Liquid parameter measuring device and method, semiconductor cleaning equipment

Abstract

The present invention relates to the field of semiconductor manufacturing, and provides a liquid parameter measurement device and method, and semiconductor cleaning equipment. The device is used to detect liquid parameters in a cleaning tank, and includes a first liquid level sensor, a second liquid level sensor, and a processing module, wherein the first probe end of the first liquid level sensor is located at the bottom of the cleaning tank, and is used to detect a first distance between the first probe end and the liquid surface of the liquid, and send it to the processing module; the second probe end of the second liquid level sensor is located above the liquid surface, and is used to detect a second distance between the position of the second probe end and the liquid surface, and send it to the processing module; the processing module is used to obtain the true value of the liquid level according to the second distance and a pre-determined third distance between the second probe end and the first probe end; and obtain the true value of the density of the liquid according to the true value of the liquid level and the first distance. The scheme of the present invention can improve the accuracy of measuring liquid parameters in the cleaning tank.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing, and in particular to a liquid parameter measuring device and method, semiconductor cleaning equipment, electronic equipment and computer-readable storage medium. Background Art

[0002] Wafer cleaning in the integrated circuit manufacturing process refers to the process of removing pollutants and self-oxides on the wafer surface by physical or chemical methods before oxidation, photolithography, epitaxy, diffusion and other processes to obtain a wafer surface that meets the cleanliness requirements. The cleaning process accounts for more than 30% of the entire integrated circuit manufacturing process steps, and the quality of wafer cleaning has an important impact on device performance.

[0003] Wafer cleaning equipment is mainly divided into single-wafer semiconductor cleaning equipment and tank-type semiconductor cleaning equipment for batch cleaning. Tank-type semiconductor cleaning equipment is widely used due to its high pass rate and large production capacity. In the process of cleaning wafers, tank-type semiconductor cleaning equipment needs to prepare different chemical solutions in the cleaning tank according to the different surface residual substances to be removed.

[0004] The concentration measurement of chemical liquid in the cleaning tank is generally carried out by spectral analysis, that is, the liquid flowing through the measuring tube is detected by a probe. However, for chemical requirements such as concentrated sulfuric acid and phosphoric acid, crystalline substances will form in the wall of the measuring tube during long-term use, which will lead to inaccurate measurements. At the same time, the liquid level in the cleaning tank is generally measured by a bubbling level sensor, but the change in temperature will cause the density of the liquid to change, which will also lead to a large deviation in the liquid level measured by the bubbling level sensor. Summary of the invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a liquid parameter measuring device and method, semiconductor cleaning equipment, electronic equipment and computer-readable storage medium, which can improve the accuracy of measuring the liquid level and density of the liquid in the cleaning tank.

[0006] To achieve the purpose of the present invention, a liquid parameter measuring device is provided, which is used to detect the liquid parameters in the cleaning tank of semiconductor cleaning equipment, including a first liquid level sensor, a second liquid level sensor and a processing module, wherein:

[0007] The first probe end of the first liquid level sensor is located at the bottom of the cleaning tank, and is used to detect a first distance between the first probe end and the liquid surface of the liquid, and send it to the processing module;

[0008] The second probe end of the second liquid level sensor is located above the liquid surface, and is used to detect a second distance between the position of the second probe end and the liquid surface, and send the second distance to the processing module;

[0009] The processing module is used to obtain the true value of the liquid level of the liquid according to the second distance and a pre-determined third distance between the second probe end and the first probe end; and to obtain the true value of the density of the liquid according to the true value of the liquid level and the first distance.

[0010] Optionally, the liquid parameter measuring device further comprises a temperature sensor for detecting the temperature of the liquid and sending the temperature to the processing module;

[0011] The processing module is also used to obtain the concentration of the liquid corresponding to the true value of the density based on the temperature of the liquid and the true value of the density, as well as the pre-acquired correspondence between the density and the concentration of the liquid at different types and temperatures of the liquid.

[0012] Optionally, the second liquid level sensor is a guided pulse liquid level sensor, and the second probe end of the guided pulse liquid level sensor is used to send a pulse signal to the liquid surface and receive a reflected signal of the pulse signal reflected by the liquid surface to obtain the second distance;

[0013] The guide pulse liquid level sensor has a guide probe, an end of the guide probe away from the second probe end is located at the bottom of the cleaning tank, and the guide probe is used to guide the propagation direction of the pulse signal.

