Cleaning method for spectrometer line nozzle

Abstract

The present application provides a cleaning method for a spectrometer line nozzle. The method comprises placing the spectrometer line nozzle in a nozzle slot of a cleaning tank; performing ultrasonic water washing on the spectrometer line nozzle; and performing high-pressure pump water washing on the spectrometer line nozzle. The spectrometer line nozzle located in the nozzle slot is first subjected to ultrasonic water washing. Through ultrasonic radiation, the microbubbles in the cleaning liquid in the tank are kept vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to loosen. After that, the loosened pollutants are washed off the spectrometer line nozzle by high-pressure flushing, so that the pollutants on the spectrometer line nozzle are quickly removed, effectively improving the cleaning efficiency of the spectrometer line nozzle.

Description

Technical Field

[0001] The invention relates to the technical field of energy spectrometers, in particular to a cleaning method for a line nozzle of an energy spectrometer. Background Art

[0002] With the booming development of the printed circuit board industry, the circuit requirements of printed circuit products are becoming more and more precise, and the performance requirements for EDS (Energy Dispersive Spectroscopy) lines are becoming more and more stringent. In order to ensure the stability of the product production process, the maintenance frequency of EDS is also increasing. When cleaning and maintaining the EDS line, due to the influence of the crystallization of the liquid medicine, it is difficult to clean the groove wall and the nozzle. In particular, the unclean nozzle will seriously affect the production quality of the EDS line.

[0003] However, the traditional cleaning method is to remove the nozzle, soak it in water and use a toothpick or a sharp hard object to clear the crystals in the nozzle one by one. Although this method can clear the crystals in the nozzle, it is very inefficient and time-consuming, which seriously affects the maintenance of the EDS line, production timeliness and labor cost control. Summary of the invention

[0004] The purpose of the present invention is to overcome the deficiencies in the prior art and provide a method for cleaning a line nozzle of an energy spectrometer which can effectively improve the cleaning efficiency.

[0005] The objective of the present invention is achieved through the following technical solutions:

[0006] A cleaning method for a spectrometer line nozzle, using a spectrometer line nozzle cleaning device for cleaning, the spectrometer line nozzle cleaning device comprising a cleaning tank, a cleaning bracket and a cleaning assembly; the cleaning tank is used to contain a cleaning liquid; the cleaning bracket is arranged in the cleaning tank, the cleaning bracket is provided with a nozzle clamping slot, the nozzle clamping slot is used to clamp and install the spectrometer line nozzle; the cleaning assembly comprises an ultrasonic water washing component and a high-pressure pump water washing component, the ultrasonic water washing component is arranged in the cleaning tank, the ultrasonic water washing component is used to perform ultrasonic water washing on the spectrometer line nozzle, the high-pressure pump water washing component is connected to the cleaning tank, the high-pressure pump water washing component is used to perform high-pressure pump water washing on the spectrometer line nozzle;

[0007] The cleaning method for the spectrometer line nozzle comprises:

[0008] Place the spectrometer line nozzle into the nozzle slot of the cleaning tank;

[0009] Performing ultrasonic water washing treatment on the spectrometer line nozzle;

[0010] The energy spectrometer line nozzle is subjected to a high-pressure pump water washing treatment.

[0011] In one of the embodiments, placing the spectrometer line nozzle in a nozzle slot of the cleaning tank includes: arranging a plurality of the spectrometer line nozzles in sequence on the nozzle slot.

[0012] In one embodiment, the ultrasonic water washing treatment of the spectrometer line nozzle includes: injecting a preset volume of cleaning liquid into the cleaning tank.

[0013] In one of the embodiments, the liquid level of the preset volume of cleaning fluid is flush with the spectrometer line nozzle.

[0014] In one embodiment, the step of injecting a preset volume of cleaning liquid into the cleaning tank further includes: turning on the ultrasonic water washing component and performing ultrasonic water washing.

[0015] In one embodiment, the ultrasonic washing time is 18 minutes to 22 minutes.

[0016] In one of the embodiments, the high-pressure pump water washing treatment of the spectrometer line nozzle also includes: opening a circulating water pipe to return the cleaning liquid in the cleaning tank to the water reservoir.

