Display panel and manufacturing method thereof, and display device

Abstract

A display panel comprises a substrate, a light-emitting structure layer, a mirror reflection layer and an interference adjustment layer; the light-emitting structure layer is located on one side of the substrate; the light-emitting structure layer comprises a plurality of light-emitting areas and a non-light-emitting area separating the plurality of light-emitting areas; the mirror reflection layer is located on a side of the light-emitting structure layer away from the substrate; the mirror reflection layer at least covers the non-light-emitting area; the interference adjustment layer is located on a side of the mirror reflection layer away from the light-emitting structure layer; the interference adjustment layer is configured to cause light of some colors to interfere and destructively form a mirror display of a set color.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] With the rapid development of display technology, various new technologies are constantly emerging, and the functions of display devices are becoming more diverse. For example, mirror display devices have both image display functions and mirror imaging functions, which can meet people's various needs and are increasingly widely used. Summary of the invention

[0003] In one aspect, a display panel is provided. The display panel includes a substrate, a light emitting structure layer, a mirror reflection layer, and an interference adjustment layer. The light emitting structure layer is located on one side of the substrate; the light emitting structure layer includes a plurality of light emitting areas and a non-light emitting area separating the plurality of light emitting areas; the mirror reflection layer is located on a side of the light emitting structure layer away from the substrate; the mirror reflection layer at least covers the non-light emitting area; the interference adjustment layer is located on a side of the mirror reflection layer away from the light emitting structure layer; the interference adjustment layer is configured to cause light of some colors to interfere with each other to form a mirror display of a set color.

[0004] In some embodiments, the interference adjustment layer includes: at least two first refractive index layers stacked together; and a second refractive index layer located between every two adjacent first refractive index layers; the refractive index of the second refractive index layer is greater than the refractive index of the first refractive index layer.

[0005] In some embodiments, the material of the first refractive index layer includes silicon dioxide or magnesium fluoride; and / or the material of the second refractive index layer includes metal.

[0006] In some embodiments, the thickness of the first refractive index layer is any one of 135nm±5nm, 155nm±5nm, 170nm±5nm, 195nm±5nm, 210nm±5nm, 225nm±5nm or 240nm±5nm; the thickness of the second refractive index layer is 4nm±1nm.

[0007] In some embodiments, the interference adjustment layer is a single-layer structure; wherein the material of the interference adjustment layer includes at least one of tantalum metal and molybdenum oxide; or, the material of the interference adjustment layer includes at least one of molybdenum dioxide, iron oxide and indium oxide; or, the material of the interference adjustment layer includes at least one of niobium carbide and zinc oxide.

[0008] In some embodiments, for light with a wavelength of 550 nm, the refractive index of the interference adjustment layer is 2.3-2.6, and the extinction coefficient is 0.57-0.77.

[0009] In some embodiments, the thickness of the interference modulation layer is any one of 35nm±5nm, 45nm±5nm, or 55nm±5nm.

[0010] In some embodiments, the thickness of the interference adjustment layer is 15nm±1nm; the display panel also includes: a light-transmitting adjustment layer, located between the mirror reflection layer and the interference adjustment layer; the thickness of the light-transmitting adjustment layer is any one of 25nm±2nm, 33nm±2nm or 50nm±2nm.

[0011] In some embodiments, the interference regulation layer includes a plurality of first openings exposing the plurality of light emitting regions.

[0012] In some embodiments, the thickness of the specular reflection layer is 330 nm ± 5 nm.

[0013] In some embodiments, the mirror reflection layer is a semi-transmissive and semi-reflective layer, and the mirror reflection layer also covers the multiple light-emitting areas; or, the mirror reflection layer is a metal reflection layer, and the metal reflection layer includes a plurality of second openings exposing the multiple light-emitting areas.

[0014] In some embodiments, the display panel further includes an encapsulation layer, a protective cover plate, and an optical adhesive layer. The encapsulation layer is located between the light emitting structure layer and the mirror reflection layer; the encapsulation layer is configured to encapsulate the light emitting structure layer on the substrate; the protective cover plate is located on a side of the interference adjustment layer away from the mirror reflection layer, and the protective cover plate is configured to protect the interference adjustment layer, the mirror reflection layer, and the light emitting structure layer; the optical adhesive layer is located between the interference adjustment layer and the protective cover plate; the optical adhesive layer is configured to bond the protective cover plate to a side of the interference adjustment layer away from the mirror reflection layer.

[0015] In another aspect, a display device is provided, wherein the display device comprises the display panel described in any one of the above embodiments.

[0016] In another aspect, a method for manufacturing a display panel is provided. The method for manufacturing a display panel includes: providing a substrate; forming a light-emitting structure layer on one side of the substrate, the light-emitting structure layer including a plurality of light-emitting areas and a non-light-emitting area separating the plurality of light-emitting areas; forming a mirror reflection layer on a side of the light-emitting structure layer away from the substrate, the mirror reflection layer at least covering the non-light-emitting area; forming an interference adjustment layer on a side of the mirror reflection layer away from the light-emitting structure layer, the interference adjustment layer being configured to cause light of some colors to interfere with each other to form a mirror display of a set color.

[0017] In some embodiments, an interference adjustment layer is formed on a side of the mirror reflection layer away from the light emitting structure layer, including: first refractive index layers and second refractive index layers are alternately formed in sequence on a side of the mirror reflection layer away from the light emitting structure layer, the number of first refractive index layers is one more than the number of second refractive index layers; and the refractive index of the first refractive index layer is less than the refractive index of the second refractive index layer.

[0018] In some embodiments, forming an interference adjustment layer on a side of the mirror reflection layer away from the light emitting structure layer further comprises: etching all the first refractive index layers and all the second refractive index layers to form a plurality of first openings exposing the plurality of light emitting regions.

[0019] In some embodiments, an interference adjustment layer is formed on a side of the mirror reflection layer away from the light emitting structure layer, comprising: forming an interference adjustment layer with a single-layer structure on a side of the mirror reflection layer away from the light emitting structure layer; wherein the material forming the interference adjustment layer includes at least one of tantalum metal and molybdenum oxide; or, the material forming the interference adjustment layer includes at least one of molybdenum dioxide, ferric oxide and indium oxide; or, the material forming the interference adjustment layer includes at least one of niobium carbide and zinc oxide.

[0020] In some embodiments, the thickness of the interference adjustment layer is any one of 35nm±5nm, 45nm±5nm or 55nm±5nm; the interference adjustment layer is formed on a side of the mirror reflection layer away from the light-emitting structure layer, and also includes: etching the interference adjustment layer in a single-layer structure to form a plurality of first openings exposing the plurality of light-emitting areas.

[0021] In some embodiments, the thickness of the interference adjustment layer is 15nm±1nm; before the interference adjustment layer is formed on the side of the mirror reflection layer away from the light-emitting structure layer, the method for manufacturing the display panel also includes: forming a light-transmitting adjustment layer on the side of the mirror reflection layer away from the light-emitting structure layer, and the thickness of the light-transmitting adjustment layer is any one of 25nm±2nm, 33nm±2nm or 50nm±2nm.

