A device and method for measuring high voltage direct current interference corrosion rate

Abstract

The present application discloses a high-voltage direct current interference corrosion rate measurement device and method, the device includes: a first and a second corrosion rate probe, a first and a second anti-interference unit, a first and a second data acquisition unit and a data processing unit. The two corrosion rate probes can be buried at any target detection position in the soil environment of the high-voltage direct current grounding electrode, the two data acquisition units collect the current value of the current to be measured flowing through the two corrosion rate probes, the data processing unit obtains the current value, and according to the exposed area of ​​the corrosion rate probe, the corrosion rate of the buried metal in the soil environment when the high-voltage direct current grounding electrode is in anode operation and cathode operation can be determined respectively. Furthermore, even if there is no buried metal near the high-voltage direct current grounding electrode, the present device can predict the corrosion rate of the buried metal to be built near the high-voltage direct current grounding electrode based on the detection of the target detection position, and can make a predictive analysis of the corrosion situation of the planned buried metal.

Description

Technical Field

[0001] The present application relates to the technical field of electrical corrosion measurement, and more specifically, to a device and method for measuring a corrosion rate using high voltage direct current interference. Background Art

[0002] In recent years, with the rapid development of high-voltage direct current transmission technology, the problem of electrochemical corrosion caused by high-voltage direct current grounding interference has become increasingly prominent.

[0003] When the high-voltage DC grounding electrode is in monopole operation, the corrosion conditions of the buried metal structures near the high-voltage DC grounding electrode under the two states of anode operation and cathode operation are obtained. The implementation methods and existing problems of the prior art generally include the following: First, detection points are set at both the sending-end grounding electrode and the receiving-end grounding electrode, and a set of detection equipment is set up at both ends, which results in a large hardware cost; second, the detection time range of the detection points of the buried metal structures covers the two processes of anode operation and cathode operation of the high-voltage DC grounding electrode in monopole operation. However, the time interval between the two processes of anode operation and cathode operation of the high-voltage DC grounding electrode in monopole operation has a large uncertainty, which may be several hours, days, months, or even years. Therefore, if you want to ensure that the detection data covers the two interference processes, the required cost is high and the timeliness is poor.

[0004] Therefore, a high-voltage direct current interference corrosion rate measurement device and method that can simultaneously detect anode operation and cathode operation at a single-ended grounding electrode and has high timeliness is very important. Summary of the invention

[0005] In view of this, the present application provides a high-voltage DC interference corrosion rate measurement device and method, which is used to efficiently and simultaneously detect the corrosion rate of buried metal caused by the current generated by the high-voltage DC grounding electrode when the single-ended high-voltage DC single-ended grounding is in anode operation and cathode operation.

[0006] In order to achieve the above objectives, the proposed solution is as follows:

[0007] A high voltage direct current interference corrosion rate measuring device, comprising:

[0008] First and second corrosion rate probes, first and second anti-interference units, first and second data acquisition units and a data processing unit;

[0009] Among them, the first anti-interference unit and the first data acquisition unit are connected in series to form a first branch line, the second anti-interference unit and the second data acquisition unit are connected in series to form a second branch line, the first and second branches are connected in parallel between the first and second corrosion rate probes, the first anti-interference unit is used to filter the interference current flowing from the first corrosion rate probe to the second corrosion rate probe, the second anti-interference unit is used to filter the interference current flowing from the second corrosion rate probe to the first corrosion rate probe, and the first and second corrosion rate probes are respectively used to be buried at the target detection position in the soil environment of the high-voltage DC grounding electrode;

[0010] The first data acquisition unit is used to collect the current to be measured flowing through the first branch line, and the second data acquisition unit is used to collect the current to be measured flowing through the second branch line;

[0011] The data processing unit establishes a communication connection with the first and second data acquisition units to determine the inflow corrosion rate probe and the outflow corrosion rate probe of the current to be measured, and obtain the current value of the current to be measured, and determine the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is operating according to the first exposed area of ​​the inflow corrosion rate probe and the current value, and determine the second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is operating according to the second exposed area of ​​the outflow corrosion rate probe and the current value.

[0012] Preferably, the first and second anti-interference units are diodes.

