Watch part, watch, and method for manufacturing a watch part

Abstract

The present invention provides a clock component, a clock, and a method for manufacturing a clock component, which make a surface with low gloss have gloss and become a designable appearance. The method for manufacturing a clock component includes the following steps: forming a first processed surface (12) with a specified pattern by irradiating a surface of a bridge plate (5) with femtosecond laser (28); and forming a second processed surface (14) with a surface roughness smaller than that of the first processed surface (12) by irradiating at least a part of the first processed surface (12) with nanosecond laser (39).

Description

Technical Field

[0001] The present invention relates to a clock part, a clock, and a method for manufacturing a clock part. Background Art

[0002] There is used a clock part having patterns such as letters and marks formed by irradiating a laser on a metal surface. In Patent Document 1, a femtosecond laser is used. Ablation processing in which the solid on the metal surface is instantaneously vaporized and dispersed is performed by irradiating the clock part with a femtosecond laser. A surface having a large surface roughness and a low glossiness is formed by the ablation processing. A groove having a low glossiness at the bottom is formed at the position where the femtosecond laser is irradiated. Patterns such as patterns, letters, and marks are formed on the clock part using this groove.

[0003] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2018-20378

[0004] In the processing of Patent Document 1, since a femtosecond laser is used, a surface having a low glossiness at the bottom of the groove is formed on the clock part. In the processing of the clock part, there is a case where it is desired to make the minute cutting surface formed by femtosecond laser processing have a gloss. At this time, a process different from the femtosecond laser processing needs to be provided. However, it is difficult to perform gloss processing on the fine cutting surface formed by the femtosecond laser, and setting other processes may also reduce the productivity. Therefore, a manufacturing method is desired in which an arbitrary portion of the processing surface using the femtosecond laser has a gloss and becomes a designable appearance. Summary of the Invention

[0005] A method for manufacturing a clock part includes the following steps: irradiating a first laser having a pulse width of femtoseconds on the surface of a metal part to form a first processing surface having a specified pattern; and irradiating a second laser having a pulse width of femtoseconds or more on at least a part of the first processing surface to form a second processing surface having a smaller surface roughness than the first processing surface.

[0006] A clock part includes: a metal base material; a first processing surface which is formed by irradiating the base material with a first laser having a pulse width of femtoseconds, has a specified pattern, and has a first surface roughness; and a second processing surface which is formed by irradiating at least a part of the first processing surface with a second laser having a pulse width of femtoseconds or more, and has a second surface roughness smaller than the first surface roughness.

[0007] A clock includes the clock part described above. Brief Description of the Drawings

[0008] Figure 1 It is a rear view of the clock of the first embodiment.

[0009] Figure 2It is a figure showing a measurement example of the surface shape of the first processed surface.

[0010] Figure 3 It is a figure showing a measurement example of the surface shape of the second processed surface.

[0011] Figure 4 It is a flowchart of a laser decoration method.

[0012] Figure 5 It is a schematic diagram for explaining the first processing step.

[0013] Figure 6 It is a schematic diagram for explaining the first processing step.

[0014] Figure 7 It is a schematic diagram for explaining the first processing step.

[0015] Figure 8 It is a schematic diagram for explaining the second processing step.

[0016] Figure 9 It is a schematic diagram for explaining the second processing step.

[0017] Figure 10 It is a schematic side sectional view showing the first processed surface.

[0018] Figure 11 It is a schematic side sectional view showing the second processed surface.

[0019] Figure 12 It is a rear view of the clock of the second embodiment.

[0020] Figure 13 It is a figure for explaining the relationship between the film thickness and color of the oxide film of the third embodiment.

[0021] Reference Numeral Explanation

[0022] 1, 45: Clock; 5, 46: Bridges (receiver plates) as clock components and metal components; 6, 47: Substrate; 12: First processed surface; 13: First pattern as a pattern; 14: Second processed surface; 15: Second pattern as a pattern; 16: Third pattern as a pattern; 17: Fourth pattern as a pattern; 18: Fifth pattern as a pattern; 28: Femtosecond laser; 39: Nanosecond laser as the second laser; 42: Oxide film. Detailed Embodiment

[0023] First Embodiment

[0024] In Figure 1 this, the clock 1 of the present embodiment is a 3 - hand analog watch. Figure 1This is a view of the timepiece 1 as seen from the back side. The timepiece 1 is not limited to an analog timepiece, and any timepiece having metal components may be used. For example, it may also be a digital timepiece, a combination timepiece, a smartwatch, or a health watch.

