Polarizing plate and method for manufacturing the same, display panel and display device
By providing a stacked structure of the anti-reflection layer, the first support layer and the grating layer in the polarizer, the problem of traditional polarizers being not resistant to high temperatures and degraded display quality under reflected light is solved, and higher display quality and structural stability are achieved.
Patent Information
- Application Number
- CN202180000305.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2021-02-25
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2041-02-25
AI Technical Summary
Traditional iodine polarizers are not resistant to high temperatures, which limits the development of display devices. At the same time, linear gate polarizers reduce the display quality of the image under reflected light.
By providing a specific structure of the polarizer, including a sequentially stacked anti-reflection layer, a first support layer and a grating layer, an optical resonant cavity structure or directly absorbs light reflected by the grating layer to reduce the reflectivity.
The reflectivity of the polarizer is significantly reduced, the display quality of the image is improved, and the structure of the polarizer is more stable.
Smart Images
Figure CN115280196B_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of display technology, and in particular to a polarizing plate and a manufacturing method thereof, a display panel and a display device. Background Art
[0002] In the prior art, the traditional iodine-based polarizer is one of the core components of the display part. However, its high temperature resistance makes it incompatible with many processes, which limits the development of display devices.
[0003] In order to reduce the cost of devices and improve the durability of polarizers, more durable wire grid polarizers (WGP) have replaced traditional iodine-based polarizers. The wire grid polarizer is composed of a group of regularly arranged sub-wavelength metal wire grids, which to some extent destroys the metallic properties in the direction perpendicular to the wire grid; its optical properties are as follows: linear polarization parallel to the metal wire grid can be reflected, while linear polarization perpendicular to the metal grating direction can be transmitted. This nanoscale linear polarizer is usually made of aluminum, which has a higher reflectivity and relatively low cost compared to other materials.
[0004] However, linearly polarized light parallel to the metal wire grid will be reflected on the surface of the metal wire grid polarizer, and the light reflected from the wire grid polarizer will reduce the display quality of the image. Summary of the invention
[0005] The present application provides a polarizing plate and a manufacturing method thereof, a display panel and a display device. By setting a specific structure of the polarizing plate, the reflectivity can be greatly reduced, the display quality of the image can be improved, and the structure of the polarizing plate can be made more stable.
[0006] According to a first aspect of an embodiment of the present application, a polarizer is provided. The polarizer comprises an anti-reflection layer, a first support layer and a grating layer stacked in sequence along the incident direction of light;
[0007] The grating layer comprises a plurality of first grating strips arranged along a first direction, and the plurality of first grating strips are arranged at intervals from each other;
[0008] The first supporting layer includes a plurality of first supporting bars arranged along a first direction and spaced from each other, and a second supporting bar arranged along a second direction and located between two adjacent first supporting bars, wherein the second direction forms an angle with the first direction, the angle being greater than 0 degrees and less than 180 degrees, and the first supporting bars correspond to the arrangement of the first grid bars;
[0009] The anti-reflection layer comprises a plurality of second grid bars arranged along a first direction, the plurality of second grid bars are arranged at intervals from each other, and the positions of the second grid bars correspond to the positions of the first grid bars, and a third gap is formed between two adjacent second grid bars;
[0010] The anti-reflection layer, the first supporting layer and the grating layer form an optical resonant cavity structure, or the anti-reflection layer is used to absorb the light reflected by the grating layer.
[0011] Optionally, the second direction is perpendicular to the first direction; and / or,
[0012] The second support bars located between two different adjacent first support bars are at least partially located on the same straight line; and / or,
[0013] The second support bars located between two different adjacent first support bars are not located on the same straight line.
[0014] Optionally, the duty cycle of the grating layer is 0.3 to 0.6; and / or,
[0015] The height of the grating layer is greater than the height of the first supporting layer, and the height of the first supporting layer is greater than the height of the anti-reflection layer; and / or,
[0016] The height of the grating layer is 100nm to 250nm, the height of the first supporting layer is 70nm to 200nm, and the height of the anti-reflection layer is 5nm to 100nm.
[0017] Optionally, the orthographic projection of the first support bar along the incident direction of the light and the orthographic projection of the first grating bar corresponding thereto at least partially overlap, and the orthographic projection of the first support bar along the incident direction of the light and the orthographic projection of the first grating bar corresponding thereto at least partially overlap;
[0018] The distance between the orthographic projection of the side edge of the first support bar and the orthographic projection of the side edge of the first grid bar corresponding thereto along the incident direction of light is less than or equal to 40nm, and the distance between the orthographic projection of the side edge of the second grid bar and the orthographic projection of the side edge of the first grid bar corresponding thereto is less than or equal to 20nm.
