Holding member, irradiation device, and plasma device

Abstract

The irradiation device includes a first electrode to which a voltage is applied to generate plasma, and a holding member that holds the first electrode, the holding member having a first member and a second member in contact with each other to form a receiving space that receives the first electrode, a contact surface of the first member and the second member including a non-perpendicular contact surface that is not perpendicular to an axis of the first electrode.

Description

Technical Field

[0001] The present invention relates to a holding component, an irradiation tool, and a plasma device. Background Art

[0002] A technology for utilizing plasma for purposes such as dental treatment has been proposed (see JP2017-35281A). The plasma irradiation device handpiece disclosed in JP2017-35281A sterilizes the affected area by irradiating plasma from the front end. The plasma irradiation device handpiece of JP2017-35281A comprises: a second electrode (33) electrically connected to an electrical connector (40), an insulating tube (36) electrically insulatingly covering the electrode, and a housing for accommodating the electrodes and the insulating tube. The insulating tube (36) is formed into a cylindrical shape so as to cover the root side of the second electrode (33), one end of which is mounted on the electrical connector (40), and the other end of which is mounted with a glass support component (38) and other components. Summary of the Invention

[0003] Technical problems to be solved by the present invention

[0004] When one end of an insulating tube is attached to the electrode and other components are attached to the other end of the insulating tube to assemble the assembly, there is room for improvement in assembly efficiency. However, to improve the assembly efficiency of the plasma irradiation equipment, it is considered preferable to have a split structure for the holding member that holds the electrode. However, as described later, when using a split structure for the holding member to improve assembly efficiency, there is a risk of short circuiting between the electrode and objects outside the holding member.

[0005] An object of the present invention is to provide a holding member, an electrode holding body, an irradiation tool, and a plasma device that can effectively solve such technical problems.

[0006] The technical solution adopted to solve this technical problem

[0007] The irradiation device according to the present invention comprises: a first electrode, which applies voltage to generate plasma; a holding component, which holds the first electrode, the holding component having a first component and a second component, the first component being in contact with the second component to form a storage space for storing the first electrode, and the contact surface between the first component and the second component includes a non-vertical contact surface that is not perpendicular to the axis of the first electrode.

[0008] In the irradiation device according to the present invention, any perpendicular line passing through the non-perpendicular contact surface and perpendicular to the axis may be non-parallel to the non-perpendicular contact surface.

[0009] In the irradiation device according to the present application, the non-perpendicular contact surface can form an angle of greater than 45° with respect to a diameter direction perpendicular to the axis.

[0010] In the irradiation device according to the present application, the non-perpendicular contact surface can surround the first electrode from the periphery with the axis as the center.

[0011] In the irradiation device according to the present application, the non-perpendicular contact surface can include a first non-perpendicular contact surface and a second non-perpendicular contact surface separated from the first non-perpendicular contact surface in a diameter direction perpendicular to the axis.

[0012] In the irradiation device according to the present application, the first electrode has a terminal portion connected to an external power source, and the non-perpendicular contact surface can be located outside the terminal portion in a diameter direction perpendicular to the axis.

[0013] In the irradiation device according to the present application, the contact surface includes a perpendicular contact surface perpendicular to the axis, and the perpendicular contact surface can be located in a region different from a region where the terminal portion is located in an extension direction of the axis.

[0014] In the irradiation device according to the present application, the first electrode has a flared portion having a maximum protruding length toward the outside in a diameter direction perpendicular to the axis, and the non-perpendicular contact surface can be located outside the flared portion in the diameter direction.

[0015] In the irradiation device according to the present application, the contact surface includes a perpendicular contact surface perpendicular to the axis, and the perpendicular contact surface can be located in a region different from a region where the flared portion is located in an extension direction of the axis.

[0016] In the irradiation device according to the present application, a second electrode is attached to the holding member in opposition to a portion of the first electrode, and the non-perpendicular contact surface can be located in a region different from a region where the second electrode is located in an extension direction of the axis.

[0017] The irradiation device according to the present application includes an outer cylinder member that is electrically grounded and houses the entire first electrode, and the non-perpendicular contact surface can be located between the first electrode and the outer cylinder member.

[0018] The plasma device according to the present application includes the irradiation device described above.

[0019] The holding member according to the present application is a holding member that holds a first electrode to which a voltage is applied in order to generate plasma, and has a first member and a second member that are in contact with each other to form a housing space that houses the first electrode, and a contact surface between the first member and the second member is a non-perpendicular contact surface that is not perpendicular to an axis of the first electrode.

[0020] Technical effects of the present application

[0021] The holding member, the irradiation device, and the plasma device according to the present application can suppress short-circuiting between an electrode and an object outside the holding member while improving assembly. BRIEF DESCRIPTION OF DRAWINGS

[0022] [ Figure 1 ] is a schematic view of a plasma device according to an embodiment of the present application.

[0023] [ Figure 2 ] is a block diagram of a schematic configuration of a plasma device according to an embodiment of the present application.

[0024] [ Figure 3 ] is a cross-sectional view of an irradiation device according to an embodiment of the present application.

[0025] [ Figure 4 ] Figure 3 is a cross-sectional view of the irradiation device along line IV-IV.

[0026] [ Figure 5 ] Figure 3 is a cross-sectional view of the irradiation device along line V-V.

[0027] [ Figure 6 ] is a partial cross-sectional view of an irradiation device according to an embodiment of the present application.

[0028] [ Figure 7 ] is a perspective view of a first member and a second member of a holding member according to an embodiment of the present application.

[0029] [ Figure 8 ] is a partial cross-sectional view of an irradiation device according to a reference example.

[0030] [ Figure 9 ] is a cross-sectional view of an irradiation device according to a first modification example.

[0031] [ Figure 10 ] is a cross-sectional view of an irradiation device according to a second modification example.

[0032] [ Figure 11 ] is a perspective view of a first member and a second member of a holding member according to a third modification example.

[0033] [ Figure 12 ] A sectional view of the irradiation device according to a third modification. DETAILED DESCRIPTION

[0034] Hereinafter, one embodiment of the present application will be described with reference to the drawings. Note that in the drawings attached to this specification, the ratio of scales of actual objects and the ratio of dimensions in the vertical and horizontal directions are changed or exaggerated as appropriate for easy understanding.

[0035] Hereinafter, one embodiment of the present disclosure will be described with reference to the drawings. Note that in the drawings attached to this specification, the ratio of scales of actual objects and the ratio of dimensions in the vertical and horizontal directions are changed or exaggerated as appropriate for easy understanding.

[0036] Further, as for terms, such as "parallel", "perpendicular", "identical", and the like, which are used in this specification to specify shapes, geometrical conditions, and their degrees, values of lengths, angles, and the like, they are not bound by strict meanings, and should be interpreted as including a range in which the same function can be expected.

[0037] The plasma device of the present application is a plasma jet irradiation device or an active gas irradiation device. Both the plasma jet irradiation device and the active gas irradiation device generate plasma. The plasma jet irradiation device directly irradiates the generated plasma and active species onto an irradiated object. The active species are generated by reaction of a gas in the plasma or a gas in the vicinity of the plasma with the plasma. The active species are, for example, active oxygen species, active nitrogen species, and the like. The active oxygen species are, for example, hydroxyl radicals, singlet oxygen, ozone, hydrogen peroxide, superoxide anion radicals, and the like. The active nitrogen species are, for example, nitric oxide, nitrogen dioxide, peroxynitrite, peroxynitrite acid, dinitrogen trioxide, and the like. The active gas irradiation device irradiates an active gas containing active species onto an irradiated object. The active species are generated by reaction of a gas in the plasma or a gas in the vicinity of the plasma with the plasma.

[0038] Hereinafter, one embodiment of a plasma device, an irradiation device, and a holding member will be described. The plasma device of the present embodiment is, for example, an active gas irradiation device. As shown in FIG. 1, the active gas irradiation device 100 of the present embodiment includes an irradiation device 10, a supply unit 20, a gas line 30, a voltage supply line 40, a supply source 70, a notification unit 80, and a control unit 90 (calculation unit). Figure 1 and Figure 2 As shown in FIG. 1, the active gas irradiation device 100 of the present embodiment includes an irradiation device 10, a supply unit 20, a gas line 30, a voltage supply line 40, a supply source 70, a notification unit 80, and a control unit 90 (calculation unit).