[0025] The timepiece 1 is a watch with a see-through back cover. Since a transparent back cover 3 is attached to the main body 2, it has a structure that allows the internal mechanism to be observed. The main body 2 functions as a housing. The material of the main body 2 is a hard metal such as titanium or stainless steel. The main body 2 is generally circular. The back cover 3 is fitted to the inner circumference of the annular wall of the main body 2. The material of the back cover 3 is sapphire glass.

[0026] Inside the main body 2, a movement 4 for driving the hands is housed. Figure 1 In this case, the clockwork components of the movement 4 and the plate 5 as a metal component are observed through the back cover 3. The plate 5 has a metal base material 6. A plurality of bearings 7 for gears are provided on the base material 6. The material of the base material 6 is titanium, a titanium alloy, or stainless steel. In addition, as the material of the base material 6, metals such as nickel silver, brass, duralumin, and iron-containing alloys may also be used.

[0027] The base material 6 has a first region 8, a second region 9, and a third region 11. The surface of the base material 6 in the first region 8 is a first processed surface 12. The shape of the first region 8 and the first processed surface 12 forms a first pattern 13 as a pattern. In other words, the first processed surface 12 has the first pattern 13. The surface roughness of the first processed surface 12 is a first surface roughness. The first processed surface 12 and the first pattern 13 are formed by irradiating the base material 6 with a first laser having a pulse width of femtoseconds. The first laser is, for example, a femtosecond laser, and the range of the pulse width is preferably 100 fs to 900 fs.

[0028] The surface of the base material 6 in the second region 9 is a second processed surface 14. The second processed surface 14 of the second region 9 is composed of four parts. The shapes of the four parts are a second pattern 15 as a pattern, a third pattern 16 as a pattern, a fourth pattern 17 as a pattern, and a fifth pattern 18 as a pattern. The surface roughness of the second processed surface 14 is a second surface roughness. The second surface roughness is smaller than the first surface roughness. The second processed surface 14 is formed by irradiating the first processed surface 12 with a second laser having a pulse width of more than femtoseconds. Therefore, the second processed surface 14 is a surface that covers a part of the first processed surface 12. In the present embodiment, the first processed surface 12 has the first pattern 13 and the second pattern 15 to the fifth pattern 18. The second processed surface 14 has the second pattern 15 to the fifth pattern 18.

[0029] The surface roughness of the first machined surface 12 is the first surface roughness. The surface roughness of the second machined surface 14 is the second surface roughness. The surface roughness is based on the surface shape of the measured surface. The surface roughness is the arithmetic mean roughness Sa. The first surface roughness and the second surface roughness are measured by a shape analysis laser microscope. The shape analysis laser microscope is VK-X250 (registered trademark) manufactured by KEYENCE Corporation. The magnification of the shape analysis laser microscope during measurement is 150 times.

[0030] The surface of the base material 6 in the third region 11 is the non-machined surface 19. The non-machined surface 19 of the third region 11 is composed of 4 parts. The shapes of the 4 parts are the sixth pattern 21, the seventh pattern 22, the eighth pattern 23, and the ninth pattern 24. The non-machined surface 19 is a surface that has not been irradiated with femtosecond laser nor with the second laser.

[0031] Figure 2 and Figure 3 is an example of a roughness curve in line roughness measurement for measuring surface roughness along a specified line. The horizontal axis represents the measurement position for measuring the surface roughness. Specifically, it is represented by the distance from the measurement start point. The vertical axis represents the position of the surface shape in the thickness direction of the base material 6. The average position of the measurement result is 0. The + direction is the direction in which the surface shape protrudes, and the - direction is the direction in which the surface shape is recessed.

[0032] As Figure 2 shown, in the example of the surface shape of the first machined surface 12, the surface unevenness varies between -0.897 μm and +0.897 μm.

[0033] As Figure 3 shown, in the example of the surface shape of the second machined surface 14, the surface unevenness varies between -0.295 μm and +0.295 μm. The surface roughness of the second machined surface 14 is smaller than the surface roughness of the first machined surface 12.