[0017] In one of the embodiments, the high-pressure pump water washing treatment of the spectrometer line nozzle includes: opening the high-pressure pump water washing component to use the cleaning liquid in the water reservoir to high-pressure wash the spectrometer line nozzle.

[0018] In one embodiment, the high pressure pump water washing component is turned on for 4 minutes to 7 minutes.

[0019] In one of the embodiments, the high pressure pump water washing component is turned on for 5 minutes.

[0020] Compared with the prior art, the present invention has at least the following advantages:

[0021] The spectrometer line nozzle located in the nozzle slot is first subjected to ultrasonic water washing treatment. Through ultrasonic radiation, the microbubbles in the cleaning liquid in the slot are kept vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the pollution layer, and finally leading to the loosening of the pollutants. After that, high-pressure flushing is used to flush the loosened pollutants from the spectrometer line nozzle, so that the pollutants on the spectrometer line nozzle are quickly removed, effectively improving the cleaning efficiency of the spectrometer line nozzle. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0023] Figure 1 A method diagram of a cleaning method for a line nozzle of an energy spectrometer in one embodiment. DETAILED DESCRIPTION

[0024] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. The preferred embodiments of the present invention are given in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thoroughly understood.

[0025] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation method.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0027] The present invention relates to a cleaning method for a spectrometer line nozzle. In one embodiment, the cleaning method for the spectrometer line nozzle comprises placing the spectrometer line nozzle in a nozzle slot of a cleaning cylinder; performing ultrasonic water washing on the spectrometer line nozzle; and performing high-pressure pump water washing on the spectrometer line nozzle. The spectrometer line nozzle located in the nozzle slot is first subjected to ultrasonic water washing. Through ultrasonic radiation, the microbubbles in the cleaning liquid in the tank are kept vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to loosen. After that, the loosened pollutants are washed off the spectrometer line nozzle by high-pressure flushing, so that the pollutants on the spectrometer line nozzle are quickly removed, effectively improving the cleaning efficiency of the spectrometer line nozzle.

[0028] See also Figure 1 , which is a flow chart of a method for cleaning a line nozzle of an energy spectrometer according to an embodiment of the present invention. The method for cleaning a line nozzle of an energy spectrometer includes part or all of the following steps.

[0029] S100: Place the spectrometer line nozzle in the nozzle slot of the cleaning tank.

[0030] In the present embodiment, the spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the boarding condition of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystalline contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle card slot to remove the crystalline contaminants from the spectrometer line nozzle. Among them, the nozzle card slot is a bottom hollow structure, and the spectrometer line nozzle is clamped in the nozzle card slot. Specifically, part of the spectrometer line nozzle is accommodated in the nozzle card slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning cylinder, thereby facilitating the all-round cleaning of the spectrometer line nozzle, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved.

[0031] S200: performing ultrasonic water washing treatment on the spectrometer line nozzle.

[0032] In the present embodiment, the spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the boarding condition of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystalline contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle card slot to remove the crystalline contaminants from the spectrometer line nozzle. Among them, the nozzle card slot is a bottom hollow structure, and the spectrometer line nozzle is clamped in the nozzle card slot. Specifically, part of the spectrometer line nozzle is accommodated in the nozzle card slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning cylinder, thereby facilitating the all-round cleaning of the spectrometer line nozzle, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved. In this way, after the spectrometer wire nozzle is placed in the nozzle slot, the spectrometer wire nozzle is immersed in the cleaning tank, and ultrasonic waves are radiated into the cleaning liquid in the cleaning tank. Under the radiation of ultrasonic waves, the microbubbles in the liquid in the nozzle slot keep vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer wire nozzle, causing fatigue damage of the contamination layer, and finally leading to the peeling or loosening of the pollutants, which is convenient for the subsequent rapid cleaning of the spectrometer wire nozzle.

[0033] S300: performing a high-pressure pump water washing process on the spectrometer line nozzle.