[0022] In some embodiments, a mirror reflection layer is formed on a side of the light emitting structure layer away from the substrate, including: forming a metal reflection film on a side of the light emitting structure layer away from the substrate, and etching the metal reflection film to form a mirror reflection layer including a plurality of second openings, wherein the plurality of second openings expose the plurality of light emitting areas; or forming a semi-transparent and semi-reflective film on a side of the light emitting structure layer away from the substrate, wherein the semi-transparent and semi-reflective film covers the plurality of light emitting areas and the non-light emitting areas, and the semi-transparent and semi-reflective film is a mirror reflection layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions in the present disclosure, the following briefly introduces the drawings required to be used in some embodiments of the present disclosure. Obviously, the drawings described below are only drawings of some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can also be obtained based on these drawings. In addition, the drawings described below can be regarded as schematic diagrams, and are not limitations on the actual size of the product involved in the embodiments of the present disclosure, the actual process of the method, the actual timing of the signal, etc.

[0024] Figure 1 is a structural diagram of a display panel according to some embodiments;

[0025] Figure 2 is a structural diagram of a light-emitting structure layer according to some embodiments;

[0026] Figure 3 is a structural diagram of another display panel according to some embodiments;

[0027] Figure 4 is a light propagation route diagram according to some embodiments;

[0028] Figure 5 is a structural diagram of an interference adjustment layer according to some embodiments;

[0029] Fig. 6A is a graph showing the reflectivity test results of an interference adjustment layer to different color lights according to some embodiments;

[0030] Figure 6B is a color coordinate result diagram according to some embodiments;

[0031] Fig. 7A is a graph showing the reflectivity test results of another interference adjustment layer to different color lights according to some embodiments;

[0032] Figure 7B is another color coordinate result diagram according to some embodiments;

[0033] Figure 8 is a structural diagram of another display panel according to some embodiments;

[0034] Fig.9A is a graph showing a reflectivity test result of a display panel to different color lights according to some embodiments;

[0035] Fig. 9B is another color coordinate result diagram according to some embodiments;

[0036] Fig.10 is a structural diagram of yet another display panel according to some embodiments;

[0037] Fig.11 is a flow chart of a method for manufacturing a display panel according to some embodiments;

[0038] Fig.12 is a flow chart of another method for manufacturing a display panel according to some embodiments;

[0039] Fig.13 is a flow chart of yet another method for manufacturing a display panel according to some embodiments;

[0040] Fig.14 is a flow chart of another method for manufacturing a display panel according to some embodiments;

[0041] Fig.15 is a flow chart of another method for manufacturing a display panel according to some embodiments;

[0042] Fig.16 is a flow chart of another method for manufacturing a display panel according to some embodiments;

[0043] Fig.17 is a flow chart of another method for manufacturing a display panel according to some embodiments;

[0044] Fig.18 is a structural diagram of a display device according to some embodiments. DETAILED DESCRIPTION

[0045] The following will be combined with the accompanying drawings to clearly and completely describe the technical solutions in some embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments provided by the present disclosure, all other embodiments obtained by ordinary technicians in this field belong to the scope of protection of the present disclosure.

[0046] Unless the context requires otherwise, throughout the specification and claims, the term "comprise" and other forms thereof, such as the third person singular form "comprises" and the present participle form "comprising", are to be interpreted as open, inclusive, that is, "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiments", "example", "specific example" or "some examples" and the like are intended to indicate that specific features, structures, materials or characteristics associated with the embodiment or example are included in at least one embodiment or example of the present disclosure. The schematic representation of the above terms does not necessarily refer to the same embodiment or example. In addition, the specific features, structures, materials or characteristics may be included in any one or more embodiments or examples in any appropriate manner.

[0047] In the following, the terms "first" and "second" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present disclosure, unless otherwise specified, "plurality" means two or more.

[0048] “At least one of A, B, and C” has the same meaning as “at least one of A, B, or C” and both include the following combinations of A, B, and C: A only, B only, C only, the combination of A and B, the combination of A and C, the combination of B and C, and the combination of A, B, and C.

[0049] “A and / or B” includes the following three combinations: A only, B only, and a combination of A and B.

[0050] The use of "adapted to" or "configured to" herein is meant to be open and inclusive language that does not exclude devices adapted or configured to perform additional tasks or steps.

[0051] Additionally, the use of “based on” is meant to be open and inclusive, as a process, step, calculation, or other action “based on” one or more stated conditions or values ​​may, in practice, be based on additional conditions or values ​​beyond those stated.

[0052] As used herein, "about" or "approximately" includes the stated value and the average value that is within an acceptable range of deviation from the particular value, where the acceptable range of deviation is determined by one of ordinary skill in the art taking into account the measurements in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system).

[0053] Exemplary embodiments are described herein with reference to cross-sectional views and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are conceivable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of regions of the device, and are not intended to limit the scope of the exemplary embodiments.

[0054] The mirror display device in the related art uses a metal reflective layer to directly reflect incident light to achieve the mirror function. However, the light reflectivity of the metal reflective layer is high. When the user uses the mirror function of the mirror display device, the mirror color is single and easily makes the user feel dazzling.

[0055] Based on this, Figure 1 As shown, some embodiments of the present disclosure provide a display panel 100, which includes a substrate 10, a light emitting structure layer 20, a mirror reflection layer 30, and an interference adjustment layer 40. The light emitting structure layer 20 is located on one side of the substrate 10. The light emitting structure layer 20 includes a plurality of light emitting areas 201 and a non-light emitting area 202 separating the plurality of light emitting areas 201. The mirror reflection layer 30 is located on a side of the light emitting structure layer 20 away from the substrate 10. The mirror reflection layer 30 at least covers the non-light emitting area 202. The interference adjustment layer 40 is located on a side of the mirror reflection layer 30 away from the light emitting structure layer 20. The interference adjustment layer 40 is configured to cause light of some colors to interfere and destructively form a mirror display of a set color.

[0056] The material of the substrate 10 may be polyimide (PI for short).

[0057] The light emitting structure layer 20 includes a plurality of light emitting regions 201. For example, the light emitting structure layer 20 may include a plurality of red light emitting regions 201a, a plurality of green light emitting regions 201b, and a plurality of blue light emitting regions 201c (eg, Figure 2As shown). Alternatively, the light emitting structure layer 20 may include a plurality of red light emitting areas, a plurality of green light emitting areas, a plurality of blue light emitting areas, and a plurality of white light emitting areas. The display panel 100 can realize the display function by driving the light emitting devices in the plurality of light emitting areas 201 to emit light. The present disclosure does not limit the number of light emitting areas 201, the arrangement of light emitting areas 201 of different colors, and the size of the light emitting areas 201, as long as the display panel 100 can display the picture.

[0058] Exemplarily, the display panel 100 may be an OLED display panel, in which case the light-emitting device in the light-emitting structure layer 20 may be an organic light-emitting diode. Based on this, the light-emitting structure layer 20 may include an anode layer, an organic light-emitting layer, and a cathode layer. Alternatively, the light-emitting structure layer 20 may include an anode layer, a hole transport layer, an organic light-emitting layer, an electron transport layer, and a cathode layer. Alternatively, the light-emitting structure layer 20 may include an anode layer, a hole injection layer, a hole transport layer, an organic light-emitting layer, an electron transport layer, an electron injection layer, and a cathode layer.