[0039] The irradiation tool 10 emits the active gas generated in the irradiation tool 10. The irradiation tool 10 is operated by a doctor or the like, and has a shape, size, and weight that are easy for a human hand to operate. The irradiation tool 10 is connected to the supply unit 20 by the gas line 30, the grounding line 31, and the voltage supply line 40. In Figure 1 In the example shown, the irradiation tool 10 is provided with the outer cylinder member 8 described later and a nozzle 9 constituting the front end of the irradiation tool 10. The nozzle 9 is attached to the front end of the holding member 1 described later. The nozzle 9 has a flow path of the active gas inside. The flow path of the active gas inside the nozzle 9 communicates with the flow path of the plasma generation gas inside the holding member 1 described later. In the case where the irradiation tool 10 has the nozzle 9, the active gas is emitted from the nozzle emission port 9a located at the front end of the nozzle 9 through the emission port 1c1 of the third member 1c in the holding member 1 described later and the flow path inside the nozzle 9. The gas line 30 and the voltage supply line 40 are housed in one cable 32. The supply unit 20 supplies electric power and the plasma generation gas to the irradiation tool 10. The supply unit 20 houses a supply source 70. The supply source 70 houses the plasma generation gas. The supply unit 20 receives a power supply from a power source such as a 100 V household power source, for example. In addition, the supply unit 20 can also have a chargeable battery incorporated inside as a power source.

[0040] Figure 3 is a cross-sectional (longitudinal cross-sectional) view of a face in the irradiation tool 10 along the extension direction of the irradiation tool 10. Figure 4 is a cross-sectional view of the irradiation tool 10 of Figure 3 along the IV-IV line. Figure 5 is a cross-sectional view of the irradiation tool 10 of Figure 3 along the V-V line. Note that, Figures 3-5 in which the illustration of the outer cylinder member 8 and the nozzle 9 is omitted. As Figure 3 shown, the irradiation tool 10 is provided with an electrode holding body 7. As Figures 3-5 shown, the electrode holding body 7 is provided with the first electrode 4 and the holding member 1 that holds the first electrode 4. In Figure 3 the example shown, the electrode holding body 7 is further provided with the second electrode 5, the tubular dielectric 3, and the O-rings 6a, 6b, and 6c.

[0041] In addition, as described above, the irradiation tool 10 can be provided with the electrically grounded outer cylinder member 8 on the basis of the electrode holding body 7. Figure 6 is a cross-sectional view of the irradiation tool 10 of Figure 3 shown, further provided with the outer cylinder member 8 on the basis of the electrode holding body 7. Figure 3The figure of the range surrounded by the two-point line of the symbol VI. As an example, the outer cylinder member 8 has a nearly cylindrical shape, internally houses the entirety of the first electrode 4, and is an electrically conductive member. The outer cylinder member 8 can house the entirety of the electrode holding body 7. In Figure 6 In the example shown, the outer cylinder member 8 internally houses the electrode holding body 7. The irradiation appliance 10, by having the outer cylinder member 8, can suppress the electric field emitted by the irradiation appliance 10, effectively preventing electric shock of the user using the irradiation appliance 10.

[0042] The first electrode 4 is an electrode to which a voltage is applied in order to generate plasma. In Figure 3 and Figure 4 In the example shown, the first electrode 4 has a terminal portion 4a that connects to an external power source via the voltage supply line 40, and a voltage is applied by the external power source. As an example, in the case where the voltage supply line 40 is soldered to the first electrode 4, the terminal portion 4a is a portion of the solder.

[0043] As shown in Figure 3 The first electrode 4 has an axis O1. Note that the axis O1 of the first electrode 4 refers to, for example, a notional line segment that extends in the extension direction d1 of the first electrode 4, and that is positioned in the direction d1 in the range in which the first electrode 4 is present. Hereinafter, the extension direction d1 of the axis O1 will also be referred to as the axis direction d1.

[0044] Further, the first electrode 4 has a flared portion 4b that has the greatest protrusion length to the outside in the radial direction d2 that is perpendicular to the axis O1. In Figure 3 In the example shown, the first electrode 4 has the flared portion 4b and a thin portion 4c that has a smaller protrusion length to the outside in the radial direction d2 than the flared portion 4b. Also, a portion of the flared portion 4b is connected to an external power source, and becomes the terminal portion 4a. In Figures 3-5 In the example shown, the flared portion 4b and the thin portion 4c each have a nearly cylindrical shape that extends in the axis direction d1.

[0045] The outer diameter d of the portion of the first electrode 4 that opposes the second electrode 5 described later can be appropriately decided in consideration of the purpose of the active gas irradiation device 100 (i.e., the size of the irradiation appliance 10), and the like. In the case where the active gas irradiation device 100 is an intraoral treatment appliance, the outer diameter d is preferably 0.5 mm to 20 mm, and more preferably 1 mm to 10 mm. If the outer diameter d is equal to or greater than the lower limit value described above, the first electrode 4 can be easily manufactured. Also, if the outer diameter d is equal to or greater than the lower limit value described above, the surface area of the first electrode 4 becomes large, plasma can be generated more efficiently, and healing and the like can be further promoted. If the outer diameter d is equal to or less than the upper limit value described above, the irradiation appliance 10 does not become excessively large, plasma can be generated more efficiently, and healing and the like can be further promoted.

[0046] The material of the first electrode 4 is not particularly limited as long as it is a conductive material, and any metal that can be used in electrodes of a plasma device can be used. Examples of the material of the first electrode 4 include metals such as stainless steel, copper, and tungsten; and carbon.

[0047] The voltage applied to the first electrode 4 is not particularly limited as long as plasma is generated between the first electrode 4 and the second electrode 5. When a gas primarily composed of nitrogen, as described later, is used as the plasma generating gas to generate plasma, the voltage applied to the first electrode 4 is, for example, 0.5 kVpp to 20 kVpp. The voltage applied to the first electrode 4 is more preferably 2 kVpp to 18 kVpp, and even more preferably 5 kVpp to 15 kVpp. It should be noted that the "pp" in "kVpp" is an abbreviation for peak to peak.

[0048] The second electrode 5 is an electrode facing a portion of the first electrode 4. Figure 3 as well as Figure 5 In the example shown, the second electrode 5 is a cylindrical electrode surrounding a portion of the first electrode 4. Figure 3 as well as Figure 5 In the example shown, the second electrode 5 faces a portion of the narrow portion 4c of the first electrode 4 in the radial direction d2. In this embodiment, the second electrode 5 is electrically grounded. Figure 3 In the example shown, the second electrode 5 is electrically grounded by being connected to a ground line 31. By supplying a plasma generating gas between the first electrode 4 and the second electrode 5 and applying a voltage to the first electrode 4 facing the second electrode 5, the plasma generating gas can be ionized to generate plasma.

[0049] The following describes the effect of having the second electrode 5 partially facing the first electrode 4. Consider the following scenario: the length of the second electrode 5 in the axial direction d1 is greater than the length of the first electrode 4 in the axial direction d1, and the second electrode 5 faces the entire first electrode 4 in the axial direction d1. In this case, the area of ​​the first electrode 4 and the second electrode 5 facing each other becomes larger. Furthermore, the temperature of the generated plasma increases with the larger the area of ​​the electrodes used. Therefore, when the second electrode 5 faces the entire first electrode 4, the generated plasma becomes even hotter.

[0050] On the other hand, by facing the second electrode 5 with a part of the first electrode 4, it is possible to suppress the generated plasma from becoming high temperature. Therefore, it is possible to generate, for example, a more low-temperature plasma suitable for irradiation to the teeth, skin, and the like of a person, an animal, and the like. In particular, even in the case where a higher voltage is applied to the electrodes, it is possible to suppress the high-temperature of the generated plasma. Therefore, it can be considered that the configuration in which the second electrode 5 faces a part of the first electrode 4 is particularly suitable for the case where a high voltage is applied to the electrodes.

