Diffusion equipment

Abstract

The present application discloses a diffusion device, including a silicon carbide paddle, a furnace tube, a fixed bracket and a base, one end of the base is connected to the furnace tube, one end of the silicon carbide paddle is connected to the fixed bracket, and the other end faces the furnace mouth of the furnace tube; the diffusion device also includes a lifting device, the lifting device is arranged at a position of the base close to the furnace tube and directly below the silicon carbide paddle, and an angle sensor and a calculation module are arranged on the silicon carbide paddle; the angle sensor is connected to the calculation module, and the calculation module is connected to the lifting device; wherein, the surface parallel to the base is taken as the horizontal plane, and the angle sensor is used to record the angle between the silicon carbide paddle and the horizontal plane in an unloaded state, and the angle between the silicon carbide paddle and the horizontal plane in a loaded state; the calculation module is used to calculate the angle difference between the silicon carbide paddle in an unloaded state and in a loaded state, and transmit the signal to the lifting device; the lifting device lifts the silicon carbide paddle to a preset angle, and the preset angle is equal to the angle difference. The present application can improve the position error caused by excessive bending of the silicon carbide paddle after loading the wafer.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and in particular to a diffusion device. Background Art

[0002] Before the diffusion equipment works, the position of the silicon carbide paddle is usually adjusted to ensure that the silicon carbide paddle does not collide with the furnace tube during movement and cause silicon wafers to break. However, the position that has been adjusted when the silicon carbide paddle is in the no-load state will often drop due to the force of supporting the wafers on the front end of the silicon carbide paddle after loading. If the silicon carbide paddle carries too many products to be processed, it will also cause the silicon carbide paddle to bend excessively, and as the silicon carbide paddle gradually moves into the furnace tube, the bending amplitude will become larger and larger. This results in a significant position error when the silicon carbide paddle reaches the furnace tube compared to the position adjusted before the silicon carbide paddle was no-loaded, increasing the chance of the silicon carbide paddle colliding with the furnace tube and furnace wall.

[0003] How to solve the position error caused by excessive bending after the silicon carbide paddle is loaded with the wafer has become an urgent problem to be solved in this field. Summary of the invention

[0004] The purpose of the present application is to provide a diffusion device that can improve the position error caused by excessive bending after the silicon carbide paddle loads the wafer.

[0005] The present application discloses a diffusion device, including a silicon carbide paddle, a furnace tube, a fixed bracket and a base, wherein one end of the base is connected to the furnace tube, the fixed bracket is movably connected to one end of the base away from the furnace tube, and the fixed bracket can move relative to the base toward the furnace tube; one end of the silicon carbide paddle is connected to the fixed bracket, and the other end faces the furnace mouth of the furnace tube; the diffusion device also includes a lifting device, which is arranged at a position of the base close to the furnace tube and directly below the silicon carbide paddle, and an angle sensor and a meter are arranged on the silicon carbide paddle. calculation module; the angle sensor is connected to the calculation module, and the calculation module is connected to the lifting device; wherein, taking the plane parallel to the base as the horizontal plane, the angle sensor is used to record the angle between the silicon carbide propeller and the horizontal plane in an unloaded state, and the angle between the silicon carbide propeller and the horizontal plane in a loaded state; the calculation module is used to calculate the angle difference between the silicon carbide propeller in an unloaded state and in a loaded state, and transmit the signal to the lifting device; the lifting device lifts the silicon carbide propeller to a preset angle, and the preset angle is equal to the angle difference.

[0006] Optionally, the lifting device includes an electronic hydraulic machine, a hydraulic rod of the electronic hydraulic machine is correspondingly arranged directly below the silicon carbide paddle, and the hydraulic rod abuts against the bottom surface of the silicon carbide paddle, and the hydraulic rod is used to lift the silicon carbide paddle.

[0007] Optionally, there are multiple electronic hydraulic devices, and the multiple electronic hydraulic devices are arranged along the extension direction of the silicon carbide paddle, and the hydraulic rods corresponding to the multiple electronic hydraulic devices have a maximum lifting height, and the maximum lifting height gradually increases along one side of the fixed bracket toward one side of the furnace tube.

[0008] Optionally, the hydraulic rod includes a support tray, which is arranged at one end of the hydraulic rod close to the silicon carbide paddle, the support tray abuts against the bottom surface of the silicon carbide paddle, and the contact surface area between the support tray and the silicon carbide paddle is larger than the contact surface area between the hydraulic rod and the silicon carbide paddle.

