Array substrate, display device and manufacturing method

Abstract

The application belongs to the technical field of display, and particularly relates to an array substrate, a display device and a preparation method, which specifically comprises: a substrate; a plurality of isolation columns, which are arranged on the substrate at intervals, and each of which defines a pixel area with the adjacent isolation column; and a plurality of micro-nano structures, which are arranged in a first area on the wall surface of each isolation column facing the pixel area in a periodic manner, and the first area is an area above the top of a pixel droplet; each micro-nano structure comprises: a first hydrophobic structure and a second hydrophobic structure arranged in a stack; in summary, the super-hydrophobic structure is prepared by cooperation of the above structure, so that the surface tension of the side wall surface of the pixel area is different from that of the lower wall surface of the pixel area, thereby ensuring that the pixel droplet is gathered in the pixel area, and less remains on the side wall surface of the isolation column, effectively improving pixel crosstalk.

Description

Technical Field

[0001] This invention belongs to the field of display technology, and particularly relates to an array substrate, a display device, and a method for manufacturing it. Background Technology

[0002] With the development of QLED (Quantum dot Light-Emitting Diode) display technology, the performance and quality of QLED display panels are getting better and better. In the manufacturing process of QLED display panels, inkjet printing technology can usually be used to precisely deposit pixel droplets containing red, green and blue light-emitting materials into the pixel area between two adjacent isolation pillars. After the solvent evaporates, a nano-thin layer is formed, which constitutes the light-emitting pixel. However, in the existing manufacturing process, pixel droplets often remain on the side wall surface of the isolation pillar, resulting in the technical problem of pixel crosstalk. Summary of the Invention

[0003] The purpose of this application is to provide an array substrate, a display device, and a manufacturing method to improve the technical problem of pixel crosstalk that easily occurs during the manufacturing process of array substrates in the prior art.

[0004] (I) Technical Solution

[0005] To achieve the above objectives, a first aspect of the present invention provides an array substrate, comprising:

[0006] Substrate;

[0007] Multiple isolation pillars are spaced apart on the substrate, and a pixel region is defined between each two adjacent isolation pillars;

[0008] And multiple micro / nano structures, at least periodically arranged in a first region on the wall of each of the isolation pillars facing the pixel region, the first region being the region above the top of the pixel droplet; each of the micro / nano structures includes: a first hydrophobic structure and a second hydrophobic structure stacked together.

[0009] As one of the optional solutions to this technical solution, the spacing between each pair of adjacent micro / nano structures is the same;

[0010] Alternatively, the spacing between any two adjacent micro / nano structures gradually decreases along the direction near the top of the isolation pillar.

[0011] As one of the optional solutions to this technical solution, the range of the spacing width is: Where x is the spacing width between the two micro / nano structures located at the intersection of the first region and the top of the isolation column; y is the height between the top of the isolation column and the micro / nano structure to be tested.

[0012] As one of the optional solutions of this technical solution, the second hydrophobic structure includes a plurality of protrusions, which are arranged at equal intervals on the wall surface of the first hydrophobic structure facing the pixel region.

[0013] As one of the optional solutions to this technical solution, the second hydrophobic structure is configured as a magnetic coating.

[0014] As one of the optional solutions of this technical solution, a plurality of micro-nano structures are periodically arranged in a second region on the wall of the isolation column facing the pixel region, and the second region is the region between the top and bottom of the pixel droplet.

[0015] As one of the optional solutions of this technical solution, the polarity of the magnetic coating disposed in the second region is opposite to the polarity of the pixel droplet, and the same as the polarity of the magnetic coating disposed in the first region.

[0016] As one of the optional solutions of this technical solution, each of the isolation pillars also has a plurality of micro-nano structures periodically arranged inside its top.

[0017] As one of the optional solutions of this technical solution, the polarity of the magnetic coating disposed in the top region is the same as that of the magnetic coating disposed in the first region.

[0018] As one of the optional solutions of this technical solution, a groove is also provided on the bottom wall of the isolation column facing the pixel area.

[0019] As one of the optional solutions of this technical solution, a first hydrophilic structure is provided in the groove.

[0020] As one of the optional solutions of this technical solution, a second hydrophilic structure is further provided between the bottom of the isolation pillar and the substrate, and the second hydrophilic structure is connected to the groove.

[0021] As one of the optional solutions to this technical solution, the second hydrophobic structure is configured as a hydrophobic coating.

[0022] To achieve the above objectives, a second aspect of the present invention provides a display device comprising: a display substrate as described in any of the preceding descriptions, wherein each pixel region is filled with an organic functional layer.

