Vacuum coating system

Abstract

The present invention provides a vacuum coating system, belonging to the technical field of coating equipment. The vacuum coating system includes a vacuum coating chamber and an etching device; the etching device includes a first etching mechanism and a second etching mechanism oppositely arranged in the vacuum coating chamber, the first etching mechanism includes a first etching component and a first anode, and the second etching mechanism includes a second etching component and a second anode; the first etching component is connected to the side wall of the vacuum coating chamber, the first anode is arranged in the vacuum coating chamber and is located at the front end of the first etching component; the second etching component is connected to the top wall of the vacuum coating chamber, and the second anode is connected to the bottom wall of the vacuum coating chamber and is oppositely arranged with the second etching component. By arranging the first etching mechanism and the second etching mechanism oppositely in the vacuum coating chamber, an etching area with a larger coverage rate can be formed, thereby improving the coating effect and coating efficiency to a certain extent.

Description

Technical Field

[0001] The present invention relates to the technical field of coating equipment, and particularly to a vacuum coating system. Background Art

[0002] DLC (Diamond-like carbon) diamond-like carbon film is a metastable long-range disordered amorphous carbon film. The bonding mode between carbon atoms is a covalent bond, mainly including two hybrid bonds of sp2 and sp3. There are also a certain number of C-H bonds in the hydrogen-containing DLC film. Because of this special configuration, it has both the excellent properties of diamond and graphite. Therefore, it is widely used in metal coating operations.

[0003] When the existing coating equipment performs DLC operations, it mostly goes through several steps such as evacuating the coating chamber, heating in the coating chamber, etching, priming, transition, intermediate layer, and DLC. In the etching stage, most of the existing equipment uses the IET etching method to etch, clean, and roughen the workpiece, strip impurities in the workpiece, and make the coating surface of the workpiece have a certain roughness so that the film layer is more likely to adhere.

[0004] However, although the current coating equipment can perform operations such as etching and coating, due to the limited coverage of IET etching and the poor etching degree and effect of single etching, other impurities still remain in the workpiece after etching, which greatly affects the subsequent operations and coating effect.

[0005] Therefore, there is an urgent need to provide a vacuum coating system to solve the problems existing in the prior art to a certain extent. Summary of the Invention

[0006] The purpose of the present invention is to provide a vacuum coating system to improve the coverage of the etching area in the vacuum coating system to a certain extent, improve the etching degree and etching ability, and optimize the coating effect.

[0007] A vacuum coating system provided by the present invention includes a vacuum coating chamber and an etching device; the etching device includes a first etching mechanism and a second etching mechanism oppositely arranged in the vacuum coating chamber. The first etching mechanism includes a first etching component and a first anode, and the second etching mechanism includes a second etching component and a second anode; the first etching component is connected to the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and located at the front end of the first etching component to form a horizontal etching area; the second etching component is connected to the top wall of the vacuum coating chamber, and the second anode is connected to the bottom wall of the vacuum coating chamber and is oppositely arranged with the second etching component to form a vertical etching area.

[0008] Among them, the first etching component includes a fixed magnetic field member, a movable magnetic field member, an adjusting member, a first target seat and a first target; the first target seat is connected to the side wall of the vacuum coating chamber, the fixed magnetic field member is connected to the side of the first target seat outside the vacuum coating chamber, the first target is connected to the side of the first target seat inside the vacuum coating chamber, the movable magnetic field member is arranged in the first target seat and is movably connected to the fixed magnetic field member; the adjusting member is connected to the movable magnetic field member to adjust the position of the movable magnetic field member.

[0009] Specifically, the second etching component includes a positioning member, a water-cooled seat, a gas inlet seat, a mounting shaft, a molybdenum tube and a heating wire; the positioning member is connected to the top wall of the vacuum coating chamber, the positioning member and the water-cooled seat form a heating cavity, and an electron outlet is provided on the side of the water-cooled seat away from the positioning member; one end of the mounting shaft passes through the positioning member vertically into the heating cavity and is connected to one end of the molybdenum tube, and the other end of the molybdenum tube is connected with a heating wire; the gas inlet seat is connected to the positioning member and can fill the heating cavity with gas.

[0010] Furthermore, the vacuum coating system provided by the present invention further includes an arc ignition mechanism, which is arranged on the top wall of the vacuum coating chamber, extends into the vacuum coating chamber, and is aligned with the second etching component.

[0011] More specifically, the arc ignition mechanism includes a fixed seat and an arc ignition rod; the fixed seat is connected to the top wall of the vacuum coating chamber, one end of the arc ignition rod passes through the fixed seat and enters the vacuum coating chamber to form an extension part, and the extension part extends in the direction close to the electron outlet.

[0012] Among them, the vacuum coating system provided by the present invention further includes a magnetron sputtering device, the magnetron sputtering device includes a first magnetron sputtering mechanism and a second magnetron sputtering mechanism, the first magnetron sputtering mechanism includes two relatively arranged first magnetron sputtering components, and the second magnetron sputtering mechanism includes two relatively arranged second magnetron sputtering components; the target materials included in the two first magnetron sputtering components are the same, the target materials included in the two second magnetron sputtering components are the same, and the target materials of the first magnetron sputtering components are different from those of the second magnetron sputtering components; the first magnetron sputtering components and the second magnetron sputtering components are both connected to the side wall of the vacuum coating chamber, and the first magnetron sputtering components and the second magnetron sputtering components are arranged at intervals.

[0013] Specifically, both the first magnetron sputtering assembly and the second magnetron sputtering assembly include a second target seat and a shielding cover. The first magnetron sputtering assembly further includes a second target, and the second magnetron sputtering assembly further includes a third target. The second target seat is connected to the side wall of the vacuum coating chamber, and a rectangular installation space is formed between the second target seat and the shielding cover. An opening is formed on the shielding cover, and both the second target and the third target are arranged in the corresponding installation space. The second target is made of tungsten carbide, and the third target is made of chromium.

[0014] Further, both the first magnetron sputtering assembly and the second magnetron sputtering assembly include a magnetic field member. A first bearing groove and a second bearing groove are formed on the second target seat. The first bearing groove and the second bearing groove are independently and spaced apart. The magnetic field members are provided in both the first bearing groove and the second bearing groove. The magnetic field member includes a first magnet, a second magnet with different magnetic poles, and a bearing seat. The first magnet and the second magnet are arranged at both ends of the bearing seat. The second magnet in the first bearing groove is close to the first magnet in the second bearing groove, and the first magnet in the first bearing groove is far from the second magnet in the second bearing groove.

[0015] Wherein, the magnetron sputtering device further includes a baffle assembly corresponding to the first magnetron sputtering assembly and the second magnetron sputtering assembly one by one. The baffle assembly includes a baffle member and a connecting member. The baffle is connected to the connecting member, and the connecting member is rotatably connected to the second target seat so that the baffle member can open or close the opening.

[0016] Specifically, the baffle member includes a first baffle and a second baffle. The connecting member includes a first connecting shaft and a second connecting shaft. The first connecting shaft is correspondingly connected to the first baffle and is rotatably connected to one side of the second target seat. The second connecting shaft is correspondingly connected to the second baffle and is rotatably connected to the other side of the second target seat. When the first baffle and the second baffle close the opening, the side of the first baffle away from the first connecting shaft abuts against the side of the second baffle away from the second connecting shaft. An extension portion extending in the direction approaching the second baffle is formed on the side of the first baffle away from the first connecting shaft, and the extension portion covers part of the second baffle.

