Illumination equipment and its usage methods and semiconductor processing equipment

Abstract

This application discloses an illumination device and its usage method, as well as a semiconductor processing device, which can reduce the intensity attenuation of UVLS emitted by the light source due to bulb burning and optimize the photolithography effect. The illumination device in this application includes: a light source for outputting a light signal of a first power, and the light signal can be emitted at least along a preset optical path; a magnifying lamp cover, through which the emitted light signal passes, the surface of the magnifying lamp cover is provided with at least two preset areas, each of the preset areas having the same light transmittance; and a driving unit connected to the magnifying lamp cover via a transmission device for driving the magnifying lamp cover to rotate, wherein during the rotation of the magnifying lamp cover, the preset areas always pass through the preset optical path.

Description

Technical Field

[0001] This application relates to the field of semiconductor memory devices, specifically to illumination devices and methods of using them, as well as semiconductor processing devices. Background Technology

[0002] Semiconductor integrated circuits require multiple processes to manufacture, including material preparation, masking, photolithography, cleaning, etching, doping, and chemical mechanical polishing. Among these, photolithography is the most critical, determining the level of sophistication of the manufacturing process.

[0003] Photolithography is a technique that uses light and photoresist to transfer a pattern from a photomask onto a substrate. The main process is as follows: First, ultraviolet light passes through the photomask and irradiates the surface of the substrate coated with a thin film of photoresist, causing a chemical reaction in the exposed areas. Then, development technology dissolves and removes the photoresist from the exposed or unexposed areas, allowing the pattern on the photomask to be copied onto the photoresist film. Finally, etching technology transfers the pattern onto the substrate.

[0004] The core equipment in the photolithography process is the photolithography machine, which directly determines the minimum feature size of integrated circuits.

[0005] In the prior art, the lamps in the lamp house of the ultraviolet leveling sensor (UVLS) in the lithography machine will burn out due to bulb burning, which will cause the light intensity emitted by the UVLS to decrease and affect the final lithography effect. Summary of the Invention

[0006] In view of this, this application provides a light illumination device and a method of using the same, as well as a semiconductor processing device, which can reduce the intensity attenuation of the light source emitted by UVLS due to bulb burning and optimize the photolithography effect.

[0007] The lighting device in this application includes: a light source for outputting a light signal of a first power, wherein the light signal is at least able to be emitted along a preset light path; a magnifying lampshade, wherein the light signal passes through the magnifying lampshade when it is emitted, wherein the surface of the magnifying lampshade is provided with at least two preset areas, wherein each preset area has the same light transmittance; and a driving unit connected to the magnifying lampshade via a transmission device for driving the magnifying lampshade to rotate, wherein during the rotation of the magnifying lampshade, the preset areas always pass through the preset light path.

[0008] Optionally, the preset area is distributed across the entire surface of the magnifying lampshade.

[0009] Optionally, the driving unit can drive the magnifying lamp cover to rotate around the location of the light source.

[0010] Optionally, the magnifying lamp cover includes a spherical magnifying lamp cover.

[0011] Optionally, the wavelength range of the light signal emitted by the light source is 450–750 nm.

[0012] Optionally, when the driving unit drives the magnifying lamp cover to rotate, it rotates around a fixed axis passing through the location of the light source, and the rotation speed is less than or equal to 1 revolution / minute.

[0013] Optionally, the light source includes an inert gas and a laser source, the laser source being used to provide laser light, and the inert gas being placed in the magnifying lamp cover to excite light emission under the irradiation of the laser.

[0014] A semiconductor processing device according to this application includes a housing and the aforementioned light irradiation device, wherein the light irradiation device is disposed within the housing, and the housing has a light-transmitting area provided in the preset light path, wherein the light signal can pass through the housing through the light-transmitting area.

[0015] Optionally, the semiconductor processing equipment is a photolithography machine.

[0016] Optionally, it also includes an optical component disposed on the preset optical path for focusing parallel light emitted along the preset optical path to a preset position.

[0017] Optionally, it may also include: a light intensity detection device, disposed on the preset optical path, for detecting the intensity of the light signal in the direction of the preset optical path.