[0059] The above-mentioned “the mirror reflection layer 30 at least covers the non-luminous area 202 ” may mean that the mirror reflection layer 30 only covers the non-luminous area 202 , or may mean that the mirror reflection layer 30 covers the multiple luminous areas 201 and the non-luminous area 202 at the same time.

[0060] In some embodiments, Figure 1 As shown, the mirror reflection layer 30 only covers the non-luminous area 202. In this case, the mirror reflection layer 30 may be a metal reflection layer 31, and the metal reflection layer 31 may include a plurality of second openings 301 exposing a plurality of luminous areas 201. In this way, not only can the metal reflection layer 31 be used to effectively reflect the light incident to the display panel 100, but also the light emitted by the luminous area 201 is prevented from being blocked by the mirror reflection layer 30, so that the display panel 100 cannot display normally.

[0061] The mirror reflection layer 30 may be a single-layer metal reflection layer. For example, the material of the mirror reflection layer 30 may include at least one of aluminum, molybdenum, titanium, silver, and copper.

[0062] Alternatively, the mirror reflection layer 30 may also be a multilayer structure including a metal reflection layer. Exemplarily, the mirror reflection layer 30 may include a titanium metal layer, an aluminum metal layer, and a titanium metal layer stacked in sequence. Alternatively, the mirror reflection layer 30 may include an indium tin oxide layer, a silver metal layer, and an indium tin oxide layer stacked in sequence.

[0063] In other embodiments, Figure 3As shown, the mirror reflection layer 30 covers the multiple light-emitting areas 201 and the non-light-emitting areas 202 at the same time. At this time, the mirror reflection layer 30 can be a semi-transparent and semi-reflective layer 32, and the light emitted by the light-emitting area 201 can pass through the mirror reflection layer 30 and emit, so there is no need to set an opening on the mirror reflection layer 30, thereby simplifying the manufacturing process of the mirror reflection layer 30, saving time and reducing the manufacturing cost.

[0064] Exemplarily, the semi-transmissive and semi-reflective layer 32 may be a reflective polarizing optical sheet, or may be a multi-layer optical film in which a reflective polarizing optical sheet and a polarizing sheet are combined.

[0065] In some embodiments, the thickness of the mirror reflection layer 30 may be 330 nm ± 5 nm. Here, “330 nm ± 5 nm” means that the thickness of the mirror reflection layer 30 may be 330 nm, and the mirror reflection layer 30 is allowed to have a deviation of ± 5 nm in thickness, which may be caused by the process when forming the mirror reflection layer 30.

[0066] It should be noted that visible light is the part of the electromagnetic spectrum that can be perceived by the human eye. The range of electromagnetic waves that can be perceived by the average human eye is 400nm to 760nm. Some people can also perceive electromagnetic waves with wavelengths between about 380nm and 780nm. Visible light of various colors corresponds to different wavelength ranges. For example, the wavelength range corresponding to purple light is 400nm to 450nm, the wavelength range corresponding to blue light is 450nm to 480nm, the wavelength range corresponding to green-blue light is 480nm to 490nm, the wavelength range corresponding to blue-green light is 490nm to 500nm, the wavelength range corresponding to green light is 500nm to 560nm, the wavelength range corresponding to yellow-green light is 560nm to 580nm, the wavelength range corresponding to yellow light is 580nm to 610nm, the wavelength range corresponding to orange light is 610nm to 650nm, and the wavelength range corresponding to red light is 650nm to 760nm.

[0067] Among them, interference is the phenomenon that two or more waves overlap in space and form a new waveform. The conditions for interference are: the vibration frequency of the two light waves is the same, and the two light waves have a fixed phase difference at the meeting point. Interference destructive, that is, in the interference of light, the peaks and troughs of the two light waves meet, and the amplitude is equal to zero.

[0068] Based on this, see Figure 4The interference adjustment layer 40 makes some colors of light interfere with each other. For example, part of the light L of a certain color is reflected on the upper surface of the interference adjustment layer 40 to obtain light a1. The other part is transmitted into the interference adjustment layer 40, and is reflected on the lower surface of the interference adjustment layer 40, and finally emitted from the upper surface of the interference adjustment layer 40 to obtain light a2. The interference adjustment layer 40 makes the path difference between the light a1 and the light a2 an odd multiple of half the wavelength of the color light, so that the light a1 and a2 meet at the peak and valley in the interference, and the amplitude becomes zero.

[0069] In some embodiments of the present disclosure, the interference adjustment layer 40 is disposed on the side of the mirror reflection layer 30 away from the light emitting structure layer 20, and the interference adjustment layer 40 is used to make the light of some colors interfere with each other. On the one hand, it can effectively reduce the intensity of the light reflected by the display panel 100, so that the color of the mirror display screen of the display panel 100 is darker, and the user is not easy to feel glare or dazzling when using the mirror function of the display panel 100. On the other hand, such a setting can also make the display panel 100 form a mirror display of a set color, making the display panel more beautiful and improving the fashionability of the display panel 100.

[0070] In some embodiments, Figure 5 As shown, the interference adjustment layer 40 includes at least two stacked first refractive index layers 41 and a second refractive index layer 42 between every two adjacent first refractive index layers 41. The refractive index of the second refractive index layer 42 is greater than that of the first refractive index layer 41.

[0071] Wherein, for example, the interference adjustment layer 40 may include a first refractive index layer 41, a second refractive index layer 42, a first refractive index layer 41, a second refractive index layer 42, a first refractive index layer 41 (such as Figure 5 As shown). Alternatively, the interference adjustment layer 40 may include a first refractive index layer 41, a second refractive index layer 42, and a first refractive index layer 41 stacked in sequence. Alternatively, the interference adjustment layer 40 may include a first refractive index layer 41, a second refractive index layer 42, a first refractive index layer 41, a second refractive index layer 42, a first refractive index layer 41, a second refractive index layer 42, and a first refractive index layer 41 stacked in sequence. The number of layers of the first refractive index layer 41 and the number of layers of the second refractive index layer 42 in the present disclosure are not limited thereto, as long as the light of some colors can be destructively interfered.

[0072] Among them, the outermost layer of the interference adjustment layer 40 is set as the first refractive index layer 41 with a low refractive index, so that more light irradiated to the interference adjustment layer 40 from the side of the interference adjustment layer 40 away from the mirror reflection layer 30 can be incident on the interference adjustment layer 40. At the same time, since the interference adjustment layer 40 includes a structure in which the first refractive index layer 41 with a low refractive index and the second refractive index layer 42 with a high refractive index overlap each other, the multi-beam interference principle can be used to make some color lights interfere and destruct, so that the mirror color formed by the interference adjustment layer 40 is darker.

[0073] In some embodiments, the material of the first refractive index layer 41 may include silicon dioxide (SiO 2 ) or magnesium fluoride (MgF).

