Removal of processing equipment

Abstract

The removal processing device comprises a table, a plurality of chucks, a nozzle and a table cover. The table is arranged horizontally and rotates around a vertical rotation center line. The plurality of chucks are arranged at intervals around the rotation center line of the table. The nozzle supplies a processing fluid to a substrate held by the chucks. The table cover receives the processing fluid above the table. The table cover has a conical inclined portion whose height decreases as it is farther away from the rotation center line of the table and whose height is constant in the rotation direction of the table.

Description

Technical Field

[0001] The present disclosure relates to removal processing devices. Background Art

[0002] The processing device described in Patent Document 1 includes a first conveying unit, a position adjustment mechanism, a second conveying unit, a turntable, a chuck table, a processing unit, and a cleaning mechanism. The first conveying unit conveys a substrate from a box to the position adjustment mechanism. The position adjustment mechanism adjusts the position of the substrate. The second conveying unit conveys a substrate from the position adjustment mechanism to the chuck table on the turntable. When the chuck table sucks and holds the substrate, the turntable rotates so that the substrate is arranged below the processing unit. The processing unit grinds the substrate using a grinding wheel. The second conveying unit sucks and holds the ground substrate and rotates it to convey it to the cleaning mechanism. The cleaning mechanism cleans the ground substrate. The first conveying unit conveys the cleaned substrate from the cleaning mechanism to the box.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2019-185645 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] A technical solution of the present disclosure provides the following technology: suppressing the machining fluid containing machining chips from remaining on the cover, and suppressing the machining chips from being deposited on the cover.

[0008] Solutions for solving problems

[0009] A removal processing device of a technical solution disclosed in the present invention comprises a table, a plurality of chucks, a nozzle and a table cover. The table is arranged horizontally and rotates around a vertical rotation center line. The plurality of chucks are arranged at intervals around the rotation center line of the table. The nozzle supplies processing fluid to the substrate held by the chuck. The table cover receives the processing fluid above the table. The table cover has a conical inclined portion whose height decreases as it is farther away from the rotation center line of the table and whose height is constant in the rotation direction of the table.

[0010] Effects of the Invention

[0011] According to one technical solution of the present disclosure, it is possible to prevent machining fluid containing machining chips from remaining on the cover, and it is possible to prevent machining chips from being deposited on the cover. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a top view of the grinding device according to one embodiment.

[0013] Figure 2It is a cross-sectional view showing an example of a grinding unit.

[0014] Figure 3 It is a perspective view showing an example of a grinding position cover.

[0015] Figure 4 It is a cross-sectional view showing an example of a stage cover, a chuck cover, and a base cover.

[0016] Figure 5 It is a cross-sectional view showing a modified example of the stage cover, the chuck cover, and the base cover.

[0017] Figure 6 It is a cross-sectional view showing a second modified example of the chuck cover, the stage cover, and the base cover.

[0018] Figure 7 (A) means Figure 6 A top view of an example of the inner cylinder portion shown in FIG. Figure 7 (B) means Figure 7 (A) is a top view of a state in which a part of the inner tube part is removed.

[0019] Figure 8 It means that Figure 6 A cross-sectional view of an example of a state in which a part of the inner cylinder portion is removed is shown.

[0020] Fig. 9 This is a plan view showing an example of the flow of the cleaning liquid. DETAILED DESCRIPTION

[0021] Hereinafter, the embodiments of the present disclosure will be described with reference to the accompanying drawings. In addition, in each of the drawings, the same or corresponding structures are sometimes marked with the same reference numerals, and the description is omitted. In this specification, the X-axis direction, the Y-axis direction, and the Z-axis direction are mutually perpendicular directions. The X-axis direction and the Y-axis direction are horizontal directions, and the Z-axis direction is a vertical direction.

[0022] First, refer to Figure 1 , the grinding device 1 is described. The grinding device 1 grinds a substrate W. The substrate W includes a semiconductor substrate such as a silicon wafer or a compound semiconductor wafer, or a glass substrate. The substrate W may also include a device layer formed on the surface of the semiconductor substrate or the glass substrate. The device layer includes an electronic circuit. In addition, the substrate W may also be an overlapping substrate formed by bonding multiple substrates. Grinding includes polishing. The abrasive used for grinding may be any of fixed abrasives and free abrasives. The grinding device 1, for example, has a table 10, four chucks 20, and three grinding units 30.

[0023] The table 10 holds four chucks 20 at equal intervals around the rotation center line R1 and rotates around the rotation center line R1. When viewed from above, the rotation direction of the table 10 switches between the clockwise direction and the counterclockwise direction. The four chucks 20 rotate together with the table 10 and move to the feeding and unfeeding position A0, the primary grinding position A1, the secondary grinding position A2, the tertiary grinding position A3, and the feeding and unfeeding position A0 in sequence.

[0024] The carry-in and carry-out position A0 is a position for carrying the substrate W in and out relative to the chuck 20, and is used as both a position for carrying the substrate W in and a position for carrying out the substrate W. In addition, in the present embodiment, the carry-in position and the carry-out position are the same position, but the carry-in position and the carry-out position may be different positions. The primary grinding position A1 is a position for performing the primary grinding of the substrate W. The secondary grinding position A2 is a position for performing the secondary grinding of the substrate W. The tertiary grinding position A3 is a position for performing the tertiary grinding of the substrate W.

[0025] The four chucks 20 are rotated about their respective center lines R2 (refer to Figure 2 ) is rotatably mounted on the table 10. At the primary grinding position A1, the secondary grinding position A2, and the tertiary grinding position A3, the chuck 20 rotates around the respective rotation center lines R2.

[0026] One grinding unit 30 performs primary grinding of the substrate W at the primary grinding position A1. Another grinding unit 30 performs secondary grinding of the substrate W at the secondary grinding position A2. The remaining grinding units 30 perform tertiary grinding of the substrate W at the tertiary grinding position A3.

[0027] The grinding unit 30 is a tool driving unit that drives the grinding tool D. The tool driving unit 30 rotates or elevates the grinding tool D. The number of the grinding units 30 may be one or more. The number of the chucks 20 may be greater than the number of the grinding units 30.

[0028] Next, refer to Figure 2 The grinding unit 30 is described. The grinding unit 30 includes a movable portion 31 on which a grinding tool D is mounted. The grinding tool D comes into contact with the substrate W to grind the substrate W. The grinding tool D includes, for example, a disc-shaped grinding wheel D1 and a plurality of grinding stones D2 arranged in a ring shape on the lower surface of the grinding wheel D1.

