Exhaust gas treatment system

Abstract

The present application relates to the technical field of gas treatment, and provides a waste gas treatment system, which comprises a water tank, reaction containers and a cleaning device; the reaction containers are at least two, and each reaction container comprises a reaction shell forming a reaction cavity and an electromagnetic heating assembly located outside the reaction shell; the reaction shell is provided with a reaction gas inlet and a reaction gas outlet; the reaction gas inlet, the reaction cavity and the reaction gas outlet are communicated; and the reaction shell is connected to the water tank; the cleaning device is connected to the water tank and communicated with the water tank, and is communicated with the reaction containers. The waste gas treatment system provided by the present application solves the problem of low heating efficiency in the prior art, adopts the electromagnetic heating mode, ensures the heating efficiency, and simplifies the equipment structure and reduces the equipment volume.

Description

Technical Field

[0001] This invention relates to the field of gas treatment equipment technology, and more particularly to a waste gas treatment system. Background Technology

[0002] In the semiconductor industry, as well as other chemical processing fields, waste gas needs to be treated, and some treatment methods require heating devices to provide a high-temperature environment.

[0003] In related technologies, electric heating is commonly used, with multiple heating rods or the entire heating column installed inside the reaction chamber; this is generally considered resistance heating technology. This technology requires heating equipment inside the reaction chamber, affecting the chamber's volume and increasing the difficulty of installation and disassembly. Electric heaters are a type of conductive heating device, resulting in significant heat loss and consequently, a relatively low actual reaction temperature and low thermal efficiency.

[0004] The reaction chamber is primarily where gaseous reactions and their products occur, making it the area most prone to dust accumulation. The presence of heating rods and structural components significantly increases the cost of subsequent maintenance. Furthermore, the equipment lacks online and automatic cleaning capabilities.

[0005] In addition, if a pre-washing section is added to an exhaust gas treatment device with an electric heating structure, the space becomes cramped and disassembly and assembly become inconvenient. Summary of the Invention

[0006] This invention provides a waste gas treatment system to solve the problem of low heating efficiency in the prior art. It adopts electromagnetic heating to ensure heating efficiency, simplify the equipment structure, reduce the size of the equipment and reduce its weight.

[0007] This invention provides a waste gas treatment system, comprising:

[0008] Water tank;

[0009] The reaction vessel is provided in at least two parts, including a reaction shell forming a reaction chamber and an electromagnetic heating assembly located outside the reaction shell. The reaction shell is provided with a reaction gas inlet and a reaction gas outlet. The reaction gas inlet, the reaction chamber and the reaction gas outlet are connected. The reaction shell is connected to the water tank.

[0010] A cleaning device is connected to and communicates with the water tank and with the reaction vessel.

[0011] According to a waste gas treatment system provided by the present invention, the reaction vessel is provided with a liquid supply component, the inlet of the liquid supply component is connected to the upper end of the reaction shell, and the lower end of the reaction shell is connected to the water tank.

[0012] According to a waste gas treatment system provided by the present invention, a partition is provided inside the reaction shell, one end of the partition forms a communication channel with one end of the reaction shell, and the other end of the partition is connected to and closed with the other end of the reaction shell.

[0013] According to a waste gas treatment system provided by the present invention, an insulating and heat-insulating layer is provided on the outside of the reaction shell, and an electromagnetic heating component is provided on the outside of the insulating and heat-insulating layer. The electromagnetic heating component includes an induction coil and an insulating skin wrapped around the outside of the induction coil.

[0014] According to a waste gas treatment system provided by the present invention, the reaction shell is provided with a liquid outlet, the liquid outlet is connected to the water tank and is adapted to be sealed by water from the water tank, and the reaction gas outlet is connected to the gas inlet of the cleaning equipment.

[0015] According to the waste gas treatment system provided by the present invention, the lower end of the reaction shell is connected to an inlet pipe and an outlet pipe. The inlet pipe forms the inlet of the reaction gas, and the outlet pipe forms the outlet of the reaction gas. The inlet pipe is inclined upward in a direction away from the reaction shell, and the outlet pipe is inclined upward in a direction away from the reaction shell.

[0016] According to a waste gas treatment system provided by the present invention, the reactive gas outlet is connected to the gas inlet of the cleaning equipment through the water tank.

[0017] According to the waste gas treatment system provided by the present invention, the reaction shell is connected to at least one temperature sensor;

[0018] And / or, both the reactant gas inlet and the reactant gas outlet are equipped with pressure sensors.

[0019] According to a waste gas treatment system provided by the present invention, the cleaning equipment is provided with a cleaning device and a cleaning component located above the cleaning device, wherein the fluid outlet of the cleaning component faces the cleaning device;

[0020] The cleaning device includes:

[0021] Discharge components;

[0022] The dust collection component is located outside the discharge component and has the opposite polarity to the discharge component;

[0023] The power supply component has its positive terminal connected to one of the discharge component and the dust collection component, and its negative terminal connected to the other of the discharge component and the dust collection component.

[0024] A flow guide, spirally surrounding the discharge component, is located between the discharge component and the dust collection component.

[0025] According to the present invention, a waste gas treatment system further includes a supply container, the supply container including a shell body, a gas supply outlet disposed on the shell body and a connecting part connected to the shell body, the gas supply outlet communicating with the reaction gas inlet, the connecting part being connected to a connecting pipe of a blockage removal device, a cleaning component being disposed inside the connecting pipe, the connecting pipe being connected to a driving component, the driving component being used to drive the cleaning component to move along the extension direction of the connecting pipe, so that the cleaning component pushes the blockage away.

