A design method for strong scattering structure with variable elevation and bistatic angle

Abstract

The invention relates to a method for designing a strong scattering structure with a variable pitch bistatic angle, and relates to the field of electromagnetic scattering. The method comprises the following steps: designing a scattering structure composed of a flat plate and an arc plate, with a random size, wherein the angle between the flat plate and the arc plate is set to β; placing the scattering structure vertically so that the flat plate is in an XOZ plane, assigning different values ​​to β, and then performing electromagnetic theoretical simulation calculation on the scattering structure; obtaining bistatic scattering characteristic images with different pitch bistatic angles; quantitatively counting data of the strong scattering intensity angle range and the bistatic pitch angle in different images, obtaining a line graph of the strong scattering intensity angle range and the bistatic pitch angle, and fitting the line graph to obtain an equation relationship between the strong scattering intensity angle range and the bistatic pitch angle. The invention has the advantage that a new type of strong scattering structure can be designed to realize strong scattering characteristics with different pitch bistatic angles.

Description

Technical Field

[0001] The invention relates to the technical field of electromagnetic scattering, and in particular to a design method for a strong scattering structure with variable elevation and dual station angles. Background Art

[0002] The development of weapon systems has gone through a gradual process. With the increasing complexity of battlefield environments and the improvement of stealth performance of targets, traditional weapon systems face severe challenges. In order to achieve precise strikes on targets, higher and higher requirements are placed on weapon system seekers. Therefore, the research on dual (multi) base radar guidance systems is a key development direction. Dual (multi) base radar detection can significantly improve the stealth target recognition capability and anti-interference capability, and can effectively increase the probability of successful attacks. The dual-station scattering characteristics of traditional typical body structures are weak when detecting with variable dual-station angles. When the azimuth angles of the transmitting radar and the receiving radar are the same but the elevation angles are different, the strong dual-station scattering characteristics are difficult to achieve.

[0003] Therefore, in view of the above shortcomings, it is necessary to provide a design method for a strong scattering structure with variable elevation and dual station angles. Summary of the invention

[0004] 1. Technical issues to be resolved

[0005] The technical problem to be solved by the present invention is to solve the problem that it is difficult for traditional scattering structures to achieve bistatic strong scattering characteristics.

[0006] (II) Technical solution

[0007] In order to solve the above technical problems, the present invention provides a method for designing a strong scattering structure with a variable pitch bistatic angle, comprising the following steps:

[0008] Ⅰ. Design a scattering structure consisting of a flat plate and an arc plate with random sizes, where the angle between the flat plate and the arc plate is set to β;

[0009] II. Place the scattering structure vertically so that the plate is in the XOZ plane, assign different values ​​to β, and then perform electromagnetic theoretical simulation calculations on the scattering structure;

[0010] III. Obtain bistatic scattering characteristic images at different bistatic elevation angles; quantitatively count the data of the strong scattering intensity angle range and the bistatic elevation angle in different images, obtain a line graph of the strong scattering intensity angle range and the bistatic elevation angle, and fit the line graph to obtain the equation relationship between the strong scattering intensity angle range and the bistatic elevation angle.

[0011] As a further illustration of the present invention, preferably, the equation obtained by fitting the line graph is:

[0012] y=0.15x 5 -2.87x4 +19.09x 3 -56x 2 +75.64x-22.14;

[0013] Among them, y represents the angular range of strong scattering intensity, and x represents the bistatic elevation angle.

[0014] As a further illustration of the present invention, preferably, the strong scattering intensity range is greater than 15dBm 2 The scattering intensity.

[0015] As a further illustration of the present invention, preferably, the angle β between the flat plate and the curved plate satisfies:

[0016]

[0017] α represents an arbitrary angle.

[0018] As a further illustration of the present invention, preferably, the parameters of the simulation calculation are:

[0019] The Ku band is selected, the incident azimuth angle is 0°~90°, the incident elevation angle is 1°~10°, and the simulation calculation interval is 1°.

[0020] (III) Beneficial effects

[0021] The above technical solution of the present invention has the following advantages:

[0022] The present invention designs a novel variable-pitch dual-station scattering structure. When the transmitting radar and the receiving radar detect with the same azimuth dual-station angle and different pitch dual-station angles, the strong scattering structure has stronger dual-station scattering characteristics. The scattering characteristics of the dual-station angles with different pitches are simulated and calculated, and the relationship between the angle range of the dual-station scattering characteristics of this structure and the dual-station angle is obtained, thereby providing a design idea for the design of dual-station deception interference. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a planar structure diagram of the strong scattering structure of the present invention;

[0024] Figure 2 is a structural diagram of a curved plate in a strong scattering structure of the present invention;

[0025] Figure 3 is a side view of the strong scattering structure of the present invention;

[0026] Figure 4 is a parameter diagram of a strong scattering structure of the present invention;

[0027] Figure 5 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 1° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0028] Figure 6 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 2° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0029] Figure 7 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 3° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0030] Figure 8 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 4° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0031] Fig. 9 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 5° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0032] Fig.10 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 6° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0033] Fig.11 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 7° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0034] Fig.12 It is a simulation result diagram of the bistatic scattering characteristics of the strong scattering structure of the present invention when the elevation bistatic angle is 8° and the azimuth bistatic angle is 10° as a function of the spatial angle;

[0035] Fig.13 It is a relationship diagram between the width of the strong scattering angle and the elevation bistatic angle of the present invention.

