A high voltage measuring device and a measuring method

Abstract

The application discloses a high-voltage measuring device and a measuring method, the device comprising a parallel-plate capacitor, an electric field intensity sensor and a processor; the parallel-plate capacitor comprises two parallel metal plates, an internal electric field is formed between the two parallel metal plates of the parallel-plate capacitor, and the two parallel metal plates of the parallel-plate capacitor are used for connecting a measured high voltage; the electric field intensity sensor is arranged between the two parallel metal plates of the parallel-plate capacitor, the electric field intensity sensor is used for collecting the electric field intensity between the two parallel metal plates of the parallel-plate capacitor and outputting a low voltage; the processor is connected with the electric field intensity sensor, used for receiving the low voltage output by the electric field intensity sensor, and used for calculating the high voltage between the two parallel metal plates of the parallel-plate capacitor according to the low voltage and the spacing between the two parallel metal plates of the parallel-plate capacitor, so that the value of the measured high voltage is measured.

Description

Technical Field

[0001] This invention relates to the field of high-voltage power transmission technology, and particularly to a high-voltage measuring device and method. Background Technology

[0002] High-voltage measurement technology is a crucial technology for the operation of ultra-high-voltage transmission lines. Currently, common high-voltage measurement methods include the following:

[0003] (1) Measurement method of ball gap pressure gauge

[0004] A ball gap voltmeter is a discharge voltmeter that measures the voltage by extrapolating from a lower discharge voltage to the rated voltage.

[0005] A ball gap voltage gauge consists of a pair of metal balls of the same diameter. Its working principle is based on the fact that the discharge (breakdown) voltage of a ball gap of a certain diameter at a certain distance between the electrodes is a fixed value.

[0006] (2) Electrostatic voltmeter measurement method

[0007] When a voltage U is applied between two specially rolled parallel electrodes, the electrodes will be subjected to an electrostatic force F. The magnitude of F has a fixed relationship with the value of U. Therefore, by measuring the magnitude of F or the displacement or deflection of the movable plate caused by it, the magnitude of the applied voltage U can be determined.

[0008] (3) Measurement of high voltage divider

[0009] When the voltage being measured is very high, a high-voltage divider is used to divide a small portion of the voltage, which is then measured using instruments such as an electrostatic voltmeter, a peak voltmeter, and a high-voltage pulse oscilloscope. High-voltage dividers can be classified into three types: resistive voltage dividers, capacitive voltage dividers, and resistive-capacitive voltage dividers.

[0010] Existing high-voltage measurement methods, besides commonly using very bulky and cumbersome instrument transformers and auxiliary equipment, suffer from significant measurement errors due to the numerous measurement stages, complex measuring mechanisms, and non-static measuring mechanisms. The performance of these mechanisms is unstable, posing numerous safety hazards. Furthermore, existing high-voltage measuring devices operate under harsh conditions, are primarily installed, and cannot be used for portable measurements or outdoor applications, making them unsuitable for ultra-high voltage measurements. Additionally, current high-voltage measurement methods often utilize SF6 dielectric, which not only increases the risk of explosion but is also environmentally unfriendly. Summary of the Invention

[0011] In view of this, the present invention proposes a high voltage measuring device and a measuring method. The measuring device has a simple structure and provides accurate measurement results.

[0012] The first aspect of this invention provides a high-voltage measuring device, which includes a parallel-plate capacitor, an electric field strength sensor, and a processor. The parallel-plate capacitor includes two parallel metal plates, and an internal electric field is formed between the two parallel metal plates. The two parallel metal plates are used to connect to the high voltage to be measured. The electric field strength sensor is disposed between the two parallel metal plates of the parallel-plate capacitor. The electric field strength sensor is used to collect the electric field strength between the two parallel metal plates of the parallel-plate capacitor and output a low voltage. The processor is connected to the electric field strength sensor and is used to receive the low voltage output by the electric field strength sensor, and calculate the high voltage between the two parallel metal plates of the parallel-plate capacitor based on the low voltage and the distance between the two parallel metal plates of the parallel-plate capacitor, thereby measuring the value of the high voltage to be measured.

[0013] Furthermore, the parallel plate capacitor also includes two input electrodes for connecting to the high voltage being measured.

[0014] Furthermore, there is a dielectric between the two parallel metal plates.

[0015] Furthermore, it also includes a metal shielding shell, within which the parallel plate capacitor is disposed.

[0016] Furthermore, the outer periphery of the parallel plate capacitor is provided with an electrical insulation layer.

