Drawing apparatus, drawing method, and storage medium containing the program

Abstract

A drawing apparatus, a drawing method, and a storage medium storing a program are provided. A position detection unit (113) detects the position of a substrate by performing pattern matching using a template on an image captured by an imaging unit. A storage unit (111) stores second CAD data, which is CAD data of a second pattern drawn on a first pattern. A data generation unit (115) rasterizes the second CAD data to generate second raster data. The storage unit (111) also stores coordinates representing the matching position on the first pattern based on pattern matching performed by the position detection unit (113). The data generation unit (115) rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as a template. Thus, template generation can be performed easily and quickly.

Description

[0001] Reference to Related Applications

[0002] This application claims the benefit of priority of Japanese Patent Application No. JP 2021-139063 filed on August 27, 2021, the entire disclosure of which is hereby incorporated by reference herein. TECHNICAL FIELD

[0003] The present application relates to a technique of performing pattern drawing by irradiating light to a substrate. BACKGROUND

[0004] Conventionally, pattern drawing is performed by irradiating light to a photosensitive material formed on a substrate such as a semiconductor substrate, a printed substrate, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as "substrate"). In a drawing device that performs such drawing, an alignment process of detecting the position of an alignment mark provided on the substrate and automatically adjusting the drawing position of a pattern is performed.

[0005] In recent years, in drawing for a printed substrate, reduction of a space for arranging an alignment mark is sought in order to increase the number of pieces that can be obtained from one substrate. Therefore, a part of a pattern on a substrate is used as an alignment mark instead of providing an alignment-specific mark on the substrate.

[0006] For example, in an exposure device of Japanese Patent Application Publication No. 2013-171988 (Document 1), a part of a pattern on a substrate is set as a reference mark model (i.e., a template) used in an alignment process and is pre-recorded in an image obtained by photographing the pattern on the substrate. Further, when a substrate to be exposed is carried into the exposure device, a part of the pattern on the substrate is photographed, and an alignment process of the substrate is performed by matching the obtained image with the pattern of the above-mentioned reference mark model.

[0007] In addition, in the exposure device of Document 1, in order to obtain a template for pattern matching, it is necessary to set a substrate at a prescribed position of the exposure device to photograph a pattern on the substrate, and to extract a partial pattern to be a template from the obtained image. Therefore, the amount of work required for generation of the template increases, and the work time also becomes long.

[0008] The present application is directed to a drawing device that performs pattern drawing by irradiating light to a substrate, and aims to easily and quickly perform generation of a template. SUMMARY

[0009] The drawing device of the preferred embodiment of the present application includes a stage that holds a substrate having a first pattern provided on an upper surface thereof; a drawing head that irradiates modulated light on the upper surface of the substrate; a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; a photographing section that photographs a portion of the first pattern; a position detection section that detects the position of the substrate by performing pattern matching using a template on a photographed image obtained by the photographing section; a storage section that stores second CAD data of a second pattern drawn on the first pattern; a data generation section that generates second raster data by rasterizing the second CAD data; and a drawing control section that performs drawing of the second pattern on the substrate relatively moved with respect to the drawing head in the scanning direction by controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection section. The storage section also stores coordinates indicating matching positions at which pattern matching is performed by the position detection section on the first pattern. The data generation section creates intermediate data by rasterizing CAD data of the first pattern, and generates image data of a region of a predetermined size corresponding to the matching positions from the intermediate data as the template.

[0010] According to the drawing device, the template can be easily and quickly generated.

[0011] It is preferable that a plurality of partial drawing regions in which the same pattern is drawn in each of the partial drawing regions arranged in a matrix shape in a scanning direction and a width direction perpendicular to the scanning direction be provided on the upper surface of the substrate. In two or more of the partial drawing regions in which the matching positions are provided, the relative positions of the matching positions in each of the two or more partial drawing regions with respect to the respective partial drawing regions are the same. The data generation section generates the template corresponding to the matching position of one of the two or more partial drawing regions. The template is commonly used in pattern matching at the matching positions of the two or more partial drawing regions based on the position detection section.

[0012] Preferably, on the upper surface of the substrate, a plurality of partial drawing regions arranged in a matrix shape in the scanning direction and a width direction perpendicular to the scanning direction are provided. In the partial drawing region on the most one side in the scanning direction and on the most one side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the one side in the scanning direction and on the one side in the width direction. In the partial drawing region on the most one side in the scanning direction and on the most other side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the one side in the scanning direction and on the other side in the width direction. In the partial drawing region on the most other side in the scanning direction and on the most one side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the other side in the scanning direction and on the one side in the width direction. In the partial drawing region on the most other side in the scanning direction and on the most other side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the other side in the scanning direction and on the other side in the width direction.

[0013] Preferably, in the data generation section, only a partial data as CAD data corresponding to a prescribed region including the matching position in the first pattern is rasterized to create the intermediate data.

[0014] Preferably, on the upper surface of the substrate, a plurality of partial drawing regions arranged in a matrix shape in the scanning direction and a width direction perpendicular to the scanning direction are provided. The partial data corresponds to a set of partial drawing regions including the matching position.

[0015] The present application is also directed to a drawing method for drawing a pattern by irradiating light to a substrate. The drawing method of a preferred aspect of the present application includes the following steps: a) a step of holding a substrate having a first pattern previously provided on an upper surface thereof; b) a step of generating a template for position detection of the substrate; c) a step of taking an image of a part of the first pattern; d) a step of detecting a position of the substrate by performing pattern matching using the template on the taken image obtained in the step c); e) a step of rasterizing second CAD data of a second pattern to be drawn on the first pattern to generate second raster data; and f) a step of performing drawing of the second pattern to the substrate relatively moved in a scanning direction parallel to the upper surface of the substrate with respect to a drawing head by controlling the drawing head and a scanning mechanism relatively moving the substrate with respect to the drawing head in the scanning direction based on the second raster data and the position of the substrate detected in the step d). The step b) includes: bl) a step of preparing coordinates indicating matching positions for the pattern matching on the first pattern; and b2) a step of creating intermediate data by rasterizing CAD data of the first pattern, and generating image data of a region of a predetermined size corresponding to the matching positions from the intermediate data as the template.

