A scanning exposure method and device, and scanning exposure equipment

Abstract

The embodiments of the present disclosure provide a scanning exposure method and device, and a scanning exposure device. The method includes: determining a target scanning speed and a preset exposure dose corresponding to each of the to-be-exposed layouts of the to-be-exposed substrate; determining each exposure area corresponding to each preset exposure dose on the to-be-exposed substrate according to each of the to-be-exposed layouts and each preset exposure dose; determining a reference exposure dose according to each preset exposure dose; scanning the to-be-exposed substrate based on the target scanning speed, and adjusting the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose when scanning to each exposure area; wherein the corresponding target exposure dose is determined according to the preset exposure dose corresponding to the exposure area, the reference exposure dose, and the preset target dose relationship. The technical solution disclosed in the present disclosure can realize multi-dose exposure in a single scanning process, saving exposure time.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a scanning exposure method and device, and a scanning exposure device. Background Art

[0002] In the field of display panel technology, in order to obtain the required layout, the photoresist needs to be exposed. During the exposure process, when there is a difference in the dose received in the high step difference area, in order to make the photoresist under the step difference react completely, the exposure dose needs to be increased. Due to the step difference and exposure process requirements, or the exposure of different graphics on the same substrate, the exposure dose of different areas on the substrate will be different. In addition, there are often multiple PPI products inside the same substrate, and different PPI products have different requirements for process exposure, which also leads to the need to expose multiple doses of graphics on the same substrate.

[0003] In the existing technology, digital exposure technology has the characteristics of no need for masks and high resolution, but the existing digital exposure equipment cannot achieve multiple dose exposures in one scanning exposure process. At present, in order to achieve multiple dose exposures, the corresponding solution is to perform multiple exposures according to different dose requirements, which will seriously waste tack time and also have a certain impact on accuracy. Summary of the invention

[0004] The embodiments of the present disclosure provide a scanning exposure method and apparatus, and a scanning exposure device to solve or alleviate one or more technical problems in the prior art.

[0005] As a first aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a scanning exposure method, which is applied to a digital exposure device. The method includes:

[0006] According to a plurality of to-be-exposed layouts of a substrate to be exposed, determining a target scanning speed and a preset exposure dose corresponding to each to-be-exposed layout;

[0007] According to each to-be-exposed layout and each preset exposure dose, determining each exposure area corresponding to each preset exposure dose on the to-be-exposed substrate;

[0008] Determining a reference exposure dose according to each preset exposure dose;

[0009] Scanning the substrate to be exposed based on the target scanning speed, and when scanning each exposure area, adjusting the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose;

[0010] Wherein, the corresponding target exposure dose is determined according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship.

[0011] In some possible implementations, the target dose relationship includes exposure energy, the number of times the digital micromirror unit is turned on, the pulse time of the digital micromirror unit, and the target scanning speed;

[0012] The target exposure dose is determined according to the exposure energy, the number of times the digital micromirror unit is turned on, the pulse time of the digital micromirror unit and the target scanning speed.

[0013] In some possible implementations, determining a corresponding target exposure dose according to a preset exposure dose corresponding to the exposure area, a reference exposure dose, and a preset target dose relationship formula includes:

[0014] Calculating a ratio of a preset exposure dose corresponding to the exposure area to a reference exposure dose;

[0015] According to the relationship between the ratio and the target dose, the corresponding target exposure dose is determined.

[0016] In some possible implementations, the target dose relationship includes the number of times the digital micromirror unit is turned on, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; and the exposure dose of the digital micromirror unit in the exposure area is adjusted to the corresponding target exposure dose, including:

[0017] According to the relationship between the ratio and the target dose, the corresponding target opening times are determined;

[0018] The number of times the digital micromirror unit is turned on in the exposure area is adjusted to a corresponding target number of times of turning on to obtain a target exposure dose.

[0019] In some possible implementations, the number of times the digital micromirror unit is turned on includes a reference number of times and a first variable coefficient, the target number of times of turning on is the product of the first variable coefficient and the reference number of times of turning on, and the first variable coefficient is the same as the ratio.

[0020] In some possible implementations, the target dose relationship includes a pulse time of a digital micromirror unit, and a corresponding target exposure dose is determined according to the ratio and the target dose relationship; and adjusting the exposure dose of the digital micromirror unit in the exposure area to the corresponding target exposure dose includes:

[0021] According to the relationship between the ratio and the target dose, the corresponding target pulse time is determined;

[0022] The pulse time of the digital micromirror unit in the exposure area is adjusted to the corresponding target pulse time to obtain the target exposure dose.

[0023] In some possible implementations, the pulse time of the digital micromirror unit includes a reference pulse time and a second variable coefficient, the target pulse time is the product of the second variable coefficient and the reference pulse time, and the second variable coefficient is the same as the ratio.

[0024] In some possible implementations, the target dose relationship includes exposure energy, and a corresponding target exposure dose is determined according to the ratio and the target dose relationship; and adjusting the exposure dose of the digital micromirror unit in the exposure area to the corresponding target exposure dose includes:

[0025] According to the relationship between the ratio and the target dose, the corresponding target exposure energy is determined;

[0026] The exposure energy of the digital micromirror unit in the exposure area is adjusted to the corresponding target exposure energy to obtain the target exposure dose.

[0027] In some possible implementations, the exposure energy includes a reference exposure energy and a third variable coefficient, the target exposure energy is the product of the third variable coefficient and the reference exposure energy, and the third variable coefficient is the same as the ratio.

[0028] In some possible implementations, determining a corresponding target exposure dose according to a preset exposure dose corresponding to the exposure area, a reference exposure dose, and a preset target dose relationship formula includes:

[0029] Calculating a ratio of a preset exposure dose corresponding to the exposure area to a reference exposure dose;

[0030] According to the relationship between the ratio and the target dose, at least two of the exposure energy, the number of opening times and the pulse time in the exposure area are adjusted to obtain the corresponding target exposure dose.

[0031] In some possible implementations, determining a reference exposure dose according to each preset exposure dose includes:

[0032] The maximum exposure dose among the preset exposure doses is determined as the reference exposure dose.

