Mask, exposure equipment and exposure method

Abstract

The embodiments of the present application provide a mask, an exposure device, and an exposure method. The mask includes: a first mask sub-plate having a plurality of sub-mask pattern groups and a second mask sub-plate having a plurality of light-transmitting areas. The second mask sub-plate is arranged on one side of the first mask sub-plate and is movable relative to the first mask sub-plate. The mobile alignment structure is connected to the second mask sub-plate and is used to control the movement of the second mask sub-plate according to the received alignment signal so that the light-transmitting areas correspond to different sub-mask pattern groups in different exposure processes. The embodiments of the present application can integrate multiple mask patterns into one mask, reduce the number of masks used, reduce production costs, and at the same time reduce the risk of mask movement during production and the resulting product process defects.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular, to a mask, an exposure device, and an exposure method. Background Art

[0002] A mask is a pattern master used in the photolithography process commonly used in micro-nanofabrication technology. The mask pattern structure is formed on a transparent substrate using an opaque light-blocking film. The pattern information is then transferred to the product substrate through the exposure process. The mask to be processed consists of a substrate, a chrome layer, and a photoresist layer. Its pattern structure is obtained through platemaking.

[0003] Masks are widely used and are required in fields involving photolithography processes, such as IC (Integrated Circuit), FPD (Flat Panel Display), PCB (Printed Circuit Boards), MEMS (Micro Electro Mechanical Systems), etc.

[0004] Taking the display industry as an example, the production of a single display involves multiple mask exposure processes. Currently, most display manufacturers use one mask per exposure pattern layer. This increases the risk of mask movement during production and the resulting process defects. Furthermore, using more masks also increases production costs. Summary of the Invention

[0005] In view of the shortcomings of the existing methods, this application proposes a mask, exposure equipment and exposure method to solve the technical problems of the existing technology such as large number of masks used, high production costs, frequent mask movements and low product quality reliability.

[0006] In order to solve the above problems, the embodiments of the present application mainly provide the following technical solutions:

[0007] In a first aspect, an embodiment of the present application provides a mask, the mask comprising:

[0008] The first mask sub-plate includes a plurality of sub-mask patterns and a light shielding area between adjacent sub-mask patterns. The plurality of sub-mask patterns include a plurality of sub-mask pattern groups, wherein the same sub-mask pattern group includes the same exposure pattern, and different sub-mask pattern groups include different exposure patterns.

[0009] The second mask sub-plate is arranged on one side of the first mask sub-plate and includes a plurality of light-transmitting areas and non-light-transmitting areas located between adjacent light-transmitting areas.

[0010] The mobile alignment structure is located on a side of the second reticle away from the first reticle and is connected to the second reticle. The orthographic projection of the mobile alignment structure on the second reticle is located in the non-transparent area. The mobile alignment structure is used to control the movement of the second reticle relative to the first reticle based on the received alignment signal, so that the transparent area corresponds to different sub-mask pattern groups during different exposure processes.

[0011] Optionally, when any sub-mask pattern group corresponds to a light-transmitting area, the orthographic projection area of the sub-mask pattern group on the second mask sub-plate is smaller than the area of the light-transmitting area, and the orthographic projection of the sub-mask pattern group that does not correspond to the light-transmitting area on the second mask sub-plate is located within the non-light-transmitting area.

[0012] Optionally, the first mask sub-plate includes a plurality of first alignment marks, each of which is located in the light-shielding area. Each sub-mask pattern group corresponds to a first alignment mark, and each first alignment mark is located around the sub-mask pattern group. The second mask sub-plate includes a plurality of second alignment marks, each of which is located in the light-opaque area and around the light-opaque area.

[0013] Optionally, in each group of sub-mask patterns, a first alignment mark is provided around each sub-mask pattern.

[0014] Optionally, the first alignment mark and the second alignment mark have the same shape, and / or the first alignment mark and the second alignment mark have the same size.

[0015] Optionally, when any sub-mask pattern group corresponds to the light-transmitting area, the orthographic projection of the first alignment mark on the second sub-mask overlaps with the second alignment mark.

