A mapping method and color selection model for an imitation embroidery diffraction grating pattern

Abstract

The present invention belongs to the field of computer-aided drawing, and provides a drawing method and a color selection model for an embroidered diffraction grating pattern. The method includes obtaining the angle of the silk thread corresponding to the embroidery trace in the sub-drawing area of the embroidered sample; based on the angle of the silk thread, selecting a silk-like segment that matches the angle of the silk thread in the color selection model, and copying the silk-like segment to the position of the silk thread corresponding to the embroidery trace; adjusting the length of the silk-like segment according to the length of the silk thread corresponding to the embroidery trace to complete the drawing. The present invention can achieve high-efficiency and intuitive drawing of an embroidered diffraction grating pattern.

Description

Technical Field

[0001] The present invention relates to the field of computer-aided drawing, and particularly to a drawing method and a color selection model for an embroidered diffraction grating pattern Background Art

[0002] Embroidery, also known as "needle embroidery" and commonly called "embroidering", uses an embroidery needle to draw colored threads (silk, velvet, thread) and stitches according to the designed pattern on fabrics (silk, cloth). The light reflected by the texture of the silk threads creates a unique visual effect with the light and shadow changes generated by the embroidery traces.

[0003] A diffraction grating pattern is a pattern formed by using diffraction gratings as compositional elements. Light diffracts spectral colors through the grating microstructure and produces a dynamic and changing visual effect as the grating direction changes. A diffraction grating pattern is an image produced by a laser holographic dot lithography technology process using a laser dot lithography machine. Its production process flow is: design → drawing → lithography → development.

[0004] The conventional drawing method is that for each silk thread drawn, first adjust its placement angle, and then calculate a gray value to be assigned to it based on the line angle. However, this work is time-consuming and brain-consuming, and the efficiency is relatively low. Summary of the Invention

[0005] The purpose of the present invention is to provide a drawing method and a color selection model for an embroidered diffraction grating pattern, through which an embroidered diffraction grating pattern can be drawn efficiently and intuitively.

[0006] The technical solution provided by the present invention is as follows:

[0007] The present invention provides a color selection model for an embroidered diffraction grating pattern, including:

[0008] A silk thread segment simulation module for defining a silk thread segment simulation;

[0009] A region indication module for the silk thread segment simulation for indicating the region where the silk thread segment simulation is located;

[0010] An angle definition diagram module for defining the angle of the silk thread segment simulation;

[0011] A silk thread angle marking module for indicating the angle of the silk thread segment simulation;

[0012] A starting and ending needle indication module for indicating the starting and ending needles of the silk thread segment simulation;

[0013] A gray value marking module for marking the gray value of the silk thread segment simulation.

[0014] In some embodiments, the angle definition diagram module is further configured to define the angle of the silk thread segment simulation based on the indicated starting and ending needles of the silk thread segment simulation;

[0015] Among them, the direction from top to bottom is defined as 0°, the direction from bottom to top is defined as 180°, the direction from left to right is defined as 90°, and the direction from right to left is defined as -90°.

[0016] In some embodiments, the value range of the gray value is 0 to 255;

[0017] When the gray value is 0, the angle of the silk-like line segment corresponding thereto is 0°;

[0018] When the gray value is n, the angle of the silk-like line segment corresponding thereto is θ = n * 0.703125°, where n = 1 to 254;

[0019] When the gray value is 255, the angle of the silk-like line segment corresponding thereto is 180°.

[0020] A method for drawing an embroidered diffraction grating pattern, which is drawn based on the color selection model of the embroidered diffraction grating pattern, includes:

[0021] Step S1: Obtain the angle of the silk thread corresponding to the embroidery trace in the sub-drawing area of the embroidered sample;

[0022] Step S2: Based on the angle of the silk thread, select a silk-like line segment that matches the angle of the silk thread in the color selection model, and copy the silk-like line segment to the position of the silk thread corresponding to the embroidery trace;

[0023] Step S3: Adjust the length of the silk-like line segment according to the length of the silk thread corresponding to the embroidery trace to complete the drawing.

[0024] In some embodiments, step S1 of obtaining the angle of the silk thread corresponding to the embroidery trace in the sub-drawing area of the embroidered sample includes:

[0025] Identify the embroidery trace in the sub-drawing area of the embroidered sample, and obtain the starting point and ending point of the embroidery trace;

[0026] Obtain the angle of the silk thread according to the starting point and ending point of the embroidery trace.

[0027] In some embodiments, obtaining the angle of the silk thread according to the starting point and ending point of the embroidery trace includes:

[0028] Connect the starting point and ending point of the embroidery trace to obtain the silk thread;

[0029] Taking the marked 0° of the angle definition diagram module in the color selection model as the baseline, measure the angle of the silk thread.