[0026] The waste gas treatment system provided by this invention includes a water tank, a reaction vessel, and cleaning equipment. At least two reaction vessels are provided, and each reaction vessel is equipped with an electromagnetic heating component. The electromagnetic heating provides a high-temperature environment for the reaction chamber, which can reduce the volume and weight of the reaction vessel. The disassembly and assembly process can also save manpower. Under the same space conditions, at least two reaction vessels can be installed. At least one reaction vessel can be in operation while the other is being cleaned. The reaction chamber can be cleaned and the reaction vessels can be inspected without shutting down the system. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in this invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0028] Figure 1 This is a schematic diagram of the structure of the waste gas treatment system provided by the present invention;

[0029] Figure 2 This is a schematic diagram of the structure of the reaction vessel provided by the present invention;

[0030] Figure 3 This is a schematic diagram of the structure of the water tank provided by the present invention;

[0031] Figure 4 This is a schematic diagram of the structure of a blockage clearing device provided by the present invention;

[0032] Figure 5 This is a schematic diagram of another blockage-clearing device provided by the present invention;

[0033] Figure 6 This is a schematic diagram of the cleaning device provided by the present invention;

[0034] Figure 7 This is a schematic diagram of the discharge component and the flow guide component of the cleaning device provided by the present invention;

[0035] Figure 8 This is a schematic diagram of the cleaning device provided by the present invention installed on a cleaning equipment.

[0036] Figure label:

[0037] 1. Reaction vessel; 11. Electromagnetic heating assembly; 111. Induction coil; 112. Insulating outer skin; 113. Transformer; 114. PLC controller; 12. Reaction shell; 121. First air inlet pipe; 122. Second air inlet pipe; 123. Air outlet pipe; 124. Liquid outlet; 125. Reaction chamber; 13. Liquid supply component; 131. Inlet of liquid supply component; 14. Separator; 15. Insulating and heat-insulating layer; 16. Temperature sensor; 17. Pressure sensor;

[0038] 2. Cleaning equipment; 3. Water tank; 31. First opening; 32. Second opening; 33. Third opening; 4. Front water flushing pipeline;

[0039] 5. Clog removal device; 51. Drive component; 52. Cleaning component; 521. Spherical part; 522. Rod; 53. Connecting pipe; 54. Gear; 55. Toothed rack; 56. Stop surface; 57. Pressure monitoring port; 58. Detection tube; 59. Pressure detection component; 510. Gas supply pipeline;

[0040] 6. Blocked opening; 7. Connecting part;

[0041] 8. Cleaning device; 81. Discharge component; 811. Discharge body; 812. Corona needle; 82. Dust collection component; 83. Flow guide; 84. Insulating protective layer; 85. Cleaning housing. Detailed Implementation

[0042] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without creative effort are within the scope of protection of this invention.

[0043] Furthermore, in the description of this invention, unless otherwise stated, "multiple", "multiple roots", and "multiple groups" mean two or more.

[0044] like Figure 1 and Figure 2As shown, the waste gas treatment system includes a reaction container 1, which includes a reaction shell 12 forming a reaction chamber 125 and an electromagnetic heating component 11 located outside the reaction shell 12. The reaction shell 12 is provided with a reaction gas inlet and a reaction gas outlet. The reaction gas inlet, the reaction chamber 125 and the reaction gas outlet are connected. The reaction gas enters the reaction chamber 125 through the reaction gas inlet and reacts in the reaction chamber 125. The reacted gas is discharged through the reaction gas outlet.

[0045] The reaction vessel 1 is heated in conjunction with the reaction shell 12 via an electromagnetic heating assembly 11, providing a high-temperature environment for the reaction chamber 125 to allow the reactant gases to react within the chamber. Compared to resistance heating, electromagnetic heating reduces heat conduction and convection losses, resulting in higher thermal efficiency. Furthermore, it eliminates the need for a heating resistor within the reaction chamber 125. For the same volume of reaction shell 12, the space of the reaction chamber 125 can be expanded to provide the same amount of heat, reducing the overall size and weight of the reaction vessel 1 and facilitating its assembly and disassembly. Additionally, the electromagnetic heating assembly 11 includes a coil wound around the outside of the reaction shell 12. The electromagnetic heating principle utilizes the high-frequency alternating current passing through the magnetic field of the coil to induce eddy currents in the magnetically driven reaction shell 12, rapidly reaching the heating temperature and improving heating efficiency, thus achieving energy savings.

[0046] The high temperature here can be understood as above the ambient temperature, without limiting a specific temperature range, and is adjusted according to the needs of the reacting gases.

[0047] In some cases, the reactant gases include waste gases from semiconductor manufacturing processes, such as flammable gases like silane, silane, and DCS in process gases. Waste gases can generally be understood as a mixture of gaseous and particulate matter, with flow characteristics similar to gaseous materials. The reactant gases also include oxygen for the redox reaction, which can be supplied with air, such as compressed air. In some cases, the reactant gas inlet includes a first inlet and a second inlet; the first inlet is for introducing waste gas, and the second inlet is for introducing air.

[0048] The exhaust gas treatment system is equipped with at least two reaction vessels 1. By switching the operating status of reaction vessels 1, the shutdown reaction vessel 1 can be cleaned while the other reaction vessels 1 are running normally. The reaction vessels 1 can be cleaned without shutting down the exhaust gas treatment system, which helps to improve production efficiency.

[0049] When the reaction vessel 1 adopts electromagnetic heating technology, there are no obstacles like heating rods inside the reaction chamber 125. While simplifying the structure, it also greatly reduces the volume of the reaction vessel 1. In the same installation space, the exhaust gas treatment system can be equipped with at least two reaction vessels 1, making redundant reaction vessels 1 possible.

[0050] When two reaction vessels 1 are installed, adopting a dual-reaction-vessel design, one operates normally while the other is on standby or being cleaned (achieving a one-in-one-backup configuration), the online automatic cleaning function of the reaction chamber 125 can be realized, greatly reducing subsequent maintenance work. Dust generation mainly occurs in the reaction chamber 125 and its downstream structure. The one-in-one-backup configuration solves the problem of blockage and cleaning of the reaction chamber 125, effectively extending the maintenance cycle of the waste gas treatment system and reducing subsequent maintenance costs. Simultaneously, it ensures the processing gas volume while minimizing or eliminating downtime. Furthermore, the use of electromagnetic heating technology simplifies the internal structure while improving heating efficiency and saving energy consumption.

[0051] In some embodiments, an insulating and heat-insulating layer 15 is provided on the outside of the reaction housing 12, and an electromagnetic heating component 11 is provided on the outside of the insulating and heat-insulating layer 15. The insulating and heat-insulating layer 15 serves to separate the induction coil 111 from the reaction housing 12, and the insulating and heat-insulating layer 15 keeps the reaction chamber 125 warm and reduces heat loss.

