Edge exposure apparatus and light source output control method

Abstract

The present inventive concepts provide an edge exposure apparatus for performing an edge exposure process by irradiating light at an edge region of a substrate. The edge exposure apparatus includes a support unit configured to support the substrate, a light irradiation unit having a light source for irradiating the light onto the substrate, and a control unit configured to control an output of the light source, and wherein the control unit includes a measurement unit configured to measure an illuminance value from the output of the light source, and an output control unit configured to set a reference illuminance value among the illuminance values measured by the measurement unit, and control the output of the light source based on the set reference illuminance value.

Description

Technical Field

[0001] The embodiments of the inventive concept described herein relate to an edge exposure apparatus and a light source output control method. Background Technology

[0002] Flat panel displays (FPDs), such as liquid crystal display (LCD) devices and plasma display panel (PDP) devices, are widely used as image display devices.

[0003] The fabrication of FPDs involves various processes, including forming various patterns, compartments, modules, etc., on a substrate (e.g., a wafer). Specifically, a photolithography process is performed to form various patterns on the substrate. The photolithography process is performed sequentially: a coating process in which a photosensitive liquid (e.g., a photoresist liquid) is applied to the substrate; an exposure process in which the coated photosensitive film is exposed using a photomask defining the pattern to be formed; and a development process in which portions of the coated photoresist film are selectively removed. In this document, a baking process is performed before and / or after the coating and development processes for heat treatment of the substrate. Before the development process, an edge exposure process is performed separately to expose a predetermined width of the edge of the substrate. In the following text, the unit used to perform the edge exposure process may be referred to as an edge-exposed wafer (EEW) unit.

[0004] Figure 1 This is a view illustrating an implementation of a conventional EEW cell.

[0005] The EEW unit used in photographic equipment is a unit that uses ArF, KrF, i-line, etc., to irradiate the edge of a UV-exposed wafer. (See reference...) Figure 1 The EEW includes: a lamp housing having a light source (a short-arc lamp, such as a high-pressure mercury lamp, a high-pressure xenon lamp, etc.) for applying exposure energy; an optical system for illuminating a predetermined area on the wafer surface; and an optional light guide for transmitting the light energy from the lamp housing to the optical system. (See reference...) Figure 1 The lamp housing may include: a lamp; an elliptical reflector for converging the light energy of the lamp; a shutter and aperture for physically controlling the light energy of the lamp; and a controller unit for controlling power, etc. The lamps used in the lamp housing are high-pressure mercury lamps or xenon lamps, and the power used is 200W to 250W. These lamps operate at the maximum power (rated power) of each power used, wherein the lifespan of the 250W lamp ranges from 1000 to 3000 hours, and the lifespan of the 200W lamp ranges from 1000 to 4000 hours.

[0006] Traditional EEW lamps are typically operated by maintaining maximum power (rated power) in the initial stage and then gradually reducing the brightness intensity, which may shorten the lamp's lifespan. Summary of the Invention

[0007] The present invention provides a light source output control method that can increase the lifespan of a light source in an edge exposure device.

[0008] The technical objectives of this invention are not limited to those described above, and other unmentioned technical objectives will become apparent to those skilled in the art from the following description.

[0009] The present invention provides a method for controlling the output of a light source for exposing a substrate in an edge exposure apparatus. The method includes: measuring an illuminance value based on the output value of the light source; setting a reference illuminance value among the measured illuminance values; and controlling the output of the light source based on the reference illuminance value.

[0010] In one embodiment, the method further includes checking whether the set reference illuminance value satisfies electrical stability.

[0011] In one embodiment, checking whether the set reference illuminance value meets the electrical stability requirements includes checking whether the percentage of the illuminance value at the set reference illuminance value is 70% or higher.

[0012] In one embodiment, the reference illuminance value is the illuminance value among the measured illuminance values ​​that is closest to the target illuminance value required for the exposure.

[0013] In one embodiment, the method further includes: measuring the output of the light source in real time.

[0014] In one embodiment, the method further includes controlling the aperture when the output of the light source, as measured in real time, deviates from the error range of the target illuminance value.

[0015] In one embodiment, the method further includes increasing the output of the light source when the output of the light source, measured in real time even after controlling the aperture, deviates from the error range of the target illuminance value.