[0030] In some embodiments, before identifying the embroidery trace in the drawing area and obtaining the starting point and ending point of the embroidery trace, it further includes:

[0031] Select the sub-drawing area from the drawing area of the simulated embroidery draft.

[0032] Adjust the line width of the silk-like line segments in the color selection model based on the line width representing the silk thread diameter.

[0033] In some embodiments, the sub-drawing area includes a plurality of embroidery traces.

[0034] In some embodiments, adjusting the length of the silk-like line segments according to the length of the silk thread corresponding to the embroidery trace to complete the drawing includes:

[0035] When the drawing of one embroidery trace is completed, draw another embroidery trace according to steps S1 - S3 until the drawing of the sub-drawing area is completed.

[0036] In some embodiments, the drawing area of the simulated embroidery draft includes a plurality of sub-drawing areas;

[0037] When the drawing of one sub-drawing area is completed, copy another sub-drawing area for drawing until the drawing of the simulated embroidery draft is completed.

[0038] The method for drawing a simulated embroidery diffraction grating pattern and the color selection model provided by the present invention at least have the following beneficial effects:

[0039] The present invention uses a diffraction grating pattern with a strong sense of modern technology to interpret the visual effect of traditional embroidery, which is an unprecedented secondary artistic creation. To make this form of expression reproducible and popularizable, a novel drawing method has been summarized.

[0040] To improve the drawing work efficiency, the present invention creatively models and toolizes the work of determining gray levels and assigning colors in the complex process of drawing a diffraction grating pattern, creates a color selection model, and greatly reduces the mental labor intensity of the drawing workers with an intuitive form of expression and a simple picking action. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] The following will further illustrate the above characteristics, technical features, advantages and their implementation manners of a method for drawing a simulated embroidery diffraction grating pattern and a color selection model in a clear and understandable manner in combination with the drawings.

[0042] Figure 1 is a schematic structural diagram of an embodiment of a color selection model of a simulated embroidery diffraction grating pattern of the present invention;

[0043] Figure 2 is a schematic structural diagram of an embodiment of a color selection model of a simulated embroidery diffraction grating pattern of the present invention;

[0044] Figure 3It is a schematic structural diagram of the silk-like line segment module in the present invention;

[0045] Figure 4 It is a schematic structural diagram of the silk-like line segment area indication module in the present invention;

[0046] Figure 5 It is a schematic structural diagram of the angle definition illustration module in the present invention;

[0047] Figure 6 It is a schematic structural diagram of the needle lifting and lowering pointer module in the present invention;

[0048] Figure 7 It is a schematic structural diagram of the silk thread angle marking module in the present invention;

[0049] Figure 8 It is a schematic structural diagram of the gray value marking module in the present invention;

[0050] Figure 9 It is a schematic diagram of an embodiment of a method for drawing an embroidered diffraction grating pattern in the present invention;

[0051] Figure 10 It is a schematic diagram of another embodiment of a method for drawing an embroidered diffraction grating pattern in the present invention;

[0052] Figure 11 It is a schematic diagram of an embroidery sample in the present invention;

[0053] Figure 12 It is a schematic diagram of the drawing application in the present invention. Detailed implementation manners

[0054] In the following description, specific details such as specific system structures and technologies are put forward for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present application. However, those skilled in the art should clearly understand that the present application can also be implemented in other embodiments without these specific details. In other cases, the detailed descriptions of well-known systems, devices, circuits, and methods are omitted to avoid unnecessary details from interfering with the description of the present application.

[0055] It should be understood that when used in this specification and the appended claims, the term "comprising" indicates the presence of the described features, wholes, steps, operations, elements, and / or components, but does not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components, and / or groups.

[0056] For the sake of simplicity of the drawings, only the parts related to the present invention are schematically shown in each drawing, and they do not represent the actual structure of the product. Additionally, for the sake of simplicity and easy understanding of the drawings, in some drawings, for components with the same structure or function, only one of them is schematically illustrated, or only one of them is labeled. In this text, "one" not only means "only this one", but also can mean "more than one" situation.

[0057] It should be further understood that the term "and / or" used in the description of the present application and the appended claims refers to any combination and all possible combinations of one or more of the related listed items, and includes these combinations.

[0058] In addition, in the description of the present application, the terms "first", "second", etc. are only used for distinguishing descriptions and cannot be understood as indicating or implying relative importance.

[0059] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the specific implementation manners of the present invention will be described below with reference to the accompanying drawings. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained according to these drawings, and other implementation manners can also be obtained.