[0016] Optionally, the mobile alignment structure includes a guide rail device and a drive device. The guide rail device is located on a side of the second mask daughter away from the first mask daughter and is connected to the second mask daughter. The drive device is connected to the guide rail device and is used to drive the second mask daughter to move on the guide rail device based on the received alignment signal.

[0017] Optionally, the guide rail device includes a first guide rail assembly and a second guide rail assembly, wherein the first guide rail assembly includes a first guide rail and a first slider slidably connected to the first guide rail; and the second guide rail assembly includes a second guide rail and a second slider slidably connected to the second guide rail.

[0018] Optionally, the first guide rail and the second guide rail are arranged perpendicularly.

[0019] Optionally, the first guide rail is fixedly connected to the exposure device.

[0020] Optionally, the first slider is fixedly connected to the second guide rail, and is used to drive the second guide rail to move along the first guide rail; the second slider is fixedly connected to the light-transmitting plate, and is used to drive the light-transmitting plate to move along the second guide rail.

[0021] In a second aspect, an embodiment of the present application provides an exposure device, comprising:

[0022] The mask and exposure chamber according to any one of the first aspects, wherein a mask carrying platform for carrying the mask is provided in the exposure chamber.

[0023] In a third aspect, an embodiment of the present application provides an exposure method, comprising: an exposure method using any mask exposure method of the first aspect, comprising:

[0024] The mobile alignment structure receives an alignment signal from the exposure device;

[0025] The mobile alignment structure controls the movement of the second mask sub-plate according to the alignment signal, so that the light-transmitting areas correspond to different sub-mask pattern groups in different exposure processes;

[0026] The substrate to be exposed is exposed using the first mask sub-plate and the second mask sub-plate.

[0027] The beneficial technical effects brought about by the technical solutions provided in the embodiments of the present application include:

[0028] The mask provided in the embodiment of the present application includes a first mask sub-plate and a second mask sub-plate, wherein the first mask sub-plate integrates multiple mask patterns, and the second mask sub-plate includes a single pattern translucent area and a non-translucent area. The second mask sub-plate can be moved relative to the first mask sub-plate according to the alignment signal received by the mobile alignment structure, so that the translucent area corresponds to the sub-mask pattern to be exposed, thereby achieving selective exposure. The mask provided in the present application can integrate multiple mask patterns into one mask for exposure process, reducing the number of masks. At the same time, it can also reduce the risk of mask movement during product production and reduce the probability of process defects and mask damage caused by mask movement. While reducing production costs in production operations, it improves the reliability of product quality.

[0029] The above description is only an overview of the technical solution of the embodiment of the present application. In order to more clearly understand the technical means of the embodiment of the present application, it can be implemented in accordance with the contents of the specification. In order to make the above and other purposes, features and advantages of the embodiment of the present application more obvious and easy to understand, the specific implementation method of the embodiment of the present application is specifically listed below. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the optional embodiments below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the embodiments of the present application. The same reference symbols are used throughout the accompanying drawings to represent the same components. In the accompanying drawings:

[0031] Figure 1 A schematic structural diagram of a mask provided in an embodiment of the present application;

[0032] Figure 2 A schematic structural diagram of a mask provided in an embodiment of the present application;

[0033] Figure 3 A schematic diagram of a partial structure of a mask provided in an embodiment of the present application;

[0034] Figure 4 A schematic diagram of a partial structure of a mask provided in an embodiment of the present application;

[0035] Figure 5 A schematic diagram of a partial structure of a mask provided in an embodiment of the present application;

[0036] Figure 6 A schematic diagram of a partial structure of a mask provided in an embodiment of the present application;

[0037] Figure 7 A schematic flow chart of an exposure method provided in an embodiment of the present application.

[0038] Description of reference numerals:

[0039] 1-first mask sub-plate; 2-second mask sub-plate; 3-moving alignment structure;

[0040] 11-first sub-mask pattern group; 12-second sub-mask pattern group; 13-third sub-mask pattern group; 14-light-shielding area;

[0041] 21-light-transmitting area; 22-light-impermeable area;

[0042] 31-guide rail device; 32 driving device; 311-first guide rail assembly; 312; second guide rail assembly;

[0043] 311a-first guide rail; 311b-first slider; 312a-second guide rail; 312b-second slider;

[0044] 41 - first alignment mark; 42 - second alignment mark. DETAILED DESCRIPTION

[0045] The present application is described in detail below. Examples of embodiments of the present application are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar components or components having the same or similar functions. In addition, if the detailed description of the known technology is not necessary for the features of the present application shown, it will be omitted. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and are not to be construed as limiting the present application.