[0023] To achieve the above objectives, a third aspect of the present invention provides a method for fabricating an array substrate, the method comprising:

[0024] Provide a substrate;

[0025] A plurality of spaced isolation pillars are fabricated on the substrate such that a pixel region is defined between each pair of adjacent isolation pillars;

[0026] A first hydrophobic structure is formed in a first region on the wall surface of each of the isolation pillars facing the pixel region, wherein the first region is the region above the top of the pixel droplet;

[0027] A second hydrophobic structure is prepared on the first hydrophobic structure.

[0028] As one of the optional solutions of this technical solution, the specific steps of fabricating the first hydrophobic structure in the first region on the wall surface of each of the isolation pillars facing the pixel region include:

[0029] A first hydrophobic structure is fabricated in a first region on the wall surface of each of the isolation pillars facing the pixel region using a nanoimprinting process.

[0030] (II) Beneficial Effects

[0031] Compared with the prior art, the present invention has the following advantages:

[0032] This invention provides an array substrate, a display device, and a fabrication method. The array substrate specifically includes: a substrate; a plurality of isolation pillars spaced apart on the substrate, with each pair of adjacent isolation pillars defining a pixel region; and a plurality of micro / nano structures arranged at least periodically in a first region on the wall surface of each isolation pillar facing the pixel region, the first region being the region above the top of the pixel droplet; each micro / nano structure includes: a first hydrophobic structure and a second hydrophobic structure stacked together. In summary, this application uses the above-mentioned structures to fabricate a superhydrophobic structure, so that the surface tension of the sidewall surface and the bottom wall surface of the pixel region are different, thereby ensuring that the pixel droplet is collected in the pixel region and less remains on the sidewall surface of the isolation pillars. At the same time, it increases the liquid loading capacity of the pixel region, effectively improving pixel crosstalk and ultimately improving the display performance of the display device. Attached Figure Description

[0033] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0034] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:

[0035] Figure 1 This is a schematic diagram of the structure of an array substrate in one embodiment of the present invention;

[0036] Figure 2 This is a cross-sectional view of a micro / nano structure, as shown in one embodiment of the present invention;

[0037] Figure 3 This is a schematic diagram illustrating the structure of another embodiment of the present invention, showing the interaction between the isolation column and the micro / nano structure;

[0038] Figure 4 yes Figure 3 A magnified view of a portion of the image;

[0039] Figure 5 This is a schematic diagram of the structure of an array substrate in another embodiment of the present invention;

[0040] Figure 6 This is another embodiment of the present invention, showing a schematic diagram of the array substrate structure;

[0041] Figure 7 yes Figure 6 A schematic diagram of the direction of magnetic force.

[0042] In the figure: 1. Isolation column; 2. Micro / nano structure; 3. First hydrophobic structure; 4. Second hydrophobic structure; 5. Groove; 6. Second hydrophilic structure; 7. First region; 8. Second region. Detailed Implementation

[0043] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0044] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments:

[0045] To address the technical problem of pixel crosstalk that easily occurs during the fabrication of display substrates in existing technologies, such as... Figures 1-7 As shown, the first aspect of the present invention provides an array substrate, comprising:

[0046] Substrate;

[0047] Multiple isolation pillars 1 are spaced apart on the substrate, and a pixel region is defined between each two adjacent isolation pillars 1. The pixel region is used to carry pixel droplets of different colors. Preferably, the multiple isolation pillars 1 are spaced equally on the substrate so that the size of the multiple pixel regions is equal.

[0048] Multiple micro / nano structures 2 are arranged periodically in a first region 7 on the wall surface of each isolation pillar 1 facing the pixel area. The first region 7 is the area above the top of the pixel droplet. Preferably, when the height of the isolation pillar 1 is n, the height of the first region 7 can be set to n / 3. The design of this embodiment can ensure that all areas in the pixel area except the area used to store the pixel droplet achieve superhydrophobicity by setting multiple micro / nano structures 2, thereby avoiding some pixel droplets remaining in the above-mentioned areas during the printing process, and thus effectively improving the pixel crosstalk problem. In order to reduce costs, it is preferable that multiple micro / nano structures 2 are only set in the first region 7 on the wall surface of each isolation pillar 1 facing the pixel area. Of course, multiple micro / nano structures 2 can be set on the wall surface of each isolation pillar 1 facing the pixel area. Alternatively, multiple micro / nano structures 2 can be set on the wall surface of each isolation pillar 1 facing the pixel area and on the top of the isolation pillar 1. The specific setting method will be described in detail in the following embodiments.