[0060] An embodiment of the present invention, as Figure 1-2 shown, a color selection model for an imitation embroidery diffraction grating pattern, comprising:

[0061] An imitation silk thread segment module 100, configured to define imitation silk thread segments.

[0062] An area indication module 200 for the imitation silk thread segments, configured to indicate the area where the imitation silk thread segments are located.

[0063] An angle definition diagram module 300, configured to define the angles of the imitation silk thread segments.

[0064] A silk thread angle marking module 400, configured to indicate the angles of the imitation silk thread segments.

[0065] A needle-lifting and needle-falling indication module 500, configured to indicate the needle-lifting and needle-falling of the imitation silk thread segments.

[0066] A gray value marking module 600, configured to mark the gray values of the imitation silk thread segments.

[0067] Specifically, in this embodiment, the diffraction grating pattern is an image lithographically produced by a laser dot matrix lithography machine through a laser holographic dot matrix lithography technology process.

[0068] The dot matrix lithography control software reads the input grayscale image, converts the pixel grayscale values into grating angle signals according to the protocol, and controls the operation of the lithography machine. The drawing work is a process of converting a design drawing into a grayscale image representing the grating angle through a series of operations using computer-aided drawing software.

[0069] The parallel arrangement of embroidery silk threads is similar to parallel grating lines, and the light and shadow changes produced by the silk texture are similar to the principle of grating diffracted light. Therefore, when making an embroidered diffraction grating image, we replace the silk threads with grating lines, and the tilt angle direction of the grating is parallel to the silk texture direction.

[0070] In this embodiment, as Figure 2 shown in the color selection model of the embroidered diffraction grating painting silk thread, it is composed of a silk-like segment area ( Figure 3 ), a silk-like segment area indicator ( Figure 4 ), an angle definition diagram ( Figure 5 ), a starting and ending needle pointer ( Figure 6 ), a silk thread angle label ( Figure 7 ), a grayscale value label ( Figure 8 ) and seven parts.

[0071] To solve the problems of low efficiency, time-consuming and brain-consuming, based on the above principle, in this embodiment, a color selection model is first created to facilitate the direct value-taking of the drafter and reduce the intensity of mental labor.

[0072] In one embodiment, the angle definition diagram module is further configured to define the angle of the silk-like segment based on the starting and ending needles of the indicated silk-like segment.

[0073] Among them, from top to bottom is defined as 0°, from bottom to top is defined as 180°, from left to right is defined as 90°, and from right to left is defined as -90°

[0074] Specifically, the silk thread angle is defined by the direction from the starting needle to the ending needle of the silk thread: from top to bottom is defined as 0°, from bottom to top is defined as 180°, from left to right is defined as 90°, and from right to left is defined as -90°.

[0075] In one embodiment, the value range of the grayscale value is 0 to 255;

[0076] When the grayscale value is 0, the corresponding angle of the silk-like segment is 0°;

[0077] When the grayscale value is n, the corresponding angle of the silk-like segment is θ = n * 0.703125°, n = 1 to 254;

[0078] When the grayscale value is 255, the corresponding angle of the silk-like segment is 180°.

[0079] Specifically, the gray-scale - grating angle protocol of the lithography machine control software is generally as follows:

[0080] The gray scale L ranges from 0 to 255. It is defined that L:0 (black) corresponds to a grating angle of 0°; 180° is evenly divided into 256 orders, and the average angle subdivision for each gray scale is 0.703125°. Then, for a grating angle θ corresponding to a gray scale L value of n, θ = n * 0.703125° (n = 1 to 254); it is defined that L:255 (white) represents no pixels and no grating.

[0081] In this embodiment, the defined gray scale value L is the assignment of the silk-like grating lines, with a value range from 0 to 255 and an increment of 1.

[0082] Specifically, L:0 corresponds to a silk thread angle of 0°; L:n corresponds to a silk thread angle of θ = n * 0.703125° (n = 1 to 254); L:255 corresponds to a silk thread angle of 180°.

[0083] In one embodiment, as Figure 9 shown, the present invention also provides a method for drawing an embroidered diffraction grating pattern, which is drawn based on the color selection model of the embroidered diffraction grating pattern, including:

[0084] Step S1: Obtain the angle of the silk thread corresponding to the embroidery trace in the sub-drawing area of the embroidered sample.

[0085] Step S2: Based on the angle of the silk thread, select a silk-like line segment that matches the angle of the silk thread in the color selection model, and copy the silk-like line segment to the position of the silk thread corresponding to the embroidery trace.

