A method, apparatus and device for automatically removing particles from a photomask

The automated photomask particle removal device and method have solved the problem of photomask particles affecting wafer circuit images, achieving efficient and safe particle removal, improving production efficiency and reducing photomask loss.

CN115407617BActive Publication Date: 2026-06-26CHANGXIN MEMORY TECH INC
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
CHANGXIN MEMORY TECH INC
Filing Date
2022-09-13
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

In existing technologies, microparticles on the photomask can cause the circuit pattern on the wafer to deviate from the design, resulting in a decrease in product yield. Furthermore, manually removing microparticles is time-consuming and labor-intensive and may damage the photomask, affecting the efficiency of the lithography machine.

Method used

Design an apparatus and method for automatically removing photomask particles. The apparatus utilizes a gripping component, a camera device, and a purge air gun to automatically locate and remove particles inside a lithography machine. The apparatus includes components such as a controller, a contact pressure sensor, an electromagnetic latch, and a retractable electric support rod to achieve automated particle positioning and removal.

Benefits of technology

It improves production efficiency, reduces photomask loss rate, reduces manual operation time and potential photomask damage, and enhances the working efficiency of the lithography machine.

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Abstract

The application relates to a method, device and equipment for automatically removing particles on a photomask, the device comprising a photomask placing platform located in a photoetching machine; a grabbing component used for grabbing the photomask under the control of a controller; an information acquisition module comprising a camera located above the photomask placing platform; a particle blowing component comprising at least one blowing air gun located above the photomask placing platform; and the controller used for determining whether particles exist on the photomask in the photoetching machine, controlling the grabbing component to grab the photomask and place the photomask on the photomask placing platform, controlling the camera to acquire pictures, determining physical position coordinates of the particles according to the acquired pictures, and controlling the at least one blowing air gun to blow against the particles to remove the particles on the photomask. The application automatically places the photomask with particles on the photomask placing platform and positions the particle position, controls the blowing air gun to blow against and remove the particles, improves production efficiency, and reduces photomask loss rate.
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