[0049] Specifically, each micro / nano structure 2 includes: a first hydrophobic structure 3 and a second hydrophobic structure 4 stacked together. In this embodiment, the first hydrophobic structure 3 and the second hydrophobic structure 4 together form a superhydrophobic structure, so that the surface tension of the side wall surface of the pixel area is different from that of the bottom wall surface of the pixel area. This ensures that the pixel droplets are gathered in the pixel area, while leaving less on the side wall surface of the isolation pillar. This effectively improves pixel crosstalk while increasing the liquid loading capacity of the pixel area, ultimately improving the display performance of the display device. In addition, the design of this embodiment is more conducive to process debugging during high refresh rate printing.

[0050] In one specific embodiment, the spacing between any two adjacent micro / nano structures 2 is the same, and the spacing between any two adjacent micro / nano structures 2 is 6 times the width of each micro / nano structure 2. That is, the spacing between any two adjacent first hydrophobic structures 3 is 6 times the width of each first hydrophobic structure 3. For example, the spacing between any two adjacent micro / nano structures 2 is 30nm-200nm, and the width of the micro / nano structure 2 is 5nm-30nm. In summary, the design of this embodiment can form a superhydrophobic surface between the sidewall of the pixel region and the pixel droplet, thereby increasing the contact angle between the pixel droplet and the superhydrophobic surface, and thus effectively improving the phenomenon of pixel droplets remaining on the sidewall of the pixel region; in a preferred embodiment, such as Figure 5As shown, multiple micro-nano structures 2 are disposed on the wall surface of the isolation pillar 1 facing the pixel area, and the spacing between each pair of adjacent micro-nano structures 2 is the same.

[0051] In another specific embodiment, to further improve the contact angle between the pixel droplet and the superhydrophobic surface, such as Figure 1 As shown, the spacing between any two adjacent micro / nano structures 2 gradually decreases towards the top of the isolation pillar 1. In other words, the micro / nano structures 2 are more densely arranged closer to the top of the isolation pillar 1, and more sparsely arranged closer to the bottom of the isolation pillar 1. Specifically, the value range of this spacing width is... Where x is the spacing width between the two micro / nano structures 2 located at the intersection of the first region 7 and the top of the isolation pillar 1; y is the height between the top of the isolation pillar 1 and the micro / nano structure 2 under test; for example, the value of x ranges from 5nm to 30nm; typically, the value of y ranges from 1.5μm to 2μm.

[0052] In a specific embodiment, such as Figures 1-3 As shown, the first hydrophobic structure 3 is configured as a protruding structure, and the second hydrophobic structure 4 includes multiple protrusions arranged at equal intervals on the wall surface of the protruding structure facing the pixel region; specifically, the spacing between each two adjacent protrusions is 6 times the width of each protrusion; for example, the spacing between two adjacent protrusions is 30nm-200nm; the width of each protrusion is 5nm-30nm; preferably, the cross-section of the protruding structure can be configured as a circular, sheet-like structure, or other shapes; the cross-section of the protrusion can be configured as a strip-shaped structure or other shapes; in a specific embodiment, such as Figure 2 As shown, the cross-section of the protruding structure is circular, and the cross-section of the raised structure is strip-shaped. Multiple circular protruding structures are densely arranged along the direction near the top of the isolation column 1, and multiple strip-shaped structures are evenly spaced on the protruding structures; in another specific embodiment, such as... Figure 3 and Figure 4As shown, the cross-section of the protruding structure is set as a sheet structure, and the cross-section of the raised structure is set as a strip structure. Multiple sheet-like protruding structures are equally spaced on the isolation pillar 1, and multiple strip structures are equally spaced on the sheet-like protruding structures. To further improve the hydrophobic performance, preferably, multiple sheet-like protruding structures are densely arranged along the direction close to the top of the isolation pillar 1. Of course, the protruding structure and the raised structure can also adopt other matching methods, which will not be described in detail in this embodiment. In summary, the protruding structure and the raised structure in this embodiment can form a superhydrophobic structure, so as to form a superhydrophobic surface with the pixel droplet, further increasing the contact angle between the pixel droplet and the superhydrophobic surface. Through multiple experiments, it is found that the design of this embodiment can increase the contact angle from 70°-90° in the prior art to 120°-160°.

[0053] Of course, to further enhance the hydrophobic properties, the isolation column 1 can be made of a hydrophobic material. Exemplary hydrophobic materials can be fluorinated materials such as fluorinated polyethylene, fluorocarbon wax or other synthetic fluorinated polymers, or high molecular melt polymers such as polyolefins, polycarbonates, polyamides, polyacrylonitrile, polyesters, fluorine-free acrylates, molten paraffin, etc.