[0017] Furthermore, it also includes two output electrodes for connecting the processor and an external voltage measuring instrument or voltage display, which is a general voltage measurement product or device.

[0018] Furthermore, it also includes a grounding plate, which is connected to both ends of the metal shielding shell.

[0019] A second aspect of the present invention provides a high voltage measurement method, which is implemented based on the high voltage measurement device described above. The method includes the following steps: an electric field strength sensor measures the electric field strength between two parallel metal plates of a parallel plate capacitor and outputs a low voltage; a processor is connected to the electric field strength sensor to receive the low voltage output by the electric field strength sensor, and calculates the high voltage between the two parallel metal plates of the parallel plate capacitor based on the low voltage and the distance between the two parallel metal plates of the parallel plate capacitor, thereby measuring the value of the measured high voltage.

[0020] The aforementioned high-voltage measuring device has a particularly high internal impedance and a high internal electric field strength. After being connected to the circuit, it will not change the value of the high voltage being measured. It is not easily affected by external electromagnetic field interference, and the measurement results are accurate and reliable. The measurement process is simple due to the small number of measurement links, which fundamentally ensures the ease of measurement and small systematic error of the entire measuring device. Attached Figure Description

[0021] For illustrative and not limiting purposes, the invention will now be described with reference to preferred embodiments thereof, particularly the accompanying drawings, in which:

[0022] Figure 1 This is a schematic diagram of the structure of a high voltage measuring device provided in an embodiment of the present invention;

[0023] Figure 2 This is a flowchart of a high-voltage measurement method provided in another embodiment of the present invention. Detailed Implementation

[0024] To better understand the above-mentioned objects, features, and advantages of the present invention, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be noted that, unless otherwise specified, the embodiments of the present invention and the features thereof can be combined with each other.

[0025] Numerous specific details are set forth in the following description to provide a thorough understanding of the invention. The described embodiments are merely some, not all, of the embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0027] Figure 1 This is a schematic diagram of a high-voltage measuring device according to an embodiment of the present invention. Please refer to [link / reference]. Figure 1The high-voltage measuring device includes a parallel plate capacitor, an electric field strength sensor 6, and a processor (not shown in the figure). The parallel plate capacitor includes two parallel metal plates 8, and an internal electric field is formed between the two parallel metal plates 8. The two parallel metal plates 8 are used to connect to the high voltage to be measured. The electric field strength sensor 6 is arranged between the two parallel metal plates 8 of the parallel plate capacitor. The electric field strength sensor 6 is used to collect the electric field strength E between the two parallel metal plates 8 of the parallel plate capacitor and output a low voltage U2. The processor (not shown in the figure) is connected to the electric field strength sensor 6 and is used to receive the low voltage U2 output by the electric field strength sensor 6. Based on the low voltage U2 and the distance D between the two parallel metal plates 6 of the parallel plate capacitor, the high voltage U1 between the two parallel metal plates 6 of the parallel plate capacitor is calculated, thereby measuring the value of the high voltage to be measured. The processor can adjust or calibrate the measurement error and convert the measurement unit, thereby realizing direct reading of the measurement result. The processor can also realize internal data storage and external communication output.

[0028] In this embodiment, the parallel plate capacitor also includes a pair of input electrodes 1, which are connected to a pair of parallel metal plates 8 for connecting to the high voltage to be measured.

[0029] A dielectric 7 is provided between two parallel metal plates 8, which enables safe and environmentally friendly measurements of ultra-high voltage (EHV) and extra-high voltage (UHV). In some embodiments, the dielectric 7 may be perfluoroisobutyronitrile (PFOBN), which enables safe and environmentally friendly measurements of EHV and UHV.

[0030] This embodiment uses perfluoroisobutyronitrile (PFOBN) as the dielectric of the measuring device, enabling the measurement of high voltages in ultra-high voltage (EHV) and extra-high voltage (UHV) applications. This further reduces the overall size of the measuring device, making it more compact. As an insulating medium, PFOBN can provide an environmentally friendly alternative to sulfur hexafluoride (SF6), reducing the consumption and emissions of SF6 in my country. This has significant social and economic benefits for energy conservation, emission reduction, mitigating the greenhouse effect, and building a green power grid.