[0051] Note that, in the example shown in FIG. 1, the front end portion 4d of the first electrode 4 protrudes more to the front end side (left side in FIG. 1) of the irradiation device 10 than the front end portion 5a of the second electrode 5. By this, it is possible to stably generate plasma in the entire length of the second electrode 5 in the axis direction d1. Figure 3 Figure 3

[0052] The material of the second electrode 5 is not particularly limited as long as it is an electrically conductive material, and a known metal for an electrode of a plasma device can be used. As the material of the second electrode 5, a metal such as stainless steel, copper, tungsten, or the like; carbon, or the like can be given.

[0053] The tubular dielectric 3 is a member having an inner hollow portion 3a. In the example shown in FIG. 1, the tubular dielectric 3 is a cylindrical member extending in the axis direction d1. As shown in FIG. 1, the first electrode 4 is disposed in the inner hollow portion 3a of the tubular dielectric 3. Figure 3 Figure 5 Figure 3 Figure 5 As shown in FIG. 1, the first electrode 4 is disposed in the inner hollow portion 3a of the tubular dielectric 3. In the example shown in FIG. 1, in the inner hollow portion 3a, a part of the fine portion 4c of the first electrode 4 is disposed. Figure 3 Figure 5

[0054] In the example shown in FIG. 1, the first electrode 4 is disposed separately from the inner surface of the tubular dielectric 3. Further, the second electrode 5 is disposed so as to be in contact with the outer surface of the tubular dielectric 3. Figure 3 Figure 5 As the material of the tubular dielectric 3, a known dielectric material for a plasma device can be used. The material of the tubular dielectric 3 is, for example, glass, ceramic, synthetic resin, or the like. The lower the dielectric constant of the tubular dielectric 3, the more preferable it is.

[0055] The inner diameter R of the tubular dielectric 3 can be appropriately decided in consideration of the outer diameter d of the part of the first electrode 4 facing the second electrode 5 described later. The inner diameter R can be decided so that the distance s described later is in a desired range.

[0056] The inner diameter R of the tubular dielectric 3 can be appropriately decided in consideration of the outer diameter d of the part of the first electrode 4 facing the second electrode 5 described later. The inner diameter R can be decided so that the distance s described later is in a desired range.

[0057] ​​​​​​​​In the case where the first electrode 4 is disposed separately from the tubular dielectric 3, the distance s between the outer surface of the first electrode 4 and the inner surface of the tubular dielectric 3 is preferably 0.05 mm to 5 mm, more preferably 0.1 mm to 1 mm. If the distance s is equal to or greater than the lower limit value, in the case where the inner space 3a of the tubular dielectric 3 is used as a flow path of the plasma generation gas as described later, the plasma generation gas can flow easily. If the distance s is equal to or smaller than the upper limit value, the plasma can be generated more efficiently, and the temperature of the active gas can be reduced.

[0058] The holding member 1 is a member that holds the electrode. As one example, the holding member 1 electrically insulates the first electrode 4. Further, as one example, as shown in FIG. 1, the holding member 1 holds the first electrode 4 in contact with the first electrode 4. Further, as one example, the holding member 1 holds the first electrode 4 directly opposite to the first electrode 4. In other words, a region in which no other member is disposed is formed at least partially between the holding member 1 and the first electrode 4. As shown in FIG. 1, the holding member 1 has a first member la and a second member lb. The first member la and the second member lb form a receiving space Id in which at least a part of the first electrode 4 is received by being in contact with each other. In the example shown in FIG. 1, the enlarged diameter portion 4b of the first electrode 4 is received in the receiving space Id. Figure 3 Figure 3 Figure 3

[0059] Figure 7 is a perspective view of the first member la and the second member lb. Note that in Figure 7 , the illustration of a screw hole used when the first member la and the second member lb are fixed to each other is omitted. In the examples shown in Figure 3 and Figure 7 , the first member la and the second member lb are both near-cylindrical members extending in the axis direction dl. In the examples shown in Figure 3 and Figure 7 , the second member lb has a shape in which at least a part can be inserted into the first member la. Specifically, the second member lb has an outer diameter that is smaller than the inner diameter of the first member la at least in a part. And, by inserting a part of the second member lb into the first member la, the first member la and the second member lb are brought into contact with each other, and the receiving space Id is formed. Although not illustrated, it is also possible that by inserting at least a part of the first member la into the second member lb, the first member la and the second member lb are brought into contact with each other, and the receiving space Id is formed.

[0060] Further, in Figure 4 ​​​In the example shown, the second member 1b is provided with screw holes 1b1 for inserting screws. Furthermore, although not shown, the first member 1a is also provided with screw holes. The first member 1a and the second member 1b are fixed to each other in a contacting state by screws (not shown) inserted into the screw holes of the first member 1a and the second member 1b.

[0061] exist Figure 3 In the example shown, the first member 1a is formed from one side along the axis O1 ( Figure 3 The second member 1b contacts the first electrode 4 and restricts the movement of the first electrode 4 to one side along the axis O1. Figure 3 The left side of the axis O1 contacts the first electrode 4, limiting the movement of the first electrode 4 to the other side along the axis O1. Figure 3 In the example shown, the second member 1b contacts the expanded diameter portion 4b of the first electrode 4 from the other side along the axis O1 via an O-ring 6a. The O-ring 6a, made of an elastic resin, is sandwiched between the expanded diameter portion 4b and the second member 1b, closely fitting the expanded diameter portion 4b and the second member 1b. This maintains the first electrode 4 in a state where its movement in the axial direction d1 is restricted.

[0062] The second electrode 5 and the tubular dielectric 3 are mounted in the holding member 1. Figure 3 In the example shown, the holding member 1 further includes a third member 1c. Furthermore, the holding member 1 further holds the second electrode 5 and the tubular dielectric 3 via the second member 1b and the third member 1c. Figure 3 In the example shown, the third member 1c is a substantially cylindrical member extending in the axial direction d1. Figure 3 In the example shown, the second member 1b is shaped so that at least a portion thereof can be inserted into the third member 1c. Specifically, at least a portion of the second member 1b has an outer diameter smaller than the inner diameter of the third member 1c. Furthermore, by inserting a portion of the second member 1b into the third member 1c, the second and third members 1b and 1c come into contact with each other, thereby forming a space for accommodating the second electrode 5 and the tubular dielectric 3. Although not shown, it is also possible to insert at least a portion of the third member 1c into the second member 1b, thereby bringing the second and third members 1b and 1c into contact with each other, thereby forming a space for accommodating the second electrode 5 and the tubular dielectric 3.

[0063] Furthermore, the second member 1b contacts the second electrode 5 from one side along the axis O1, restricting the movement of the second electrode 5 toward the one side along the axis O1. Furthermore, the third member 1c contacts the second electrode 5 from the other side along the axis O1, restricting the movement of the second electrode 5 toward the other side along the axis O1. Thus, the second electrode 5 is held in a state where its movement in the axial direction d1 is restricted.

[0064] Furthermore, the second member 1b contacts the tubular dielectric 3 from one side along the axis O1 via the O-ring 6b, restricting movement of the tubular dielectric 3 toward the one side along the axis O1. Furthermore, the third member 1c contacts the tubular dielectric 3 from the other side along the axis O1 via the O-ring 6c, restricting movement of the tubular dielectric 3 toward the other side along the axis O1. The O-rings 6b and 6c are made of an elastic resin member and have an inner diameter sufficient to closely contact the outer circumferential surface of the tubular dielectric 3. Thus, the tubular dielectric 3 is retained in a state where its movement in the axial direction d1 is restricted.

[0065] The front end side of the irradiation device 10 ( Figure 3 The front end of the third component 1c in the left side is provided with an irradiation port 1c1. Figure 3 In the example shown, the irradiation port 1 c 1 allows the inner hollow portion 3 a of the tubular dielectric 3 to communicate with the outside of the irradiation tool 10 .