[0014] Optionally, an end of the guide probe away from the second probe end is lower than the first probe end of the first liquid level sensor.

[0015] Optionally, the first liquid level sensor is a bubbling type liquid level sensor, and the bubbling type liquid level sensor is used to obtain the first distance by detecting a pressure value of the liquid at the probe end.

[0016] Optionally, the third distance, the second distance and the actual value of the liquid level satisfy the following relationship:

[0017] h 2 =LL 1

[0018] Among them, h 2 is the actual value of the liquid level of the liquid; L is the third distance; L 1 is the second distance.

[0019] Optionally, the actual value of the liquid level, the first distance, and the actual value of the density satisfy the following relationship:

[0020]

[0021] Among them, ρ 1 is the true value of the density of the liquid; ρ 2 is the density value of the preset calibration liquid; h 1 is the first distance; h 2 is the actual value of the liquid level of the liquid.

[0022] Optionally, the third distance satisfies the following relationship:

[0023] L=h 10 +L 10

[0024] Wherein, L is the third distance; h 10 is the first distance when the preset calibration liquid is water; L 10 The second distance is when the preset calibration liquid is water.

[0025] Optionally, the processing module includes a signal link unit, an analog-to-digital conversion unit and a calculation unit, wherein:

[0026] The signal link unit is used to transmit the analog signals sent by the first liquid level sensor and the second liquid level sensor to the analog-to-digital conversion unit;

[0027] The analog-to-digital conversion unit is used to convert the analog signal into a digital signal and send it to the calculation unit;

[0028] The calculation unit is used to perform corresponding processing and calculation on the digital signal to obtain the true value of the liquid level and the true value of the density of the liquid.

[0029] Optionally, an end of the guide probe away from the second probe end is lower than the first probe end of the first liquid level sensor.

[0030] As another technical solution, the present invention also provides a liquid parameter measurement method for detecting liquid parameters in a cleaning tank of a semiconductor cleaning device; the method comprises:

[0031] Acquire a first distance between a first probe end of a first liquid level sensor and a liquid surface, wherein the first probe end of the first liquid level sensor is located at the bottom of the cleaning tank;

[0032] Acquire a second distance between a position where a second probe end of a second liquid level sensor is located and the liquid surface, wherein the second probe end of the second liquid level sensor is located above the liquid surface;

[0033] Obtaining a true value of the liquid level of the liquid according to the second distance and a pre-determined third distance between the second probe end and the first probe end;

[0034] The true value of the density of the liquid is obtained according to the true value of the liquid level and the first distance.

[0035] Optionally, the method further includes:

[0036] detecting the temperature of the liquid;

[0037] The concentration of the liquid corresponding to the true value of the density is obtained according to the temperature of the liquid and the true value of the density, as well as the pre-acquired correspondence between the density and the concentration of the liquid at different types and temperatures of the liquid.

[0038] As another technical solution, the present invention further provides a semiconductor cleaning device, including a cleaning tank and the above-mentioned liquid parameter measuring device provided by the present invention.

[0039] As another technical solution, the present invention further provides an electronic device, at least one processor; and

[0040] a memory communicatively connected to the at least one processor; wherein,

[0041] The memory stores one or more computer programs that can be executed by the at least one processor, and the one or more computer programs are executed by the at least one processor so that the at least one processor can execute the above-mentioned liquid parameter measurement method provided by the present invention.

[0042] Optionally, the memory further stores relationship data, wherein the relationship data includes pre-acquired corresponding relationships between the density and concentration of the liquid at different types and temperatures of the liquid.

[0043] As another technical solution, the present invention further provides a computer-readable storage medium on which a computer program is stored. When the computer program is executed by a processor, the liquid parameter measurement method provided by the present invention is implemented.