[0074] In some embodiments, the refractive index of the first refractive index layer 41 is 1.3-1.5.

[0075] In some embodiments, the material of the second refractive index layer 42 may include metal. Exemplarily, the material of the second refractive index layer 42 may be any one of aluminum, molybdenum, titanium, silver, and copper. The thickness of the second refractive index layer 42 may be 4nm±1nm. That is, the thickness of the second refractive index layer 42 may be 4nm, and the thickness of the second refractive index layer 42 may have a deviation of ±1nm, which may be caused by the process when forming the second refractive index layer 42.

[0076] In some embodiments, the thickness of the first refractive index layer 41 may be any one of 135nm±5nm, 155nm±5nm, 170nm±5nm, 195nm±5nm, 210nm±5nm, 225nm±5nm, or 240nm±5nm. It should be noted that "±5nm" means that the thickness of the first refractive index layer 41 may have a deviation of ±5nm. This deviation may be caused by the process when forming the first refractive index layer 41.

[0077] For example, when the material of the mirror reflection layer 30 is molybdenum metal, the material of the first refractive index layer 41 is silicon dioxide, the material of the second refractive index layer 42 is titanium metal, the thickness of the mirror reflection layer 30 is 330nm, the thickness of the second refractive index layer 42 is 4nm, and the thickness of the first refractive index layer 41 is 135nm, 155nm, 170nm, 195nm, 210nm, 225nm, and 240nm respectively, the test results of the reflectivity (i.e., the ratio of the intensity of the reflected light to the intensity of the incident light) of each wavelength after being reflected by the interference adjustment layer 40 are as follows: Fig. 6A shown.

[0078] Combination Fig. 6AIt can be seen that when the thickness of the first refractive index layer 41 is 135nm, the reflectivity of the light with a wavelength range of approximately 410nm to 430nm is the highest, that is, the interference adjustment layer 40 reflects the most purple light, and the interference adjustment layer 40 can form a purple mirror display. When the thickness of the first refractive index layer 41 is 155nm, the reflectivity of the light with a wavelength range of approximately 460nm to 480nm is the highest, that is, the interference adjustment layer 40 reflects the most blue light, so the interference adjustment layer 40 can form a blue mirror display. When the thickness of the first refractive index layer 41 is 170nm, the reflectivity of the light with a wavelength range of approximately 510nm to 530nm is the highest, that is, the interference adjustment layer 40 reflects the most green light, and the interference adjustment layer 40 can form a green mirror display. When the thickness of the first refractive index layer 41 is 195nm, the reflectivity of the light with a wavelength range of approximately 580nm to 600nm is the highest, that is, the interference adjustment layer 40 reflects the most yellow light, and the interference adjustment layer 40 can form a yellow mirror display. When the thickness of the first refractive index layer 41 is 210nm, the reflectivity of the light with a wavelength range of approximately 620nm to 640nm is the highest, that is, the interference adjustment layer 40 reflects the most orange light, and the interference adjustment layer 40 can form an orange mirror display. When the thickness of the first refractive index layer 41 is 225nm, the reflectivity of the light with a wavelength range of approximately 670nm to 690nm is the highest, that is, the interference adjustment layer 40 reflects the most red light, and the interference adjustment layer 40 can form a red mirror display. When the thickness of the first refractive index layer 41 is 240 nm, the reflectivity of light with a wavelength range of approximately 710 nm to 730 nm is the highest, that is, the interference adjustment layer 40 reflects the most purple-red light, and the interference adjustment layer 40 can form a purple-red mirror display.

[0079] In addition, based on Fig. 6A The reflectivity curve shown in the figure can also calculate the three stimulation values ​​of X, Y, and Z in combination with the light source spectrum and the human eye color matching function. The color coordinate value can be calculated based on the three stimulation values ​​of X, Y, and Z, and the color of the light reflected by the interference adjustment layer 40 can be obtained using the color coordinate value and the CIE chromaticity diagram.

[0080] For example, the three stimulus values ​​X, Y, and Z can be calculated using formula (1), formula (2), and formula (3) respectively, and the color coordinate value can be calculated using formula (4) and formula (5).

[0081]

[0082]

[0083]

[0084] x=X / (X+Y+Z) (4)

[0085] y=Y / (X+Y+Z) (5)

[0086] Among them, R(λ) represents the reflectivity of light with a wavelength of λ, and S(λ) represents the energy of light with a wavelength of λ in natural light sources. Represents the color matching function value of light with a wavelength of λ, where λ is the wavelength of the light wave.

[0087] Using the above formula, it can be calculated that: when the thickness of the first refractive index layer 41 is 135nm, the color coordinate value of the light reflected by the interference adjustment layer 40 is x=0.24, y=0.11; when the thickness of the first refractive index layer 41 is 155nm, the color coordinate value of the light reflected by the interference adjustment layer 40 is x=0.15, y=0.18; when the thickness of the first refractive index layer 41 is 170nm, the color coordinate value of the light reflected by the interference adjustment layer 40 is x=0.21, y=0.46; when the thickness of the first refractive index layer 41 is 195nm When the thickness of the first refractive index layer 41 is 210 nm, the color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.47 and y=0.49; when the thickness of the first refractive index layer 41 is 210 nm, the color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.55 and y=0.40; when the thickness of the first refractive index layer 41 is 225 nm, the color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.57 and y=0.32; when the thickness of the first refractive index layer 41 is 240 nm, the color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.42 and y=0.23.

[0088] On this basis, combined Figure 6BIt can be seen that when the thickness of the first refractive index layer 41 is 135nm, the color coordinate point is located in the purple area, and the coordinate point is close to the edge of the chromaticity diagram, that is, the interference adjustment layer 40 can reflect dark purple light to form a dark purple mirror display; when the thickness of the first refractive index layer 41 is 155nm, the color coordinate point is located in the blue area, and the coordinate point is close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark blue light to form a dark blue mirror display; when the thickness of the first refractive index layer 41 is 170nm, the color coordinate point is located in the green area, and the coordinate point is relatively close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark green light to form a dark green mirror display; when the thickness of the first refractive index layer 41 is 195nm, the color coordinate point is located in the yellow area, When the coordinate point is close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark yellow light to form a dark yellow mirror display; when the thickness of the first refractive index layer 41 is 210nm, the color coordinate point is located in the orange area, and the coordinate point is close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark orange light to form a dark orange mirror display; when the thickness of the first refractive index layer 41 is 225nm, the color coordinate point is located in the red area, and the coordinate point is close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark red light to form a dark red mirror display; when the thickness of the first refractive index layer 41 is 240nm, the color coordinate point is located in the purple-red area, and the coordinate point is close to the edge of the chromaticity diagram, the interference adjustment layer 40 reflects dark purple-red light to form a dark purple-red mirror display.

[0089] In this way, when some embodiments of the present disclosure adopt the structure of the above-mentioned interference adjustment layer 40, the color of the mirror formed by the reflection of the display panel 100 can be adjusted by changing the thickness of the first refractive index layer 41, and the color of the mirror can be any one of dark purple, dark blue, dark green, dark yellow, dark orange, dark red or dark purple.

