Color filter, display panel and method for preparing color filter

Abstract

The present invention discloses a color filter, a display panel and a method for preparing the color filter. The color filter comprises a first protective layer, a plurality of color photoresist units and a filter layer. A plurality of grooves are arranged on the first protective layer; the plurality of color photoresist units comprise a red photoresist unit, a green photoresist unit and a blue photoresist unit, each color photoresist unit fills a groove, and the thickness of the color photoresist unit is greater than the depth of the groove; the filter layer comprises filter units arranged in an array, and the filter units arranged in an array comprise a red filter unit, a blue filter unit and a green filter unit. The technical solution of the embodiment of the present invention reduces the risk of light leakage between pixels by arranging a color photoresist unit whose color is different from the filter unit and overlaps with the filter unit between two adjacent filter units of different colors, and the color photoresist can meet the demand for higher resolution.

Description

Technical Field

[0001] The embodiments of the present invention relate to silicon-based OLED display technology, and more particularly to a color filter, a display panel, and a method for preparing the color filter. Background Art

[0002] In recent years, as the demand for VR / AR technology has gradually increased, the display screens used for VR / AR technology have received more and more attention. Compared with LCD screens, silicon-based OLED displays have the advantages of relatively simple structure, thinner thickness, higher contrast, higher resolution, and faster refresh rate. Therefore, silicon-based OLED displays are currently a more suitable choice for displays used in VR / AR products.

[0003] Silicon-based OLED displays mainly use luminescent materials and color filter technology to achieve colorization. However, there is a certain distance between the color filter and the luminescent material, which leads to light leakage between pixels, affecting the product yield and color gamut. In the existing technology, low-temperature BM materials are often used to fill between pixels to block light leakage, but the resolution of BM materials is low and cannot meet the high resolution required by VR / AR technology.

[0004] Based on this, designing color filters with higher resolution to improve the phenomenon of light leakage between pixels when silicon-based OLED displays are colored has become an urgent problem to be solved in the industry. Summary of the invention

[0005] The present invention provides a color filter, a display panel and a method for preparing the color filter, so as to reduce the risk of light leakage between pixels in a silicon-based OLED display device.

[0006] In a first aspect, an embodiment of the present invention provides a color filter, the color filter comprising:

[0007] A first protective layer, wherein a plurality of grooves are arranged on the first protective layer;

[0008] A plurality of color photoresist units, the plurality of color photoresist units comprising a red photoresist unit, a green photoresist unit and a blue photoresist unit, each color photoresist unit fills a groove, and a thickness of the color photoresist unit is greater than a depth of the groove;

[0009] A filter layer, the filter layer includes filter units arranged in an array, and the filter units arranged in an array include a red filter unit, a blue filter unit and a green filter unit;

[0010] Among them, at least one color photoresist unit is arranged between adjacent filter units, and at least one of the at least one color photoresist unit is different in color from the two filter units; along the thickness direction of the first protective layer and in the direction perpendicular to the thickness direction, the color photoresist unit overlaps with the two filter units of different colors.

[0011] Optionally, the groove is a through groove.

[0012] Optionally, the color photoresist unit includes a color photoresist column, and only one color photoresist column is arranged between two adjacent filter units.

[0013] Optionally, the portion of the colored photoresist column protruding from the groove includes a first sub-portion, a second sub-portion and a third sub-portion which are integrally connected in sequence; one of two adjacent different-color filter units covers the first sub-portion, the other covers the third sub-portion, and the gap between the two exposes the second sub-portion.

[0014] Optionally, a first color photoresist column, a second color photoresist column and a third color photoresist column are arranged side by side between two adjacent filtering units, and the arrangement direction of the first color photoresist column, the second color photoresist column and the third color photoresist column is perpendicular to the thickness direction of the first protective layer, and the colors of the first color photoresist column, the second color photoresist column and the third color photoresist column are different.