[0009] Optionally, the shape of the support tray matches the shape of the bottom surface of the silicon carbide paddle.

[0010] Optionally, the support tray includes a supporting portion, a first positioning portion and a second positioning portion, the first positioning portion and the second positioning portion are respectively connected to edges of the supporting portion, and the positions of the first positioning portion and the second positioning portion correspond to each other, the width of the supporting portion is greater than or equal to the width of the silicon carbide paddle, and the silicon carbide paddle is arranged between the first positioning portion and the second positioning portion.

[0011] Optionally, a side of the support tray close to the silicon carbide paddle is a plane, and the plane of the support tray is perpendicular to the hydraulic rod.

[0012] Optionally, the electronic hydraulic device further includes a first electronic hydraulic device, and the first electronic hydraulic device is arranged at a position corresponding to the middle of the silicon carbide paddle.

[0013] Optionally, the electronic hydraulic pressure also includes a second electronic hydraulic pressure and a third electronic hydraulic pressure, the second electronic hydraulic pressure and the third electronic hydraulic pressure are arranged at intervals, the hydraulic rod in the second electronic hydraulic pressure and the hydraulic rod in the third electronic hydraulic pressure have the same lifting height, and the support tray is simultaneously connected to the hydraulic rod in the second electronic hydraulic pressure and the hydraulic rod in the third electronic hydraulic pressure toward one end of the silicon carbide paddle.

[0014] Optionally, the diffusion device also includes a laser ruler for detecting the position of the silicon carbide paddle; the laser ruler includes a transmitting component and a receiving component, the transmitting component is arranged on a side of the silicon carbide paddle close to the fixed bracket, the receiving component is arranged on the furnace tube, and the transmitting component corresponds to the receiving component.

[0015] The present application provides a lifting device at a position close to the furnace tube of the base, and the lifting device is located directly below the silicon carbide paddle. During the actual operation of the diffusion equipment, the angle of the silicon carbide paddle in the no-load state is first recorded by an angle sensor, and the angle of the silicon carbide paddle in the no-load state is taken as the initial angle. Then, the angle of the silicon carbide paddle after loading the product to be processed is recorded by the angle sensor, and the angle difference is calculated by a calculation module based on the angles recorded twice before and after. The calculation module outputs a signal to the lifting device, and the lifting device lifts the silicon carbide paddle from the bottom of the silicon carbide paddle to the position directly opposite the silicon carbide paddle according to the angle difference. The downward bending position of the silicon carbide paddle caused by gravity after loading is lifted by the lifting device and then restored to its original position, thereby realizing the compensation adjustment of the angle of the silicon carbide paddle when it is no-load and after loading the wafer, improving the position error caused by excessive bending of the silicon carbide paddle after loading the wafer, and effectively avoiding the silicon carbide paddle from colliding with the furnace tube during operation. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation methods of the present application, and together with the text description, explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor. In the drawings:

[0017] Figure 1 A schematic diagram of a first embodiment of a diffusion device of the present application;

[0018] Figure 2 A schematic diagram of a second embodiment of the diffusion device of the present application;

[0019] Figure 3 A schematic diagram of a third embodiment of the diffusion device of the present application;

[0020] Figure 4 A schematic diagram of a fourth embodiment of the diffusion device of the present application;

[0021] Figure 5 A schematic diagram of a support tray in a fifth embodiment of the diffusion device of the present application;

[0022] Figure 6 A schematic diagram of a sixth embodiment of the diffusion device of the present application;

[0023] Figure 7 It is a schematic diagram of the seventh embodiment of the diffusion device of the present application.

[0024] Among them, 10, diffusion equipment; 100, silicon carbide paddle; 110, angle sensor; 120, computing module; 200, furnace tube; 300, fixed bracket; 400, base; 500, lifting device; 510, electronic hydraulic pressure; 511, hydraulic rod; 512, support tray; 513, support part; 514, first positioning part; 515, second positioning part; 520, first electronic hydraulic pressure; 530, second electronic hydraulic pressure; 540, third electronic hydraulic pressure; 600, laser ruler; 610, receiving component; 620, transmitting component. DETAILED DESCRIPTION

[0025] It should be understood that the terms used herein, the specific structures and functional details disclosed are only for describing specific embodiments and are representative, but the present application can be implemented in many alternative forms and should not be construed as being limited to only the embodiments described herein.