[0046] It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those skilled in the art to which this application belongs. It should also be understood that terms such as those defined in common dictionaries should be understood to have meanings consistent with their meanings in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless specifically defined as herein.

[0047] It will be understood by those skilled in the art that, unless expressly stated otherwise, the singular forms "a", "an", "said" and "the" used herein may also include the plural forms. It should be further understood that the term "comprising" used in the specification of the present application refers to the presence of the features, integers, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or groups thereof. It should be understood that when we refer to an element as being "connected" or "coupled" to another element, it may be directly connected or coupled to the other element, or there may be intermediate elements. In addition, "connected" or "coupled" as used herein may include wireless connections or wireless couplings. The term "and / or" used herein includes all or any units and all combinations of one or more associated listed items.

[0048] The mask, which transfers the pattern information on the mask to the product substrate through the exposure process, is a crucial component of the photolithography process. In actual production, the purchase cost of a single mask is very high. Furthermore, the mask is frequently moved during production, increasing the risk of mask wear and process defects. This results in higher product costs and lower quality reliability.

[0049] How to reduce the number of masks used in the production process and reduce the number of times the masks are moved; improve product quality reliability and reduce product production costs are of great significance to improving the economic benefits of the enterprise and enhancing market competitiveness.

[0050] In response to the above-mentioned problems existing in the current related technologies, the embodiments of the present application provide a new mask to solve the technical problems existing in the current technologies of large number of mask requirements and frequent movement.

[0051] In order to make the objectives, technical solutions and advantages of this application clearer, the implementation methods of this application will be further described in detail below with reference to the accompanying drawings.

[0052] The embodiment of the present application provides a mask, such as Figure 1 As shown, the mask includes: a first mask sub-plate 1, a second mask sub-plate 2 and a shift alignment structure 3. The first mask sub-plate 1 includes a plurality of sub-mask patterns and a light shielding area 14 located between adjacent sub-mask patterns. The plurality of sub-mask patterns include a plurality of groups of sub-mask patterns ( Figure 1 , three sub-mask pattern groups are shown, specifically, a first sub-mask pattern group 11, a second sub-mask pattern group 12, and a third sub-mask pattern group 13. Each sub-mask pattern group includes the same exposure pattern, while different sub-mask pattern groups include different exposure patterns. For example, the first sub-mask pattern group 11 includes a first exposure pattern, the second sub-mask pattern group 12 includes a second exposure pattern, and the third sub-mask pattern group 13 includes a third exposure pattern. Each exposure pattern can be determined based on the actual desired exposure pattern.

[0053] like Figure 1 As shown, the second mask 2 is disposed on one side of the first mask 1 and is movable relative to the first mask 1. The second mask 2 includes multiple light-transmitting regions 21 and non-light-transmitting regions 22 located between adjacent light-transmitting regions 21. A mobile alignment structure 3 is located on the side of the second mask 2 away from the first mask 1 and is connected to the second mask 2. The orthographic projection of the mobile alignment structure 3 on the second mask 2 is located in the non-light-transmitting region 22. The mobile alignment structure 3 is used to control the movement of the second mask 2 relative to the first mask 1 based on the received alignment signal, so that the light-transmitting regions 21 correspond to different sub-mask pattern groups during different exposure processes.

[0054] In some embodiments, the first mask sub-plate 1 may include three groups of sub-mask patterns, such as Figure 1 As shown, it includes a first sub-mask pattern group 11 , a second sub-mask pattern group 12 and a third sub-mask pattern group 13 .

[0055] In the embodiment of the present application, when any sub-mask pattern group corresponds to the light-transmitting area 21, the orthographic projection area of the sub-mask pattern group on the second mask daughter plate 2 is smaller than the area of the light-transmitting area 21. Furthermore, the orthographic projection area of the sub-mask pattern group that does not correspond to the light-transmitting area 21 on the second mask daughter plate 2 is located within the non-light-transmitting area 22.