[0031] In some embodiments, the device further includes a metal shielding housing 2, within which a parallel plate capacitor is disposed. The metal shielding housing 2 isolates and shields the mutual influence of internal and external electric fields, preventing the high-voltage source and high-voltage leads from affecting the low-voltage measuring equipment and measuring personnel. Preferably, the metal shielding housing 2 is made of copper to maximize the isolation and shielding of the mutual influence of internal and external electric fields, effectively preventing the high-voltage source and high-voltage leads from affecting the low-voltage measuring equipment and measuring personnel.

[0032] In some embodiments, an electrical insulation layer 4 is provided on the outer periphery of the parallel plate capacitor, which provides good electrical insulation performance for the parallel plate capacitor. This electrical insulation layer 4 uses an electrical insulation material of appropriate voltage rating, effectively preventing high voltage from affecting the safety of the measuring personnel and measuring device, while simultaneously sealing the dielectric 7 between the two metal plates 8.

[0033] In this embodiment, the device further includes two output electrodes 3, which are used to connect the processor and an external voltage measuring instrument or voltage display. The external voltage measuring instrument or voltage display is a general voltage measurement product or device. After passing through the processor, the low voltage measuring instrument or voltage display outputs the measured high voltage value to indicate or display.

[0034] This embodiment employs an electrical insulation layer 4 with a fully enclosed electrical insulation structure and a metal shielding shell 2 with a fully enclosed electric field shielding structure, making the measuring device compact and the measurement process safe and reliable.

[0035] In some embodiments, the device further includes a grounding plate 5, which is connected to both ends of the metal shielding shell 2. The grounding plate 5 and the metal shielding shell 2 together isolate the mutual influence of the internal and external electric fields, ensuring the independence of the measured electric field. Preferably, the grounding plate 5 is a large-size copper plate, which is connected to the metal shielding shell 2 to further isolate the mutual influence of the internal and external electric fields.

[0036] The metal shielding shell 2 adopts grounding at both farthest ends, which effectively reduces the induced transient voltage; effectively reduces the influence of the measured high voltage electric field on the outside world; and basically eliminates the influence of AC magnetic field on the core measuring mechanism.

[0037] In some embodiments, the connection wire of the input electrode 1 for connecting the high voltage source under test is introduced from the rear side of the grounding plate 5 to further prevent the high voltage source and high voltage lead from affecting the safety of the measuring device, the measurement results, the personal safety of the measuring personnel, and radio frequency radiation.

[0038] In some embodiments, the electric field strength sensor 6 employs a microstructure electric field sensor chip based on MEMS technology to acquire the electric field strength E between the two parallel metal plates 8 of the parallel plate capacitor. The microstructure electric field sensor chip based on MEMS technology is only on the order of micrometers, with a typical size of 33 square millimeters. The entire measurement device is small in size, light in weight, low in power consumption, low in cost, and high in reliability, possessing advantages that traditional sensors cannot match.

[0039] Because electric fields are invisible and intangible, despite long-standing interest in electric field detection, the development of instruments and equipment for this purpose has been relatively slow. Traditional electric field detectors are large, complex, and expensive, and suffer from low spatial resolution, inconvenience, and a high failure rate.

[0040] This embodiment utilizes the characteristic that the electric field intensity E between the two parallel metal plates 8 of a parallel plate capacitor is uniformly distributed, and that the electric field intensity E is linearly proportional to the high voltage U1 between the two metal plates 8, i.e., U1 = DE, where D is the distance between the two metal plates. Simultaneously, the value of the high voltage can be measured by using the low voltage U2 output between the two output electrodes 3 by the electric field intensity sensor 6. This high voltage measuring device has extremely high internal resistance, consumes almost no energy, and has very high measurement accuracy.

[0041] In this embodiment, the processor (not shown in the figure) calculates the high voltage U1 between the two parallel metal plates 8 of the parallel plate capacitor based on the low voltage U2 and the distance D between the two parallel metal plates of the parallel plate capacitor, thereby measuring the value of the measured high voltage. The relationship between the measured high voltage U1 and the low voltage U2 is expressed as follows:

[0042]

[0043] Therefore, after obtaining the low voltage U2, the high voltage U1 of the two parallel metal plates 8 of the parallel plate capacitor can be measured. The measured high voltage value can be obtained by multiplying the low voltage U2 by a proportionality coefficient D / K. Furthermore, the processor can adjust or calibrate the measurement error by adjusting the proportionality coefficient D / K, and convert the measurement units, thus achieving direct reading of the measurement results. The processor can also perform internal data storage and external communication output. The measured high voltage value is then output as an indication or displayed by the low voltage measuring instrument or voltage display after processing.