[0034] The surface roughness refers to surface roughness measurement, which is an extension of line roughness measurement to two-dimensional measurement. Similarly to line roughness measurement, in surface roughness measurement, the surface roughness of the second machined surface 14 is also smaller than the surface roughness of the first machined surface 12. Therefore, the second surface roughness is less than the first surface roughness. The second surface roughness is preferably 0.1 μm or more and 0.3 μm or less.

[0035] According to this structure, the surface of the base material 6 has a first processed surface 12 and a second processed surface 14. The surface roughness of the first processed surface 12 is greater than that of the second processed surface 14. Therefore, the first processed surface 12 becomes a so-called matte surface with low gloss. The gloss is measured with a gloss meter. Since the surface roughness of the second processed surface 14 is smaller than that of the first processed surface 12, the second processed surface 14 becomes a surface with high gloss. The surface of the base material 6 has the first processed surface 12 with low gloss and the second processed surface 14 with high gloss. Therefore, compared with the case where it is composed only of the first processed surface 12 with low gloss, the surface of the base material 6 can have a more designed appearance.

[0036] Next, a method for manufacturing the first processed surface 12 and the second processed surface 14 of the above-mentioned clamping plate 5 will be described. In Figure 4 the flowchart, step S1 is the first processing step. In this step, by irradiating the surface of the base material 6 of the clamping plate 5 with femtosecond laser, a first processed surface 12 having a first pattern 13 and second to fifth patterns 15 - 18 is formed. Then, it transfers to step S2.

[0037] Step S2 is the second processing step. In this step, by irradiating a part of the first processed surface 12 with a second laser having a pulse width longer than femtoseconds, a second processed surface 14 with a surface roughness smaller than that of the first processed surface 12 and a thicker oxide film than the first processed surface 12 is formed. Through the above steps, the first processed surface 12 and the second processed surface 14 are completed. Here, the pulse width longer than femtoseconds is preferably 100 fs or more, more preferably 1 ns or more and 200 ns or less.

[0038] Next, the manufacturing method will be described in detail corresponding to the steps Figure 4 shown.

[0039] Figures 5 to 7 is a diagram corresponding to the first processing step of step S1. As Figure 5 shown, a laser processing device 25 is prepared. The laser processing device 25 has a first laser light source 26 and a second laser light source 27. The first laser light source 26 is a light source that emits femtosecond laser 28. The second laser light source 27 is a light source that emits nanosecond laser. The second laser light source 27 only needs to be able to emit laser with a pulse width longer than femtoseconds. The laser emitted by the second laser light source 27 is not limited to nanosecond laser. The second laser light source 27 also serves as a light source that emits picosecond laser.

[0040] The laser processing apparatus 25 includes an irradiation unit 29 that irradiates the base material 6 with femtosecond laser 28 or nanosecond laser. The first laser light source 26 and the irradiation unit 29 are connected by a first optical fiber 31. The femtosecond laser 28 emitted from the first laser light source 26 is supplied to the irradiation unit 29 through the first optical fiber 31. The second laser light source 27 and the irradiation unit 29 are connected by a second optical fiber 32. The nanosecond laser emitted from the second laser light source 27 is supplied to the irradiation unit 29 through the second optical fiber 32.

[0041] The irradiation unit 29 includes a condenser lens 29a and a shutter 29b. The condenser lens 29a converges the femtosecond laser 28 and the nanosecond laser onto the surface of the base material 6. The diameter of the first condensing portion 28a formed by converging the femtosecond laser 28 and the nanosecond laser is not limited, and is, for example, 25 μm in the present embodiment. The shutter 29b switches between irradiation and non-irradiation of the femtosecond laser 28 and the nanosecond laser.

[0042] The laser processing apparatus 25 has an X stage 33 that moves the irradiation unit 29 in the X direction. The laser processing apparatus 25 includes a Y stage 34 that moves the base material 6 in the Y direction. The X stage 33 and the Y stage 34 have servo motors (not shown).

[0043] The laser processing apparatus 25 includes a control device 35. The control device 35 controls the moving speed and the moving amount of the X stage 33 and the Y stage 34. The control device 35 includes a storage unit 36. Coordinate data of the path for irradiating the base material 6 with the femtosecond laser 28 is stored in the storage unit 36. The control device 35 can scan the femtosecond laser 28 or the nanosecond laser within a specified pattern based on the coordinate data of the path.