[0033] In some possible implementations, determining a target scanning speed according to a plurality of to-be-exposed layouts of a to-be-exposed substrate includes:

[0034] Determine the to-be-exposed layout corresponding to the maximum value among the preset exposure doses as the reference exposure layout;

[0035] Determining a first scanning speed of the reference exposure layout according to a scanning speed expression;

[0036] Determining a second scanning speed of the reference exposure layout according to a preset exposure dose of the reference exposure layout and a preset dose-speed correspondence relationship;

[0037] The minimum value of the first scanning speed and the second scanning speed is determined as the target scanning speed.

[0038] In some possible implementations, the target dose relationship is:

[0039] Dose=(λ*P0)*(α*M0)*(β*T0) / v0,

[0040] Wherein, Dose is the target exposure dose; α is the first variable coefficient, M0 is the reference opening times of the digital micromirror unit; β is the second variable coefficient, T0 is the reference pulse time of the digital micromirror unit; λ is the third variable coefficient, P0 is the reference exposure energy; v0 is the target scanning speed.

[0041] In some possible implementations, determining exposure regions corresponding to the preset exposure doses on the substrate to be exposed according to the patterns to be exposed and the preset exposure doses includes:

[0042] According to the regional positions of the patterns to be exposed on the substrate to be exposed, the substrate to be exposed is divided into regions to determine the exposure regions corresponding to the patterns to be exposed on the substrate to be exposed;

[0043] Each exposure area is calibrated using each preset exposure dose corresponding to each to-be-exposed layout.

[0044] As a second aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a scanning exposure device, which is applied to a digital exposure device, and the device includes:

[0045] A speed and preset dose determination module, used to determine a target scanning speed and a preset exposure dose corresponding to each to-be-exposed layout according to a plurality of to-be-exposed layouts of a to-be-exposed substrate;

[0046] An exposure area determination module is used to determine exposure areas corresponding to preset exposure doses on the substrate to be exposed according to each to-be-exposed layout and each preset exposure dose;

[0047] A reference dose determination module, used to determine a reference exposure dose according to each preset exposure dose;

[0048] An exposure adjustment module, used for scanning the substrate to be exposed based on a target scanning speed, and adjusting the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose when scanning to each exposure area;

[0049] The device further includes: a target dose determination module, which is used to determine the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship.

[0050] In some possible implementations, the target dose determination module includes:

[0051] A calculation submodule, used to calculate the ratio of a preset exposure dose corresponding to an exposure area to a reference exposure dose;

[0052] The target dose determination submodule is used to determine the corresponding target exposure dose according to the ratio and the target dose relationship.

[0053] As a third aspect of an embodiment of the present disclosure, an embodiment of the present disclosure provides a digital exposure device, including the scanning exposure device in any embodiment of the present disclosure.

[0054] The technical solution of the disclosed embodiment realizes multi-dose exposure in one scanning process, avoids multiple scans of the substrate to be exposed in order to realize multi-dose exposure, avoids the waste of Tack Time, and saves exposure time. Since it is multi-dose exposure in one scanning, the influence of multiple scans on the accuracy is avoided, and the accuracy of digital exposure is improved.

[0055] The above summary is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments and features described above, further aspects, embodiments and features of the present disclosure will be readily apparent by reference to the accompanying drawings and the following detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0056] In the accompanying drawings, unless otherwise specified, the same reference numerals throughout the multiple drawings represent the same or similar parts or elements. These drawings are not necessarily drawn to scale. It should be understood that these drawings only depict some embodiments according to the present disclosure and should not be regarded as limiting the scope of the present disclosure.

[0057] Figure 1 is a schematic diagram of a scanning exposure method in an embodiment of the present disclosure;

[0058] Figure 2 It is a schematic diagram of calibrating each exposure area of ​​a substrate to be exposed in one embodiment of the present disclosure;

[0059] Figure 3 A schematic diagram of a process for obtaining a target exposure dose in an embodiment of the present disclosure

[0060] Figure 4 1 is a structural block diagram of a scanning exposure device in one embodiment of the present disclosure. DETAILED DESCRIPTION

[0061] In the following, only some exemplary embodiments are briefly described. As those skilled in the art will appreciate, the described embodiments may be modified in various ways without departing from the spirit or scope of the present disclosure. Therefore, the drawings and descriptions are considered to be exemplary and non-restrictive in nature.

[0062] The graphic processing of digital exposure equipment relies on the microprisms in the digital micromirror unit (DMD unit) to perform dot scanning exposure on the graphics. The DMD unit is an array unit composed of 2560*1600 microprisms. All microprisms in the DMD unit are fixed on a base. The opening and closing of the microprisms follow the principle of micro-electromechanical systems (MEMS). When the microprism is +12 degrees, the microprism is in the open state, and the light irradiated by the light source can be reflected on the substrate to achieve exposure; when the microprism is -12 degrees, the microprism is in the closed state, and the light irradiated by the light source will be projected into the useless beam collection plate, and exposure cannot be achieved. The microprisms in the DMD unit are controlled by the central processor of the digital exposure equipment. The central processor will control the microprisms in the DMD unit to switch on and off according to the graphics in the layout to achieve exposure.

[0063] Figure 1 FIG. 1 is a schematic diagram of a scanning exposure method in an embodiment of the present disclosure. Figure 1 As shown, the scanning exposure method is applied to a digital exposure device, and the scanning exposure method may include:

[0064] S110, determining a target scanning speed and a preset exposure dose corresponding to each of the multiple to-be-exposed layouts of the substrate to be exposed;

[0065] S120, determining exposure areas corresponding to the preset exposure doses on the substrate to be exposed according to the patterns to be exposed and the preset exposure doses;

[0066] S130, determining a reference exposure dose according to each preset exposure dose;

[0067] S140, scanning the substrate to be exposed based on the target scanning speed, and when scanning each exposure area, adjusting the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose;

[0068] Wherein, the corresponding target exposure dose is determined according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship.

[0069] For example, the plurality of layouts to be exposed may be determined, and may be determined according to design requirements. It is necessary to form the plurality of layouts on the same substrate to be exposed.

[0070] The target scanning speed may be a scanning speed of a DMD unit in a digital exposure device on a substrate to be exposed. During the scanning process, the substrate to be exposed is exposed.