[0029] The movable part 31 includes: a flange 32 on which a grinding tool D is mounted; a spindle 33 having the flange 32 at its lower end; and a spindle motor 34 that rotates the spindle 33. The flange 32 is arranged horizontally, and a grinding tool D is mounted on its lower surface. The spindle 33 is arranged vertically. The spindle motor 34 rotates the spindle 33 to rotate the grinding tool D mounted on the flange 32. The rotation center line R3 of the grinding tool D is the rotation center line of the spindle 33.

[0030] The grinding unit 30 further includes a lifting unit 35 for lifting the movable unit 31. The lifting unit 35 includes, for example, a vertical Z-axis guide 36, a Z-axis slide 37 that moves along the Z-axis guide 36, and a Z-axis motor 38 that moves the Z-axis slide 37. The movable unit 31 is fixed to the Z-axis slide 37, and the movable unit 31 and the grinding tool D are lifted and lowered together with the Z-axis slide 37. The lifting unit 35 further includes a position detector 39 for detecting the position of the grinding tool D. The position detector 39 detects the position of the grinding tool D by detecting the rotation of the Z-axis motor 38, for example.

[0031] The lifting unit 35 lowers the grinding tool D from the standby position. The grinding tool D rotates while descending, contacts the upper surface of the rotating substrate W, and grinds the entire upper surface of the substrate W. When the thickness of the substrate W reaches the set value, the lifting unit 35 stops the descent of the grinding tool D. Thereafter, the lifting unit 35 raises the grinding tool D to the standby position.

[0032] like Figure 2 As shown, the grinding device 1 has a grinding position cover 40 and a nozzle 50. The grinding position cover 40 is a housing. The grinding position cover 40 covers, for example, the upper and side areas of the primary grinding position A1, the secondary grinding position A2, and the tertiary grinding position A3. In addition, the grinding position cover 40 accommodates the chuck 20, the grinding tool D, and the nozzle 50. The nozzle 50 supplies the grinding liquid to the substrate W held by the chuck 20.

[0033] The grinding position cover 40 suppresses particles such as grinding chips and grinding fluid from scattering to the outside. The grinding position cover 40 includes an upper panel 41 arranged horizontally and a side panel 42 arranged vertically. An insertion port 43 for the movable part 31 is formed on the upper panel 41. The grinding position cover 40 forms a grinding chamber for grinding the substrate W. A recovery tray (not shown) is provided at the lower part of the grinding position cover 40. The recovery tray recovers particles and grinding fluid.

[0034] The nozzle 50 is used to supply a grinding fluid. The grinding fluid is pure water such as DIW (Deionized Water). The grinding fluid enters between the substrate W and the grinding tool D, reduces grinding resistance, and suppresses heat generation.

[0035] like Figure 3As shown, the grinding position cover 40 includes a fixed partition wall 45. The fixed partition wall 45 is provided on the lower surface of the upper panel 41. A plurality of fixed partition walls 45 are arranged at equal intervals around the rotation center line R1 of the table 10, and are used to separate the feeding and unfeeding position A0, the primary grinding position A1, the secondary grinding position A2, and the tertiary grinding position A3. The fixed partition wall 45 is fixed to the lower surface of the upper panel 41. When viewed from above, the fixed partition wall 45 extends in the radial direction of the table 10 (a direction orthogonal to the rotation center line R1).

[0036] like Figure 1 As shown, the fixed partition wall 45 is, for example, set in a cross shape, dividing the interior of the housing 40 into four chambers B0 to B3 around the rotation center line R1 of the table 10. Three chambers B1 to B3 are grinding chambers for grinding the substrate W. B1 is a primary grinding chamber, B2 is a secondary grinding chamber, and B3 is a tertiary grinding chamber. The remaining chamber B0 is a carry-in and carry-out chamber for carrying in and out the substrate W. The carrying in and out of the substrate W includes the action of handing over the substrate W by an external conveying device and the chuck 20. The carry-in and carry-out chamber B0 is open at the top.

[0037] When viewed from above, the interior of the housing 40 is sequentially divided into the delivery chamber B0, the primary grinding chamber B1, the secondary grinding chamber B2, and the tertiary grinding chamber B3 in the counterclockwise direction. In addition, the order of the four chambers B0 to B3 may be reversed. When viewed from above, the interior of the housing 40 may also be sequentially divided into the delivery chamber B0, the primary grinding chamber B1, the secondary grinding chamber B2, and the tertiary grinding chamber B3 in the clockwise direction. In addition, the number of chambers is not limited to four, as long as it is two or more.

[0038] like Figure 3 As shown, the fixed partition wall 45 includes, for example, an upper portion 46 and a side portion 47. The upper portion 46 is mounted on the lower surface of the upper panel 41, and a gap is formed between the upper portion 46 and the stage 10. The gap allows the chuck 20 and the substrate W to pass through when the stage 10 rotates. A long strip of flexible sheet 48 is provided at the lower edge of the upper portion 46 to block the space between the upper portion 46 and the substrate W. The side portion 47 is mounted on the inner wall surface of the side plate 42. The side portion 47 protrudes downward than the upper portion 46, and blocks the space between the side of the stage 10 and the side plate 42.

[0039] On the other hand, the rotating partition wall 15 is provided on the upper surface of the table 10 and rotates together with the table 10. The rotating partition wall 15 is provided with the same number as the fixed partition wall 45, and when the rotation of the table 10 stops, the rotating partition wall 15 is arranged directly below the fixed partition wall 45. By using the fixed partition wall 45 and the rotating partition wall 15, it is possible to suppress the outflow of particles generated inside the grinding chamber to the outside of the grinding chamber. For example, the intrusion of grinding chips from the primary grinding chamber B1 and the tertiary grinding chamber B3 into the feeding and discharging chamber B0 is suppressed, and the feeding and discharging chamber B0 is kept clean. In addition, the intrusion of primary grinding chips with larger particle size from the primary grinding chamber B1 to the secondary grinding chamber B2 is suppressed, and the roughness of the grinding surface after the secondary grinding is suppressed. Moreover, the intrusion of secondary grinding chips with larger particle size from the secondary grinding chamber B2 to the tertiary grinding chamber B3 is suppressed, and the roughness of the grinding surface after the tertiary grinding is suppressed.

[0040] like Figure 4 As shown, the grinding device 1 includes a table cover 60. The table cover 60 receives the grinding fluid above the table 10. The table cover 60 is fixed to the table 10 and rotates together with the table 10.