[0056] Specifically, if Figure 1As shown, when the first sub-mask pattern group 11 is an exposure pattern, the first sub-mask pattern group 11 corresponds to the light-transmitting area 21, and the orthographic projection area of the first sub-mask pattern group 11 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21, so that the orthographic projection of the first sub-mask pattern group 11 on the second mask sub-plate 2 falls within the light-transmitting area 21, that is, the orthographic projection area of each first sub-mask pattern in the first sub-mask pattern group 11 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21 at the corresponding position, so as to ensure that during exposure, light can fully illuminate each first sub-mask pattern.

[0057] like Figure 2 As shown, when the second sub-mask pattern group 12 is an exposure pattern, the second sub-mask pattern group 12 corresponds to the light-transmitting area 21, and the orthographic projection area of the second sub-mask pattern group 12 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21, so that the orthographic projection of the second sub-mask pattern group 12 on the second mask sub-plate 2 falls within the light-transmitting area 21, that is, the orthographic projection area of each second sub-mask pattern in the second sub-mask pattern group 12 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21 at the corresponding position, so as to ensure that light can fully illuminate each second sub-mask pattern during exposure.

[0058] Similarly, when the third sub-mask pattern group 13 is an exposure pattern, the third sub-mask pattern group 13 corresponds to the light-transmitting area 21, and the orthographic projection area of the third sub-mask pattern group 13 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21, so that the orthographic projection of the third sub-mask pattern group 13 on the second mask sub-plate 2 falls within the light-transmitting area 21, that is, the orthographic projection area of each third sub-mask pattern in the third sub-mask pattern group 13 on the second mask sub-plate 2 is smaller than the area of the light-transmitting area 21 at the corresponding position, so as to ensure that during exposure, light can fully illuminate each third sub-mask pattern.

[0059] In the embodiments of this application, Figure 3 As shown, the first mask sub-plate 1 includes a plurality of first alignment marks 41, which are located in the light-shielding area 14. Each sub-mask pattern group corresponds to a set of first alignment marks 41, and the first alignment marks 41 are located around the sub-mask pattern group. The provision of the first alignment marks 41 enables the exposure equipment to capture the specific position of each sub-mask pattern group. Furthermore, in a specific embodiment, within each sub-mask pattern group, first alignment marks 41 are provided around each sub-mask pattern, which further enables the exposure equipment to accurately capture the specific position of each sub-mask pattern group.

[0060] like Figure 4As shown, the second mask 2 includes multiple second alignment marks 42. The second alignment marks 42 are located in the non-transparent area 22 and around the transparent area 21. The provision of the second alignment marks 42 enables the exposure equipment to capture the specific position of the transparent area 21. Furthermore, in a specific embodiment, a second alignment mark 42 can be provided around each transparent area 21. For each transparent area 21, one second alignment mark 42 can be provided, or multiple second alignment marks 42 can be provided. The figure uses four second alignment marks 42 as an example.

[0061] The first mask sub-plate 1 includes multiple groups of first alignment marks 41, and each sub-mask pattern corresponds to one or more first marks 41 around it. Figure 3 As shown, the first mask sub-plate 1 includes three groups of first alignment marks 41, and each sub-mask pattern corresponds to the four first alignment marks 41 around it. Figure 4 As shown, the second mask 2 includes a group of second alignment marks 42 , and the second alignment marks around each light-transmitting area can be moved to correspond to any group of first alignment marks 41 .

[0062] In an embodiment of the present application, the first alignment mark 41 and the second alignment mark 42 have the same shape, and / or the first alignment mark 41 and the second alignment mark 42 have the same size; specifically, the shape of the first alignment mark 41 and the second alignment mark 42 can be a cross, and the size of the first alignment mark 41 and the second alignment mark 42 can also be the same, that is, the first alignment mark 41 and the second alignment mark 42 are crosses of the same size. Of course, the shape of the first alignment mark 41 and the second alignment mark 42 is not limited to a cross, and can also be other shapes, such as a cross, a swastika, etc.