[0071] For example, the preset exposure dose corresponding to the layout to be exposed may be determined according to the pattern density and / or the exposure experience value of the layout to be exposed.

[0072] The scanning exposure method of the disclosed embodiment scans the substrate to be exposed based on the target scanning speed, and when scanning to each exposure area, adjusts the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose; wherein the corresponding target exposure dose is determined according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship. Thus, in one scanning process, when the DMD unit scans to any exposure area, the DMD unit generates the target exposure dose corresponding to the exposure area, realizing multi-dose exposure in one scanning process, avoiding multiple scans of the substrate to be exposed in order to realize multi-dose exposure, avoiding the waste of Tack Time, and saving exposure time. Since it is a multi-dose exposure in one scan, the influence of multiple scans on the accuracy is avoided, and the accuracy of digital exposure is improved.

[0073] Exemplarily, the target exposure dose corresponding to each exposure area can be determined before scanning the substrate to be exposed. Exemplarily, when scanning each exposure area, the corresponding target exposure dose can be determined according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship, and the exposure dose in the exposure area can be adjusted to the corresponding target exposure dose.

[0074] In one embodiment, determining a target scanning speed based on a plurality of to-be-exposed layouts of a substrate to be exposed may include: determining a layout to be exposed corresponding to a maximum value among each preset exposure dose as a reference exposure layout; determining a first scanning speed of the reference exposure layout based on a scanning speed expression; determining a second scanning speed of the reference exposure layout based on a preset exposure dose of the reference exposure layout and a preset dose-speed correspondence relationship; and determining the minimum value of the first scanning speed and the second scanning speed as the target scanning speed.

[0075] Exemplarily, the more complex the pattern to be exposed is, the greater the corresponding preset exposure dose is; the greater the exposure dose is, the slower the scanning speed of the DMD unit is in order to achieve the exposure dose.

[0076] After the reference exposure layout is determined, the first scanning speed for realizing the reference exposure layout can be calculated according to the scanning speed expression.

[0077] For example, with the long-term use of the digital exposure device or the product description of the digital exposure device, a preset dose-speed correspondence relationship, such as a preset dose-speed relationship table, can be obtained. By querying the preset dose-speed correspondence relationship, the second scanning speed of the preset exposure dose for achieving the reference exposure pattern can be determined.

[0078] Exemplarily, the minimum value of the first scanning speed and the second scanning speed is determined as the target scanning speed, and the scanning speed of the DMD unit can be further reduced to facilitate the realization of various exposure doses.

[0079] It should be noted that the lower the scanning speed, the greater the exposure dose that can be achieved. And at a lower scanning speed, more different exposure doses can be obtained by adjusting the pulse time and the number of times the DMD unit is turned on. Therefore, when the exposure dose required by the layout is larger, the corresponding scanning speed is smaller; when the exposure dose required by the layout is smaller, the corresponding scanning speed can be increased.

[0080] In the disclosed embodiment, the layout to be exposed corresponding to the maximum value of each preset exposure dose is determined as the reference exposure layout, and the minimum value of the first scanning speed and the second scanning speed is determined as the target scanning speed. In this way, not only can the layout with the maximum exposure dose be realized, but also at a lower scanning speed, an exposure dose smaller than the preset exposure dose of the reference exposure layout can be realized by adjusting the exposure energy, pulse time or number of openings of the DMD unit, which is conducive to realizing multi-dose exposure in one scanning process.

[0081] In one embodiment, the scan speed expression may be:

[0082]

[0083] Among them, DMD exposure length is the exposure length of the DMD unit; M is the number of times the DMD unit is turned on; max_rast_cnt is the maximum data volume of the layout, which is related to the complexity of the layout; T is the pulse time of the DMD unit, which can also be called the duration of the on state of the DMD unit; DMD reset time is the on interval time of the DMD unit, that is, the time interval from the on state to the next on state of the DMD unit.

[0084] Exemplarily, for a 2560*1600 DMD unit, the DMD exposure length is the product of 2560 and the width of a single microprism. Exemplarily, the standard value of M in the digital exposure device can be 70, and in a specific application, the value of M can be set based on experience. Exemplarily, the standard value of T in the digital exposure device is about 2μs, and in a specific application, the value of T can be set based on experience. The DMD reset time in the digital exposure device can be determined.

[0085] In one embodiment, based on each to-be-exposed layout and each preset exposure dose, determining each exposure area corresponding to each preset exposure dose on the to-be-exposed substrate may include: dividing the to-be-exposed substrate into regions according to the regional positions of each to-be-exposed layout on the to-be-exposed substrate to determine each exposure area corresponding to each to-be-exposed layout on the to-be-exposed substrate; and calibrating each exposure area using each preset exposure dose corresponding to each to-be-exposed layout.

[0086] For example, when designing the layout to be exposed, the regional position of the layout to be exposed on the substrate to be exposed can be determined, so that the substrate to be exposed can be divided into regions according to the regional positions of each layout to be exposed on the substrate to be exposed, and the exposure regions corresponding to each layout to be exposed on the substrate to be exposed can be determined. Each exposure region can be calibrated using each preset exposure dose corresponding to each layout to be exposed, so that when the DMD unit scans to any exposure region, the DMD unit can generate the corresponding target exposure dose according to the calibration information.

[0087] It should be noted that each exposure area can be calibrated using each preset exposure dose in the operating system of the digital exposure device. It is understandable that the digital exposure device can simulate the actual scanning exposure process, and the technician can draw a simulated substrate to be exposed corresponding to the actual substrate to be exposed in the digital exposure device, and draw each layout to be exposed, and then use each preset exposure dose in the digital exposure device to calibrate each exposure area.

[0088] Figure 2 FIG. 1 is a schematic diagram of calibrating each exposure area of ​​a substrate to be exposed in one embodiment of the present disclosure. Figure 2 As shown, the number of layouts to be exposed is 4, corresponding to 4 exposure areas, and each exposure area is calibrated using a preset exposure dose. For example, the first layout to be exposed corresponds to area A, and the preset exposure dose of area A is 45mj; the second layout to be exposed corresponds to area B, and the preset exposure dose of area B is 28mj; the third layout to be exposed corresponds to area C, and the preset exposure dose of area C is 38mj; the fourth layout to be exposed corresponds to area D, and the preset exposure dose of area D is 50mj.