[0019] Optionally, the material of the grating layer is a metal material; and the material of the first supporting layer is a transparent material.
[0020] Optionally, the polarizer includes a second supporting layer, the second supporting layer is located on a side of the anti-reflection layer away from the first supporting layer, the second supporting layer includes a plurality of third supporting bars arranged along a first direction and spaced apart from each other, and a fourth supporting bar arranged along the second direction and located between two adjacent third supporting bars, the positions of the third supporting bars corresponding to the positions of the first grid bars; and / or,
[0021] The fourth support bar is arranged corresponding to the second support bar; and / or,
[0022] The second supporting layer is made of transparent material.
[0023] Optionally, the polarizer further includes a substrate, and the substrate is located on a side of the grating layer away from the first supporting layer; or, the substrate is located on a side of the anti-reflection layer away from the first supporting layer.
[0024] According to a second aspect of an embodiment of the present application, a method for manufacturing a polarizer is provided, for preparing the above-mentioned polarizer, the method for manufacturing a polarizer comprising:
[0025] forming the grating layer on a substrate;
[0026] forming the first supporting layer on the grating layer;
[0027] The anti-reflection layer is formed on the first supporting layer.
[0028] Optionally, after forming the anti-reflection layer on the first supporting layer, the method further includes: forming a second supporting layer on the anti-reflection layer, wherein the second supporting layer includes a plurality of third supporting bars arranged along the first direction and spaced from each other, and a fourth supporting bar arranged along the second direction and located between two adjacent third supporting bars, and the positions of the third supporting bars correspond to the positions of the first grating bars; and / or,
[0029] The fourth support bar is arranged corresponding to the second support bar; and / or,
[0030] The second supporting layer is made of transparent material.
[0031] According to a third aspect of the embodiment of the present application, a method for manufacturing a polarizer is provided, for preparing the polarizer described above, the method for manufacturing a polarizer comprising:
[0032] forming the anti-reflection layer on the substrate;
[0033] forming the first supporting layer on the anti-reflection layer;
[0034] The grating layer is formed on the first supporting layer.
[0035] Optionally, before forming the anti-reflection layer on the transparent substrate, the method further includes: forming a second support layer on the substrate, the second support layer including a plurality of third support bars arranged along the first direction and spaced from each other, and a fourth support bar arranged along the second direction and located between two adjacent third support bars, and the positions of the third support bars correspond to the positions of the first grating bars; and / or,
[0036] The fourth support bar is arranged corresponding to the second support bar; and / or,
[0037] The second supporting layer is made of transparent material.
[0038] According to a third aspect of an embodiment of the present application, a display panel is provided, wherein the display panel includes the polarizing plate described above.
[0039] According to a fourth aspect of an embodiment of the present application, a display device is provided, comprising the above-mentioned display panel.
[0040] The polarizer and its manufacturing method, display panel and display device of the present application can greatly reduce the reflectivity and improve the display quality of the image by setting the specific structure of the polarizer, while making the structure of the polarizer more stable.
[0041] The polarizer of the present application can achieve the effect of reducing reflectivity in two ways. That is, reducing the reflectivity of the polarizer to ambient light to avoid the reflected ambient light affecting the display quality of the image. The polarizer of the present application includes an anti-reflection layer, a first support layer and a grating layer stacked in sequence along the incident direction of the light, wherein the light refers to ambient light.
[0042] In the first mode, an optical resonant cavity structure is formed by an anti-reflection layer, a first support layer and a grating layer. Specifically, white light enters the polarizer from the incident direction, passes through the anti-reflection layer and the first support layer, is reflected on the surface of the grating layer, and is emitted from the side of the anti-reflection layer away from the first support layer, thereby becoming a light reflection of a certain color, thereby reducing the overall reflectivity of the polarizer. The first support layer located between the anti-reflection layer and the grating layer is a dielectric layer, which acts as a matching layer to induce the reflectivity of the film system near a specific wavelength to the maximum. Since the optical properties of the structure are sensitive to the thickness of the first support layer, different colors can be induced to reflect only by changing the thickness of the first support layer. It should be noted that in this structure, the first support layer not only serves as a part of the optical resonant cavity structure, but also, by setting the specific structure of the first support layer, that is, including a plurality of first support strips arranged at intervals along the first direction, and a second support strip arranged along the second direction and located between two adjacent first support strips, it can play a good supporting role and make the overall structure of the polarizer more solid.