[0054] According to one embodiment of this application, such as Figure 6 and Figure 7 As shown, the second hydrophobic structure 4 is configured as a magnetic coating. Figure 7 The direction of the middle arrow indicates the direction of magnetic force; that is, the micro-nano structure 2 in the first region 7 within the wall of the isolation column 1 facing the pixel area has a magnetic coating, and the polarity of the magnetic coating is the same as the polarity of the pixel droplet, so that the micro-nano structure 2 forms a repulsive pressure on the pixel droplet, which can effectively suppress the climbing of the pixel droplet during the drying process, which is conducive to forming a relatively flat film on the surface of the pixel area and improving the uniformity of film formation.

[0055] Based on the above embodiments, in order to further suppress the climbing of pixel droplets during the drying process, multiple micro-nano structures 2 are periodically arranged in the second region 8 on the wall surface of the isolation column 1 facing the pixel area. The second region 8 is the area between the top and bottom of the pixel droplet. Specifically, the polarity of the magnetic coating disposed in the second region 8 is opposite to that of the pixel droplet, and the same as that of the magnetic coating disposed in the first region 7. For example, when the pixel droplet is positively polarized, the magnetic coating disposed in the second region 8 is set to negatively polarized, and the pixel droplet is adsorbed by the attraction of opposite polarities. At the same time, the magnetic coating disposed in the first region 7 is set to positively polarized. At this time, under the action of like poles repulsion, the micro-nano structures 2 disposed in the first region 7 will provide pressure to the pixel droplet, thereby effectively suppressing the climbing of pixel droplets during the drying process, which is conducive to forming a relatively flat film on the surface of the pixel droplet and improving the film uniformity.

[0056] Based on the above embodiments, in order to further suppress the climbing of pixel droplets during the drying process, such as Figure 6 and Figure 7 As shown, each isolation pillar 1 also has multiple micro / nano structures 2 arranged periodically at its top. Specifically, the polarity of the magnetic coating in the top region is the same as that of the magnetic coating in the first region 7; that is, the polarity of the magnetic coating in the second region 8 is opposite to that of the pixel droplet and the same as that of the magnetic coating in the first region 7. The polarity of the magnetic coating in the top region is the same as that of the magnetic coating in the first region 7. For example, when the pixel droplet is positively polarized, the magnetic coating in the second region 8 is set to negatively polarized, and the pixel droplet is adsorbed by the attraction of opposite polarities. Simultaneously, the magnetic coating disposed in the first region 7 is set to positive polarity. At this time, under the effect of like poles repulsion, the micro-nano structure 2 disposed in the first region 7 will provide pressure to the pixel droplets. Furthermore, the magnetic coating disposed in the top region of the isolation pillar 1 is set to positive polarity, thereby providing pressure to the pixel droplets through the micro-nano structure 2 disposed in the top region under the effect of like poles repulsion. In summary, the adsorption force in the second region 8 and the pressure in the first region 7 and the top region work together to further effectively suppress the climbing of pixel droplets during the drying process, which is conducive to forming a relatively flat film on the surface of the pixel area and improving the film uniformity.

[0057] According to one embodiment of this application, in order to further suppress the climbing of pixel droplets during the drying process, such as Figure 1As shown, a groove 5 is also provided on the bottom wall of the isolation column 1 facing the pixel area. When the pixel droplets are printed into the pixel area, some of the pixel droplets will enter the groove 5. At this time, the pixel droplets will be restricted by the groove 5, thereby further effectively suppressing the climbing of the pixel droplets during the drying process. This is conducive to forming a relatively flat film on the surface of the pixel area and improving the film uniformity. Based on the above embodiment, in order to further enhance the restriction effect of the groove 5 on the pixel droplets, a first hydrophilic structure is also provided in the groove 5. The pixel droplets are further adsorbed by the first hydrophilic structure.

[0058] According to one embodiment of this application, in order to further reduce droplet climbing in pixel areas and improve the uniformity of pixel film formation, the following solution can be adopted, such as... Figure 1 As shown, a second hydrophilic structure 6 is also provided between the bottom of the isolation pillar 1 and the substrate. The second hydrophilic structure 6 is connected to the groove 5, so that when the pixel droplet enters the groove 5, it can come into contact with the second hydrophilic structure 6, and thus the pixel droplet is suppressed by the joint action of the groove 5 and the second hydrophilic structure 6. Specifically, the height of the second hydrophilic structure 6 is in the range of 0.1um-0.5um; the width of the second hydrophilic structure 6 is 1 / 2-2 / 3 of the width of the isolation pillar 1; the first hydrophilic structure and the second hydrophilic structure 6 can both be made of hydrophilic material, and the specific composition of the hydrophilic material is not specifically limited in this embodiment.