[0063] In the embodiment of the present application, when any sub-mask pattern group corresponds to the light-transmitting area, the orthographic projection of the first alignment mark on the second mask sub-plate overlaps with the second alignment mark; specifically, Figure 5 As shown, when the first sub-mask pattern group 11 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment mark 41 around the first mask pattern group on the second mask sub-plate 2 overlaps with the second alignment mark 42. When the second sub-mask pattern group 12 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment mark 41 around the second mask pattern group on the second mask sub-plate 2 overlaps with the second alignment mark 42. When the third sub-mask pattern group 13 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment mark 41 around the third mask pattern group on the second mask sub-plate 2 overlaps with the second alignment mark 42.

[0064] In a specific implementation, if the first alignment marks 41 and the second alignment marks 42 have the same shape and size, when the first sub-mask pattern group 11 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment marks 41 around the first mask pattern group 11 on the second mask sub-plate 2 completely overlaps with the second alignment marks 42. When the second sub-mask pattern group 12 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment marks 41 around the second mask pattern group 12 on the second mask sub-plate 2 completely overlaps with the second alignment marks 42. When the third sub-mask pattern group 13 corresponds to the light-transmitting area 21, the orthographic projection of the first alignment marks 41 around the third mask pattern group 13 on the second mask sub-plate 2 completely overlaps with the second alignment marks 42.

[0065] It should be noted that when the orthographic projection of the first alignment mark 41 around the sub-mask pattern group on the second mask sub-plate 2 overlaps with the second alignment mark 42, a millimeter-level error is allowed between the geometric center of the orthographic projection and the geometric center of the overlapping second alignment mark 42.

[0066] In the embodiments of this application, Figure 1 and Figure 2 As shown, the movable alignment structure 3 includes a guide rail assembly 31 and a drive assembly 32. The guide rail assembly 31 is located on the side of the second reticle 2 away from the first reticle 1 and is connected to the second reticle 2. The drive assembly 32 is connected to the guide rail assembly 31. The drive assembly 32 receives alignment signals from the exposure equipment and drives the second reticle 2 to move on the guide rail assembly 31 based on the alignment signals.

[0067] In an optional embodiment, as Figure 6 As shown, the guide rail device 31 includes a first guide rail assembly 311 and a second guide rail assembly 312. The first guide rail assembly 311 includes a first guide rail 311a and a first slider 311b slidably connected to the first guide rail. The second guide rail assembly 312 includes a second guide rail 312a and a second slider 312b slidably connected to the second guide rail.

[0068] like Figure 5 As shown, the first guide rail 311a and the second guide rail 312a respectively include two parallel rails. The first guide rail 311a and the second guide rail 312a are vertically arranged. The orthographic projections of the four rails on the second mask 2 form a rectangle.

[0069] In this embodiment of the present application, the first guide rail 311a is fixedly connected to the exposure apparatus. The first slider 311b is fixedly connected to the second guide rail 312a, and the first slider 311b is used to drive the second guide rail 312a to move along the first guide rail 311a. The second slider 312b is fixedly connected to the second reticle 2, and is used to drive the second reticle 2 to move along the second guide rail 312a. In this way, the second reticle 2 is moved along its plane by the first slider 311b and the second slider 312b, respectively. It should be understood that this movement does not limit the order in which the first slider 311b and the second slider 312b move.

[0070] When the first sub-mask pattern on the first reticle 1 needs to be exposed, the exposure equipment first acquires the position coordinates of the first alignment marks 41 and the second alignment marks 42. Based on the acquired position coordinates, an alignment signal is sent to the movable alignment mechanism 3. The alignment signal includes the position coordinates of the first alignment marks 41 and the second alignment marks 42 corresponding to each sub-mask pattern group. Based on the alignment signal, the movable alignment mechanism 3 controls the first slider 311b and the second slider 312b to move along their respective tracks, driving the second reticle 2 fixed to the second slider 312b to move. This ensures that the first alignment marks 41 around the first sub-mask pattern align with the second alignment marks 42 around the light-transmitting area 21, thereby aligning the first sub-mask pattern with the light-transmitting area 21. At this point, the orthographic projection of the first sub-mask pattern on the second reticle 2 falls exactly into the light-transmitting area 21. The orthographic projections of the other sub-mask patterns on the second reticle 2 fall into the non-light-transmitting area 22.