[0013] Preferably, the first and second data acquisition units are ammeters.

[0014] Preferably, the structural connection between the data processing unit and the first and second data acquisition units includes:

[0015] The data processing unit is integrated on the first data acquisition unit and the second data acquisition unit respectively;

[0016] or,

[0017] The data processing unit is structurally separate from the first data acquisition unit and the second data acquisition unit.

[0018] Preferably, the communication connection mode between the data processing unit and the first and second data acquisition units includes:

[0019] The data processing unit establishes wireless communication connections with the first data acquisition unit and the second data acquisition unit respectively through wireless signals;

[0020] or,

[0021] The data processing unit establishes wired connections with the first data acquisition unit and the second data acquisition unit respectively through data lines.

[0022] A method for measuring a corrosion rate caused by high voltage direct current interference is applied to a data processing unit of the above-mentioned device for measuring a corrosion rate caused by high voltage direct current interference, comprising:

[0023] Acquire the current value collected by the first or second data collection unit, where the current value is the current value of the current to be measured at the target detection position in the soil environment of the high-voltage DC grounding electrode;

[0024] Determine the inflow corrosion rate probe and the first exposure area of ​​the current to be measured, and the outflow corrosion rate probe and the second exposure area of ​​the current to be measured;

[0025] Determine, according to the current value and the first exposure area, a first corrosion rate of buried metal at a target detection position when the high voltage DC grounding electrode anode is in operation;

[0026] A second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is in operation is determined according to the current value and the second exposure area.

[0027] Preferably, the process of determining the first corrosion rate comprises:

[0028] Determine a first current density, a first discharge rate, and a preset corrosion rate calculation constant, wherein the first current density is a ratio of the current value to the first exposure area, and the first discharge rate is a ratio of the operating time of the high-voltage direct current grounding electrode anode to the entire year;

[0029] The product of the first current density, the first discharge rate, and the corrosion rate calculation constant is determined as the first corrosion rate.

[0030] Preferably, the process of determining the second corrosion rate comprises:

[0031] Determine a second current density, a second discharge rate, and a preset corrosion rate calculation constant, wherein the second current density is a ratio of the current value to the second exposure area, and the second discharge rate is a ratio of the cathode operation time of the high-voltage DC grounding electrode to the whole year;

[0032] The product of the second current density, the second discharge rate, and the corrosion rate calculation constant is determined as the second corrosion rate.

[0033] It can be seen from the above scheme that the high-voltage DC interference corrosion rate measurement device provided by the present application, its two corrosion rate probes can be buried at any target detection position in the soil environment of the high-voltage DC grounding electrode, and the data processing unit can determine the corrosion rate of the buried metal in the soil environment when the high-voltage DC grounding electrode is in anode operation and cathode operation, respectively, based on the current value of the current to be measured collected by the data acquisition unit and the exposed area of ​​the corrosion rate probe.

[0034] Furthermore, even if there is no buried metal near the high-voltage DC grounding electrode, the device can predict the corrosion rate of the buried metal structure to be built near the high-voltage DC grounding electrode based on the detection of the target detection position, and can make a predictive analysis of the corrosion conditions of the planned buried metal structures. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying any creative work.

[0036] Figure 1 A schematic structural diagram of a high-voltage DC interference corrosion rate measurement device provided in an embodiment of the present application;

[0037] Figure 2 This is a flow chart of a high-voltage direct current interference corrosion rate measurement method disclosed in an embodiment of the present application. DETAILED DESCRIPTION

[0038] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0039] Next, the high voltage DC interference corrosion rate measuring device of the present application is introduced in detail. Please refer to Figure 1 , Figure 1 This is a schematic diagram of the structure of a high-voltage DC interference corrosion rate measurement device provided in an embodiment of the present application. The device may include:

[0040] A first corrosion rate probe a, a second corrosion rate probe b, a first anti-interference unit D1, a second anti-interference unit D2, a first data acquisition unit A, a second data acquisition unit B and a data processing unit C.

[0041] The current to be measured can flow into the device from the first corrosion rate probe and then flow out of the device from the second corrosion rate probe. The current to be measured can also flow into the device from the second corrosion rate probe and then flow out of the device from the first corrosion rate probe.