[0016] In one embodiment, increasing the output of the light source includes increasing the output of the light source in units of 1W.

[0017] In one embodiment, the method further includes: after the output of the light source is increased, when the output of the light source measured in real time deviates from the error range of the target illuminance value, further increasing the output of the light source.

[0018] The present invention provides an edge exposure apparatus for performing an edge exposure process by irradiating an edge region of a substrate with light. The edge exposure apparatus includes: a support unit configured to support the substrate; a light irradiation unit having a light source for irradiating the substrate with light; and a control unit configured to control the output of the light source, wherein the control unit includes: a measurement unit configured to measure an illuminance value based on the output of the light source; and an output control unit configured to set a reference illuminance value among the illuminance values ​​measured by the measurement unit, and to control the output of the light source based on the set reference illuminance value.

[0019] In one embodiment, the output control unit checks whether the set reference illuminance value meets the electrical stability requirements.

[0020] In one implementation, the output control unit checks whether the percentage of illuminance at the set reference illuminance value is 70% or higher.

[0021] In one implementation, the reference illuminance value is the illuminance value among the measured illuminance values ​​that is closest to the target illuminance value required for exposure.

[0022] In one embodiment, the measuring unit measures the output of the light source controlled by the output control unit in real time.

[0023] In one embodiment, the control unit further includes an aperture for physically adjusting the output of the light source.

[0024] In one implementation, the output control unit controls the aperture when the output of the light source, as measured in real time, deviates from the error range of the target illuminance value.

[0025] In one embodiment, after controlling the aperture, when the output of the light source, as measured in real time, deviates from the error range of the target illuminance, the output control unit increases the output of the light source.

[0026] In one embodiment, the output control unit increases the output of the light source in units of 1W.

[0027] In one implementation, after the output of the light source increases, the output control unit maintains the output of the light source when the real-time measured output of the light source does not deviate from the error range of the target illuminance value.

[0028] In one embodiment, after the output of the light source is increased, when the output of the light source, as measured in real time, deviates from the error range of the target illuminance value, the output control unit further increases the output of the light source.

[0029] According to an embodiment of the present invention, the lifespan of the light source included in the edge exposure apparatus can be increased.

[0030] According to an embodiment of the present invention, illuminance can be stabilized by reducing the heating temperature of the light source included in the edge exposure device.

[0031] The effects of this invention are not limited to those described above, and other effects will become apparent to those skilled in the art from the following description. Attached Figure Description

[0032] The above and other objects and features will become apparent from the following drawings and description, wherein, unless otherwise stated, the same reference numerals refer to the same parts throughout the various drawings, and wherein:

[0033] Figure 1 This is a view illustrating an implementation of a conventional EEW cell.

[0034] Figure 2 A substrate processing apparatus according to an embodiment of the present invention is shown.

[0035] Figure 3 This is a block diagram illustrating the configuration of an edge exposure apparatus according to an embodiment of the present invention.

[0036] Figure 4 This is a block diagram illustrating the configuration of a control unit according to an embodiment of the present invention.

[0037] Figure 5 The graph shows the results of the traditional light source output control method and the light source output control method proposed in this invention.

[0038] Figure 6 It is a graph of lifespan measured using the control method conceived according to the present invention.

[0039] Figure 7 The results of measuring lifetime using a sensitive colorimetric method are shown.

[0040] Figure 8 This is a flowchart illustrating an output control method according to an embodiment of the present invention. Detailed Implementation

[0041] The inventive concept can be modified in various ways and can take various forms, and its specific embodiments will be shown and described in detail in the accompanying drawings. Embodiments are provided to more fully explain the inventive concept to those skilled in the art. However, the embodiments according to the inventive concept are not intended to limit the specific forms disclosed, and it should be understood that the inventive concept includes all variations, equivalents, and substitutions included within the spirit and scope of the inventive concept. In the description of the inventive concept, detailed descriptions of relevant known technologies may be omitted where the essence of the inventive concept may be unclear. Furthermore, the same reference numerals are used throughout the drawings for parts having similar functions and actions.

[0042] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the inventive concept. It should be further understood that the terms “comprising,” “including,” “containing,” and / or “having,” when used in this specification, specify the presence of the stated features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0043] Singular expressions include plural expressions unless they are explicitly distinguished in the context. Furthermore, for clarity, the shapes and dimensions of elements in the accompanying drawings may be exaggerated.