[0026] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating relative importance or implicitly indicating the number of technical features indicated. Therefore, unless otherwise specified, features defined as "first" and "second" may explicitly or implicitly include one or more of the features; "plurality" means two or more. The term "including" and any variation thereof means non-exclusive inclusion, and one or more other features, integers, steps, operations, units, components and / or combinations thereof may exist or be added.

[0027] In addition, terms indicating orientation or positional relationships, such as “center,” “lateral,” “up,” “down,” “left,” “right,” “vertical,” “horizontal,” “top,” “bottom,” “inside,” and “outside,” are described based on the orientation or relative positional relationships shown in the accompanying drawings and are merely simplified descriptions for the convenience of describing the present application. They do not indicate that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limitations on the present application.

[0028] The present application is described in detail below with reference to the accompanying drawings and optional embodiments.

[0029] Figure 1 This is a schematic diagram of a first embodiment of the diffusion device of the present application, such as Figure 1As shown, the present application discloses a diffusion device 10, including a silicon carbide paddle 100, a furnace tube 200, a fixed bracket 300 and a base 400, one end of the base 400 is connected to the furnace tube 200, the fixed bracket 300 is movably connected to the end of the base 400 away from the furnace tube 200, and the fixed bracket 300 can move relative to the base 400 toward the furnace tube 200; one end of the silicon carbide paddle 100 is connected to the fixed bracket 300, and the other end faces the furnace mouth of the furnace tube 200; the diffusion device 10 also includes a lifting device 500, which is arranged at a position of the base 400 close to the furnace tube 200 and is located directly below the silicon carbide paddle 100, and the silicon carbide paddle 10 0 is provided with an angle sensor 110 and a calculation module 120; the angle sensor 110 is connected to the calculation module 120, and the calculation module 120 is connected to the lifting device 500; wherein, taking the surface parallel to the base 400 as the horizontal plane, the angle sensor 110 is used to record the angle between the silicon carbide paddle 100 and the horizontal plane in an unloaded state, and the angle between the silicon carbide paddle 100 and the horizontal plane in a loaded state; the calculation module 120 is used to calculate the angle difference between the silicon carbide paddle 100 in an unloaded state and in a loaded state, and transmit the signal to the lifting device 500; the lifting device 500 lifts the silicon carbide paddle 100 to a preset angle, and the preset angle is equal to the angle difference.

[0030] Before the diffusion equipment 10 starts working, the silicon wafers to be processed are generally loaded onto a quartz boat specially used to carry silicon wafers, and then the quartz boat is loaded onto the silicon carbide paddle 100 (the silicon carbide paddle 100 is in an unloaded state when the quartz boat is not loaded). The quartz boat is then transported to the furnace tube 200 of the diffusion equipment 10 for heating by using the silicon carbide paddle 100. When the silicon carbide paddle 100 is loaded with the quartz boat, it is in a loaded state. Since there are too many silicon wafers to be processed in the quartz boat, the silicon carbide paddle 100 is bent due to excessive weight, and the excessively bent portion is mainly concentrated at one end of the silicon carbide paddle 100 close to the furnace tube 200. Therefore, the present application sets a lifting device 500 at a position close to the furnace tube 200 on the base 400, and the lifting device 500 is located directly below the silicon carbide paddle 100. During the actual operation of the diffusion equipment 10, the angle sensor 110 is first used to record the empty space. The angle of the silicon carbide paddle 100 in the loaded state is taken as the initial angle, and then the angle of the silicon carbide paddle 100 after loading the processed silicon wafer is recorded by the angle sensor 110, and the angle difference is calculated by the calculation module 120 through the angles recorded twice before and after, and the calculation module 120 outputs a signal to the lifting device 500, and the lifting device 500 lifts the silicon carbide paddle 100 from the bottom of the silicon carbide paddle 100 according to the angle difference, and the downward bending position of the silicon carbide paddle 100 caused by gravity after loading is lifted by the lifting device 500 and then restored to the original position, thereby realizing the compensation adjustment of the angle of the silicon carbide paddle 100 when it is unloaded and after loading the wafer, improving the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafer, and can effectively avoid the silicon carbide paddle 100 from colliding with the furnace tube 200 during operation.

[0031] Furthermore, the lifting device 500 includes an electronic hydraulic device 510, and a hydraulic rod 511 of the electronic hydraulic device 510 is correspondingly arranged directly below the silicon carbide paddle 100. The hydraulic rod 511 abuts against the bottom surface of the silicon carbide paddle 100 (the bottom surface is a side of the silicon carbide paddle 100 close to the base 400), and the hydraulic rod 511 is used to lift the silicon carbide paddle 100.