[0041] The stage cover 60 has an inclined portion 61. The inclined portion 61 has a conical shape whose height decreases as it moves away from the rotation center line R1 of the stage 10 and whose height is constant in the rotation direction of the stage 10. The conical inclined portion 61 may have an opening 61b at its tip.

[0042] Unlike the horizontal flat plate portion, the conical inclined portion 61 can discharge the grinding fluid obliquely downward under the action of gravity, thereby preventing the grinding fluid from remaining on the stage cover 60 and preventing the grinding chips contained in the grinding fluid from being deposited.

[0043] In addition, the conical inclined portion 61 is different from the inclined portion of a pyramidal shape such as a quadrangular pyramid. Figure 3 As shown by the arrows, the grinding fluid can be discharged radially, and the grinding fluid can be evenly dispersed and discharged in the rotation direction of the table 10.

[0044] When the stage cover 60 has a quadrangular pyramid-shaped inclined portion instead of the conical inclined portion 61, Figure 3 The groove G is shown by the double-dashed line. The chuck 20 is located at the bottom of the groove G, and the grinding fluid is likely to gather near the chuck 20, and the grinding chips are likely to be deposited.

[0045] According to this embodiment, the stage cover 60 has a conical inclined portion 61. Therefore, as described above, Figure 3 As shown by the arrows, the grinding fluid can be discharged radially, and the grinding chips can be suppressed from being deposited near the chuck 20.

[0046] Since the accumulation of grinding chips can be suppressed, the contamination of the grinding device 1 can be reduced. Therefore, it is possible to suppress the contamination of the operator or the working robot during maintenance such as replacement of the grinding tool D or replacement of the chuck 20. In addition, it is possible to suppress the accumulated grinding chips from peeling off and adhering to the chuck 20 or the substrate W.

[0047] like Figure 4 As shown in FIG. 1 , the table cover 60 has a straight portion 63 extending downward from the lower edge of the inclined portion 61. The straight portion 63 extends directly downward from the lower edge of the inclined portion 61 in the present embodiment, but may also extend obliquely downward. The straight portion 63 has a cylindrical shape centered on the rotation center line R1 of the table 10. The straight portion 63 guides the grinding fluid flowing down from the inclined portion 61 downward. The straight portion 63 is arranged at a position farther from the rotation center line R1 of the table 10 than the table 10, so that the grinding fluid falls outside the table 10.

[0048] The table cover 60 is divided into a plurality of sections (in Figure 3 The number of the split covers 60A is the same as the number of the chucks 20. Between the split covers 60A adjacent to each other in the rotation direction of the table 10, a rotation partition wall 15 is arranged.

[0049] The plurality of segment covers 60A are individually detachably mounted on the table 10. During maintenance, only the segment covers 60A need to be individually detached, and the entire table cover 60 does not need to be detached at once, so that workability can be improved.

[0050] like Figure 4 As shown in FIG. 1 , the grinding device 1 includes a chuck cover 70 . The chuck cover 70 protrudes upward from the inclined portion 61 of the stage cover 60 , and receives the grinding fluid around the chuck 20 .

[0051] The chuck cover 70 is provided for each chuck 20. The chuck cover 70 also has a function of preventing an object from being caught in the chuck 20 when the chuck 20 rotates. The chuck cover 70 is fixed relative to the stage 10 and rotates together with the stage 10.

[0052] The chuck cover 70 has an annular portion 71. The annular portion 71 has a conical shape in which the height decreases as it is farther away from the rotation center line R2 of the chuck 20 and the height is constant in the rotation direction of the chuck 20.

[0053] Unlike the horizontal flat plate portion, the conical annular portion 71 can discharge the grinding fluid obliquely downward under the action of gravity, thereby preventing the grinding fluid from remaining on the chuck cover 70 and preventing grinding chips contained in the grinding fluid from being deposited.

[0054] Furthermore, unlike the pyramidal annular portion, the conical annular portion 71 can discharge the grinding fluid radially and can evenly disperse and discharge the grinding fluid in the rotation direction of the chuck 20. This can suppress the deviation of the grinding fluid and the accumulation of grinding chips.

[0055] The chuck 20 includes a holding table 21 for holding a substrate W. The holding table 21 includes a disk-shaped porous body 21a and a base 21b including a recessed portion in which the porous body 21a is disposed. A recessed portion is formed on the upper surface of the base 21b, and the porous body 21a is embedded in the recessed portion.

[0056] When the gas inside the porous body 21a is sucked to make the gas pressure of the porous body 21a negative pressure lower than the atmospheric pressure, the substrate W is adsorbed to the porous body 21a. On the other hand, when the gas suction is stopped to return the gas pressure of the porous body 21a to the atmospheric pressure, the adsorption of the substrate W is released.

[0057] The chuck 20 has a flange 23 provided on the lower edge of the holding table 21. The flange 23 is detachably mounted on the rotating table 25 by fixing members such as bolts 24. A plurality of bolts 24 are provided at intervals in the circumferential direction of the flange 23.

[0058] The annular portion 71 has an opening 71a. The diameter of the opening 71a is larger than the diameter of the substrate W and smaller than the diameter of the flange 23 of the chuck 20. The bolts 24 can be hidden directly below the annular portion 71, and the collision of the grinding fluid with the bolts 24 can be suppressed, and the scattering of the grinding fluid can be suppressed.

[0059] The chuck cover 70 has a cylindrical portion 73 extending downward from the lower edge of the annular portion 71. In the present embodiment, the cylindrical portion 73 extends directly downward from the lower edge of the annular portion 71, but may also extend obliquely downward. The center line of the cylindrical portion 73 is the rotation center line R2 of the chuck 20. The cylindrical portion 73 guides the grinding fluid flowing down from the annular portion 71 downward.

[0060] The cylindrical portion 73 passes through the hole 64 of the inclined portion 61 of the stage cover 60. The hole 64 guides the grinding fluid flowing down the cylindrical portion 73 to the lower side of the inclined portion 61. Compared with the case where the cylindrical portion 73 is placed on the inclined portion 61 without the hole 64, the grinding fluid can be prevented from accumulating on the inclined portion 61, and the accumulation of grinding chips can be prevented.

[0061] like Figure 4 As shown, the grinding device 1 includes a support 80 and a base cover 90. The support 80 places the cylindrical portion 73 of the chuck cover 70 below the inclined portion 61 of the table cover 60. The base cover 90 receives the grinding fluid dropped from the hole 64 of the inclined portion 61 above the table 10 and below the table cover 60. The base cover 90 is fixed relative to the table 10 and rotates together with the table 10.

