flush with the outer side surface of the annular protrusion.

[0015] In a preferred example, in the target assembly, the back side of the back plate ring is flush with the back side of the target body.

[0016] In the present invention, the front side of the back plate ring refers to the side in contact with the back side of the annular protrusion, and the other side opposite to the front side of the back plate ring is the back side of the back plate ring.

[0017] In a preferred example, in the target assembly, the inner side surface of the backing plate ring is matched with the outer side surface of the target body located behind the annular protrusion.

[0018] The target assembly may further include a front ring arranged on the front side of the annular protrusion.

[0019] In the present invention, the position of the annular protrusion is used for fixed connection with the base flange, and the connection method can be a punched bolt fixed connection. The simultaneous arrangement of the front ring and the back plate ring can play a role of synergistic reinforcement, so that the connection part of the target assembly and the base flange forms a high-strength integral component, further improving the connection strength of the target assembly and the base flange.

[0020] In a preferred example, in the target assembly, the outer side surface of the front ring is flush with the outer side surface of the annular protrusion.

[0021] In a preferred example, in the target assembly, the front surface of the target body is flush with the front surface of the front ring, or the front surface of the target body protrudes relative to the front surface of the front ring.

[0022] In the present invention, the back side of the front ring refers to the side in contact with the front side of the annular convex portion, and the other side opposite to the back side of the front ring is the front side of the front ring.

[0023] In a preferred example, in the target assembly, the inner side surface of the front ring is matched with the outer side surface of the target body located in front of the annular protrusion.

[0024] In a preferred example, the material of the front ring of the target assembly is the same as that of the back plate ring, which can further improve the strength of the connecting portion of the target assembly.

[0025] The present invention also provides a method for manufacturing the target material assembly, wherein the welding parts are concentrated in the annular convex area (the connecting part for fixed connection with the base flange), which causes little damage to the target material body used for sputtering, does not affect the physical and chemical state and properties such as the crystal phase structure and grain size of the sputtering part of the target material body, has a large welding surface, and has high bonding strength between the back plate ring, the front ring and the sputtering target material.

[0026] When the target assembly has no front ring, its manufacturing method includes: welding the annular protrusion and the backing plate ring, inserting the welding head from the back of the backing plate ring close to the outer side until it contacts or extends into the annular protrusion, and during the welding process, the welding head gradually moves toward the inner side of the backing plate ring.

[0027] When the target material assembly also includes a front ring, its manufacturing method includes: welding the annular protrusion to the back plate ring and the front ring, inserting the welding head from the back of the back plate ring close to the outer side until it contacts or extends into the front ring, and during the welding process, the welding head gradually moves toward the inner side of the back plate ring.

[0028] The method for manufacturing the target assembly of the present invention can use stir friction welding or electron beam welding to perform welding.

[0029] According to the method for manufacturing the target material assembly of the present invention, during the welding process, the welding head gradually moves toward the inner side of the back plate ring until it contacts the target material body, and then continues to move toward the target material body while gradually reducing the insertion depth of the welding head, which can further improve the bonding strength with the target material body and minimize the impact on the physical and chemical state and properties of the target material body, such as the crystal phase structure and grain size.

[0030] The target assembly of the present invention can also be made into a desired shape and structure by cutting or other methods before use.

[0031] Compared with the prior art, the present invention has the following main advantages:

[0032] The present invention provides a sputtering target material, a target material assembly and a method for manufacturing a target material assembly, which cause little damage to a target material body used for sputtering, and do not affect the physical and chemical states and properties such as the crystal phase structure and grain size of the sputtering part of the target material body. The welding parts are mainly in the connection parts used for fixed connection with the base flange, the welding surface is large, and the bonding strength between the back plate ring, the front ring and the sputtering target material is high.

[0033] The prior art usually only welds at the junction of the sputtering target and the back plate. On the one hand, the bonding strength of the sputtering target and the back plate needs to be further improved. On the other hand, the welding area is narrow, and it is easy to cause air leakage and water leakage at the joint during the actual vacuum sputtering process. The present invention welds the annular convex part of the sputtering target and the back plate ring, or the back plate ring and the front ring, into a body-integrated body, which not only makes the bonding stronger, but also improves the welding sealing, solving the problems of air leakage and water leakage. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 is a schematic structural diagram of the sputtering target material of Example 1;

[0035] Figure 2 The structure, manufacturing process and product schematic diagram of the target assembly of Example 2;

[0036] Figure 3 The structure, manufacturing process and product schematic diagram of the target assembly of Example 3;

[0037] In the figure:

[0038] 1-target body 2-annular convex part 3-back plate ring

[0039] 4- front ring 5- welding head 6- alloy layer. DETAILED DESCRIPTION

[0040] The present invention will be further described below in conjunction with the accompanying drawings and specific examples. It should be understood that these examples are only intended to illustrate the present invention and are not intended to limit the scope of the present invention. The operating methods in the following examples without specifying specific conditions are usually carried out under conventional conditions or under conditions recommended by the manufacturer.