[0032] During the operation of the silicon carbide paddle 100, the angle sensor 110 first records the angle of the silicon carbide paddle 100 in an unloaded state and the angle of the silicon carbide paddle 100 in a loaded silicon wafer state, and then the calculation module 120 calculates the angle difference of the silicon carbide paddle 100 in the two states, and then transmits the signal to the electronic hydraulic device 510. The electronic hydraulic device 510 provides a certain amount of hydraulic pressure to the hydraulic rod 511 according to the signal, so that the hydraulic rod 511 gradually rises and abuts against the bottom surface of the silicon carbide paddle 100 that has excessive bending, and in the process of continuing to rise, the silicon carbide paddle 100 is moved upward. 0 The over-bent portion is lifted to a preset angle; thus, when the diffusion equipment 10 is working, the electronic hydraulic device 510 lifts the downwardly bent portion of the silicon carbide paddle 100 after loading through the lifting device 500 and then restores it to its original position, thereby realizing the compensation adjustment of the angle when the silicon carbide paddle 100 is unloaded and after loading the wafer, improving the position error caused by the excessive bending of the silicon carbide paddle 100 after loading the wafer, and can effectively avoid the collision of the silicon carbide paddle 100 with the furnace tube 200 during operation, avoid damage to the silicon wafers in the quartz boat, and at the same time extend the service life of the diffusion equipment 10.

[0033] Figure 2 This is a schematic diagram of a second embodiment of the diffusion device of the present application. As shown in FIG2 , the electronic hydraulic device 510 further includes a first electronic hydraulic device 520 . The first electronic hydraulic device 520 is arranged at a position corresponding to the middle of the silicon carbide paddle 100 .

[0034] Since the area of ​​the silicon carbide paddle 100 that bears force after loading the wafer is relatively large, that is, the front half of the entire silicon carbide paddle 100 close to the furnace tube 200 may be affected by the weight of the silicon wafer to be processed, in order to prevent the portion between the lifted portion of the silicon carbide paddle 100 and the clamped end of the silicon carbide paddle 100 from deforming during the process of lifting the excessively bent portion of the silicon carbide paddle 100, thereby preventing local deformation of the silicon carbide paddle 100, a first electronic hydraulic device 520 is further provided on the base 400 in this embodiment at a position corresponding to the middle of the silicon carbide paddle 100.

[0035] When the silicon carbide paddle 100 bends at the end near the furnace tube 200 due to excessive weight, the electronic hydraulic machine 510 arranged near the furnace tube 200 uses the hydraulic rod 511 to lift the part of the silicon carbide paddle 100 where the main bending occurs. At the same time, the hydraulic rod 511 of the first electronic hydraulic machine 520 abuts against the middle part of the silicon carbide paddle 100 during the lifting process, thereby forming support for the middle part of the silicon carbide paddle 100, thereby preventing the silicon carbide paddle 100 from being excessively deformed and then broken due to the combined effect of the weight of the silicon wafer to be processed and the upward lifting force of the hydraulic rod 511 of the electronic hydraulic machine 510 when the silicon carbide paddle 100 is lifted near the end. While improving the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafer and effectively avoiding the collision between the silicon carbide paddle 100 and the furnace tube 200 during operation, the structural strength of the silicon carbide paddle 100 is ensured, damage to the silicon carbide paddle 100 is avoided, and the service life of the silicon carbide paddle 100 is extended.

[0036] Figure 3 is a schematic diagram of a third embodiment of the diffusion device of the present application, Figure 3 The illustrated embodiment is based on Figure 2 Improvements such as Figure 3 As shown, there are multiple electronic hydraulic machines 510, and the multiple electronic hydraulic machines 510 are arranged along the extension direction of the silicon carbide paddle 100, and the hydraulic rods 511 corresponding to the multiple electronic hydraulic machines 510 have a maximum lifting height, and the maximum lifting height gradually increases along one side of the fixed bracket 300 toward one side of the furnace tube 200.

[0037] This embodiment is different from the previous embodiment in that, in this embodiment, a plurality of electronic hydraulic machines 510 are arranged on the base 400 along the extension direction of the silicon carbide paddle 100, and the maximum heights that the hydraulic rods 511 of the plurality of electronic hydraulic machines 510 can reach are different. The maximum heights that the hydraulic rods 511 of the plurality of electronic hydraulic machines 510 can reach gradually increase along the side close to the fixed bracket 300 toward the furnace tube 200.