[0034] In this embodiment, the spectrometer line spray is first subjected to ultrasonic water washing treatment before the high-pressure pump water washing treatment. The spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the board formation of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystalline contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle card slot to remove the crystalline contaminants from the spectrometer line nozzle. Among them, the nozzle card slot is a bottom hollow structure, and the spectrometer line nozzle is clamped in the nozzle card slot. Specifically, part of the spectrometer line nozzle is accommodated in the nozzle card slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning tank, so as to facilitate the all-round cleaning of the spectrometer line nozzle, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved. After the spectrometer line nozzle is placed in the nozzle slot, the spectrometer line nozzle is immersed in the cleaning tank, and ultrasonic waves are radiated into the cleaning liquid in the cleaning tank. Under the radiation of ultrasonic waves, the microbubbles in the liquid in the nozzle slot keep vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to peel off or loosen. In this way, the crystallized pollutants on the spectrometer line nozzle are in a loose state, that is, an easy-to-peel state. Under the action of high-pressure water flow, the crystallized pollutants on the spectrometer line nozzle can be cleaned more quickly and washed down with the water flow, effectively improving the cleaning efficiency of the spectrometer line nozzle.

[0035] In the above embodiment, the spectrometer line nozzle located in the nozzle slot is first subjected to ultrasonic water washing treatment. Through ultrasonic radiation, the microbubbles in the cleaning liquid in the slot are kept vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally leading to the loosening of the pollutants. Thereafter, high-pressure flushing is used to flush the loosened pollutants from the spectrometer line nozzle, so that the pollutants on the spectrometer line nozzle are quickly removed, effectively improving the cleaning efficiency of the spectrometer line nozzle.

[0036] In one embodiment, the placing of the spectrometer line nozzle in the nozzle slot of the cleaning cylinder includes: arranging a plurality of the spectrometer line nozzles in sequence on the nozzle slot. In this embodiment, the spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the boarding condition of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystal contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle slot to remove the crystal contaminants from the spectrometer line nozzle. Among them, the nozzle slot is a bottom hollow structure, and a plurality of the spectrometer line nozzles are clamped in the nozzle slot. Specifically, the plurality of the spectrometer line nozzles are evenly distributed in the nozzle slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning cylinder, so as to facilitate the all-round cleaning of the spectrometer line nozzle. Moreover, the plurality of the spectrometer line nozzles can be cleaned at the same time, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved.

[0037] In one embodiment, the ultrasonic water washing treatment of the spectrometer line nozzle includes: injecting a preset volume of cleaning liquid into the cleaning cylinder. In this embodiment, the cleaning cylinder accommodates the spectrometer line nozzle, and the cleaning cylinder is also used to accommodate the cleaning liquid, and the cleaning liquid is used to clean the spectrometer line nozzle. Before cleaning the spectrometer line nozzle, a preset volume of cleaning liquid is first injected into the cleaning cylinder, so that the cleaning cylinder is filled with cleaning liquid, which is convenient for subsequent ultrasonic water washing of the spectrometer line nozzle.

[0038] Furthermore, the liquid level of the preset capacity of cleaning liquid is flush with the spectrometer line nozzle, and the liquid volume of the cleaning liquid is equal to the cleaning amount required for the spectrometer line nozzle. Specifically, the liquid level of the cleaning liquid in the cleaning tank is equal to the height of the spectrometer line nozzle, that is, the cleaning liquid in the cleaning tank just covers the spectrometer line nozzle, which facilitates the cleaning of various positions of the spectrometer line nozzle to improve the cleanliness of the spectrometer line nozzle.

[0039] Furthermore, the process of injecting a preset volume of cleaning liquid into the cleaning cylinder further includes: turning on the ultrasonic water washing component and performing ultrasonic water washing. In the present embodiment, after the cleaning cylinder is filled with the cleaning liquid, the cleaning liquid submerges the spectrometer line nozzle, so that the cleaning liquid covers the spectrometer line nozzle in all directions, so that the cleaning liquid is attached to each position of the spectrometer line nozzle. The ultrasonic water washing component is located in the cleaning cylinder. After the cleaning liquid is injected, the ultrasonic water washing component is turned on to radiate ultrasonic waves to the cleaning liquid. With the help of ultrasonic vibration, the microbubbles in the liquid in the nozzle slot keep vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to peel off or loosen, which is convenient for cleaning the spectrometer line nozzle. In another embodiment, the ultrasonic water washing time is 18 minutes to 22 minutes, specifically, the ultrasonic water washing time is 20 minutes.