[0017] Further, the baffle assembly further includes a control member and a driving member. The control member is communicatively connected to the driving member. The driving member is correspondingly arranged with the first connecting shaft and the second connecting shaft, and the control member can control the driving member to drive the first connecting shaft and the second connecting shaft to rotate so that the first baffle and the second baffle open or close the opening.

[0018] Among them, the vacuum coating system provided by the present invention further includes a heating device, the heating device includes a first heating mechanism and a second heating mechanism, the first heating mechanism and the second heating mechanism are arranged opposite to each other, and are both connected to the side wall of the vacuum coating chamber.

[0019] Specifically, the vacuum coating system provided by the present invention further includes a vacuum pumping device, the vacuum pumping device includes a vacuum pump group, a connecting pipeline and an opening control component, an air extraction port is formed on the side wall of the vacuum coating chamber, the vacuum pump group is connected to the air extraction port through the connecting pipeline, the opening control component is arranged vertically in the vacuum coating chamber and is located at the front end of the air extraction port for adjusting the opening of the air extraction port.

[0020] Further, a rough pumping port is opened on the bottom wall of the vacuum coating chamber, the rough pumping port is connected with a dust-proof pipe extending towards the top wall of the vacuum coating chamber, and the connecting pipeline is respectively connected to the air extraction port and the rough pumping port.

[0021] Further, the vacuum coating chamber has an octagonal structure and includes a coating chamber main body, a first door body and a second door body; the first door body and the second door body are rotatably connected to the coating chamber main body.

[0022] Furthermore, the coating chamber main body includes two relatively arranged first side walls, the first door body includes three second side walls connected in sequence, the second door body includes three third side walls connected in sequence; one of the first magnetron sputtering components and one of the second magnetron sputtering components are connected to two second side walls arranged at intervals of the first door body, and the other first magnetron sputtering component and the other second magnetron sputtering component are connected to two third side walls arranged at intervals of the second door body; the first heating mechanism is connected to the second side wall of the first door body located between the first magnetron sputtering component and the second magnetron sputtering component, and the second heating mechanism is connected to the third side wall of the second door body located between the first magnetron sputtering component and the second magnetron sputtering component; the first etching component is connected to one of the first side walls of the coating chamber main body, the air extraction port is opened on the other first side wall of the coating chamber main body, and the second etching component is located at the front end of the air extraction port.

[0023] Among them, the vacuum coating system provided by the present invention further includes a cooling device, and the cooling device includes a water supply mechanism, a water return mechanism, and a plurality of cooling pipelines; the water inlet ends of the plurality of cooling pipelines are all connected to the water supply mechanism, and the water outlet ends of the plurality of cooling pipelines are all connected to the water return mechanism; the plurality of cooling pipelines are distributed in the coating chamber main body, the first door body, the second door body, the etching device, the magnetron sputtering device, and the heating device.

[0024] Specifically, a turntable driving device, the turntable driving device includes a driving mechanism and a transmission mechanism; the driving mechanism is arranged outside the vacuum coating chamber, the output end of the driving mechanism is connected to the transmission mechanism, and the output end of the transmission mechanism passes through the bottom wall of the vacuum coating chamber and enters the vacuum coating chamber.

[0025] Further, the transmission mechanism includes a connecting block, a docking groove is formed on the connecting block, the docking groove is sword-shaped, and one end of the docking groove away from the tip penetrates through the edge of the connecting block.

[0026] Compared with the prior art, the vacuum coating chamber provided by the present invention has the following advantages:

[0027] The vacuum coating chamber provided by the present invention includes a vacuum coating chamber and an etching device; the etching device includes a first etching mechanism and a second etching mechanism oppositely arranged in the vacuum coating chamber, the first etching mechanism includes a first etching component and a first anode, and the second etching mechanism includes a second etching component and a second anode; the first etching component is connected to the side wall of the vacuum coating chamber, the first anode is arranged in the vacuum coating chamber and is located at the front end of the first etching component to form a horizontal etching area; the second etching component is connected to the top wall of the vacuum coating chamber, the second anode is connected to the bottom wall of the vacuum coating chamber and is oppositely arranged with the second etching component to form a vertical etching area.

[0028] It can be analyzed from this that by relatively arranging the first etching mechanism and the second etching mechanism in the vacuum coating chamber, a stable and uniform etching area can be formed. Since the first etching mechanism in the present application includes a first etching component and a first anode, and in the present application, the first etching component is connected to the side wall of the vacuum coating chamber, and the first anode is arranged at the front end of the first etching component, therefore, during the etching operation, the ions emitted by the first etching component move towards the first anode under the action of the first anode, so as to form a horizontal etching area. When the workpiece passes through the horizontal etching area, the ions bombard the surface of the workpiece to realize the etching of the workpiece. Since only the horizontal etching area is formed by the first etching mechanism in the present application, only the middle area of the larger workpiece except for both ends can be covered and etched by the first etching mechanism.

[0029] Furthermore, in the present application, a second etching mechanism is provided opposite to the first etching mechanism. The second etching mechanism includes a second etching component and a second anode. The second etching component is connected to the top wall of the vacuum coating chamber, and the second anode is connected to the bottom wall of the vacuum coating chamber. When the second etching mechanism is started for etching operations, the ions of the second etching component move towards the second anode under the influence of the second anode, thereby forming a vertical etching region. When the workpiece passes through the vertical etching region, the workpiece can be etched, especially enabling the etching operations on the regions at both ends of a relatively large workpiece.

[0030] Therefore, through the simultaneous operation and mutual cooperation of the first etching mechanism and the second etching mechanism in the present application, the etching effect on the workpiece can be improved to a certain extent, and the etching operations on large workpieces can be achieved, enhancing the etching ability and coating effect of the vacuum coating system. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following will briefly introduce the drawings required for use in the description of the specific embodiments or the prior art. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0032] Figure 1 Structural schematic diagram of the vacuum coating system provided by the embodiment of the present invention from the first perspective;

[0033] Figure 2 Structural schematic diagram of the vacuum coating system provided by the embodiment of the present invention from the second perspective;

[0034] Figure 3 Internal structural schematic diagram of the vacuum coating system provided by the embodiment of the present invention from the second perspective;

[0035] Figure 4 Internal structural schematic diagram of the vacuum coating system provided by the embodiment of the present invention from the third perspective;

[0036] Figure 5 Structural schematic diagram of the second etching component in the vacuum coating system provided by the embodiment of the present invention from the third perspective;

[0037] Figure 6 Cross-sectional view of the second etching component in the vacuum coating system provided by the embodiment of the present invention;

[0038] Figure 7 Structural schematic diagram of the magnetron sputtering device in the vacuum coating system provided by the embodiment of the present invention;

[0039] Figure 8 ForFigure 3 Partial enlarged view at position A in the [Chinese context];

[0040] Figure 9 Schematic structural view of the open states of the first door body and the second door body of the vacuum coating chamber in the vacuum coating system provided by an embodiment of the present invention;

[0041] Figure 10 Schematic structural view of the third perspective of the magnetron sputtering target in the vacuum coating system provided by an embodiment of the present invention;

[0042] Figure 11 Schematic structural view of the arc ignition mechanism in the vacuum coating system provided by an embodiment of the present invention.