[0015] Optionally, the color of the second color photoresist column arranged between two adjacent filter units is different from the colors of the two filter units.

[0016] Optionally, the color filter further includes a second protective layer, and the second protective layer covers the filter units and the color photoresist units exposed between adjacent filter units.

[0017] In a second aspect, an embodiment of the present invention further provides a display panel, the display panel comprising:

[0018] substrate;

[0019] A light emitting device layer is disposed on the substrate;

[0020] An encapsulation layer, encapsulating a light-emitting device layer;

[0021] The color filter is arranged on a side of the encapsulation layer away from the substrate, wherein the color filter adopts the color filter described in the first aspect, and the first protective layer is in contact with the encapsulation layer.

[0022] In a third aspect, an embodiment of the present invention further provides a method for preparing a color filter, the method comprising:

[0023] forming a first protective layer, wherein the first protective layer is provided with a groove;

[0024] Forming a plurality of color photoresist units filling the grooves, the plurality of color photoresist units comprising a red photoresist unit, a green photoresist unit and a blue photoresist unit, each color photoresist unit filling a groove, and a thickness of the color photoresist unit being greater than a depth of the groove;

[0025] forming a filter layer on the first protective layer, wherein the filter layer comprises filter units arranged in an array, wherein the filter units arranged in an array comprise a red filter unit, a blue filter unit and a green filter unit;

[0026] Among them, at least one color photoresist unit is formed between two adjacent filter units of different colors, and at least one of the at least one color photoresist is different in color from the two filter units; along the thickness direction of the first protective layer and in the direction perpendicular to the thickness direction, the color photoresist unit overlaps with the two filter units of different colors.

[0027] Optionally, forming a plurality of color photoresist units filling the grooves comprises:

[0028] Forming a first color photoresist layer on the first protective layer to fill the groove and cover the first protective layer;

[0029] Etching the first color photoresist layer, retaining the corresponding groove and the first color photoresist layer above the groove to form a first color photoresist unit;

[0030] forming a second color photoresist layer filling the groove and covering the first protection layer on the first protection layer, wherein the second color photoresist layer exposes the first color photoresist unit;

[0031] Etching the second color photoresist layer, retaining the corresponding groove and the second color photoresist layer above the groove to form a second color photoresist unit;

[0032] Forming a third color photoresist layer on the first protection layer to fill the groove and cover the first protection layer, wherein the third color photoresist layer exposes the first color photoresist unit and the second color photoresist unit;

[0033] The third color photoresist layer is etched to retain the corresponding groove and the third color photoresist layer above the groove to form a third color photoresist unit.

[0034] The technical solution of the present invention is to set a plurality of grooves on the first protective layer of the color filter, fill each groove with a color photoresist unit, and the thickness of the color photoresist unit is greater than the depth of the groove. The filter units arranged in an array in the filter layer are alternately arranged in different colors, and the color photoresist unit overlaps with two adjacent filter units of different colors in the thickness direction of the first protective layer and in a direction perpendicular to the thickness direction. The color filter set in this way can make the light irradiated by the pixel to other filter units pass through the color photoresist unit with a color different from that of the filter unit, so that almost no light is emitted, thereby reducing the risk of light leakage between pixels, and the resolution of the color photoresist can meet the higher resolution requirements required by the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 A structural diagram of a color filter provided by an embodiment of the present invention;

[0036] Figure 2 is a structural diagram of another color filter provided by an embodiment of the present invention;

[0037] Figure 3 is a structural diagram of another color filter provided by an embodiment of the present invention;

[0038] Figure 4 is a flow chart of a method for preparing a color filter provided by an embodiment of the present invention;

[0039] Figure 5-Figure 7 is a structural diagram corresponding to step S110 to step S130 in a method for preparing a color filter provided by an embodiment of the present invention;

[0040] Figure 8 is a flowchart of a detailed method of step S120 in a method for preparing a color filter provided by an embodiment of the present invention;

[0041] Figure 9-Figure 14 It is a structural diagram corresponding to step S1201 to step S1206 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0042] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0043] An embodiment of the present invention provides a color filter. Figure 1 FIG. 1 is a structural diagram of a color filter provided by an embodiment of the present invention. Figure 1As shown, the color filter includes: a first protection layer 10 , a plurality of color photoresist units 20 and a filter layer 30 .