[0044] The present invention has the following beneficial effects:

[0045] The technical solution of the liquid parameter measuring device and method provided by the present invention can obtain the true value of the liquid level by using the second liquid level sensor to detect the second distance between the position of the second probe end and the liquid surface and the third distance between the second probe end and the first probe end of the second liquid level sensor measured in advance. Compared with the prior art using the bubbling type liquid level sensor to measure the liquid level, the problem of deviation in the measured liquid level caused by the change in the density of the liquid due to temperature changes can be avoided; and the true value of the density of the liquid can be obtained according to the true value of the liquid level and the first distance. Compared with the prior art using the spectral analysis method to detect the density of the liquid, the problem of inaccurate measurement can be avoided due to the formation of crystalline substances in the measuring tube wall by chemical liquids such as concentrated sulfuric acid and phosphoric acid. Therefore, compared with the prior art, the solution of the present invention can improve the accuracy of measuring liquid parameters (such as liquid level and density) in the cleaning tank, and can also reduce equipment costs.

[0046] The semiconductor cleaning equipment provided by the present invention can avoid the problem of deviation in liquid level measurement caused by changes in liquid density due to temperature changes, and can also avoid the problem of inaccurate measurement caused by the formation of crystalline substances in the measuring tube wall by chemical liquids such as concentrated sulfuric acid and phosphoric acid, by adopting the above-mentioned liquid parameter measuring device provided by the present invention. This can improve the accuracy of measuring liquid parameters (such as liquid level and density) in the cleaning tank, and can also reduce equipment costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] Figure 1 It is a structural diagram of an existing bubbling type liquid level sensor;

[0048] Figure 2 is a graph of sulfuric acid density and temperature;

[0049] Figure 3 A schematic diagram of a liquid parameter measuring device provided by an embodiment of the present invention;

[0050] Figure 4 This is the corresponding relationship table between the density and concentration of sulfuric acid at different temperatures;

[0051] Figure 5 A flow chart of a method for measuring liquid parameters provided by an embodiment of the present invention;

[0052] Figure 6 A block diagram of an electronic device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0053] In order to enable those skilled in the art to better understand the technical solution of the present invention, the liquid parameter measurement device and method, semiconductor cleaning equipment, electronic equipment and computer-readable storage medium provided by the present invention are described in detail below in conjunction with the accompanying drawings.

[0054] In the related art, the liquid level in the cleaning tank is generally measured by a bubbling liquid level sensor. Specifically, Figure 1 As shown, the nitrogen provided by the gas source 11 is regulated by the two-stage pressure regulating valve 12 to form a constant pressure nitrogen that enters the body of the bubbling type liquid level sensor 13. The body is provided with a pressure sensor for detecting the pipeline pressure. The constant pressure nitrogen flows out from the outlet 13a of the nitrogen bubbling tube after flowing through the pressure sensor. When measuring the liquid level of the liquid 15 in the cleaning tank 14, the pressure measured by the pressure sensor is the sum of the pipeline pressure and the pressure at the outlet 13a in the cleaning tank 14. According to the liquid pressure formula: P 2 =ρ 1 gh, the liquid level height can be calculated, where P 2 is the pressure at the outlet 13a in the cleaning tank 14; h is the liquid level; ρ 1 is the density of the liquid being measured; g is the proportionality coefficient, which is about 9.8N / kg. Taking water as an example, ρ 1 =1, then the liquid level h = P 2 / g.

[0055] When the density of the liquid changes with temperature, the liquid level also changes. However, at pressure P 2 When the temperature is constant, the liquid level measured by the bubbling liquid level sensor 13 remains unchanged, which leads to inaccurate liquid level measurement. This inaccuracy is particularly evident in high-temperature concentrated sulfuric acid and phosphoric acid liquids. For example, Figure 2 is a graph of sulfuric acid density and temperature. Figure 2 As shown in the figure, from the curve C of sulfuric acid density and temperature, it can be seen that the density of 89.8% concentrated sulfuric acid is 1.1815g / ml at 20°C and 1.723g / ml at 100°C, and the density change reaches 5.07%. The change in the density of the liquid caused by the change in temperature will cause a large deviation in the liquid level measured by the nitrogen bubbling method. In addition, for concentrated sulfuric acid and phosphoric acid, since crystalline substances will form in the tube wall during long-term use, the online spectral analysis method will have problems such as inaccurate measurement.