[0052] In some embodiments, the electromagnetic heating assembly 11 includes an induction coil 111 and an insulating sheath 112 wrapped around the induction coil 111 to provide leakage protection for the induction coil 111.

[0053] Of course, the electromagnetic heating assembly 11 also includes a power supply for powering the induction coil 111. In some cases, the power supply connects the transformer 113 (such as a high-frequency generator) and a controller, which can be used to adjust the heating power to regulate the heating effect of the induction coil 111. The power supply is AC, and the oscillation frequency of the high-frequency generator can be controlled from a few kHz to tens of kHz. The controller can adopt various structures; the following description uses a PLC controller 114 as an example.

[0054] The temperature of the reaction chamber 125 is raised by electromagnetic heating technology. The reaction shell 12 is made of a material with high Curie temperature and magnetic permeability, such as graphite steel, to ensure that it does not lose its magnetism at high temperatures, while also having the characteristics of corrosion resistance and high strength.

[0055] When electromagnetic heating is used in semiconductor waste gas treatment equipment, energy efficiency can be improved, achieving energy saving. It also simplifies the equipment structure, allowing for modular assembly and disassembly of the reaction vessel 1, thus overcoming the difficulties in maintaining and the complexity of the reaction vessel 1 in related technologies. Furthermore, by using redundant reaction vessels 1, the reaction chamber 125 can be automatically cleaned online after blockage, solving the problem that the reaction chamber 125 cannot be directly cleaned with water in related technologies, significantly reducing maintenance costs for after-sales personnel.

[0056] In some embodiments, the exhaust gas treatment system further includes a water tank 3, and the reaction vessel 1 is connected to and in fluid communication with the water tank 3. When the reaction vessel 1 is cleaned, the cleaning fluid used for cleaning can flow into the water tank 3 through the liquid outlet 124 of the reaction shell 12, and the fluid can be reused or centrally treated through the water tank 3.

[0057] In some embodiments, the reaction vessel 1 is provided with a liquid supply component 13. The inlet 131 of the liquid supply component is connected to one end of the reaction shell 12, and the other end of the reaction shell 12 is connected to the water tank 3. The liquid supply component 13 can supply cleaning liquid to the reaction vessel 1. The cleaning liquid flows from top to bottom to rinse or spray the inner wall of the reaction shell 12, so as to clean the inner wall of the reaction shell 12.

[0058] refer to Figure 2 As shown, the upper end of the reaction shell 12 is provided with the inlet 131 of the liquid supply component, and the lower end of the reaction shell 12 is provided with the water tank 3. The cleaning liquid is rinsed from top to bottom and flows into the water tank 3 under the action of gravity. The structure is simple, the operation is convenient and the cleaning effect is good.

[0059] Because there are no heating rods or other structural components inside the reaction chamber 125, when the reaction vessel 1 is shut down, after the temperature of the reaction chamber 125 drops to a certain value, the liquid supply component 13 is used to clean the inner wall of the reaction shell 12, flushing the dust into the water tank 3, and then the dust is discharged to the outside from the water tank 3.

[0060] The liquid supply component 13 may be equipped with a nozzle to spray cleaning solution onto the inner wall of the reaction housing 12. The nozzle may be located at the top of the reaction housing 12. Alternatively, the liquid supply component may be a housing (not shown in the figure) located outside the reaction housing, forming an overflow cavity between the liquid supply component and the reaction housing. The upper end of the overflow cavity is connected to the top of the reaction housing to allow cleaning solution to overflow onto the inner wall of the reaction housing for cleaning. Alternatively, the liquid supply component 13 may be located at the top of the reaction housing 12 and form an annular cavity through which cleaning solution is supplied to the inner wall of the reaction housing 12. The above liquid supply component 13 has a simple structure and provides good cleaning effect on the reaction housing 12. Water can be used as the cleaning solution.

[0061] When two reaction vessels 1 are set up, one for use and one for standby, while one reaction vessel 1 is working, the other reaction vessel 1 can be cleaned after the temperature drops, without affecting the use of the equipment and meeting the requirements of continuous semiconductor equipment production.

[0062] When the exhaust gas inlet of reaction vessel 1 is connected to upstream equipment, such as... Figure 1The air inlet pipe or pre-washing equipment shown, the two reaction vessels 1 and the air inlet pipe, or the two reaction vessels 1 and the pre-washing equipment, can all be controlled by a three-way valve. When the exhaust gas inlet of reaction vessel 1 is connected to water tank 3, the switching between the two reaction vessels 1 and water tank 3 is controlled by a three-way valve.

[0063] In some embodiments, such as Figure 2 As shown, the reaction vessel 1 is provided with a liquid supply component 13, and the reaction shell 12 is provided with a liquid outlet 124. The liquid outlet 124 is connected to the water tank 3 and is adapted to be sealed by water tank 3. The cleaning liquid introduced into the reaction chamber 125 by the liquid supply component 13 can enter the water tank 3 through the liquid outlet 124, which helps to simplify the structure.

[0064] The reaction gas outlet and liquid outlet 124 can be the same outlet (not shown in the figure). The reaction gas outlet enters the downstream processing equipment through the water tank 3, which further simplifies the structure of the reaction vessel 1.

[0065] In some embodiments, the lower end of the reaction housing 12 is connected to an inlet pipe and an outlet pipe 123. The inlet pipe forms a reaction gas inlet, and the outlet pipe 123 forms a reaction gas outlet. When the reaction housing 12 is provided with a liquid outlet 124, the reaction housing 12 is provided with both a reaction gas outlet and a liquid outlet 124. The reaction gas does not need to pass through the water tank 3 and can flow directly into the next stage equipment, which can reduce the pressure loss of the reaction gas.

[0066] In some embodiments, the inlet pipe is inclined upwards in a direction away from the reaction shell 12, and the outlet pipe 123 is inclined upwards in a direction away from the reaction shell 12. When the reaction shell 12 is connected to the water tank 3, liquid overflows into the inlet pipe and outlet pipe 123, and can then flow back into the reaction chamber 125 through the inclined inlet pipe and outlet pipe 123, and then flow into the water tank 3 through the reaction chamber 125, thus avoiding the liquid affecting the flow of gas.

[0067] When the reaction gas also includes air, the air inlet pipe includes a first air inlet pipe 121 for introducing the reaction gas and a second air inlet pipe 122 for introducing air.