[0044] The control device 35 is electrically connected to the first laser light source 26, the second laser light source 27, and the irradiation unit 29. The control device 35 controls the start and stop of light emission of the first laser light source 26 and the second laser light source 27. The control device 35 controls the opening and closing of the shutter 29b of the irradiation unit 29.

[0045] In step S1, the first laser light source 26 emits the femtosecond laser 28, and the second laser light source 27 stops emitting light. The base material 6 is irradiated with the femtosecond laser 28. Concavities and convexities 37 are formed on the surface of the base material 6 along the trajectory of the irradiated femtosecond laser 28. By irradiating the femtosecond laser 28, ablation processing is performed to instantaneously vaporize and disperse the metal molecules on the surface of the base material 6. A surface with a large surface roughness and a low glossiness is formed by the ablation processing.

[0046] As Figure 6 shown, a plurality of first trajectories 38 as the trajectories of the irradiated femtosecond laser 28 are arranged in parallel. The first trajectory 38 can be a curve or a straight line. The first trajectory 38 can also be a pattern formed by combining a curve and a straight line. As a result, the concavities and convexities 37 are provided without gaps within a specified pattern.

[0047] The conditions for irradiating the femtosecond laser 28 are not particularly limited. In the present embodiment, for example, the laser energy density of the first condensing portion 28a of the femtosecond laser 28 is 2600 mJ / cm 2 ~2700 mJ / cm 2 . The frequency of the laser pulse is about 505 kHz. The scanning speed is 1300 mm / s. The pitch of the positions where the laser pulses are irradiated is 2.6 μm.

[0048] As Figure 7 shown, a first processing surface 12 with a first pattern 13, a second pattern 15, a third pattern 16, a fourth pattern 17, and a fifth pattern 18 is formed on the base material 6 of the clamping plate 5.

[0049] Figure 8 and Figure 9 are diagrams corresponding to the second processing step of step S2. As Figure 8 shown, a laser processing device 25 is used. In step S2, the first laser light source 26 stops emitting light, and the second laser light source 27 emits a nanosecond laser 39 as the second laser. The nanosecond laser 39 is irradiated onto the base material 6. The diameter of the second condensing portion 39a formed by converging the nanosecond laser 39 is 25 μm. The laser energy density of the second condensing portion 39a of the nanosecond laser 39 is 350 mJ / cm 2 ~450 mJ / cm 2 . The frequency of the laser pulse is about 100 kHz. The scanning speed is 400 mm / s. The pitch of the positions where the laser pulses are irradiated is 4 μm. The pitch of the positions where the laser pulses are irradiated is not particularly limited, but when the diameter of the second condensing portion 39a is 25 μm, the pitch is preferably 3 μm or more and 10 μm or less. The value obtained by dividing the pitch by the diameter of the second condensing portion 39a is preferably 0.12 or more and 0.4 or less. When the pitch is less than 3 μm, the productivity is low. When the pitch exceeds 10 μm, the uniformity of the appearance is impaired. By irradiating the nanosecond laser 39 at equal intervals with a fixed pitch, the film thickness of the oxide film can be made close to fixed.

[0050] When irradiating the second condensing portion 39a with a diameter of 25 μm every 4 μm, a part of the second condensing portion 39a overlaps. The overlap ratio obtained by dividing the overlapping area by the area of the second condensing portion 39a is preferably 50% or more and 90% or less. When the overlap ratio is less than 50%, the uniformity of the appearance is impaired. When the overlap ratio exceeds 90%, the productivity decreases.

[0051] The unevenness 37 is oxidized along the trajectory of the irradiated nanosecond laser 39. By irradiating the nanosecond laser 39, the surface of the substrate 6 is heated. Since the substrate 6 is heated in the atmosphere, metal molecules combine with oxygen and are oxidized. In addition, in the protruding portions of the unevenness 37, heat is difficult to dissipate, so it is presumed that melting occurs. Therefore, melting and oxidation are carried out by heating to form a surface with a small surface roughness and a high gloss.

[0052] As Figure 9 shown, a plurality of second trajectories 41 as the trajectories of the irradiated nanosecond laser 39 are arranged in parallel. The second trajectory 41 can be a curve or a straight line. As a result, the unevenness 37 on the surface within a specified pattern is oxidized without gaps. In Figure 9 , the first trajectory 38 is arranged to intersect the second trajectory 41. Not limited to this, the first trajectory 38 and the second trajectory 41 can be parallel, can overlap, or can be unrelated trajectories.