[0044] Unless otherwise defined, all terms used herein (including technical or scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which the inventive concept pertains. Unless clearly defined in this application, terms such as those defined in common dictionaries should be interpreted as consistent with the context of the relevant art, and not as ideal or overly formal.

[0045] Figure 2 A schematic plan view of a substrate processing apparatus according to an embodiment of the present invention is shown.

[0046] Referring to the figure, the substrate processing apparatus 1 includes a transposition module 10, a coating module 20, an interface module 30, an edge exposure device 40, and a developing module 50.

[0047] The transposition module 10 and the interface module 30 are arranged in parallel. The coating module 20, the edge exposure device 40, and the developing module 50 are arranged between the transposition module 10 and the interface module 30. The edge exposure device 40 and the developing module 50 are adjacent and arranged along the second direction 14. The coating module 20 is arranged parallel to the edge exposure device 40 and the developing module 50 on opposite sides. The coating module 20 is spaced apart from the edge exposure device 40 and the developing module 50 along the first direction 12.

[0048] The substrate W is introduced into or removed from the apparatus 1 via the indexing module 10. In one embodiment, the indexing module 10 may be connected to a transport device external to the apparatus 1. The transport device may have transfer rollers. When the substrate W is introduced into the indexing module 10 from the outside, it may be introduced by the transfer rollers carrying the substrate W. Similarly, when the substrate W is removed from the outside, it may be removed by the transfer rollers carrying the substrate W. Alternatively, a transfer robot may be arranged outside the indexing module 10. The transfer robot may transfer the substrate W from the outside to the indexing module 10, or it may transfer the substrate W, which has already been processed, from the indexing module 10 to the outside. The indexing module 10 is arranged along a first direction 12 in its longitudinal direction.

[0049] The coating module 20 performs a coating process on the substrate W. The coating module 20 is provided adjacent to one side of the transposition module 10. The coating module 20 is arranged along a second direction 14 in its longitudinal direction. The coating module 20 includes a cleaning unit 21, a drying unit 22, a coating unit 23, and a firing unit 24. In the coating module 20, the cleaning process, drying process, coating process, and firing process are performed sequentially. Before performing the coating process on the substrate W, the cleaning unit 21 cleans the substrate W. The cleaning unit 21 supplies cleaning liquid to the substrate W to perform the process. In one embodiment, the cleaning unit 21 can supply cleaning liquid from a cleaning liquid supply component provided above the substrate W. For example, the cleaning liquid may include deionized water.

[0050] The drying unit 22 dries any residual cleaning liquid on the substrate W after the cleaning process has been completed. In one embodiment, the drying unit 22 may include a fluid supply member that supplies air above the substrate W to perform the drying process. In one embodiment, the fluid supply member may be an air knife.

[0051] The coating unit 23 performs a coating process on the substrate W. In one embodiment, during the coating process, a photosensitive liquid is applied to the upper surface of the substrate W. The photosensitive liquid may be a photoresist liquid. The substrate W, after the coating process is completed, moves to the baking unit 24. The baking unit 24 performs a baking process on the substrate W. In one embodiment, during the baking process, the substrate W may be heated by a heating element mounted below the substrate W.

[0052] The substrate W, whose process is completed in the coating module 20, moves to the interface module 30. The interface module 30 then transfers the substrate W to the exposure module 60 outside the apparatus 1. The substrate W whose exposure process is completed in the exposure module 60 outside the apparatus 1 is transferred to the interface module 30 of the apparatus 1. The interface module 30 then transfers the substrate W whose exposure process is completed to the edge exposure apparatus 40.

[0053] Interface module 30 is connected to exposure module 60. Interface module 30 is arranged along a first direction 12 in its longitudinal direction. When substrate W is transferred by interface module 30, a transfer robot can be used to transfer substrate W. Exposure module 60, external to device 1, performs an exposure process on substrate W.

[0054] The developing module 50 performs a developing process on the substrate W. The indexing module 10 is arranged adjacent to one side of the developing module 50. The developing module 50 is parallel to the coating module 20, and its longitudinal direction is arranged along the second direction 14.