[0018] A method of using a lighting device according to this application includes the following steps: providing a light source capable of providing a light signal of a first power, and the light signal being able to be emitted at least along a preset light path; providing a magnifying lampshade, through which the emitted light signal passes when it is emitted, the surface of the magnifying lampshade being provided with at least two preset areas, each of the preset areas having the same light transmittance; rotating the magnifying lampshade, always passing through the preset areas along the preset light path.

[0019] Optionally, when the magnifying lamp cover rotates, it rotates around a fixed axis passing through the location of the light source, and the rotation speed is less than or equal to 1 revolution / minute.

[0020] The illumination device, its usage method, and the semiconductor processing equipment of this application can drive the magnifying lamp cover of the light source to rotate via a driving unit. During the rotation of the magnifying lamp cover, it always passes through the preset area and the preset optical path, which helps to ensure uniform light output intensity. Even if bulb burning occurs, the preset optical path can pass through other preset areas of the lamp cover, preventing the lamp cover from being burned and affecting the final light output effect. When this illumination device is selected as the light source for a lithography machine, it can effectively optimize the lithography effect of the lithography machine and reduce the light source intensity attenuation caused by bulb burning. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the structure of the lighting device described in one embodiment of this application;

[0023] Figure 2 This is a flowchart illustrating the steps of using the lighting device described in one embodiment of this application;

[0024] Figure 3 This is a schematic diagram of the structure of the semiconductor processing device described in one embodiment. Detailed Implementation

[0025] Research has found that the main reason for the above problems is that, with the improvement of exposure yield and manufacturing efficiency in current lighting systems, it is often necessary to use mercury lamp light sources with power of kilowatts or even higher. When the light signals emitted by these high-power light sources pass through the magnifying lamp cover for a long time, it will cause the magnifying lamp cover to get very hot and burn up. This may change the light transmittance of the magnifying lamp cover, resulting in low lithography efficiency, and may also change the propagation path of the light signal, affecting the overall lighting performance indicators and the overall yield of the lithography machine.

[0026] The following description, in conjunction with the accompanying drawings and embodiments, further illustrates the illumination device, its usage method, and the semiconductor processing device.

[0027] Please see Figure 1 This is a schematic diagram of the structure of the lighting device described in one embodiment of this application.

[0028] In this embodiment, the lighting device includes: a light source 101 for outputting a light signal of a first power, and the light signal is capable of being emitted along at least a preset light path; a magnifying lamp cover 102, through which the light signal passes when emitted, the surface of the magnifying lamp cover 102 having at least two preset areas, each of the preset areas having the same light transmittance; and a driving unit 103 connected to the magnifying lamp cover 102 via a transmission device 104 for driving the magnifying lamp cover 102 to rotate, wherein the magnifying lamp cover 102 always passes through the preset area along the preset light path during rotation.

[0029] In this embodiment, the illumination device can drive the magnifying lamp cover 102 of the light source 101 to rotate via the driving unit 103. During the rotation of the magnifying lamp cover 102, it always passes through the preset area along the preset optical path, which helps ensure uniform light output intensity. Even if bulb burning occurs, the preset optical path can pass through other preset areas of the lamp cover, preventing the lamp cover from being burned and affecting the final light output effect. When this illumination device is selected as the light source 101 of a lithography machine, the lithography effect of the lithography machine can be effectively optimized, and the intensity attenuation of the light source 101 caused by bulb burning can be reduced.

[0030] In some embodiments, the light source 101 includes an inert gas and a laser light source 101, the laser light source 101 being used to provide laser light, and the magnifying lamp cover 102 being sealed and filled with an inert gas for exciting light emission under the irradiation of the laser. (The wavelength range provided by the light source 101 is given.)

[0031] In some other embodiments, the light source 101 may also include a mercury lamp with a power of 800W or higher, which is high enough to meet the requirements of semiconductor processes and provide ultraviolet light. In fact, the light source 101 can also be other types of light sources, which can be configured as needed by those skilled in the art.

[0032] In some embodiments, the wavelength range of the light signal emitted by the light source 101 is 450–750 nm.