[0062] The bracket 80 is provided protrudingly on the upper surface of the base cover 90. The bracket 80 supports the cylindrical portion 73 of the chuck cover 70 above the base cover 90. Compared with the case where the cylindrical portion 73 is placed on the upper surface of the base cover 90, the length of the cylindrical portion 73 can be shortened.

[0063] The chuck cover 70 further includes a plate-like portion 74 horizontally disposed on the outer periphery of the barrel portion 73. A notch 65 through which the plate-like portion 74 of the chuck cover 70 passes is formed at the opening edge of the hole 64 of the inclined portion 61 of the stage cover 60. The plate-like portion 74 of the chuck cover 70 is formed, for example, at the lower end of the barrel portion 73, placed on the bracket 80, and is detachably mounted on the bracket 80 by bolts 81 or the like. When the stage cover 60 is mounted, a tool is inserted into the notch 65, and the bolts 81 can be loosened or tightened by the tool, so that the chuck cover 70 can be removed or mounted.

[0064] The base cover 90 has a disk portion 91 disposed horizontally above the table 10. The diameter of the disk portion 91 is larger than the diameter of the table 10. The grinding fluid that has fallen on the disk portion 91 is discharged from a gap between the disk portion 91 and the linear portion 63 of the table cover 60.

[0065] A plurality of openings 91a are formed in the disk portion 91. The plurality of openings 91a are arranged at equal intervals around the rotation center line R1 of the table 10. The rotating shaft 26 for rotating the rotating table 25 passes through the opening 91a.

[0066] The rotating shaft 26 extends vertically downward from the rotation center of the rotating table 25. An outer cylinder portion 27 extending downward is provided at the periphery of the rotating table 25. The outer cylinder portion 27 extends directly downward from the periphery of the rotating table 25 in this embodiment, but may also extend obliquely downward. An inner cylinder portion 93 is arranged inside the outer cylinder portion 27.

[0067] The inner cylinder 93 extends upward from the opening edge of the opening 91a of the disk 91. In the present embodiment, the inner cylinder 93 extends directly upward from the opening edge of the opening 91a of the disk 91, but may also extend obliquely upward. The height of the upper end of the inner cylinder 93 is higher than the height of the lower end of the outer cylinder 27. The inner cylinder 93 and the outer cylinder 27 can form a labyrinth that suppresses the infiltration of the grinding fluid.

[0068] As described above, a plurality of openings 91a are arranged at equal intervals around the rotation center line R1 of the table 10. A rotation partition wall 15 is arranged between the openings 91a adjacent to each other in the rotation direction of the table 10. The rotation partition wall 15 is provided on the disk 91. The bracket 80 is also provided on the disk 91.

[0069] The base cover 90 has a cylinder 94 extending downward from the periphery of the disk portion 91. In the present embodiment, the cylinder 94 extends directly downward from the periphery of the disk portion 91, but may also extend obliquely downward. The center line of the cylinder 94 is the rotation center line R1 of the table 10. The cylinder 94 is arranged at a position farther from the rotation center line R1 of the table 10 than the table 10, so that the grinding fluid falls outside the table 10. The cylinder 94 is arranged on the extension line of the straight portion 63 of the table cover 60, and guides the grinding fluid flowing down along the straight portion 63 further downward.

[0070] Next, refer to Figure 5 , a modified example of the stage cover and the chuck cover will be described. The following mainly describes the differences between this modified example and the above-mentioned embodiment.

[0071] The stage cover 60 has a curved portion 66 that rounds the angle between the inclined portion 61 and the straight portion 63. The curved portion 66 has a so-called rounded chamfer shape. The curved portion 66 can smoothly guide the grinding fluid from the inclined portion 61 to the straight portion 63, and can suppress the scattering of the grinding fluid.

[0072] Similarly, the chuck cover 70 has a curved portion 76 that rounds the angle between the annular portion 71 and the cylindrical portion 73. The curved portion 76 has a so-called rounded chamfer shape. The curved portion 76 can smoothly guide the grinding fluid from the annular portion 71 to the cylindrical portion 73, and can suppress the scattering of the grinding fluid.

[0073] Next, refer to Figure 6 The grinding device 1 according to the second modification will be described. The contents of this modification can also be applied to the above-mentioned embodiment and the like.

[0074] like Figure 6 As shown, the grinding device 1 includes a chuck cover 70 that rotates together with the chuck 20. The chuck 20 includes a holding table 21 that holds the substrate W and a flange 23 provided at the lower edge of the holding table 21. The holding table 21 includes a porous body 21a and a base 21b. A recess is formed on the upper surface of the holding table 21, and a disc-shaped porous body 21a is embedded in the recess.

[0075] When the gas inside the porous body 21a is sucked to make the gas pressure of the porous body 21a negative pressure lower than the atmospheric pressure, the substrate W is adsorbed to the porous body 21a. On the other hand, when the gas suction is stopped to return the gas pressure of the porous body 21a to the atmospheric pressure, the adsorption of the substrate W is released.

[0076] The chuck 20 is placed on the rotating table 25 and fixed to the rotating table 25 by a fixing member. The fixing member is not particularly limited, and is, for example, a bolt 24. A plurality of bolts 24 are provided at intervals in the circumferential direction of the flange 23 of the chuck 20. The rod of the bolt 24 passes through the through hole of the flange 23 and is screwed into the bolt hole of the rotating table 25. The head of the bolt 24 presses the flange 23 from above. The chuck 20 can be replaced by loosening or tightening the bolt 24.

[0077] The chuck cover 70 includes an annular canopy portion 71. The annular canopy portion 71 forms an opening portion 71a at the center thereof for the holding table 21 of the chuck 20 to enter. The upper surface of the canopy portion 71 is arranged at the same height as the upper surface of the holding table 21 of the chuck 20, or at a position lower than the upper surface of the holding table 21. In addition, the upper surface of the canopy portion 71 is arranged at a position higher than the inclined portion 61 of the table cover 60.

[0078] The upper surface of the eaves portion 71 is inclined downward as it is away from the rotation center line R2 of the chuck 20. In addition, the upper surface of the eaves portion 71 may be horizontal. However, if the upper surface of the eaves portion 71 is inclined, the grinding fluid can be discharged obliquely downward under the action of gravity, and the deposition of grinding chips mixed with the grinding fluid can be suppressed. The upper surface of the eaves portion 71 has a conical shape, for example.