[0068] Water tank 3 serves as the carrier for water circulation, enabling the circulating water to perform functions such as cooling, dust removal, and gas isolation through nozzles and overflow. The inlet of the liquid supply component 13 can also be connected to water tank 3, utilizing the water within water tank 3 for cleaning and allowing the water to flow back into water tank 3, thus maintaining water circulation. Regarding gas isolation, the internal structure of water tank 3 achieves water seals along each flow path, ensuring that the reacting gases flow along predetermined channels. The water tank 3 and reaction vessel 1, through a simple modular structural design, ensure unobstructed gas flow while also facilitating later maintenance and management.

[0069] In some embodiments, a partition 14 is provided inside the reaction housing 12. One end of the partition 14 forms a communication channel with one end of the reaction housing 12, and the other end of the partition 14 is connected to and closed with the other end of the reaction housing 12. By providing the partition 14, the flow path of the reactant gas in the reaction chamber 125 can be extended, optimizing the reaction effect of the reactant gas. One or more partitions 14 can be provided inside the reaction housing 12, which can be selected as needed. The reactant gas can flow along a U-shaped path or an S-shaped path in the reaction chamber 125.

[0070] When a separator 14 is installed in the reaction chamber 125, the path of the reaction gas through the reaction chamber 125 is doubled, which improves the equipment's efficiency in treating waste gas.

[0071] In some embodiments, pressure sensors 17 are provided at both the reactant gas inlet and the reactant gas outlet. The pressure difference is obtained through the two pressure sensors 17. Based on the pressure difference measured by the pressure sensors 17, the PLC controller 114 determines whether to switch the reaction vessel 1 via the three-way valve at the control front end. When the pressure difference remains within a preset range, the reaction vessel 1 continues to operate; when the pressure difference exceeds the preset range, the reaction vessel 1 is shut down, and other reaction vessels 1 are controlled to open, thus achieving the switching of the reaction vessel 1. The switching method is simple, and the structure of the reaction vessel 1 is simple.

[0072] In some embodiments, the reaction housing 12 is connected to at least one temperature sensor 16. By detecting the temperature of the reaction housing 12 through the temperature sensor 16, the temperature inside the reaction chamber 125 can be obtained. Based on the temperature inside the reaction chamber 125, the heating power of the electromagnetic heating assembly 11 can be adjusted to keep the temperature inside the reaction chamber 125 within a set range. Multiple temperature sensors 16 monitor the temperature and transmit the values ​​to the PLC controller 114.

[0073] refer to Figure 2 As shown, the reaction vessel 12 is equipped with two temperature sensors 16. The temperature difference can be obtained based on the temperature detected by the two temperature sensors 16, so as to monitor the temperature of different parts of the reaction vessel 1.

[0074] The electromagnetic heating assembly 11 can adjust its heating power based on the temperature detected by one of the temperature sensors 16, or based on the average value of multiple temperature sensors 16. The PLC controller 114 uses PID calculation based on the collected temperature values ​​and the set values, and outputs control signals to the high-frequency generator via analog signals, thereby controlling the output power of the high-frequency generator to achieve a constant temperature in the reaction chamber 125.

[0075] In some embodiments, such as Figure 1As shown, the exhaust gas treatment system also includes a cleaning device 2, which is connected to the reaction vessel 1 so that the reaction gas discharged from the reaction vessel 1 enters the cleaning device 2 for cleaning. The cleaning can be dust removal. Dust removal can be spray dust removal, electrostatic dust removal, or a combination of multiple dust removal methods.

[0076] Cleaning device 2 is connected to and communicates with water tank 3. The cleaning liquid from cleaning device 2 can flow into water tank 3 without separate discharge, simplifying the structure. The gas inlet of cleaning device 2 can also be connected to the reaction gas outlet through water tank 3, simplifying the structure of reaction vessel 1. Alternatively, the reaction gas outlet can be connected to the gas inlet of cleaning device 2, allowing the reaction gas to directly enter cleaning device 2, reducing pressure loss of the reaction gas. The simple and reasonable structural layout also enhances the disassembly capability of the equipment.

[0077] refer to Figure 1 As shown, the cleaning device 2 can be a washing tower, which has a simple structure and good cleaning effect.

[0078] The entire gas passage can be flushed with water or conditionally, giving the exhaust gas treatment system the ability to automatically adjust and reducing human intervention. The PLC controller 114 can automatically control the execution of each process, enhancing the reliability of the equipment.

[0079] refer to Figures 1 to 3As shown, semiconductor process gas flows to the pre-wash line 4, which is connected to the water tank 3. There is a water nozzle above the pre-wash line 4 to pre-treat the process gas and capture the water-soluble components in the gas. The water flows directly into the water tank 3 through the first opening 31. The remaining gas flows into the manifold, and then, by controlling the opening and closing of the three-way valve, it selectively enters one of the two reaction containers 1. The three-way valve has a valve position detection function, and if the valve position is incorrect, a shutdown alarm will be triggered to ensure the accuracy of the control logic. After the waste gas flows into the reaction chamber 125, the reaction chamber 125 is heated to about 700 degrees Celsius by electromagnetic heating. There is a partition 14 inside. The waste gas and air enter the reaction chamber 125 from the bottom and flow upwards in the reaction chamber 125, and then return to the bottom. The first air inlet pipe 121 and the second air inlet pipe 122 are close to each other to ensure the sufficiency of the reaction. The reaction chamber 125 is connected to the water tank 3 through the second opening 32 of the water tank 3. The gas then flows into the cleaning equipment 2 (washing tower) for dust removal. The cleaning equipment 2 is equipped with nozzles and a cleaning device 8. Multiple nozzles cool the gas and collect dust. The cleaning device 8 uses electrostatic dust removal and the nozzles to clean the dust collection component 82 used for dust adsorption. The cleaning equipment 2 is connected to the water tank 3, ensuring that the generated products can enter the water tank 3 through the third opening 33. All water flowing from the above components flows into the water tank 3. The water tank 3, through internal partitions, ensures that the gas flows in the order of the previous washing pipeline 4, water tank 3, reaction vessel 1, and cleaning equipment 2. Water for all nozzles is pumped from the water tank 3 by a water pump. The gas supply pipelines are all inclined upwards at a certain angle to ensure that no water accumulates in the gas supply pipelines.