[0043] In the second mode, the anti-reflection layer can directly absorb the light reflected by the grating layer, thereby achieving the effect of reducing the reflectivity. It should be noted that in this structure, the first support layer can not only play a good supporting role, making the overall structure of the polarizer more solid; at the same time, since the first support layer is located between the anti-reflection layer and the grating layer, it can separate the absorption layer and the grating layer, avoiding the mutual influence between the absorption effect of the anti-reflection layer and the polarization effect of the grating layer. BRIEF DESCRIPTION OF THE DRAWINGS
[0044] Figure 1 It is a schematic diagram of the top view structure of the polarizer of Example 1 of the present application.
[0045] Figure 2 yes Figure 1 Schematic diagram of the cross-sectional structure along the AA direction.
[0046] Figure 3 yes Figure 1 Schematic diagram of the cross-sectional structure along the BB direction.
[0047] Figure 4 yes Figure 1 Schematic diagram of the cross-sectional structure along the CC direction.
[0048] Figure 5 It is a schematic diagram of the top view structure of the grating layer of the polarizer of Example 1 of the present application.
[0049] Figure 6 It is a schematic diagram of the top view structure of the first supporting layer of the polarizer of Example 1 of the present application.
[0050] Figure 7 It is a schematic diagram of the top view structure of another implementation of the first supporting layer of the polarizer of Example 1 of the present application.
[0051] Figure 8-Figure 11 It is a schematic diagram of the structure in which the various layers of the polarizer of Example 1 of the present application are stacked in sequence.
[0052] Fig.12 It is a schematic cross-sectional structure diagram of another implementation of the polarizer of Example 1 of the present application.
[0053] Figure 13-Figure 22 A process flow chart of the polarizer manufacturing method of Example 1 of the present application.
[0054] Fig.23 It is a schematic diagram of the cross-sectional structure of the polarizer of Example 2 of the present application.
[0055] Fig.24 It is a schematic cross-sectional structure diagram of another implementation of the polarizer of Example 2 of the present application. DETAILED DESCRIPTION
[0056] Exemplary embodiments will be described in detail herein, examples of which are shown in the accompanying drawings. When the following description refers to the drawings, the same numbers in different drawings represent the same or similar elements unless otherwise indicated. The implementations described in the following exemplary embodiments do not represent all implementations consistent with the present application. Instead, they are merely examples of devices consistent with some aspects of the present application as detailed in the appended claims.
[0057] The terms used in this application are only for the purpose of describing specific embodiments and are not intended to limit this application. Unless otherwise defined, the technical terms or scientific terms used in this application should be understood by people with ordinary skills in the field to which this application belongs. Similar words such as "one" or "one" used in this application specification and claims do not indicate a quantitative limitation, but indicate that there is at least one. Similar words such as "include" or "include" mean that the elements or objects appearing in front of "include" or "include" cover the elements or objects listed after "include" or "include" and their equivalents, and do not exclude other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, and can include electrical connections, whether direct or indirect. "Multiple" includes two, which is equivalent to at least two. The singular forms of "one", "" and "the" used in this application specification and the attached claims are also intended to include plural forms, unless the context clearly indicates other meanings. It should also be understood that the term "and / or" used in this article refers to and includes any or all possible combinations of one or more associated listed items.
[0058] Example 1
[0059] Please combine Figures 1 to 7 It is understood that this embodiment provides a polarizer 1. The polarizer 1 includes an anti-reflection layer 10, a first support layer 20, a grating layer 30 and a substrate 40 stacked in sequence along the light incident direction F. That is, the substrate 40 is located on the side of the grating layer 30 away from the first support layer 20. The substrate 40 is a transparent substrate, and the material of the substrate 40 can be glass, quartz, PI, PET, etc., which is not specifically limited here.
[0060] The grating layer 30 includes first gratings 31 arranged along a first direction L, and a plurality of first gratings 31 are arranged at intervals from each other. That is, the plurality of first gratings 31 are all arranged along the first direction L, and the plurality of first gratings 31 are arranged at intervals from each other.