[0079] The shielding portion 71 is arranged above the flange 23 of the chuck 20, and covers the bolt 24 as a fixing member from above. The diameter of the opening 71a formed in the center of the shielding portion 71 is larger than the diameter of the holding table 21 and smaller than the diameter of the flange 23. The bolt 24 can be hidden directly below the shielding portion 71, and the collision of the grinding fluid with the bolt 24 can be suppressed, and the scattering of the grinding fluid can be suppressed.

[0080] According to this variation, the chuck cover 70 rotates together with the chuck 20. If the chuck 20 is rotated during the grinding of the substrate W, the eaves portion 71 rotates, and the grinding fluid attached to the eaves portion 71 can be blown radially outward under the action of centrifugal force. Therefore, the deposition of grinding chips mixed with the grinding fluid can be suppressed, and the deposition of grinding chips around the chuck 20 can be suppressed. As a result, it is possible to suppress the operator or the working robot from being contaminated during maintenance such as replacement of the chuck 20 or the grinding tool D. In addition, it is possible to suppress the deposited grinding chips from peeling off and adhering to the chuck 20 or the substrate W.

[0081] A spacer 28 is provided between the canopy portion 71 of the chuck cover 70 and the flange 23 of the chuck 20. A plurality of spacers 28 are provided at intervals in the circumferential direction of the flange 23. The canopy portion 71 is placed on the plurality of spacers 28. In addition, the spacer 28 may be integrated with the canopy portion 71, in which case the spacer 28 is placed on the flange 23, and the rod of the bolt 29 described later is screwed into the bolt hole of the flange 23.

[0082] The spacer 28 forms a gap between the eaves portion 71 and the flange 23. Compared with a case where there is no gap, the thickness of the eaves portion 71 can be reduced, and the eaves portion 71 can be made lighter. In addition, a space for arranging the heads of the bolts 24 can be ensured between the eaves portion 71 and the flange 23.

[0083] The spacer 28 has a bolt hole on its upper surface. The rod of the bolt 29 that fixes the eaves portion 71 to the spacer 28 is screwed into the bolt hole. The head of the bolt 29 presses the eaves portion 71 from above. A groove 71b extending in the radial direction of the chuck 20 is formed on the upper surface of the eaves portion 71. The groove 71b accommodates the head of the bolt 29, and the head of the bolt 29 presses the bottom surface of the groove 71b from above.

[0084] The upper surface of the eaves portion 71 is inclined, while the lower surface of the eaves portion 71 is horizontal. If the lower surface of the eaves portion 71 is horizontal, the eaves portion 71 can be stably placed on the plurality of spacers 28. The number of spacers 28 is preferably three or more.

[0085] The chuck cover 70 includes an outer cylinder portion 77 extending downward from the periphery of the eaves portion 71. Figure 6 The outer cylinder 77 extends to a position below the upper end of the inner cylinder 67 of the stage cover 60, and surrounds the inner cylinder 67. The inner cylinder 67 and the outer cylinder 77 can form a labyrinth that suppresses the infiltration of the grinding fluid.

[0086] The boundary between the eaves portion 71 and the outer cylinder portion 77 has, for example, a chamfered shape or a curved shape. In the case of a zigzag-line-shaped boundary, the surface tension of the droplets prevents the droplets from crossing the boundary. As a result, an annular accumulation of liquid is easily formed. If the boundary between the eaves portion 71 and the outer cylinder portion 77 has a curved shape, the droplets easily cross the boundary, and the grinding fluid is easily discharged. Therefore, it is possible to prevent the grinding chips mixed with the grinding fluid from adhering to the ring shape.

[0087] like Figure 6 As shown in FIG. 1 , the grinding device 1 includes a table cover 60 that rotates together with the table 10. The table cover 60 includes an inclined portion 61 that is inclined downward as it becomes farther away from the rotation center line R1 of the table 10.

[0088] The inclined portion 61 is disposed below the upper surface of the holding table 21 of the chuck 20 and above the table 10. Unlike the horizontal flat plate portion, the inclined portion 61 can discharge the grinding fluid obliquely downward under the action of gravity. Therefore, the deposition of grinding chips mixed with the grinding fluid can be suppressed.

[0089] The inclined portion 61 has, for example, a conical shape having a constant height in the circumferential direction of the stage 10. When the inclined portion 61 has a conical shape, as shown in FIG. Figure 3 As shown by the arrows, the grinding fluid can be discharged radially, and the grinding chips can be prevented from being deposited around the chuck 20.

[0090] The inclined portion 61 forms an opening 61a between the top and the base for the turntable 25 to enter. The opening 61a is formed for each turntable 25, and a plurality of openings 61a are formed at intervals around the rotation center line R1 of the table 10. The plurality of openings 61a are formed at equal intervals, for example.

[0091] The stage cover 60 includes an inner tube portion 67 that rises upward from the opening edge of the opening portion 61a of the inclined portion 61. The inner tube portion 67 is Figure 6 The inner tube portion 67 is vertically raised, but may be vertically raised obliquely. The upper edge of the inner tube portion 67 is horizontal in the entire circumferential direction. The inner tube portion 67 prevents the grinding fluid from entering the opening 61a.

[0092] like Figure 7 As shown in (A), the inner cylinder portion 67 includes a first arc cylinder portion 67a, a second arc cylinder portion 67b and a connecting portion 67c. The first arc cylinder portion 67a is fixed relative to the inclined portion 61. The second arc cylinder portion 67b is connected to the first arc cylinder portion 67a in a detachable manner. The connecting portion 67c connects the first arc cylinder portion 67a and the second arc cylinder portion 67b in a ring shape.

[0093] The connecting portion 67c includes, for example, a connecting plate 67c1 and a bolt 67c2. The connecting plate 67c1 is, for example, fixed to the inner circumference of the second arc cylinder portion 67b and extends to the inner circumference of the first arc cylinder portion 67a. The rod of the bolt 67c2 passes through the through hole of the first arc cylinder portion 67a and is screwed into the bolt hole of the connecting plate 67c1. The head of the bolt 67c2 presses the first arc cylinder portion 67a from the radially outer side.

[0094] In addition, the structure of the connecting portion 67c is not particularly limited. For example, the connecting plate 67c1 may be fixed to the inner circumference of the first arc cylinder 67a and extend to the inner circumference of the second arc cylinder 67b. In this case, the rod of the bolt 67c2 passes through the through hole of the second arc cylinder 67b and is screwed into the bolt hole of the connecting plate 67c1. The head of the bolt 67c2 presses the second arc cylinder 67b from the radial outside.