[0016] The present application is also directed to a storage medium storing a program executed in a drawing apparatus for drawing a pattern by irradiating light to a substrate. The drawing apparatus includes: a stage holding a substrate having a first pattern previously provided on an upper surface thereof; a drawing head irradiating modulated light to the upper surface of the substrate; a scanning mechanism relatively moving the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; a taking section taking an image of a part of the first pattern; a position detection section detecting a position of the substrate by performing pattern matching using a template on a taken image obtained by the taking section; a storage section storing second CAD data of a second pattern to be drawn on the first pattern as CAD data; a data generation section rasterizing the second CAD data to generate second raster data; and a drawing control section performing drawing of the second pattern to the substrate relatively moved in the scanning direction with respect to the drawing head by controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection section. The storage section also stores coordinates indicating matching positions for the pattern matching on the first pattern based on the position detection section. By executing the program with a computer, the data generation section rasterizes CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching positions from the intermediate data as the template.

[0017] The above objects and other objects, features, aspects and advantages of the present application will become more apparent from the following detailed description of the application when taken in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is a perspective view of a drawing device that represents one embodiment.

[0019] Figure 2 is a plan view of a substrate.

[0020] Figure 3 is a diagram that represents a structure of a computer that the control section has.

[0021] Figure 4 is a block diagram that represents a function of the control section.

[0022] Figure 5A is a diagram that represents a flow of pattern drawing for a substrate.

[0023] Figure 5B is a diagram that represents a flow of pattern drawing for a substrate.

[0024] Figure 6 is a diagram that represents a matching position and an extraction region.

[0025] Figure 7 is a diagram that represents one example of a template.

[0026] Figure 8 is a diagram that represents one example of a configuration of a plurality of matching positions.

[0027] Figure 9 is a diagram that represents another example of a configuration of a plurality of matching positions.

[0028] Figure 10 is a diagram that represents another example of a configuration of a plurality of matching positions.

[0029] BRIEF DESCRIPTION OF DRAWINGS

[0030] 1 drawing device

[0031] 3 imaging section

[0032] 9 substrate

[0033] 21 stage

[0034] 22 stage moving mechanism

[0035] 41 drawing head

[0036] 90 upper surface (of the substrate)

[0037] 94 partial drawing region

[0038] 95 matching position

[0039] 96 extraction region

[0040] 97 template

[0041] 109 program

[0042] 111 storage unit

[0043] 113 position detection unit

[0044] 114 drawing control unit

[0045] 115 data generation unit

[0046] S11 to S16, S121 to S122 steps DETAILED DESCRIPTION

[0047] Figure 1 is a perspective view showing a drawing device 1 according to an embodiment of the present application. The drawing device 1 is a direct drawing device that performs pattern drawing by irradiating a substantially beam-like light modulated in space to a photosensitive material on a substrate 9, and scanning the irradiation region of the light on the substrate 9. In Figure 1 , three directions orthogonal to each other are set as an X direction, a Y direction, and a Z direction and are shown by arrows. In Figure 1 the example shown, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same applies to other drawings.

[0048] Further, in Figure 1 , a data processing device 6 connected to the drawing device 1 is also drawn. The data processing device 6 is a device that performs preprocessing and the like of data used in drawing in the drawing device 1. The data processing device 6 is, for example, a general-purpose computer, but is conceptually drawn as a substantially cuboid in Figure 1 .

[0049] Figure 2 is a plan view showing a main surface (+Z) side of the substrate 9 (hereinafter also referred to as "upper surface 90"). The substrate 9 is, for example, a plate-like member that is substantially rectangular in plan view. The substrate 9 is, for example, a multilayer printed wiring substrate (hereinafter simply referred to as "printed substrate"). In the present embodiment, a circuit pattern formed of copper (Cu) or the like is formed on the upper surface 90 of the substrate 9 in advance, and a resist film formed of a photosensitive material is provided on the circuit pattern. Also, in the drawing device 1, a solder pattern is drawn (i.e., formed) on the resist film of the substrate 9. The solder pattern is drawn on the above-described circuit pattern in matching with the circuit pattern.

[0050] In the following description, a pattern (i.e., a circuit pattern) that is formed in advance on the upper surface 90 of the substrate 9 is also referred to as a "first pattern", and a predetermined pattern (i.e., a solder pattern) that is drawn on the upper surface 90 of the substrate 9 in the drawing apparatus 1 is also referred to as a "second pattern". Furthermore, the kind and shape of the substrate 9 and the like can be variously changed. In addition, the pattern drawn on the substrate 9 by the drawing apparatus 1 is not limited to a solder pattern, and can be variously changed.

[0051] In Figure 2 The upper surface 90 of the illustrated substrate 9 is provided with a plurality of (for example, four) division regions 92 divided by a first division predetermined line 91 of a substantially rectangular shape. In each division region 92, a plurality of local drawing regions 94 of a substantially rectangular shape are provided, each of which is divided by a division predetermined line 93 of a lattice shape. The number and arrangement of the plurality of local drawing regions 94 in each division region 92 are the same. The same pattern is drawn in each of the plurality of local drawing regions 94. Each division region 92 and each local drawing region 94 respectively correspond to a chip and a device that is finally obtained from the substrate 9. In Figure 2 In the illustrated example, each local drawing region 94 is of a substantially square shape. The plurality of local drawing regions 94 are arranged in a matrix shape in the X direction and the Y direction. In Figure 2 In the drawing, each local drawing region 94 is drawn larger than actual, and the number of local drawing regions 94 is drawn smaller than actual. No alignment mark dedicated to a position detection process (i.e., an alignment process) described later is provided on the substrate 9.

[0052] As Figure 1 As illustrated, the drawing apparatus 1 includes a stage 21, a stage moving mechanism 22, a photographing section 3, a drawing section 4, and a control section 10. The control section 10 controls the stage moving mechanism 22, the photographing section 3, the drawing section 4, and the like. The stage 21 is a substantially flat substrate holding section of the substrate 9 that is held in a horizontal state from the lower side under the photographing section 3 and the drawing section 4 (i.e., the (-Z) side). The stage 21 is, for example, a vacuum chuck that sucks and holds the lower surface of the substrate 9. The stage 21 can also have a configuration other than the vacuum chuck. The upper surface 90 of the substrate 9 placed on the stage 21 is substantially perpendicular to the Z direction and substantially parallel to the X direction and the Y direction.