[0089] In one embodiment, determining the reference exposure dose according to each preset exposure dose may include: determining the maximum exposure dose among each preset exposure dose as the reference exposure dose. Figure 2 In the embodiment, the preset exposure dose 50 mj of the region D can be determined as the reference exposure dose. In other embodiments, any one of the preset exposure doses can be determined as the reference exposure dose as needed.

[0090] In one embodiment, the target dose relationship may include exposure energy, the number of times the digital micromirror unit is turned on, the pulse time of the digital micromirror unit, and the target scanning speed. The target exposure dose is determined according to the exposure energy, the turn-on time of the digital micromirror unit, the pulse time of the digital micromirror unit, and the target scanning speed.

[0091] In one embodiment, the target dose relationship may be:

[0092] Dose=(λ*P0)*(α*M0)*(β*T0) / v0, expression (2)

[0093] Wherein, Dose is the target exposure dose; α is the first variable coefficient, M0 is the reference opening times of the DMD unit; β is the second variable coefficient, T0 is the reference pulse time of the DMD unit; λ is the third variable coefficient, P0 is the reference exposure energy; v0 is the target scanning speed. Exemplarily, the first variable coefficient α, the second variable coefficient β, and the third variable coefficient λ may all be less than or equal to 1.

[0094] In one embodiment, determining the corresponding target exposure dose according to the preset exposure dose, reference exposure dose and preset target dose relationship formula corresponding to the exposure area may include: calculating the ratio of the preset exposure dose and the reference exposure dose corresponding to the exposure area; and determining the corresponding target exposure dose according to the ratio and the target dose relationship formula.

[0095] In this way, the target exposure dose of the digital micromirror unit in the exposure area can be determined based on the relationship between the ratio and the target dose. The method of determining the target exposure dose is simple and easy to implement, which is beneficial for conveniently and quickly adjusting the corresponding target exposure dose when the DMD unit scans each exposure area, thereby improving exposure accuracy.

[0096] In one embodiment, the target dose relationship includes the number of times the digital micromirror unit is turned on, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; the exposure dose of the digital micromirror unit in the exposure area is adjusted to the corresponding target exposure dose, including: determining the corresponding target number of turns on according to the ratio and the target dose relationship; adjusting the number of turns on the digital micromirror unit in the exposure area to the corresponding target number of turns on, so as to obtain the target exposure dose. In this way, the target exposure dose corresponding to the exposure area can be obtained by only determining and adjusting the target number of turns on, and the adjustment process is simple and easy to implement.

[0097] Exemplarily, the number of times the digital micromirror unit is turned on includes a reference number of times and a first variable coefficient, the target number of times of turning on is the product of the first variable coefficient and the reference number of times of turning on, and the first variable coefficient is the same as the ratio.

[0098] Exemplarily, the target dose relationship may be expressed as expression (2), wherein α is the first variable coefficient, and M0 is the reference opening number of the DMD unit. Exemplarily, the maximum exposure dose among the preset exposure doses, i.e., the preset exposure dose of 50 mj in region D, may be determined as the reference exposure dose. Since the exposure energy and the pulse time of the DMD unit are not adjusted, both β and λ in expression (2) may be set to 1.

[0099] For a preset exposure dose of 50 mj, the ratio of the preset exposure dose to the reference exposure dose is 1. In order to achieve the target exposure dose of 50 mj, the reference opening times M0 of the DMD unit, the reference pulse time T0 of the DMD unit, and the reference exposure energy P0 can be determined according to the requirements and experience of the digital exposure equipment. For example, for a high dose (e.g., a dose greater than or equal to 50 mj), the reference opening times M0 can be set to a value between 100 and 200. The reference exposure dose can be expressed as Dose 参考 To express, β and λ in expression (2) are both set to a constant value of 1, and the first variable coefficient α is set to be adjustable. That is to say, during the scanning exposure process of the DMD unit on each exposure area of ​​the substrate to be exposed, the exposure energy is maintained at the reference exposure energy P0, the pulse time of the DMD unit is maintained at the reference pulse time T0, the scanning speed is maintained at the target scanning speed v0, and the number of times the DMD unit is turned on is α*M0.

[0100] For an exposure area, α may be equal to the ratio of the preset exposure dose corresponding to the exposure area to the reference exposure dose. For example, when the DMD unit scans to the exposure area B, the first variable coefficient α of the exposure area B is B Equal to the preset exposure dose Dose of exposure area B B With reference exposure dose Dose 参考 The ratio of B =Dose B / Dose 参考 , the target opening times of the DMD unit are determined to be α B *M0. When exposing the exposure area B, the number of times the DMD unit is turned on can be adjusted to the target number of times α B *M0 to obtain the target exposure dose in exposure area B.

[0101] For example, when the DMD unit scans to the exposure area A, the first variable coefficient α of the exposure area A is A Equal to the preset exposure dose Dose of exposure area A A With reference exposure dose Dose 参考 The ratio of A =Dose A / Dose参考 When exposing the exposure area A, the number of times the DMD unit is turned on can be adjusted to the target number of times α A *M0 to obtain the target exposure dose in exposure area A.

[0102] For example, when the DMD unit scans to the exposure area C, the first variable coefficient α of the exposure area C is C Equal to the preset exposure dose Dose of exposure area C C With reference exposure dose Dose 参考 The ratio of C =Dose C / Dose 参考 When exposing the exposure area C, the number of times the DMD unit is turned on can be adjusted to the target number of times α C *M0 to obtain the target exposure dose in exposure area C.

[0103] For example, when the DMD unit scans the exposure area D, the first variable coefficient α of the exposure area D is D Equal to the preset exposure dose Dose of the exposure area D D With reference exposure dose Dose 参考 The ratio of D =Dose D / Dose 参考 When exposing the exposure area D, the number of times the DMD unit is turned on can be adjusted to the target number of times α D *M0 to obtain the target exposure dose in exposure area D.