[0061] The first support layer 20 includes a plurality of first support bars 21 arranged along a first direction L and spaced from each other (i.e., the plurality of first support bars 21 are all arranged along the first direction L, and the plurality of first support bars 21 are spaced from each other), and a second support bar 22 arranged along a second direction W and located between two adjacent first support bars 21, the second direction W forms an angle with the first direction L (i.e., the second direction W is not parallel to the first direction L), that is, the first support bar 21 and the second support bar 22 form an angle α, the angle α is greater than 0 degrees and less than 180 degrees, and the position of the first support bar 21 corresponds to the position of the first grid bar 31. The first support layer 20 is integrally formed, that is, the first support bar 21 and the second support bar 22 are an integrally formed structure.
[0062] The anti-reflection layer 10 includes a plurality of second gratings 11 arranged along the first direction L, the plurality of second gratings 11 are arranged at intervals from each other, and the positions of the second gratings 11 correspond to the positions of the first gratings 31. That is, the plurality of second gratings 11 are all arranged along the first direction L, and the plurality of second gratings 11 are arranged at intervals from each other.
[0063] In this embodiment, the angle α formed by the second direction W and the first direction L is equal to 90 degrees, that is, the second direction W (the arrangement direction of the second support bar 22) is perpendicular to the first direction L (the arrangement direction of the first support bar 21); that is, the second support bar 22 is perpendicular to the first support bar 21 to facilitate the manufacturing process. The width w2 of the second support bar 22 is 20nm to 200nm.
[0064] like Figure 6 As shown, the second support bars 22 located between two different adjacent first support bars 21 may be located on the same straight line. Figure 7 As shown, in another embodiment, the second support bars 22 located between two different adjacent first support bars 21 may also be that a portion of the second support bars 22 are located on the same straight line, while another portion of the second support bars 22 are located on another straight line. In other embodiments, it can also be said that the second support bars 22 located between two different adjacent first support bars 21 are not located on the same straight line.
[0065] There may be a plurality of second support bars 22 between two adjacent first support bars 21 to better play a supporting role. A plurality of second support bars 22 between two adjacent first support bars 21 are arranged at intervals to better play a supporting role.
[0066] Preferably, the period p of the grating layer 30 is 100nm-140nm, preferably, 100nm, 120nm and 140nm. The duty cycle of the grating layer 30 is 0.3-0.6, wherein the duty cycle is the proportion of the first grating strips 31 within the period p of the grating layer 30, that is, the ratio of the width w of the first grating strips 31 to the length of the period p of the grating layer 30, the ratio of the width w of the first grating strips 31 to the period p of the grating layer 30: w / p.
[0067] The height h1 of the grating layer is greater than the height h2 of the first support layer, and the height h2 of the first support layer is greater than the height h3 of the anti-reflection layer. The height h1 of the grating layer is 100nm-250nm, the height h2 of the first support layer is 10nm-200nm, and the height h3 of the anti-reflection layer is 5nm-100nm.
[0068] In this embodiment, the orthographic projection of the first support bar 21 along the light incident direction F and the orthographic projection of the corresponding first grid bar 31 completely overlap, and the orthographic projection of the second grid bar 11 along the light incident direction F and the orthographic projection of the corresponding first grid bar 31 completely overlap, thereby minimizing the impact on the polarization effect of the polarizer 1 itself.
[0069] However, it is not limited thereto, and the orthographic projection of the first support bar 21 and the orthographic projection of the first grating bar 31 corresponding thereto may at least partially overlap along the light incident direction F, and the orthographic projection of the second grating bar 11 and the orthographic projection of the first grating bar 31 corresponding thereto may at least partially overlap along the light incident direction F. Specifically, the distance between the orthographic projection of the side edge of the first support bar 21 and the orthographic projection of the side edge of the first grating bar 31 corresponding thereto along the light incident direction F is less than or equal to 40nm, and the distance between the orthographic projection of the side edge of the second grating bar 11 and the orthographic projection of the side edge of the first grating bar 31 corresponding thereto is less than or equal to 20nm. That is, the first support bar 21 is slightly offset from the first grating bar 31, and the second grating bar 11 is slightly offset from the first grating bar 31.
[0070] In this embodiment, the anti-reflection layer 10 , the first supporting layer 20 and the grating layer 30 form an optical resonant cavity structure, or the anti-reflection layer 10 is used to absorb the light reflected by the grating layer 30 .