[0055] The developing module 50 includes a developing unit 51, a rinsing unit 52, a drying unit 53, and an inspector 54. In the developing module 50, after the developing process at the developing unit 51, a cleaning process and a drying process are performed at the rinsing unit 52 and the drying unit 53, and then an inspection is performed at the inspector 54.

[0056] The edge exposure apparatus 40 performs an edge exposure process: illuminating the edge of the substrate W with light. The edge exposure apparatus 40 is disposed between the interface module 30 and the developing module 50. In one embodiment, the edge exposure process can be performed after the exposure process. Alternatively, the edge exposure apparatus 40 can be disposed between the coating module 20 and the interface module 30 to perform the edge exposure process after the coating process.

[0057] The configuration of the edge exposure device 40 will be described in more detail below with reference to the accompanying drawings.

[0058] Figure 3 This is a block diagram illustrating the configuration of an edge exposure apparatus 40 according to an embodiment of the present invention.

[0059] Reference Figure 3 The edge exposure apparatus 40 according to the present invention may include a support unit 400, a light irradiation unit 410 and a control unit 420.

[0060] The support unit 400 can support the substrate to be exposed. The support unit 400 can be an electrostatic chuck. The support unit 400 can support the substrate by mechanical clamping.

[0061] The light irradiation unit 410 can irradiate light onto the substrate W. The light irradiation unit 410 can also irradiate light onto the edge of the substrate W. The light irradiation unit 410 can be positioned above the support unit 400. The light irradiation unit 410 may include a light source. According to an embodiment, the light source included in the light irradiation unit 410 may be a high-pressure mercury lamp. According to an embodiment, the light source included in the light irradiation unit 410 may be a high-pressure xenon lamp. According to an embodiment, the light source included in the light irradiation unit 410 may be a short-arc lamp.

[0062] The control unit 420 can control the output of the light source included in the light illumination unit 410. (Refer to...) Figure 4 A more detailed description of the configuration and control methods of the control unit 420 is provided.

[0063] Figure 4 This is a block diagram illustrating the configuration of a control unit 420 according to an embodiment of the present invention. (Refer to...) Figure 4 The control unit 420 may include a measurement unit 421, an output control unit 422, and an aperture 423.

[0064] The measuring unit 421 can measure the illuminance value (illuminance intensity) based on the output value of the light source included in the light illumination unit 410. The measuring unit 421 can be a sensor capable of measuring the illuminance value. The measuring unit 421 can measure the illuminance value (illuminance) of the light output from the light source included in the light illumination unit 410 in real time, and can send the measured value to the output control unit 422.

[0065] The output control unit 422 can set a reference illuminance value from the illuminance values ​​measured by the measurement unit 421, and can control the output of the light source included in the light illumination unit 410 based on the reference illuminance value. In this case, the output control unit 422 can check whether the set reference illuminance value satisfies electrical stability. In this inventive concept, when the percentage of the illuminance value at the set reference illuminance value is 70% or greater, it is determined that electrical stability is satisfied. The output control unit 422 according to this inventive concept can select and control an output value that satisfies both the reference illuminance value and electrical stability.

[0066] The reference illuminance value selected by the output control unit 422 can be the illuminance value among those measured by the measurement unit 421 that is closest to the target illuminance value required for exposure. This will be described in detail through the following embodiments.

[0067] Aperture 423 allows for physical adjustment of the light source's output.

[0068] When the output of the light source, as measured in real time by the measuring unit 421, deviates from the set error range of the target illuminance value, the output control unit 422 can perform additional illuminance control using the aperture 423. Additional illuminance control using the aperture 423 can be performed without changing the output of the light source.

[0069] Even after control is performed using aperture 423, if the output of the light source, measured in real time, exceeds the error range of the target illuminance value, the output control unit 422 can increase and thereby control the output of the light source. In this case, the output control unit 422 can control the output of the light source by increasing the output of the light source in units of 1W. In this case, the error range can be around 5%. When determining the error range at this time, it can only be applied when it deviates from the target illuminance value. According to the embodiment, when the conditions of minimum power and electrical stability are both met, an output much higher than the target illuminance value can be obtained. However, when applying the error range in this case, controlling the output may not be easy to accomplish. Therefore, the error range can only be applied when the output is lower than the target illuminance.

[0070] The output control unit 422 can increase and control the output of the light source, and then maintain the output of the light source as normal when the output of the light source measured in real time does not deviate from the error range of the target illuminance value.