[0066] exist Figure 3 and Figure 4 In the example shown, the holding member 1 further includes a voltage supply line housing portion 1e that houses a portion of the voltage supply line 40 so that the voltage supply line 40 can be extended to the outside of the holding member 1 while being connected to the terminal portion 4a. Figure 3 and Figure 5 In the illustrated example, the holding member 1 further includes a ground wire housing portion 1 f that houses a portion of the ground wire 31 so that the ground wire 31 can be extended to the outside of the holding member 1 while being connected to the second electrode 5 .

[0067] exist Figures 3-7 In the example shown, the first member 1a, the second member 1b, and the third member 1c are substantially cylindrical in shape. Although not shown, the first member 1a, the second member 1b, and the third member 1c may also be in a polygonal shape such as a square tube, a hexagonal tube, or an octagonal tube.

[0068] The material of the first member 1a, the second member 1b, and the third member 1c is not particularly limited, and is preferably a material having insulating properties. The material having insulating properties is, for example, a thermoplastic resin, a thermosetting resin, or the like. The thermoplastic resin is, for example, polyethylene, polypropylene, polyvinyl chloride, polystyrene, acrylonitrile-butadiene-styrene resin (ABS resin), polyether ether ketone (PEEK), polytetrafluoroethylene (PTFE), polyvinylidene fluoride (PVDF), polyethyleneimine (PEI), polyacetal (POM), modified polyphenylene ether (mPPE), or the like. The thermosetting resin is, for example, phenol resin, melamine resin, urea resin, epoxy resin, unsaturated polyester resin, silicone resin, or the like. In addition, as the material having insulating properties, a material in which polyethylene terephthalate (PET) is used as a main raw material and glass short fibers, inorganic fillers, or the like are compounded and filled can also be used. As such a material, for example, UNILATE (registered trademark) manufactured by UNITIKA, LTD. can be given. As the material of the first member 1a, the second member 1b, and the third member 1c, PEEK or mPPE is more preferable because it has physical properties suitable for the resin of the material of the first member 1a, the second member 1b, and the third member 1c.

[0069] Since the holding member 1 includes the first member 1a, the second member 1b, or further includes the third member 1c, the holding member 1 can be disassembled into a plurality of members. Therefore, the first electrode 4, the second electrode 5, the tubular dielectric 3, and the like held by the holding member 1 can be easily taken out of the holding member 1. In addition, the electrode holding body 7 and the irradiation device 10 can also be easily assembled with the first member 1a, the second member 1b, and the third member 1c.

[0070] Figure 3 The illustrated irradiation device 10 can be assembled, for example, by the following steps. First, the first member 1a, the second member 1b, and the first electrode 4 are arranged so that the first member 1a and the second member 1b face each other with the first electrode 4 interposed therebetween.

[0071] Next, the first member 1a and the second member 1b are brought into contact with each other so as to be fixed to each other with at least a part of the first electrode 4 housed in the housing space 1d. In particular, in the case where the third member 1c is further included, the first member 1a, the second member 1b, and the third member 1c are brought into contact with each other so as to be fixed to each other with at least a part of the first electrode 4 housed in the housing space 1d. Figure 3In the illustrated irradiation device 10, the first electrode 4 is first inserted into the interior of the first member 1a from the expanded diameter portion 4b side, such that at least the expanded diameter portion 4b is located inside the first member 1a and at least a portion of the narrow portion 4c is located outside the first member 1a. This causes the first electrode 4 to contact the first member 1a in the axial direction d1, inhibiting movement of the first electrode 4. Next, the second member 1b is introduced from the narrow portion 4c side of the first electrode 4, such that the narrow portion 4c passes through the interior of the second member 1b and the second member 1b covers the expanded diameter portion 4b. This brings the first member 1a and the second member 1b into contact and secures them to each other. This results in the first electrode 4 being held by the first and second members 1a, 1b.

[0072] Next, the third member 1c, the second electrode 5, and the tubular dielectric 3 are arranged so that the second member 1b and the third member 1c face each other, sandwiching the second electrode 5 and the tubular dielectric 3. Next, the second member 1b and the third member 1c are brought into contact and fixed to each other so that the second electrode 5 and the tubular dielectric 3 are accommodated between them.

[0073] According to the irradiation device 10 according to this embodiment, the irradiation device 10 can be assembled through the above steps. When the first member 1a and the second member 1b are brought into contact with each other, the first electrode 4 and the second member 1b are less likely to buffer each other, thereby improving the assemblability.

[0074] Here, if Figure 3 and Figure 4 As shown in FIG, the contact surface 2 between the first component 1a and the second component 1b includes a non-perpendicular contact surface 2a that is not perpendicular to the axis O1. Figure 3 In the example shown, the contact surface 2 includes, in addition to the non-perpendicular contact surface 2a, a perpendicular contact surface 2b perpendicular to the axis O1.

[0075] like Figure 3 As shown, the non-perpendicular contact surface 2 a is located outside the first electrode 4 in the radial direction d2 . Figure 3 In the example shown, the angle θ formed by the non-perpendicular contact surface 2a with respect to the radial direction d2 is 90°. In addition, as described above, since the contact surface 2 between the first component 1a and the second component 1b is formed by inserting a portion of the second component 1b into the first component 1a, the non-perpendicular contact surface 2a is as shown in FIG. Figure 4 As shown, the first electrode 4 is surrounded from all sides with the axis O1 as the center.

[0076] The effects of the contact surface 2 including the non-perpendicular contact surface 2a will be described below by comparing with a reference example. First, as a reference example, a case where the contact surface 2 does not include the non-perpendicular contact surface 2a will be considered. Figure 8is a cross-sectional view of the vicinity of the contact surface 2 in the irradiation device 10 provided with the electrode holding body 7 and the outer cylinder member 8 according to the reference example. As shown in the drawing, the conductive object such as the outer cylinder member 8 and the like is present outside the radial direction d2 of the first electrode 4 and outside the holding member 1. Here, the contact surface 2 according to the reference example does not have the non-perpendicular contact surface 2a, and is a surface perpendicular to the axis O1. In this case, there is a perpendicular line L1 that is perpendicular to the axis O1 and that is present on the contact surface 2. On this perpendicular line L1, an electric line from the first electrode 4 to which a voltage is applied toward the object outside the holding member 1 is not blocked by the first member 1a and the second member 1b. Therefore, there is a possibility that the first electrode 4 and the object outside the holding member 1 are short-circuited by a surface-parallel discharge between the first member 1a and the second member 1b. If the short-circuiting occurs, there is a risk that the irradiation device 10 is damaged and malfunctions. Figure 8

[0077] In contrast, the contact surface 2 according to the present embodiment includes the non-perpendicular contact surface 2a. In the example shown in Figure 3 Figure 6 In the example shown in

[0078] In the example shown in Figure 6

[0079] ​​​Further, in the present embodiment, the non-parallel contact surface 2a is provided in such a manner that any perpendicular line passing through the non-parallel contact surface 2a and perpendicular to the axis O1 is not parallel to the non-parallel contact surface O1. In other words, in the present embodiment, if a perpendicular line is drawn passing through the non-parallel contact surface 2a and perpendicular to the axis O1, it is necessarily not parallel to the non-parallel contact surface 2a, in such a manner that a perpendicular line parallel to the non-parallel contact surface 2a cannot be drawn. Thus, on the line which is a perpendicular line perpendicular to the axis O1 and passing through the non-parallel contact surface 2a, an electric line from the first electrode 4 toward an object outside the holding member 1 is blocked by the first member 1a and the second member 1b. Therefore, short-circuiting between the first electrode 4 and an object outside the holding member 1 intervening between the first member 1a and the second member 1b can be suppressed.