[0071] That is to say, the polarizer 1 of this embodiment can achieve the effect of reducing reflectivity in two different ways. That is, reducing the reflectivity of the polarizer 1 to ambient light to prevent the ambient light from affecting the display quality of the image. The polarizer 1 of this embodiment includes an anti-reflection layer 10, a first supporting layer 20 and a grating layer 30 stacked in sequence along the incident direction F of the light, wherein the light refers to the ambient light.
[0072] In the first mode, an optical resonant cavity structure D is formed by the anti-reflection layer 10, the first support layer 20 and the grating layer 30. Specifically, Figure 4As shown, the arrow direction E is the light path direction. White light enters the polarizer 1 along the arrow direction E (the incident direction of the light), passes through the anti-reflection layer 10 and the first support layer 20, is reflected on the surface of the grating layer 30, and is emitted from the side of the anti-reflection layer 10 away from the first support layer 20 along the arrow direction E', thereby becoming a light reflection of a certain color, thereby reducing the overall reflectivity of the polarizer 1. The first support layer 20 located between the anti-reflection layer 10 and the grating layer 30 is a dielectric layer, which acts as a matching layer to induce the reflectivity of the film system near a specific wavelength to the maximum. Since the optical properties of the structure are sensitive to the thickness of the first support layer 20, different colors can be induced to reflect simply by changing the thickness of the first support layer 20. It should be noted that in this structure, the first support layer 20 is not only a part of the optical resonant cavity structure, but also can play a good supporting role by setting the specific structure of the first support layer 20, that is, including a plurality of first support bars 21 arranged along the first direction and spaced from each other, and a second support bar 22 arranged along the second direction and located between two adjacent first support bars 21, so as to make the overall structure of the polarizer 1 more solid. The material of the grating layer 30 is a metal material, such as aluminum, silver, platinum, gold or a metal compound. The material of the first support layer 20 is a transparent material, such as silicon oxide. The reflectivity of the grating layer 30 is greater than the reflectivity of the anti-reflection layer 10, and the transmittance of the grating layer 30 is less than the transmittance of the anti-reflection layer 10. The material of the anti-reflection layer 10 can be a metal material, such as chromium, titanium or molybdenum; or it can be a non-metallic material, such as a ceramic material, that is, a composite material in which nano-scale metal particles are mixed in silicon oxide.
[0073] In the second mode, the anti-reflection layer 10 can directly absorb the light reflected by the grating layer 30, thereby achieving the effect of reducing the reflectivity. It should be noted that in this structure, the first support layer 20 can not only play a good supporting role, but also make the overall structure of the polarizer 1 more solid; at the same time, since the first support layer 20 is located between the anti-reflection layer 10 and the grating layer 30, it can separate the absorption layer and the grating layer 30, avoiding the mutual influence between the absorption effect of the anti-reflection layer 10 and the polarization effect of the grating layer 30. The materials of the grating layer 30 and the first support layer 20 are the same as those in the first mode, and the material of the anti-reflection layer 10 having the function of absorbing the light reflected by the grating layer 30 is a metal oxide, such as copper oxide or chromium oxide.
[0074] It should also be noted that when the polarizer 1 of the present embodiment is a wire grid polarizer (WGP), the supporting effect of the first supporting layer 20 is particularly significant. This is because, in the wire grid polarizer (WGP), its metal grating (the first grid bar 31 of the grating layer 30) is a nano-scale wire grid structure, and adding a structure to the metal grating is prone to the problem of tipping, thereby making the overall structure unstable.
[0075] In this embodiment, the polarizer 1 further includes a second support layer 50, which is located on a side of the anti-reflection layer 10 away from the first support layer 20. The second support layer 50 includes a plurality of third support bars 51 arranged along the first direction L and spaced from each other, and a fourth support bar 52 arranged along the second direction W and located between two adjacent third support bars 51. The positions of the third support bars 51 correspond to the positions of the first grid bars 31. The fourth support bar 52 corresponds to the second support bar 22. The second support layer 50 is integrally formed, that is, the third support bar 51 and the fourth support bar 52 are an integrally formed structure.
[0076] In this way, by providing the second support layer 50, the support effect can be further improved and the stability of the overall structure can be strengthened. In addition, since the second support layer 50 is located on the side of the anti-reflection layer 10 away from the first support layer 20, that is, the light is incident from the second support layer 50 to the anti-reflection layer 10, and blocking matching can be achieved, allowing more light to enter the anti-reflection layer 10. The second support layer 50, the anti-reflection layer 10, the first support layer 20 and the grating layer 30 form an optical resonant cavity structure D, which can reduce the reflection of the incident light, thereby greatly reducing the reflectivity and improving the display quality of the image.