[0038] When the silicon carbide paddle 100 is subjected to excessive pressure, it will bend toward the furnace tube 200 on the side close to the fixed bracket 300 to form a certain curvature, and the closer the silicon carbide paddle 100 is to the furnace tube 200, the larger the curvature is, that is, the closer the position of the silicon carbide paddle 100 is to the furnace tube 200, the greater the difference between the original position of the silicon carbide paddle 100 and the position of the silicon carbide paddle 100. Therefore, it is necessary to use an electronic hydraulic machine 510 with a larger lifting height at a position closer to the furnace tube 200. When the hydraulic rods 511 of multiple electronic hydraulic machines 510 reach the maximum height, the silicon carbide paddle 100 returns to its original position and maintains a relatively horizontal state.

[0039] While the multiple electronic hydraulics 510 gradually lift the silicon carbide paddle 100, the hydraulic rods 511 in the multiple electronic hydraulics 510 gradually contact the silicon carbide paddle 100 from different positions below the silicon carbide paddle 100, so that various parts of the silicon carbide paddle 100 can be smoother when contacting with the multiple hydraulic rods 511, which can effectively share the force of the silicon carbide paddle 100 and avoid obvious deformation or fracture of the silicon carbide paddle 100 in some parts.

[0040] Figure 4 is a schematic diagram of a fourth embodiment of the diffusion device of the present application, Figure 4 The illustrated embodiment is based on Figure 1 As shown in FIG. 4 , the hydraulic rod 511 includes a support tray 512, which is arranged at one end of the hydraulic rod 511 close to the silicon carbide paddle 100, and the support tray 512 abuts against the bottom surface of the silicon carbide paddle 100, and the contact surface area between the support tray 512 and the silicon carbide paddle 100 is larger than the contact surface area between the hydraulic rod 511 and the silicon carbide paddle 100.

[0041] In order to make the electronic hydraulic machine 510 lift the silicon carbide paddle 100 more stably, in the process of lifting the silicon carbide paddle 100, a support tray 512 is provided at one end of the hydraulic rod 511 close to the silicon carbide paddle 100 in this embodiment. The support tray 512 forms a surface contact with the silicon carbide paddle 100, and the force bearing area between the support tray 512 and the silicon carbide paddle 100 is increased by the support tray 512, so that the force acting on the silicon carbide paddle 100 by the support tray 512 is dispersed. When the silicon carbide paddle 100 bends due to excessive pressure, the support tray 512 can lift the silicon carbide paddle 100 upward, and at the same time avoid deformation or rupture of the silicon carbide paddle 100 due to the force of the support tray 512 on the silicon carbide paddle 100. By improving the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafer, it is possible to effectively avoid the silicon carbide paddle 100 from colliding with the furnace tube 200 during operation, thereby avoiding damage to the silicon wafers to be processed on the silicon carbide paddle 100 and extending the service life of the diffusion equipment 10.

[0042] Furthermore, since the support tray 512 needs to be in contact with the bottom surface of the silicon carbide paddle 100 before lifting the silicon carbide paddle 100 upwards, so that the bent part of the silicon carbide paddle 100 returns to its original position, in order to ensure the stability of the contact between the support tray 512 and the silicon carbide paddle 100, the shape of the support tray 512 in this embodiment matches the shape of the bottom surface of the silicon carbide paddle 100. When the support tray 512 and the silicon carbide paddle 100 are in contact, the contact surfaces between the support tray 512 and the silicon carbide paddle 100 fit each other, further enhancing the stability of the connection between the support tray 512 and the silicon carbide paddle 100, making the silicon carbide paddle 100 more stable and less likely to shake during the upward lifting process, effectively avoiding the risk of the silicon wafer to be processed mounted on the silicon carbide paddle 100 falling off the silicon carbide paddle 100.

[0043] Furthermore, the side of the support tray 512 close to the silicon carbide paddle 100 is a plane, and the plane of the support tray 512 is perpendicular to the hydraulic rod 511. In this way, the contact between the support tray 512 and the silicon carbide paddle 100 can be better, and in the process of lifting the silicon carbide paddle 100, the silicon carbide paddle 100 is always kept in a relatively stable state, not easy to shake, and in the lifting process, the position of the silicon carbide paddle 100 in the vertical direction is not easy to shift; further improve the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafer, can effectively avoid the silicon carbide paddle 100 from colliding with the furnace tube 200 during operation, avoid damage to the silicon wafer to be processed on the silicon carbide paddle 100, and extend the service life of the diffusion device 10.