[0053] The stage moving mechanism 22 is a moving mechanism that moves the stage 21 relative to the imaging unit 3 and the drawing unit 4 in the horizontal direction (i.e., in a direction substantially parallel to the upper surface 90 of the substrate 9). The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 moves the stage 21 linearly along the guide rail in the X direction. The first moving mechanism 23 moves the stage 21 and the second moving mechanism 24 together linearly along the guide rail in the Y direction. The drive source for the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor, or a motor mounted on a ball screw. Various modifications can be made to the construction of the first moving mechanism 23 and the second moving mechanism 24.

[0054] In the drawing apparatus 1, a stage rotation mechanism may also be provided to rotate the stage 21 around a rotation axis extending in the Z direction. Additionally, a stage lifting mechanism to move the stage 21 in the Z direction may also be provided in the drawing apparatus 1. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage lifting mechanism. The construction of the stage rotation mechanism and the stage lifting mechanism can also be modified in various ways.

[0055] The imaging unit 3 has multiple (in) arranged along the X direction. Figure 1 In the example shown, there are two cameras 31. Each camera 31 is supported above the platform 21 and the platform moving mechanism 22 by a head support 30 that spans the platform 21 and the platform moving mechanism 22. One of the two cameras 31 is fixed to the head support 30, while the other camera 31 can move along the X-direction on the head support 30. This allows the distance between the two cameras 31 in the X-direction to be changed. Furthermore, the number of cameras 31 in the imaging unit 3 can be one or more.

[0056] Each camera 31 is a camera equipped with an image sensor and optical system (not shown in the illustration). Each camera 31 is, for example, an area scan camera for acquiring two-dimensional images. The image sensor includes, for example, multiple CCD (Charge Coupled Device) elements arranged in a matrix. In each camera 31, reflected light from illumination light (not shown) directed to the upper surface 90 of the substrate 9 is guided to the image sensor via the optical system. The image sensor receives the reflected light from the upper surface 90 of the substrate 9 and acquires an image of a generally rectangular image area. As the light source, various light sources such as LEDs (Light Emitting Diodes) can be used. Alternatively, each camera 31 can also be other types of cameras such as line scan cameras.

[0057] The drawing unit 4 has multiple (in) arranged in the X and Y directions. Figure 1Five in the example shown) drawing heads 41. Each drawing head 41 is supported by a head support portion 40 provided across the stage 21 and the stage moving mechanism 22 above the stage 21 and the stage moving mechanism 22. The head support portion 40 is disposed on the (+Y) side compared with the head support portion 30 of the photographing portion 3. Further, the number of the drawing heads 41 of the drawing portion 4 can be one or a plurality.

[0058] Each drawing head 41 is provided with an optical source, an optical system, and a spatial light modulation element, which are omitted from illustration. As the spatial light modulation element, various elements such as a DMD (Digital Micro Mirror Device) or a GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, California)) can be used. As the optical source, various optical sources such as an LD (Laser Diode) can be used. The plurality of drawing heads 41 have substantially the same configuration.

[0059] In the drawing apparatus 1, modulated light (i.e., spatially modulated light) from the plurality of drawing heads 41 of the drawing portion 4 is irradiated onto the upper surface 90 of the substrate 9, and the substrate 9 is moved in the Y direction by the stage moving mechanism 22. Thus, the irradiation region of the light from the plurality of drawing heads 41 is scanned in the Y direction on the substrate 9, and thus the pattern drawing for the substrate 9 is performed. In the following description, the Y direction is also referred to as the "scanning direction", and the X direction is also referred to as the "width direction". The stage moving mechanism 22 is a scanning mechanism that moves the irradiation region of the light from each drawing head 41 in the scanning direction on the substrate 9.

[0060] In the drawing apparatus 1, the drawing for the substrate 9 is performed in a so-called single-pass manner. Specifically, the stage 21 is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the stage moving mechanism 22, and the irradiation region of the light from the plurality of drawing heads 41 is scanned only once in the Y direction (i.e., the scanning direction) on the upper surface 90 of the substrate 9. Thus, the drawing for the substrate 9 is completed. Further, in the drawing apparatus 1, the drawing for the substrate 9 can also be performed in a multipass manner by repeatedly performing the movement of the stage 21 in the Y direction and the stepwise movement in the X direction. Further, in the case where the drawing in the multipass manner is performed in the drawing apparatus 1, the Y direction is the main scanning direction, and the X direction is the sub-scanning direction. In addition, the first moving mechanism 23 of the stage moving mechanism 22 is a main scanning mechanism that moves the stage 21 in the main scanning direction, and the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 in the sub-scanning direction.

[0061] Figure 3This diagram illustrates the structure of the computer 100 included in the control unit 10. The computer 100 is a typical computer equipped with a processor 101, a memory 102, an input / output unit 103, and a bus 104. The bus 104 is a signal circuit connecting the processor 101, the memory 102, and the input / output unit 103. The memory 102 stores various types of information. The memory 102 reads out and stores, for example, a program 109 pre-stored in a storage medium 81, which is a program product. The storage medium 81 is, for example, a USB memory or a CD-ROM.

[0062] The processor 101 executes various processes (such as numerical calculations and image processing) while utilizing the memory 102, following the program 109 and the like stored in the memory 102. The input / output unit 103 includes a keyboard 105 and a mouse 106 for receiving input from the operator, and a display 107 for displaying output from the processor 101. Furthermore, the control unit 10 may be a programmable logic controller (PLC) or a circuit board, or a combination of these with one or more computers.

[0063] Figure 4 This is a block diagram illustrating the functions of the control unit 10 implemented by the computer 100 executing the aforementioned program 109. Figure 4 The diagram also shows the structure other than the control unit 10. The control unit 10 includes a storage unit 111, a shooting control unit 112, a position detection unit 113, a drawing control unit 114, and a data generation unit 115.

[0064] The storage unit 111 is mainly implemented by the memory 102, which stores various information related to pattern drawing in the drawing device 1 in advance. The information stored in the storage unit 111 includes, for example, information sent from the data processing device 6 to the drawing device 1. This includes CAD data (hereinafter also referred to as "second CAD data") of a predetermined second pattern drawn on the substrate 9, and template generation information, which serves as information for generating the template described later.

[0065] The imaging control unit 112, position detection unit 113, drawing control unit 114, and data generation unit 115 are mainly implemented by the processor 101. The imaging control unit 112 controls the imaging unit 3 and the stage moving mechanism 22 to make the imaging unit 3 image the upper surface 90 (refer to) of the substrate 9. Figure 2The data generation unit 115 acquires an image of a portion of the first pattern described above (hereinafter also referred to as "captured image"). This captured image is sent to and saved by the storage unit 111. The data generation unit 115 rasterizes the second CAD data stored in the storage unit 111 to generate raster data (hereinafter also referred to as "second raster data") used in drawing the second pattern in the drawing apparatus 1. The second raster data is, for example, run-length data. Additionally, the data generation unit 115 generates a template (i.e., a reference image) for position detection of the substrate 9.