[0095] In any case, the second arc cylinder portion 67b can be removed or installed by loosening or tightening the bolt 67c2. Figure 7 As can be seen from (B), the chuck 20 can be easily replaced by removing the second arc cylinder portion 67b.

[0096] like Figure 6As shown, the second arcuate cylinder portion 67b is arranged radially outward of the table 10 relative to the first arcuate cylinder portion 67a. Furthermore, at least a portion of the lower edge of the second arcuate cylinder portion 67b is arranged below the upper surface of the rotating table 25.

[0097] As a result, if the second arc cylinder portion 67b is removed, Figure 8 As shown, the chuck 20 placed on the upper surface of the rotating table 25 can be pulled out in the lateral direction. This is effective when the adhesion between the chuck 20 and the rotating table 25 is strong and the chuck 20 cannot be peeled upward.

[0098] like Figure 6 As shown, the inner cylinder portion 67 may further include a third arc cylinder portion 67d on which the second arc cylinder portion 67b is placed. The third arc cylinder portion 67d may be fixed to the inclined portion 61 and integrated with the first arc cylinder portion 67a.

[0099] The inner cylinder 67 may also include a position alignment portion 67e for aligning the second arc cylinder 67b and the third arc cylinder 67d. The position alignment portion 67e is, for example, fixed to the inner circumference of the second arc cylinder 67b, inserted into the inner side of the third arc cylinder 67d, and contacts the inner circumference of the third arc cylinder 67d, thereby aligning the second arc cylinder 67b and the third arc cylinder 67d.

[0100] The stage cover 60 has a cylindrical portion 63 extending downward from the lower edge of the inclined portion 61. Figure 6 The cylindrical portion 63 extends directly downward, but may also extend obliquely downward. The cylindrical portion 63 allows the grinding fluid to fall outside the table 10. The outer diameter of the cylindrical portion 63 is larger than the diameter of the table 10.

[0101] The boundary between the inclined portion 61 and the cylindrical portion 63 has a chamfered shape or a curved shape. Compared with a broken line boundary, liquid droplets easily pass over the boundary and the grinding fluid is easily discharged. Therefore, it is possible to prevent the grinding chips mixed with the grinding fluid from being fixed in a ring shape.

[0102] The inclined portion 61 has an opening 61b formed at its top for the fixed shaft 11 to pass through. The cover 60 has a central tube 69 that rises upward from the opening edge of the opening 61b of the inclined portion 61. The central tube 69 is Figure 6 The central cylinder 69 is erected directly upward, but may also be erected obliquely upward. The central cylinder 69 prevents the grinding fluid from entering the opening 61b.

[0103] The table cover 60 is divided into a plurality of divided covers in the circumferential direction of the table 10. The number of divided covers is the same as the number of chucks 20. A rotation partition wall 15 is disposed between the divided covers adjacent to each other in the circumferential direction.

[0104] The plurality of segment covers are individually detachably mounted on the table 10. During maintenance, the segment covers only need to be individually detached, and the entire table cover 60 does not need to be detached at once, so that workability can be improved.

[0105] The grinding device 1 includes a base cover 90. The base cover 90 has a horizontal disk portion 91. The disk portion 91 is disposed below the table cover 60 and above the table 10, and is disposed concentrically with the table 10. The diameter of the disk portion 91 is larger than the diameter of the table 10.

[0106] The disk portion 91 forms an opening 91a through which the rotation shaft 26 of the chuck 20 passes around the rotation center line R1 of the table 10. A plurality of openings 91a are formed around the rotation center line R1 of the table 10 at equal intervals.

[0107] The base cover 90 includes an inner tube portion 93 that rises upward from the opening edge of the opening portion 91a. Figure 6 The rotating shaft 26 passes through the inner cylinder portion 93 .

[0108] The rotating shaft 26 extends vertically downward from the rotation center of the rotating table 25. An outer cylinder portion 27 extending downward is provided on the periphery of the rotating table 25. The outer cylinder portion 27 is Figure 6 The middle part extends directly downward, but it can also extend diagonally downward.

[0109] The outer cylinder portion 27 extends to a position below the upper end of the inner cylinder portion 93 of the base cover 90, and surrounds the inner cylinder portion 93. The inner cylinder portion 93 and the outer cylinder portion 27 form a labyrinth that suppresses the infiltration of the grinding fluid.

[0110] As described above, a plurality of openings 91a are arranged at equal intervals around the rotation center line R1 of the table 10. The rotation partition wall 15 is arranged between the openings 91a adjacent to each other in the circumferential direction of the table 10. The rotation partition wall 15 is provided on the disk portion 91.

[0111] The base cover 90 has a cylindrical portion 94 extending downward from the periphery of the disk portion 91. Figure 6 The middle part extends directly downward, but it can also extend diagonally downward.

[0112] The boundary between the disk portion 91 and the cylinder portion 94 has a chamfered shape or a curved shape, for example. Compared with a broken line shape, liquid droplets are more likely to pass over the boundary and the grinding fluid is more likely to be discharged. Therefore, it is possible to prevent the grinding chips mixed with the grinding fluid from being fixed in a ring shape.

[0113] like Figure 6As shown, the grinding device 1 is provided with a nozzle 51 for supplying a cleaning liquid to the inclined portion 61 between the top of the inclined portion 61 of the table cover 60 and the chuck 20. The nozzle 51 supplies the cleaning liquid to the inclined portion 61 from above. The nozzle 51 may also be provided at the central cylinder 69. The cleaning liquid is, for example, pure water. After being supplied to the inclined portion 61, the cleaning liquid flows obliquely downward under the action of gravity. By using the cleaning liquid, a wider range of the inclined portion 61 can be cleaned, and the grinding chips can be suppressed from being deposited around the chuck 20. Alternatively, the nozzle 51 supplies the cleaning liquid to the inclined portion 61 at a position where the cleaning liquid can reach the top of the inclined portion 61. The entire inclined portion 61 can be cleaned from the top to the base.

[0114] The nozzle 51 sprays a cleaning liquid, for example, when the substrate W is being ground, to wash away the grinding liquid and grinding debris attached to the inclined portion 61. The nozzle 51 is provided not only in the primary grinding chamber B1, but also in the secondary grinding chamber B2 and the tertiary grinding chamber B3. The nozzle 51 may also be provided in the feeding and unfeeding chamber B0. The nozzle 51 may spray a cleaning liquid at times other than when the substrate W is being ground.