[0090] In some embodiments, see Figure 1 and Figure 5 When the interference adjustment layer 40 includes at least two first refractive index layers 41 and a second refractive index layer 42 located between each two adjacent first refractive index layers 41 , the interference adjustment layer 40 may further include a plurality of first openings 401 exposing the plurality of light emitting regions 201 .

[0091] By setting a plurality of first openings 401 on the interference adjustment layer 40 to expose a plurality of light-emitting areas 201, the light emitted by the light-emitting device in the light-emitting area 201 can avoid passing through the interference adjustment layer 40, thereby reducing the energy loss of the light emitted by the light-emitting device, thereby achieving mirror color display while ensuring that the display panel 100 can display the image normally.

[0092] In other embodiments, the interference adjustment layer 40 may be a single-layer structure. In this case, the material of the interference adjustment layer 40 may include at least one of tantalum metal (Ta) and molybdenum oxide (MoOx). Alternatively, the material of the interference adjustment layer 40 includes at least one of molybdenum dioxide (MoO2), iron oxide (Fe2O3) and indium oxide (In2O3). Alternatively, the material of the interference adjustment layer 40 includes at least one of niobium carbide (NbC) and zinc oxide (ZnO).

[0093] Exemplarily, when the material of the interference adjustment layer 40 is a mixture of tantalum metal and molybdenum oxide, by adjusting the ratio of tantalum metal to molybdenum oxide, the refractive index of the interference adjustment layer 40 can be approximately 2.37 and the extinction coefficient can be approximately 0.77 for light with a wavelength of 550 nm. When the material of the interference adjustment layer 40 is a mixture of molybdenum dioxide, ferric oxide and indium trioxide, by adjusting the ratio of molybdenum dioxide, ferric oxide and indium trioxide, the refractive index of the interference adjustment layer 40 can be approximately 2.59 and the extinction coefficient can be approximately 0.64 for light with a wavelength of 550 nm. When the material of the interference adjustment layer 40 is a mixture of niobium carbide and zinc oxide, by adjusting the ratio of niobium carbide and zinc oxide, the refractive index of the interference adjustment layer can be approximately 2.42 and the extinction coefficient can be approximately 0.57 for light with a wavelength of 550 nm.

[0094] The material of the interference adjustment layer 40 provided in some embodiments of the present disclosure is not limited thereto. For example, the material of the interference adjustment layer 40 may also be other materials that meet the condition that "for light with a wavelength of 550nm, the refractive index of the interference adjustment layer is 2.3-2.6, and the extinction coefficient is 0.57-0.77".

[0095] By utilizing the single-layer interference adjustment layer provided by some of the above embodiments, the absorption effect of the interference adjustment layer 40 on the light incident to the display panel 100 can be improved, thereby achieving a dark mirror display of the display panel 100 .

[0096] When the interference adjustment layer 40 is a single-layer structure, in some embodiments, the material of the mirror reflection layer 30 can be aluminum metal, so that the mirror color gamut formed by the interference adjustment layer 40 is wider, that is, the color coordinate points are more dispersed in the chromaticity diagram and closer to the edge of the chromaticity diagram, and the color displayed by the mirror can be darker.

[0097] In some embodiments, the thickness of the interference adjustment layer 40 may be any one of 35nm±5nm, 45nm±5nm, or 55nm±5nm, where “±5nm” means that the thickness of the interference adjustment layer 40 may have a deviation of ±5nm, which may be caused by the process of forming the interference adjustment layer 40, for example.

[0098] For example, when the material of the mirror reflection layer 30 is aluminum metal, the material of the interference adjustment layer 40 includes niobium carbide and zinc oxide, the thickness of the mirror reflection layer 30 is 330nm, and the thickness of the interference adjustment layer 40 is 35nm, 45nm, and 55nm, the test results of the reflectivity of each wavelength of light after being reflected by the interference adjustment layer 40 are as follows: Fig. 7A shown.

[0099] On this basis, according to Fig. 7A The reflectivity curve shown in FIG. 1 is combined with the light source spectrum distribution and the color matching function of the human eye, and the above formulas (1), (2), and (3) can be used to calculate the three stimulus values ​​X, Y, and Z of the light reflected by the interference adjustment layer 40 when the thickness of the interference adjustment layer 40 is 35 nm, 45 nm, and 55 nm, respectively. Based on the three stimulus values ​​X, Y, and Z of the light reflected by the interference adjustment layer 40, the color coordinate values ​​of the light reflected by the interference adjustment layer 40 can be calculated according to the above formulas (4) and (5). The color coordinate values ​​and the CIE chromaticity diagram can be used to determine the color reflected by the interference adjustment layer 40 when the thickness of the interference adjustment layer 40 is 35 nm, 45 nm, and 55 nm, respectively.

[0100] When the thickness of the interference adjustment layer 40 is 35nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.5, y=0.45; when the thickness of the interference adjustment layer 40 is 45nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.32, y=0.15; when the thickness of the interference adjustment layer 40 is 55nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.17, y=0.18.

[0101] Combination Figure 7B It can be seen that when the thickness of the interference adjustment layer 40 is 35nm, the color coordinate point is located in the yellow area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark yellow light to form a dark yellow mirror display; when the thickness of the interference adjustment layer 40 is 45nm, the color coordinate point is located in the purple area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark purple light to form a dark purple mirror display; when the thickness of the interference adjustment layer 40 is 55nm, the color coordinate point is located in the blue area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark blue light to form a dark blue mirror display.

[0102] In this way, a single-layer interference adjustment layer 40 is formed on the side of the mirror reflection layer 30 away from the light emitting structure layer 20. On the one hand, the intensity of light reflected by the display panel 100 can be reduced, and the mirror display color can be darker, so that the user is not easily glared or dazzled when using the display panel 100. On the other hand, by changing the thickness of the interference adjustment layer 40, the display panel 100 can display a dark yellow mirror, a dark purple mirror, or a dark blue mirror, thereby improving the fashionability of the display panel 100.

[0103] In some embodiments, Figure 1 As shown, when the interference adjustment layer 40 is the above-mentioned single-layer structure, the interference adjustment layer 40 may include a plurality of first openings 401 exposing a plurality of light-emitting areas 201. In this way, when the display panel 100 drives the light-emitting device in the light-emitting area 201 to emit light, the light emitted by the light-emitting device may not pass through the interference adjustment layer 40, thereby reducing the loss of light emitted from the light-emitting area 201, so that the display panel 100 can realize mirror color display while ensuring that the display panel 100 can display normal pictures.

[0104] In some other embodiments, Figure 8 As shown, the thickness of the interference adjustment layer 40 is 15nm±1nm. “15nm±1nm” means that the thickness of the interference adjustment layer 40 can be 15nm, and the interference adjustment layer 40 is allowed to have a deviation of ±1nm in thickness, which may be caused by the process of forming the interference adjustment layer 40.