[0080] Further, in the terminal portion 4a in the first electrode 4, a solder, a portion of the first electrode 4 soldered to the voltage supply line 40, or the like, which is a component for connecting the first electrode 4 to an external power source, can be provided. Therefore, it can be considered that, in the terminal portion 4a, the more components for connecting the first electrode 4 to an external power source are provided, the more the distance between the first electrode 4 and components electrically connected to the first electrode 4 and an object outside the holding member 1 easily becomes short, and short-circuiting easily occurs. Here, in the example shown in Figure 3 , Figure 4 and Figure 6 , the non-parallel contact surface 2a is located outside the terminal portion 4a in the radial direction d2. Thus, short-circuiting between the terminal portion 4a and an object outside the holding member 1 can be effectively suppressed.

[0081] Further, it can be considered that, since the enlarged diameter portion 4b in the first electrode 4 is a portion having the largest protruding length outside the radial direction d2 in the first electrode 4, the distance to an object outside the holding member 1 easily becomes short, and short-circuiting easily occurs. Here, in the example shown in Figure 3 , Figure 4 and Figure 6 , the non-parallel contact surface 2a is located outside the enlarged diameter portion 4b in the radial direction d2. Thus, short-circuiting between the enlarged diameter portion 4b and an object outside the holding member 1 can be effectively suppressed.

[0082] Further, in the example shown in Figure 3 , the second electrode 5 opposes a portion of the first electrode 4. It can be considered that, in the first electrode 4, a portion not opposing the second electrode 5 is more likely to be short-circuited with an object outside the holding member 1 than a portion opposing the second electrode 5, in correspondence with a portion in which the second electrode 5 is not present in the interval. Here, in the example shown in Figure 3In the illustrated example, the non-parallel contact surface 2a is located in a region different from a region in which the second electrode 5 is located in the direction of extension of the axis O1. Thus, short-circuiting of a portion of the first electrode 4 that is not opposed to the second electrode 5 and an object outside the holding member 1 can be effectively suppressed.

[0083] Further, in Figure 3 In the illustrated example, a portion of the first electrode 4 is disposed in the inner space 3a of the tubular dielectric 3. Here, in Figure 3 In the illustrated example, the non-parallel contact surface 2a is located in a region different from a region in which the tubular dielectric 3 is located in the direction of extension of the axis O1.

[0084] Further, in Figure 4 In the illustrated example, as described above, the non-parallel contact surface 2a surrounds the first electrode 4 from the periphery with the axis O1 as the center. Thus, in the entirety of the circumferential direction with the axis O1 as the center, short-circuiting of the first electrode 4 and an object outside the holding member 1 can be suppressed.

[0085] Further, in Figure 3 and Figure 6 In the illustrated example, the contact surface 2 includes a parallel contact surface 2b. Here, a case in which the parallel contact surface 2b is located in a region in which the first electrode 4 is located in the axial direction d1 is assumed. In this case, in the region in which the parallel contact surface 2b is located, the thickness of the holding member 1 that shields an electric wire extending in the radial direction d2 from the first electrode 4 toward an object outside the holding member 1 becomes small.

[0086] Here, in Figure 3 and Figure 6 In the illustrated example, the parallel contact surface 2b is located in a region different from a region in which the terminal portion 4a is located in the axial direction d1. Thus, the thickness of the holding member 1 in the region in which the terminal portion 4a is located can be ensured. Thus, for example, even in a case in which a high voltage is applied to the first electrode 4, short-circuiting of the terminal portion 4a and an object outside the holding member 1 via a portion of the holding member 1 in which the thickness is small can be suppressed.

[0087] Further, in Figure 3 and Figure 6 In the illustrated example, the parallel contact surface 2b is located in a region different from a region in which the diameter-expanded portion 4b is located in the axial direction d1. Thus, short-circuiting of the diameter-expanded portion 4b and an object outside the holding member 1 via a portion of the holding member 1 in which the thickness is small can be suppressed.

[0088] Note that, in Figure 3 and Figure 6In the illustrated example, the first electrode 4 has a first portion 4e located in the inner space 3a of the tubular dielectric 3 and a second portion 4f located outside the inner space 3a. Also, the vertical contact surface 2b is located in a region different from the region in which the second portion 4f is located in the axial direction dl.

[0089] Further, in Figure 3 and Figure 6 In the illustrated example, the vertical contact surface 2b is located in a region different from the region in which the first electrode 4 is located in the axial direction dl. Thereby, the thickness of the holding member 1 in the entire region in which the first electrode 4 is located can be ensured. Thereby, short-circuiting of the first electrode 4 and an object outside the holding member 1 via a portion of the holding member 1 having a small thickness can be suppressed.

[0090] In the irradiation device 10, the plasma generation gas is supplied from the supply unit 20 to between the first electrode 4 and the second electrode 5. In Figure 3 and Figure 5 In the illustrated example, the first electrode 4 is disposed separately from the tubular dielectric 3. In this case, the inner space 3a of the tubular dielectric 3 can also be used as a flow path of the plasma generation gas, and the plasma generation gas can be supplied to between the first electrode 4 and the second electrode 5. Further, although not illustrated, in the case where the second electrode 5 is disposed separately from the tubular dielectric 3, the gap between the second electrode 5 and the tubular dielectric 3 can also be used as a flow path of the plasma generation gas, and the plasma generation gas can be supplied to between the first electrode 4 and the second electrode 5.

[0091] There is no particular limitation on the method of supplying the plasma generation gas to between the first electrode 4 and the second electrode 5. Although not illustrated, the inside of the first electrode 4 can be hollow. In this case, the plasma generation gas supplied to the irradiation device 10 via the gas pipe 30 passes through the inside of the first electrode 4, is ejected from a hole of the first electrode 4 provided at an opposing portion opposite the second electrode 5, and is thereby supplied to between the first electrode 4 and the second electrode 5. Further, a through hole can also be provided at the holding member 1 described later. In this case, the plasma generation gas supplied to the irradiation device 10 via the gas pipe 30 is supplied to between the first electrode 4 and the second electrode 5 via the through hole of the holding member 1.

[0092] Figure 1The supply unit 20 shown supplies electricity and a plasma generation gas to the irradiation device 10. The supply unit 20 is capable of adjusting the voltage and frequency applied between the first electrode 4 and the second electrode 5. The supply unit 20 is provided with a housing 21 that houses a supply source 70. The housing 21 houses the supply source 70 in a detachable manner. Thus, when the gas in the supply source 70 housed in the housing 21 is used up, the supply source 70 of the plasma generation gas can be replaced.

[0093] The supply source 70 supplies the plasma generation gas between the first electrode 4 and the second electrode 5. The supply source 70 is a pressure-resistant container that houses the plasma generation gas therein. As shown, the supply source 70 is detachably attached to a pipe 75 arranged in the housing 21. The pipe 75 connects the supply source 70 and the gas line 30. The pipe 75 is provided with an electromagnetic valve 71, a pressure regulator 73, a flow controller 74, and a pressure sensor 72 (a residual amount sensor). Figure 2

[0094] The electromagnetic valve 71, if in an open state, supplies the plasma generation gas from the supply source 70 to the irradiation device 10 via the pipe 75 and the gas line 30. In the illustrated example, the electromagnetic valve 71 is not configured to adjust the degree of opening of the valve, but is configured to merely switch between open and closed. Note that the electromagnetic valve 71 can also be configured to adjust the degree of opening of the valve. The pressure regulator 73 is arranged between the electromagnetic valve 71 and the supply source 70. The pressure regulator 73 reduces the pressure of the plasma generation gas from the supply source 70 to the electromagnetic valve 71 (depressurizes the plasma generation gas).

[0095] The flow controller 74 is arranged between the electromagnetic valve 71 and the gas line 30. The flow controller 74 adjusts the flow rate (the amount of supply per unit time) of the plasma generation gas that passes through the electromagnetic valve 71. The flow controller 74 adjusts the flow rate of the plasma generation gas to, for example, 3 L / min.

[0096] The pressure sensor 72 detects the residual amount V1 of the plasma generation gas in the supply source 70. The pressure sensor 72 measures the pressure (the residual pressure) in the supply source 70 as the residual amount V1. The pressure sensor 72 measures the pressure (the primary pressure) of the plasma generation gas between the pressure regulator 73 and the supply source 70 (closer to the primary side than the pressure regulator 73) as the pressure of the supply source 70. As the pressure sensor 72, for example, the AP-V80 series (specifically, for example, the AP-15S) of Keyence Co., Ltd., or the like can be used.