[0040] In one of the embodiments, the high-pressure pump water washing treatment of the spectrometer line nozzle also includes: opening the circulating water pipe to return the cleaning liquid in the cleaning tank to the water reservoir. In this embodiment, the spectrometer line nozzle is first subjected to ultrasonic water washing treatment before the high-pressure pump water washing treatment. The spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the board formation of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystalline contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle slot to remove the crystalline contaminants from the spectrometer line nozzle. Among them, the nozzle slot is a hollow structure at the bottom, and the spectrometer line nozzle is clamped in the nozzle slot. Specifically, part of the spectrometer line nozzle is accommodated in the nozzle slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning tank, so as to facilitate the all-round cleaning of the spectrometer line nozzle, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved. After the spectrometer line nozzle is placed in the nozzle slot, the spectrometer line nozzle is immersed in the cleaning tank, and is radiated into the cleaning liquid in the cleaning tank by ultrasonic waves. Under the radiation of ultrasonic waves, the microbubbles in the liquid in the nozzle slot keep vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to peel off or loosen. At this time, the crystallized pollutants on the spectrometer line nozzle are in a loose state, that is, an easy-to-peel state. Under the action of high-pressure water flow, the crystallized pollutants on the spectrometer line nozzle can be cleaned more quickly and washed down with the water flow, effectively improving the cleaning efficiency of the spectrometer line nozzle. In this way, the circulating water pipe is opened to connect the cleaning cylinder with the water reservoir, and the cleaning liquid is circulated under the high-pressure water supply of the high-pressure pump washing component, which not only provides water pressure for the high-pressure cleaning of the spectrometer line nozzle, but also can reuse the cleaning liquid.

[0041] Furthermore, the high-pressure pump water washing treatment of the spectrometer line nozzle includes: opening the high-pressure pump water washing component to use the cleaning liquid in the water reservoir to high-pressure wash the spectrometer line nozzle. In this embodiment, the spectrometer line nozzle is first subjected to ultrasonic water washing treatment before the high-pressure pump water washing treatment. The spectrometer line nozzle is a nozzle on the detection line of the spectrometer, which is used to detect the board formation of the circuit board, that is, to detect the surface integrity of the circuit board during the manufacturing process. Since the spectrometer line nozzle is often aligned with the circuit board, crystalline contaminants are attached to the spectrometer line nozzle. The spectrometer line nozzle is placed in the nozzle slot to remove the crystalline contaminants from the spectrometer line nozzle. Among them, the nozzle slot is a hollow structure at the bottom, and the spectrometer line nozzle is clamped in the nozzle slot. Specifically, part of the spectrometer line nozzle is accommodated in the nozzle slot, which is convenient for cleaning the spectrometer line nozzle with the help of the cleaning liquid in the cleaning tank, so as to facilitate the all-round cleaning of the spectrometer line nozzle, so that the cleanliness and cleaning efficiency of the spectrometer line nozzle are improved. After the spectrometer line nozzle is placed in the nozzle slot, the spectrometer line nozzle is immersed in the cleaning tank, and is radiated into the cleaning liquid in the cleaning tank by ultrasonic waves. Under the radiation of ultrasonic waves, the microbubbles in the liquid in the nozzle slot keep vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the spectrometer line nozzle, causing fatigue damage to the contamination layer, and finally causing the pollutants to peel off or loosen. At this time, the crystallized pollutants on the spectrometer line nozzle are in a loose state, that is, an easy-to-peel state. Under the action of high-pressure water flow, the crystallized pollutants on the spectrometer line nozzle can be cleaned more quickly and washed down with the water flow, effectively improving the cleaning efficiency of the spectrometer line nozzle. Open the circulating water pipe so that the cleaning cylinder is connected to the water reservoir. Under the high-pressure water supply of the high-pressure pump water washing unit, the cleaning liquid is circulated, which not only provides water pressure for the high-pressure cleaning of the spectrometer line nozzle, but also can reuse the cleaning liquid. In this way, the high-pressure pump water washing unit provides kinetic energy for the flow of the cleaning liquid and pressurizes the cleaning liquid, so that the cleaning liquid used to clean the spectrometer line nozzle is a high-pressure liquid, thereby making the spectrometer line nozzle undergo high-pressure cleaning. Under the flushing of the high-pressure liquid, the crystalline contaminants on the spectrometer line nozzle that are in an easily peelable state are quickly removed, further improving the cleaning efficiency of the spectrometer line nozzle. In another embodiment, the opening time of the high-pressure pump water washing unit is 4 to 7 minutes, specifically, the opening time of the high-pressure pump water washing unit is 5 minutes.