[0056] To solve the above problems, see Figure 3 The embodiment of the present invention provides a liquid parameter measuring device for detecting parameters of a liquid 22 in a cleaning tank 21 of a semiconductor cleaning device, wherein the parameters may include liquid level and density. The liquid parameter measuring device includes a first liquid level sensor 23, a second liquid level sensor 24, and a processing module 26, wherein a first probe end 23a of the first liquid level sensor 23 is located at the bottom of the cleaning tank 21, and is used to detect a first distance h between the first probe end 23a and a liquid surface A of the liquid 22.1 , and sends it to the processing module 26. Optionally, the first liquid level sensor 23 is a bubbling type liquid level sensor, which is used to obtain the first distance h by detecting the pressure value of the liquid at the first probe end 23a (that is, the end of the bubbling tube 231 of the bubbling type liquid level sensor away from the sensor body). 1 The structure of the bubble type liquid level sensor is, for example, Figure 1 The structure shown, according to the liquid pressure formula: P h1 =ρ 1 gh 1 The first distance h can be calculated 1 .

[0057] The second probe end 241 of the second liquid level sensor 24 is located above the liquid surface A and is used to detect a second distance L between the second probe end 241 and the liquid surface A. 1 , and sends it to the processing module 26; optionally, the second liquid level sensor 24 is a guided pulse liquid level sensor, and the second probe end 241 of the guided pulse liquid level sensor is used to send a pulse signal to the liquid surface A, and receive the reflected signal of the pulse signal reflected by the liquid surface A to obtain the second distance L 1 Specifically, the second distance L can be calculated based on the interval between the sending time and the return time of the pulse signal: 1 Since the guide pulse type liquid level sensor is not affected by the change in density of the liquid due to temperature change, it can accurately measure the liquid level of the liquid 22. The guide pulse type liquid level sensor has a guide probe 242, and the end of the guide probe 242 away from the second probe end 241 is located at the bottom of the cleaning tank 21. The guide probe 242 is used to guide the propagation direction of the above-mentioned pulse signal, that is, the pulse signal propagates along the guide probe 242.

[0058] In practical applications, in order to enable the pulse signal to propagate along the guide probe 242 to the liquid level A, the end of the guide probe 242 away from the second probe end 241 must be located below the liquid level A. However, when the actual height of the liquid level A cannot be known, the end of the guide probe 242 away from the second probe end 241 can be located at the bottom of the cleaning tank 21 to ensure that even if the liquid level changes, the end of the guide probe 242 away from the second probe end 241 can always be located below the liquid level A. In addition, preferably, the end of the guide probe 242 away from the second probe end 241 is lower than the first probe end 23a of the first liquid level sensor 23. It is easy to understand that as long as the end of the guide probe 242 away from the second probe end 241 can always be located below the liquid surface A, the normal measurement of the guide pulse type liquid level sensor can be guaranteed, that is, within the measurement range of the guide pulse type liquid level sensor, by making the end of the guide probe 242 away from the second probe end 241 lower than the first probe end 23a of the first liquid level sensor 23, that is, h2'>h1, it can be ensured that the measurement range of the first liquid level sensor 23 is within the measurement range of the guide pulse type liquid level sensor. In other words, the measurement range of the guide pulse type liquid level sensor includes the measurement range of the first liquid level sensor 23. Of course, the embodiment of the present invention is not limited to this, and the end of the guide probe 242 away from the second probe end 241 can also be flush with the first probe end 23a of the first liquid level sensor 23, that is, h2'>h1. 2 '=h 1 .

[0059] Optionally, an anti-corrosion sleeve is wrapped around the guide probe 242 to protect the guide probe 242 from being corroded by corrosive liquids. The anti-corrosion sleeve can be made of appropriate materials selected according to the chemical properties of the liquid in the cleaning tank 21, such as plastics such as PFA or other materials resistant to chemical corrosion.

[0060] Optionally, the material of the bubbling tube 231 of the bubbling type liquid level sensor includes plastics such as PFA, PTFE, etc. or other chemical liquid corrosion resistant materials. The bubbling tube 231 is a hard tube with a uniform diameter.

[0061] It should be noted that the second liquid level sensor 24 in the embodiment of the present invention is not limited to the guide pulse liquid level sensor. In practical applications, other liquid level sensors that can accurately measure the second distance L may also be used. 1 A detection device that is not affected by changes in liquid density caused by temperature changes.

[0062] It should also be noted that the first liquid level sensor 23 in the embodiment of the present invention is not limited to a bubbling type liquid level sensor. In practical applications, other liquid level sensors that can measure the first distance h can also be used. 1 detection device.