[0042] The corrosion rate probe introduced above can be a metal probe for testing corrosion rate parameters, which is used to be buried at the target detection position in the soil environment of the high-voltage DC grounding electrode. In addition, the two corrosion rate probes can be flexibly arranged according to the conditions of the measurement site or according to actual needs. In an optional implementation, the arrangement distance of the two corrosion rate probes can be no less than 10 meters.

[0043] Regarding the connection relationship of the various components of the device, specifically, the first anti-interference unit and the first data acquisition unit can be connected in series to form a first branch line, the second anti-interference unit and the second data acquisition unit can be connected in series to form a second branch line, and the first and second branches can be connected in parallel between the first and second corrosion rate probes. Among them, the first anti-interference unit can be used to filter the interference current flowing from the first corrosion rate probe to the second corrosion rate probe, and the second anti-interference unit can be used to filter the interference current flowing from the second corrosion rate probe to the first corrosion rate probe.

[0044] The first data acquisition unit may be used to acquire the current to be measured flowing through the first branch line, and the second data acquisition unit may be used to acquire the current to be measured flowing through the second branch line.

[0045] The first and second anti-interference units described above may be diodes, and the first and second data acquisition units may be ammeters.

[0046] The data processing unit can establish a communication connection with the first and second data acquisition units to determine the inflow corrosion rate probe and the outflow corrosion rate probe of the current to be measured, and obtain the current value of the current to be measured, and determine the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is operating according to the first exposed area and current value of the inflow corrosion rate probe, and determine the second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is operating according to the second exposed area and current value of the outflow corrosion rate probe.

[0047] In some embodiments of the present application, a data processing unit and first and second data acquisition units are introduced. Next, the structural connection relationship between the data processing unit and the first and second data acquisition units will be introduced.

[0048] Specifically, the following structural connection relationships may be included:

[0049] The data processing unit can be integrated on the first data acquisition unit and the second data acquisition unit respectively. In this case, there can be multiple data processing units. One data processing unit can be integrated on the first data acquisition unit and the second data acquisition unit respectively. Each data processing unit can obtain the current to be measured collected by its corresponding data acquisition unit.

[0050] The data processing unit is structurally separated from the first data acquisition unit and the second data acquisition unit. For details, please refer to Figure 1 At this time, the data processing unit can establish communication connections with the first and second data acquisition units respectively, and obtain the current to be measured collected by the first data acquisition unit, or obtain the current to be measured collected by the second data acquisition unit.

[0051] In some embodiments of the present application, a data processing unit and first and second data acquisition units are introduced. Next, the communication connection relationship between the data processing unit and the first and second data acquisition units will be introduced.

[0052] Specifically, the following communication connection relationships may be included:

[0053] The data processing unit can establish wireless communication connections with the first data acquisition unit and the second data acquisition unit respectively through wireless signals, such as: establishing communication connections through WIFI signals, or establishing communication connections through 5G signals, and establishing communication connections through other optional forms of wireless signals.

[0054] The data processing unit may also establish wired connections with the first data acquisition unit and the second data acquisition unit via data lines.

[0055] After the data processing unit establishes a communication connection with the first and second data acquisition units, the data acquisition unit can obtain the current value of the current to be measured collected by the first and second data acquisition units, and determine the direction of the current value, that is, the corrosion rate probe into which the current flows and the corrosion rate probe out of which the current flows.

[0056] Next, the high voltage DC interference corrosion rate measurement method of this application is introduced in detail. Please refer to Figure 2 , Figure 2 This is a flow chart of a method for measuring a corrosion rate using high voltage direct current interference provided in an embodiment of the present application. The method may include:

[0057] Step S100: acquiring a current value collected by the first or second data collection unit, wherein the current value is a current value of a current to be measured at a target detection position in a soil environment of a high voltage DC grounding electrode.

[0058] Specifically, when the current to be measured flows into the device of the present application from any corrosion rate probe, the first or second data acquisition unit can collect the current value of the current to be measured, and then obtain the current value of the current to be measured.

[0059] Step S110: determining the inflow corrosion rate probe of the measured current and its first exposure area, and the outflow corrosion rate probe and its second exposure area.