[0041] Example 1

[0042] This embodiment specifically introduces the sputtering target of the present invention, and its structure is schematically shown as follows: Figure 1 shown.

[0043] The sputtering target includes a target body 1 .

[0044] The side surface of the target body 1 is convex to form an annular convex portion 2;

[0045] The front surface of the target body 1 is convex relative to the front surface of the annular convex portion 2 , and the back surface of the target body 1 is convex relative to the back surface of the annular convex portion 2 .

[0046] The thickness of the target body 1 is D, the thickness of the annular protrusion 2 is d1, the distance between the back surface of the annular protrusion 2 and the back surface of the target body 1 is d2, and the width of the annular protrusion 2 is S.

[0047] Example 2

[0048] This embodiment specifically introduces one structure, manufacturing process and corresponding products of the target assembly of the present invention.

[0049] The structure of the target assembly is as follows Figure 2 As shown in the above figure, it includes the sputtering target material as introduced in Example 1 and a backing plate ring 3 arranged on the back side of the annular protrusion 2.

[0050] The outer side surface of the back plate ring 3 is flush with the outer side surface of the annular protrusion 2 .

[0051] The back side of the back plate ring 3 is flush with the back side of the target body 1 .

[0052] The inner side surface of the backing plate ring 3 matches the outer side surface of the target body 1 located behind the annular protrusion 2 .

[0053] The material of the sputtering target can be any one of pure aluminum, aluminum-copper alloy, aluminum-silicon alloy, and copper-silicon-aluminum alloy.

[0054] The material of the back plate ring 3 can be any one of A5000 series aluminum, A6000 series aluminum, and A2000 series aluminum.

[0055] The target assembly manufacturing process of this embodiment is as follows Figure 2 As shown in the figure above, the annular protrusion 2 is welded to the backing plate ring 3, and the welding head 5 is inserted from the back of the backing plate ring 3 close to the outer side until it contacts or extends into the annular protrusion 2. During the welding process, the welding head 5 gradually moves toward the inner side of the backing plate ring 3. After the welding head 5 contacts the target body 1, it continues to move toward the target body 1 while gradually reducing the insertion depth of the welding head 5. After the welding is completed, adaptive cutting is performed to obtain a target assembly product that can be used for sputtering, such as Figure 2 As shown in the figure below.

[0056] The moving distance of the welding head 5 in the target body 1 can be 0.1 to 3 mm.

[0057] In the above manufacturing process, the welding can be performed by friction stir welding or electron beam welding.

[0058] Example 3

[0059] This embodiment specifically introduces another structure, manufacturing process and corresponding products of the target assembly of the present invention.

[0060] The structure of the target assembly is as follows Figure 3 As shown in the above figure, it includes the sputtering target material as introduced in Example 1, a backing ring 3 arranged on the back side of the annular protrusion 2, and a front ring 4 arranged on the front side of the annular protrusion 2.

[0061] The outer side surface of the back plate ring 3 is flush with the outer side surface of the annular protrusion 2 .

[0062] The back side of the back plate ring 3 is flush with the back side of the target body 1 .

[0063] The inner side surface of the backing plate ring 3 matches the outer side surface of the target body 1 located behind the annular protrusion 2 .

[0064] The material of the sputtering target can be any one of pure aluminum, aluminum-copper alloy, aluminum-silicon alloy, and copper-silicon-aluminum alloy.

[0065] The material of the back plate ring 3 can be any one of A5000 series aluminum, A6000 series aluminum, and A2000 series aluminum.

[0066] The outer side surface of the front ring 4 is flush with the outer side surface of the annular protrusion 2 .

[0067] The front surface of the target body 1 is flush with the front surface of the front surface ring 4 , or the front surface of the target body 1 protrudes relative to the front surface of the front surface ring 4 .

[0068] The inner side surface of the front ring 4 matches the outer side surface of the target body 1 located in front of the annular protrusion 2 .

[0069] The material of the front ring 4 can be the same as that of the back plate ring 3 .