[0063] In some optional embodiments, the liquid parameter may also include concentration. In this case, the liquid parameter measuring device further includes a temperature sensor 25, which is used to detect the temperature of the liquid 22 and send it to the processing module 26. The temperature sensor 25, for example, includes a temperature measuring element 25a and a temperature transmitter, the temperature transmitter is located above the liquid level A, one end of the temperature measuring element 25a is connected to the temperature transmitter, and the other end extends into the cleaning tank 21 and is located below the liquid level A, preferably located near the bottom of the cleaning tank 21, for detecting the temperature of the liquid 22; the temperature transmitter is used to convert the temperature signal detected by the temperature measuring element 25a into an electrical signal, and send it to the processing module 26.

[0064] The processing module 26 is used to calculate the second distance L according to the second distance L 1 and the third distance L between the second probe end 241 and the first probe end 23a determined in advance, to obtain the true value of the liquid level of the liquid 22; 1 The true value of the density of the liquid 22 is obtained.

[0065] In some optional embodiments, the processing module 26 is also used to obtain the concentration of the liquid 22 corresponding to the true value of the density based on the true values ​​of the temperature and density of the liquid 22, and the pre-obtained correspondence between the density and concentration of the liquid at different types and temperatures of the liquid.

[0066] By using the second liquid level sensor 24 to detect the second distance L between its position and the liquid surface A 1 And the third distance L between the second probe end 241 and the first probe end 23a determined in advance can obtain the true value of the liquid level of the liquid 22. Compared with the prior art using a bubbling type liquid level sensor to measure the liquid level, the problem of deviation in the measured liquid level caused by the change in the density of the liquid due to temperature changes can be avoided; and the true value of the density of the liquid can be obtained according to the true value of the liquid level and the first distance. Optionally, the temperature of the liquid 22 can be detected by using a temperature sensor 25, and the concentration of the liquid corresponding to the true value of the density can be obtained according to the temperature and true value of the liquid density, and the correspondence between the density and the concentration of the liquid at different liquid types and temperatures obtained in advance. Compared with the prior art using a spectral analysis method to detect the density and concentration of the liquid, the problem of inaccurate measurement can be avoided due to the formation of crystalline substances in the measuring tube wall by chemical liquids such as concentrated sulfuric acid and phosphoric acid. Therefore, compared with the prior art, the scheme of the embodiment of the present invention can improve the accuracy of measuring the liquid level, concentration and density of the liquid 22 in the cleaning tank 21, and can also reduce the equipment cost.

[0067] In some optional embodiments, the processing module 26 includes a signal link unit 261, an analog-to-digital conversion unit 262, and a calculation unit 263, wherein the signal link unit 261 is used to transmit the analog signal sent by the first liquid level sensor 23, the second liquid level sensor 24, and the temperature sensor 25 to the analog-to-digital conversion unit 262; the signal link unit 261 adopts, for example, RS485, RSS422, or other communication methods, field bus, or other communication methods to transmit the analog signal. The analog-to-digital conversion unit 262 is used to convert the analog signal into a digital signal and send it to the calculation unit 263; the calculation unit 263 is used to process and calculate the digital signal accordingly to obtain the true value of the liquid level, the true value of the density, and the concentration of the liquid. The calculation unit 263 is, for example, a computer or a PLC, etc.

[0068] In some optional embodiments, the third distance L and the second distance L 1 and the actual value of the liquid level h 2 Satisfies the following relationship:

[0069] h 2 =LL 1

[0070] Among them, h 2 is the actual value of the liquid level of the liquid 22; L is the third distance L between the second probe end 241 and the first probe end 23a determined in advance; L 1 is the second distance.

[0071] In some optional embodiments, the third distance L can be obtained by using water as the calibration liquid and based on the measurements of the first liquid level sensor 23 and the second liquid level sensor 24. Of course, in practical applications, other calibration liquids can also be used. Taking water as the calibration liquid as an example, the density value ρ of the calibration liquid is 2 A certain amount of calibration liquid is injected into the cleaning tank 21, and the first distance h when the calibration liquid is water is obtained by measuring the first liquid level sensor 23 and the second liquid level sensor 24 respectively. 10 , The second distance L when the calibration liquid is water 10 , then the third distance L = h 10 +L 10 Since the calibration liquid is water, the density of water changes very little with temperature, and the third distance L is an accurate constant.