[0060] Specifically, if the acquired current value is collected by the first data acquisition unit, the inflow corrosion rate probe of the measured current is the first corrosion rate probe, and its exposed area is the first exposure area, and the outflow corrosion rate probe is the second corrosion rate probe, and its exposed area is the second exposure area; if the acquired current value is collected by the second data acquisition unit, the inflow corrosion rate probe of the measured current is the second corrosion rate probe, and its exposed area is the first exposure area, and the outflow corrosion rate probe is the first corrosion rate probe, and its exposed area is the second exposure area.

[0061] Step S120: determining a first corrosion rate of buried metal at a target detection position when the high voltage DC grounding electrode anode is in operation according to the current value and the first exposure area.

[0062] Specifically, since the inflow corrosion rate probe is close to the anode of the high-voltage DC grounding electrode, the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is in operation can be determined based on the acquired current value and the first exposed area of ​​the inflow corrosion rate probe.

[0063] Step S130: determining a second corrosion rate of buried metal at a target detection position when the high voltage DC grounding electrode cathode is in operation according to the current value and the second exposure area.

[0064] Specifically, since the outflow corrosion rate probe is close to the cathode of the high-voltage DC grounding electrode, the second corrosion rate of the buried metal at the target detection position when the cathode of the high-voltage DC grounding electrode is operating can be determined based on the acquired current value and the second exposed area of ​​the outflow corrosion rate probe.

[0065] In some embodiments of the present application, the above-mentioned step S120 is introduced, which is a process of determining the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is operating according to the current value and the first exposure area. The process will be further explained below.

[0066] Specifically, the process may include the following steps:

[0067] S1. Determine a first current density, a first discharge rate, and a preset corrosion rate calculation constant.

[0068] Specifically, the first current density may be a ratio of a current value to a first exposed area, wherein the unit of the current during calculation may be ampere, and the unit of the first exposed area may be square meter.

[0069] The first discharge rate may be a ratio of the operating time of the high voltage DC grounding electrode anode to the annual time, wherein the unit of the anode operating time and the unit of the annual time may be unified, such as seconds, minutes, hours, etc.

[0070] The preset corrosion rate calculation constant may be a constant value determined according to actual conditions, for example, an industry experience value, which may generally be 1.168.

[0071] S2. Determine the first corrosion rate as the product of the first current density, the first discharge rate, and the corrosion rate calculation constant.

[0072] Specifically, the first current density, the first discharge rate and the corrosion rate calculation constant determined in the above step S1 can be multiplied to obtain a calculation result, that is, the product of the above three parameters, and then the calculation result can be used as the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is operating.

[0073] In some embodiments of the present application, the above-mentioned step S130 is introduced, which is a process of determining the second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is operating according to the current value and the second exposure area. The process will be further explained below.

[0074] Specifically, the process may include the following steps:

[0075] S1. Determine a second current density, a second discharge rate, and a preset corrosion rate calculation constant.

[0076] Specifically, the second current density may be a ratio of the current value to the second exposure area, wherein the unit of the current during calculation may be ampere, and the unit of the second exposure area may be square meter.

[0077] The second discharge rate may be a ratio of the cathode operation time of the high voltage DC grounding electrode to the annual time, wherein the unit of the cathode operation time and the unit of the annual time may be unified, such as seconds, minutes, hours, etc.

[0078] The preset corrosion rate calculation constant may be a constant value determined according to actual conditions, for example, an industry experience value, which may generally be 1.168.

[0079] S2. Determine the product of the second current density, the second discharge rate and the corrosion rate calculation constant as the second corrosion rate.

[0080] Specifically, the second current density, the second discharge rate and the corrosion rate calculation constant determined in the above step S1 can be multiplied to obtain a calculation result, that is, the product of the above three parameters, and then the calculation result can be used as the second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is operating.

[0081] It can be seen from the above scheme that the device of the present application has low cost and high efficiency, and can simultaneously determine at one detection point whether the buried metal in the soil environment near the high-voltage DC grounding electrode is disturbed by the high-voltage DC when the high-voltage DC grounding electrode is in single-pole operation, anode operation and cathode operation. In addition, the device has a wide range of applications. By burying two corrosion rate probes at the target detection position, it can be used to determine the corrosion conditions of buried metal structures near the high-voltage DC grounding electrode that have been built, are to be built, and are in the planning and route selection stage. In addition, the diode of the device can filter out the influence of interference currents other than the current to be measured generated by the high-voltage DC grounding electrode on the detection results.