[0053] As Figure 1 shown, the nanosecond laser 39 is irradiated onto the first processed surface 12 of the second pattern 15, the third pattern 16, the fourth pattern 17, and the fifth pattern 18. As a result, a second processed surface 14 is formed so as to cover the first processed surface 12 in the second pattern 15, the third pattern 16, the fourth pattern 17, and the fifth pattern 18.

[0054] The surface of the first processed surface 12 is a surface formed by irradiating the femtosecond laser 28. Therefore, as Figure 10 shown, the unevenness 37 of the first processed surface 12 is large and the first surface roughness is large. The surface of the first processed surface 12 is a surface formed by ablation processing. Therefore, metal molecules do not bond with oxygen and the film thickness of the oxide film 42 is thin.

[0055] The surface of the second processed surface 14 is a surface formed by irradiating the nanosecond laser 39 onto the first processed surface 12. Therefore, as Figure 11 shown, the unevenness 37 of the second processed surface 14 is small and the second surface roughness is small. The surface of the second processed surface 14 is a surface heated in the atmosphere, so the film thickness of the oxide film 42 is thicker than that of the first processed surface 12.

[0056] The thickness of the oxide film is measured by the following method, for example. Fix the splint 5 with resin. Then, cut the cured resin and the splint 5, and grind the cross-section of the cured resin. Observe the cross-section of the resin and the splint 5 with a scanning electron microscope to measure the thickness of the oxide film 42.

[0057] According to this manufacturing method, in step S1, femtosecond laser 28 is irradiated onto the surface of substrate 6 of clamping plate 5 which is a metal component. Femtosecond laser 28 is a laser with a pulse width in the femtosecond range. A prescribed pattern is formed by the first trajectory 38 of femtosecond laser 28. This pattern includes patterns, characters, graphics, etc. Ablation processing that instantaneously vaporizes and disperses the metal is performed using femtosecond laser 28. The surface with the pattern formed through ablation processing is the first processed surface 12. A part of the first processed surface 12 is irradiated with nanosecond laser 39 which is a second laser. The pulse width of the second laser is equal to or greater than the pulse width of femtosecond laser 28. Therefore, an oxide film 42 is formed at the irradiated part. The surface with the oxide film 42 formed is the second processed surface 14. The oxide film 42 on the second processed surface 14 is thicker than the oxide film 42 on the first processed surface 12. When the oxide film 42 is thick, the surface roughness becomes smaller compared to when it is thin, and it becomes a shiny surface. Therefore, compared with the first processed surface 12, the second processed surface 14 can be made into a shiny surface. As a result, since the second processed surface 14 is a surface with more luster than the first processed surface 12, it can have a decorative appearance.

[0058] According to this manufacturing method, the second laser used in step S2 is nanosecond laser 39. Nanosecond laser 39 is a laser with a pulse width in the nanosecond range. Nanosecond laser 39 can make the first processed surface 12 into a shiny second processed surface 14 without damaging the pattern formed by femtosecond laser 28.

[0059] In the second processed surface 14, the film thickness of the oxide film 42 is greater than 0 nm and 10 nm or less. According to this manufacturing method, since the film thickness of the oxide film 42 on the second processed surface 14 is greater than 0 nm, it can become a shiny surface. Since the film thickness of the oxide film 42 on the second processed surface 14 is 10 nm or less, the pattern formed by irradiating femtosecond laser 28 can be made to look undamaged. Since the film thickness of the oxide film 42 on the second processed surface 14 is 10 nm or less, the oxide film 42 is transparent.

[0060] According to this structure, the first processed surface 12 is formed by irradiating substrate 6 of titanium, titanium alloy or stainless steel with femtosecond laser 28. Further, the second processed surface 14 is formed by irradiating substrate 6 with nanosecond laser 39. Titanium, titanium alloy and stainless steel are difficult to plate, so it is difficult to perform plating to change the appearance. Therefore, even if the material of the watch part is titanium, titanium alloy or stainless steel which is difficult to electroplate, various changes can be added to the appearance.

[0061] The watch 1 has the above-mentioned clamping plate 5. According to this structure, the above-mentioned clamping plate 5 included in the watch 1 has a decorative appearance. Therefore, the watch 1 can be a watch with a watch part having a decorative appearance.

