An off-axis ion guiding device

Abstract

The present invention relates to an ion flow off-axis guiding device, comprising: a mounting bracket, a first attracting pole, a second attracting pole, a first repeller plate, and a second repeller plate, wherein the first attracting pole, the second attracting pole, the first repeller plate, and the second repeller plate are fixed on the mounting bracket, the first repeller plate is parallel to the second repeller plate, the first attracting pole and the second attracting pole have a height difference, and the first attracting pole and the second attracting pole are placed between the first repeller plate and the second repeller plate. The present invention is simpler in structure than the prior art, and is very convenient to disassemble and clean; it can achieve a certain bunching effect, and ions can enter the subsequent ion optical system more efficiently, thereby improving the sensitivity of the instrument.

Description

Technical Field

[0001] The present invention relates to the technical field of ion optical systems, and particularly relates to an off-axis ion guiding device. Background Art

[0002] A mass spectrometer is a scientific instrument for analyzing the components of chemical substances. Its working method is to ionize the molecules of the substance to be measured by certain means, and then screen and measure the ions through an ion optical system. Currently, when various ionization means (such as electron impact ionization source, inductively coupled plasma ionization source, etc.) ionize the molecules of the substance to be measured, a large number of electrons, photons, neutral particles, etc. will inevitably be generated at the same time. Photons and neutral particles move in a straight line in the ion optical system. In a linear ion optical system, photons and neutral particles will be mixed with the ions and reach the detector, generating a large number of noise signals. By adding an off-axis device to the ion optical system, the transmission path of the ions in the ion optical system is offset, while photons and neutral particles are not affected by the off-axis device and still propagate in a straight line, so that the ions are separated from the photons and neutral particles, reducing the signal noise of the instrument.

[0003] Currently, the existing ion off-axis technologies generally have the following problems: 1. The structure of the ion off-axis device is complex and difficult to clean; 2. The ion off-axis device has no ion focusing effect, making the ions more dispersed in the subsequent ion optical system. Summary of the Invention

[0004] In order to achieve the above objects and other advantages of the present invention, the object of the present invention is to provide an off-axis ion guiding device, including: a mounting bracket, a first attracting pole rod, a second attracting pole rod, a first repelling plate electrode, and a second repelling plate electrode. The first attracting pole rod, the second attracting pole rod, the first repelling plate electrode, and the second repelling plate electrode are fixed on the mounting bracket. The first repelling plate electrode is parallel to the second repelling plate electrode, and there is a height difference between the first attracting pole rod and the second attracting pole rod. The first attracting pole rod and the second attracting pole rod are placed between the first repelling plate electrode and the second repelling plate electrode.

[0005] Further, the mounting bracket is an insulating bracket.

[0006] Further, both the first attracting pole rod and the second attracting pole rod are metal pole rods.

[0007] Further, both the first repelling plate electrode and the second repelling plate electrode are metal plate electrodes.

[0008] Further, both the first attracting pole rod and the second attracting pole rod are cylindrical metal pole rods.

[0009] Further, both the first repulsive electrode plate and the second repulsive electrode plate are metal electrode plates with a bending angle.

[0010] Further, the bending angles of both the first repulsive electrode plate and the second repulsive electrode plate are 90° to 120°.

[0011] Further, the ion flow at the entrance is parallel to the ion flow at the exit.

[0012] Further, both the first repulsive electrode plate and the second repulsive electrode plate form a 45° angle with the ion flow at the exit.

[0013] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0014] The present invention provides an off-axis ion guiding device, which has a simpler structure than the prior art and is very convenient for disassembly, assembly and cleaning; it can achieve a certain beam focusing effect, and ions can enter the subsequent ion optical system more efficiently, thereby improving the sensitivity of the instrument.

[0015] The above description is only an overview of the technical solution of the present invention. In order to understand the technical means of the present invention more clearly and implement it according to the content of the specification, the following describes the preferred embodiments of the present invention in detail with reference to the accompanying drawings. The specific embodiments of the present invention are given in detail by the following embodiments and their accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The accompanying drawings described herein are used to provide a further understanding of the present invention, and constitute a part of this application. The schematic embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation to the present invention. In the drawings:

[0017] Figure 1 is a schematic diagram of the ion flow inlet and outlet;

[0018] Figure 2 is a partial structure schematic diagram of an off-axis ion guiding device;

[0019] Figure 3 is a schematic diagram of the structure of an off-axis ion guiding device;

[0020] Figure 4 is a schematic diagram of the equipotential lines of the electric field;

[0021] Figure 5 is a schematic diagram of the shape of the electric field;

[0022] Figure 6 is a schematic diagram of the ion flow Figure 1 ;

[0023] Figure 7 is a schematic diagram of the ion flow Figure 2 ;

[0024] Figure 8 Schematic diagram of the bunching effect Figure 1 ;

[0025] Figure 9 Schematic diagram of the bunching effect Figure 2 。

[0026] In the figure: 1. Mounting bracket; 2. First attracting pole rod; 3. Second attracting pole rod; 4. First repelling plate; 5. Second repelling plate; 6. Ion flow inlet; 7. Ion flow outlet. Specific implementation mode

[0027] Next, in combination with the accompanying drawings and specific implementation modes, the present invention will be further described. It should be noted that, on the premise of no conflict, the following-described embodiments or technical features can be combined arbitrarily to form new embodiments.

[0028] In subsequent descriptions, suffixes such as "module", "component" or "unit" used to represent elements are only for the convenience of describing the present invention, and they have no specific meaning by themselves. Therefore, "module", "component" or "unit" can be used interchangeably.