[0072] In some optional embodiments, the above liquid level true value h 2 , first distance h 1 And the true value of density satisfies the following relationship:

[0073]

[0074] Among them, ρ 1 is the true value of the density of the liquid 22; ρ 2 is the density value of the preset calibration liquid; h 1 is the first distance; h 2 is the actual value of the liquid level.

[0075] Optionally, the calibration liquid is water, and the density value of the calibration liquid is ρ 2 is 1, in which case ρ 2 =1 Substituting into the above relationship we get:

[0076]

[0077] Therefore, the above liquid level true value h 2 and the first distance h 1 Substituting the above relationship, the true value ρ of the density of liquid 22 is calculated 1 Then, according to the temperature of the liquid 22 and the above-mentioned actual value of the liquid level h 2 , the corresponding relationship between the density and concentration of the liquid 22 under different liquid types and temperatures is obtained in advance, and the above-mentioned liquid level true value h is obtained 2 The corresponding liquid concentration.

[0078] In some optional embodiments, the corresponding relationship between the density and concentration of the liquid 22 under different liquid types and temperatures can be pre-established in the form of a comparison table and stored in the processing module 26. The corresponding relationship can be obtained through experiments or existing experimental data. For example, Figure 4 This is the corresponding relationship table between the density and concentration of sulfuric acid at different temperatures. Figure 4 As shown, taking liquid 22 as concentrated sulfuric acid as an example, when the temperature is 50°C, the above relationship Calculate the true value of the density of concentrated sulfuric acid ρ 1 is 1.21, then by querying the above correspondence table, we can get the true value of density ρ 1 The corresponding concentration of concentrated sulfuric acid is 32%.

[0079] In some optional embodiments, based on the fact that the relationship between liquid density and temperature is usually a linear relationship, the corresponding relationship between the density and concentration of the liquid 22 at different liquid types and temperatures can also be obtained by interpolation based on experimentally measured data to obtain the functional relationship between the density and concentration of the liquid 22 at different liquid types and temperatures.

[0080] In some optional embodiments, in the process of measuring the liquid level, concentration and density of the liquid 22 in the cleaning tank 21, the first liquid level sensor 23, the second liquid level sensor 24 and the temperature sensor 25 can respectively perform real-time detection of the corresponding parameters, and the real-time acquired data can be sent to the processing module 26.

[0081] As another technical solution, see Figure 5 The embodiment of the present invention further provides a liquid parameter measurement method, which uses the above-mentioned liquid parameter measurement device provided by the embodiment of the present invention to detect the liquid level and density of the liquid in the cleaning tank of the semiconductor cleaning equipment; Figure 3 Taking the liquid parameter measuring device shown as an example, the liquid parameter measuring method includes:

[0082] S1. Obtaining a first distance h between the first probe end 23a of the first liquid level sensor 23 and the liquid surface A of the liquid 22 1 , the first probe end 23a of the first liquid level sensor 23 is located at the bottom of the cleaning tank 14;

[0083] S2. Obtain a second distance L between the position of the second probe end 241 and the liquid surface A 1 The second probe end 241 of the second liquid level sensor 24 is located above the liquid level A;

[0084] S3, according to the second distance L 1 and a third distance L between the second probe end 241 and the first probe end 23a determined in advance, to obtain a true value of the liquid level of the liquid 22;

[0085] S4, based on the actual value of the liquid level and the first distance h 1 , and obtain the true value of the density of the liquid 22.

[0086] In practical applications, the above steps S1, S2 and S3 may be executed simultaneously or in any order, and the embodiment of the present invention has no particular limitation on this.

[0087] In some optional embodiments, the liquid parameter measurement method provided by the embodiment of the present invention may further include:

[0088] Detecting the temperature of the liquid 22;

[0089] According to the temperature and density true values ​​of the liquid 22 and the pre-acquired correspondence between the density and concentration of the liquid at different liquid types and temperatures, the concentration of the liquid 22 corresponding to the density true value is obtained.

[0090] The temperature detection step of the liquid 22 and the steps S1 , S2 and S3 may be performed simultaneously or in any order, and there is no particular limitation on this in the embodiment of the present invention.