[0066] The position detection unit 113 performs pattern matching using the template on the captured image of the first pattern described above, and the detection stage 21 (refer to) Figure 1 The position of the substrate 9 on the drawing unit 4 (i.e., the relative position of the substrate 9 with respect to the drawing unit 4). The drawing control unit 114 controls the drawing unit 4 and the stage moving mechanism 22 based on the second grid data and the position of the substrate 9 detected by the position detection unit 113, so as to adjust the drawing position on the substrate 9 and make the drawing unit 4 perform the drawing of the second pattern for the substrate 9.

[0067] Next, while referring to Figure 5A and Figure 5B The process of drawing a pattern onto a substrate 9 using the drawing apparatus 1 will be explained. When drawing onto the substrate 9, firstly, the substrate 9 is moved into… Figure 1 In the drawing apparatus 1 shown, the substrate 9 is held by a stage 21 (step S11). The stage 21 is located on the (-Y) side compared to the imaging unit 3 and the drawing unit 4. A first pattern is pre-formed on the upper surface 90 of the substrate 9 held on the stage 21. The upper surface 90 of the substrate 9 is approximately parallel to the X and Y directions.

[0068] Next, the data generation unit 115 of the control unit 10 (see reference) Figure 4 Step S12: First, the data processing device 6 sends the second CAD data and template generation information to the drawing device 1 and saves them in the storage unit 111. Thus, the drawing device 1 prepares the second CAD data and template generation information (step S121). The template generation information includes the first CAD data of the first pattern as CAD data, and coordinates indicating the position (hereinafter also referred to as the "matching position") of the pattern matching based on the position detection unit 113 on the first pattern. Additionally, the template generation information also includes template size information indicating the size of the template used for pattern matching.

[0069] In the control section 10, the template generation information stored in the storage section 111 is read by the data generation section 115. The data generation section 115 rasterizes the 1st CAD data included in the template generation information, and generates 1st raster data (hereinafter also referred to as "intermediate data"). The 1st raster data is, for example, run-length data.

[0070] In addition, the data generation section 115 extracts a region of a prescribed size (i.e., a size indicated by the template size information) corresponding to the matching position from the 1st raster data, based on the coordinate indicating the matching position included in the template generation information and the template size information. As shown in Figure 6 The region extracted from the 1st raster data (hereinafter also referred to as "extraction region 96") is, for example, a substantially square region of two square millimeters with the matching position 95 indicated by a cross as a center. In Figure 6 In the present embodiment, the portion near the top left corner of the partial drawing region 94 in which the top left corner (i.e., the vertex on the (-X) side and the (+Y) side) of the partial drawing region 94 in which the 1st pattern is drawn is enlarged and depicted. Further, the extraction region 96 does not necessarily have to be extracted with the matching position 95 as a center, and can be, for example, a substantially square region with the matching position 95 as a top left corner. In addition, the shape and size of the extraction region 96 can be variously changed.

[0071] The data generation section 115 generates a template by converting the data of the extraction region 96 extracted from the 1st raster data into image data in a form that can be utilized in pattern matching (step S122). Figure 7 is a view showing one example of the template 97 generated by the data generation section 115. In the template 97, a portion of the 1st pattern is included as described above. Further, the shape of the pattern included in the template 97 is not limited to Figure 7 the shape shown in the drawing, and can be variously changed. In the present embodiment, the template is bitmap data. Further, the data form of the template can be a form other than the bitmap form.

[0072] The coordinates of a plurality of (for example, four or more) matching positions 95 are generally included in the template generation information. The plurality of matching positions 95 are set by the designer in advance in the data processing apparatus 6, and are included in the template generation information. In the above-described step S12, a plurality of templates 97 corresponding to the plurality of matching positions 95, respectively, are generated by the data generation section 115, and are saved in the storage section 111.

[0073] Figure 8 is a view showing one example of the arrangement of the plurality of matching positions 95 on the substrate 9. Hereinafter, the matching position 95 on the substrate 9 will be referred to as a "matching position 95" or a "matching position". Figure 8one of the divided areas 92, and the configuration of the matching position 95 in the divided area 92 is explained with reference to the plurality of local drawing areas 94. In addition, the configuration of the matching position 95 in the plurality of divided areas 92 is the same. The same applies to the description related to the matching position 95 described later. Figure 9 and Figure 10 the same applies to the description related to the matching position 95 described later. Figure 8 In the example shown in FIG. 9, four matching positions 95 are arranged in the four corner local drawing areas 94 of the plurality of local drawing areas 94 arranged in a matrix in the divided area 92. In addition, in each of the local drawing areas 94 in which the matching position 95 is arranged, the matching position 95 is arranged near the corner portion of the local drawing area 94 that is farthest from the central portion of the divided area 92.

[0074] Specifically, in the local drawing area 94 at the corner portion on the (-X) side and the (+Y) side of the divided area 92 (i.e., the local drawing area 94 on the most inward side in the width direction and the most inward side in the scanning direction), the matching position 95 is arranged adjacent to the corner portion on the (-X) side and the (+Y) side of the local drawing area 94. In addition, the extraction area 96 corresponding to this matching position 95 is also arranged adjacent to this corner portion of the local drawing area 94. The extraction area 96 is entirely within the local drawing area 94 (i.e., on the outer periphery of the local drawing area 94 and on the inner side of the outer periphery). It is preferable that the corner portion on the (-X) side and the (+Y) side of the extraction area 96 overlap the corner portion on the (-X) side and the (+Y) side of the local drawing area 94, and that the edge on the (-X) side and the edge on the (+Y) side of the extraction area 96 overlap the edge on the (-X) side and the edge on the (+Y) side of the local drawing area 94.

[0075] Furthermore, the extraction area 96 can also be separated inward from the outer periphery of the local drawing area 94. In this case, the distance between the edge on the (-X) side of the extraction area 96 and the edge on the (-X) side of the local drawing area 94 is, for example, 2 mm or less (i.e., 100% or less of the length of one side of the extraction area 96), and is preferably 1 mm or less (i.e., 50% or less of the length of one side of the extraction area 96). The same applies to the distance between the edge on the (+Y) side of the extraction area 96 and the edge on the (+Y) side of the local drawing area 94.