[0104] In one embodiment, the target dose relationship includes the pulse time of the digital micromirror unit, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; the exposure dose of the digital micromirror unit in the exposure area is adjusted to the corresponding target exposure dose, including: determining the corresponding target pulse time according to the ratio and the target dose relationship; adjusting the pulse time of the digital micromirror unit in the exposure area to the corresponding target pulse time to obtain the target exposure dose. In this way, the target exposure dose corresponding to the exposure area can be obtained by only determining the target pulse time, and the determination process is simple and easy to implement.

[0105] Exemplarily, the pulse time of the digital micromirror unit includes a reference pulse time and a second variable coefficient, the target pulse time is the product of the second variable coefficient and the reference pulse time, and the second variable coefficient is the same as the ratio.

[0106] Exemplarily, the target dose relationship may be expressed as expression (2), wherein β is the second variable coefficient, and T0 is the reference pulse time of the DMD unit. Exemplarily, the maximum exposure dose among the preset exposure doses, i.e., the preset exposure dose of 50 mj in region D, may be determined as the reference exposure dose. Since the exposure energy and the number of times the DMD unit is turned on are not adjusted, α and λ in expression (2) may be set to 1.

[0107] For a preset exposure dose of 50 mj, the ratio of the preset exposure dose to the reference exposure dose is 1. In order to achieve the target exposure dose of 50 mj, the reference opening times M0 of the DMD unit, the reference pulse time T0 of the DMD unit, and the reference exposure energy P0 can be determined according to the requirements and experience of the digital exposure equipment. For example, for a dose of 50 mj, the reference pulse time T0 can be set to 4 μs. The reference exposure dose can be expressed as Dose 参考 To express, α and λ in expression (2) are both set to a constant value of 1, and the second variable coefficient β is set to be adjustable. That is to say, during the scanning exposure process of the DMD unit on each exposure area of ​​the substrate to be exposed, the exposure energy is maintained at the reference exposure energy P0, the number of times the DMD unit is turned on is maintained at the reference number of times M0, the scanning speed is maintained at the target scanning speed v0, and the pulse time of the DMD unit is β*T0.

[0108] For an exposure area, β may be equal to the ratio of the preset exposure dose corresponding to the exposure area to the reference exposure dose. For example, when the DMD unit scans to the exposure area B, the second variable coefficient β of the exposure area B is B Equal to the preset exposure dose Dose of exposure area B B With reference exposure dose Dose 参考 The ratio of B =Dose B / Dose 参考 When exposing the exposure area C, the pulse time of the DMD unit can be adjusted to the target pulse time β B *T0, to obtain the target exposure dose in exposure area B.

[0109] For example, when the DMD unit scans to the exposure area A, the second variable coefficient β of the exposure area A is A Equal to the preset exposure dose Dose of exposure area A A With reference exposure dose Dose 参考 The ratio of A =Dose A / Dose 参考 When exposing the exposure area A, the pulse time of the DMD unit can be adjusted to the target pulse time β A*T0, to obtain the target exposure dose in exposure area A.

[0110] For example, when the DMD unit scans to the exposure area C, the second variable coefficient β of the exposure area C is C Equal to the preset exposure dose Dose of exposure area C C With reference exposure dose Dose 参考 The ratio of C =Dose C / Dose 参考 When exposing the exposure area C, the pulse time of the DMD unit can be adjusted to the target pulse time β C *T0, to obtain the target exposure dose in exposure area C.

[0111] For example, when the DMD unit scans to the exposure area D, the second variable coefficient β of the exposure area D is D Equal to the preset exposure dose Dose of exposure area D D With reference exposure dose Dose 参考 The ratio of D =Dose D / Dose 参考 When exposing the exposure area D, the pulse time of the DMD unit can be adjusted to the target pulse time β D *T0, to obtain the target exposure dose in the exposure area D.

[0112] In one embodiment, the target dose relationship includes exposure energy, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; the exposure dose of the digital micromirror unit in the exposure area is adjusted to the corresponding target exposure dose, including: determining the corresponding target exposure energy according to the ratio and the target dose relationship; adjusting the exposure energy of the digital micromirror unit in the exposure area to the corresponding target exposure energy to obtain the target exposure dose. In this way, the target exposure dose corresponding to the exposure area can be obtained by only adjusting the target exposure energy, and the adjustment process is simple and easy to implement.

[0113] Exemplarily, the exposure energy includes a reference exposure energy and a third variable coefficient, the target exposure energy is the product of the third variable coefficient and the reference exposure energy, and the third variable coefficient is the same as the ratio.

[0114] Exemplarily, the target dose relationship may be expressed as expression (2), wherein λ is the third variable coefficient, and P0 is the reference exposure energy of the DMD unit. Exemplarily, the maximum exposure dose among the preset exposure doses, i.e., the preset exposure dose of 50 mj in region D, may be determined as the reference exposure dose. Since the number of times the DMD unit is turned on and the pulse time are not adjusted, α and β in expression (2) may be set to 1.

[0115] For a preset exposure dose of 50 mj, the ratio of the preset exposure dose to the reference exposure dose is 1. In order to achieve the target exposure dose of 50 mj, the reference opening times M0 of the DMD unit, the reference pulse time T0 of the DMD unit, and the reference exposure energy P0 can be determined according to the requirements and experience of the digital exposure equipment. The reference exposure dose can be expressed as Dose 参考 To express, both α and β in expression (2) are set to a constant value of 1, and the coefficient of the third variable λ is set to be adjustable. That is to say, during the scanning exposure process of the DMD unit on each exposure area of ​​the substrate to be exposed, the number of times the DMD unit is turned on remains at the reference number of times M0, the pulse time of the DMD unit remains at the reference pulse time T0, the scanning speed remains at the target scanning speed v0, and the exposure energy is λ*P0.

[0116] For an exposure area, λ may be equal to the ratio of the preset exposure dose corresponding to the exposure area to the reference exposure dose. For example, when the DMD unit scans to the exposure area B, the third variable coefficient λ of the exposure area B is B Equal to the preset exposure dose Dose of exposure area B B With reference exposure dose Dose 参考 The ratio of B =Dose B / Dose 参考 When exposing the exposure area C, the exposure energy can be adjusted to the target exposure energy λ B *P0, to obtain the target exposure dose in exposure area B.