[0043] In the figure: 1 - vacuum coating chamber; 101 - coating chamber main body; 1011 - rough pumping port; 1012 - dust-proof pipe; 102 - first door body; 103 - second door body; 2 - first etching component; 3 - first anode; 4 - second etching component; 401 - positioning member; 402 - water-cooled seat; 4021 - electron outlet; 403 - air inlet seat; 404 - mounting shaft; 405 - molybdenum tube; 406 - heating wire; 407 - heating cavity; 5 - second anode; 6 - arc ignition mechanism; 601 - fixed seat; 602 - arc ignition rod; 7 - heater; 8 - magnetron sputtering device; 801 - first magnetron sputtering component; 8011 - second target; 802 - second magnetron sputtering component; 8021 - third target; 803 - second target seat; 8031 - first bearing groove; 8032 - second bearing groove; 8033 - first magnet; 8034 - second magnet; 804 - shielding cover; 805 - adjusting member; 806 - first pressing component; 807 - second pressing component; 9 - first baffle; 10 - second baffle; 11 - heating device; 12 - pumping pump group; 13 - connecting pipeline; 14 - grating valve; 15 - cooling device; 16 - driving mechanism; 17 - transmission mechanism; 1701 - connecting block; 18 - locking component; 19 - outer shell; 20 - turntable; 21 - first support frame; 22 - second support frame; 23 - cabinet body. Detailed implementation manners

[0044] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the following will clearly and completely describe the technical solutions in the embodiments of this application with reference to the accompanying drawings in the embodiments of this application. Obviously, the described embodiments are only a part rather than all of the embodiments of this application. Components of the embodiments of this application described and illustrated herein are usually arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of this application provided in the drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative efforts belong to the scope of protection of this application.

[0045] In the description of the embodiments of this application, it should be noted that the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings or the orientation or positional relationship in which the inventive product is customarily placed during use. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive distinction and cannot be understood as indicating or implying relative importance.

[0046] In addition, terms such as "horizontal" and "vertical" do not mean that the components are required to be absolutely horizontal or hanging, but can be slightly inclined. For example, "horizontal" only means that its direction is more horizontal relative to "vertical", and does not mean that the structure must be completely horizontal, but can be slightly inclined.

[0047] In the description of the embodiments of this application, it should also be noted that unless otherwise clearly specified and limited, the terms "set", "installed", "connected", "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.

[0048] As used herein, the term "and / or" includes any one of the listed related items and any combination of any two or more of them.

[0049] For ease of description, spatial relationship terms such as "above", "upper", "below", and "lower" may be used herein to describe the relationship between one element and another as shown in the accompanying drawings. Such spatial relationship terms are intended to include different orientations of the device in use or operation in addition to the orientation depicted in the accompanying drawings.

[0050] The terms used herein are for the purpose of describing various examples only and are not intended to limit the present disclosure. Unless the context clearly dictates otherwise, the singular forms are also intended to include the plural forms. The terms "comprises", "comprising", and "having" list the stated features, quantities, operations, components, elements, and / or combinations thereof that exist, but do not preclude the presence or addition of one or more other features, quantities, operations, components, elements, and / or combinations thereof.

[0051] Due to manufacturing techniques and / or tolerances, variations in the shapes shown in the accompanying drawings may occur. Accordingly, the examples described herein are not limited to the specific shapes shown in the accompanying drawings, but include changes in shape that occur during manufacturing.

[0052] The features of the examples described herein can be combined in various ways that will be apparent after understanding the disclosure of the present application. In addition, although the examples described herein have a variety of configurations, other configurations are possible as will be apparent after understanding the disclosure of the present application. Additionally, the technical solutions between various embodiments can be combined with each other, but it must be based on the ability of those of ordinary skill in the art to implement. When the combination of technical solutions results in contradictions or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by this application.

[0053] As Figures 1 - 4 shown, the present invention provides a vacuum coating system, including a vacuum coating chamber 1 and an etching device; the etching device includes a first etching mechanism and a second etching mechanism oppositely arranged in the vacuum coating chamber 1, the first etching mechanism includes a first etching component 2 and a first anode 3, and the second etching mechanism includes a second etching component 4 and a second anode 5; the first etching component 2 is connected to the side wall of the vacuum coating chamber 1, and the first anode 3 is arranged in the vacuum coating chamber 1 and located at the front end of the first etching component 2 to form a horizontal etching area; the second etching component 4 is connected to the top wall of the vacuum coating chamber 1, and the second anode 5 is connected to the bottom wall of the vacuum coating chamber 1 and is oppositely arranged with the second etching component 4 to form a vertical etching area.

[0054] Compared with the prior art, the vacuum coating chamber 1 provided by the present invention has the following advantages:

[0055] The vacuum coating chamber 1 provided by the present invention can form a stable and uniform etching area through the first etching mechanism and the second etching mechanism oppositely arranged in the vacuum coating chamber 1. Since the first etching mechanism in this application includes a first etching component 2 and a first anode 3, and in this application, the first etching component 2 is connected to the side wall of the vacuum coating chamber 1, and the first anode 3 is arranged at the front end of the first etching component 2. Therefore, during the etching operation, the ions emitted by the first etching component 2 move towards the first anode 3 under the action of the first anode 3, so that a horizontal etching area can be formed. When the workpiece passes through the horizontal etching area, the ions bombard the surface of the workpiece to achieve the etching of the workpiece. Since only a horizontal etching area is formed by the first etching mechanism in this application, only the middle area of the larger workpiece except for both ends can be covered and etched by the first etching mechanism.

[0056] Furthermore, in this application, a second etching mechanism is arranged opposite to the first etching mechanism. The second etching mechanism includes a second etching component 4 and a second anode 5. The second etching component 4 is connected to the top wall of the vacuum coating chamber 1, and the second anode 5 is connected to the bottom wall of the vacuum coating chamber 1. When the second etching mechanism is started for the etching operation, the ions of the second etching component 4 move towards the second anode 5 under the influence of the second anode 5, so that a vertical etching area can be formed. When the workpiece passes through the vertical etching area, the workpiece can be etched, especially the areas at both ends of the larger workpiece can be etched.

[0057] Therefore, through the simultaneous operation and mutual cooperation of the first etching mechanism and the second etching mechanism in this application, the etching effect on the workpiece can be improved to a certain extent, and the etching operation on the large workpiece can be realized, improving the etching ability and coating effect of the vacuum coating system.

[0058] Optionally, the first etching component 2 provided by this application includes a fixed magnetic field member, a movable magnetic field member, an adjusting member 805, a first target seat and a first target material; the first target seat is connected to the side wall of the vacuum coating chamber 1, the fixed magnetic field member is connected to the side of the first target seat outside the vacuum coating chamber 1, the first target material is connected to the side of the first target seat inside the vacuum coating chamber 1, the movable magnetic field member is arranged in the first target seat and is movably connected to the fixed magnetic field member; the adjusting member 805 is connected to the movable magnetic field member to adjust the position of the movable magnetic field member.

[0059] In the present application, a stable magnetic field can be formed by the fixed magnetic field component and the movable magnetic field component provided in the first target seat, so that ions in the first target can move in the direction of the first anode 3 during operation. Since the adjustment component in the present application is connected to the movable magnetic field component, therefore, by adjusting the movable magnetic field component through the adjustment component, the position of the movable magnetic field component relative to the fixed magnetic field component and the position relative to the first target can be changed, thereby the intensity of the magnetic field can be changed, and further the size of the magnetic field can be adjusted according to the etching requirements, improving the etching effect, and ultimately improving the coating effect.