[0044] Figure 5 This is a schematic diagram of a support tray in the fifth embodiment of the diffusion device of the present application. Figure 5 The illustrated embodiment is based on Figure 4 Improvements such as Figure 6 As shown, the support tray 512 includes a support portion 513, a first positioning portion 514 and a second positioning portion 515, the first positioning portion 514 and the second positioning portion 515 are respectively connected to the edges of the support portion 513, and the positions of the first positioning portion 514 and the second positioning portion 515 correspond, the width of the support portion 513 is greater than or equal to the width of the silicon carbide paddle 100, and the silicon carbide paddle 100 is arranged between the first positioning portion 514 and the second positioning portion 515.

[0045] The present embodiment is different from the previous embodiment in that, in the present embodiment, in order to prevent the silicon carbide paddle 100 from being easily displaced in the horizontal direction during the process of the support tray 512 pushing the silicon carbide paddle 100 upward and to ensure the stability of the position of the silicon carbide paddle 100, the structure of the support tray 512 is improved. The support tray 512 in the present embodiment has three structures, namely, a support portion 513, a first positioning portion 514 and a second positioning portion 515. When the silicon carbide paddle 100 is bent under excessive pressure, the electronic hydraulic device 510 drives the support tray 512 to move upward through the hydraulic rod 511. At this time, the support portion 513 contacts the bottom surface of the silicon carbide paddle 100 while gradually approaching the silicon carbide paddle 100, and abuts against the bottom surface of the silicon carbide paddle 100 to form a support for the silicon carbide paddle 100. Support, at the same time, the first positioning portion 514 and the second positioning portion 515 extend from both sides of the silicon carbide paddle 100, and the silicon carbide paddle 100 is limited between the first positioning portion 514 and the second positioning portion 515. In this way, when the support tray 512 lifts the bent silicon carbide paddle 100 upward to restore it to its original position, even if the silicon carbide paddle 100 is offset in the horizontal direction, it will be limited between the first positioning portion 514 and the second positioning portion 515, and no obvious position deviation in the horizontal direction will occur, thereby improving the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafer, and can effectively avoid the collision of the silicon carbide paddle 100 with the furnace tube 200 during operation, avoid damage to the silicon wafers to be processed on the silicon carbide paddle 100, and at the same time extend the service life of the diffusion equipment 10.

[0046] Figure 6 Schematic diagram of the sixth embodiment of the diffusion device of the present application, as shown Figure 6 As shown, this embodiment is based on Figure 1 The electronic hydraulic machine 510 further comprises a second electronic hydraulic machine 530 and a third electronic hydraulic machine 540, the second electronic hydraulic machine 530 and the third electronic hydraulic machine 540 are spaced apart from each other, the hydraulic rod 511 in the second electronic hydraulic machine 530 and the hydraulic rod 511 in the third electronic hydraulic machine 540 have the same lifting height, and the support tray 512 is simultaneously connected to the hydraulic rod 511 in the second electronic hydraulic machine 530 and the hydraulic rod 511 in the third electronic hydraulic machine 540 at one end facing the silicon carbide paddle 100.

[0047] In this embodiment, an electronic hydraulic press 510 is used with two hydraulic rods 511 having the same lifting height, namely a second electronic hydraulic press 530 and a third electronic hydraulic press 540, and the support tray 512 is simultaneously connected to one end of the second electronic hydraulic press 530 and the third electronic hydraulic press 540 close to the silicon carbide paddle 100, so that the hydraulic rods 511 of the two electronic hydraulic presses 510 can simultaneously drive the lifting and lowering of the support tray 512 during the lifting and lowering.

[0048] When the silicon carbide paddle 100 is loaded with a quartz boat, and the silicon carbide paddle 100 is over-bent due to too many silicon wafers to be tested in the quartz boat, the second electronic hydraulic machine 530 and the third electronic hydraulic machine 540 will lift the hydraulic rod 511 according to the received signal. After the two hydraulic rods 511 lift the support tray 512 at the same time, the support tray 512 begins to contact with the silicon carbide paddle 100 and abuts against the bottom surface of the silicon carbide paddle 100. As the lifting height of the two hydraulic rods 511 increases, the silicon carbide paddle 100 is dragged upward by the support tray 512 and gradually returns to its original position from the bent position, thereby improving the position error caused by excessive bending of the silicon carbide paddle 100 after loading the wafers, and can effectively prevent the silicon carbide paddle 100 from colliding with the furnace tube 200 during operation.