[0105] On this basis, the display panel 100 may further include a light transmission adjustment layer 50. The light transmission adjustment layer 50 may be disposed between the specular reflection layer 30 and the interference adjustment layer 40, and the thickness of the light transmission adjustment layer 40 may be any one of 25nm±2nm, 33nm±2nm, or 50nm±2nm. Here, "±2nm" means that the light transmission adjustment layer 50 may have a deviation of ±2nm in thickness, and such a deviation may be caused by, for example, the process when the light transmission adjustment layer 50 is formed.

[0106] By providing the light-transmitting adjustment layer 50, the thickness of the interference adjustment layer 40 can be reduced, the transmittance of the interference adjustment layer 40 can be increased, and when the display panel 100 realizes the display function, even if the light emitted from the light-emitting area 201 passes through the interference adjustment layer 40, the energy loss is small, and the interference adjustment layer 40 has a small impact on the display effect of the display panel 100. Based on this, there is no need to provide openings at the positions of the interference adjustment layer 40 corresponding to the plurality of light-emitting areas 201, so that when the interference adjustment layer 40 is manufactured, there is no need to etch the openings, which simplifies the process and reduces the cost.

[0107] For example, when the material of the mirror reflection layer 30 is molybdenum metal, the material of the interference adjustment layer 40 includes niobium carbide and zinc oxide, the material of the light transmission adjustment layer 50 is indium tin oxide, the thickness of the mirror reflection layer is 330nm, the thickness of the interference adjustment layer 40 is 15nm, and the thickness of the light transmission adjustment layer 50 is 25nm, 33nm, and 50nm, the test results of the reflectivity of light of different wavelengths after being reflected by the display panel 100 are as follows: Fig.9A shown.

[0108] On this basis, according to Fig.9A The reflectivity curve shown in the figure, combined with the light source spectrum distribution and the color matching function of the human eye, can be used to obtain the three stimulus values ​​X, Y, and Z of the light emitted by the interference adjustment layer 40 when the transparent adjustment layer 50 is 25nm, 33nm, and 50nm respectively using the above formulas (1), (2), and (3). Based on the three stimulus values ​​X, Y, and Z, the color coordinate values ​​of the light emitted by the interference adjustment layer 40 can be calculated using the above formulas (4) and (5). The color of the light emitted by the interference adjustment layer 40 can be determined based on the color coordinate values ​​and the CIE chromaticity diagram.

[0109] When the thickness of the transparent adjustment layer 50 is 25nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.52, y=0.45; when the thickness of the transparent adjustment layer 50 is 33nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.36, y=0.18; when the thickness of the transparent adjustment layer 50 is 50nm, the calculated color coordinate values ​​of the light reflected by the interference adjustment layer 40 are x=0.17, y=0.10.

[0110] Combination Fig. 9B It can be seen that when the thickness of the light-transmitting adjustment layer 50 is 25nm, the color coordinate point is located in the yellow area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark yellow light to form a dark yellow mirror display; when the thickness of the light-transmitting adjustment layer 50 is 33nm, the color coordinate point is located in the purple area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark purple light to form a dark purple mirror display; when the thickness of the light-transmitting adjustment layer 50 is 50nm, the color coordinate point is located in the blue area, and the color coordinate point is close to the edge of the chromaticity diagram, so the interference adjustment layer 40 reflects dark blue light to form a dark blue mirror display.

[0111] In this way, the color of the display mirror of the display panel 100 can be adjusted by changing the thickness of the light transmission adjustment layer 50 , so that the display mirror can display dark yellow, dark purple or dark blue, thereby improving the fashionability of the display panel 100 .

[0112] For example, the material of the light transmission adjustment layer 50 may be indium tin oxide (ITO). Alternatively, the material of the light transmission adjustment layer 50 may be silicon nitride (SiNx). Alternatively, for example, the material of the light transmission adjustment layer 50 may be silicon dioxide (SiO2).

[0113] In some embodiments, Figure 1 , Figure 3 , Figure 8 , Fig.10 As shown, the display panel 100 further includes an encapsulation layer 60. The encapsulation layer 60 is located between the light emitting structure layer 20 and the mirror reflection layer 30. The encapsulation layer 60 is configured to encapsulate the light emitting structure layer 20 on the substrate 10. Wherein, when the display panel 100 is an organic light emitting diode (OLED) display panel, the light emitting structure layer may be a light emitting functional layer (for example, including an anode, an organic light emitting structure layer and a cathode). At this time, providing the encapsulation layer 60 between the light emitting structure layer 201 and the mirror reflection layer 30 can also help protect the light emitting structure layer 201 and prevent the light emitting structure layer 201 from being corroded by water vapor.

[0114] For example, the encapsulation layer 60 may be a multi-layer structure, including an inorganic material layer, an organic material layer, and an inorganic material layer stacked in sequence, wherein the organic material layer is disposed between two inorganic material layers.

[0115] In some embodiments, Fig.10 As shown, the display panel 100 may further include an optical adhesive layer 70 and a protective cover plate 80. The protective cover plate 80 is located on a side of the interference adjustment layer 40 away from the mirror reflection layer 30, and the protective cover plate 80 is configured to protect the interference adjustment layer 40, the mirror reflection layer 30 and the light emitting structure layer 20. The optical adhesive layer 70 is located between the interference adjustment layer 40 and the protective cover plate 80, and the optical adhesive layer 70 is configured to bond the protective cover plate 80 to a side of the interference adjustment layer 40 away from the mirror reflection layer 30.

[0116] The protective cover plate 80 may be a glass cover plate.

[0117] It should be noted that if Fig.10 As shown, the display panel 100 further includes a circuit structure layer 90 disposed between the light emitting structure layer 20 and the substrate 10. The circuit structure layer 90 is used to drive the light emitting devices in each light emitting area 201 in the light emitting structure layer 20 to emit light.

[0118] In some embodiments, the circuit structure layer 90 may include a plurality of thin film transistors and storage capacitors forming a pixel driving circuit. The thin film transistor may be, for example, a low temperature polycrystalline silicon (LTPS) thin film transistor or an indium gallium zinc oxide (IGZO) thin film transistor. Exemplarily, the circuit structure layer 90 may include an active layer, a first insulating layer, a first gate metal layer, a second insulating layer, a second gate metal layer, an interlayer dielectric layer, a source-drain electrode layer, and a planarization layer that are sequentially away from the substrate 10.

[0119] like Fig.11 As shown, some embodiments of the present disclosure provide a method for manufacturing a display panel, including:

[0120] S1. Provide a substrate 10. By way of example, the material of the substrate 10 may include polyimide.

[0121] S2 . Form a light emitting structure layer 20 on one side of the substrate 10 . The light emitting structure layer 20 includes a plurality of light emitting regions 201 and a non-light emitting region 202 separating the plurality of light emitting regions 201 .

[0122] S3 . Form a specular reflection layer 30 on a side of the light emitting structure layer 20 away from the substrate 10 . The specular reflection layer 30 at least covers the non-light emitting area 202 .

[0123] S4. An interference adjustment layer 40 is formed on a side of the mirror reflection layer 30 away from the light emitting structure layer 20. The interference adjustment layer 40 is configured to cause light of some colors to interfere with each other to form a mirror display of a set color.