[0033] In some embodiments, the magnifying lamp cover 102 is made of materials such as silicon dioxide, PMMA, and quartz, which can amplify the light signal. In some embodiments, the material used to make the magnifying lamp cover 102 can be selected as needed, and materials with high temperature resistance and high light transmittance are preferred.

[0034] In some embodiments, the magnifying lampshade 102 includes a spherical magnifying lampshade 102. However, the shape of the magnifying lampshade 102 can be selected as needed, such as an ellipsoidal shape. When selecting the shape of the lampshade, it is preferable that the magnifying lampshade 102 can surround the light source 101.

[0035] It should be noted that the shape of the magnifying lamp cover 102 is related to the rotation mode of the magnifying lamp cover 102. In some embodiments, the rotation mode of the magnifying lamp cover 102 is such that a preset area on its surface with the same or similar distance from the light source is always positioned on the preset optical path, thereby reducing the impact of the distance between the surface of the magnifying lamp cover 102 and the light source on the propagation of the light signal during rotation.

[0036] In some embodiments, the transmittance of each region on the surface of the magnifying lamp cover 102 is consistent. Therefore, no matter how the magnifying lamp cover 102 rotates, the light signal passes through the region with the same transmittance when passing through the magnifying lamp cover 102, preventing the rotation of the magnifying lamp cover 102 from affecting the light transmission of the light signal.

[0037] In some embodiments, the entire surface of the magnifying lamp cover 102 is distributed with multiple preset areas, covering the entire surface of the magnifying lamp cover 102. Therefore, regardless of how the driving unit 103 drives the magnifying lamp cover 102 to rotate, the lighting device can have the same light emission intensity.

[0038] exist Figure 1 In the embodiment shown, the surface of the magnifying lampshade 102 has two preset areas, namely a first preset area A1 and a second preset area A2. The two preset areas are arranged adjacent to each other and have the same area.

[0039] In some embodiments, the preset areas on the surface of the magnifying lampshade 102 have the same shape, being at least one of a rectangle, a circle, or a triangle, and the area of ​​the preset area is at least larger than the beam size of the light source 101.

[0040] In some other embodiments, the plurality of preset areas may also be arranged non-adjacently on the surface of the magnifying lampshade 102. When the lampshade rotates, it is preferable that light is emitted only when the rotation occurs and the preset area passes through the preset light path, so as to prevent other areas of the magnifying lampshade 102 from affecting the lighting effect due to different light transmittance when passing through the preset light path.

[0041] In some embodiments, the drive unit 103 includes a drive motor such as a motor, and those skilled in the art can configure the drive unit 103 as needed.

[0042] In some embodiments, the driving unit 103 can drive the magnifying lamp cover 102 to rotate around the location of the light source 101.

[0043] Preferably, when the magnifying lamp cover 102 is spherical, the light source is located at the center of the sphere, and the distance between the light source and each area of ​​the surface of the magnifying lamp cover 102 is equal. During the rotation of the magnifying lamp cover 102, the distance between the surface of the magnifying lamp cover 102 and the light source 101 has little impact on the light signal emitted by the light source.

[0044] In some other embodiments, when the magnifying lampshade 102 is ellipsoidal, the light source is positioned at the center of the ellipsoidal lampshade, the major axis of the magnifying lampshade 102 is perpendicular to the preset optical path, and the magnifying lampshade 102 rotates around the major axis. The major axis refers to the longest line segment that can be obtained by connecting two points on the ellipsoid. In this case, the distance between the surface of the magnifying lampshade 102 and the light source 101 has a smaller impact on the light signal emitted by the light source.

[0045] In some embodiments, when the driving unit 103 drives the magnifying lamp cover 102 to rotate, if the rotation speed is too fast, it will cause gas turbulence in the surrounding environment, affecting the propagation effect of the light signal. Furthermore, when the light transmittance of the magnifying lamp cover is not uniform everywhere, the faster the rotation speed, the greater the impact on the propagation effect of the light signal.