[0049] In addition, the hydraulic rod 511 of the second electronic hydraulic machine 530 and the hydraulic rod 511 of the third electronic hydraulic machine 540 form two fulcrums on the support tray 512, sharing the pressure exerted on the support tray 512 by the silicon carbide paddle 100, while providing effective support for the support tray 512 and preventing the support tray 512 from being damaged.

[0050] In order to avoid collision between the silicon carbide paddle 100 and the furnace tube 200 during operation, and to repeatedly adjust the position of the silicon carbide paddle 100 in an unloaded state, the present application further provides a laser ruler 600 on the silicon carbide paddle 100, as follows:

[0051] Figure 7 This is a schematic diagram of the seventh embodiment of the diffusion device of the present application, as shown Figure 7 As shown, the diffusion device 10 also includes a laser ruler 600 for detecting the position of the silicon carbide paddle 100; the laser ruler 600 includes a transmitting component 620 and a receiving component 610, the transmitting component 620 is arranged on a side of the silicon carbide paddle 100 close to the fixed bracket 300, and the receiving component 610 is arranged on the furnace tube 200, and the transmitting component 620 corresponds to the receiving component 610.

[0052] A marking line signal is sent out by the transmitting component 620 and received by the receiving component 610 to form a marking line for adjusting the position of the silicon carbide paddle 100, so that the silicon carbide paddle 100 can be adjusted in position according to the marking line as a reference to avoid position deviation of the silicon carbide paddle 100.

[0053] Furthermore, the transmitting component 620 and the receiving component 610 in the laser ruler 600 are both arched, and the outer edges of the transmitting component 620 and the receiving component 610 are both arc-shaped, and the inner edges of the transmitting component 620 and the receiving component 610 are both square; wherein, the transmitting component 620 is provided with a power supply, a charging interface, a horizontal scale reference, a horizontal bubble mark and a cross laser head, the power supply is electrically connected to the charging interface, the horizontal scale reference and the horizontal bubble mark are positively connected, and the cross laser head is electrically connected to the power supply.

[0054] In actual operation, the transmitting component 620 of the laser ruler 600 is first placed on the side of the silicon carbide paddle 100 close to the fixed bracket 300, and then the receiving component 610 is installed on the furnace tube 200 corresponding to the position of the transmitting component 620, so that the signal emitted by the transmitting component 620 can be received by the receiving component 610 to form a marking line; the front and rear scale lines of the transmitting component 620 and the level bubble mark at the top are used to adjust the angle of the transmitting component 620 relative to the silicon carbide paddle 100, so that the transmitting component 620 remains horizontal relative to the carbon silicon slurry. Then, referring to the vertical laser line emitted by the cross laser head of the transmitting component 620, the angle of the transmitting component 620 relative to the forward direction of the silicon carbide paddle 100 is adjusted to keep the transmitting component 620 vertical relative to the forward direction of the silicon carbide paddle 100.

[0055] The above operation can make the cross mark line emitted by the cross laser head on the transmitting component 620 parallel to the silicon carbide paddle 100 and located at the center of the silicon carbide paddle 100, so that the extension direction of the laser mark line emitted by the transmitting component 620 replaces the direction of the silicon carbide paddle 100; that is, the laser mark line is corrected relative to the furnace tube 200, and the silicon carbide paddle 100 will also enter the furnace tube 200 according to the corresponding trajectory. By making the laser emitted by the transmitting component 620 parallel to the silicon carbide paddle 100 and located at the center of the silicon carbide paddle 100, the length of the silicon carbide paddle 100 can be extended, simulating the angle and position of the silicon carbide paddle 100 when it extends into the furnace tube 200, reducing the error of visual calibration by human eyes and repeatedly moving the silicon carbide paddle 100, and improving the accuracy and efficiency of calibration.

[0056] In addition, the pitch angle of the emitting component 620 relative to the silicon carbide paddle 100 can be adjusted according to the actual situation so that the vertical line of the laser marking coincides with the center line of the end of the furnace tube 200; the distances from both sides of the furnace tube 200 to the center of the cursor are equal. Based on the above two points, the position of the silicon carbide paddle 100 is continuously adjusted to meet the requirements. Finally, four points are connected in a straight line, and the position adjustment is completed.

[0057] It should be noted that the inventive concept of the present application can form a large number of embodiments, but the length of the application document is limited and it is impossible to list them one by one. Therefore, under the premise of no conflict, the embodiments or technical features described above can be arbitrarily combined to form new embodiments. After the embodiments or technical features are combined, the original technical effects will be enhanced.