[0044] The aforementioned high-voltage measuring device has a particularly high internal impedance and a high internal electric field strength. After being connected to the circuit, it will not change the value of the high voltage being measured. It is not easily affected by external electromagnetic field interference, and the measurement results are accurate and reliable. The measurement process is simple due to the small number of measurement links, which fundamentally ensures the ease of measurement and small systematic error of the entire measuring device.

[0045] The aforementioned high-voltage measuring device is a static measuring device, which ensures that the system error of the measurement is stable, adjustable, controllable, compensable, and can be eliminated; and ensures the stable performance of the measuring device.

[0046] The above-mentioned high-voltage measuring device offers flexible measurement methods, capable of measuring both high and low voltages; both AC and DC voltages; both mounted and portable models; and both indoor and outdoor measurements.

[0047] Figure 2 This is a flowchart of a high-voltage measurement method provided in another embodiment of the present invention. This high-voltage measurement method is implemented based on the high-voltage measurement device described above.

[0048] Please seeFigure 2 The high voltage measurement method includes the following three steps:

[0049] S100, the electric field strength sensor measures the electric field strength E between the two parallel metal plates of a parallel plate capacitor and outputs a low voltage U2.

[0050] S200: The processor receives the low voltage U2 output from the output electrode and performs digital processing such as error adjustment, unit conversion, storage, and output.

[0051] S300, an external voltage output device that indicates or displays the high voltage measurement value U1.

[0052] The above-mentioned high voltage measurement method is not easily affected by external electromagnetic fields, the measurement results are accurate and reliable, there are few measurement steps, the measurement process is simple, and the measurement error is small.

[0053] The specific embodiments described above do not constitute a limitation on the scope of protection of this invention. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can occur depending on design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this invention should be included within the scope of protection of this invention.

Claims

1. A high-voltage measuring device, characterized in that, Includes parallel plate capacitors, electric field strength sensors, and processors; The parallel plate capacitor includes two parallel metal plates, and an internal electric field is formed between the two parallel metal plates of the parallel plate capacitor. The two parallel metal plates of the parallel plate capacitor are used to connect to the high voltage being measured. The electric field strength sensor is disposed between the two parallel metal plates of the parallel plate capacitor. The electric field strength sensor is used to collect the electric field strength between the two parallel metal plates of the parallel plate capacitor and output a low voltage. The processor is connected to the electric field strength sensor and is used to receive the low voltage output by the electric field strength sensor. Based on the low voltage output by the electric field strength sensor and the distance between the two parallel metal plates of the parallel plate capacitor, the processor calculates the high voltage between the two parallel metal plates of the parallel plate capacitor, thereby measuring the value of the measured high voltage.

2. The high-voltage measuring device according to claim 1, characterized in that, The parallel plate capacitor also includes two input electrodes connected to two parallel metal plates for connecting to the high voltage being measured.

3. The high-voltage measuring device according to claim 2, characterized in that, A dielectric exists between the two parallel metal plates.

4. The high-voltage measuring device according to claim 1, characterized in that, It also includes a metal shielding housing, and the parallel plate capacitor is disposed inside the metal shielding housing.

5. The high-voltage measuring device according to claim 1, characterized in that, The outer periphery of the parallel plate capacitor is provided with an electrical insulation layer.

6. The high-voltage measuring device according to claim 1, characterized in that, It also includes two output electrodes, which are used to connect the processor and an external voltage measuring instrument or voltage display.

7. The high-voltage measuring device according to claim 4, characterized in that, It also includes a grounding plate, which is connected to both ends of the metal shielding shell.

8. A high-voltage measurement method, implemented based on the high-voltage measurement device according to any one of claims 1 to 7, characterized in that, Includes the following steps: An electric field strength sensor measures the electric field strength between the two parallel metal plates of a parallel plate capacitor and outputs a low voltage. Based on the distance between the two parallel metal plates of the parallel plate capacitor and the low voltage output by the electric field strength sensor, the high voltage between the two parallel metal plates of the parallel plate capacitor is calculated, thereby measuring the value of the measured high voltage.

9. The high voltage measurement method according to claim 8, characterized in that, The method for calculating the high voltage between the two parallel metal plates of the parallel plate capacitor is as follows: In the formula, D / K is the proportionality coefficient, which is a constant; U2 is the low voltage output by the electric field strength sensor; U1 is the high voltage between the two parallel metal plates of the parallel plate capacitor; and D is the distance between the two parallel metal plates of the parallel plate capacitor.

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