[0091] In summary, the technical solution of the liquid parameter measurement device and method provided in the embodiment of the present invention uses the second liquid level sensor 24 to detect the second distance L between its position and the liquid surface A. 1 And the third distance L between the second probe end 241 and the first probe end 23a determined in advance can obtain the true value of the liquid level of the liquid 22. Compared with the prior art using a bubbling type liquid level sensor to measure the liquid level, this can avoid the problem of deviation in the measured liquid level caused by the change in the density of the liquid due to temperature changes; and, according to the true value of the liquid level and the first distance, the true value of the density of the liquid can be obtained. Compared with the prior art using a spectral analysis method to detect the density of the liquid, this can avoid the problem of inaccurate measurement caused by the formation of crystalline substances in the measuring tube wall by chemical liquids such as concentrated sulfuric acid and phosphoric acid. Therefore, compared with the prior art, the scheme of the present invention can improve the accuracy of measuring liquid parameters (such as liquid level and density) in the cleaning tank, and can also reduce equipment costs.

[0092] As another technical solution, an embodiment of the present invention further provides a semiconductor cleaning device, including a cleaning tank and the above-mentioned liquid parameter measuring device provided by an embodiment of the present invention.

[0093] The semiconductor cleaning equipment provided by the embodiment of the present invention can avoid the problem of deviation in liquid level measurement caused by changes in liquid density due to temperature changes, and can also avoid the problem of inaccurate measurement caused by the formation of crystalline substances in the measuring tube wall by chemical liquids such as concentrated sulfuric acid and phosphoric acid, by adopting the above-mentioned liquid parameter measuring device provided by the embodiment of the present invention. Thereby, the accuracy of measuring the liquid level, concentration and density of the liquid in the cleaning tank can be improved, and the equipment cost can also be reduced.

[0094] As another technical solution, see Figure 6 The embodiment of the present invention provides an electronic device 500, which includes: at least one processor 501; at least one memory 502; wherein the memory 502 stores one or more computer programs that can be executed by the at least one processor 501, and the one or more computer programs are executed by the at least one processor 501, so that the at least one processor 501 can perform the above-mentioned liquid parameter measurement method. Optionally, the electronic device 500 also includes one or more I / O interfaces 503, which are connected between the processor 501 and the memory 502.

[0095] In some optional embodiments, the memory 502 further stores relationship data, which includes pre-acquired corresponding relationships between the density and concentration of the liquid at different types and temperatures of the liquid.

[0096] The embodiment of the present invention further provides a computer-readable storage medium on which a computer program is stored, wherein the computer program implements the above-mentioned liquid parameter measurement method when executed by a processor. The computer-readable storage medium may be a volatile or non-volatile computer-readable storage medium.

[0097] It is to be understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, but the present invention is not limited thereto. For those of ordinary skill in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A liquid parameter measuring device for detecting liquid parameters in a cleaning tank of a semiconductor cleaning device. It is characterized in that It includes a first liquid level sensor, a second liquid level sensor and a processing module, wherein: The first probe end of the first liquid level sensor is located at the bottom of the cleaning tank, and is used to detect a first distance between the first probe end and the liquid surface of the liquid, and send it to the processing module; the first liquid level sensor is a bubbling type liquid level sensor, and the bubbling type liquid level sensor is used to obtain the first distance by detecting the pressure value of the liquid at the first probe end; The second probe end of the second liquid level sensor is located above the liquid surface, and is used to detect a second distance between the position of the second probe end and the liquid surface, and send the second distance to the processing module; The processing module is used to obtain a true value of the liquid level of the liquid according to the second distance and a pre-determined third distance between the second probe end and the first probe end; and to obtain a true value of the density of the liquid according to the true value of the liquid level and the first distance; The second liquid level sensor is a guide pulse liquid level sensor, and the guide pulse liquid level sensor has a guide probe, and an end of the guide probe away from the second probe end is lower than the first probe end of the first liquid level sensor; The third distance, the second distance and the actual value of the liquid level satisfy the following relationship: h 2 =LL 1 Among them, h 2 is the actual value of the liquid level of the liquid; L is the third distance; L 1 is the second distance; The actual value of the liquid level, the first distance and the actual value of the density satisfy the following relationship: in, is the true value of the density of the liquid; is the density value of the preset calibration liquid; h 1 is the first distance; h 2 is the actual value of the liquid level of the liquid.