[0080] like Figure 2 As shown, compressed air (CDA) is supplied to the reaction chamber 125 through the air inlet pipe. When the reaction chamber 125 is in use, the compressed air serves as the reaction medium, providing the oxygen required for the process gas reaction. When the reaction chamber 125 is not in use, the compressed air serves as the cooling medium, ensuring the rapid cooling of the reaction chamber 125. After the operating state of the reaction vessel 1 is switched, the process gas enters another reaction chamber 125. The electromagnetic heating of this reaction chamber 125 is stopped, but the compressed air intake continues. The suction component (such as acid discharge) continuously extracts the gas in the reaction chamber 125, causing the temperature to drop. When the temperature of the reaction chamber 125 drops below 80 degrees Celsius, circulating water overflows from the top of the reaction shell 12. The circulating water flows down the circumference of the reaction chamber 125 and the partition 14 of the reaction chamber 125, flushing the internal dust into the water tank 3. The compressed air, process gas, and circulating water are all equipped with corresponding flow monitoring sensors to ensure the sufficiency of the supply medium.

[0081] In some embodiments, such as Figure 4 and Figure 5As shown, the exhaust gas treatment system also includes a blockage removal device 5, which is installed on a small-diameter pipe to remove blockages and solve the problem of pipe blockage, so as to keep the pipe in a connected state.

[0082] The term "small diameter" here can be understood as the pipe diameter of the pipeline where the blockage removal device 5 is installed being smaller than the diameter of the main equipment pipeline, in order to solve the problem of blockages easily occurring in small-diameter pipelines. It does not limit the size of this pipe diameter. In some cases, the blockage removal device 5 is installed on a branch line used for pressure testing.

[0083] The following provides an embodiment of the blockage clearing device 5.

[0084] In some embodiments, such as Figure 4 and Figure 5 As shown, the blockage removal device 5 includes a connecting pipe 53, a cleaning component 52, and a driving component 51. One end of the connecting pipe 53 is adapted to be connected to the connecting part 7 of the blocked opening 6. The cleaning component 52 is disposed inside the connecting pipe 53. The driving component 51 is connected to the connecting pipe 53. The driving component 51 is used to drive the cleaning component 52 to move along the extension direction of the connecting pipe 53, so that the cleaning component 52 pushes the blockage to move. The cleaning component 52 contacts the blockage and pushes the blockage into the equipment (the equipment is a device with a blocked opening 6), so that the blockage is discharged centrally through the equipment.

[0085] In some cases, the connecting pipe 53 is a straight-lined pipe fitting, and the driving component 51 drives the cleaning component 52 to move in a straight line. The cleaning component 52 gradually approaches the blocked opening 6 and pushes the blockage at the blocked opening 6 into the device. The fixed part of the driving component 51 is fixedly connected to the connecting pipe 53, and the moving part of the driving component 51 is connected to the cleaning component 52. The driving component 51 can be a cylinder, motor, or other components. In some cases, a motor is selected as the driving component 51 because motors have good operational stability and are less prone to jamming, which can ensure the operational stability of the blockage cleaning device 5.

[0086] The connecting part 7 can be the wall at the opening of the container or a pipe section extending out of the container. The connecting pipe 53 is detachably connected to the connecting part 7 of the blocked opening 6. The connecting pipe 53 and the connecting part 7 can be connected by means of threaded connection, clamp connection, welding, etc., and the connection method between the connecting pipe 53 and the connecting part 7 is not limited.

[0087] In some embodiments, such as Figure 5As shown, the output end of the drive unit 51 is connected to the gear 54, and a toothed rack 55 is provided inside the connecting pipe 53. The gear 54 meshes with the toothed rack 55, and the cleaning component 52 is connected to the toothed rack 55. The rotational force of the drive unit 51 is converted into the reciprocating force of the gear 54 through the cooperation of the gear 54 and the toothed rack 55. The gear 54 and the toothed rack 55 mesh and transmit power, which has good transmission stability, and the position of the cleaning component 52 can be adjusted according to the number of rotations of the drive unit 51.

[0088] The gear 54 and the toothed rack 55 can be made of metal or plastic, depending on the specific requirements. The cleaning component 52 can be welded, threaded, or plugged into the toothed rack 55 for fixation.

[0089] In some embodiments, the rack 55 has stop surfaces 56 at both ends. When the gear 54 moves to contact the stop surfaces 56, the gear 54 rotates freely. Even if the drive member 51 continuously provides rotational driving force, the gear 54 and the rack 55 will not slip off. When the drive member 51 provides a reverse rotational driving force, the gear 54 engages with the rack 55, and can drive the rack 55 to move in the opposite direction again. That is, the rack 55 has toothless portions at both ends, which can prevent damage to components caused by the drive member 51 (such as a motor) losing synchronization or control. This ensures both the functionality of the product and the long-term service life of the structure.

[0090] The stop surface 56 can be a plane or a curved surface, which can be selected according to the needs.

[0091] It should also be noted that the end of the toothed rack 55 is provided with a protrusion to prevent the toothed rack 55 from disengaging from the gear 54. The gear 54 may be a structure that is detachably connected to the output shaft of the motor, or the output shaft of the motor may be machined with meshing teeth.

[0092] In some embodiments, the driving component 51 is a stepper motor, which can determine the position of the cleaning component 52 according to the frequency and number of pulse signals, so as to facilitate the adjustment of the position of the cleaning component 52.

[0093] When the drive unit 51 is connected to the gear 54 and the gear 54 cooperates with the toothed rack 55 for transmission, the positions of the toothed rack 55 and the cleaning unit 52 can be determined according to the frequency and number of pulse signals of the stepper motor.

[0094] When the drive unit 51 uses a micro stepper motor, the micro stepper motor uses pulse control from the PLC controller 114 to control the number of steps, and uses the stop surface 56 to control special cases such as step loss. The PLC controller 114 controls the pulse signal and direction signal of the micro stepper motor, using the PLC's DO (digital output) signal for control. The size of the micro stepper motor can be as small as 2.5cm or even smaller, and the size of the blockage clearing device 5 can be made very small, used in practical applications in 1 / 4 of the airway as a clearing device.