[0124] In the display panel manufactured by the display panel manufacturing method provided by some embodiments of the present disclosure, the interference adjustment layer 40 is arranged on the side of the mirror reflection layer 30 away from the light-emitting structure layer 20. The interference adjustment layer 40 can also cause the interference of some colors of light to cancel each other. Therefore, it can not only effectively reduce the intensity of the light reflected by the display panel 100, but also make the color of the mirror display of the display panel 100 darker, so that the user is not easy to feel glare or dazzling when using the display panel. In addition, the display panel 100 can form a mirror display of a set color, thereby improving the fashion of the display panel 100.

[0125] In some embodiments, Fig.12 As shown, S4, forming an interference adjustment layer 40 on a side of the specular reflection layer 30 away from the light emitting structure layer 20, comprising:

[0126] S41, alternately forming a first refractive index layer 41 and a second refractive index layer 42 on the side of the mirror reflection layer 30 away from the light emitting structure layer 20, wherein the number of first refractive index layers 41 is one more than the number of second refractive index layers 42; and the refractive index of the first refractive index layer 41 is less than the refractive index of the second refractive index layer 42.

[0127] In this way, the second refractive index layer 42 is located between each two adjacent first refractive index layers 41, and the outermost layer of the interference adjustment layer 40 is a low refractive index layer, so that more light irradiated to the interference adjustment layer 40 from the side of the interference adjustment layer 40 away from the mirror reflection layer 30 can be incident on the interference adjustment layer 40. At the same time, since the interference adjustment layer 40 includes a structure in which the first refractive index layer 41 with a low refractive index and the second refractive index layer 42 with a high refractive index overlap each other, the principle of multi-beam interference can be used to make the light of some colors interfere and cancel each other, so that the color displayed on the mirror surface is deeper.

[0128] In some embodiments, Fig.13 As shown, S4, forming an interference adjustment layer 40 on a side of the mirror reflection layer 30 away from the light emitting structure layer 20, further comprising:

[0129] S42 , etching all the first refractive index layers 41 and all the second refractive index layers 42 to form a plurality of first openings 401 exposing the plurality of light emitting regions 201 .

[0130] In some embodiments, Fig.14 As shown, S4, forming an interference adjustment layer 40 on a side of the specular reflection layer 30 away from the light emitting structure layer 20, comprising:

[0131] S43 , forming an interference adjustment layer 40 having a single-layer structure on a side of the mirror reflection layer 30 away from the light emitting structure layer 20 .

[0132] Among them, the material forming the interference adjustment layer 40 may include at least one of tantalum metal and molybdenum oxide; or, the material forming the interference adjustment layer 40 includes at least one of molybdenum dioxide, iron oxide and indium oxide; or, the material forming the interference adjustment layer 40 includes at least one of niobium carbide and zinc oxide.

[0133] For example, the thickness of the interference adjustment layer 40 may be any one of 35 nm ± 5 nm, 45 nm ± 5 nm, or 55 nm ± 5 nm. Fig.14 S4, forming an interference adjustment layer 40 on a side of the mirror reflection layer 30 away from the light emitting structure layer 20, further comprising:

[0134] S44 , etching the interference adjustment layer 40 in a single-layer structure to form a plurality of first openings 401 exposing the plurality of light-emitting regions 201 .

[0135] By utilizing the above-mentioned step S42 or step S44 to form a plurality of first openings 401, when the display panel 100 drives the light-emitting device in the light-emitting area 201 to emit light, the light emitted by the light-emitting device can avoid passing through the interference adjustment layer 40, thereby reducing the energy loss of the light emitted by the light-emitting device, thereby ensuring that the display panel 100 can display the image normally while achieving the set color mirror display.

[0136] Exemplarily, the thickness of the interference adjustment layer 40 is 15 nm ± 1 nm. Fig.15 As shown, before the interference adjustment layer 40 is formed on the side of the mirror reflection layer 30 away from the light emitting structure layer 20, the method for manufacturing the display panel further includes:

[0137] S5. Form a light transmission adjustment layer 50 on a side of the mirror reflection layer 30 away from the light emitting structure layer 20. The thickness of the light transmission adjustment layer 50 is any one of 25 nm±2 nm, 33 nm±2 nm or 50 nm±2 nm.

[0138] By providing the light-transmitting adjustment layer 50, the thickness of the interference adjustment layer 40 can be reduced, and the transmittance of the interference adjustment layer 40 can be increased, so that when the display panel 100 realizes the display function, the energy loss of the light emitted from the light-emitting area 201 after passing through the interference adjustment layer 40 is also small. In other words, the interference adjustment layer 40 has a small impact on the display effect of the display panel 100. Based on this, it is not necessary to set openings at the positions of the interference adjustment layer 40 corresponding to the multiple light-emitting areas 201, so that when the interference adjustment layer 40 is manufactured, it is not necessary to etch the openings, thereby simplifying the manufacturing process of the display panel and reducing the cost.

[0139] In some embodiments, Fig.16 As shown, S3, forming a specular reflection layer 30 on a side of the light emitting structure layer 20 away from the substrate 10, comprising:

[0140] S31 , forming a metal reflective film on a side of the light emitting structure layer 20 away from the substrate 10 , and etching the metal reflective film to form a mirror reflective layer 30 including a plurality of second openings 301 , wherein the plurality of second openings 301 expose the plurality of light emitting regions 201 .

[0141] In this way, not only can the mirror reflection layer 30 effectively reflect the light incident on the display panel 100 , but also the light emitted by the light emitting area 201 can be prevented from being blocked by the mirror reflection layer 30 , which would prevent the display panel 100 from being unable to display normally.

[0142] Or, in other embodiments, Fig.17 As shown, S3, forming a specular reflection layer 30 on a side of the light emitting structure layer 20 away from the substrate 10, comprising:

[0143] S32 , forming a semi-transparent and semi-reflective film on the side of the light-emitting structure layer 20 away from the substrate 10 , the semi-transparent and semi-reflective film covering the plurality of light-emitting areas 201 and the non-light-emitting areas 202 , and the semi-transparent and semi-reflective film is a mirror reflection layer 30 .

[0144] In this way, the light emitted by the light emitting area 201 can pass through the mirror reflection layer 30 and emit, so there is no need to set an opening on the mirror reflection layer 30, thereby simplifying the manufacturing process of the mirror reflection layer 30, saving time and reducing manufacturing costs.

[0145] like Fig.18 As shown, some embodiments of the present disclosure provide a display device 200, comprising the display panel 100 described in any of the above embodiments.

[0146] The display device may be an organic light-emitting diode (OLED) or a quantum dot light-emitting diode (QLED).

[0147] The display device may be any component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a laptop computer, a navigator, or the like.

[0148] The beneficial effects that can be achieved by the display device provided by the present disclosure are the same as the beneficial effects that can be achieved by the display panel provided by the above technical solution, and will not be elaborated here.