[0076] In the partial drawing region 94 at the corner on the (+X) side and the (-Y) side (i.e., the partial drawing region 94 on the othermost side in the width direction and the othermost side in the scanning direction), the matching position 95 and the extraction region 96 are arranged adjacent to the corner on the (+X) side and the (-Y) side of the partial drawing region 94. The extraction region 96 is entirely located within the partial drawing region 94. It is preferable that the corner on the (+X) side and the (-Y) side of the extraction region 96 overlap the corner on the (+X) side and the (-Y) side of the partial drawing region 94, and that the edge on the (+X) side and the edge on the (-Y) side of the extraction region 96 overlap the edge on the (+X) side and the edge on the (-Y) side of the partial drawing region 94, respectively. Further, the extraction region 96 can also be separated inward from the outer periphery of the partial drawing region 94, as described above. In this case, the distance between the extraction region 96 and the partial drawing region 94 is substantially the same as the extraction region 96 of the partial drawing region 94 arranged on the othermost (-X) side and the othermost (+Y) side, described above.

[0077] In the partial drawing region 94 at the corner on the (+X) side and the (-Y) side (i.e., the partial drawing region 94 on the othermost side in the width direction and the othermost side in the scanning direction), the matching position 95 and the extraction region 96 are arranged adjacent to the corner on the (+X) side and the (-Y) side of the partial drawing region 94. The extraction region 96 is entirely located within the partial drawing region 94. It is preferable that the corner on the (+X) side and the (-Y) side of the extraction region 96 overlap the corner on the (+X) side and the (-Y) side of the partial drawing region 94, and that the edge on the (+X) side and the edge on the (-Y) side of the extraction region 96 overlap the edge on the (+X) side and the edge on the (-Y) side of the partial drawing region 94, respectively. Further, the extraction region 96 can also be separated inward from the outer periphery of the partial drawing region 94, as described above. In this case, the distance between the extraction region 96 and the partial drawing region 94 is substantially the same as the extraction region 96 of the partial drawing region 94 arranged on the othermost (-X) side and the othermost (+Y) side, described above.

[0078] In the local drawing region 94 located at the corners on both the (-X) and (-Y) sides (i.e., the local drawing region 94 furthest to the side in the width direction and furthest to the side in the scanning direction), the matching position 95 and the extraction region 96 are arranged adjacent to the corners on both the (-X) and (-Y) sides of the local drawing region 94. The extraction region 96 is entirely located within the local drawing region 94. Preferably, the corners on both the (-X) and (-Y) sides of the extraction region 96 overlap with the corners on both the (-X) and (-Y) sides of the local drawing region 94, and the edges on both the (-X) and (-Y) sides of the extraction region 96 overlap with the edges on both the (-X) and (-Y) sides of the local drawing region 94, respectively. Furthermore, the extraction region 96 may also be separated from the outer periphery of the local drawing region 94 inwards, as described above. In this case, the distance between the extraction region 96 and the local drawing region 94 is approximately the same as that between the extraction region 96 and the local drawing region 94 located on the (-X) and (+Y) sides as described above.

[0079] In step S12, when generating multiple templates 97 corresponding to multiple matching positions 95 respectively, using... Figure 1 The stage moving mechanism 22 shown moves the substrate 9 together with the stage 21 in the (+Y) direction, moving it downwards from the imaging unit 3. Furthermore, step S12 can be performed before the loading and holding of the substrate 9 in step S11, or it can be performed in parallel with step S11.

[0080] Next, by utilizing the shooting control unit 112 (see reference) Figure 4 The camera unit 3 and the stage moving mechanism 22 are controlled to capture images of a predetermined size on the substrate 9 corresponding to each matching position 95, thereby acquiring an image containing a portion of the first pattern (step S13). This capturing area is a generally rectangular region centered on the matching position 95, provided the substrate 9 is correctly held in the designed position on the stage 21. This capturing area has a pair of sides parallel to the X and Y directions, respectively, and is larger than the extraction area 96 described above in both the X and Y directions.

[0081] For example, the shot area has a substantially rectangular shape in which the extraction area 96 is enlarged by a prescribed size toward the (+X) side, the (-X) side, the (+Y) side, and the (-Y) side, respectively. For example, each of the lengths in the X direction and the Y direction of the shot area (i.e., each of the lengths in the X direction and the Y direction of the shot field of view of the camera 31) is 14 mm and 7 mm. Therefore, even if the position of the substrate 9 on the stage 21 is slightly shifted from the designed position, the pattern corresponding to the template 97 is included in the shot image. In step S13, a plurality of shot images corresponding to the plurality of matching positions 95, respectively, are acquired and stored in the storage section 111. Further, step S13 can be performed before step S12, or can be performed in parallel with step S12. In addition, the size of the shot area can be variously changed.

[0082] Next, the position detection section 113 of the control section 10 performs pattern matching using the template 97 corresponding to each matching position 95, on the shot image corresponding to the matching position 95. The pattern matching is performed according to a known pattern matching method (for example, geometric shape pattern matching or normalized correlation search, etc.). Further, based on the position of the pattern common to the template 97 in each shot image, and the relative position of the substrate 9 to the imaging section 3 at the time of acquisition of each shot image, etc., the position of the substrate 9 on the stage 21 is detected by the position detection section 113 (refer to Figure 4 ) (step S14).

[0083] The position of the substrate 9 detected by the position detection section 113 in step S14 includes the coordinates of the substrate 9 on the stage 21 in the X direction and the Y direction, the orientation of the substrate 9, and information indicating the deformation of the substrate 9 due to distortion, etc. In addition, the information indicating the deformation of the substrate 9 refers to information such as the shape of the deformed substrate 9, and the positions of the plurality of partial drawing areas 94 on the substrate 9.

[0084] In the control section 10, the 2nd CAD data is also read out from the storage section 111 by the data generation section 115 (refer to Figure 4 ), and rasterization of the 2nd CAD data is performed to generate 2nd raster data (step S15). The 2nd raster data is, for example, run-length data. Step S15 can be performed after step S14, can be performed in parallel with step S14, or can be performed before step S14. In the case where step S15 is performed before step S14, for example, step S15 can be performed in parallel with one of steps S11 to S13, can be performed between two of steps S11 to S14, or can be performed before step S11.