[0097] ​It should be noted that the actual remaining volume V1 (volume) in the supply source 70 is calculated based on the residual pressure measured by the pressure sensor 72 and the capacity (internal volume) of the supply source 70. If a supply source 70 having a variety of capacities is used as the supply source 70, the capacity used for calculation can be set by, for example, selecting the actual capacity of the supply source 70 on a system screen (not shown) of the input unit. Furthermore, if a supply source 70 having a predetermined capacity is used as the supply source 70, the control unit 90 can store the capacity in advance.

[0098] A joint 76 is provided at the end of the pipe 75 on the supply source 70 side. The supply source 70 is detachably mounted at the joint 76. By attaching and detaching the supply source 70 to the joint 76, the supply source 70 for plasma generation gas can be replaced while the electromagnetic valve 71, the pressure regulator 73, the flow controller 74, and the pressure sensor 72 (hereinafter also referred to as "the electromagnetic valve 71, etc.") are fixed to the housing 21. In this case, the supply source 70 before and after replacement can use a common electromagnetic valve 71, etc. It should be noted that the electromagnetic valve 71, etc. can also be fixed to the supply source 70 and can be separated from the housing 21 in an integrated manner with the supply source 70.

[0099] like Figure 1 As shown, the gas line 30 is a passage for supplying plasma-generating gas from the supply unit 20 to the irradiation apparatus 10. The gas line 30 is connected to the rear end of the tubular dielectric 3 of the irradiation apparatus 10. The material of the gas line 30 is not particularly limited; materials used for known gas pipes can be used. Examples of materials for the gas line 30 include resin piping and rubber tubing, with flexible materials being preferred.

[0100] The voltage supply line 40 is a wiring line that supplies voltage from the supply unit 20 to the irradiation device 10. As described above, the voltage supply line 40 is connected to the first electrode 4 of the irradiation device 10 and is also connected to a foot switch (not shown). The material of the voltage supply line 40 is not particularly limited; materials commonly used for voltage supply lines can be used. Examples of materials for the voltage supply line 40 include metal wires coated with an insulating material.

[0101] Figure 2 The control unit 90 shown is configured using an information processing device. Specifically, the control unit 90 includes a CPU (Central Processor Unit), memory, and auxiliary storage device connected via a bus. The control unit 90 operates by executing programs. For example, the control unit 90 can be built into the supply unit 20. The control unit 90 controls the irradiation device 10, the supply unit 20, and the notification unit 80.

[0102] The control section 90 is electrically connected to a not-shown foot switch. When the user of the irradiation device 10 operates the foot switch, an electric signal is transmitted from the foot switch to the control section 90. When the control section 90 receives the electric signal, the control section 90 causes the electromagnetic valve 71 and the flow controller 74 to be activated, and applies a voltage to the first electrode 4.

[0103] In the present embodiment, when the user depresses the foot switch once, the control section 90 receives the electric signal. Then the control section 90 causes the electromagnetic valve 71 to be opened for a given time, causes the flow controller 74 to adjust the flow rate of the plasma-generating gas passing through the electromagnetic valve 71, and applies a voltage to the first electrode 4 for a given time. As a result, a certain amount of plasma-generating gas is supplied from the supply source 70 to between the first electrode 4 and the second electrode 5, and the active gas is continuously ejected from the nozzle irradiation port 9a for a certain time (for example, several seconds to several tens of seconds, and in the present embodiment, 30 seconds).

[0104] That is, in the present embodiment, the amount of the active gas ejected per depression of the foot switch by the user is determined. Such an operation of ejecting a given amount of the active gas is referred to as a unit operation. In the present embodiment, the unit operation is the depression of the foot switch by the user once. The amount of the active gas ejected per unit operation (the amount of the plasma-generating gas supplied from the supply source 70 to between the first electrode 4 and the second electrode 5 per unit operation) can be a fixed value set in advance, or can be a variable value set by an operation of a not-shown operation panel or the like.

[0105] The control section 90 calculates at least one of the residual number N and the residual time T of the plasma-generating gas as the residual information. In the present embodiment, the control section 90 calculates only the residual number N of the residual number N and the residual time T as the residual information. The residual number N is the number of unit operations in which the plasma-generating gas remaining in the supply source 70 can be supplied from the supply source 70 to between the first electrode 4 and the second electrode 5. The residual time T is the time in which the plasma-generating gas remaining in the supply source 70 can be supplied from the supply source 70 to between the first electrode 4 and the second electrode 5.

[0106] The residual number N and the residual time T can be calculated based on the amount Vl of the plasma generation gas remaining in the supply source 70. The residual number N can be calculated based on the amount Vl of the plasma generation gas remaining and the amount V2 of the plasma generation gas supplied per unit operation of the foot switch (N = Vl / V2). Alternatively, the average value V2 (average) of the amount (supply amount) of the plasma generation gas used in the most recent number of times can be calculated, and the residual number N can be calculated by dividing the average value V2 (average) by the amount Vl of the plasma generation gas remaining. The residual time T can be calculated based on the amount Vl of the plasma generation gas remaining and the amount V3 of the plasma generation gas supplied from the supply source 70 to between the first electrode 4 and the second electrode 5 per unit time (T = Vl / V3).

[0107] The notification section 80 notifies at least one of the residual number N and the residual time T. In the present embodiment, the notification section 80 displays the residual number N. The notification section 80 displays the residual number N calculated by the control section 90 in numerals. As the notification section 80, for example, a display device capable of displaying arbitrary numerals can be used, or a mechanical counter can be used.

[0108] Note that in the illustrated example, the notification section 80 is provided on the outer surface of the housing 21 in a manner integrated with the housing 21, but can be provided in a manner independent of the supply unit 20. Further, the notification section 80 can indicate the residual number N in a manner different from numerals. For example, as the notification section 80, a configuration of an analog display formed by a dial and a pointer can be used. Further, for example, the notification section 80 can notify the residual number N by a display form of colors, or a manner of lighting of light.

[0109] Further, the notification section 80 can notify the residual number N by sound. In this case, as the notification section 80, for example, a speaker or the like can be used.

[0110] As in the present embodiment, in a case where a certain amount of the plasma generation gas is supplied from the supply source 70 to between the first electrode 4 and the second electrode 5 when the user presses the foot switch, the residual number N can improve the convenience of the user more than the residual time T is notified.

[0111] Next, the method of using the active gas irradiation device 100 will be described. For example, a user such as a doctor holds the irradiation tool 10 and moves it so that the nozzle irradiation port 9a faces a target to be irradiated described later. In this state, the user presses the foot switch, and the supply source 70 supplies electricity and the plasma generation gas to the irradiation tool 10. The plasma generation gas supplied to the irradiation tool 10 flows into the inner space 3a of the tubular dielectric 3 from the rear end portion of the tubular dielectric 3. The plasma generation gas is ionized in a position where the first electrode 4 and the second electrode 5 face each other, and becomes plasma.

[0112] In the present embodiment, the first electrode 4 and the second electrode 5 face each other in a direction perpendicular to the flow direction of the plasma generation gas. The plasma generated at the position where the outer circumferential surface of the first electrode 4 and the inner circumferential surface of the second electrode 5 face each other changes in gas composition while flowing in the inner space 3a of the tubular dielectric 3, and becomes active gas containing active species such as radicals.

[0113] The generated active gas is ejected from the nozzle irradiation port 9a. The ejected active gas further activates a part of the gas in the vicinity of the nozzle irradiation port 9a to generate active species. These active gas containing active species are irradiated to the irradiation target.

[0114] As the irradiation target, for example, cells, living tissues, biological individuals, and the like can be given. As the living tissues, organs such as internal organs, epithelial tissues covering the surface of the body or the inner surface of the body cavity, periodontal tissues such as gingiva, alveolar bone, periodontal ligament, and cementum, teeth, bones, and the like can be given. As the biological individuals, any one of mammals such as humans, dogs, cats, pigs, and the like; birds; fish; and the like can be given.