[0029] Embodiment 1

[0030] An off-axis ion guiding device, as Figures 1 - 3 shown, includes: a mounting bracket 1, a first attracting pole rod 2, a second attracting pole rod 3, a first repelling plate 4, and a second repelling plate 5. The first attracting pole rod 2, the second attracting pole rod 3, the first repelling plate 4, and the second repelling plate 5 are fixed on the mounting bracket 1, such as fixing the first attracting pole rod 2, the second attracting pole rod 3, the first repelling plate 4, and the second repelling plate 5 to the mounting bracket 1 with screws. The first repelling plate 4 is parallel to the second repelling plate 5. As Figure 1 shown, the ion flow at the inlet is parallel to the ion flow at the outlet, and both the ion flow at the inlet and the ion flow at the outlet form a certain angle with the first repelling plate 4 and the second repelling plate 5. In this embodiment, both the ion flow at the inlet and the ion flow at the outlet form a 45° angle with the first repelling plate 4 and the second repelling plate 5. The first attracting pole rod 2 and the second attracting pole rod 3 have a height difference, and the first attracting pole rod 2 and the second attracting pole rod 3 are placed between the first repelling plate 4 and the second repelling plate 5. In this embodiment, the height of the ion flow outlet 7 is higher than the height of the ion flow inlet 6, the height of the second attracting pole rod 3 is higher than the height of the first attracting pole rod 2, the first attracting pole rod 2 is close to the ion flow inlet 6, and the second attracting pole rod 3 is close to the ion flow outlet 7. Different voltages are applied to the attracting pole rod and the repelling plate to guide the deflection of the ion flow.

[0031] The mounting bracket 1 is an insulating bracket. The first attracting pole rod 2 and the second attracting pole rod 3 are both metal pole rods. In this embodiment, both the first attracting pole rod 2 and the second attracting pole rod 3 are cylindrical metal pole rods. The first repelling plate 4 and the second repelling plate 5 are both metal plates. In this embodiment, both the first repelling plate 4 and the second repelling plate 5 are metal plates with a bending angle. Preferably, the bending angles of the first repelling plate 4 and the second repelling plate 5 are both 90° to 120°. Under the action of the repelling electric field force on both wings of the metal plate, the ions move towards the axis of the ion beam, thus achieving the effect of beam bunching, as Figure 8 , Figure 9 shown. The smaller the angle between the two wings of the repelling plate, the more obvious the beam bunching effect, so that the ions can enter the subsequent ion optical system more efficiently.

[0032] A method of using an ion off-axis guiding device is as follows: In the simulation, apply a voltage of -90V to the first attracting pole rod 2 and the second attracting pole rod 3, and apply a voltage of -450V to the first repelling plate 4 and the second repelling plate 5. It should be understood that the voltages applied to the attracting pole rod and the repelling plate are not limited to the above voltage values. As Figure 4 , Figure 5 shown, under the influence of the attracting pole rod and the repelling plate, an electric field similar to a saddle surface will be generated in the ion off-axis deflection region. Under the influence of this electric field, the ions enter from the ion flow inlet 6, undergo off-axis deflection, and fly out from the ion flow outlet 7, thus achieving the effect of off-axis deflection, and the moving direction of the ions when entering is parallel to the moving direction when leaving, as Figure 6 , Figure 7 shown.

[0033] The above is only for the embodiments of this specification and is not used to limit one or more embodiments of this specification. For those skilled in the art, one or more embodiments of this specification can have various changes and modifications. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of one or more embodiments of this specification shall be included within the scope of the claims of one or more embodiments of this specification. One or more embodiments of this specification, one or more embodiments of this specification, one or more embodiments of this specification, one or more embodiments of this specification.

Claims

1. An off-axis ion guiding device, characterized in that, comprising: a mounting bracket, a first attracting pole rod, a second attracting pole rod, a first repelling plate, and a second repelling plate. The first attracting pole rod, the second attracting pole rod, the first repelling plate, and the second repelling plate are fixed on the mounting bracket. The first repelling plate is parallel to the second repelling plate. There is a height difference between the first attracting pole rod and the second attracting pole rod. The first attracting pole rod and the second attracting pole rod are placed between the first repelling plate and the second repelling plate; Under the influence of the first attracting pole rod, the second attracting pole rod, the first repelling plate, and the second repelling plate, an electric field similar to a saddle surface will be generated in the off-axis ion deflection region. Under the influence of this electric field, ions enter from the ion flow inlet, undergo off-axis deflection, and fly out from the ion flow outlet, thereby achieving the effect of off-axis deflection. Moreover, the moving direction of the ions when entering is parallel to the moving direction when leaving.

2. The off-axis ion guiding device according to claim 1, characterized in that: The mounting bracket is an insulating bracket.

3. The off-axis ion guiding device according to claim 1, characterized in that: Both the first attracting pole rod and the second attracting pole rod are metal pole rods.

4. The off-axis ion guiding device according to claim 1, characterized in that: Both the first repelling plate and the second repelling plate are metal plates.

5. The off-axis ion guiding device according to claim 3, characterized in that: Both the first attracting pole rod and the second attracting pole rod are cylindrical metal pole rods.

6. The off-axis ion guiding device according to claim 4, characterized in that: Both the first repelling plate and the second repelling plate are metal plates with a bending angle.

7. The off-axis ion guiding device according to claim 6, characterized in that: The bending angles of both the first repelling plate and the second repelling plate are 90° - 120°.

8. The off-axis ion guiding device according to claim 1, characterized in that: The ion flow at the inlet is parallel to the ion flow at the outlet.

9. The off-axis ion guiding device according to claim 8, characterized in that: Both the first repelling plate and the second repelling plate are at a 45° angle to the ion flow at the outlet.

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