[0071] After the output control unit 422 increases and controls the output of the light source, when the real-time measured output of the light source deviates from the error range of the target illuminance value, the output control unit 422 can additionally increase and control the output of the light source. In this case, the additional increase unit can be 1W.

[0072] The light source output control method according to the present invention will be described in more detail below through experimental examples and implementation methods.

[0073] In the method for controlling constant illuminance according to the present invention, in order to determine the lower limit value of the light source (i.e., the starting point for controlling constant illuminance (reference illuminance value)), the illuminance value for each power of each light source must be measured in advance. This can be measured in advance, or it can be measured in real time by the measuring unit 421. This can be measured before exposure takes place in the edge exposure device 40.

[0074] Table 1 below shows the illuminance values ​​(mW / cm²) of a standard 250W mercury lamp housing used in an EEW employing KrF. 2 The illuminance values ​​were measured at 10W intervals in the experiments shown in the table below. However, this is only an example, and the intervals used to measure the illuminance values ​​can be greater or less than 10W.

[0075] [Table 1]

[0076] 250W lamp output (W) <![CDATA[Illuminance value (mW / cm 2 )]]> Illuminance percentage 250 591 100.0 240 553 93.6 230 530 89.7 220 476 80.5 210 457 77.3 200 427 72.3 190 403 68.2 180 385 65.1

[0077] [Based on the illuminance value and percentage of illuminance output from a 250W lamp]

[0078] Assuming the target illuminance required for the EEW exposure process is 400 mW / cm²2 To output 400mW / cm 2 The target illuminance value should be selected, and the output value that can exceed the target illuminance value should be chosen as the starting point for minimum illuminance control. According to the table, the output value that can reach 403 mW / cm² is [not specified]. 2 An illuminance value of 190W can be used as the minimum illuminance control starting point (i.e., the reference illuminance value). In this invention, the percentage of the illuminance value is also considered regarding the lamp's illumination stability. Experimental results confirm that electrical stability is high when the percentage of the illuminance value is approximately 70% or greater. Therefore, a target illuminance value (400mW / cm²) can be output by selecting... 2 The output of the light source is controlled by an output value that meets a percentage (70%) or more of the illuminance value. According to the table, 200W, meeting both conditions, can be set as the starting point (i.e., the reference illuminance value) for illuminance control. In the case of a 250W mercury lamp, when the illuminance value at the starting power decreases from 200W (which is the starting output for illuminance control), it can be used by increasing it up to 1W to the maximum power (250W). At this point, the target illuminance value can be 400mW / cm². 2 Furthermore, the reference illuminance value can be set to 403 mW / cm². 2 .

[0079] Table 2 below shows the illuminance values ​​(mW / cm²) of a conventional 200W mercury lamp housing used in semiconductor EEWs and employing KrF. 2 ) measurement.

[0080] [Table 2]

[0081] 200W lamp output (W) <![CDATA[Illuminance value (mW / cm 2 )]]> Illuminance percentage 200 2770 100 190 2605 94 180 2437 88 170 2261 82 160 2097 76 150 1930 70 140 1760 64 130 1600 58 120 1432 52 110 1266 46 100 1085 39 90 885 32 85 770 28

[0082] [Based on the illuminance value and percentage of illuminance output from a 200W lamp]

[0083] In this paper, it is assumed that the target illuminance value required for EEW exposure is 1200 mW / cm². 2 In this case, 110W, exceeding the reference illuminance value, satisfies the condition of being a starting point for illuminance control. In this invention, the percentage of illuminance value is also considered regarding the lamp's electrical stability. As mentioned above, experiments have confirmed that stability is high when the percentage of illuminance value is 70% or greater. That is, within 200W, 150 to 160W, satisfying both conditions, can be selected as the starting point for illuminance control. In other words, a 200W mercury or xenon lamp can initially be operated at 150 to 160W, and then increased by up to 1W to increase the power up to a maximum of 200W. At this point, the target illuminance value can be 1200mW / cm². 2 Furthermore, the reference illuminance value can be set to 1930 mW / cm². 2 .