[0085] When the 2nd raster data is generated, the drawing control section 114 (refer toFigure 4 The drawing unit 4 and the stage moving mechanism 22 are controlled. As a result, the modulated light described above is irradiated onto the substrate 9, which moves relative to the drawing head 41 of the drawing unit 4 in the Y direction, thereby drawing a second pattern on the upper surface 90 of the substrate 9 (step S16). In step S16, based on the position of the substrate 9 detected in step S14, the drawing unit 4 and the stage moving mechanism 22 mechanically and automatically correct the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 onto the substrate 9, as well as the scanning position of the light beam on the substrate 9, using known correction methods. Therefore, the second pattern can be drawn on the first pattern with high positional accuracy.

[0086] In the above description, in step S12, the first raster data obtained by rasterizing all of the first CAD data (i.e., the entire first pattern) is used as intermediate data. Extraction regions 96 corresponding to matching positions 95 are extracted from this intermediate data, and a template 97 is generated. However, this is not a limitation. For example, in step S12, only a portion of the data that is part of the first CAD data may be rasterized by the data generation unit 115 to create the aforementioned intermediate data. In this case, the portion of data is CAD data corresponding to a region of a predetermined size in the first pattern containing each matching position 95 (hereinafter also referred to as a "clipping region"). As described above, when multiple matching positions 95 are set, the portion of data is CAD data corresponding to a set of multiple clipping regions corresponding to the multiple matching positions 95 respectively. The positions and sizes of the multiple clipping regions are preset by the designer in the data processing device 6 and included in the template generation information.

[0087] Each clipping region, as described above, includes a matching position 95 and an extraction region 96 corresponding to that matching position 95. The clipping region is, for example, a generally rectangular region having a pair of sides parallel to the X and Y directions, and having a size greater than or equal to the extraction region 96 in both the X and Y directions. The clipping region may have a shape obtained by expanding the extraction region 96 by a predetermined size (e.g., the maximum positional offset of the substrate 9 in the X and Y directions) towards the (+X), (-X), (+Y), and (-Y) sides, respectively. Alternatively, the clipping region may be the same region as a partial drawing region 94 containing the matching position 95. In this case, the aforementioned partial data corresponds to CAD data corresponding to multiple partial drawing regions 94 (i.e., a set of partial drawing regions 94 containing each of the multiple matching positions 95). In this way, by rasterizing only a portion of the first CAD data in the data generation unit 115, the rasterization time can be shortened.

[0088] As described above, the drawing apparatus 1 is an apparatus for drawing patterns by irradiating light onto a substrate 9. The drawing apparatus 1 includes a stage 21, a drawing head 41, a scanning mechanism (in the above example, a stage moving mechanism 22), an imaging unit 3, a position detection unit 113, a storage unit 111, a data generation unit 115, and a drawing control unit 114. The stage 21 holds a substrate 9 with a first pattern pre-formed on its upper surface 90. The drawing head 41 irradiates modulated light onto the upper surface 90 of the substrate 9. The scanning mechanism moves the stage 21 relative to the drawing head 41 in a scanning direction parallel to the upper surface 90 of the substrate 9 (in the above example, the Y direction). The imaging unit 3 captures an image of a portion of the first pattern.

[0089] The position detection unit 113 detects the position of the substrate 9 by performing pattern matching using template 97 on the captured image acquired by the imaging unit 3. The storage unit 111 stores second CAD data as CAD data for the second pattern drawn on the first pattern. The data generation unit 115 rasterizes the second CAD data to generate second raster data. The drawing control unit 114 controls the drawing head 41 and the scanning mechanism based on the second raster data and the position of the substrate 9 detected by the position detection unit 113, and executes the drawing of the second pattern onto the substrate 9, which moves relative to the drawing head 41 in the scanning direction.

[0090] The storage unit 111 also stores the coordinates of the matching position 95 on the first pattern, which is based on the pattern matching performed by the position detection unit 113. The data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size (i.e., extraction region 96) corresponding to the matching position 95 from the intermediate data as a template 97.

[0091] In this way, in the drawing apparatus 1, when generating the template 97 used for pattern matching during position detection on the substrate 9, the template 97 can be generated from the CAD data of the first pattern without photographing the first pattern on the substrate 9. Therefore, when generating the template 97, it is not necessary to correctly place the substrate 9 on the stage 21 at the designed position or to photograph the first pattern on the substrate 9 using the photographing unit 3. Therefore, the template 97 can be generated easily and quickly.

[0092] As described above, preferably, in the data generation unit 115, only a portion of the CAD data corresponding to the designated area (i.e., the cut-out area) containing the matching position 95 in the first pattern is rasterized, thereby creating intermediate data. This shortens the rasterization time compared to rasterizing all of the first CAD data, thus reducing the time required to generate the template 97.

[0093] As described above, a plurality of local drawing regions 94 may be arranged in a matrix on the upper surface 90 of the substrate 9 in the scanning direction and in the width direction perpendicular to the scanning direction (Y and X directions in the above example). In this case, it is preferable that the aforementioned partial data corresponds to the set of local drawing regions 94 including matching positions 95. This makes it easier to set the clipping region based on the designer, thereby shortening the time required to create template generation information in the data processing device 6.

[0094] like Figure 8 As shown, when multiple division regions 92 are provided on the upper surface 90 of the substrate 9, the configuration of the matching positions 95 in each division region 92 can also be the same. In this case, in the data generation unit 115, four extraction regions 96 corresponding to the four matching positions 95 in one division region 92 are extracted and four templates 97 are generated. Furthermore, instead of creating templates corresponding to the matching positions 95 of other division regions 92, these four templates 97 are shared in pattern matching at the four matching positions 95 of each division region 92 based on the position detection unit 113. As a result, the time required to generate the templates 97 can be shortened.