[0046] In some embodiments, the light source 101 rotates about a fixed axis passing through its location, and the rotation speed is less than or equal to 1 revolution per minute. Studies have found that a rotation speed of less than or equal to 1 revolution per minute can achieve both good anti-burn effect and good light signal propagation effect.

[0047] In some embodiments, the fixed axis is not parallel to the preset optical path to prevent the magnifying lamp cover 102 from always passing through the same area of ​​the preset optical path during rotation, thus failing to provide an anti-burning effect. The fixed axis should form a non-180° angle with the preset optical path so that different areas of the magnifying lamp cover 102 can pass through the preset optical path during rotation, reducing the impact of bulb burning on the magnifying lamp cover 102. Please refer to... Figure 1 The fixed axis is perpendicular to the paper surface and perpendicular to the preset optical path, therefore the rotation direction is as follows: Figure 1 As indicated by the double arrows in the image.

[0048] In fact, those skilled in the art can set the rotation speed as needed.

[0049] This application provides a method for using a lighting device in a second aspect, comprising the following steps: Step S1: providing a light source 101, the light source 101 being capable of providing a light signal of a first power, and the light signal being able to be emitted at least along a preset light path; Step S2: providing a magnifying lampshade 102, the light signal passing through the magnifying lampshade 102 when emitted, the surface of the magnifying lampshade 102 being provided with at least two preset areas, each of the preset areas having the same light transmittance; Step S3: rotating the magnifying lampshade 102, always passing through the preset area along the preset light path.

[0050] The described method can drive the magnifying lamp cover 102 of the light source 101 to rotate, and the magnifying lamp cover 102 always passes through the preset area and the preset optical path during the rotation, which helps to ensure uniform light intensity. In the event of bulb burning of the lamp cover, the preset optical path can pass through other preset areas of the lamp cover, avoiding the lamp cover being burned and affecting the final light output effect. When this illumination device is selected as the light source 101 of the lithography machine, the lithography effect of the lithography machine can be effectively optimized, and the intensity attenuation of the light source 101 caused by bulb burning can be reduced.

[0051] In some embodiments, when the magnifying lampshade 102 rotates, it rotates about a fixed axis passing through the location of the light source 101, and the rotation speed is less than or equal to 1 revolution / minute.

[0052] In some embodiments, the fixed axis is not parallel to the preset optical path to prevent the magnifying lamp cover 102 from always passing through the preset optical path in the same area during rotation. The fixed axis should form an angle other than 180° with the preset optical path so that different areas of the magnifying lamp cover 102 can pass through the preset optical path during rotation, thereby reducing the impact of bulb burning on the magnifying lamp cover 102.

[0053] In some embodiments, those skilled in the art can also set the rotation speed as needed. Studies have found that a rotation speed of less than or equal to 1 revolution per minute can achieve both good anti-burn effect and good optical signal effect.

[0054] In some embodiments, other devices can be used to detect light intensity signals on a preset optical path, and the magnifying lamp cover 102 can be driven to rotate according to the light intensity signals, thereby reducing the probability of uneven light intensity caused by bulb burning.

[0055] This application provides a semiconductor processing apparatus in a third aspect.

[0056] Please see Figure 3 This is a schematic diagram of the structure of the semiconductor processing device in one embodiment.

[0057] In this embodiment, the semiconductor processing device includes a housing 301 and the illumination device 302, and the illumination device 302 is disposed inside the housing 301. The housing 301 is provided with a light-transmitting area 303 on the preset optical path, and the optical signal can pass through the housing 301 through the light-transmitting area 303.

[0058] In this embodiment, the semiconductor processing device has a driving unit 103 that drives the magnifying lamp cover 102 of the light source 101 to rotate, and the magnifying lamp cover 102 always passes through the preset light path in the preset area during the rotation process, which helps to ensure uniform light intensity and prevent the phenomenon of bulb burning from being found in the lighting device 302 during use, and prevent the intensity attenuation of the light source 101 caused by bulb burning.

[0059] In some embodiments, the semiconductor processing equipment is a lithography machine. In some embodiments, the illumination equipment is an ultraviolet lithography machine, and the illumination equipment 302 provides the ultraviolet light used in the lithography process. In practice, the lithography machine can also be a laser lithography machine, in which case the illumination equipment 302 provides the laser light used in the lithography process.