[0058] The above content is a further detailed description of the present application in combination with specific optional implementation methods, and it cannot be determined that the specific implementation of the present application is limited to these descriptions. For ordinary technicians in the technical field to which the present application belongs, several simple deductions or substitutions can be made without departing from the concept of the present application, which should be deemed to fall within the scope of protection of the present application.

Claims

1. A diffusion device, comprising a silicon carbide paddle, a furnace tube, a fixed bracket and a base, wherein one end of the base is connected to the furnace tube, the fixed bracket is movably connected to one end of the base away from the furnace tube, and the fixed bracket can move relative to the base toward the furnace tube; one end of the silicon carbide paddle is connected to the fixed bracket, and the other end faces the furnace port of the furnace tube; It is characterized in that The diffusion device further comprises a lifting device, which is arranged at a position of the base close to the furnace tube and directly below the silicon carbide paddle, and an angle sensor and a calculation module are arranged on the silicon carbide paddle; the angle sensor is connected to the calculation module, and the calculation module is connected to the lifting device; Wherein, the plane parallel to the base is taken as the horizontal plane, the angle sensor is used to record the angle between the silicon carbide propeller and the horizontal plane in an unloaded state, and the angle between the silicon carbide propeller and the horizontal plane in a loaded state; the calculation module is used to calculate the angle difference between the silicon carbide propeller in an unloaded state and in a loaded state, and transmit the signal to the lifting device; the lifting device lifts the silicon carbide propeller to a preset angle, and the preset angle is equal to the angle difference; The lifting device includes an electronic hydraulic device, a hydraulic rod of the electronic hydraulic device is correspondingly arranged directly below the silicon carbide propeller, and the hydraulic rod abuts against the bottom surface of the silicon carbide propeller, and the hydraulic rod is used to lift the silicon carbide propeller; The hydraulic rod includes a support tray, which is arranged at one end of the hydraulic rod close to the silicon carbide paddle. The support tray abuts against the bottom surface of the silicon carbide paddle, and the contact surface area between the support tray and the silicon carbide paddle is larger than the contact surface area between the hydraulic rod and the silicon carbide paddle.

2. The diffusion device according to claim 1, characterized in that There are multiple electronic hydraulic devices, and the multiple electronic hydraulic devices are arranged along the extension direction of the silicon carbide paddle, and the hydraulic rods corresponding to the multiple electronic hydraulic devices have a maximum lifting height, and the maximum lifting height gradually increases along one side of the fixed bracket toward one side of the furnace tube.

3. The diffusion device according to claim 1, characterized in that The shape of the support tray matches the shape of the bottom surface of the silicon carbide paddle.

4. The diffusion device according to claim 1, characterized in that The support tray includes a supporting portion, a first positioning portion and a second positioning portion, the first positioning portion and the second positioning portion are respectively connected to edges of the supporting portion, and the positions of the first positioning portion and the second positioning portion correspond to each other, the width of the supporting portion is greater than or equal to the width of the silicon carbide paddle, and the silicon carbide paddle is arranged between the first positioning portion and the second positioning portion.

5. The diffusion device according to claim 1, characterized in that A side of the support tray close to the silicon carbide paddle is a plane, and the plane of the support tray is perpendicular to the hydraulic rod.

6. The diffusion device according to claim 1, characterized in that The electronic hydraulic device also includes a first electronic hydraulic device, and the first electronic hydraulic device is arranged at a position corresponding to the middle of the silicon carbide paddle.

7. The diffusion device according to claim 1, characterized in that The electronic hydraulic machine also includes a second electronic hydraulic machine and a third electronic hydraulic machine. The second electronic hydraulic machine and the third electronic hydraulic machine are arranged at an interval. The hydraulic rod in the second electronic hydraulic machine has the same lifting height as the hydraulic rod in the third electronic hydraulic machine. The support tray is simultaneously connected to the hydraulic rod in the second electronic hydraulic machine and the hydraulic rod in the third electronic hydraulic machine toward one end of the silicon carbide paddle.

8. The diffusion device according to claim 1, characterized in that The diffusion device also includes a laser ruler, which is used to detect the position of the silicon carbide paddle; the laser ruler includes a transmitting component and a receiving component, the transmitting component is arranged on a side of the silicon carbide paddle close to the fixed bracket, the receiving component is arranged on the furnace tube, and the transmitting component corresponds to the receiving component.

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