[0059] According to one embodiment of this application, the second hydrophobic structure 4 is configured as a hydrophobic coating. The hydrophobic material can be a fluorinated material, such as fluorinated polyethylene, fluorocarbon wax or other synthetic fluorinated polymers, or a high molecular melt polymer such as polyolefin, polycarbonate, polyamide, polyacrylonitrile, polyester, fluorine-free acrylate, molten paraffin, etc. Specifically, when the isolation pillar 1 is made of a hydrophobic material, in order to further enhance the hydrophobic performance of the sidewall of the pixel area, it is preferable to configure the second hydrophobic structure 4 as a hydrophobic coating, and the hydrophobic performance of the hydrophobic coating is higher than that of the isolation pillar 1. For example, the hydrophobic coating is made of fluorinated polyethylene and the isolation pillar 1 is made of polyolefin.

[0060] Under the same inventive concept, a second aspect of the present invention provides a display device comprising: a display substrate of any of the foregoing, wherein each pixel region is filled with an organic functional layer.

[0061] Under the same inventive concept, a third aspect of this invention proposes a method for fabricating an array substrate, the method comprising:

[0062] Provide a substrate;

[0063] Multiple isolation pillars 1 are fabricated on a substrate at intervals, so that a pixel region is defined between each two adjacent isolation pillars 1;

[0064] A first hydrophobic structure 3 is fabricated in a first region 7 on the wall surface of each isolation pillar 1 facing the pixel region, wherein the first region 7 is the region above the top of the pixel droplet;

[0065] A second hydrophobic structure 4 was prepared on the first hydrophobic structure 3.

[0066] According to one embodiment of this application, the specific steps for fabricating a first hydrophobic structure 3 in a first region 7 on the wall surface of each isolation pillar 1 facing the pixel region include:

[0067] A first hydrophobic structure 3 is fabricated in the first region 7 on the wall surface of each isolation pillar 1 facing the pixel area by nanoimprinting.

[0068] In a specific embodiment, such as Figure 2 and Figure 5 As shown, the first hydrophobic structure 3 is made of an expanding material and its cross-section is set as a circular structure. The second hydrophobic structure 4 is set as a strip structure, and multiple strip structures are arranged at equal intervals on the first hydrophobic structure 3.

[0069] The specific preparation process is as follows:

[0070] Step 1: Provide a TFT backplane as a substrate;

[0071] Step 2: Apply a layer of organic adhesive to the TFT backplane. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500rpm / s-3000rpm / s, and the spin coating time can be 30s-1min.

[0072] Step 3: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0073] Step 4: Multiple thermal expansion materials are evenly spaced or densely arranged on the wall surface of each isolation pillar 1 facing the pixel area, wherein the thermal conductivity of the thermal expansion materials is >0.2W / m*K;

[0074] Step 5: Select a temperature of 200℃ to 250℃ and cure the photoresist for 30min to 90min. During the curing process, multiple thermally expanding materials expand to form the first hydrophobic structure 3, so that multiple first hydrophobic structures 3 are periodically arranged on the side wall surface of the pixel area.

[0075] Step 6: Use a laser to process each of the first hydrophobic structures 3 into a sphere with a radius of 50nm-200nm;

[0076] Step 7: Using a laser, etch multiple strip-shaped protrusions onto the spherical first hydrophobic structure 3, so that the multiple strip-shaped protrusions are evenly spaced on the spherical first hydrophobic structure 3 to form the second hydrophobic structure 4. The width of each strip-shaped protrusion is 10nm-20nm. See details below. Figure 2 .

[0077] Based on the above structure, in order to further suppress the climbing of pixel droplets during the drying process, such as Figure 1 As shown, a groove 5 is also formed on the bottom wall of the isolation pillar 1 facing the pixel area. A second hydrophilic structure 6 is also provided between the bottom of the isolation pillar 1 and the substrate. The second hydrophilic structure 6 is connected to the groove 5, as shown in the figure. Figure 1 As shown.

[0078] The specific preparation process is as follows:

[0079] Step 1: Provide a TFT backplane as a substrate;

[0080] Step 2: Coat a layer of organic adhesive material made of hydrophilic material on the TFT backplane and pattern it to prepare a second hydrophilic structure 6. The height of the second hydrophilic structure 6 is 0.1um-0.5um and the width is 1 / 2-2 / 3 of the width of the isolation pillar 1.

[0081] Step 3: Apply an organic adhesive to the TFT backplane and the second hydrophilic structure 6. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500 rpm / s-3000 rpm / s, and the spin coating time can be 30s-1min.