[0115] As the plasma generation gas, for example, noble gases such as helium, neon, argon, krypton, and the like; nitrogen; and the like can be given. These gases can be used alone or in combination with two or more. The plasma generation gas preferably contains nitrogen as a main component. Here, the content of nitrogen in the plasma generation gas is more than 50% by volume. That is, the content of nitrogen in the plasma generation gas is preferably more than 50% by volume, further preferably 70% by volume or more, and particularly preferably 90% by volume to 100% by volume. In the plasma generation gas, the gas component other than nitrogen is not particularly limited, and for example, oxygen, noble gases, and the like can be given.

[0116] In the case where the plasma generation gas contains nitrogen as a main component, a high voltage is particularly required for generating plasma. Here, in the invention related to the present embodiment, as described above, the invention related to the present embodiment is particularly suitable for the case where a high voltage is applied to the electrodes because a part of the second electrode 5 faces the first electrode 4. Therefore, it can be considered that the invention related to the present embodiment is particularly suitable for the case where the plasma generation gas contains nitrogen gas as a main component.

[0117] In the case where the active gas irradiation device 100 is an intraoral treatment tool, the oxygen concentration of the plasma generation gas introduced into the tubular dielectric 3 is preferably 1% by volume or less. If the oxygen concentration is the upper limit value or less, the generation of ozone can be reduced.

[0118] The flow rate of the plasma generation gas introduced into the tubular dielectric 3 is preferably 1 L / min to 10 L / min. If the flow rate of the plasma generation gas introduced into the tubular dielectric 3 is equal to or greater than the lower limit value, the temperature increase of the irradiated surface in the irradiated object is easily suppressed. If the flow rate of the plasma generation gas is equal to or less than the upper limit value, the cleaning, activation, or healing of the irradiated object can be further promoted.

[0119] The temperature of the active gas irradiated from the nozzle irradiation port 9a is preferably 50°C or lower, more preferably 45°C or lower, and further preferably 40°C or lower. If the temperature of the active gas irradiated from the nozzle irradiation port 9a is equal to or lower than the upper limit value, the temperature of the irradiated surface is easily 40°C or lower. By making the temperature of the irradiated surface 40°C or lower, even if the irradiated portion is a lesion, the irritation to the lesion can be reduced. The lower limit value of the temperature of the active gas irradiated from the nozzle irradiation port 9a is not particularly limited, and is, for example, 10°C or higher. The temperature of the active gas is a value determined by measuring the temperature of the active gas in the nozzle irradiation port 9a with a thermocouple.

[0120] The distance from the nozzle irradiation port 9a to the irradiated surface (irradiation distance) is, for example, preferably 0.01 mm to 10 mm. If the irradiation distance is equal to or greater than the lower limit value, the temperature of the irradiated surface can be reduced, and the irritation to the irradiated surface can be further alleviated. If the irradiation distance is equal to or lower than the upper limit value, the effect of healing or the like can be further improved.

[0121] The temperature of the irradiated surface at a position 1 mm or more and 10 mm or less from the nozzle irradiation port 9a is preferably 40°C or lower. If the temperature of the irradiated surface is 40°C or lower, the irritation to the irradiated surface can be reduced. The lower limit value of the temperature of the irradiated surface is not particularly limited, and is, for example, 10°C or higher. The temperature of the irradiated surface can be adjusted by a combination of the alternating voltage applied between the first electrode 4 and the second electrode 5, the amount of the active gas irradiated, the distance from the tip portion 4d of the first electrode 4 to the nozzle irradiation port 9a, and the like. The temperature of the irradiated surface can be measured using a thermocouple.

[0122] As the active species (radicals and the like) contained in the active gas, a hydroxyl radical, a singlet oxygen, ozone, hydrogen peroxide, a superoxide anion radical, nitric oxide, nitrogen dioxide, a peroxynitrite, a peroxynitrite, dinitrogen trioxide, and the like can be given. The kind of the active species contained in the active gas can be further adjusted by, for example, the kind of the plasma generation gas and the like.

[0123] The density of the hydroxyl radical in the active gas (radical density) is preferably 0.1 to 300 μmol / L. If the radical density is equal to or greater than the lower limit, it is easy to promote cleaning, activation, or healing of abnormalities of the irradiated object selected from the group consisting of cells, living tissues, and biological individuals. If the radical density is equal to or less than the upper limit, it is possible to reduce the stimulation to the irradiated surface.

[0124] The radical density can be measured, for example, by the following method. A 0.2 mL solution of DMPO (5,5-dimethyl-l-pyrroline-N-oxide) 0.2 mol / L is irradiated with the active gas for 30 seconds. At this time, the distance from the nozzle irradiation port 9a to the liquid surface is set to 5.0 mm. The concentration of the hydroxyl radical is measured for the solution irradiated with the active gas by electron spin resonance (ESR) method, and this is taken as the radical density.

[0125] The density of the singlet oxygen in the active gas (singlet oxygen density) is preferably 0.1 to 300 μmol / L. If the singlet oxygen density is equal to or greater than the lower limit, it is easy to promote cleaning, activation, or healing of abnormalities of the irradiated object selected from the group consisting of cells, living tissues, and biological individuals. If it is equal to or less than the upper limit, it is possible to reduce the stimulation to the irradiated surface.

[0126] The singlet oxygen density can be measured, for example, by the following method. A 0.4 mL solution of TPC (2,2,5,5-tetramethyl-3-pyrroline-3-carboxamide) 0.1 mol / L is irradiated with the active gas for 30 seconds. At this time, the distance from the nozzle irradiation port 9a to the liquid surface is set to 5.0 mm. The concentration of the singlet oxygen is measured for the solution irradiated with the active gas by electron spin resonance (ESR) method, and this is taken as the singlet oxygen density.

[0127] The flow rate of the active gas irradiated from the nozzle irradiation port 9a is preferably 1 to 10 L / min. If the flow rate of the active gas irradiated from the nozzle irradiation port 9a is equal to or greater than the lower limit, it is possible to sufficiently improve the effect of the active gas on the irradiated surface. If the flow rate of the active gas irradiated from the nozzle irradiation port 9a is less than the upper limit, it is possible to prevent excessive increase in the temperature of the irradiated surface of the active gas. Further, in the case where the irradiated surface is wet, it is possible to prevent rapid drying of the irradiated surface. Also, in the case where the irradiated surface is a lesion, it is possible to suppress the stimulation to the patient. Note that in the active gas irradiation device 100, the flow rate of the active gas irradiated from the nozzle irradiation port 9a can be adjusted by the amount of the plasma generation gas supplied to the tubular dielectric 3.

[0128] The active gas generated by the active gas irradiation device 100 has an effect of promoting healing of an injury, an abnormality. By irradiating the active gas to a cell, a living tissue, or a living organism, it is possible to promote cleaning, activation of the irradiated portion, or healing of the irradiated portion.

[0129] In the case of irradiating the active gas for the purpose of promoting healing of an injury, an abnormality, there is no particular limitation on the irradiation frequency, the number of irradiations, and the irradiation period. For example, in the case of irradiating the active gas to an affected portion with an irradiation amount of 1 L / min to 5.0 L / min, from the viewpoint of promoting healing, it is preferable to set the irradiation conditions to 1 time to 5 times per day, 10 seconds to 10 minutes per time, 1 day to 30 days, and the like.

[0130] The active gas irradiation device 100 of the present embodiment is particularly useful as an intraoral treatment tool, a dental treatment tool. In addition, the active gas irradiation device 100 of the present embodiment is also suitable as an animal treatment tool.

[0131] The present embodiment has been described above with reference to the specific example, but the above specific example is not intended to limit the present embodiment. The above present embodiment can be implemented in other various specific examples, and various omissions, substitutions, and changes can be made within the scope of the gist thereof.