[0095] In some embodiments, such as Figure 4 and Figure 5 As shown, the cleaning component 52 includes a rod 522 and a spherical part 521 connected to one end of the rod 522. The other end of the rod 522 is connected to the drive component 51. The spherical part 521 faces the blocked opening 6 and moves within the connecting tube 53. It can smoothly avoid obstacles through its spherical surface. Even if there is a dimensional deviation, the spherical part 521 can still move freely, which can solve the problem of the cleaning component 52 getting stuck. Furthermore, the spherical part 521 pushes the blockage away.

[0096] Among them, the spherical part 521 can be a spherical structure or a hemispherical structure, such as a spherical surface or an ellipsoidal surface. When a toothed rack 55 is provided in the connecting pipe 53, the other end of the rod 522 is connected to the toothed rack 55. That is, when the driving power of the driving member 51 is transmitted through the gear 54 and the toothed rack 55, the rod 522 is connected to the end of the toothed rack 55 facing the blocked opening 6. The structure is simple and can optimize the cleaning effect of the blockage cleaning device 5.

[0097] Of course, the cleaning component 52 can also be directly set as a rod-shaped structure, which is simple in structure and easy to process.

[0098] When the movable part of the drive member 51 is directly connected to the cleaning member 52, the other end of the rod 522 is connected to the movable part of the drive member 51.

[0099] In some embodiments, such as Figure 5 As shown, the other end of the connecting pipe 53 is adapted to be connected to the gas supply pipe 510. The gas supply pipe 510 is used to supply gas to the connecting pipe 53 to maintain a slightly positive pressure inside the connecting pipe 53, preventing gas inside the equipment from leaking to the outside of the equipment through the connecting pipe 53, and also preventing dust from accumulating inside the connecting pipe 53. The gas supply pipe 510 can supply gases that do not affect the operation of the equipment, such as nitrogen or air, to the connecting pipe 53.

[0100] In some embodiments, the connecting pipe 53 is provided with a pressure monitoring port 57, which is connected to a detection pipe 58. The detection pipe 58 is provided with a pressure detection element 59, and the detection pipe 58 is connected to the equipment through the connecting pipe 53 to detect the pressure inside the equipment. The pressure detection element 59 can be a pressure sensor, which can determine whether the equipment is blocked or whether the gas inside the equipment flows smoothly by detecting the pressure.

[0101] The PLC controller 114 collects conditions such as negative pressure differential (equipment inlet and outlet) and performs appropriate logic control and frequency control on the drive unit 51 to achieve automatic clearing of blockages.

[0102] The blockage removal device 5 can promptly remove blockages and also monitor the pressure inside the equipment. When the equipment is under negative pressure, the cleaning component 52 pushes the blockage into the equipment, where it is then discharged under the suction of the negative pressure.

[0103] The aforementioned connecting pipe 53 is generally a rigid pipe. The connecting pipe 53 guides and limits the movement direction of the cleaning component 52, ensuring that the cleaning component 52 moves accurately to the location of the blockage.

[0104] The exhaust gas treatment system includes multiple containers, each including a shell body. The shell body is provided with a connecting part 7, and a connecting pipe 53 is connected to the connecting part 7 of the blockage removal device 5. The blockage removal device 5 can be installed in multiple containers.

[0105] It should be noted that the aforementioned blockage removal device 5 can be installed, but is not limited to, the aforementioned pre-wash water pipe 4. The blockage removal device 5 can also be installed in the detection pipe of any equipment, and is not limited to the exhaust gas treatment system. Other easily blocked parts can also be equipped with the aforementioned blockage removal device 5. The pre-wash water pipe 4 can be in a negative pressure environment. Dust in the pre-wash water pipe 4 easily accumulates at the openings and blocks them. By installing the blockage removal device 5 at the openings, the dust blockage at the openings can be cleaned. The structure is simple and the cleaning effect is good.

[0106] When dust clogs the pressure monitoring port of the equipment, the pressure sensor detecting negative pressure will read a positive pressure value, causing the equipment to shut down and affecting the production of the customer's products, resulting in extremely negative consequences. If the blockage is cleared by directly disconnecting the detection tube, there is a risk of harmful gas leakage, which could cause personal injury in severe cases. In some situations, the customer is asked to stop the equipment to ensure there are no process gases (toxic gases) in the pipeline before the blockage is cleared with tools. After the pressure is checked and found to be normal, the equipment is restarted and returned to the customer. This process, however, affects the operation of the customer's equipment and product output.

[0107] The aforementioned blockage removal device 5 allows for dust removal without interrupting production, ensuring the airtightness of the entire pipeline environment and preventing toxic gases from escaping. Furthermore, by incorporating low-voltage technologies such as micro stepper motors (due to limited equipment space), PLC control, and logic interlocks, it automatically handles dust based on machine operation, ensuring long-term machine operation. The blockage removal device 5 automatically cleans the pipeline, solving the problem of lacking automatic cleaning devices for narrow pipes. It has a wide range of applications and can be designed in various sizes to suit different pipeline conditions, from 1 / 4-inch detection tubes to 1.5-inch exhaust pipes. It can be used to clear blockages in semiconductor waste gas treatment equipment without affecting normal equipment operation or causing jamming or leaks.

[0108] In another embodiment of the present invention, a pressure detection method for a container is provided, applied to a container having the above-described blockage removal device 5, comprising:

[0109] Step 100: Obtain the status signal of the driving component 51;

[0110] The operating states of the drive unit 51 include driving and stopping, and the status signals include driving signals and stopping signals.

[0111] Step 200: Determine that the drive unit 51 is in the drive state and shield the pressure signal.

[0112] When the blockage clearing device 5 is running, that is, when the drive unit 51 is in the driving state, the pressure inside the connecting pipe 53 is maintained at a slightly positive pressure. The pressure detected by the pressure sensor is the pressure inside the connecting pipe 53, and the pressure detected by the pressure sensor cannot represent the pressure inside the container. At this time, the pressure signal detected by the pressure sensor, or the alarm signal generated based on the pressure signal detected by the pressure sensor, can be shielded to avoid inaccurate pressure signals affecting the operation of the equipment or the judgment of the personnel.