[0086] Step S3: Adjust the length of the silk-like line segment according to the length of the silk thread corresponding to the embroidery trace to complete the drawing.

[0087] In one embodiment, step S1 of obtaining the angle of the silk thread corresponding to the embroidery trace in the sub-drawing area of the embroidered sample includes:

[0088] Identify the embroidery trace in the sub-drawing area of the embroidered sample and obtain the starting point and ending point of the embroidery trace;

[0089] Based on the starting point and ending point of the embroidery trace, obtain the angle of the silk thread.

[0090] In one embodiment, obtaining the angle of the silk thread based on the starting point and ending point of the embroidery trace includes:

[0091] Connect the starting point and ending point of the embroidery trace to obtain the silk thread;

[0092] Using the mark 0° of the angle definition diagram module in the color selection model as the baseline, measure the angle of the silk thread.

[0093] In one embodiment, before identifying the embroidery traces in the drawing area and obtaining the starting point and ending point of the embroidery traces, the method further includes:

[0094] Selecting the sub-drawing area from the drawing area of the imitation embroidery draft.

[0095] Adjusting the line width of the silk-like line segments in the color selection model based on the line width representing the silk thread diameter.

[0096] In one embodiment, the sub-drawing area includes a plurality of embroidery traces.

[0097] In one embodiment, the adjusting the length of the silk-like line segments according to the length of the silk thread corresponding to the embroidery trace to complete the drawing includes:

[0098] When the drawing of one embroidery trace is completed, the drawing of another embroidery trace is performed according to steps S1 to S3 until the drawing of the sub-drawing area is completed.

[0099] In one embodiment, the drawing area of the imitation embroidery draft includes a plurality of sub-drawing areas;

[0100] When the drawing of one sub-drawing area is completed, another sub-drawing area is copied for drawing until the drawing of the imitation embroidery draft is completed.

[0101] In one embodiment, as Figure 10 shown, first select the imitation embroidery draft, then select an area in the imitation embroidery draft, that is, the sub-drawing area, determine that the line width representing the silk thread diameter is d, and adjust the line width of the color selection model to d as well. Select an embroidery trace in the pattern, such as Figure 11 the embroidery draft shown, connect the starting and ending points of the needle to form a line segment, and measure the angle of the connecting line segment. Pick up the silk-like line segment in the color selection model that is closest to the measured angle of the line segment and copy it to the position of the silk thread corresponding to the selected embroidery trace in the selected pattern. Adjust the length of the silk-like line segment according to the stitch length to complete the drawing of one sub-area.

[0102] The following is an example to illustrate the implementation process of this method.

[0103] In the first step, we select an embroidery draft as described in item 11 below.

[0104] In the second step, select the left area A of the draft to be drawn first, as Figure 12 shown.

[0105] In the third step, determine that the silk thread diameter is 0.2 mm, and adjust the line width of the color selection model ( Figure 3 ) to 0.2 mm as well.

[0106] Step 4: Select an embroidery trace a100 in area A. Determine that its starting point is point a101 and its ending point is point a102. Connect a line segment with points a101 and a102 as endpoints. Taking Figure 4 the angle definition diagram shows that 0° is the baseline, and measure its angle to be 129.71°.

[0107] Step 5: Pick up the silk-like segment f100 (L: 184, θ: 129.375°) that is closest to the measured line segment angle in the color selection model ( Figure 2 ), and copy it to the corresponding silk thread position of the selected embroidery trace a100 in the selected pattern.

[0108] Step 6: Adjust the length of the silk-like segment f100 according to the stitch length of a100.

[0109] Step 7: Select another embroidery trace, such as a200, and repeat Steps 4 to 6 until all the embroidery trace segments in area A are replicated.

[0110] Step 8: Repeat Step 2 to select and draw the right B area of the sample draft, and then repeat Steps 4 to 7.

[0111] Step 9: Until all the sample drafts are replicated and the drawing work is completed.

[0112] The present invention uses a diffraction grating pattern with a strong modern sense of technology to interpret the visual effect of traditional embroidery, which is an unprecedented secondary artistic creation. To make this form of expression reproducible and popularizable, a novel drawing method has been summarized.

[0113] The present invention, in order to improve the efficiency of the drawing work, creatively models and toolizes the work of determining grayscale and coloring in the complex diffraction grating drawing process, creates a color selection model, and greatly reduces the mental labor intensity of the drawing workers with an intuitive form of expression and a simple picking action.