[0082] Step 4: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0083] Step 5: Multiple thermal expansion materials are evenly spaced or densely arranged on the wall surface of each isolation pillar 1 facing the pixel area, wherein the thermal conductivity of the thermal expansion materials is >0.2W / m*K;

[0084] Step 6: Select a temperature of 200℃ to 250℃ and cure the photoresist for 30min to 90min. During the curing process, multiple thermally expanding materials expand to form the first hydrophobic structure 3, so that multiple first hydrophobic structures 3 are periodically arranged on the side wall surface of the pixel area.

[0085] Step 7: Use a laser to process each of the first hydrophobic structures 3 into a sphere with a radius of 50nm-200nm;

[0086] Step 8: Using a laser, etch multiple strip-shaped protrusions onto the spherical first hydrophobic structure 3, so that the multiple strip-shaped protrusions are evenly spaced on the spherical first hydrophobic structure 3 to form the second hydrophobic structure 4. The width of each strip-shaped protrusion is 10nm-20nm. See details below. Figure 2 .

[0087] Step 9: Etch a groove 5 structure at the bottom of each isolation pillar 1 so that the groove 5 structure is connected to the second hydrophilic structure 6. The etching solution can be printed into the pixel pit by an inkjet printer. After etching is completed, the solvent can be removed by a vacuum drying device, and then the final substrate can be obtained by cleaning.

[0088] In a specific embodiment, such as Figure 3 and Figure 4 As shown, the first hydrophobic structure 3 is made of sheet material, and the second hydrophobic structure 4 is set as a strip structure, with multiple strip structures arranged at equal intervals on the first hydrophobic structure 3.

[0089] The specific preparation process is as follows:

[0090] Step 1: Provide a TFT backplane as a substrate;

[0091] Step 2: Apply a layer of organic adhesive to the TFT backplane. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500rpm / s-3000rpm / s, and the spin coating time can be 30s-1min.

[0092] Step 3: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0093] Step 4: On the wall surface of each isolation pillar 1 facing the pixel area, multiple sheet-like materials composed of talc powder, mica powder, etc. are arranged at equal intervals or densely in the direction of isolation pillar 1.

[0094] Step 5: Use a laser to process each sheet material, so that its thickness ranges from 10 to 100 nm; and its planar size ranges from 50 nm to 100 nm * 100 to 500 nm.

[0095] Step 6: Using a laser, multiple strip-shaped protrusions are etched onto the sheet-like first hydrophobic structure 3, so that the multiple strip-shaped protrusions are evenly spaced on the spherical first hydrophobic structure 3 to form the second hydrophobic structure 4. The width of each strip-shaped protrusion is 10nm-20nm. See details below. Figure 3 and Figure 4 .

[0096] Based on the above structure, in order to further suppress the climbing of pixel droplets during the drying process, such as Figure 6 and Figure 7 As shown, the second hydrophobic structure 4 is configured as a magnetic coating, wherein the magnetic coating can be selected from ferromagnetic elements such as iron, cobalt, and nickel; and multiple micro-nano structures 2 are provided in the first region 7 and the second region 8 facing the pixel area of ​​the isolation pillar 1, preferably using nanoimprinting technology to imprint the micro-nano structures 2 onto the isolation pillar 1; in addition, a groove 5 is also provided on the bottom wall of the isolation pillar 1 facing the pixel area, and a second hydrophilic structure 6 is provided between the bottom of the isolation pillar 1 and the substrate, and the second hydrophilic structure 6 is connected to the groove 5.

[0097] The specific preparation process is as follows:

[0098] Step 1: Provide a TFT backplane as a substrate;

[0099] Step 2: Coat a layer of organic adhesive material made of hydrophilic material on the TFT backplane and pattern it to prepare a second hydrophilic structure 6. The height of the second hydrophilic structure 6 is 0.1um-0.5um and the width is 1 / 2-2 / 3 of the width of the isolation pillar 1.

[0100] Step 3: Apply an organic adhesive to the TFT backplane and the second hydrophilic structure 6. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500 rpm / s-3000 rpm / s, and the spin coating time can be 30s-1min.

[0101] Step 4: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0102] Step 5: Use a laser to form multiple nanoscale micropores on the wall surface of the isolation pillar 1 facing the pixel area. The multiple micropores can be arranged at equal intervals or densely arranged facing the top of the isolation pillar 1.

[0103] Step 6: Prepare the first hydrophobic structure 3, and coat the outer wall of the first hydrophobic structure 3 with a magnetic coating. Specifically, when the pixel droplet is positive, the magnetic coating set in the second region 8 is set to negative, and at the same time, the magnetic coating set in the first region 7 is set to positive, thereby completing the preparation of the micro / nano structure 2.