[0060] It should be further noted here that in the present application, the first etching component 2 is connected to one of the side walls of the coating chamber main body 101. Correspondingly, the second etching component 4 is arranged on the top wall of the coating chamber main body 101 and close to the position of the other side wall. And in the present application, an air extraction port is provided on the side wall of the coating chamber main body 101 far from the first etching component 2, which is used to connect a vacuum pumping device to perform a vacuum pumping operation on the vacuum coating chamber 1.

[0061] It should be further supplemented and explained here that the internal structure of the first etching component 2 provided in the present application is similar to the internal structure of the magnetron sputtering component, both having a fixed magnetic field, and the fixed magnetic field can be an electromagnetic coil, and through the cooperation with the adjustable magnetic field, the function of precipitating ions of the first target is realized. In order to ensure that a large horizontal etching area can be formed in the vacuum coating chamber 1, therefore, the number of the first etching components 2 in the present application is at least two and arranged in a vertical direction. Correspondingly, a corresponding number of installation positions are provided on the side wall of the coating chamber main body 101 in the present application to install the first etching component 2.

[0062] Optionally, as Figure 5 Combined with Figure 6 shown, the second etching component 4 in the present application includes a positioning member 401, a water-cooling seat 402, an air inlet seat 403, an installation shaft 404, a molybdenum tube 405 and a heating wire 406; the positioning member 401 is connected to the top wall of the vacuum coating chamber 1, the positioning member 401 and the water-cooling seat 402 form a heating cavity 407, and an electron outlet 4021 is provided on the side of the water-cooling seat 402 far from the positioning member 401; one end of the installation shaft 404 passes through the positioning member 401 vertically into the heating cavity 407 and is connected to one end of the molybdenum tube 405, and the other end of the molybdenum tube 405 is connected with a heating wire 406; the air inlet seat 403 is connected to the positioning member 401 and can fill the heating cavity 407 with gas.

[0063] In this application, the water-cooled base 402 is connected to the top wall of the coating chamber main body 101 through the positioning member 401. A heating chamber 407 is formed between the water-cooled base 402 and the positioning member 401. One end of the molybdenum tube 405 extends into the heating chamber 407 and is connected to the heating wire 406. Thus, after the molybdenum tube 405 is powered on, the heating wire 406 can be powered on and heated up, and then the gas introduced into the heating chamber 407 can be heated and electrons can be released. The cooling flow channel formed between the water-cooled bases 402 allows the coolant to pass through, thereby cooling the overall second etching assembly 4 and improving the service life and operating stability of the device.

[0064] It should be noted here that in this application, the diameter of the electron outlet 4021 is 8 mm - 12 mm, and the voltage of the high-voltage arc ignition mechanism 6 is 8 kV.

[0065] During specific operations, such as Figure 3 Combined with Figure 4 As shown, the vacuum coating system provided by the present invention further includes an arc ignition mechanism 6. The arc ignition mechanism 6 is arranged on the top wall of the vacuum coating chamber 1, extends into the vacuum coating chamber 1, and is aligned with the second etching assembly 4.

[0066] When the second etching mechanism is operating, first, gas is filled into the heating chamber 407 through the air inlet seat 403, and then the molybdenum tube 405 is powered on, so that the heating wire 406 can be powered on. After the heating wire 406 is powered on, it generates heat to heat the gas in the heating chamber 407 and release electrons. As the heating wire 406 continues to heat up, the electron content in the heating chamber 407 continuously increases. Then, the arc ignition mechanism 6 is turned on. The electrons in the heating chamber 407 are guided by the arc ignition mechanism 6 and discharged from the electron outlet 4021, and move towards the direction of the second anode 5, thereby forming a vertical etching area.

[0067] Preferably, as Figure 11 shown, the arc ignition mechanism 6 in this application includes a fixed seat 601 and an arc ignition rod 602; the fixed seat 601 is connected to the top wall of the vacuum coating chamber 1, and one end of the arc ignition rod 602 passes through the fixed seat 601 and enters the vacuum coating chamber 1 to form an extension part, and the extension part extends towards the direction close to the electron outlet 4021.

[0068] The arc ignition rod 602 in this application has an L-shaped structure, and one end is connected to the fixed seat 601. The fixed seat 601 is connected to the top wall of the vacuum coating chamber 1. The other end of the L-shaped arc ignition rod 602 is located in the vacuum coating chamber 1 and extends towards the direction close to the electron outlet 4021. Thus, when the arc ignition mechanism 6 is started, the electrons in the heating chamber 407 can be led out to achieve the function of arc ignition. Moreover, the arc ignition mechanism 6 in this application is a high-voltage arc ignition mechanism 6, and high-voltage electricity is introduced into the arc ignition mechanism 6 to achieve the purpose of leading out electrons.

[0069] It should be noted here that the installation shaft 404 in this application is a copper electrode, and as Figure 6 shown, there are four copper electrodes in this application, and they are grouped in pairs. Correspondingly, the number of molybdenum tubes 405 connected to the copper electrodes is four. The ends of two molybdenum tubes 405 are connected to the heating wire 406, so that a circuit can be formed to realize the function of heating the heating wire 406 after power-on. Since there are four copper electrodes and four molybdenum tubes 405 in this application, two heating wires 406 can be connected, thus improving the electron generation speed to a certain extent.

[0070] Among them, as Figure 3 combined with Figure 7 shown, the vacuum coating system provided by the present invention further includes a magnetron sputtering device 8. The magnetron sputtering device 8 includes a first magnetron sputtering mechanism and a second magnetron sputtering mechanism. The first magnetron sputtering mechanism includes two relatively arranged first magnetron sputtering components 801, and the second magnetron sputtering mechanism includes two relatively arranged second magnetron sputtering components 802; the target materials included in the two first magnetron sputtering components 801 are the same, the target materials included in the two second magnetron sputtering components 802 are the same, and the target material of the first magnetron sputtering component 801 is different from the target material of the second magnetron sputtering component 802; the first magnetron sputtering component 801 and the second magnetron sputtering component 802 are both connected to the side wall of the vacuum coating chamber 1, and the first magnetron sputtering component 801 and the second magnetron sputtering component 802 are arranged at intervals.

[0071] Since the vacuum coating system provided by this application is mainly applied to DLC, that is, the operation of diamond-like carbon film, and the generation effect of DLC on the tungsten carbide film layer is better, and the affinity between chromium and the metal matrix is better. Therefore, preferably, the second target material 8011 used in the two relatively arranged first magnetron sputtering components 801 in this application is a tungsten carbide target, and the third target material 8021 used in the two relatively arranged second magnetron sputtering components 802 is a chromium target.

[0072] Since the etching operation is to clean and roughen the surface of the metal matrix, the so-called cleaning and roughening is to strip the impurities in the surface layer of the metal matrix and make the outer surface of the metal matrix rougher, so as to improve the adhesion effect and speed of the film layer.

[0073] After the etching operation is completed, only the second magnetron sputtering component 802 is turned on, so that a chromium layer can be formed on the substrate. After the second magnetron sputtering component 802 works for a certain time, the first magnetron sputtering component 801 is turned on, so that the tungsten carbide target and the chromium target work simultaneously, so that a mixed layer of tungsten carbide and chromium can be further formed on the chromium layer. The mixed layer can protect the chromium layer formed on the substrate on the one hand and provide a basis for the subsequent formed tungsten carbide layer on the other hand.