[0042] It is understandable that the spectrometer line nozzle is placed in the nozzle slot, and the nozzle slot is located on the cleaning bracket. The nozzle slot of the cleaning bracket matches the spectrometer nozzle, and the cleaning bracket also has a telescopic function to adjust the opening size of the nozzle slot, so as to facilitate the complete accommodation of the spectrometer nozzle, thereby facilitating the subsequent cleaning of the spectrometer nozzle. However, when the spectrometer nozzle is placed on the cleaning bracket, the ultrasonic water washing part and the high-pressure pump water washing part clean the spectrometer nozzle, but the spectrometer nozzle is still prone to shaking. This is limited by the structural characteristics of the spectrometer nozzle, that is, its own weight is small and cannot be stable. Although there are corresponding positioning columns on the cleaning bracket, the position of the positioning columns changes as the cleaning bracket is extended and retracted, and the spectrometer nozzle cannot be accurately aligned, which is more likely to cause the spectrometer nozzle to loosen.

[0043] In order to facilitate the quick and fixed placement of the energy spectrometer nozzle, the energy spectrometer line nozzle is subjected to ultrasonic water washing treatment, which also includes the following steps:

[0044] Obtaining the positioning distance of the cleaning bracket;

[0045] Detecting whether the positioning distance matches a preset distance;

[0046] When the positioning distance does not match the preset distance, an increase signal is sent to the cleaning control device to continue to increase the area of ​​the nozzle slot of the cleaning bracket.

[0047] In this embodiment, the positioning distance is the distance between two adjacent positioning posts on the cleaning bracket, that is, the positioning distance is the position of the positioning posts on the cleaning bracket for positioning and installing the spectrometer nozzle, that is, the positioning distance corresponds to the spacing between the positioning posts on the cleaning bracket. The positioning posts on the cleaning bracket correspond to the positioning holes on the spectrometer nozzle and are used to fix the spectrometer nozzle on the cleaning bracket. The preset distance is a standard positioning distance. Specifically, the preset distance is the hole spacing between two adjacent positioning holes of the spectrometer nozzle. The preset distance is used to determine the relative position between two adjacent positioning posts on the cleaning bracket. The positioning distance does not match the preset distance, indicating that the spacing between the positioning posts on the cleaning bracket is not equal to the hole spacing between the positioning holes on the spectrometer nozzle, that is, indicating that the cleaning bracket has not been extended to the specified position, that is, the positioning posts on the cleaning bracket have not moved to the position corresponding to the positioning holes. Among them, the movement mode of the positioning column of the cleaning bracket is the extension mode, that is, before the spectrometer nozzle is placed on the cleaning bracket, the positioning column is in the initial position, and when the spectrometer nozzle needs to be placed, the positioning column is gradually extended to the position corresponding to the positioning hole, and after the spectrometer nozzle is cleaned, that is, after the spectrometer nozzle is removed, the cleaning bracket is reset and the positioning column retracts to the initial position to facilitate the subsequent cleaning of the spectrometer nozzle. In this way, when the positioning column has not moved to the position corresponding to the positioning hole, the cleaning bracket continues to work by sending an amplitude increase signal to the cleaning control device, so that the positioning column continues to extend, which not only continues to increase the area of ​​the nozzle slot of the cleaning bracket, but also can move the positioning column to correspond to the positioning hole on the spectrometer nozzle, thereby improving the alignment and installation efficiency of the spectrometer nozzle and the cleaning bracket. In another embodiment, the opening change of the nozzle slot of the cleaning bracket is achieved by a transverse regulator and a longitudinal regulator, that is, the spectrometer line nozzle cleaning device also includes a transverse regulator and a longitudinal regulator connected to the cleaning bracket, the transverse regulator is used to adjust the width of the nozzle slot, and the longitudinal regulator is used to adjust the length of the nozzle slot.