[0077] The orthographic projection of the fourth support bar 52 along the incident direction completely overlaps with the orthographic projection of the corresponding second support bar 22 to avoid affecting the polarization effect of the polarizer 1 itself. However, it is not limited to this, and the orthographic projection of the fourth support bar 52 and the orthographic projection of the corresponding second support bar 22 may also partially overlap. The width of the fourth support bar 52 is 20nm to 200nm.
[0078] The material of the second supporting layer 50 is a transparent material. The material of the second supporting layer 50 is the same as or different from that of the first supporting layer 20. In this embodiment, the material of the second supporting layer 50 and the first supporting layer 20 are both silicon oxide.
[0079] In order to better illustrate the structure of each layer of the polarizer 1 in this embodiment, please refer to Figures 8 to 11 Schematic diagram of the structure in which each layer is stacked in sequence.
[0080] like Fig.12 As shown, in another implementation of this embodiment, the second supporting layer 50 may not be included.
[0081] In this embodiment, by setting the specific structure of the polarizer 1, the reflectivity can be greatly reduced, the display quality of the image can be improved, and the structure of the polarizer can be made more stable. Experiments have shown that the polarization degree of the polarizer 1 of this embodiment can be 99.9-99.999%, the transmittance can be reduced by 5%-10%, and the reflectivity can be reduced from more than 40% to less than 10%.
[0082] This embodiment also provides a method for manufacturing a polarizing plate, which is used to prepare the polarizing plate 1. The method for manufacturing a polarizing plate comprises the following steps:
[0083] Step 100: forming a grating layer on a substrate;
[0084] Step 200: forming a first supporting layer on the grating layer;
[0085] Step 300: forming an anti-reflection layer on the first supporting layer;
[0086] Step 400: forming a second supporting layer on the anti-reflection layer.
[0087] Specifically, Figure 13-Figure 22 As shown, the method for manufacturing the polarizer 1 of this embodiment includes:
[0088] In step 100, forming the grating layer 30 on the substrate 40 includes: Fig.13 As shown, a grating material layer 30' is deposited on one side surface of the transparent substrate 40; then, as shown in Fig.14 As shown, a photoresist layer 71 is formed on the grating material layer 30'; then, as shown Fig.15 As shown, the photoresist layer 71 is patterned to form a photoresist grating 72; then, as shown Fig.16 As shown, the grating material layer 30' not covered by the photoresist grating 72 is etched to form the first grating stripes 31 of the grating layer 30, and a first gap 33 is formed between two adjacent first grating stripes 31; finally, the photoresist grating 72 is washed away by a stripping solution. Specifically, the photoresist layer 71 can be patterned by a photolithography device, and further, the photoresist layer 71 can be patterned by a dry etching technology (such as an inductively coupled plasma etching technology (ICP)).
[0089] However, the invention is not limited thereto, and nanoimprint glue may be used to replace photoresist, and patterning may be formed by nanoimprinting. The photoresist and nanoimprint glue in this embodiment are both commercially available products.
[0090] In step 200, forming the first supporting layer 20 on the grating layer 30 includes: Fig.17 As shown in FIG. 1 , a photoresist material 73 is filled between two adjacent first grating strips 31 of the grating layer 30 (i.e., a photoresist material 73 is filled in a first gap 33 formed between two adjacent first grating strips 31), and the photoresist material 73 is cured so that the upper surface of the photoresist material 73 and the upper surface of the first grating strips 31 are located at the same horizontal plane; then, as shown in FIG. Fig.18As shown, a first support material layer is formed on the upper surface of the first grating strips 31 and the upper surface of the photoresist material 73, and the first support material layer is patterned to form the first support layer 20. It should be noted that the photoresist material 73 can be filled between two adjacent first grating strips 31 of the grating layer 30 by coating or printing.
[0091] In step 300, the process of forming the anti-reflection layer 10 on the first supporting layer 20 includes: filling a photoresist material 73 between two adjacent first supporting bars 21 of the first supporting layer 20 (i.e., filling a photoresist material 73 in a second gap (not shown in the figure) formed between two adjacent first supporting bars 21), and curing the photoresist material 73 so that the upper surface of the photoresist material 73 and the upper surface of the first supporting bar 21 are located at the same horizontal plane; and then, Fig.19 As shown, an absorption material layer 10' is formed on the upper surface of the first support bar 21 and the upper surface of the photoresist material 73; then, as shown Fig. 20 As shown, the absorption material layer 10 ′ is patterned to form the second grid bars 11 of the anti-reflection layer 10 , and a third gap 13 is formed between two adjacent second grid bars 11 .