[0095] like Figure 8As shown, preferably, when a plurality of local drawing regions 94 (in the example above, a plurality of local drawing regions 94 arranged in a matrix in the scanning direction and the width direction perpendicular to the scanning direction) are provided on the upper surface 90 of the substrate 9, the matching position 95 of the local drawing region 94 that is the closest in both the scanning direction and the width direction (in the example above, the closest to the (+Y) side and the closest to the (-X) side) is disposed adjacent to the corner of that side in both the scanning direction and the width direction (in the example above, the (+Y) side and the (-X) side). Furthermore, preferably, the matching position 95 of the local drawing region 94 that is the closest in both the scanning direction and the other side in both the width direction (in the example above, the closest to the (+Y) side and the closest to the (+X) side) is disposed adjacent to the corner of that side in both the scanning direction and the other side in both the width direction (in the example above, the (+Y) side and the (+X) side). Furthermore, preferably, in the partial drawing area 94 that is the most distant side in the scanning direction and the most distant side in the width direction (in the above example, the most (-Y) side and the most (+X) side), the matching position 95 is arranged adjacent to the corner of the other side in the scanning direction and the other side in the width direction (in the above example, the (-Y) side and the (+X) side). Also preferably, in the partial drawing area 94 that is the most distant side in the scanning direction and the most distant side in the width direction (in the above example, the most (-Y) side and the most (-X) side), the matching position 95 is arranged adjacent to the corner of the other side in the scanning direction and the other side in the width direction (in the above example, the (-Y) side and the (-X) side).

[0096] In this way, by arranging four matching positions 95 at the four corners of the smallest rectangle that circumscribes the plurality of local drawing regions 94 arranged in a matrix (in the example above, the plurality of local drawing regions 94 are arranged in a divided region 92), it is possible to enclose the approximate whole area of ​​the region where the second pattern is drawn with these four matching positions 95. As a result, the approximate whole area of ​​the region where the second pattern is drawn can be aligned with high precision, thereby improving the drawing accuracy of the second pattern.

[0097] The number and arrangement of matching positions 95 on substrate 9 are not limited to Figure 8 The quantity and configuration shown can be varied. For example, matching positions 95 can also be configured in the multiple local drawing regions 94 arranged in each division region 92, except for the local drawing regions 94 located at the four corners. For example, as Figure 9As shown, matching positions 95 can also be configured for each of the multiple local drawing regions 94 arranged in a matrix within each divided region 92. Figure 9 In the example shown, among the multiple local drawing regions 94 in each of the divided regions 92, the matching position 95 in each local drawing region 94 located on the (-Y) side is arranged adjacent to the edge on the (-Y) side, and the matching position 95 in each local drawing region 94 located on the (+Y) side is arranged adjacent to the edge on the (+Y) side. Furthermore, among these multiple local drawing regions 94, the matching position 95 in each local drawing region 94 located on the (-X) side is arranged adjacent to the edge on the (-X) side, and the matching position 95 in each local drawing region 94 located on the (+X) side is arranged adjacent to the edge on the (+X) side. Therefore, since the approximate whole area of ​​the region where the second pattern is drawn can be surrounded by multiple matching positions 95, the approximate whole area of ​​the region where the second pattern is drawn can be aligned with even higher precision.

[0098] In addition, Figure 9 In the example shown, it is preferable that the multiple matching positions 95 of the multiple local drawing regions 94 arranged along the Y direction are located at the same position in the X direction. Therefore, when acquiring the images at each matching position 95 in step S13, the images at the multiple matching positions 95 can be captured without moving the substrate 9 relative to the imaging unit 3 in the X direction. As a result, the time required to acquire the images in step S13 can be shortened, thereby shortening the time required for the alignment process.

[0099] Or, such as Figure 10 As shown, among the multiple local drawing regions 94 arranged in a matrix within each divided region 92, the relative positions of the matching positions 95 in each local drawing region 94 relative to each local drawing region 94 (e.g., relative coordinates with the corner of the local drawing region 94 on the (-X) and (+Y) sides as the origin) can also be the same. Figure 10 In the example shown, in each of the four local drawing regions 94, the matching position 95 is arranged adjacent to the corner of the local drawing region 94 on both the (-X) and (+Y) sides. In this case, in the data generation unit 115, instead of extracting four extraction regions 96 corresponding to the four matching positions 95 to generate four templates 97, one template 97 is generated corresponding to the matching position 95 of one of the local drawing regions 94 located at the four corners. Furthermore, this single template 97 is shared in the pattern matching at the matching positions 95 of the four local drawing regions 94 based on the position detection unit 113. As a result, the time required to generate the template 97 can be shortened.

[0100] In addition, Figure 10 The example shown illustrates the case where matching positions 95 are configured at the same position in each of the four corner local drawing regions 94 within multiple local drawing regions 92. However, the same effect will be achieved even if matching positions 95 are configured at the same position in two or more local drawing regions 94 regardless of their position.

[0101] That is, when the relative positions of the matching positions 95 within two or more of the multiple local drawing regions 94 are the same, it is preferable that the data generation unit 115 generates a template 97 corresponding to the matching position 95 of one of the two or more local drawing regions 94, and this template 97 is shared in pattern matching at the respective matching positions 95 of the two or more local drawing regions 94 based on the position detection unit 113. This reduces the time required to generate the template 97.

[0102] As described above, the method for drawing a pattern by irradiating a substrate with light includes the following steps: holding a substrate 9 with a first pattern pre-formed on its upper surface 90 (step S11); generating a template 97 for position detection of the substrate 9 (step S12); photographing a portion of the first pattern (step S13); detecting the position of the substrate 9 by performing pattern matching using the template 97 on the photographed image obtained in step S13 (step S14); and using a second pattern drawn on the first pattern as CAD data in a second CAD file. The process of generating second grid data by data rasterization (step S15); and the process of drawing the second pattern onto the substrate 9 which is moving relative to the drawing head 41 in the scanning direction (Y direction in the above example) by controlling the drawing head 41 to irradiate the upper surface 90 of the substrate 9 based on the second grid data and the position of the substrate 9 detected in step S14, and the scanning mechanism (stage moving mechanism 22 in the above example) to move the substrate 9 relative to the drawing head 41 in the scanning direction parallel to the upper surface 90 of the substrate 9.

[0103] Step S12 includes a step of preparing coordinates representing the matching position 95 for pattern matching on the first pattern (step S121), and a step of rasterizing the CAD data of the first pattern to create intermediate data, and generating image data of a region of a predetermined size corresponding to the matching position 95 from the intermediate data as a template 97 (step S122). Thus, as described above, the template 97 can be generated easily and quickly.

[0104] In the example described above, the program 109 related to the generation of template 97 is pre-stored in the computer 100 of the drawing device 1, but this is not a limitation. For example, the program 109 can also be subsequently imported into the drawing device 1 that is already in use (i.e., retrofit). In this case, by executing the program 109 using the computer 100, the data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and generates image data of a region of a predetermined size corresponding to the matching position 95 (i.e., extraction region 96) from the intermediate data as template 97. Thus, as described above, template 97 can be generated easily and quickly.