[0044] A plurality of grooves are disposed on the first protection layer 10 .

[0045] The plurality of color photoresist units 20 include a red photoresist unit 21 , a green photoresist unit 22 and a blue photoresist unit 23 . Each color photoresist unit 20 fills a groove, and a thickness of the color photoresist unit 20 is greater than a depth of the groove.

[0046] The filter layer 30 includes filter units arranged in an array, and the filter units arranged in an array include a red filter unit 31 , a blue filter unit 32 and a green filter unit 33 .

[0047] Among them, at least one color photoresist unit 20 is arranged between adjacent filter units, and at least one of the at least one color photoresist unit 20 has a color different from that of the two filter units; along the thickness direction of the first protective layer 10 and in a direction perpendicular to the thickness direction, the color photoresist unit 20 overlaps with two filter units of different colors.

[0048] Specifically, the first protective layer 10 can be an OC optical adhesive, which is used to protect the thin film encapsulation layer of the lower encapsulated pixels and is used to realize the process of colorization of the display device. OC optical adhesive is an optically transparent adhesive with high adhesion and peel strength, resistance to ultraviolet light, easy processing, and controllable thickness. A plurality of grooves are provided on the first protective layer 10 for filling with color photoresist, and work together with the filter layer 30 to reduce the risk of light leakage between adjacent pixels.

[0049] The plurality of color photoresist units 20 may include a red photoresist unit 21, a green photoresist unit 22, and a blue photoresist unit 23. Each color photoresist unit 20 is used to work together with the filter layer 30, so that when the white light emitted by the pixel to the adjacent filter unit passes through the color photoresist unit 20 and the filter unit in the filter layer 30 in turn, most of the light can be filtered out, so that almost no light is emitted, thereby reducing the risk of light leakage; and the white light emitted by the pixel to the filter unit facing it passes through the filter unit and emits colored light, thereby realizing the colorization of the silicon-based OLED display. For silicon-based OLED display panels, the pixel size is generally about 5μm, and the pixel pitch is less than 0.5μm. Compared with low-temperature BM materials, color photoresist has a higher resolution and can be patterned at a position where the pixel pitch is less than 0.5μm. The color photoresist unit 20 is respectively filled in each groove set on the first protective layer 10, and the thickness of the color photoresist unit 20 is greater than the depth of the groove, so that the color photoresist unit 20 can filter a wider range of light and improve the effect of preventing light leakage.

[0050] The filter layer 30 includes filter units arranged in an array, and the filter units are located above each pixel and directly opposite to the position of the pixel. The size of the filter unit is generally larger than the pixel size, and the thickness of the thin film encapsulation layer is reduced to reduce the distance between the pixel and the filter layer 30, so that the filter unit can contain the range of light emitted by the corresponding pixel as much as possible, better realize colorization, and reduce light leakage. The filter unit can include a red filter unit 31, a blue filter unit 32, and a green filter unit 33, and filter units of different colors are alternately arranged, and the colors of two adjacent filter units are different. When white light is irradiated on the filter unit, only light with the same wavelength range as the wavelength range of light corresponding to the color of the filter unit can be emitted, thereby realizing the conversion of white light into colored light.