[0062] Second Embodiment

[0063] The difference between this embodiment and the first embodiment is that Figure 1 the first pattern 13 of the first region 8 shown becomes the second processed surface 14. In addition, the same reference numerals are given to the same structures as in the first embodiment, and redundant descriptions are omitted.

[0064] As Figure 12 shown, the timepiece 45 has a bridge 46 as a timepiece component and a metal component. The bridge 46 includes a metal base material 47. The material of the base material 47 is the same as that of the base material 6 in the first embodiment.

[0065] The base material 47 has a first region 8, a second region 9, and a third region 11. The surfaces of the base material 47 in the first region 8 and the second region 9 are the second processed surfaces 14. The shape of the first region 8 is the first pattern 13. The second processed surface 14 of the second region 9 is composed of 4 parts. The shapes of the 4 parts are the second pattern 15, the third pattern 16, the fourth pattern 17, and the fifth pattern 18.

[0066] The second processed surface 14 is formed by irradiating the first processed surface 12 with a second laser having a pulse width longer than the pulse width of the femtosecond laser 28. Therefore, the second processed surface 14 is a surface covering the entire first processed surface 12.

[0067] The surface roughness of the first processed surface 12 is the first surface roughness. The surface roughness of the second processed surface 14 is the second surface roughness. The second surface roughness is 0.1 μm or more and 0.3 μm or less. The second surface roughness is smaller than the first surface roughness. The bridge 46 includes the first processed surface 12 and the second processed surface 14, and the second processed surface 14 covers the entire first processed surface 12.

[0068] According to this structure, the surface of the base material 47 has the second processed surface 14. The second processed surface 14 is a surface covering the first processed surface 12. The first processed surface 12 is a surface with a larger surface roughness and lower gloss than the second processed surface 14. The second processed surface 14 becomes a surface with a smaller surface roughness and higher gloss than the first processed surface 12. The second processed surface 14 is a surface with high gloss, and compared with the first processed surface 12 with low gloss, it can have a more decorative appearance.

[0069] Next, Figure 4 the manufacturing method of the above-mentioned bridge 46 will be described. In the Figure 4 flowchart, the first processing step of step S1 is the same as that in the first embodiment.

[0070] In the second processing step of step S2, by irradiating all the first processing surfaces 12 with a second laser having a pulse width of more than femtoseconds, a second processing surface 14 is formed with a surface roughness smaller than that of the first processing surface 12 and an oxide film 42 thicker than that of the first processing surface 12. Through the above process, the second processing surface 14 covering the first processing surface 12 is completed.

[0071] According to this manufacturing method, the second laser is irradiated to all parts of the first processing surface 12. An oxide film 42 is formed at the irradiated part of the second laser. The surface on which the oxide film 42 is formed is the second processing surface 14. The oxide film 42 of the second processing surface 14 is thicker than the oxide film of the first processing surface 12. When the oxide film 42 is thick, the surface roughness becomes smaller than when it is thin, and it becomes a shiny surface. Therefore, compared with the first processing surface 12, the second processing surface 14 can be made into a shiny surface. As a result, since the second processing surface 14 is a surface with more luster than the first processing surface 12, it can have a designed appearance.

[0072] Third Embodiment

[0073] In the above first embodiment, the thickness of the oxide film 42 of the second processing surface 14 is set to 10 nm or less. The thickness of the oxide film 42 can also exceed 10 nm. As Figure 13 shown, when the thickness of the oxide film 42 exceeds 10 nm, a colored surface is observed. By adjusting the hue, a designed appearance can be achieved.

[0074] The thickness of the oxide film 42 can be controlled by increasing or decreasing the energy received by the substrate 6 with the nanosecond laser 39. Among the parameters caused by energy, there are the scanning speed, the frequency, and the laser energy density of the second condensing part 39a. The frequency represents the frequency of the nanosecond laser 39 emitted from the irradiation part 29. For example, parameters other than the frequency are fixed. When the film thickness is desired to be thickened, the frequency is increased and the pitch of the second condensing part 39a is shortened. In addition, for example, parameters other than the scanning speed are fixed. When the film thickness is desired to be thickened, the scanning speed is decreased and the pitch of the second condensing part 39a is shortened. In this way, by controlling the energy received by the substrate 6, the thickness of the oxide film 42 can be controlled.