[0071] Based on the same inventive concept, embodiments of the present application provide an exposure apparatus comprising the aforementioned reticle and an exposure chamber, wherein the exposure chamber is provided with a mask carrier for supporting the reticle. Because the exposure apparatus includes the aforementioned reticle, the exposure apparatus exhibits the same beneficial technical effects as the aforementioned reticle. Therefore, the beneficial effects of the exposure apparatus will not be reiterated herein.

[0072] Based on the same inventive concept, the embodiment of the present application provides an exposure method using the above mask exposure, such as Figure 7 As shown, the exposure method includes:

[0073] S101, moving the alignment structure to receive an alignment signal from an exposure device;

[0074] S102, the mobile alignment structure controls the movement of the second mask sub-plate according to the alignment signal, so that the light-transmitting areas correspond to different sub-mask pattern groups in different exposure processes;

[0075] S103 , using the first mask sub-plate and the second mask sub-plate to expose the substrate to be exposed.

[0076] The exposure method in the embodiment of the present application is introduced below with reference to a specific embodiment.

[0077] When it is time to expose the first sub-mask pattern 11 on the first reticle 1, the exposure device first acquires the position coordinates of the first alignment marks 41 and the second alignment marks 42 surrounding the first sub-mask pattern 11. Based on the acquired position coordinates, an alignment signal is sent to the movable alignment mechanism 3. The alignment signal includes the position coordinates of the first alignment marks 41 and the second alignment marks 42 corresponding to the first sub-mask pattern 11. Based on the alignment signal, the movable alignment mechanism 3 controls the first slider 311b and the second slider 312b to move along their respective tracks, driving the second reticle 2 fixed to the second slider 312b to move. This causes the first alignment marks 41 surrounding the first sub-mask pattern 11 to align with the second alignment marks 42 surrounding the light-transmitting area 21, thereby aligning the first sub-mask pattern 11 with the light-transmitting area 21. At this point, the orthographic projection of the first sub-mask pattern 11 on the second reticle 2 falls exactly within the light-transmitting area 21. The orthographic projections of the other sub-mask patterns on the second reticle 2 fall within the light-impermeable area 22.

[0078] Then, the substrate to be exposed is subjected to exposure of the first sub-mask pattern and subsequent operations.

[0079] Similarly, when the second sub-mask pattern 12 (or the third sub-mask pattern 13) on the first mask sub-plate 1 needs to be exposed, the exposure method is similar to the exposure method of the first sub-mask pattern 11, which will not be repeated here.

[0080] By adopting the exposure method of this embodiment, different mask patterns can be selected on the same mask for selective exposure, thereby reducing the number of masks used and the number of times the mask needs to be moved.

[0081] By applying the embodiments of the present application, at least the following beneficial effects can be achieved:

[0082] The mask includes a first mask sub-plate and a second mask sub-plate. The first mask sub-plate integrates multiple mask patterns, and the second mask sub-plate includes a single pattern translucent area and a non-translucent area. The second mask sub-plate can be moved relative to the first mask sub-plate according to the alignment signal received by the mobile alignment structure, so that the translucent area corresponds to the sub-mask pattern to be exposed, thereby achieving selective exposure. The mask provided in this application can integrate multiple mask patterns into one mask for exposure process, reducing the number of masks. At the same time, it can also reduce the risk of mask movement during product production and reduce the probability of process defects and mask damage caused by mask movement. While reducing production costs in production operations, it improves the reliability of product quality.

[0083] Those skilled in the art will appreciate that the steps, measures, and schemes in the various operations, methods, and processes discussed in this application may be interchanged, modified, combined, or deleted. Furthermore, other steps, measures, and schemes in the various operations, methods, and processes discussed in this application may also be interchanged, modified, rearranged, decomposed, combined, or deleted. Furthermore, steps, measures, and schemes in the prior art that are similar to those disclosed in this application may also be interchanged, modified, rearranged, decomposed, combined, or deleted.

[0084] In the description of this application, it should be understood that the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0085] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. Throughout this application, unless otherwise specified, "plurality" means two or more.