[0074] After the first magnetron sputtering component 801 and the second magnetron sputtering component 802 operate simultaneously for a certain period of time to form a stable mixed layer, the second magnetron sputtering component 802 is turned off, and only the first magnetron sputtering component 801 operates, so that a tungsten carbide layer can be formed on the mixed layer, providing a basis for the formation of DLC.

[0075] It can be understood that, as Figure 7 combined with Figure 10 shown, both the first magnetron sputtering component 801 and the second magnetron sputtering component 802 in this application include a second target seat 803 and a shielding cover 804. The second target seat 803 is connected to the side wall of the vacuum coating chamber 1, and a rectangular installation space is formed between the second target seat 803 and the shielding cover 804. An opening is formed on the shielding cover 804, and the second target 8011 and the third target 8021 are both arranged in the corresponding installation space.

[0076] The second target seat 803 can provide a stable installation space for the second target 8011 and the third target 8021. In order to avoid the irregular diffusion of ions formed by the second target 8011 and the third target 8021 during operation, therefore, in this application, the shielding cover 804 covered outside the second target seat 803 can block ions to a certain extent, so that the ions of the target can only move in the direction of the workpiece, reducing the influence of target ions on other structures during the coating process.

[0077] It should be supplemented here that except for the different target materials used between the first magnetron sputtering component 801 and the second magnetron sputtering component 802, other structures are the same. Therefore, in this application Figure 10 the target shown can be the second target 8011 or the third target 8021, and the material of the target can be selected according to the specific installation position.

[0078] Preferably, both the second target 8011 and the third target 8021 in this application use rectangular targets. Correspondingly, the second target 8011 in this application also has a rectangular structure, so as to provide a stable installation space for the second target 8011 and the third target 8021.

[0079] On this basis, the first magnetron sputtering component 801 and the second magnetron sputtering component 802 in this application further include a first pressing component 806 and a second pressing component 807. The first pressing component 806 is arranged along the outer circumference of the second target 8011 or the third target 8021, so as to enable the second target 8011 or the third target 8021 to be stably connected to the second target seat 803. By pressing the second target 8011 or the third target 8021 at the middle position through the second pressing component 807, the connection stability between the target and the second target seat 803 can be further improved.

[0080] Further, as Figure 7 shown, both the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 in the present application include magnetic field members. A first bearing groove 8031 and a second bearing groove 8032 are formed on the second target seat 803. The first bearing groove 8031 and the second bearing groove 8032 are independently and spaced apart. Magnetic field members are provided in both the first bearing groove 8031 and the second bearing groove 8032. The magnetic field member includes a first magnet 8033, a second magnet 8034 with different magnetic poles, and a bearing seat. The first magnet 8033 and the second magnet 8034 are arranged at both ends of the bearing seat, and the second magnet 8034 in the first bearing groove 8031 is close to the first magnet 8033 in the second bearing groove 8032, while the first magnet 8033 in the first bearing groove 8031 is far from the second magnet 8034 in the second bearing groove 8032.

[0081] In the present application, one first magnet 8033 and one second magnet 8034 are provided in both the first bearing groove 8031 and the second bearing groove 8032. By arranging the second magnet 8034 in the first bearing groove 8031 close to the first magnet 8033 in the second bearing groove 8032 and arranging the first magnet 8033 in the first bearing groove 8031 far from the second magnet 8034 in the second bearing groove 8032, it can cooperate with the magnetic field mechanism in the magnetron sputtering device 8 at other positions in the coating equipment to form a stable closed magnetic field.

[0082] Since the magnetic poles of the first magnet 8033 and the second magnet 8034 in the present application are different, when the first magnet 8033 is an N pole, correspondingly, the second magnet 8034 is an S pole. Thus, a magnetic field is generated between the first magnet 8033 and the second magnet 8034 in the first bearing groove 8031, a magnetic field is generated between the first magnet 8033 and the second magnet 8034 in the second bearing groove 8032, and a magnetic field is also generated between the first magnet 8033 and the second magnet 8034 in the first bearing groove 8031 and the first magnet 8033 and the second magnet 8034 in the adjacent second target seat 803. Therefore, in this way of magnet distribution, a stable closed magnetic field can be formed in the vacuum coating chamber 1, thereby improving the magnetic field's ability to confine plasma to a certain extent and enhancing the coating effect.

[0083] It can be understood that, as Figure 7As shown, in the present application, the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 further include an adjustment assembly. The adjustment assembly may include a screw, a threaded sleeve, a connecting rod, and a connecting seat. The first magnet 8033 and the second magnet 8034 in the first bearing groove 8031 and the second bearing groove 8032 are installed through a mounting seat, and the mounting seat is connected to one end of the connecting rod. The other end of the connecting rod is connected to the connecting seat. The connecting seat can be connected to the screw through structures such as bearings. The threaded sleeve is connected to the second target seat 803. When the screw rotates relative to the threaded sleeve, since the threaded sleeve is connected to the second target seat 803, the threaded sleeve is relatively fixed. Thus, the screw moves relative to the threaded sleeve, and then drives the connecting seat to move, realizing the adjustment of the distance between the first magnet 8033 and the second magnet 8034 and the target material.

[0084] Optionally, as Figure 7 shown, the magnetron sputtering device 8 further includes a baffle assembly provided in one-to-one correspondence with the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802; the baffle assembly includes a baffle member and a connecting member. The baffle is connected to the connecting member, and the connecting member is rotatably connected to the second target seat 803, so that the baffle member can open or close the open portion.

[0085] The baffle in the present application can be an integral baffle, which can cooperate with the shielding cover 804 to form a relatively closed accommodation space. When the corresponding second target 8011 or the third target 8021 needs to operate, the baffle member opens the open portion, thus exposing the corresponding second target 8011 or the third target 8021.

[0086] It can be seen from the above description that during the operation in the present application, first, a bottom layer of chromium layer needs to be formed on the substrate, then a mixed layer of tungsten carbide and chromium is formed on the bottom layer, and finally a tungsten carbide layer is formed on the mixed layer. Therefore, when forming the bottom layer, the baffle member corresponding to the first magnetron sputtering assembly 801 is in the closed state, and the baffle member corresponding to the second magnetron sputtering assembly 802 is in the open state, so as to ensure to a certain extent that there are mainly chromium ions in the vacuum coating chamber 1. On the one hand, it can improve the quality of the formed chromium layer, and on the other hand, it can also avoid the mutual influence between the tungsten carbide target and the chromium target.

[0087] When forming the mixed layer, the baffle members corresponding to the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 are all opened, so as to release tungsten carbide ions and chromium ions, achieving the purpose of forming a mixed layer on the bottom layer.

[0088] After the mixed layer is formed, the baffle member corresponding to the second magnetron sputtering assembly 802 is closed, so as to ensure to a certain extent that there are mainly tungsten carbide ions in the vacuum coating chamber 1, realizing the formation of the tungsten carbide layer and providing a basis for the formation of DLC.

[0089] Preferably, as Figure 7 shown, the baffle member in the present application includes a first baffle 9 and a second baffle 10, the connecting member includes a first connecting shaft and a second connecting shaft, the first connecting shaft is correspondingly connected to the first baffle 9, and the first connecting shaft is rotatably connected to one side of the second target seat 803, the second connecting shaft is correspondingly connected to the second baffle 10, and the second connecting shaft is rotatably connected to the other side of the second target seat 803; when the first baffle 9 and the second baffle 10 close the open portion, the side of the first baffle 9 away from the first connecting shaft abuts against the side of the second baffle 10 away from the second connecting shaft, and an extension portion extending in a direction approaching the second baffle 10 is formed on the side of the first baffle 9 away from the first connecting shaft, and the extension portion covers a part of the second baffle 10.