[0104] Step 7: Imprint the negative polar nanostructure into the micropores opened in the second region 8 using nanoimprint technology, and imprint the positive polar nanostructure into the micropores opened in the first region 7.

[0105] Step 8: Etch a groove 5 structure at the bottom of each isolation pillar 1 so that the groove 5 structure is connected to the second hydrophilic structure 6.

[0106] Step 9: In the drying process, the TFT substrate can be placed in a reduced-pressure drying magnetic field to remove the solvent, and then the final substrate is obtained by cleaning.

[0107] Based on the above embodiments, in order to better suppress the climbing of pixel droplets during the drying process, it is preferable to provide a plurality of micro-nano structures 2 in the top region of the isolation column 1, and the micro-nano structure 2 is provided with a magnetic coating, wherein the polarity of the magnetic coating is the same as the polarity of the magnetic coating provided in the first region 7.

[0108] The specific preparation process is as follows:

[0109] Step 1: Provide a TFT backplane as a substrate;

[0110] Step 2: Coat a layer of organic adhesive material made of hydrophilic material on the TFT backplane and pattern it to prepare a second hydrophilic structure 6. The height of the second hydrophilic structure 6 is 0.1um-0.5um and the width is 1 / 2-2 / 3 of the width of the isolation pillar 1.

[0111] Step 3: Apply an organic adhesive to the TFT backplane and the second hydrophilic structure 6. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500 rpm / s-3000 rpm / s, and the spin coating time can be 30s-1min.

[0112] Step 4: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0113] Step 5: Using a laser, multiple nanoscale micropores are formed on the wall surface of the isolation pillar 1 facing the pixel area and on the top of the isolation pillar 1. The multiple micropores can be arranged at equal intervals or densely arranged facing the top of the isolation pillar 1.

[0114] Step 6: Prepare the first hydrophobic structure 3, and coat the outer wall of the first hydrophobic structure 3 with a magnetic coating. Specifically, when the pixel droplet is positive, the magnetic coating set in the second region 8 is set to negative. At the same time, the magnetic coatings set in the first region 7 and the top of the isolation pillar 1 are both set to positive, thereby completing the preparation of the micro / nano structure 2.

[0115] Step 7: Imprint the negative polar nanostructure into the micropores opened in the second region 8 and the top region of the isolation pillar 1 respectively using nanoimprint technology, and imprint the positive polar nanostructure into the micropores opened in the first region 7.

[0116] Step 8: Etch a groove 5 structure at the bottom of each isolation pillar 1 so that the groove 5 structure is connected to the second hydrophilic structure 6.

[0117] Step 9: In the drying process, the TFT substrate can be placed in a reduced-pressure drying magnetic field to remove the solvent, and then the final substrate is obtained by cleaning.

[0118] In one specific embodiment, the second hydrophobic structure 4 is configured as a hydrophobic coating. Preferably, the micro / nano structure 2 with the hydrophobic coating is imprinted onto the isolation pillar 1 using nanoimprinting technology. The hydrophobic properties of the hydrophobic coating are stronger than the hydrophobic material properties of the isolation pillar 1. In addition, a groove 5 is provided on the bottom wall of the isolation pillar 1 facing the pixel area. A second hydrophilic structure 6 is also provided between the bottom of the isolation pillar 1 and the substrate. The second hydrophilic structure 6 is connected to the groove 5.

[0119] The specific preparation process is as follows:

[0120] Step 1: Provide a TFT backplane as a substrate;

[0121] Step 2: Coat a layer of organic adhesive material made of hydrophilic material on the TFT backplane and pattern it to prepare a second hydrophilic structure 6. The height of the second hydrophilic structure 6 is 0.1um-0.5um and the width is 1 / 2-2 / 3 of the width of the isolation pillar 1.

[0122] Step 3: Coat the TFT backplane and the second hydrophilic structure 6 with an organic adhesive material containing hydrophobic material. The spin coating speed and time can be selected according to the height of the isolation pillar 1. The speed can be 500 rpm / s-3000 rpm / s, and the spin coating time can be 30s-1min.

[0123] Step 4: Then, multiple equally spaced isolation pillars 1 are patterned through processes such as preheating, exposure and development. The spacing between each pair of adjacent isolation pillars 1 is 10-120um, so that a pixel area is formed between each pair of adjacent isolation pillars 1.

[0124] Step 5: Use a laser to form multiple nanoscale micropores on the wall surface of the isolation pillar 1 facing the pixel area. The multiple micropores can be arranged at equal intervals or densely arranged facing the top of the isolation pillar 1.