[0084] When this method is used, the lamp's heating temperature is reduced, and therefore, the illuminance is stabilized and the lamp's lifespan is extended. This extended lifespan has been confirmed experimentally. According to conventional control methods, the lamp has a lifespan of 3000 hours; however, experiments have shown that, in the control method of this invention, when constant illuminance control is applied, the lamp's lifespan exceeds 6000 hours.

[0085] Figure 5 The graph shows the results of the traditional light source output control method and the light source output control method proposed in this invention.

[0086] Reference Figure 5 Traditional light source output control methods use open-loop indication, while the light source output control method based on the present invention uses closed-loop feedback indication.

[0087] Reference Figure 5 In conventional light source output control methods, the lamp's lifespan is rapidly depleted from the initial high power input. However, the control method proposed according to this invention employs a closed-loop feedback approach. That is, when using the control method proposed according to this invention, the power is reduced so as not to affect normal operation from the start of illumination, and the power gradually increases as the illuminance decreases, eventually reaching the maximum power (rated power). When using this method, the lamp's heating temperature is reduced, thereby stabilizing the illuminance and extending the lamp's lifespan. Furthermore, by using the output control method proposed according to this invention, the applied illuminance value can be controlled to a predetermined constant value by adjusting the light source's output, and therefore is more stable than the conventional method where the applied illuminance value gradually decreases.

[0088] Figure 6 It is a graph of lifespan measured using the control method conceived according to the present invention.

[0089] Reference Figure 6 The lifespan of a lamp can be predicted using an exponential function and a trend line. Figure 6 In the graph, the horizontal axis represents time, and the vertical axis represents illuminance values. (See reference...) Figure 6 The illuminance value is expected to decrease to 1200 mW / cm². 2 The reference illuminance value takes approximately 15,000 hours to reach, but considering the degradation of quartz bulbs, the maximum lifespan is determined to be approximately 6,000 hours. When using the constant illuminance concepted according to the present invention, up to approximately 6,000 hours can be achieved, which is the maximum lifespan of a 250W mercury lamp. As a result of practical evaluation, the illuminance was confirmed to be 1986 mW / cm² at 6057 hours. 2 And with 1200mW / cm 2 Sufficient illuminance values ​​can be ensured compared to the target illuminance value.

[0090] Figure 7 The results of measuring lifetime using a sensitive colorimetric method are shown.

[0091] Reference Figure 7 The results of a lamp condition analysis performed over 6100 hours are shown. Analysis of the bulb's thermal shock distribution using a sensitive colorimetric method confirms its safe operation for up to 6000 hours. To evaluate the effectiveness of constant illuminance control, the lifespan was more than doubled, as demonstrated by applying the illuminance control algorithm conceived in this invention to the housing of a 250W lamp in an EEW module installed on actual track equipment.

[0092] Figure 8 This is a flowchart illustrating an output control method according to an embodiment of the present invention.

[0093] The illuminance control starting point (initial power) for controlling constant illuminance, as conceived according to the present invention, can be determined by measuring the illuminance for each power value in each lamp. In this case, a power higher than the target illuminance value required for exposure should be selected, and regarding the electrical stability of the lamp, the power should have illuminance of 70% or greater compared to the initial illuminance value. If a power with less than 70% of the initial illuminance is selected, the lamp may frequently shut off, and the electrical stability will be very poor. After setting an illuminance value that satisfies both conditions as the starting point, the lamp output can be controlled. Subsequently, the illuminance value can be checked to see if it exceeds the error range of the target illuminance value by measuring the illuminance value in real time. Subsequently, if the illuminance value does not reach the target illuminance value, the illuminance can be controlled by increasing the output up to 1W. When the maximum output is finally reached, no power control is performed.

[0094] When performing power control, aperture control can be performed simultaneously when the illuminance value is less than the target illuminance value. According to the implementation, aperture control can be performed for a predetermined time period. If the illuminance value does not reach the target illuminance value even after the aperture is fully open, it can be controlled by increasing the output by up to 1W outside the illuminance control range. Then, the illuminance can be measured again.

[0095] Reference Figure 8 A method for controlling the output of a light source for exposing a substrate in an edge exposure apparatus is disclosed.

[0096] According to this method, illuminance values ​​based on the output value of a light source can be measured. Illuminance values ​​can be measured in advance or in real time. Illuminance values ​​based on the output value of a light source can be measured by adjusting the output value at regular intervals. The predetermined interval can be 10W.