[0092] In step 400, forming a second support layer 50 on the anti-reflection layer 10 includes: Fig.21 As shown, a photoresist material 73 is filled between two adjacent second grid lines 11 of the anti-reflection layer 10 (i.e., the photoresist material 73 is filled in the third gap 13 formed between two adjacent second grid lines 11), and the photoresist material 73 is cured so that the upper surface of the photoresist material 73 and the upper surface of the second grid line 11 are located at the same horizontal plane; then, as shown in Fig. 22 As shown, a second supporting material layer is formed on the upper surface of the second grid strip 11 and the upper surface of the photoresist material 73 , and the second supporting material layer is patterned to form the second supporting layer 50 .
[0093] After all the above steps are completed, the photoresist material 73 filled in each gap (the first gap 33, the second gap and the third gap 13) is washed away with a stripping liquid to form a Figure 2 The structure shown in .
[0094] It should be noted that when preparing the structure of the polarizer 1 that does not include the second supporting layer 50, it is only necessary to use a stripping liquid to wash away the photoresist material 73 filled in each gap (the first gap, the second gap and the third gap) after completing step 300 to form the final structure of the polarizer 1.
[0095] This embodiment further provides a display panel, which includes the above-mentioned polarizing plate.
[0096] This embodiment further provides a display device, which includes the above-mentioned display panel.
[0097] Example 2
[0098] like Fig.23 As shown, the overall structure of the polarizer 1 of this embodiment is basically the same as that of the embodiment 1, except that the polarizer 1 includes a substrate 40, an anti-reflection layer 10, a first support layer 20 and a grating layer 30 stacked in sequence along the incident direction of light. That is, the substrate 40 is located on the side of the anti-reflection layer 10 away from the first support layer 20.
[0099] In this way, similar to the situation in Example 1, in the first way of reducing the reflectivity, the optical resonant cavity structure is still formed by the anti-reflection layer 10, the first supporting layer 20 and the grating layer 30. In the second way, the anti-reflection layer 10 can directly absorb the light reflected by the grating layer 30, so as to achieve the effect of reducing the reflectivity.
[0100] In this embodiment, the specific position of the second supporting layer 50 is slightly different from that in Embodiment 1, and the second supporting layer 50 is located on the side of the anti-reflection layer 10 away from the first supporting layer 20, and is located between the substrate 40 and the anti-reflection layer 10. The function of the second supporting layer 50 in this embodiment is the same as that in Embodiment 1, and will not be repeated here.
[0101] like Fig.24 As shown, in another implementation of this embodiment, the second supporting layer 50 may not be included.
[0102] This embodiment also provides a method for manufacturing a polarizing plate, which is used to prepare the polarizing plate 1. The method for manufacturing a polarizing plate comprises the following steps:
[0103] Step 100 ′: forming a second supporting layer on the substrate;
[0104] Step 200 ′: forming an anti-reflection layer on the substrate;
[0105] Step 300 ′: forming a first supporting layer on the anti-reflection layer;
[0106] Step 400 ′: forming a grating layer on the first supporting layer.
[0107] The specific processes of the above steps are the same as those in Example 1 and will not be repeated here.
[0108] When the polarizer 1 in this embodiment does not include the second supporting layer 50 , step 100 ′ is omitted, and the anti-reflection layer 10 is directly formed on the substrate 40 , and the subsequent steps remain unchanged.
[0109] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the scope of protection of the present application.
Claims
1. A polarizing plate, characterized in that: The polarizer includes an anti-reflection layer, a first support layer and a grating layer stacked in sequence along the incident direction of light; The grating layer comprises a plurality of first grating strips arranged along a first direction, and the plurality of first grating strips are arranged at intervals from each other; The first support layer includes a plurality of first support bars arranged along a first direction and spaced from each other, and a second support bar arranged along a second direction and located between two adjacent first support bars, the second direction forms an angle with the first direction, the angle is greater than 0 degrees and less than 180 degrees, the first support bars correspond to the arrangement of the first grid bars; the second support bars located between two different adjacent first support bars are not located on the same straight line; The anti-reflection layer comprises a plurality of second grid bars arranged along a first direction, the plurality of second grid bars are arranged at intervals from each other, and the positions of the second grid bars correspond to the positions of the first grid bars; The anti-reflection layer, the first supporting layer and the grating layer form an optical resonant cavity structure, or the anti-reflection layer is used to absorb the light reflected by the grating layer.