[0125] Step 6: Prepare the first hydrophobic structure 3, and coat the outer wall surface of the first hydrophobic structure 3 with a hydrophobic coating, wherein the hydrophobic properties of the hydrophobic coating are stronger than the hydrophobic material properties of the isolation column 1.

[0126] Step 7: Imprint multiple nanostructures into the corresponding micropores using nanoimprint technology;

[0127] Step 8: Etch a groove 5 structure at the bottom of each isolation pillar 1 so that the groove 5 structure is connected to the second hydrophilic structure 6.

[0128] Step 9: In the drying process, the TFT substrate can be placed in a reduced-pressure drying magnetic field to remove the solvent, and then the final substrate is obtained by cleaning.

[0129] The various embodiments in this specification are described in a progressive manner. Several embodiments focus on the differences from other embodiments, and the same or similar parts between the various embodiments can be referred to each other.

[0130] It should be noted that in the specification, claims, and accompanying drawings of this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or specific order or sequence between these entities or operations. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented, for example, in orders other than those illustrated or described herein.

[0131] Furthermore, the terms "comprising," "including," and "having," as well as any variations thereof, are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus. For example, a process, method, system, product, or apparatus that comprises a list of steps or units is not necessarily limited to those steps or units expressly listed, but may include other steps or units not expressly listed or inherent to such process, method, product, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes the element.

[0132] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.

[0133] The above are merely specific embodiments of this application, enabling those skilled in the art to understand or implement this application. Various modifications and variations to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application. Therefore, this application is not limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. An array substrate, characterized in that, include: Substrate; Multiple isolation pillars are spaced apart on the substrate, and a pixel region is defined between each two adjacent isolation pillars; And multiple micro / nano structures, at least periodically arranged in a first region on the wall of each of the isolation pillars facing the pixel region, the first region being the region above the top of the pixel droplet; Each of the micro / nano structures includes: a first hydrophobic structure and a second hydrophobic structure stacked together; Each of the isolation pillars also has multiple micro / nano structures periodically arranged inside its top; The spacing between each pair of adjacent micro / nano structures is the same; Alternatively, the spacing between any two adjacent micro / nanostructures gradually decreases along the direction near the top of the isolation pillar; The second hydrophobic structure is configured as a magnetic coating; The second region on the wall of the isolation column facing the pixel area is also periodically arranged with multiple micro-nano structures, and the second region is the area between the top and bottom of the pixel droplet; The polarity of the magnetic coating disposed in the second region is opposite to that of the pixel droplet, while the polarity of the pixel droplet is the same as that of the magnetic coating disposed in the first region.

2. The array substrate according to claim 1, characterized in that, The range of values ​​for the spacing is: - Where x is the spacing width between the two micro / nano structures located at the intersection of the first region and the top of the isolation column; y is the height between the top of the isolation column and the micro / nano structure to be tested.

3. The array substrate according to claim 1, characterized in that, The second hydrophobic structure includes a plurality of protrusions, which are arranged at equal intervals on the wall of the first hydrophobic structure facing the pixel region.

4. The array substrate according to claim 1, characterized in that, The magnetic coating in the top region has the same polarity as the magnetic coating in the first region.

5. The array substrate according to claim 1, characterized in that, The bottom of the isolation column has a groove on the wall facing the pixel area.

6. The array substrate according to claim 5, characterized in that, A first hydrophilic structure is provided inside the groove.

7. The array substrate according to claim 5, characterized in that, A second hydrophilic structure is also provided between the bottom of the isolation pillar and the substrate, and the second hydrophilic structure is connected to the groove.

8. The array substrate according to claim 1, characterized in that, The second hydrophobic structure is configured as a hydrophobic coating.

9. A display device, characterized in that, include: The array substrate according to any one of claims 1-8, wherein each pixel region is filled with an organic functional layer.

10. A method for fabricating an array substrate, characterized in that, The method for preparing the array substrate according to any one of claims 1-8 comprises: Provide a substrate; A plurality of spaced isolation pillars are fabricated on the substrate such that a pixel region is defined between each pair of adjacent isolation pillars; A first hydrophobic structure is formed in a first region on the wall surface of each of the isolation pillars facing the pixel region, wherein the first region is the region above the top of the pixel droplet; A second hydrophobic structure is prepared on the first hydrophobic structure; Each of the isolation pillars also has multiple micro- and nano-structures periodically arranged at its top.

11. The method for fabricating an array substrate according to claim 10, characterized in that, The specific steps for fabricating the first hydrophobic structure in the first region on the wall surface of each of the isolation pillars facing the pixel region include: A first hydrophobic structure is fabricated in a first region on the wall surface of each of the isolation pillars facing the pixel region using a nanoimprinting process.

Images