[0115] The inclined portion 61 of the cover 60 has an opening 61b formed at its top for the fixed shaft 11 to pass through. The central cylinder 69 rises from the opening edge of the opening 61b, and the nozzle 51 is arranged radially outward of the central cylinder 69. This prevents the cleaning liquid from entering the inner side of the central cylinder 69.

[0116] like Fig. 9 As shown, a plurality of supply ports 51a of the nozzle 51 are provided at intervals in the circumferential direction of the table cover 60 (the rotation direction of the table cover 60). A plurality of supply ports 51a may also be provided in one chamber (for example, the primary grinding chamber B1). By utilizing the plurality of supply ports 51a, a wider range in the circumferential direction of the inclined portion 61 of the table cover 60 can be cleaned simultaneously. In addition, the supply port 51a of the nozzle 51 is an arc-shaped slit along the circumferential direction of the table cover 60. The cleaning liquid can be supplied at a position close to the top of the inclined portion 61 of the table cover 60. In addition, the supply port 51a of the nozzle 51 may also be a linear slit or a circular hole.

[0117] In addition, the surface tension of the liquid droplets prevents the liquid droplets from passing over the base of the inclined portion 61. As a result, an annular liquid pool is easily formed, and annular dirt is easily fixed.

[0118] Therefore, the grinding device 1 includes nozzles 52-1 and 52-2 for supplying cleaning liquid from above to the base of the inclined portion 61 of the stage cover 60. The cleaning liquid is, for example, pure water. The cleaning liquid washes away the grinding liquid contaminated by the grinding chips and suppresses the adhesion of ring-shaped dirt.

[0119] The nozzle 52-1 is located near the boundary between the primary grinding chamber B1 and the feeding and unloading chamber B0, for example. The boundary vicinity is within 50 mm from the fixed partition wall 45 as the boundary. At least part of the nozzle 52-1 outlet is located within this range.

[0120] On the other hand, the nozzle 52-2 is located near the boundary between the tertiary grinding chamber B3 and the feeding and unloading chamber B0. The boundary vicinity is within 50 mm from the fixed partition wall 45 as the boundary. At least part of the nozzle 52-2 outlet is sufficient as long as it is located within this range.

[0121] While the control unit 16 rotates the table 10 in the clockwise direction when viewed from above, the cleaning liquid is supplied from the nozzle 52-1 disposed in the primary grinding chamber B1 to the base of the inclined portion 61 of the table cover 60. The base of the inclined portion 61 can be cleaned immediately before the base of the inclined portion 61 moves from the primary grinding chamber B1 to the loading and unloading chamber B0, thereby preventing dirt from being brought into the loading and unloading chamber B0.

[0122] On the other hand, while the control unit 16 rotates the table 10 counterclockwise when viewed from above, the cleaning liquid is supplied from the nozzle 52-2 disposed in the tertiary grinding chamber B3 to the base of the inclined portion 61 of the table cover 60. Before the base of the inclined portion 61 is moved from the tertiary grinding chamber B3 to the loading and unloading chamber B0, the base of the inclined portion 61 can be cleaned, and dirt can be prevented from being brought into the loading and unloading chamber B0.

[0123] The grinding device 1 includes a control unit 16. The control unit 16 is, for example, a computer, and includes a CPU (Central Processing Unit) 17 and a storage medium 18 such as a memory. The storage medium 18 stores a program for controlling various processes executed in the grinding device 1. The control unit 16 controls the operation of the grinding device 1 by causing the CPU 17 to execute the program stored in the storage medium 18.

[0124] The grinding device of the present disclosure has been described above, but the present disclosure is not limited to the above-mentioned embodiments, etc. Various changes, corrections, substitutions, additions, deletions and combinations can be made within the scope of the claims, which of course also belong to the technical scope of the present disclosure.

[0125] For example, the technology disclosed in the present invention is applicable to the grinding device 1 in the above-mentioned embodiment, but can also be applied to a cutting device, etc. Grinding includes lapping. As long as it is a removal processing device that removes a part of the substrate W, the technology disclosed in the present invention can be applied. This is because the processing of removing a part of the substrate W will generate processing chips. In addition, in the processing of removing a part of the substrate W, a processing fluid is supplied to the substrate W to reduce the friction resistance between the substrate W and the processing tool.

[0126] This application claims priority based on Japanese Patent Application No. 2020-052488 filed with the Japan Patent Office on March 24, 2020, and Japanese Patent Application No. 2020-161269 filed with the Japan Patent Office on September 25, 2020, and the entire contents of Japanese Patent Application No. 2020-052488 and Japanese Patent Application No. 2020-161269 are hereby cited in the present application.

[0127] Description of Reference Numerals

[0128] 1. Grinding device (removal of processing device); 10. Table; 20. Chuck; 50. Nozzle; 60. Table cover; 61. Inclined portion.

Claims

1. A removal processing device, wherein: The removal processing device comprises: A horizontal table that rotates about a vertical centerline of rotation; a plurality of chucks arranged at intervals around a rotation centerline of the table; a nozzle for supplying a processing fluid to the substrate held by the chuck; a table cover receiving the machining fluid above the table, wherein the table cover includes a conical inclined portion whose height decreases as it moves away from the rotation center line of the table and whose height is constant in the rotation direction of the table; a chuck cover, the chuck cover protruding upward from the inclined portion of the stage cover, receiving the machining fluid around the chuck, wherein the chuck cover includes a cylindrical portion protruding upward from the inclined portion of the stage cover, and a hole for the cylindrical portion to penetrate is formed in the inclined portion of the stage cover; a base cover receiving the machining fluid above the table and below the table cover; and A bracket is provided to place the cylindrical portion of the chuck cover below the inclined portion of the stage cover, wherein the bracket is provided to protrude from the upper surface of the base cover.

2. The removal processing device according to claim 1, wherein: The stage cover includes a straight portion extending downward from a lower edge of the inclined portion and a curved portion rounding an angle between the inclined portion and the straight portion.

3. The removal processing device according to claim 1 or 2, wherein: The stage cover is divided into a plurality of divided covers between the chucks adjacent to each other in the rotation direction of the stage. The plurality of split covers are mounted on the table in an individually detachable manner.

4. The removal processing device according to claim 1, wherein: The chuck cover has a conical annular portion whose height decreases as it becomes farther away from the rotation center line of the chuck and whose height is constant in the rotation direction of the chuck.

5. The removal processing device according to claim 4, wherein: The chuck cover includes a cylindrical portion extending downward from a lower edge of the annular portion and a curved portion rounding an angle between the annular portion and the cylindrical portion.