[0097] Among the illuminance values ​​measured by adjusting the output value at predetermined intervals, the illuminance value closest to the target illuminance value can be set as the reference illuminance value, and the output of the light source can be controlled by the output value corresponding to the reference illuminance value. In this case, it can be checked whether the set reference illuminance value meets the electrical stability requirements. If the electrical stability requirements are not met, a higher output value that meets the electrical stability requirements can be selected and controlled.

[0098] When control begins, the output of the light source can be measured in real time. When the real-time measured output of the light source exceeds the error range of the target illuminance value, control via the aperture can be executed. The illuminance value can be increased by fully opening the aperture. If the real-time measured output of the light source still exceeds the error range of the target illuminance value even after aperture control is executed, it can be controlled by gradually increasing the output of the light source. If the real-time measured output of the light source still deviates from the error range of the target illuminance after controlling the value by increasing and thus controlling the output of the light source, the output of the light source can be further increased and thus controlled.

[0099] The effects of this invention are not limited to those described above, and those skilled in the art will clearly understand any unmentioned effects from the specification and drawings.

[0100] While preferred embodiments of the inventive concept have been shown and described to date, the inventive concept is not limited to the specific embodiments described above, and it should be noted that those skilled in the art to which the inventive concept pertains can implement the inventive concept in various ways without departing from the essence of the inventive concept claimed in the claims, and modifications should not be interpreted separately from the technical spirit or prospect of the inventive concept.

Claims

1. A method for controlling the output of a light source for exposing a substrate in an edge exposure apparatus, the method comprising: The illuminance value is measured based on the output value of the light source; Set a reference illuminance value among the measured illuminance values; as well as The output of the light source is controlled based on the reference illuminance value. The method further includes checking whether the percentage of illuminance at the set reference illuminance value is 70% or higher, to check whether the set reference illuminance value meets the electrical stability requirements. The method further includes measuring the output of the light source in real time, controlling the aperture to perform illuminance control when the real-time measured output of the light source deviates from the error range of the target illuminance value, and increasing the output of the light source when the real-time measured output of the light source still deviates from the error range of the target illuminance value even after controlling the aperture.

2. The method according to claim 1, wherein, The reference illuminance value is the illuminance value among the measured illuminance values ​​that is closest to the target illuminance value required for the exposure.

3. The method according to claim 1, wherein, The increase in the output of the light source includes increasing the output of the light source in units of 1W.

4. The method according to claim 1, further comprising: After the output of the light source is increased, when the output of the light source measured in real time deviates from the error range of the target illuminance value, the output of the light source is further increased.

5. An edge exposure apparatus for performing an edge exposure process by irradiating an edge region of a substrate with light, the edge exposure apparatus comprising: A support unit configured to support the substrate; A light irradiation unit having a light source for irradiating the substrate with light; and A control unit, configured to control the output of the light source, and The control unit includes: A measuring unit configured to measure illuminance values ​​based on the output of the light source, and the measuring unit to measure in real time the output of the light source controlled by the output control unit; and An output control unit is configured to set a reference illuminance value among illuminance values ​​measured by the measuring unit and control the output of the light source based on the set reference illuminance value. The output control unit checks whether the percentage of the illuminance value at the set reference illuminance value is 70% or higher to check whether the set reference illuminance value meets electrical stability requirements. The control unit also includes an aperture; when the output of the light source measured in real-time deviates from the error range of the target illuminance value, the output control unit controls the aperture to physically adjust the output of the light source. After controlling the aperture, when the output of the light source measured in real-time still deviates from the error range of the target illuminance, the output control unit increases the output of the light source.

6. The edge exposure apparatus according to claim 5, wherein, The reference illuminance value is the illuminance value among the measured illuminance values ​​that is closest to the target illuminance value required for exposure.

7. The edge exposure apparatus according to claim 5, wherein, The output control unit increases the output of the light source in units of 1W.

8. The edge exposure apparatus according to claim 5, wherein, After the output of the light source increases, the output control unit maintains the output of the light source when the real-time measured output of the light source does not deviate from the error range of the target illuminance value.

9. The edge exposure apparatus according to claim 5, wherein, After the output of the light source is increased, when the output of the light source measured in real time deviates from the error range of the target illuminance value, the output control unit further increases the output of the light source.

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