[0113] When the drive unit 51 is stopped (not running), the signal detected by the pressure sensor can characterize the pressure inside the equipment and whether there is a blockage at the opening.

[0114] In some embodiments, reference Figures 6 to 8 As shown, the cleaning equipment 2 mentioned above includes a cleaning device 8, which removes dust by electrostatic adsorption. It has a simple structure and good dust removal effect.

[0115] The following provides relevant embodiments of the cleaning device 8.

[0116] In some embodiments, such as Figure 6 and Figure 7As shown, the cleaning device 8 includes a discharge component 81 and a dust collection component 82. The dust collection component 82 is located outside the discharge component 81, and the polarity of the dust collection component 82 is opposite to that of the discharge component 81. The cleaning device 8 removes dust through electrostatic adsorption, thereby separating dust particles in the airflow.

[0117] The cleaning device 8 also includes a flow guide 83, which spirals around the discharge component 81 and is located between the discharge component 81 and the dust collection component 82. The flow guide 83 allows the airflow to flow along the flow direction of the flow guide 83, thereby increasing the path of the airflow in the cleaning device 8 and extending the time of the airflow in the cleaning device 8, so that the dust in the airflow is fully separated.

[0118] An air passage is formed between the flow guide 83, the discharge component 81 and the dust collection component 82, allowing the airflow to flow along the air passage, extending the time the gas spends in the cleaning device 8, and ensuring that the dust is fully adsorbed onto the dust collection component 82. The spiral structure also has a limited impact on the negative pressure at the inlet of the cleaning device 8.

[0119] The flow guide 83 can be connected to the outside of the discharge component 81, the housing of the cleaning device 8, or the dust collection component 82, so that the flow guide 83 can guide the airflow between the discharge component 81 and the dust collection component 82. The specific installation method of the flow guide 83 is not limited.

[0120] The cleaning device can be used to capture micro-dust after the process gas reaction and wash the dust into the water tank. This device can be applied to multi-dust processes to prevent dust from accumulating at the customer's acid discharge and avoid acid discharge blockage.

[0121] In some embodiments, the discharge component 81 includes a discharge body 811 and a plurality of corona needles 812 connected to the discharge body 811. The plurality of corona needles 812 form a discharge assembly, with the tips of the corona needles 812 facing the dust collection component 82. The discharge body 811 can be cylindrical, columnar, or otherwise shaped. The corona needles 812 are connected to the discharge body 811, causing a corona to form around the discharge component 81. The discharge component 81 causes the dust to become negatively charged through ionization. The size and number of corona needles 812 can be set according to actual needs and are not limited here.

[0122] In some embodiments, the corona needles 812 are spirally distributed on the surface of the discharge body 811. The installation method of the corona needles 812 is simple, and the structure of the discharge component 81 is simple.

[0123] Of course, the corona needles 812 can also be evenly distributed on the discharge body 811. The setting method of the corona needles 812 is flexible and can be selected according to needs.

[0124] In some embodiments, the flow guide 83 is connected to the discharge body 811, and the distribution path of the corona needles 812 is the same as the extension path of the flow guide 83. The distribution pattern of the corona needles 812 is consistent with or similar to the extension path of the flow guide 83, which avoids interference between the corona needles 812 and the flow guide 83 and also ensures the dust removal effect.

[0125] In some embodiments, at least one of the discharge component 81 and the dust collection component 82 is provided with an insulating protective layer 84, which serves as an insulating protection layer and prevents short circuits between the discharge component 81 and the dust collection component 82 caused by water spraying without affecting dust collection.

[0126] The dust collection component 82 can be a cylindrical shell structure or a shell structure formed by multiple plates disposed on the outside of the discharge component 81. The manufacturing method and specific shape of the dust collection component 82 are not limited. The insulating protective layer 84 can be a protective layer of polypropylene material (PP material), but is not limited to this. In some cases, the dust collection component 82 is provided with an insulating protective layer 84.

[0127] In some embodiments, a gap is provided between the guide member 83 and the dust collection member 82, so that when the dust collection member 82 is cleaned by water spraying or overflow, water can flow out through this gap to prevent water accumulation in the cleaning device 8.

[0128] When the flow guide 83 and the dust collection component 82 are sealed, the water can flow out along the flow direction of the flow guide 83.

[0129] In some embodiments, the cleaning device 8 further includes a cleaning housing 85, which is located outside the dust collection component 82. The dust collection component 82, the discharge component 81, and the guide component 83 are all fixed to the cleaning housing 85. The cleaning housing 85 protects the components inside and facilitates the disassembly and assembly of the cleaning device 8 with other components.

[0130] In some embodiments, the cleaning device 8 includes a power supply component, the positive terminal of which is connected to the dust collection component 82, and the negative terminal of which is connected to the discharge component 81. The negative terminal of the power supply component is connected to the discharge component 81 so that the dust in the airflow becomes negatively charged and moves toward the dust collection component 82, and the dust collection component 82 adsorbs the negatively charged dust.

[0131] The power supply unit is connected to the controller, which in turn is connected to the display. The display shows the power supply unit's on / off status and ionization voltage, among other information. The structure is simple and easy to use.

[0132] The controller can be a PLC controller to control the ionization voltage. The ionization voltage of the power supply transformer 113 can be divided into three levels, such as 4000V, 8000V, and 15000V, to adjust the capture capacity under different dust conditions. The ionization voltage can be displayed and adjusted through the human-machine interface on the monitor, meeting the functional selectivity and safety requirements of the cleaning device 8. Furthermore, when the dust removal device is stopped, the transformer 113 is in a no-output state.

[0133] It should be noted that the cleaning device 8 described above can be formed as an independent module, and can be installed, disassembled and used independently. It can be applied to, but is not limited to, the exhaust gas treatment system described above.

[0134] When the cleaning device 8 is applied to the aforementioned waste gas treatment system, the cleaning device 8 can be installed on the aforementioned cleaning equipment 2 (such as a scrubbing tower), without increasing the floor space of the waste gas treatment system, and can effectively achieve the purpose of dust removal. The scrubbing tower can cool the gas through spray washing and remove water-soluble compounds, combined with electrostatic dust removal.