[0090] Due to the limited space in the vacuum coating chamber 1, a turntable 20 needs to be placed during operation, and the main body of the turntable 20 rotates continuously in the vacuum coating chamber 1, and the hanging rods provided on the turntable 20 revolve continuously relative to the main body of the turntable 20. Therefore, in order to avoid the influence of the opening and closing of the baffle member on the turntable 20, the baffle member in the present application includes a first baffle 9 and a second baffle 10, and adopts an opening and closing manner, so as to reduce the space occupied when the first baffle 9 and the second baffle 10 are opened to a certain extent, and further avoid the problem that the baffle member affects the rotation of the turntable 20 to a certain extent.

[0091] It should be supplemented and explained here that since impurities in the workpiece are washed out during the etching stage and exist in the vacuum coating chamber 1, if a large amount of impurities adhere to the surfaces of the tungsten carbide target and the chromium target, it will cause the poisoning and failure of the target material.

[0092] Therefore, in the present application, by correspondingly providing a first baffle 9 and a second baffle 10 on the open portions of the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802, and closing the open portions by the first baffle 9 and the second baffle 10 during the etching stage, the problem that impurities adhere to the surface of the target material and cause the failure of the target material can be avoided to a certain extent.

[0093] Moreover, since there is still a state where the tungsten carbide target and the chromium target are both opened during the coating stage, therefore, by selectively opening and closing the first baffle 9 and the second baffle 10, the mutual influence between the tungsten carbide target and the chromium target can be reduced, the service life of the target material can be improved, and the coating effect can be improved.

[0094] It should be supplemented and explained here that since a low bias voltage can cause ion deposition and a high bias voltage can cause ion stripping, when there are too many impurities attached to the target material, it is necessary to introduce a high bias voltage to precipitate and strip the impurities on the target material. And during the stripping process, in order to avoid the stripped impurities from affecting other target materials again, therefore, by closing the first baffle 9 and the second baffle 10, the stripped impurities can be retained in the closed accommodation space, thereby reducing the influence on other target materials.

[0095] Further preferably, as Figure 7 shown, the baffle assembly in the present application further includes a control member and a driving member. The control member is communicatively connected to the driving member. The driving member is provided in one-to-one correspondence with the first connecting shaft and the second connecting shaft, and the control member can control the driving member to drive the first connecting shaft and the second connecting shaft to rotate, so as to open or close the opening by the first baffle 9 and the second baffle 10.

[0096] Since both the first baffle 9 and the second baffle 10 are located in the vacuum coating chamber 1 and the vacuum coating chamber 1 cannot be opened during the coating process, therefore, the automatic opening and closing of the first baffle 9 and the second baffle 10 can be realized through the control member and the driving member, improving the automation degree of the overall system.

[0097] Optionally, as Figure 4 shown, the vacuum coating system provided by the present invention further includes a heating device 11. The heating device 11 includes a first heating mechanism and a second heating mechanism. The first heating mechanism and the second heating mechanism are oppositely arranged and are both connected to the side wall of the vacuum coating chamber 1.

[0098] By the first heating mechanism and the second heating mechanism oppositely arranged in the vacuum coating chamber 1, a uniform heating space can be provided for the vacuum coating chamber 1, thereby ensuring the stability of the coating process.

[0099] Optionally, as Figure 2 Combined with Figure 3 shown, the vacuum coating system provided by the present invention further includes a vacuum pumping device. The vacuum pumping device includes a vacuum pump group 12, a connecting pipeline 13 and an opening degree control assembly. An air extraction port is formed on the side wall of the vacuum coating chamber 1. The vacuum pump group 12 is connected to the air extraction port through the connecting pipeline 13. The opening degree control assembly is arranged vertically in the vacuum coating chamber 1 and is located at the front end of the air extraction port for adjusting the opening degree of the air extraction port.

[0100] It can be understood that the vacuum pump group 12 in the present application includes a fine vacuum pump assembly and a rough vacuum pump assembly. Both the fine vacuum pump assembly and the rough vacuum pump are connected to the vacuum coating chamber 1 through pipelines, and the air extraction port formed on the side wall of the vacuum coating chamber 1 is a fine vacuum port. And the fine vacuum pump assembly in the present application is directly connected to the fine vacuum port, omitting the connection through the connecting pipeline 13 in the middle, thereby being able to improve the conductance to a certain extent and avoiding the problem of loss of vacuum pumping capacity caused by too many turns of the connecting pipeline 13 and the small diameter of the connecting pipeline 13, and further improving the vacuum pumping efficiency.

[0101] It should be supplemented and explained here that the opening degree control assembly in the present application is a grating valve 14, and the opening degree of the fine vacuum port can be controlled through the grating valve 14, thereby being able to reduce the waste of resources to a certain extent.

[0102] It should be further noted here that, as Figure 3 shown, on the side of the grating valve 14 away from the fine pumping port, a heater 7 is also provided in the vacuum coating chamber 1. Through the heater 7, the vacuum coating chamber 1 can be preheated and the temperature can be maintained, so as to ensure the coating effect to a certain extent.

[0103] As Figure 3 shown, a rough pumping port 1011 is provided on the bottom wall of the vacuum coating chamber 1 in this application. The rough pumping port 1011 is connected with a dust-proof pipe 1012 extending towards the top wall of the vacuum coating chamber 1. The connecting pipeline 13 is respectively connected with the pumping port and the rough pumping port 1011.

[0104] The rough pumping pump in this application is connected with the rough pumping port 1011 through the connecting pipeline 13. And since the rough pumping port 1011 in this application is located on the bottom wall of the vacuum coating chamber 1, during the vacuum pumping process, it is very easy for the dust deposited on the bottom wall of the vacuum coating chamber 1 to enter the rough pumping port 1011 and enter the rough pumping pump assembly through the connecting pipeline 13, resulting in damage to the pump group. In this application, by providing the dust-proof pipe 1012 at the rough pumping port 1011 and the dust-proof pipe 1012 extending in the vertical direction, the rough pumping port 1011 can be raised, and thus the problem of dust entering the rough pumping port 1011 can be reduced to a certain extent.

[0105] As Figure 9 shown, the vacuum coating chamber 1 provided in this application has an octagonal structure, including a coating chamber main body 101, a first door body 102 and a second door body 103; the first door body 102 and the second door body 103 are rotatably connected to the coating chamber main body 101.

[0106] By providing the first door body 102 and the second door body 103 and making both the first door body 102 and the second door body 103 rotatably connected to the coating chamber main body 101, a double-door structure can be formed, and thus sufficient open space can be provided for the maintenance and repair of the equipment, improving the maintenance and repair efficiency. And, due to the double-door structure, when one side of the first door body 102 or the second door body 103 cannot be freely opened and closed due to space limitations, the first door body 102 or the second door body 103 on the other side can still provide conditions and a basis for the loading and unloading of the turntable 20 and the maintenance and repair of the equipment.

[0107] Preferably, as Figures 1 - 4As shown in the figure, the vacuum coating system provided by the present application includes a vacuum coating chamber 1 and a cabinet 23. The main controller, electrical control devices, and water cooling device are mainly installed in the cabinet 23, and the space surrounded by multiple cabinets 23 is used to place the vacuum pumping device, so that the space utilization of the formed vacuum coating system is more reasonable and the appearance structure of the overall equipment is more regular. An outer shell 19 is provided outside the vacuum coating chamber 1, and the cross-section of the outer shell 19 corresponding to each side wall is a semi-circular structure, which can not only provide a stable installation space for the magnetron sputtering device 8 on the side wall, but also improve the aesthetics of the overall system.