[0051] A color photoresist unit 20 is arranged between two adjacent filter units, and the number of the color photoresist unit 20 is at least one, and a plurality of color photoresist units 20 may also be arranged, without any limitation herein. Among the arranged color photoresist units 20, at least one has a color different from that of the two adjacent filter units. And along the thickness direction of the first protective layer 10, i.e. the vertical direction, and the direction perpendicular to the thickness direction, i.e. the horizontal direction, there are overlapping parts between the color photoresist unit 20 and the two adjacent filter units of different colors. If the color photoresist unit 20 and the filter unit do not overlap in both the vertical and horizontal directions, the light emitted by the pixel may still leak out from the gap. The color photoresist unit 20 and the filter unit are arranged to overlap each other, which can effectively reduce the risk of light leakage.

[0052] The technical solution of the embodiment of the present invention is to set a plurality of grooves on the first protective layer of the color filter, fill each groove with a color photoresist unit, and the thickness of the color photoresist unit is greater than the depth of the groove. The filter units arranged in an array in the filter layer are alternately arranged in different colors, and the color photoresist unit overlaps with two adjacent filter units of different colors in the thickness direction of the first protective layer and in a direction perpendicular to the thickness direction. The color filter set in this way can make the light irradiated by the pixel to other filter units pass through the color photoresist unit of a different color from the filter unit, so that almost no light is emitted, thereby reducing the risk of light leakage between pixels, and the resolution of the color photoresist can meet the higher resolution requirements required by the product.

[0053] Optionally, based on the above embodiment, continue to refer to Figure 1 , the groove is a through groove.

[0054] Specifically, the grooves arranged on the first protective layer 10 are all through grooves, so that the prepared color photoresist unit 20 can penetrate the first protective layer 10, thereby maximally receiving the light emitted by the pixel to other filter units, and effectively improving the phenomenon of light leakage between pixels.

[0055] Optionally, based on the above embodiment, continue to refer to Figure 1 The color photoresist unit 20 includes a color photoresist column, and only one color photoresist column is arranged between two adjacent filter units.

[0056] Specifically, the color photoresist unit 20 may include a color photoresist column, which is formed by filling a groove set on the first protective layer 10 with color photoresist. Since the thickness of the color photoresist column is greater than the depth of the groove, the color photoresist column protrudes from the surface of the pixel away from the groove. Only one color photoresist column can be set between two adjacent filter units of different colors, and the color of the color photoresist column is different from the colors of the two adjacent filter units. Optionally, the part of the color photoresist column protruding from the groove includes a first sub-section, a second sub-section and a third sub-section that are connected in sequence as a whole; one of the two adjacent filter units of different colors covers the first sub-section, the other covers the third sub-section, and the gap between the two exposes the second sub-section. Specifically, the part of the color photoresist column protruding from the groove can be divided into three parts: a first sub-section, a second sub-section and a third sub-section. Wherein, the first sub-portion is covered by an adjacent filter unit of a different color, and the third sub-portion is covered by another adjacent filter unit of a different color, then the overlapping portion of the color photoresist column and the adjacent filter unit of a different color can achieve the filtering effect of the black matrix material set between the filter units in the prior art; similarly, the overlapping portion of the color photoresist column and the adjacent filter unit of a different color can also achieve the filtering effect of the black matrix material. The exposed second sub-portion is located in the gap between the coverage areas of the two adjacent filter units of different colors. When the white light emitted by the pixel to the filter unit facing it passes through the filter unit, a colored light of the same color as the filter unit can be emitted, thus realizing colorization; when the white light emitted by the pixel to other adjacent filter units passes through the colored photoresist column arranged at the gap position between two adjacent filter units, the first sub-portion of the colored photoresist column covered by an adjacent filter unit, and the adjacent filter unit in sequence, or passes through the colored photoresist column arranged at the gap position between two adjacent filter units, the third sub-portion of the colored photoresist column covered by another adjacent filter unit, and the adjacent filter unit in sequence, almost no light is emitted. Such an arrangement can simplify the preparation process and ensure that the light emitted by the pixel to other adjacent filter units passes through the colored photoresist columns and filter units of different colors in sequence, thus achieving the effect of reducing light leakage between pixels.