[0114] Those skilled in the art can clearly understand that, for the convenience and simplicity of description, only the above division of each program module is used as an example. In actual applications, the above functions can be allocated to different program modules according to needs, that is, the internal structure of the device is divided into different program units or modules to complete all or part of the functions described above. Each program module in the embodiment can be integrated into a processing unit, or each unit can exist physically alone, or two or more units can be integrated into a processing unit. The above integrated units can be implemented in the form of hardware or in the form of software program units. In addition, the specific names of each program module are only for the convenience of mutual distinction and do not limit the protection scope of the present application.

[0115] It should be noted that the above embodiments can be freely combined as needed. The above are only the preferred embodiments of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and refinements can be made, and these improvements and refinements should also be regarded as the protection scope of the present invention.

Claims

1. A method for making a pattern of an embroidery-like diffraction grating, characterized in that: The color selection model of the embroidery-like diffraction grating pattern is used for mapping, and the color selection model of the embroidery-like diffraction grating pattern includes: The silk-like segment module is used to define the silk-like segment; An area indication module for the imitation silk thread segment, used for indicating the area where the imitation silk thread segment is located; An angle definition diagram module, used to define the angle of the imitation silk segment; A silk thread angle marking module, used to indicate the angle of the imitation silk thread segment; A needle rise and fall indication module, used for indicating the needle rise and fall of the imitation silk thread segment; A grayscale value marking module, used for marking the grayscale value of the imitation silk thread segment; The method for making the imitation embroidery diffraction grating pattern comprises: Step S1: obtaining the angle of the silk thread corresponding to the embroidery trace of the sub-drawing area of the imitation embroidery sample; Step S2: based on the angle of the silk thread, selecting a silk-like thread segment that matches the angle of the silk thread in the color selection model, and copying the silk-like thread segment to the position of the silk thread corresponding to the embroidery mark; Step S3 adjusts the length of the imitation silk thread segment according to the length of the silk thread corresponding to the embroidery mark to complete the drawing.

2. The method for making an embroidery-like diffraction grating pattern according to claim 1, wherein: The angle definition diagram module is further used to define the angle of the imitation silk thread segment based on the indicated rise and fall stitches of the imitation silk thread segment; Among them, 0° is defined from top to bottom, 180° is defined from bottom to top, 90° is defined from left to right, and -90° is defined from right to left.

3. The method for making an embroidery-like diffraction grating pattern according to any one of claims 1 to 2, characterized in that: The grayscale value ranges from 0 to 255; When the grayscale value is 0, the angle of the corresponding imitation silk segment is 0°; When the gray value is n, the angle of the corresponding silk-like line segment is θ=n*0.703125°, where n=1~254; When the grayscale value is 255, the angle of the corresponding silk-like thread segment is 180°.

4. The mapping method of the imitation embroidery diffraction grating pattern according to claim 1, characterized in that, The step of obtaining the angle of the silk thread corresponding to the embroidery trace of the sub-drawing area of the imitation embroidery sample includes: Identifying embroidery traces in a sub-drawing area of an imitation embroidery sample and obtaining a needle starting point and a needle ending point of the embroidery traces; The angle of the silk thread is obtained according to the needle starting point and the needle ending point of the embroidery.

5. The method for drawing an embroidered diffraction grating pattern according to claim 4, characterized in that The method of obtaining the angle of the silk thread according to the needle starting point and the needle ending point of the embroidery trace comprises: Connecting the starting point and the ending point of the embroidery to obtain the silk thread; The angle of the thread is measured using the 0° indicated in the angle definition diagram module in the color selection model as a baseline.

6. The mapping method of the embroidered diffraction grating pattern according to claim 4, characterized in that, Before identifying the embroidery traces in the drawing area and obtaining the needle starting point and the needle ending point of the embroidery traces, the method further includes: From the drawing area of the imitation embroidery sample, select the sub-drawing area; Based on the line width representing the diameter of the silk thread, the line width of the silk-like thread segment in the color selection model is adjusted.

7. The method for making a simulated embroidery diffraction grating pattern according to claim 1, wherein: The sub-drawing area includes a plurality of embroidery traces.

8. The mapping method of the embroidered diffraction grating pattern according to claim 7, characterized in that The step of adjusting the length of the imitation silk thread segment according to the length of the silk thread corresponding to the embroidery mark to complete the drawing comprises: When the drawing of one embroidery stitch is completed, another embroidery stitch is drawn according to steps S1 to S3 until the drawing of the sub-drawing area is completed.

9. The cartography method of the embroidered diffraction grating pattern according to claim 8, wherein the drawing area of the embroidered draft includes a plurality of sub-drawing areas; when the drawing of one sub-drawing area is completed, another sub-drawing area is copied for drawing until the drawing of the embroidered draft is completed.

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