[0108] As Figure 4 Combined with Figure 9 As shown in the figure, the present application provides a compact and reasonable arrangement method for the internal structures of the vacuum coating chamber 1. Among them, the coating chamber main body 101 includes two relatively arranged first side walls, the first door body 102 includes three second side walls connected in sequence, and the second door body 103 includes three third side walls connected in sequence; one of the first magnetron sputtering assemblies 801 and one of the second magnetron sputtering assemblies 802 are connected to two second side walls arranged at intervals of the first door body 102, and the other first magnetron sputtering assembly 801 and the other second magnetron sputtering assembly 802 are connected to two third side walls arranged at intervals of the second door body 103; the first heating mechanism is connected to the second side wall of the first door body 102 between the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802, and the second heating mechanism is connected to the third side wall of the second door body 103 between the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802; the first etching assembly 2 is connected to one of the first side walls of the coating chamber main body 101, the air extraction port is opened on the other first side wall of the coating chamber main body 101, and the second etching assembly 4 is located at the front end of the air extraction port.

[0109] Optionally, as Figure 4 As shown in the figure, the vacuum coating system provided by the present invention further includes a cooling device 15. The cooling device 15 includes a water supply mechanism, a water return mechanism, and multiple cooling pipelines; the water inlet ends of the multiple cooling pipelines are all connected to the water supply mechanism, and the water outlet ends of the multiple cooling pipelines are all connected to the water return mechanism; the multiple cooling pipelines are distributed in the coating chamber main body 101, the first door body 102, the second door body 103, the etching device, the magnetron sputtering device 8, and the heating device 11.

[0110] The water supply mechanism in the present application provides cooling water for the multiple cooling pipelines. Preferably, the cooling water used in the present application is ice water. Since the ice water needs to be refrigerated and cooled before entering the cooling pipeline, and the corresponding refrigeration device has a filtering device, it does not need to be filtered again when entering the cooling pipeline, and thus can ensure the stability and service life of the cooling device 15 and the cooling pipeline circulation to a certain extent, and avoid the problem of blockage of the cooling pipeline.

[0111] It is understandable that in this application, the water supply mechanism at least includes a main water supply pipe, and a plurality of water outlets are provided on the main water supply pipe. The cooling pipelines are connected to the water outlets in a one-to-one correspondence. One end of the cooling pipeline is connected to the water outlet, so that the inflow of cooling water can be realized. The other end of the cooling pipeline is connected to the water return mechanism. Therefore, the water return mechanism provided in this application at least includes a main water return pipe, and a plurality of water return ports are provided on the main water return pipe. The water return ports are arranged in a one-to-one correspondence with the cooling pipelines, so as to form a stable circulating cooling system and realize the function of cooling the overall equipment.

[0112] Specifically, as Figure 8 shown, the vacuum coating system provided in this application further includes a turntable driving device. The turntable driving device includes a driving mechanism 16 and a transmission mechanism 17. The driving mechanism 16 is arranged outside the vacuum coating chamber 1, and the output end of the driving mechanism 16 is connected to the transmission mechanism 17. The output end of the transmission mechanism 17 passes through the bottom wall of the vacuum coating chamber 1 and enters the vacuum coating chamber 1.

[0113] During operation, the driving mechanism 16 drives the transmission mechanism 17 to rotate. The turntable 20 is connected to the transmission mechanism 17, so that the rotation of the turntable 20 can be realized. Preferably, the turntable driving device in this application further includes a bias voltage introducing mechanism. Through the bias voltage introducing mechanism, a bias voltage can be supplied to the turntable 20, so that the coating operation of the workpiece can be realized.

[0114] Preferably, the transmission mechanism 17 in this application includes a connecting block 1701. A docking groove is formed on the connecting block 1701. The docking groove is sword-shaped, and one end of the docking groove away from the tip penetrates through the edge of the connecting block 1701.

[0115] By making the docking groove sword-shaped and the side of the docking groove away from the tip penetrate through the edge of the connecting block 1701, it is convenient for the drive shaft on the turntable 20 to enter. It is understandable that the shape of the drive shaft on the turntable 20 in this application is adapted to the docking groove, so that the rotation of the turntable 20 can be more stable.

[0116] During the process of the turntable 20 moving into the vacuum coating chamber 1, the drive shaft of the turntable 20 gradually enters the docking groove and continues to move along the extending direction of the docking groove until the front end of the drive shaft abuts against the tip of the docking groove. Since the docking groove in this application is sword-shaped, when the connecting block 1701 drives the drive shaft of the turntable 20 to rotate, there can be two stress surfaces, which can improve the stability of the movement and the strength of the connecting block 1701 to a certain extent.

[0117] Further preferably, locking components 18 are provided at both ends of the transmission mechanism 17 provided in the present application. Both of the two locking components 18 include positioning shafts capable of reciprocating in the vertical direction. When it is necessary to lock the turntable 20, the positioning shafts extend, so that they can be inserted into the corresponding positioning holes at the bottom of the turntable 20, thereby realizing the locking of the turntable 20. Correspondingly, when it is necessary to unlock the turntable 20, the positioning shafts contract, thereby realizing the unlocking of the turntable 20.

[0118] In the above solution, as Figure 2 Combined with Figure 3 shown, a first support frame 21 is provided corresponding to the bottom of the vacuum coating chamber 1 in the present application. The vacuum coating chamber 1 can be lifted by the first support frame 21, so as to provide a stable and sufficient installation space for the driving mechanism 16. And a second support frame 22 is provided corresponding to the position of the air extraction pump group 12 in the present application. The second support frame 22 can provide a stable bearing space for the air extraction pump group 12 and can support the air extraction pump group 12 off the ground, so as to shorten the size of the connecting pipeline 13 to a certain extent, and further improve the vacuum pumping efficiency.

[0119] The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention.

Claims

1. A vacuum coating system, characterized in that, It includes a vacuum coating chamber and an etching device; The etching device includes a first etching mechanism and a second etching mechanism oppositely arranged in the vacuum coating chamber. The first etching mechanism includes a first etching component and a first anode, and the second etching mechanism includes a second etching component and a second anode; The first etching component is connected to the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and located at the front end of the first etching component to form a horizontal etching area; The second etching component is connected to the top wall of the vacuum coating chamber, and the second anode is connected to the bottom wall of the vacuum coating chamber and is oppositely arranged with the second etching component to form a vertical etching area; It further includes a magnetron sputtering device. The magnetron sputtering device includes a first magnetron sputtering mechanism and a second magnetron sputtering mechanism. The first magnetron sputtering mechanism includes two oppositely arranged first magnetron sputtering components, and the second magnetron sputtering mechanism includes two oppositely arranged second magnetron sputtering components; Both the first magnetron sputtering component and the second magnetron sputtering component include a second target seat; Both the first magnetron sputtering component and the second magnetron sputtering component include a magnetic field member. A first bearing groove and a second bearing groove are formed on the second target seat. The first bearing groove and the second bearing groove are independently and spaced apart. The magnetic field member is arranged in both the first bearing groove and the second bearing groove; The magnetic field member includes a first magnet, a second magnet with different magnetic poles, and a bearing seat. The first magnet and the second magnet are arranged at both ends of the bearing seat, and the second magnet in the first bearing groove is close to the first magnet in the second bearing groove, while the first magnet in the first bearing groove is far from the second magnet in the second bearing groove.