2. The liquid parameter measuring device according to claim 1, It is characterized in that The liquid parameter measuring device also includes a temperature sensor for detecting the temperature of the liquid and sending the temperature to the processing module; The processing module is also used to obtain the concentration of the liquid corresponding to the true value of the density based on the temperature of the liquid and the true value of the density, as well as the pre-acquired correspondence between the density and the concentration of the liquid at different types and temperatures of the liquid.

3. The liquid parameter measuring device according to claim 1, It is characterized in that The second probe end of the guide pulse liquid level sensor is used to send a pulse signal to the liquid surface and receive a reflected signal of the pulse signal reflected by the liquid surface to obtain the second distance; One end of the guide probe away from the second probe end is located at the bottom of the cleaning tank, and the guide probe is used to guide the propagation direction of the pulse signal.

4. The liquid parameter measuring device according to any one of claims 1 to 3, It is characterized in that The third distance satisfies the following relationship: L=h 10 +L 10 where L is the third distance; h 10 is the first distance when the preset calibration liquid is water; L 10 is the second distance when the preset calibration liquid is water.

5. The liquid parameter measuring device according to any one of claims 1 to 3, It is characterized in that The processing module includes a signal link unit, an analog-to-digital conversion unit and a calculation unit, wherein: The signal link unit is used to transmit the analog signals sent by the first liquid level sensor and the second liquid level sensor to the analog-to-digital conversion unit; The analog-to-digital conversion unit is used to convert the analog signal into a digital signal and send it to the calculation unit; The calculation unit is used to perform corresponding processing and calculation on the digital signal to obtain the true value of the liquid level and the true value of the density of the liquid.

6. A liquid parameter measurement method for detecting liquid parameters in a cleaning tank of a semiconductor cleaning device; It is characterized in that The method comprises: Obtaining a first distance between a first probe end of a first liquid level sensor and a liquid surface of the liquid, wherein the first probe end of the first liquid level sensor is located at the bottom of the cleaning tank; the first liquid level sensor is a bubbling type liquid level sensor, and the bubbling type liquid level sensor is used to obtain the first distance by detecting a pressure value of the liquid at the first probe end; Acquire a second distance between a position where a second probe end of a second liquid level sensor is located and the liquid surface, wherein the second probe end of the second liquid level sensor is located above the liquid surface; Obtaining a true value of the liquid level of the liquid according to the second distance and a pre-determined third distance between the second probe end and the first probe end; Obtaining a true value of density of the liquid according to the true value of the liquid level and the first distance; The second liquid level sensor is a guide pulse liquid level sensor, and the guide pulse liquid level sensor has a guide probe, and an end of the guide probe away from the second probe end is lower than the first probe end of the first liquid level sensor; The third distance, the second distance and the actual value of the liquid level satisfy the following relationship: h 2 =LL 1 Among them, h 2 is the actual value of the liquid level of the liquid; L is the third distance; L 1 is the second distance; The actual value of the liquid level, the first distance, and the actual value of the density satisfy the following relationship: in, is the true value of the density of the liquid; is the density value of the preset calibration liquid; h 1 is the first distance; h 2 is the actual value of the liquid level of the liquid.

7. The liquid parameter measuring method according to claim 6, It is characterized in that The method further comprises: detecting the temperature of the liquid; The concentration of the liquid corresponding to the true value of the density is obtained according to the temperature of the liquid and the true value of the density, as well as the pre-acquired correspondence between the density and the concentration of the liquid at different types and temperatures of the liquid.

8. A semiconductor cleaning device comprising a cleaning tank, It is characterized in that It also includes the liquid parameter measuring device as described in any one of claims 1-5.

9. An electronic device, It is characterized in that at least one processor; and a memory communicatively connected to the at least one processor; wherein, The memory stores one or more computer programs executable by the at least one processor, and the one or more computer programs are executed by the at least one processor so that the at least one processor can perform the liquid parameter measurement method as described in any one of claims 6-7.

10. The electronic device according to claim 9, It is characterized in that The memory further stores relational data, wherein the relational data includes pre-acquired corresponding relationships between the density and concentration of the liquid at different types and temperatures of the liquid.

11. A computer-readable storage medium having a computer program stored thereon, It is characterized in that When the computer program is executed by a processor, the liquid parameter measurement method according to any one of claims 6 to 7 is implemented.

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