[0057] Optional, Figure 2FIG. 1 is a structural diagram of another color filter provided by an embodiment of the present invention. Figure 2 As shown, a first color photoresist column 201, a second color photoresist column 202 and a third color photoresist column 203 are arranged side by side between two adjacent filter units, and the arrangement direction of the first color photoresist column 201, the second color photoresist column 202 and the third color photoresist column 203 is perpendicular to the thickness direction of the first protective layer 10, and the colors of the first color photoresist column 201, the second color photoresist column 202 and the third color photoresist column 203 are all different.

[0058] Specifically, only one color photoresist column different from the color of the filter unit can be set between two adjacent filter units of different colors, or a plurality of color photoresist columns can be set between two adjacent filter units. Exemplarily, three color photoresist columns of different colors can be set between two adjacent filter units, namely, the first color photoresist column 201, the second color photoresist column 202 and the third color photoresist column 203. Moreover, the three color photoresist columns are arranged side by side in sequence along the direction perpendicular to the thickness direction of the first protective layer 10, so that the three color photoresist columns can achieve the filtering effect equivalent to the black matrix material. Similarly, the color photoresist unit formed by the three color photoresist columns arranged in sequence also overlaps with the two adjacent filter units, and the overlapping part is located along the thickness direction of the first protective layer 10 and the direction perpendicular to the thickness direction, so that the phenomenon of light leakage of pixels between the two adjacent filter units can be effectively avoided. The colors of the first color photoresist column 201 , the second color photoresist column 202 and the third color photoresist column 203 are related to the colors of two adjacent filter units.

[0059] Exemplarily, the color of the second color photoresist column 202 set between two adjacent filter units is different from the colors of the two filter units. Specifically, since the light emitted by the pixel to other filter units will definitely pass through the second color photoresist column 202 located in the middle of the color photoresist columns set side by side between the two adjacent filter units. Therefore, the color of the second color photoresist column 202 is set to be different from the colors of the two adjacent filter units, while the colors of the first color photoresist column 201 and the third color photoresist column 203 are not limited, which can minimize the light leakage between pixels. For example: if the two adjacent filter units are red and green respectively, the color of the second color photoresist column 202 should be blue, the first color photoresist column 201 can be red, and the third color photoresist column 203 can be green; or the second color photoresist column 202 is blue, the first color photoresist column 201 can be green, and the third color photoresist column 203 can be red.

[0060] Optional, Figure 3FIG. 1 is a structural diagram of another color filter provided by an embodiment of the present invention. Figure 3 As shown, the color filter further includes a second protective layer 40, and the second protective layer 40 covers the filter units and the color photoresist units exposed between adjacent filter units.

[0061] Specifically, the second protective layer 40 can be an optical OC glue, which covers the filter units arranged in an array and the second sub-portion of the protruding groove portion of the color photoresist unit exposed between adjacent filter units. The second protective layer 40 can protect the filter units arranged in an array on the first protective layer 10, and because the optical OC glue used has an optically transparent property, it will not affect the white light from passing through the filter unit, thereby realizing the colorization of the silicon-based OLED display device.

[0062] The embodiment of the present invention also provides a display panel. Figure 3 The display panel includes: a substrate 50, a light emitting device layer 60, an encapsulation layer 70 and a color filter 80.

[0063] The light emitting device layer 60 is disposed on the substrate 50;

[0064] The encapsulation layer 70 encapsulates the light emitting device layer 60;

[0065] The color filter 80 is disposed on a side of the encapsulation layer 70 away from the substrate 50 , wherein the color filter 80 is the color filter described in any of the above embodiments, and the first protection layer 10 is in contact with the encapsulation layer 70 .

[0066] Specifically, the display panel includes the color filter 80 described in the above embodiment, which can effectively reduce the risk of light leakage between pixels; and the color photoresist used has a high resolution, which can meet the product's display screen requirements for high resolution.