[0036] In the figure: 1. Flat plate; 2. Curved plate. DETAILED DESCRIPTION

[0037] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0038] A design method for a strong scattering structure with variable elevation and bistatic angles, combined with Figure 1-Figure 4 , including the following steps:

[0039] Ⅰ. Design a scattering structure consisting of a flat plate 1 and an arc plate 2, with random sizes. The flat plate 1 is a quadrilateral structure with a side length of a. The structure of the arc plate 2 is like the outer arc surface of a horizontally placed truncated cone shell, with a bottom radius of R and a top radius of r. The bottom of the arc plate 2 is fixedly connected to the flat plate 1, and the top of the arc plate 2 is located above the flat plate 1. The generatrix angle between the flat plate 1 and the arc plate 2 is set to β.

[0040] Ⅱ. Place the scattering structure vertically so that the plate 1 is in the XOZ plane, assign different values ​​to β, and then perform electromagnetic theoretical simulation calculations on the scattering structure; the main calculation parameters are Ku band, incident azimuth angle of 0°~90°, incident elevation angle of 1°~10°, and the simulation calculation interval is 1° for the dual-station RCS scattering characteristics.

[0041] III. Obtain bistatic scattering characteristic images at different bistatic elevation angles, and obtain the following results: Figure 5-Figure 12 From the images obtained by simulation results, it can be seen that with the increase of the elevation bistatic angle, the strong scattering angle range of the bistatic scattering characteristic gradually widens and then gradually narrows. Then, the strong scattering intensity (greater than 15dBm 2 ) angle range and the dual-station elevation angle data, and obtain the line graph of the strong scattering intensity angle range and the dual-station elevation angle, such as Fig.13 As shown, the equations for fitting the line graph to obtain the angle range of strong scattering intensity and the dual-station elevation angle are as follows:.

[0042] y=0.15x 5 -2.87x 4 +19.09x 3 -56x 2 +75.64x-22.14;

[0043] Among them, y represents the angular range of strong scattering intensity, and x represents the bistatic elevation angle.

[0044] From a large number of simulations, it is known that when the angle β between the flat plate 1 and the curved plate 2 satisfies:

[0045] When α is represented by an arbitrary angle, the bistatic scattering characteristic is stronger. When β is selected as 95° and the azimuth angle is 10°, the bistatic scattering characteristic of the scattering structure composed of the flat plate 1 and the curved plate 2 is stronger.

[0046] In summary, the present invention designs a new strong scattering structure and obtains a strong scattering intensity (greater than 15dBm) by simulation method. 2 ) The relationship between the angle range and the dual-station elevation angle provides an empirical formula for the subsequent design of dual-station deception interference and reduces the technical difficulty of future development.

[0047] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for designing a strong scattering structure with variable elevation and bistatic angles, characterized in that: The following steps are included: Ⅰ. Design a scattering structure consisting of a flat plate (1) and an arc plate (2) with random sizes, wherein the angle between the flat plate (1) and the arc plate (2) is set to β; II. Place the scattering structure vertically so that the plate (1) is in the XOZ plane, assign different values ​​to β, and then perform electromagnetic theoretical simulation calculations on the scattering structure; III. Obtain bistatic scattering characteristic images at different bistatic elevation angles; The data of the strong scattering intensity angle range and the bistatic elevation angle in different images were quantitatively counted to obtain a line graph of the strong scattering intensity angle range and the bistatic elevation angle. The line graph was fitted to obtain the equation relationship between the strong scattering intensity angle range and the bistatic elevation angle.

2. The method for designing a strong scattering structure with variable elevation bistatic angle according to claim 1, characterized in that: The equation obtained by fitting the line graph is: y=0.15x 5 -2.87x 4 +19.09x 3 -56x 2 +75.64x-22.14; Among them, y represents the angular range of strong scattering intensity, and x represents the bistatic elevation angle.

3. The method for designing a strong scattering structure with variable elevation bistatic angle according to claim 2, characterized in that: Strong scattering intensity range is greater than 15dBm 2 The scattering intensity.

4. The method for designing a strong scattering structure with variable elevation bistatic angle according to claim 3, characterized in that: The angle β between the flat plate (1) and the curved plate (2) satisfies: α represents an arbitrary angle.

5. The method for designing a strong scattering structure with variable elevation bistatic angle according to claim 4, characterized in that: The parameters of the simulation calculation are: The Ku band is selected, the incident azimuth angle is 0°~90°, the incident elevation angle is 1°~10°, and the simulation calculation interval is 1°.

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