[0132] Hereinafter, a modified example will be described with reference to the drawings. In the following description and the drawings used in the following description, for the portions that can be constituted in the same manner as the above-described specific example, the same symbols as those used in the corresponding portions in the above-described specific example are used, and the repeated description is omitted.

[0133] (First Modified Example)

[0134] In the above-described embodiment, the example in which the non-perpendicular contact surface 2a forms an angle of 90° with respect to the radial direction d2 has been described. However, the angle θ that the non-perpendicular contact surface 2a forms with respect to the radial direction d2 is not limited thereto. Figure 9 is a cross-sectional view of the irradiation tool 10 to which the first modified example is applied. In the example shown in Figure 9 In the example shown in the drawing, the angle θ is not 90°. In addition, the contact surface 2 does not include the perpendicular contact surface 2b. The non-perpendicular contact surface 2a preferably forms an angle θ of more than 45° with respect to the radial direction d2. In this case, it is possible to make the along-surface distance between the first electrode 4 and the object outside the holding member 1 longer than in the case where the angle θ is 45° or less.

[0135] (Second Modified Example)

[0136] Figure 10 is a cross-sectional view of the irradiation tool 10 to which the second modified example is applied. In the example shown inFigure 10 In the example shown, the non-flat contact surface 2a includes a first non-flat contact surface 2a1 and a second non-flat contact surface 2a2 separated from the first non-flat contact surface 2a1 in the radial direction d2. In this modification, the first non-flat contact surface 2a1 and the second non-flat contact surface 2a2 each surround the first electrode 4 from the periphery with the axis O1 as the center. By the non-flat contact surface 2a including the first non-flat contact surface 2a1 and the second non-flat contact surface 2a2, the distance along the surface between the first electrode 4 and an object outside the holding member 1 can be made longer.

[0137] (Third Modification)

[0138] In the above-described embodiment and each modification, an example in which the non-flat contact surface 2a surrounds the first electrode 4 from the periphery with the axis O1 as the center has been described. However, the form of the non-flat contact surface 2a is not limited thereto. Figure 11 A perspective view of the first member la and the second member lb related to the third modification. Figure 12 A cross-sectional view of the irradiation device 10 related to the third modification, in a plane passing through the terminal portion 4a and perpendicular to the axis O1.

[0139] In the holding member 1 in the example shown, the non-flat contact surface 2a is formed at a portion in the circumferential direction with the axis O1 as the center when the first member la is in contact with the second member lb. In the example shown, the non-flat contact surface 2a is formed at a portion in the circumferential direction with the axis O1 as the center when the first member la is in contact with the second member lb. Figure 11 In the example shown, the non-flat contact surface 2a is located outside the terminal portion 4a in the radial direction d2. In this case, by the non-flat contact surface 2a, the short circuit of the terminal portion 4a and an object outside the holding member 1 can be effectively suppressed. Figure 12 Figure 12 (Third Modification)

[0140] In the above-described embodiment and each modification, an example in which the first member la and the second member lb have a nearly cylindrical shape, and the first member la and the second member lb are arranged side by side in the axis direction dl when the first member la and the second member lb are brought into contact to form the accommodation space ld has been described. However, as for the form of the first member la and the second member lb, there is no particular limitation as long as the accommodation space ld and the contact surface 2 including the non-flat contact surface 2a can be formed by bringing into contact with each other. As one example, the first member la and the second member lb each have a semi-cylindrical shape. In this case, by bringing the first member la and the second member lb into contact, a cylindrical shape can be formed, and the inside of the cylindrical shape can be used as the accommodation space ld.

[0141] In the above-described embodiment and each modification, an example in which the first member la and the second member lb have a nearly cylindrical shape, and the first member la and the second member lb are arranged side by side in the axis direction dl when the first member la and the second member lb are brought into contact to form the accommodation space ld has been described. However, as for the form of the first member la and the second member lb, there is no particular limitation as long as the accommodation space ld and the contact surface 2 including the non-flat contact surface 2a can be formed by bringing into contact with each other. As one example, the first member la and the second member lb each have a semi-cylindrical shape. In this case, by bringing the first member la and the second member lb into contact, a cylindrical shape can be formed, and the inside of the cylindrical shape can be used as the accommodation space ld.

[0142] (Fifth Modification)

[0143] ​In the above-described embodiments and modifications, the example in which the second electrode 5 is electrically grounded is described. However, the configuration of the second electrode 5 is not limited to this, and a voltage can also be applied to the second electrode 5. As one example, an alternating current that is shifted by only a half cycle is applied to the first electrode 4 and the second electrode 5. In this case, the positional relationship between the above-described first electrode 4 and the contact surface 2 can be applied to the positional relationship between the second electrode 5 and the contact surface 2, unless there is a particular contradiction.

[0144] The modes of the present application are not limited to the above-described embodiments, and various modifications that can be conceived by those skilled in the art are also included, and the effects of the present application are not limited to the above-described content. That is, various additions, changes, and partial deletions can be made within the scope of the conceptual idea and the gist of the present application that can be derived from the content defined in the scope of the claims and equivalents thereof.

Claims

1. An irradiation device comprising: a first electrode to which a voltage is applied for generating plasma; and a holding member that holds the first electrode, wherein the holding member has a first member and a second member that are in contact with each other to form a housing space that houses the first electrode, wherein a contact surface of the first member and the second member includes a non-perpendicular contact surface that is not perpendicular to an axis of the first electrode, wherein the non-perpendicular contact surface includes a first non-perpendicular contact surface and a second non-perpendicular contact surface that is separated from the first non-perpendicular contact surface in a radial direction that is perpendicular to the axis, and wherein the first member is in contact with the first electrode from one side along the axis.

2. The irradiation device according to claim 1, wherein any perpendicular line to the non-perpendicular contact surface that is perpendicular to the axis is not parallel to the non-perpendicular contact surface.

3. The irradiation device according to claim 1 or 2, wherein the non-perpendicular contact surface is at an angle greater than 45° with respect to the radial direction that is perpendicular to the axis.

4. The irradiation device according to claim 1 or 2, wherein the non-perpendicular contact surface surrounds the first electrode from around with the axis as a center.

5. The irradiation device according to claim 1 or 2, wherein the first electrode has a terminal portion that is connected to an external power source, and wherein the non-perpendicular contact surface is located outside the terminal portion in the radial direction that is perpendicular to the axis.

6. The irradiation device according to claim 5, wherein the contact surface includes a perpendicular contact surface that is perpendicular to the axis, and wherein the perpendicular contact surface is located in a region different from a region where the terminal portion is located in an extension direction of the axis.

7. The irradiation device according to claim 1 or 2, wherein the first electrode has a flared portion having a maximum protruding length to an outside in the radial direction that is perpendicular to the axis, and wherein the non-perpendicular contact surface is located outside the flared portion in the radial direction.

8. The irradiation device according to claim 7, wherein the contact surface includes a perpendicular contact surface that is perpendicular to the axis, and wherein the perpendicular contact surface is located in a region different from a region where the flared portion is located in an extension direction of the axis.

9. The irradiation device according to claim 1 or 2, wherein a second electrode is provided on the holding member in a manner that opposes a portion of the first electrode, and wherein the non-perpendicular contact surface is located in a region different from a region where the second electrode is located in an extension direction of the axis.

10. The irradiation device according to claim 1 or 2, comprising: an outer cylinder member that is electrically grounded and houses the first electrode as a whole, wherein the non-perpendicular contact surface is located between the first electrode and the outer cylinder member.

11. A plasma device comprising the irradiation device according to any one of claims 1 to 10.

12. A holding member that holds a first electrode to which a voltage is applied for generating plasma, wherein the holding member has a first member and a second member that are in contact with each other to form a housing space that houses the first electrode. ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ the contact surface of the first member with the second member includes a non-perpendicular contact surface that is not perpendicular to an axis of the first electrode, the non-perpendicular contact surface includes a first non-perpendicular contact surface and a second non-perpendicular contact surface that is separate from the first non-perpendicular contact surface in a radial direction perpendicular to the axis, the first member is in contact with the first electrode from one side along the axis.

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