2. The vacuum coating system according to claim 1, wherein The first etching component includes a fixed magnetic field member, a movable magnetic field member, an adjusting member, a first target seat, and a first target material; The first target seat is connected to the side wall of the vacuum coating chamber. The fixed magnetic field member is connected to the side of the first target seat located outside the vacuum coating chamber. The first target material is connected to the side of the first target seat located inside the vacuum coating chamber. The movable magnetic field member is arranged in the first target seat and is movably connected to the fixed magnetic field member; The adjusting member is connected to the movable magnetic field member to adjust the position of the movable magnetic field member.

3. The vacuum coating system according to claim 1, wherein The second etching component includes a positioning member, a water-cooling seat, an air inlet seat, a mounting shaft, a molybdenum tube, and a heating wire; The positioning member is connected to the top wall of the vacuum coating chamber. The positioning member and the water-cooling seat form a heating cavity, and an electron outlet is provided on the side of the water-cooling seat away from the positioning member; One end of the mounting shaft passes through the positioning member vertically into the heating cavity and is connected to one end of the molybdenum tube. The other end of the molybdenum tube is connected to a heating wire; The air inlet seat is connected to the positioning member and can fill gas into the heating cavity.

4. The vacuum coating system according to claim 3, characterized in that, It further includes an arc striking mechanism, which is arranged on the top wall of the vacuum coating chamber, extends into the vacuum coating chamber, and is aligned with the second etching component.

5. The vacuum coating system according to claim 4, wherein, The arc striking mechanism includes a fixed seat and an arc striking rod; The fixed seat is connected to the top wall of the vacuum coating chamber. One end of the arc striking rod passes through the fixed seat and enters the vacuum coating chamber to form an extension part, and the extension part extends in the direction approaching the electron outlet.

6. The vacuum coating system according to claim 1, characterized in that, The two first magnetron sputtering components include the same target materials, the two second magnetron sputtering components include the same target materials, and the target materials of the first magnetron sputtering components are different from those of the second magnetron sputtering components; Both the first magnetron sputtering component and the second magnetron sputtering component are connected to the side wall of the vacuum coating chamber, and the first magnetron sputtering component and the second magnetron sputtering component are arranged at intervals.

7. The vacuum coating system according to claim 6, wherein The first magnetron sputtering component and the second magnetron sputtering component further include shielding covers, and the first magnetron sputtering component further includes a second target, and the second magnetron sputtering component further includes a third target; The second target seat is connected to the side wall of the vacuum coating chamber, and a rectangular installation space is formed between the second target seat and the shielding cover. An opening is formed on the shielding cover, and the second target and the third target are both arranged in the corresponding installation space; The second target is made of tungsten carbide, and the third target is made of chromium.

8. The vacuum coating system according to claim 7, wherein The magnetron sputtering device further includes a baffle component arranged in one-to-one correspondence with the first magnetron sputtering component and the second magnetron sputtering component; The baffle component includes a baffle member and a connecting member. The baffle is connected to the connecting member, and the connecting member is rotatably connected to the second target seat, so that the baffle member can open or close the opening.

9. The vacuum coating system according to claim 8, characterized in that, The baffle member includes a first baffle and a second baffle. The connecting member includes a first connecting shaft and a second connecting shaft. The first connecting shaft is correspondingly connected to the first baffle and is rotatably connected to one side of the second target seat. The second connecting shaft is correspondingly connected to the second baffle and is rotatably connected to the other side of the second target seat; When the first baffle and the second baffle close the opening, the side of the first baffle away from the first connecting shaft abuts against the side of the second baffle away from the second connecting shaft. An extension part extending in the direction approaching the second baffle is formed on the side of the first baffle away from the first connecting shaft, and the extension part covers part of the second baffle.

10. The vacuum coating system according to claim 9, wherein, The baffle component further includes a control part and a driving part. The control part is communicatively connected to the driving part. The driving part is arranged in one-to-one correspondence with the first connecting shaft and the second connecting shaft, and the control part can control the driving part to drive the first connecting shaft and the second connecting shaft to rotate, so that the first baffle and the second baffle open or close the opening.

11. The vacuum coating system according to claim 6, wherein, It further includes a heating device, which comprises a first heating mechanism and a second heating mechanism. The first heating mechanism and the second heating mechanism are arranged opposite to each other and are both connected to the side wall of the vacuum coating chamber.

12. The vacuum coating system according to claim 11, characterized in that, It further includes a vacuum pumping device, which comprises a pump set, a connecting pipeline and an opening control component. An air extraction port is formed on the side wall of the vacuum coating chamber. The pump set is connected to the air extraction port through the connecting pipeline. The opening control component is arranged vertically in the vacuum coating chamber and is located at the front end of the air extraction port for adjusting the opening degree of the air extraction port.

13. The vacuum coating system according to claim 12, characterized in that, A rough pumping port is formed on the bottom wall of the vacuum coating chamber. The rough pumping port is connected with a dust-proof pipe extending towards the top wall of the vacuum coating chamber. The connecting pipeline is respectively connected to the air extraction port and the rough pumping port.

14. The vacuum coating system according to claim 13, characterized in that, The vacuum coating chamber has an octagonal structure and includes a coating chamber main body, a first door body and a second door body. The first door body and the second door body are rotatably connected to the coating chamber main body.

15. The vacuum coating system according to claim 14, wherein, The coating chamber main body includes two relatively arranged first side walls. The first door body includes three second side walls connected in sequence. The second door body includes three third side walls connected in sequence. One of the first magnetron sputtering components and one of the second magnetron sputtering components are connected to two second side walls of the first door body arranged at intervals. The other first magnetron sputtering component and the other second magnetron sputtering component are connected to two third side walls of the second door body arranged at intervals. The first heating mechanism is connected to the second side wall of the first door body located between the first magnetron sputtering component and the second magnetron sputtering component. The second heating mechanism is connected to the third side wall of the second door body located between the first magnetron sputtering component and the second magnetron sputtering component. The first etching component is connected to one of the first side walls of the coating chamber main body. The air extraction port is formed on the other first side wall of the coating chamber main body, and the second etching component is located at the front end of the air extraction port.

16. The vacuum coating system according to claim 15, wherein, It further includes a cooling device, which comprises a water supply mechanism, a water return mechanism and a plurality of cooling pipelines. The water inlet ends of the plurality of cooling pipelines are all connected to the water supply mechanism, and the water outlet ends of the plurality of cooling pipelines are all connected to the water return mechanism. The plurality of cooling pipelines are distributed in the coating chamber main body, the first door body, the second door body, the etching device, the magnetron sputtering device and the heating device.

17. The vacuum coating system according to claim 1, wherein A turntable driving device, which comprises a driving mechanism and a transmission mechanism. The driving mechanism is arranged outside the vacuum coating chamber. The output end of the driving mechanism is connected to the transmission mechanism. The output end of the transmission mechanism passes through the bottom wall of the vacuum coating chamber and enters the vacuum coating chamber.

18. The vacuum coating system according to claim 17, wherein The transmission mechanism includes a connecting block. A docking groove is formed on the connecting block. The docking groove is sword-shaped, and one end of the docking groove far from the tip penetrates through the edge of the connecting block.

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