[0135] Based on the available space in the waste gas treatment system, a cleaning device 8 is installed. Utilizing electrostatic dust removal, it meets dust removal requirements while overcoming the drawback of a large footprint. The process gas undergoes a chemical reaction within the reaction vessel 1, potentially generating dust before and after the reaction. The cleaning device 8 can be installed in equipment upstream or downstream of the reaction vessel 1. The cleaning device 8 employs a modular design to accommodate different process characteristics, allowing for the installation of various dust-generating devices. Its spiral channel design addresses the issue of short gas passages, minimizing the impact on negative pressure and increasing gas residence time, thus maximizing the efficiency of electrostatic dust collection.

[0136] In some embodiments, combined with Figure 1 , Figures 6 to 8 As shown, the cleaning device 2 also includes a cleaning component located above the cleaning device 8. The fluid outlet of the cleaning component faces the cleaning device 8, and the fluid flowing out of the fluid outlet can clean the dust inside the cleaning device 8. The cleaning component can use the fluid to wash and clean the dust collection component 82, the discharge component 81, and the guide component 83, ensuring the long-term use of the cleaning device 8.

[0137] In some cases, the cleaning component can be configured as a spray pipe connected to the water tank 3, using the water in the water tank 3 to rinse the dust in the cleaning device 8.

[0138] In some embodiments, the cleaning device 2 (such as a washing tower) further includes a housing, within which cleaning components are disposed. In the case where the cleaning device 8 includes a cleaning housing 85, the cleaning housing 85 is connected to the housing. The cleaning device 8 is easy to assemble and disassemble and has a simple structure.

[0139] When the cleaning device 8 is installed inside the washing tower, it adds the function of electrostatic dust removal while maintaining the original function of the washing tower. At this time, the cleaning shell 85 can be connected with the outer shell of the washing tower, and the cleaning component is the washing structure of the washing tower.

[0140] Taking the cleaning device 8 installed in the washing tower as an example, the washing tower adopts a spiral structure to extend the path of the gas, so that the gas can have enough time to be adsorbed onto the dust collection component 82, and the dust collection component 82 is rinsed with water by the spray component in the washing tower to wash away the captured dust, maintain the long-term adsorption capacity of the dust collection component 82, optimize the dust removal effect of the washing tower, and has a simple structure and is easy to disassemble and assemble.

[0141] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A waste gas treatment system, characterized in that, include: Water tank; The reaction vessel is provided in at least two parts, including a reaction shell forming a reaction chamber and an electromagnetic heating assembly located outside the reaction shell. The reaction shell is made of graphite steel and has a reaction gas inlet and a reaction gas outlet. The reaction gas inlet, the reaction chamber and the reaction gas outlet are connected. The reaction shell is connected to the water tank. A cleaning device is connected to and communicates with the water tank and the reaction vessel, and the cleaning device includes a cleaning apparatus. The cleaning device includes: a discharge component, a dust collection component, a power supply component, and a flow guide component. The dust collection component is located outside the discharge component and has the opposite polarity to the discharge component. The positive terminal of the power supply component is connected to one of the discharge component and the dust collection component, and the negative terminal of the power supply component is connected to the other of the discharge component and the dust collection component. The flow guide component is spirally wrapped around the discharge component and located between the discharge component and the dust collection component. The discharge component includes a discharge body and a plurality of corona needles connected to the discharge body. The plurality of corona needles form a discharge assembly. The tips of the corona needles face the dust collection component. The plurality of corona needles are spirally distributed on the surface of the discharge body, and the distribution path is the same as the extension path of the guide. It also includes a supply container, which includes a shell body, a gas outlet disposed on the shell body, and a connecting part connected to the shell body. The gas outlet is connected to the reaction gas inlet. The connecting part is connected to the connecting pipe of the blockage removal device. A cleaning component is disposed inside the connecting pipe. The connecting pipe is connected to a driving component. The driving component is used to drive the cleaning component to move along the extension direction of the connecting pipe so that the cleaning component pushes the blockage away. The blockage removal device includes a connecting pipe, a cleaning component, and a stepper motor. One end of the connecting pipe is adapted to connect to the connection portion of the blocked opening. The cleaning component is disposed inside the connecting pipe. The stepper motor is connected to the connecting pipe. The output end of the stepper motor is connected to a gear, and a toothed rack is provided inside the connecting tube. The gear meshes with the toothed rack, and the cleaning component is connected to the toothed rack. The rotational force of the stepper motor is converted into the reciprocating force of the gear through the engagement of the gear and the toothed rack. The cleaning component includes a rod and a spherical part connected to one end of the rod, the other end of the rod being connected to the stepper motor, and the spherical part facing the blocked opening.

2. The waste gas treatment system according to claim 1, characterized in that, The reaction vessel is equipped with a liquid supply component, the inlet of which is connected to the upper end of the reaction shell, and the lower end of the reaction shell is connected to the water tank.

3. The waste gas treatment system according to claim 1, characterized in that, The reaction shell is provided with a partition, one end of which forms a communication channel with one end of the reaction shell, and the other end of which is connected to and closed with the other end of the reaction shell.

4. The waste gas treatment system according to claim 1, characterized in that, An insulating and heat-insulating layer is provided on the outside of the reaction shell, and the electromagnetic heating component is provided on the outside of the insulating and heat-insulating layer. The electromagnetic heating component includes an induction coil and an insulating skin wrapped around the outside of the induction coil.

5. The waste gas treatment system according to claim 1, characterized in that, The reaction shell is provided with a liquid outlet, which is connected to the water tank and adapted to be sealed by water from the water tank. The reaction gas outlet is connected to the gas inlet of the cleaning equipment.

6. The waste gas treatment system according to claim 5, characterized in that, The lower end of the reaction shell is connected to an inlet pipe and an outlet pipe. The inlet pipe forms the inlet of the reaction gas, and the outlet pipe forms the outlet of the reaction gas. The inlet pipe is inclined upward in a direction away from the reaction shell, and the outlet pipe is inclined upward in a direction away from the reaction shell.

7. The waste gas treatment system according to claim 1, characterized in that, The reactive gas outlet is connected to the gas inlet of the cleaning equipment via the water tank.

8. The waste gas treatment system according to claim 1, characterized in that, The reaction shell is connected to at least one temperature sensor; And / or, both the reactant gas inlet and the reactant gas outlet are equipped with pressure sensors.

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