2. The polarizing plate according to claim 1, wherein The second direction is perpendicular to the first direction.
3. The polarizing plate according to claim 1, wherein The duty cycle of the grating layer is 0.3 to 0.6; and / or, The height of the grating layer is greater than the height of the first supporting layer, and the height of the first supporting layer is greater than the height of the anti-reflection layer; and / or, The height of the grating layer is 100nm to 250nm, the height of the first supporting layer is 70nm to 200nm, and the height of the anti-reflection layer is 5nm to 100nm.
4. The polarizing plate according to claim 1, wherein The orthographic projection of the first support bar along the incident direction of the light at least partially overlaps with the orthographic projection of the first grating bar corresponding thereto, and the orthographic projection of the first support bar along the incident direction of the light at least partially overlaps with the orthographic projection of the first grating bar corresponding thereto; The distance between the orthographic projection of the side edge of the first support bar and the orthographic projection of the side edge of the first grid bar corresponding thereto along the incident direction of light is less than or equal to 40nm, and the distance between the orthographic projection of the side edge of the second grid bar and the orthographic projection of the side edge of the first grid bar corresponding thereto is less than or equal to 20nm.
5. The polarizing plate according to claim 1, wherein The material of the grating layer is a metal material; the material of the first supporting layer is a transparent material.
6. The polarizing plate according to any one of claims 1 to 5, characterized in that: The polarizer includes a second support layer, the second support layer is located on a side of the anti-reflection layer away from the first support layer, the second support layer includes a plurality of third support bars arranged along a first direction and spaced from each other, and a fourth support bar arranged along the second direction and located between two adjacent third support bars, the positions of the third support bars corresponding to the positions of the first grid bars; and / or, The fourth support bar is arranged corresponding to the second support bar; and / or, The second supporting layer is made of transparent material.
7. The polarizing plate according to any one of claims 1 to 5, characterized in that: The polarizer further includes a substrate, and the substrate is located on a side of the grating layer away from the first supporting layer; or the substrate is located on a side of the anti-reflection layer away from the first supporting layer.
8. A method for manufacturing a polarizing plate, for preparing the polarizing plate according to any one of claims 1 to 5, characterized in that: The polarizer manufacturing method comprises: forming the grating layer on a substrate; forming the first supporting layer on the grating layer; The anti-reflection layer is formed on the first supporting layer.
9. The method for manufacturing a polarizing plate according to claim 8, characterized in that: After the anti-reflection layer is formed on the first support layer, the method further includes: forming a second support layer on the anti-reflection layer, wherein the second support layer includes a plurality of third support bars arranged along the first direction and spaced from each other, and a fourth support bar arranged along the second direction and located between two adjacent third support bars, and the positions of the third support bars correspond to the positions of the first grid bars; and / or, The fourth support bar is arranged corresponding to the second support bar; and / or, The second supporting layer is made of transparent material.
10. A method for manufacturing a polarizing plate, for preparing the polarizing plate according to any one of claims 1 to 5, characterized in that: The polarizer manufacturing method comprises: forming the anti-reflection layer on the substrate; forming the first supporting layer on the anti-reflection layer; The grating layer is formed on the first supporting layer.
11. The method for manufacturing a polarizing plate according to claim 10, characterized in that: Before forming the anti-reflection layer on the transparent substrate, the method further includes: forming a second support layer on the substrate, wherein the second support layer includes a plurality of third support bars arranged along the first direction and spaced from each other, and a fourth support bar arranged along the second direction and located between two adjacent third support bars, and the positions of the third support bars correspond to the positions of the first grating bars; and / or, The fourth support bar is arranged corresponding to the second support bar; and / or, The second supporting layer is made of transparent material.
12. A display panel, characterized in that: The display panel comprises the polarizing plate according to any one of claims 1 to 7.
13. A display device, characterized in that: The display device comprises the display panel according to claim 12.
Citation Information
Patent Citations
Selectively absorptive wire-grid polarizer
CN101688938A
Polaroid and preparation method
CN111679356A