[0117] For example, when the DMD unit scans the exposure area A, the third variable coefficient λ of the exposure area A is A Equal to the preset exposure dose Dose of exposure area A A With reference exposure dose Dose 参考 The ratio of A =Dose A / Dose 参考 When exposing the exposure area A, the exposure energy can be adjusted to the target exposure energy λ B *P0, to obtain the target exposure dose in exposure area A.

[0118] For example, when the DMD unit scans the exposure area C, the third variable coefficient λ of the exposure area C is C Equal to the preset exposure dose Dose of exposure area C C With reference exposure dose Dose 参考 The ratio of C =Dose C / Dose参考 When exposing the exposure area C, the exposure energy can be adjusted to the target exposure energy λ C *P0 to obtain the target exposure dose in exposure area C.

[0119] For example, when the DMD unit scans the exposure area D, the third variable coefficient λ of the exposure area D is D Equal to the preset exposure dose Dose of exposure area D D With reference exposure dose Dose 参考 The ratio of D =Dose D / Dose 参考 When exposing the exposure area D, the exposure energy can be adjusted to the target exposure energy λ D *P0 to obtain the target exposure dose in the exposure area D.

[0120] Exemplarily, the maximum dose among the preset exposure doses is selected as the reference exposure dose, so that the first variable coefficient α, the second variable coefficient β or the third variable coefficient λ are all less than or equal to 1, which can avoid the target opening times, target pulse time or target exposure energy of each exposure area exceeding the corresponding allowable dose, and facilitate adjustment to obtain the target exposure dose.

[0121] In one embodiment, determining the corresponding target exposure dose according to the preset exposure dose, reference exposure dose and preset target dose relationship formula corresponding to the exposure area may include: calculating the ratio of the preset exposure dose and the reference exposure dose corresponding to the exposure area; and adjusting at least two of the exposure energy, the number of open times and the pulse time in the exposure area according to the ratio and the target dose relationship formula to obtain the corresponding target exposure dose.

[0122] Exemplarily, when the ratio of the preset exposure dose to the reference exposure dose is greater than 1, at least two of the exposure energy, the number of opening times and the pulse time in the exposure area can be adjusted to obtain the corresponding target exposure dose.

[0123] Exemplarily, the target dose relationship may adopt expression (2), and any one of the plurality of preset exposure doses may be determined as the reference exposure dose. For example, the preset exposure dose 38 mj of the exposure area C may be determined as the reference exposure dose. For the exposure area C, the ratio of the preset exposure dose to the reference exposure dose is 1, and therefore, for the exposure area C, the first variable coefficient α, the second variable coefficient β, and the third variable coefficient λ may all be 1. In order to achieve the target exposure dose of 38 mj, the reference opening times M0 of the DMD unit, the reference pulse time T0 of the DMD unit, and the reference exposure energy P0 may be determined according to the requirements and experience of the digital exposure device.

[0124] Exemplarily, the third variable coefficient can be set to be adjustable, and the first variable coefficient α and the second variable coefficient β are set to 1. That is, when the DMD unit performs scanning exposure on each exposure area of ​​the substrate to be exposed, the exposure energy is adjustable, the number of times the DMD unit is turned on is maintained at the reference number of times M0, the pulse time is maintained at the reference pulse time T0, and the scanning speed is maintained at the target scanning speed v0.

[0125] It should be noted that the first variable coefficient α, the second variable coefficient β and the third variable coefficient λ are all values ​​less than 1 or equal to 1.

[0126] For example, when the DMD unit scans to the exposure area B, the third variable coefficient λ of the exposure area B is B Equal to the preset exposure dose Dose of exposure area B B With reference exposure dose Dose 参考 The ratio of B =Dose B / Dose 参考 Due to Dose B <Dose 参考 , so λ B <1, therefore, when exposing the exposure area B, the exposure energy can be adjusted to the target exposure energy λ B *P0, the number of openings is the reference number of openings M0, and the pulse time is the reference pulse time T0, so as to obtain the target exposure dose in the exposure area B. That is, when the exposure area B is exposed, due to, λ B <1, you only need to adjust the exposure energy to the target exposure energy to get the corresponding target exposure dose.

[0127] For example, when the DMD unit scans the exposure area A, the third variable coefficient λ of the exposure area A is A Equal to the preset exposure dose Dose of exposure area A A With reference exposure dose Dose 参考 The ratio of A =Dose A / Dose 参考 . Dose A >Dose 参考 , so λ B >1. In order to make λ B ≤1, one of the reference opening times and the reference pulse time can be adjusted. For example, the reference opening times can be adjusted to increase the reference opening times from M0 to M1, so that λ A Reduced to λ A1 , so that A1≤1, the exposure energy of exposure area A is obtained as the target exposure energy λ A1 *P0, the number of times the exposure area A is turned on is the target number of times M1, and the pulse time of the exposure area A is the reference pulse time T0, so as to obtain the corresponding target exposure dose. Therefore, when the ratio of the preset exposure dose to the reference exposure dose is greater than 1, at least two of the exposure energy, the number of times the exposure is turned on, and the pulse time can be adjusted to obtain the corresponding target exposure dose.

[0128] For example, in order to make λ B ≤1, for example, the reference pulse time can be adjusted from T0 to T1, so that λ A Reduced to λ A1 , so that A1 ≤1, the exposure energy of exposure area A is obtained as the target exposure energy λ A1 *P0, the pulse time of the exposure area A is the target pulse time T1, and the opening times of the exposure area A is the reference opening times T0, so as to obtain the corresponding target exposure dose.

[0129] For the exposure area C, λ C =Dose C / Dose 参考 ,λ C =1, therefore, when exposing the exposure area C, the exposure energy can be adjusted to the target exposure energy λ C *P0, the number of openings is the reference number of openings M0, and the pulse time is the reference pulse time T0, so as to obtain the target exposure dose in the exposure area C. That is, when the exposure area C is exposed, due to λ C =1, you only need to adjust the exposure energy to the target exposure energy to get the corresponding target exposure dose.

[0130] For the exposure area D, λ D =Dose D / Dose 参考 ,λ D >1, the same method as exposure area A can be adopted, and at least two of the exposure energy, the number of opening times and the pulse time can be adjusted to obtain the corresponding target exposure dose.