[0082] Finally, it should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0083] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0084] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A high voltage DC interference corrosion rate measuring device, characterized in that: include: First and second corrosion rate probes, first and second anti-interference units, first and second data acquisition units and a data processing unit; Among them, the first anti-interference unit and the first data acquisition unit are connected in series to form a first branch line, the second anti-interference unit and the second data acquisition unit are connected in series to form a second branch line, the first and second branches are connected in parallel between the first and second corrosion rate probes, the first anti-interference unit is used to filter the interference current flowing from the first corrosion rate probe to the second corrosion rate probe, the second anti-interference unit is used to filter the interference current flowing from the second corrosion rate probe to the first corrosion rate probe, and the first and second corrosion rate probes are respectively used to be buried at the target detection position in the soil environment of the high-voltage DC grounding electrode; The first data acquisition unit is used to collect the current to be measured flowing through the first branch line, and the second data acquisition unit is used to collect the current to be measured flowing through the second branch line; The data processing unit establishes a communication connection with the first and second data acquisition units to determine the inflow corrosion rate probe and the outflow corrosion rate probe of the current to be measured, and obtain the current value of the current to be measured, and determine the first corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode anode is operating according to the first exposed area of ​​the inflow corrosion rate probe and the current value, and determine the second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is operating according to the second exposed area of ​​the outflow corrosion rate probe and the current value.

2. The device according to claim 1, characterized in that The first and second anti-interference units are diodes.

3. The device according to claim 1, characterized in that The first and second data acquisition units are ammeters.

4. The device according to claim 1, characterized in that The structural connection mode of the data processing unit and the first and second data acquisition units includes: The data processing unit is integrated on the first data acquisition unit and the second data acquisition unit respectively; or, The data processing unit is structurally separate from the first data acquisition unit and the second data acquisition unit.

5. The device according to claim 1, characterized in that The communication connection mode between the data processing unit and the first and second data acquisition units includes: The data processing unit establishes wireless communication connections with the first data acquisition unit and the second data acquisition unit respectively through wireless signals; or, The data processing unit establishes wired connections with the first data acquisition unit and the second data acquisition unit respectively through data lines.

6. A method for measuring high voltage direct current interference corrosion rate, applied to a data processing unit of a high voltage direct current interference corrosion rate measuring device according to any one of claims 1 to 5, characterized in that: include: Acquire the current value collected by the first or second data collection unit, where the current value is the current value of the current to be measured at the target detection position in the soil environment of the high-voltage DC grounding electrode; Determine the inflow corrosion rate probe and the first exposure area of ​​the current to be measured, and the outflow corrosion rate probe and the second exposure area of ​​the current to be measured; Determine, according to the current value and the first exposure area, a first corrosion rate of buried metal at a target detection position when the high voltage DC grounding electrode anode is in operation; A second corrosion rate of the buried metal at the target detection position when the high-voltage DC grounding electrode cathode is in operation is determined according to the current value and the second exposure area.

7. The method according to claim 6, characterized in that: The process of determining the first corrosion rate comprises: Determine a first current density, a first discharge rate, and a preset corrosion rate calculation constant, wherein the first current density is a ratio of the current value to the first exposure area, and the first discharge rate is a ratio of the operating time of the high-voltage direct current grounding electrode anode to the entire year; The product of the first current density, the first discharge rate, and the corrosion rate calculation constant is determined as the first corrosion rate.

8. The method according to claim 6, characterized in that: The process of determining the second corrosion rate comprises: Determine a second current density, a second discharge rate, and a preset corrosion rate calculation constant, wherein the second current density is a ratio of the current value to the second exposure area, and the second discharge rate is a ratio of the cathode operation time of the high-voltage DC grounding electrode to the whole year; The product of the second current density, the second discharge rate, and the corrosion rate calculation constant is determined as the second corrosion rate.

Images