[0075] Fourth Embodiment

[0076] In the first embodiment, when the second processing surface 14 is formed by irradiating the second laser, the manufacturing process ends. In addition, various metals can be plated on the second processing surface 14. By adjusting the hue, a designed appearance can be achieved.

[0077] Fifth Embodiment

[0078] In the above first embodiment, the nanosecond laser 39 is irradiated at equal intervals with a fixed pitch. The nanosecond laser 39 may also be irradiated while gradually switching the pitch. Since the film thickness of the oxide film 42 gradually changes, a gradient can be imparted to the glossiness. By gradually increasing the film thickness of the oxide film 42, a gradient can be imparted to the hue. The locus of movement of the second condenser portion 39a is set as a scanning line. A gradient can be imparted to the direction of the scanning line.

[0079] By gradually changing the interval between the scanning lines, the film thickness of the oxide film 42 gradually changes, so that a gradient can be imparted to the glossiness. A gradient can be imparted in the direction intersecting the scanning lines.

[0080] Sixth Embodiment

[0081] In the first embodiment, a first processing surface 12 and a second processing surface 14 are formed on the clamping plate 5. In the second embodiment, a first processing surface 12 and a second processing surface 14 are formed on the clamping plate 46. In addition, the clock component on which the first processing surface 12 and the second processing surface 14 are formed may be any component among support components such as the clamping plate 5 and the clamping plate 46, a circuit cover, a pendulum (rotating weight), a bottom plate, a back cover, a dial, a pointer, and a balance wheel.

[0082] According to this structure, any one of the support component, the circuit cover, the pendulum, the bottom plate, the back cover, the dial, the pointer, and the balance wheel has the first processing surface 12 and the second processing surface 14. The second processing surface 14 is a surface with gloss added to the pattern of the first processing surface 12. Therefore, the support component, the circuit cover, the pendulum, the bottom plate, the back cover, the dial, the pointer, and the balance wheel having the second processing surface 14 can improve the decorativeness of the clock.

Claims

1. A manufacturing method of a clock component, characterized in that, The manufacturing method of the clock and watch component includes the following processes: Irradiating the surface of the metal component with first laser having a pulse width of femtoseconds to form a first processed surface having a specified pattern; and Irradiating at least a part of the first processed surface with second laser having a pulse width longer than femtoseconds to form a second processed surface having a smaller surface roughness than the first processed surface, In the process of forming the first processed surface, an oxide film is formed on the first processed surface, In the process of forming the second processed surface, an oxide film is formed on the second processed surface, The oxide film formed on the second processed surface is thicker than the oxide film formed on the first processed surface.

2. The manufacturing method of the clock component according to claim 1, characterized in that, The second laser is nanosecond laser.

3. The manufacturing method of the clock component according to claim 1, characterized in that, In the second processed surface, the film thickness of the oxide film is greater than 0 nm and 10 nm or less.

4. A clock component, characterized in that, This clock and watch component has: A metal base material; A first processed surface, which is formed by irradiating the base material with first laser having a pulse width of femtoseconds, the first processed surface has a specified pattern, and the surface roughness is the first surface roughness; And A second processed surface, which is formed by irradiating at least a part of the first processed surface with second laser having a pulse width longer than femtoseconds, the surface roughness is the second surface roughness smaller than the first surface roughness, The first processed surface and the second processed surface have an oxide film on the surface, The oxide film on the surface of the second processed surface is thicker than the oxide film on the surface of the first processed surface.

5. The clock component according to claim 4, characterized in that, The second surface roughness is 0.1 μm or more and 0.3 μm or less.

6. The clock component according to claim 4 or 5, characterized in that, The second laser is nanosecond laser.

7. The clock component according to claim 4, characterized in that, The film thickness of the oxide film on the surface of the second processed surface is greater than 0 nm and 10 nm or less.

8. The clock component according to claim 4 or 5, characterized in that, The clock and watch component is any one of a support component, a circuit cover, a pendulum bob, a base plate, a back cover, a dial, a pointer, and a balance wheel.

9. The clock component according to claim 4 or 5, characterized in that, The material of the base material is titanium, a titanium alloy, or stainless steel.

10. A clock, characterized in that, This clock and watch has the clock and watch component according to any one of claims 4 to 9.

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