[0131] Figure 3 FIG. 1 is a flow chart of obtaining a target exposure dose in an embodiment of the present disclosure. Figure 3 As shown, the exposure areas corresponding to the preset exposure doses on the substrate to be exposed are determined; the target scanning speed is determined; the third variable coefficient based on the exposure energy is an adjustable coefficient, and the target exposure dose can be achieved by adjusting the pulse time and the number of opening times.

[0132] like Figure 3 As shown, in the pulse time scheme, when the preset exposure dose of the exposure area is less than or equal to the reference exposure dose, it is only necessary to adjust the exposure energy to achieve the target exposure dose; when the preset exposure dose of the exposure area is greater than the reference exposure dose, the exposure energy and pulse time are adjusted at the same time to achieve the target exposure dose.

[0133] like Figure 3 As shown, in the scheme of the number of opening times, when the preset exposure dose of the exposure area is less than or equal to the reference exposure dose, it is only necessary to adjust the exposure energy to achieve the target exposure dose; when the preset exposure dose of the exposure area is greater than the reference exposure dose, the exposure energy and the opening time are adjusted at the same time to achieve the target exposure dose.

[0134] Figure 4 The present disclosure also provides a scanning exposure device, which is applied to a digital exposure device, and the device includes:

[0135] The speed and preset dose determination module 41 is used to determine the target scanning speed and the preset exposure dose corresponding to each of the to-be-exposed layouts according to the multiple to-be-exposed layouts of the to-be-exposed substrate;

[0136] An exposure region determination module 42 is used to determine exposure regions corresponding to respective preset exposure doses on the substrate to be exposed according to respective to-be-exposed patterns and respective preset exposure doses;

[0137] A reference dose determination module 43, used to determine a reference exposure dose according to each preset exposure dose;

[0138] An exposure adjustment module 45 is used to scan the substrate to be exposed based on the target scanning speed, and when scanning each exposure area, adjust the exposure dose of the digital micromirror unit of the digital exposure machine in the exposure area to the corresponding target exposure dose;

[0139] The device further includes: a target dose determination module 44, which is used to determine the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and the preset target dose relationship.

[0140] In one embodiment, the target dose determination module includes: a calculation submodule for calculating the ratio of a preset exposure dose and a reference exposure dose corresponding to an exposure area; and a target dose determination submodule for determining the corresponding target exposure dose according to a relationship between the ratio and the target dose.

[0141] Exemplarily, the target dose relationship includes the number of times the digital micromirror unit is turned on, and the target dose determination submodule is also used to determine the corresponding target number of times of turning on according to the ratio and the target dose relationship; the exposure adjustment module is also used to adjust the number of times the digital micromirror unit is turned on in the exposure area to the corresponding target number of times of turning on to obtain the target exposure dose.

[0142] Exemplarily, the target dose relationship includes the pulse time of the digital micromirror unit, and the target dose determination submodule is further used to determine the corresponding target pulse time based on the ratio and the target dose relationship; the exposure adjustment module is further used to adjust the pulse time of the digital micromirror unit in the exposure area to the corresponding target pulse time to obtain the target exposure dose.

[0143] Exemplarily, the target dose relationship includes exposure energy, and the target dose determination submodule is further used to determine the corresponding target exposure energy based on the ratio and the target dose relationship; the exposure adjustment module is further used to adjust the exposure energy of the digital micromirror unit in the exposure area to the corresponding target exposure energy to obtain the target exposure dose.

[0144] An embodiment of the present disclosure also provides a digital exposure device, including the scanning exposure device in any embodiment of the present disclosure.

[0145] In the description of this specification, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present disclosure.

[0146] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present disclosure, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0147] In the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.

[0148] In the present disclosure, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being “above”, “above”, and “above” a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0149] The disclosure above provides many different embodiments or examples to implement different structures of the present disclosure. In order to simplify the present disclosure, the components and settings of specific examples are described above. Of course, they are only examples, and the purpose is not to limit the present disclosure. In addition, the present disclosure can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments and / or settings discussed.

[0150] The above are only specific embodiments of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any technician familiar with the technical field can easily think of various changes or substitutions within the technical scope disclosed in the present disclosure, which should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A scanning exposure method, characterized in that: Applied to digital exposure equipment, the method comprises: According to a plurality of to-be-exposed layouts of a substrate to be exposed, determining a target scanning speed and a preset exposure dose corresponding to each of the to-be-exposed layouts; According to each of the to-be-exposed patterns and each of the preset exposure doses, determining each exposure area corresponding to each of the preset exposure doses on the to-be-exposed substrate; Determining a reference exposure dose according to each of the preset exposure doses; Scanning the substrate to be exposed based on the target scanning speed, and when scanning each exposure area, adjusting the exposure dose of the digital micromirror unit of the digital exposure device in the exposure area to the corresponding target exposure dose; Determine the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and a preset target dose relationship; the target exposure dose is the exposure dose generated by the digital micromirror unit of the digital exposure device when scanning to any of the exposure areas; Wherein, determining the target scanning speed according to the multiple to-be-exposed layouts of the to-be-exposed substrate includes: determining the to-be-exposed layout corresponding to the maximum value of each of the preset exposure doses as the reference exposure layout; determining the first scanning speed of the reference exposure layout according to the scanning speed expression; determining the second scanning speed of the reference exposure layout according to the preset exposure dose of the reference exposure layout and the preset dose-speed correspondence relationship; determining the minimum value of the first scanning speed and the second scanning speed as the target scanning speed; Wherein, according to a plurality of to-be-exposed layouts of the to-be-exposed substrate, determining the preset exposure doses respectively corresponding to the to-be-exposed layouts includes: determining the preset exposure doses respectively corresponding to the to-be-exposed layouts according to the pattern density and / or the exposure experience value of the to-be-exposed layouts; Wherein, determining the reference exposure dose according to each of the preset exposure doses includes: determining the maximum exposure dose among each of the preset exposure doses as the reference exposure dose; Wherein, determining the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and a preset target dose relationship formula includes: calculating the ratio of the preset exposure dose corresponding to the exposure area and the reference exposure dose; and determining the corresponding target exposure dose according to the ratio and the target dose relationship formula.