[0060] In some embodiments, the semiconductor processing apparatus further includes an optical component 304 disposed on the preset optical path for focusing parallel light emitted along the preset optical path to a preset position. The optical component 304 includes a lens, etc.

[0061] In some embodiments, the semiconductor processing device further includes: a light intensity detection device 305, disposed on the preset optical path, for detecting the intensity of the light signal in the direction of the preset optical path.

[0062] In some embodiments, the light intensity detection device 305 includes a photosensitive sensor, a controller, etc., and the photosensitive sensor is connected to the controller.

[0063] In some embodiments, the controller can determine whether the light intensity of the light signal emitted by the current lighting device meets the requirements based on the light intensity detected by the current photosensitive sensor, and output different instructions based on the determination result.

[0064] In some embodiments, the controller in the light intensity detection device 305 can also be connected to the drive unit 103. When the light intensity detection device 305 detects that the current light intensity does not meet the preset light intensity, it controls the drive unit 103 to drive the magnifying lamp cover 102 to rotate, so that another preset area passes through the preset light path, in order to prevent the preset area currently passing through the preset light path from being burned, which would affect the light intensity of the light signal.

[0065] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, such as the combination of technical features between embodiments, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. An illumination device, characterized by The application relates to a light source for outputting a light signal of a first power, wherein the light signal can at least exit along a preset light path, the wavelength range of the light signal exiting the light source is 450-750 nm, the light source comprises inert gas and a laser light source for providing laser light; an amplification lampshade through which the light signal exits, the surface of the amplification lampshade is provided with at least two preset areas, the light transmittance of each preset area is the same; the inert gas is arranged in the amplification lampshade and is used for exciting light emission under the irradiation of the laser light; a driving part connected to the amplification lampshade through transmission devices and used for driving the amplification lampshade to rotate, wherein the preset area always passes through the preset light path during the rotation of the amplification lampshade. The preset areas are distributed on the whole surface of the amplification lampshade. The driving part can drive the amplification lampshade to rotate around the point where the light source is located. The amplification lampshade comprises a spherical amplification lampshade.

2. The illumination device of claim 1, wherein, When the driving part drives the amplification lampshade to rotate, the amplification lampshade rotates around a fixed shaft passing through the point where the light source is located, and the rotating speed is less than or equal to 1 turn per minute.

3. The illumination device of claim 1, wherein, The application further relates to a shell and the light irradiation device as claimed in any one of claims 1 to 5, wherein the light irradiation device is arranged in the shell, and the shell is provided with a light-transmitting area on the preset light path, and the light signal can pass through the shell through the light-transmitting area.

4. The illumination apparatus of claim 1, wherein, The semiconductor processing device is a photoetching machine.

5. The illumination apparatus of claim 1, wherein, The application further relates to an optical assembly arranged on the preset light path and used for focusing parallel light exiting along the preset light path to a preset position.

6. A semiconductor processing apparatus, characterized by comprising: The application further relates to a light intensity detection device arranged on the preset light path and used for detecting the intensity of the light signal in the direction of the preset light path.

7. The semiconductor processing apparatus of claim 6, wherein The application further relates to the following steps:

8. The semiconductor processing apparatus of claim 6, wherein providing a light source capable of providing a light signal of a first power, wherein the light signal can at least exit along a preset light path, the light source comprises inert gas and a laser light source for providing laser light; 9. The semiconductor processing apparatus of claim 6, wherein providing an amplification lampshade through which the light signal exits, the surface of the amplification lampshade is provided with at least two preset areas, the light transmittance of each preset area is the same; the inert gas is arranged in the amplification lampshade and is used for exciting light emission under the irradiation of the laser light; rotating the amplification lampshade and always passing the preset area through the preset light path.

10. A method of using a light device, characterized by, When the amplification lampshade rotates, the amplification lampshade rotates around a fixed shaft passing through the point where the light source is located, and the rotating speed is less than or equal to 1 turn per minute. ​ ​ ​ 11. The method of using a light device of claim 10, wherein, ​

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