[0067] The embodiment of the present invention also provides a method for preparing a color filter. Figure 4 FIG. 1 is a flow chart of a method for preparing a color filter provided by an embodiment of the present invention. Figure 4 As shown, the color filter preparation method specifically includes the following steps:

[0068] S110, forming a first protective layer, wherein a groove is provided on the first protective layer.

[0069] Specifically, Figure 5 FIG. 1 is a structural diagram corresponding to step S110 in a method for preparing a color filter provided in an embodiment of the present invention. Figure 5As shown, a layer of optical OC glue of a certain thickness is evenly applied on the thin film packaging layer of the packaged device to form a first protective layer 10. A patterning process is performed on the first protective layer 10 to expose a rectangular pattern slightly larger than the spacing size at a position corresponding to the spacing between two adjacent pixels. After developing and removing part of the photoresist, a groove 90 is etched.

[0070] S120, forming a plurality of color photoresist units filling the grooves, the plurality of color photoresist units including a red photoresist unit, a green photoresist unit and a blue photoresist unit, each color photoresist unit filling a groove, and a thickness of the color photoresist unit being greater than a depth of the groove.

[0071] Specifically, Figure 6 FIG. 1 is a structural diagram corresponding to step S120 in a method for preparing a color filter provided in an embodiment of the present invention. Figure 6 As shown, a color photoresist is uniformly applied on a first protective layer 10 provided with grooves, so that the color photoresist is filled in each groove to form a plurality of color photoresist units 20. The color photoresist unit 20 may include a red photoresist unit, a green photoresist unit, and a blue photoresist unit. When uniformly applying the color photoresist, the color sequence of the photoresist is not limited here. After the formed color photoresist unit 20 is filled in the groove, a patterning process is performed on the color photoresist film, and then a part of the color photoresist is removed by development, and the color photoresist unit 20 filled in the groove position corresponding to the color of the color photoresist is retained, and the exposed surface of the color photoresist unit 20 protrudes out of the groove.

[0072] S130, forming a filter layer on the first protective layer, wherein the filter layer includes filter units arranged in an array, and the filter units arranged in an array include a red filter unit, a blue filter unit, and a green filter unit;

[0073] Among them, at least one color photoresist unit is formed between two adjacent filter units of different colors, and at least one of the at least one color photoresist is different in color from the two filter units; along the thickness direction of the first protective layer and in the direction perpendicular to the thickness direction, the color photoresist unit overlaps with the two filter units of different colors.

[0074] Specifically, Figure 7 FIG. 1 is a structural diagram corresponding to step S130 in a method for preparing a color filter provided by an embodiment of the present invention. Figure 7As shown, on the first protective layer 10 filled with a plurality of color photoresist units, a plurality of filter units arranged in an array are arranged by exposure and development to form a filter layer 30. The filter units may include a red filter unit 31, a blue filter unit 32, and a green filter unit 33, and the colors of two adjacent filter units of different colors are different from the colors of the corresponding color photoresist units below the spacing between the two filter units. The two adjacent filter units cover the part of the protruding groove of the color photoresist unit, so that in the thickness direction of the first protective layer 10 and in the direction perpendicular to the thickness direction, the two filter units of different colors and the color photoresist unit have overlapping parts, thereby reducing the risk of light leakage between pixels.

[0075] The color filter obtained by the color filter preparation method provided by the embodiment of the present invention can make the light emitted by the pixel to other filter units almost not be emitted after passing through the color filter. It effectively prevents light leakage between pixels, and the color photoresist used has a high resolution, which can meet the product's requirements for the resolution of silicon-based OLED display screens.

[0076] Optional, Figure 8 FIG. 1 is a flowchart of a detailed method of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Figure 8 As shown, in the color filter preparation method, the step of forming a plurality of color photoresist units filling the grooves specifically includes the following steps:

[0077] S1201, forming a first color photoresist layer on the first protective layer to fill the groove and cover the first protective layer.