[0149] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any changes or substitutions that can be thought of by any person skilled in the art within the technical scope disclosed in the present disclosure should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A display panel, characterized in that: include: substrate; A light emitting structure layer is located on one side of the substrate; the light emitting structure layer comprises a plurality of light emitting regions and a non-light emitting region separating the plurality of light emitting regions; A specular reflection layer, located on a side of the light-emitting structure layer away from the substrate; the specular reflection layer at least covers the non-light-emitting area; The interference adjustment layer is located on a side of the mirror reflection layer away from the light emitting structure layer; the interference adjustment layer is configured to cause light of some colors to interfere with each other to form a mirror display of a set color; the interference adjustment layer includes a plurality of first openings exposing the plurality of light emitting areas.

2. The display panel according to claim 1, characterized in that: The interference adjustment layer comprises: At least two first refractive index layers are stacked; and A second refractive index layer is located between every two adjacent first refractive index layers; the refractive index of the second refractive index layer is greater than the refractive index of the first refractive index layer.

3. The display panel according to claim 2, characterized in that: The material of the first refractive index layer includes silicon dioxide or magnesium fluoride; and / or, The material of the second refractive index layer includes metal.

4. The display panel according to claim 2, characterized in that: The thickness of the first refractive index layer is any one of 135nm±5nm, 155nm±5nm, 170nm±5nm, 195nm±5nm, 210nm±5nm, 225nm±5nm or 240nm±5nm; The thickness of the second refractive index layer is 4 nm±1 nm.

5. The display panel according to claim 1, characterized in that: The interference adjustment layer is a single-layer structure; The material of the interference adjustment layer includes at least one of tantalum metal and molybdenum oxide, or the material of the interference adjustment layer includes at least one of molybdenum dioxide, iron oxide and indium oxide; or the material of the interference adjustment layer includes at least one of niobium carbide and zinc oxide.

6. The display panel according to claim 5, characterized in that: For light with a wavelength of 550 nm, the refractive index of the interference adjustment layer is 2.3-2.6, and the extinction coefficient is 0.57-0.

77.

7. The display panel according to claim 5, characterized in that: The thickness of the interference adjustment layer is any one of 35nm±5nm, 45nm±5nm or 55nm±5nm.

8. The display panel according to claim 5, characterized in that: The thickness of the interference adjustment layer is 15nm±1nm; the display panel further includes: The light-transmitting adjustment layer is located between the specular reflection layer and the interference adjustment layer; the thickness of the light-transmitting adjustment layer is any one of 25nm±2nm, 33nm±2nm or 50nm±2nm.

9. The display panel according to any one of claims 1 to 8, characterized in that: The thickness of the mirror reflection layer is 330nm±5nm.

10. The display panel according to any one of claims 1 to 8, characterized in that: The mirror reflection layer is a semi-transmissive and semi-reflective layer, and the mirror reflection layer also covers the multiple light-emitting areas; or, the mirror reflection layer is a metal reflection layer, and the metal reflection layer includes a plurality of second openings exposing the multiple light-emitting areas.

11. The display panel according to any one of claims 1 to 8, characterized in that: Also includes: an encapsulation layer, located between the light emitting structure layer and the specular reflection layer; the encapsulation layer is configured to encapsulate the light emitting structure layer on the substrate; a protective cover plate, located on a side of the interference adjustment layer away from the specular reflection layer, the protective cover plate being configured to protect the interference adjustment layer, the specular reflection layer and the light emitting structure layer; The optical adhesive layer is located between the interference adjustment layer and the protective cover plate; the optical adhesive layer is configured to adhere the protective cover plate to a side of the interference adjustment layer away from the specular reflection layer.

12. A display device, characterized in that: include: The display panel according to any one of claims 1 to 11.

13. A method for manufacturing a display panel, characterized in that: include: providing a substrate; forming a light emitting structure layer on one side of the substrate, wherein the light emitting structure layer includes a plurality of light emitting regions and a non-light emitting region separating the plurality of light emitting regions; forming a specular reflection layer on a side of the light emitting structure layer away from the substrate, wherein the specular reflection layer at least covers the non-light emitting area; An interference adjustment layer is formed on a side of the mirror reflection layer away from the light emitting structure layer, and the interference adjustment layer is configured to cause light of some colors to interfere with each other to form a mirror display of a set color; the interference adjustment layer includes a plurality of first openings exposing the plurality of light emitting areas.

14. The method for manufacturing a display panel according to claim 13, characterized in that: An interference adjustment layer is formed on a side of the specular reflection layer away from the light emitting structure layer, comprising: A first refractive index layer and a second refractive index layer are alternately formed in sequence on the side of the mirror reflection layer away from the light emitting structure layer, the number of the first refractive index layer is one more than the number of the second refractive index layer; and the refractive index of the first refractive index layer is less than the refractive index of the second refractive index layer.

15. The method for manufacturing a display panel according to claim 14, characterized in that: An interference adjustment layer is formed on a side of the specular reflection layer away from the light emitting structure layer, and further includes: All of the first refractive index layers and all of the second refractive index layers are etched to form a plurality of first openings exposing the plurality of light emitting regions.

16. The method for manufacturing a display panel according to claim 13, characterized in that: An interference adjustment layer is formed on a side of the specular reflection layer away from the light emitting structure layer, comprising: forming an interference adjustment layer having a single-layer structure on a side of the specular reflection layer away from the light-emitting structure layer; Among them, the material forming the interference adjustment layer includes at least one of tantalum metal and molybdenum oxide; or, the material forming the interference adjustment layer includes at least one of molybdenum dioxide, iron oxide and indium oxide; or, the material forming the interference adjustment layer includes at least one of niobium carbide and zinc oxide.

17. The method for manufacturing a display panel according to claim 16, characterized in that: The thickness of the interference adjustment layer is any one of 35nm±5nm, 45nm±5nm or 55nm±5nm; An interference adjustment layer is formed on a side of the specular reflection layer away from the light emitting structure layer, and further includes: The interference adjustment layer in a single-layer structure is etched to form a plurality of first openings exposing the plurality of light-emitting regions.

18. The method for manufacturing a display panel according to claim 16, characterized in that: The thickness of the interference adjustment layer is 15 nm±1 nm; before the interference adjustment layer is formed on the side of the mirror reflection layer away from the light emitting structure layer, the manufacturing method of the display panel further includes: A light transmission adjustment layer is formed on a side of the mirror reflection layer away from the light emitting structure layer, and the thickness of the light transmission adjustment layer is any one of 25nm±2nm, 33nm±2nm or 50nm±2nm.

19. The method for manufacturing a display panel according to any one of claims 13 to 18, characterized in that: A specular reflection layer is formed on a side of the light emitting structure layer away from the substrate, comprising: forming a metal reflective film on a side of the light emitting structure layer away from the substrate, and etching the metal reflective film to form a mirror reflective layer including a plurality of second openings, wherein the plurality of second openings expose the plurality of light emitting areas; or, A semi-transparent and semi-reflective film is formed on a side of the light-emitting structure layer away from the substrate, the semi-transparent and semi-reflective film covers the multiple light-emitting areas and the non-light-emitting area, and the semi-transparent and semi-reflective film is a mirror reflection layer.

Images