[0086] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections, indirect connections through an intermediate medium, or internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0087] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0088] It should be understood that although the steps in the flowcharts of the accompanying drawings are shown in sequence as indicated by the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some of the steps in the flowcharts of the accompanying drawings may include multiple sub-steps or multiple stages, and these sub-steps or stages are not necessarily executed at the same time, but can be executed at different times, and their execution order is not necessarily sequential, but can be executed in turn or alternately with other steps or at least a portion of the sub-steps or stages of other steps.

[0089] The above description is only part of the implementation methods of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. A mask, characterized in that: include: A first mask sub-plate includes a plurality of sub-mask patterns and a light shielding area located between adjacent sub-mask patterns, wherein the plurality of sub-mask patterns include a plurality of sub-mask pattern groups, wherein the same sub-mask pattern group includes the same exposure pattern, and different sub-mask pattern groups include different exposure patterns; A second mask sub-plate is provided on one side of the first mask sub-plate, and includes a plurality of light-transmitting areas and a non-light-transmitting area located between adjacent light-transmitting areas; A mobile alignment structure is located on a side of the second mask sub-plate away from the first mask sub-plate and is connected to the second mask sub-plate, and its orthographic projection on the second mask sub-plate is located in the non-light-transmitting area. It is used to control the movement of the second mask sub-plate relative to the first mask sub-plate according to the received alignment signal, so that the light-transmitting areas correspond to different sub-mask pattern groups in different exposure processes; when any of the sub-mask pattern groups corresponds to the light-transmitting area, the orthographic projection area of the sub-mask pattern group on the second mask sub-plate is smaller than the area of the light-transmitting area, and the orthographic projection of the sub-mask pattern group that does not correspond to the light-transmitting area on the second mask sub-plate is located in the non-light-transmitting area.

2. The mask according to claim 1, wherein: The first mask sub-plate includes a plurality of first alignment marks, the first alignment marks are located in the light-shielding area, each group of the sub-mask pattern groups corresponds to a first alignment mark, and the first alignment marks are located around the sub-mask pattern group; The second mask sub-plate includes a plurality of second alignment marks, and the second alignment marks are located in the non-light-transmitting area and at the periphery of the light-transmitting area.

3. The mask according to claim 2, wherein: In each of the sub-mask pattern groups, the first alignment mark is provided around each sub-mask pattern.

4. The mask according to claim 2, wherein: The first alignment mark and the second alignment mark have the same shape, and / or the first alignment mark and the second alignment mark have the same size.

5. The mask according to any one of claims 2 to 4, characterized in that: When any of the sub-mask pattern groups corresponds to the light-transmitting area, the orthographic projection of the first alignment mark on the second mask sub-plate overlaps with the second alignment mark.

6. The mask according to claim 1, wherein: The mobile alignment structure includes a guide rail device and a driving device; The guide rail device is located on a side of the second mask daughter plate away from the first mask daughter plate and is connected to the second mask daughter plate; The driving device is connected to the guide rail device and is used to drive the second mask to move on the guide rail device according to the received alignment signal.

7. The mask according to claim 6, wherein: The guide rail device includes a first guide rail assembly and a second guide rail assembly; The first guide rail assembly includes a first guide rail and a first slider slidably connected to the first guide rail; the second guide rail assembly includes a second guide rail and a second slider slidably connected to the second guide rail; the first guide rail and the second guide rail are arranged perpendicularly; The first guide rail is fixedly connected to the exposure device; The first slider is fixedly connected to the second guide rail and is used to drive the second guide rail to move along the first guide rail; The second slider is fixedly connected to the second mask sub-plate and is used to drive the second mask sub-plate to move along the second guide rail.

8. An exposure device, characterized in that: include: The mask according to any one of claims 1 to 7, and an exposure chamber, wherein a mask carrying platform for carrying the mask is provided in the exposure chamber.

9. An exposure method using the mask according to any one of claims 1 to 7, characterized in that: include: The mobile alignment structure receives an alignment signal from the exposure device; The mobile alignment structure controls the movement of the second mask sub-plate according to the alignment signal, so that the light-transmitting areas correspond to different sub-mask pattern groups in different exposure processes; The first mask sub-plate and the second mask sub-plate are used to expose the substrate to be exposed.

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