[0105] The drawing device 1, drawing method and program 109 described above can be modified in various ways.

[0106] For example, in the above example, the drawing of one main surface of the substrate 9 was described, but in the drawing apparatus 1, patterns can also be drawn on both main surfaces of the substrate 9. In this case, when drawing the other main surface of the substrate 9, a template for use in pattern matching is generated from the CAD data of the pattern pre-formed on the other main surface, just as described above.

[0107] The substrate 9 described above does not necessarily need to have multiple division regions 92. That is, only one division region 92 may be provided on the substrate 9. In this case, the first pre-defined dividing line 91 may be omitted. In addition, multiple local drawing regions 94 need not necessarily be provided in the division region 92. Furthermore, the substrate 9 is not necessarily limited to a printed circuit board. In the drawing apparatus 1, for example, drawing can be performed on glass substrates for flat panel display devices such as semiconductor substrates, liquid crystal display devices, and organic EL display devices, glass substrates for photomasks, substrates for solar panels, etc.

[0108] The structures in the above-described embodiments and their variations can be appropriately combined as long as they do not contradict each other.

[0109] Although the invention has been described and illustrated in detail, the description is illustrative and not limiting. Therefore, it can be said that various modifications and methods can be implemented without departing from the scope of the invention.

Claims

1. A drawing apparatus for drawing patterns by irradiating a substrate with light, characterized in that, Possessing: a stage that holds a substrate on which a first pattern is provided on an upper surface; a drawing head that irradiates modulated light on the upper surface of the substrate; a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; a photographing section that photographs a portion of the first pattern; a position detection section that detects the position of the substrate by performing pattern matching using a template on a photographed image acquired by the photographing section; a storage section that stores second CAD data of a second pattern drawn on the first pattern as CAD data; a data generation section that generates second raster data by rasterizing the second CAD data; and a drawing control section that performs drawing of the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head by controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection section, the storage section further stores coordinates that indicate matching positions at which pattern matching is performed by the position detection section on the first pattern, the data generation section rasterizes only partial data corresponding to a prescribed region of the first pattern that includes the matching position to create intermediate data, and generates image data of a region of a prescribed size corresponding to the matching position from the intermediate data as the template.

2. The drawing apparatus according to claim 1, wherein a plurality of partial drawing regions that are arranged in a matrix shape in the scanning direction and a width direction perpendicular to the scanning direction and each of which draws the same pattern are provided on the upper surface of the substrate, in two or more partial drawing regions of the plurality of partial drawing regions in which the matching position is provided, the relative positions of the matching position within each of the two or more partial drawing regions with respect to the each partial drawing region are the same, the data generation section generates the template corresponding to the matching position of one of the two or more partial drawing regions, the template is commonly used in pattern matching at the matching positions of the two or more partial drawing regions based on the position detection section.

3. The drawing apparatus according to claim 1, wherein a plurality of partial drawing regions that are arranged in a matrix shape in the scanning direction and a width direction perpendicular to the scanning direction are provided on the upper surface of the substrate, in a partial drawing region of the plurality of partial drawing regions that is on the most side in the scanning direction and on the most side in the width direction, the matching position is disposed adjacent to a corner on the side in the scanning direction and on the side in the width direction, in a partial drawing region of the plurality of partial drawing regions that is on the most side in the scanning direction and on the other side in the width direction, the matching position is disposed adjacent to a corner on the side in the scanning direction and on the other side in the width direction. ​ in a partial drawing region on the other side in the scanning direction and on the one side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the other side in the scanning direction and on the one side in the width direction, in a partial drawing region on the other side in the scanning direction and on the other side in the width direction among the plurality of partial drawing regions, the matching position is disposed adjacent to a corner on the other side in the scanning direction and on the other side in the width direction.

4. The drawing apparatus according to any one of claims 1 to 3, wherein a plurality of partial drawing regions arranged in a matrix shape in a scanning direction and a width direction perpendicular to the scanning direction are provided on the upper surface of the substrate, the partial data corresponds to a set of partial drawing regions including the matching position.

5. A drawing method of performing pattern drawing by irradiating light to a substrate, characterized by, comprising the following steps: a) a step of holding a substrate on which a first pattern is provided in advance on an upper surface; b) a step of generating a template for position detection of the substrate; c) a step of capturing a part of the first pattern; d) a step of detecting a position of the substrate by performing pattern matching using the template on a captured image obtained in the step c); e) a step of rasterizing second CAD data, which is CAD data of a second pattern to be drawn on the first pattern, to generate second raster data; and f) a step of performing drawing of the second pattern on the substrate relatively moved in a scanning direction parallel to the upper surface of the substrate with respect to a drawing head that irradiates modulated light on the upper surface of the substrate and a scanning mechanism that relatively moves the substrate with respect to the drawing head in the scanning direction, based on the second raster data and the position of the substrate detected in the step d), the step b) includes: b1) a step of preparing coordinates indicating a matching position at which the pattern matching is performed on the first pattern; and b2) a step of rasterizing only partial data, which is CAD data of a prescribed region including the matching position in the first pattern, to create intermediate data, and generating image data of a region of a prescribed size corresponding to the matching position from the intermediate data as the template.

6. A storage medium recording a program executed in a drawing apparatus that irradiates light on a substrate to perform pattern drawing, characterized in that the drawing apparatus includes: a stage that holds a substrate on which a first pattern is provided in advance on an upper surface; a drawing head that irradiates modulated light on the upper surface of the substrate; a scanning mechanism that relatively moves the stage with respect to the drawing head in a scanning direction parallel to the upper surface of the substrate; a capturing section that captures a part of the first pattern; a position detection section that detects a position of the substrate by performing pattern matching using a template on a captured image obtained by the capturing section; a storage section that stores second CAD data as CAD data of a second pattern drawn on the first pattern; a data generation section that generates second raster data by rasterizing the second CAD data; and a drawing control section that performs drawing of the second pattern onto the substrate relatively moved in the scanning direction with respect to the drawing head by controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection section, the storage section further stores coordinates indicating a matching position at which pattern matching is performed on the first pattern based on the position detection section, by executing the program with a computer, the data generation section creates intermediate data by rasterizing only partial data as CAD data corresponding to a prescribed region in the first pattern that contains the matching position, and generates image data of a region of a prescribed size corresponding to the matching position from the intermediate data as the template.

Images