6. The removal processing device according to claim 4, wherein: The chuck cover includes a cylindrical portion extending downward from the lower edge of the annular portion and a curved portion that rounds the angle between the annular portion and the cylindrical portion. The inclined portion of the stage cover is formed with a hole through which the cylindrical portion passes.

7. The removal processing device according to claim 1, wherein: The chuck cover further includes a plate-shaped portion horizontally arranged on the outer periphery of the cylindrical portion, A notch is formed at the opening edge of the hole of the inclined portion of the stage cover, through which the plate-shaped portion of the chuck cover passes. The plate-shaped portion of the chuck cover is placed on the bracket and is detachably mounted on the bracket.

8. The removal processing device according to claim 1, wherein: The removal processing device has: a rotating table on which the chuck is mounted; a rotation axis extending vertically downward from the rotation center of the rotating table; and an outer cylinder portion extending downward from the periphery of the turntable, The base cover includes: a disk portion horizontally arranged above the table; an opening portion through which the rotating shaft passes; and an inner cylinder portion extending upward from an opening edge of the opening portion. The inner cylinder portion is arranged inside the outer cylinder portion.

9. The removal processing device according to claim 1 or 2, wherein: The removal processing device includes a second nozzle that supplies a cleaning liquid to a base portion of the inclined portion of the stage cover from above.

10. The removal processing device according to claim 9, wherein: The removal processing device comprises: a housing that accommodates the plurality of chucks; and a fixed partition wall that divides the interior of the housing into a plurality of chambers around the rotation center line of the stage. The plurality of chambers include a grinding chamber for grinding the substrate and a carrying-in and carrying-out chamber for carrying the substrate in and out. The second nozzle is located near a boundary between the grinding chamber and the feeding and unfeeding chamber.

11. The removal processing device according to claim 1 or 2, wherein: The removal processing device includes a nozzle for supplying a cleaning liquid to the inclined portion between the top of the inclined portion of the stage cover and the chuck.

12. A removal processing device, wherein: The removal processing device comprises: A horizontal table that rotates about a vertical centerline of rotation; a plurality of chucks arranged at intervals around a rotation centerline of the table; a nozzle for supplying a processing fluid to the substrate held by the chuck; a table cover receiving the machining fluid above the table, wherein the table cover includes a conical inclined portion whose height decreases as it moves away from the rotation center line of the table and whose height is constant in the rotation direction of the table, a base cover, which receives the processing fluid above the table and below the table cover; a rotating table on which the chuck is mounted; a rotation axis extending vertically downward from the rotation center of the rotating table; and an outer cylinder portion extending downward from the periphery of the turntable, The base cover includes: a disk portion horizontally arranged above the table; an opening portion through which the rotating shaft passes; and an inner cylinder portion extending upward from an opening edge of the opening portion. The inner cylinder portion is arranged inside the outer cylinder portion.

13. The removal processing device according to claim 12, wherein: The removal processing device includes a second nozzle that supplies a cleaning liquid to a base portion of the inclined portion of the stage cover from above.

14. The removal processing device according to claim 13, wherein: The removal processing device comprises: a housing that accommodates the plurality of chucks; and a fixed partition wall that divides the interior of the housing into a plurality of chambers around the rotation center line of the stage. The plurality of chambers include a grinding chamber for grinding the substrate and a carrying-in and carrying-out chamber for carrying the substrate in and out. The second nozzle is located near a boundary between the grinding chamber and the feeding and unfeeding chamber.

15. The removal processing device according to any one of claims 12 to 14, wherein: The removal processing device includes a nozzle for supplying a cleaning liquid to the inclined portion between the top of the inclined portion of the stage cover and the chuck.

16. A removal processing device, wherein: The removal processing device comprises: A horizontal table that rotates about a vertical centerline of rotation; a plurality of chucks arranged at intervals around a rotation centerline of the table; a nozzle for supplying a processing fluid to the substrate held by the chuck; a table cover receiving the processing fluid above the table, wherein the table cover includes a conical inclined portion whose height decreases as it moves away from the rotation center line of the table and whose height is constant in the rotation direction of the table, and the chuck includes a holding table for holding the substrate and a flange provided at the lower edge of the holding table, a rotating table on which the chuck is mounted; a fixing member for fixing the flange of the chuck to the rotating table; and a chuck cover, which rotates with the chuck, The chuck cover includes an annular eaves portion, which forms an opening in the center for the holding platform to enter. The overhang portion is disposed above the flange and covers the fixing member from above.

17. The removal processing device according to claim 16, wherein: The removal processing device includes a spacer that forms a gap between the overhang portion of the chuck cover and the flange of the chuck.

18. The removal processing device according to claim 16 or 17, wherein: The table supports the plurality of chucks rotatably by means of the plurality of rotating tables, and rotates around a rotation center line different from the rotation center line of the chucks. The inclined portion of the stage cover forms an opening portion between the top and the base for the turntable to enter. The stage cover includes an inner tube portion, which stands upward from the opening edge of the opening portion. The chuck cover includes an outer cylinder portion extending from the peripheral edge of the eaves portion to a position below the upper end of the inner cylinder portion and surrounding the inner cylinder portion.

19. The removal processing device according to claim 18, wherein: The inner cylinder portion of the stage cover includes: a first arc cylinder portion fixed relative to the inclined portion of the stage cover; a second arc cylinder portion connected to the first arc cylinder portion in a detachable manner; and a connecting portion connecting the first arc cylinder portion and the second arc cylinder portion into a ring shape.

20. The removal processing device according to claim 19, wherein: The second arcuate cylinder is arranged at a position radially outward of the platform relative to the first arcuate cylinder. At least a portion of the lower edge of the second arcuate cylinder is disposed below the upper surface of the turntable.

21. The removal processing device according to claim 16 or 17, wherein: The removal processing device includes a second nozzle that supplies a cleaning liquid to a base portion of the inclined portion of the stage cover from above.

22. The removal processing device according to claim 21, wherein: The removal processing device comprises: a housing that accommodates the plurality of chucks; and a fixed partition wall that divides the interior of the housing into a plurality of chambers around the rotation center line of the stage. The plurality of chambers include a grinding chamber for grinding the substrate and a carrying-in and carrying-out chamber for carrying the substrate in and out. The second nozzle is located near a boundary between the grinding chamber and the feeding and unfeeding chamber.

23. The removal processing device according to claim 16 or 17, wherein: The removal processing device includes a nozzle for supplying a cleaning liquid to the inclined portion between the top of the inclined portion of the stage cover and the chuck.

Images