[0070] The target assembly manufacturing process of this embodiment is as follows Figure 3 As shown in the figure above, the annular protrusion 2 is welded to the back plate ring 3 and the front ring 4. The welding head 5 is inserted from the back of the back plate ring 3 close to the outer side until it contacts or extends into the front ring 4. During the welding process, the welding head 5 gradually moves toward the inner side of the back plate ring 3. After the welding head 5 contacts the target body 1, it continues to move toward the target body 1 while gradually reducing the insertion depth of the welding head 5. After the welding is completed, adaptive cutting is performed to obtain a target assembly product that can be used for sputtering, such as Figure 3 As shown in the figure below.

[0071] The moving distance of the welding head 5 in the target body 1 can be 0.1 to 3 mm.

[0072] In the above manufacturing process, the welding can be performed by friction stir welding or electron beam welding.

[0073] In addition, it should be understood that after reading the above description of the present invention, those skilled in the art may make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the claims attached to this application.

Claims

1. A sputtering target, characterized in that: It comprises a target body (1); The target body (1) has a side surface that bulges outward to form an annular convex portion (2), and the annular convex portion (2) is located at a position for fixed connection with a base flange; The front surface of the target body (1) is convex relative to the front surface of the annular convex portion (2), and the back surface of the target body (1) is convex relative to the back surface of the annular convex portion (2); The annular protrusion (2) and the back plate ring (3), or the back plate ring (3) and the front ring (4), are integrally welded and fixedly connected to the base flange as a high-strength connection; the welding position is concentrated in the annular protrusion (2) area; the annular protrusion (2) and the back plate ring (3) are welded together, and the welding head is inserted from the back side of the back plate ring (3) close to the outer side until it contacts or extends into the annular protrusion (2), and the welding head gradually moves toward the inner side of the back plate ring (3) during the welding process; or, the annular protrusion (2) and the back plate ring (3) and the front ring (4) are welded together, and the welding head is inserted from the back side of the back plate ring (3) close to the outer side until it contacts or extends into the front ring (4), and the welding head gradually moves toward the inner side of the back plate ring (3) during the welding process; The front side of the target body (1) is a surface for sputtering, and the back side of the target body (1) is another surface opposite to the sputtering surface; the annular convex portion (2) is located between the front side and the back side of the target body (1), the front side of the target body (1) being relatively closer to the sputtering surface, and the back side of the target body (1) being relatively closer to the back side of the target body (1) and being opposite to the front side of the annular convex portion (2).

2. A target assembly, characterized in that: It comprises the sputtering target material as claimed in claim 1 and a back plate ring (3) arranged on the back side of the annular protrusion (2).

3. The target assembly according to claim 2, characterized in that: The outer side surface of the back plate ring (3) is flush with the outer side surface of the annular protrusion (2); The back surface of the back plate ring (3) is flush with the back surface of the target body (1); The inner side surface of the back plate ring (3) is matched with the outer side surface of the target body (1) located behind the annular protrusion (2).

4. The target assembly according to claim 2 or 3, characterized in that: The target assembly also includes a front ring (4) arranged on the front side of the annular protrusion (2).

5. The target assembly according to claim 4, characterized in that: The outer side surface of the front ring (4) is flush with the outer side surface of the annular protrusion (2); The front surface of the target body (1) is flush with the front surface of the front ring (4), or the front surface of the target body (1) protrudes relative to the front surface of the front ring (4); The inner side surface of the front ring (4) is matched with the outer side surface of the target body (1) located in front of the annular protrusion (2).

6. The target assembly according to claim 4, characterized in that: The material of the front ring (4) is the same as that of the back plate ring (3).

7. The method for manufacturing a target assembly according to claim 2 or 3, characterized in that: include: The annular protrusion (2) and the back plate ring (3) are welded together, and the welding head is inserted from the back side of the back plate ring (3) close to the outer side until it contacts or extends into the annular protrusion (2). During the welding process, the welding head gradually moves toward the inner side of the back plate ring (3).

8. The method for manufacturing a target assembly according to any one of claims 4 to 6, characterized in that: include: The annular protrusion (2) is welded to the back plate ring (3) and the front ring (4), and the welding head is inserted from the back side of the back plate ring (3) close to the outer side until it contacts or extends into the front ring (4). During the welding process, the welding head gradually moves toward the inner side of the back plate ring (3).

9. The method for manufacturing a target assembly according to claim 7 or 8, characterized in that: The welding is performed by friction stir welding or electron beam welding.

10. The method for manufacturing a target assembly according to claim 7 or 8, characterized in that: During the welding process, the welding head gradually moves toward the inner side of the back plate ring (3) until it contacts the target body (1), and then continues to move toward the target body (1) while gradually reducing the insertion depth of the welding head.

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