[0078] Specifically, Fig. 9 1 is a structural diagram corresponding to step S1201 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig. 9 As shown, exposure and development are performed on the first protective layer 10, and after the grooves are etched, a first color photoresist layer 23 is formed on the first protective layer 10, and the first color photoresist 23 fills all the grooves.

[0079] S1202, etching the first color photoresist layer, retaining the corresponding groove and the first color photoresist layer above the groove to form a first color photoresist unit.

[0080] Specifically, Fig.10 1 is a structural diagram corresponding to step S1202 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig.10As shown, the first color photoresist layer 23 is exposed to achieve patterning, and after development and removal of part of the color photoresist, the grooves that do not need to be filled with the first color photoresist and the first color photoresist units 23 formed by the first color photoresist in the corresponding grooves are retained.

[0081] S1203 , forming a second color photoresist layer on the first protection layer to fill the groove and cover the first protection layer, wherein the second color photoresist layer exposes the first color photoresist unit.

[0082] Specifically, Fig.11 1 is a structural diagram corresponding to step S1203 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig.11 As shown, a second color photoresist layer 22 is formed on the first protection layer 10 , and the second color photoresist 22 fills all the remaining grooves. The second color photoresist layer 22 exposes the first color photoresist unit 23 .

[0083] S1204, etching the second color photoresist layer, retaining the corresponding groove and the second color photoresist layer above the groove to form a second color photoresist unit.

[0084] Specifically, Fig.12 1 is a structural diagram corresponding to step S1204 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig.12 As shown, the second color photoresist layer 22 is exposed to achieve patterning, and after development and removal of part of the color photoresist, the grooves that do not need to be filled with the second color photoresist and the second color photoresist units 22 formed by the second color photoresist in the corresponding grooves are retained.

[0085] S1205 , forming a third color photoresist layer on the first protective layer to fill the groove and cover the first protective layer, wherein the third color photoresist layer exposes the first color photoresist unit and the second color photoresist unit.

[0086] Specifically, Fig.13 1 is a structural diagram corresponding to step S1205 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig.13 As shown, a third color photoresist layer 21 is formed on the first protection layer 10 and the third color photoresist 21 fills all other grooves. The third color photoresist layer 21 exposes the first color photoresist unit 23 and the second color photoresist unit 22.

[0087] S1206 , etching the third color photoresist layer, retaining the corresponding groove and the third color photoresist layer above the groove to form a third color photoresist unit.

[0088] Specifically, Fig.141 is a structural diagram corresponding to step S1206 of step S120 in a method for preparing a color filter provided by an embodiment of the present invention. Fig.14 As shown, the third color photoresist layer 21 is exposed to achieve patterning, and after development and removal of part of the color photoresist, the grooves that do not need to be filled with the third color photoresist and the third color photoresist units 21 formed by the third color photoresist in the corresponding grooves are retained.

[0089] Note that the above are only preferred embodiments of the present invention and the technical principles used. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and that various obvious changes, readjustments and substitutions can be made by those skilled in the art without departing from the scope of protection of the present invention. Therefore, although the present invention has been described in more detail through the above embodiments, the present invention is not limited to the above embodiments, and may include more other equivalent embodiments without departing from the concept of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims

1. A color filter, characterized in that: include: a first protective layer, wherein a plurality of grooves are provided on the first protective layer; A plurality of color photoresist units, the plurality of color photoresist units comprising a red photoresist unit, a green photoresist unit and a blue photoresist unit, each of the color photoresist units fills one of the grooves, and a thickness of the color photoresist unit is greater than a depth of the groove; A filter layer, the filter layer comprising filter units arranged in an array, the filter units arranged in an array comprising a red filter unit, a blue filter unit and a green filter unit; Wherein, the color photoresist unit is arranged between adjacent filter units, and the color of the color photoresist unit is different from that of the two adjacent filter units; along the thickness direction of the first protective layer and in a direction perpendicular to the thickness direction, the color photoresist unit overlaps with the two adjacent filter units of different colors; Wherein, the color photoresist unit includes a first color photoresist column, a second color photoresist column and a third color photoresist column; The first color photoresist column, the second color photoresist column and the third color photoresist column are arranged side by side between two adjacent filtering units, the arrangement direction of the first color photoresist column, the second color photoresist column and the third color photoresist column is perpendicular to the thickness direction of the first protective layer, and the colors of the first color photoresist column, the second color photoresist column and the third color photoresist column are all different; one of the two adjacent filtering units of different colors covers the first color photoresist column, the other covers the third color photoresist column, and the gap between the two exposes the second color photoresist column.

2. The color filter according to claim 1, characterized in that: The groove is a through groove.

3. The color filter according to claim 1, characterized in that: The color of the second color photoresist column arranged between two adjacent filter units is different from the colors of the two filter units.

4. The color filter according to claim 1, wherein: It also includes a second protective layer, which covers the filter units and the color photoresist units exposed between adjacent filter units.

5. A display panel, characterized in that: include: substrate; A light emitting device layer is disposed on the substrate; An encapsulation layer, encapsulating the light-emitting device layer; A color filter is arranged on a side of the encapsulation layer away from the substrate, wherein the color filter adopts the color filter according to any one of claims 1 to 4, and the first protective layer is in contact with the encapsulation layer.

6. A method for preparing a color filter, characterized in that: include: forming a first protective layer, wherein the first protective layer is provided with a groove; Forming a plurality of color photoresist units filling the grooves, the plurality of color photoresist units comprising a red photoresist unit, a green photoresist unit and a blue photoresist unit, each of the color photoresist units filling one of the grooves, and a thickness of the color photoresist unit being greater than a depth of the grooves; forming a filter layer on the first protective layer, wherein the filter layer comprises filter units arranged in an array, wherein the filter units arranged in an array comprise a red filter unit, a blue filter unit and a green filter unit; The color photoresist unit is formed between two adjacent filter units of different colors, and the color of the color photoresist unit is different from that of the two adjacent filter units; along the thickness direction of the first protective layer and in a direction perpendicular to the thickness direction, the color photoresist unit overlaps with the two adjacent filter units of different colors; Wherein, the color photoresist unit includes a first color photoresist column, a second color photoresist column and a third color photoresist column; The first color photoresist column, the second color photoresist column and the third color photoresist column are arranged side by side between two adjacent filtering units, the arrangement direction of the first color photoresist column, the second color photoresist column and the third color photoresist column is perpendicular to the thickness direction of the first protective layer, and the colors of the first color photoresist column, the second color photoresist column and the third color photoresist column are all different; one of the two adjacent filtering units of different colors covers the first color photoresist column, the other covers the third color photoresist column, and the gap between the two exposes the second color photoresist column.

7. The method according to claim 6, characterized in that Forming a plurality of color photoresist units filling the grooves, comprising: forming a first color photoresist layer on the first protective layer to fill the groove and cover the first protective layer; Etching the first color photoresist layer to retain the corresponding groove and the first color photoresist layer above the groove to form a first color photoresist unit; forming a second color photoresist layer on the first protection layer to fill the groove and cover the first protection layer, wherein the second color photoresist layer exposes the first color photoresist unit; Etching the second color photoresist layer, retaining the corresponding groove and the second color photoresist layer above the groove to form a second color photoresist unit; forming a third color photoresist layer on the first protection layer to fill the groove and cover the first protection layer, wherein the third color photoresist layer exposes the first color photoresist unit and the second color photoresist unit; The third color photoresist layer is etched to retain the corresponding groove and the third color photoresist layer above the groove to form a third color photoresist unit.

Images