2. The method according to claim 1, characterized in that The target dose relationship includes exposure energy, the number of times the digital micromirror unit is turned on, the pulse time of the digital micromirror unit and the target scanning speed; The target exposure dose is determined according to the exposure energy, the number of times the digital micromirror unit is turned on, the pulse time of the digital micromirror unit and the target scanning speed.

3. The method according to claim 1, characterized in that The target dose relationship includes the number of times the digital micromirror unit is turned on, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; Adjusting the exposure dose of the digital micromirror unit in the exposure area to a corresponding target exposure dose includes: Determining a corresponding target opening number according to the ratio and the target dosage relationship; The number of times the digital micromirror unit is turned on in the exposure area is adjusted to correspond to the target number of times of turning on, so as to obtain the target exposure dose.

4. The method according to claim 3, characterized in that The number of times the digital micromirror unit is turned on includes a reference number of times and a first variable coefficient, the target number of times of turning on is the product of the first variable coefficient and the reference number of times of turning on, and the first variable coefficient is the same as the ratio.

5. The method according to claim 1, characterized in that The target dose relationship includes the pulse time of the digital micromirror unit, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship; Adjusting the exposure dose of the digital micromirror unit in the exposure area to a corresponding target exposure dose includes: Determining a corresponding target pulse time according to the ratio and the target dose relationship; The pulse time of the digital micromirror unit in the exposure area is adjusted to correspond to the target pulse time to obtain the target exposure dose.

6. The method according to claim 5, characterized in that The pulse time of the digital micromirror unit includes a reference pulse time and a second variable coefficient, the target pulse time is the product of the second variable coefficient and the reference pulse time, and the second variable coefficient is the same as the ratio.

7. The method according to claim 1, characterized in that The target dose relationship formula includes exposure energy, and the corresponding target exposure dose is determined according to the ratio and the target dose relationship formula; Adjusting the exposure dose of the digital micromirror unit in the exposure area to a corresponding target exposure dose includes: Determining a corresponding target exposure energy according to the ratio and the target dose relationship; The exposure energy of the digital micromirror unit in the exposure area is adjusted to correspond to the target exposure energy to obtain the target exposure dose.

8. The method according to claim 7, characterized in that The exposure energy includes a reference exposure energy and a third variable coefficient, the target exposure energy is the product of the third variable coefficient and the reference exposure energy, and the third variable coefficient is the same as the ratio.

9. The method according to claim 2, characterized in that: Determining the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and a preset target dose relationship, including: Calculating a ratio of a preset exposure dose corresponding to the exposure area to the reference exposure dose; According to the ratio and the target dose relationship, at least two of the exposure energy, the number of opening times and the pulse time in the exposure area are adjusted to obtain the corresponding target exposure dose.

10. The method according to claim 2, characterized in that The target dose relationship is: Dose=(λ*P0)*(α*M0)*(β*T0) / v0, Wherein, Dose is the target exposure dose; α is the first variable coefficient, M0 is the reference opening times of the digital micromirror unit; β is the second variable coefficient, T0 is the reference pulse time of the digital micromirror unit; λ is the third variable coefficient, P0 is the reference exposure energy; v0 is the target scanning speed.

11. The method according to any one of claims 1 to 9, characterized in that Determining, according to each of the to-be-exposed layouts and each of the preset exposure doses, each of the exposure regions corresponding to each of the preset exposure doses on the to-be-exposed substrate comprises: According to the regional positions of the patterns to be exposed on the substrate to be exposed, the substrate to be exposed is divided into regions to determine the exposure regions corresponding to the patterns to be exposed on the substrate to be exposed; Each of the exposure areas is calibrated using the preset exposure doses corresponding to each of the to-be-exposed patterns.

12. A scanning exposure device, characterized in that: Applied to digital exposure equipment, the device comprises: A speed and preset dose determination module, used to determine a target scanning speed and a preset exposure dose corresponding to each of the plurality of to-be-exposed layouts of the to-be-exposed substrate according to the plurality of to-be-exposed layouts; An exposure area determination module, used for determining each exposure area corresponding to each preset exposure dose on the substrate to be exposed according to each of the to-be-exposed patterns and each of the preset exposure doses; A reference dose determination module, used to determine a reference exposure dose according to each of the preset exposure doses; an exposure adjustment module, configured to scan the substrate to be exposed based on the target scanning speed, and when scanning each exposure area, adjust the exposure dose of the digital micromirror unit of the digital exposure device in the exposure area to the corresponding target exposure dose; The device further comprises: a target dose determination module, configured to determine the corresponding target exposure dose according to the preset exposure dose corresponding to the exposure area, the reference exposure dose and a preset target dose relationship; the target exposure dose is the exposure dose generated by the digital micromirror unit of the digital exposure device when scanning to any of the exposure areas; Wherein, determining the target scanning speed according to the multiple to-be-exposed layouts of the to-be-exposed substrate includes: determining the to-be-exposed layout corresponding to the maximum value of each of the preset exposure doses as the reference exposure layout; determining the first scanning speed of the reference exposure layout according to the scanning speed expression; determining the second scanning speed of the reference exposure layout according to the preset exposure dose of the reference exposure layout and the preset dose-speed correspondence relationship; determining the minimum value of the first scanning speed and the second scanning speed as the target scanning speed; Wherein, according to a plurality of to-be-exposed layouts of the to-be-exposed substrate, determining the preset exposure doses respectively corresponding to the to-be-exposed layouts comprises: determining the preset exposure doses respectively corresponding to the to-be-exposed layouts according to the pattern density and / or the exposure experience value of the to-be-exposed layouts; Wherein, determining the reference exposure dose according to each of the preset exposure doses includes: determining the maximum exposure dose among each of the preset exposure doses as the reference exposure dose; Among them, the target dose determination module includes: a calculation submodule, used to calculate the ratio of the preset exposure dose corresponding to the exposure area and the reference exposure dose; a target dose determination submodule, used to determine the corresponding target exposure dose according to the ratio and the target dose relationship.

13. A digital exposure device, characterized in that: Includes the scanning exposure device as described in claim 12.

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