[0048] Furthermore, the detecting whether the positioning distance matches the preset distance further includes the following steps:

[0049] When the positioning distance matches the preset distance, the positioning distance is calibrated to obtain the sine angle of the positioning column;

[0050] Detecting whether the sine angle of the positioning column is equal to a preset sine angle;

[0051] When the sine angle of the positioning column is not equal to the preset sine angle, a cleaning alarm signal is sent to the cleaning control device.

[0052] In this embodiment, the positioning distance matches the preset distance, indicating that the spacing between the positioning posts on the cleaning bracket is equal to the spacing between the positioning holes on the spectrometer nozzle, which means that the cleaning bracket is extended to the specified position, that is, the positioning posts on the cleaning bracket are moved to the position corresponding to the positioning holes. However, there may be an elongation offset in the position of the positioning posts on the cleaning bracket, that is, the straight line where two adjacent positioning posts are located is no longer parallel to the inner wall of the cleaning cylinder. At this time, the sine angle of the positioning distance is collected, based on the distance between the positioning distance and the inner wall of the cleaning cylinder, specifically, the distance between the two positioning posts parallel to the inner wall of the cleaning cylinder, and the difference in spacing between the two positioning posts and the inner wall of the cleaning cylinder, the offset angle of the positioning post, that is, the sine angle of the positioning post, is determined based on the above two values. The preset sine angle is the standard sine angle of the positioning column. The sine angle of the positioning column is not equal to the preset sine angle, indicating that the positioning column on the cleaning bracket is elongated and offset, which means that the placement of the spectrometer nozzle on the cleaning bracket is tilted at an angle, that is, there is a risk that part of the spectrometer nozzle will exceed the cleaning bracket. At this time, a cleaning alarm signal is sent to the cleaning control device so that the operator can reset and maintain the relative position between the inner wall of the cleaning cylinder and the cleaning bracket in time to avoid the board falling due to the offset of the cleaning bracket during long-term use. In another embodiment, the offset of the spectrometer nozzle on the cleaning bracket is caused by the tilt of the positioning column.

[0053] Furthermore, when the sine angle of the positioning column is not equal to the preset sine angle, sending a cleaning alarm signal to the cleaning control device specifically includes the following steps:

[0054] When the sine angle of the positioning column is not equal to the preset sine angle, the cleaning position deviation is obtained according to the sine angle of the positioning column and the side length of the spectrometer nozzle;

[0055] Detecting whether the cleaning position deviation is greater than a preset position deviation;

[0056] When the cleaning position deviation is greater than the preset position deviation, a cleaning stop signal is sent to the cleaning control device to stop the horizontal line production of the spectrometer nozzle.

[0057] In this embodiment, the sine angle of the positioning column is not equal to the preset sine angle. At this time, the spectrometer nozzle may be offset and fall off the board, that is, the spectrometer nozzle is offset too much from the nozzle slot. However, since the nozzle slot of the cleaning bracket still has a considerable area, the spectrometer nozzle may fall into the cleaning tank after high-pressure flushing during the cleaning process only after severe offset. In order not to affect production, it is necessary to deal with the excessive offset in a timely manner. The sine angle of the positioning column is the offset angle of the spectrometer nozzle on the cleaning bracket relative to the inner wall of the cleaning tank. The side length of the spectrometer nozzle is the horizontal or vertical width of the spectrometer nozzle. When the sine angle of the positioning column and the side length of the spectrometer nozzle are determined, the maximum distance of the side of the spectrometer nozzle away from the inner wall of the cleaning tank can be obtained, that is, the cleaning position deviation. The cleaning position deviation is greater than the preset position deviation, indicating that the side deviation distance of the spectrometer nozzle exceeds the standard deviation distance, which means that the deviation of the spectrometer nozzle is more serious, that is, the deviation of the spectrometer nozzle will cause the board to fall off. In this way, a cleaning stop signal is sent to the cleaning control device to stop the horizontal line production of the spectrometer nozzle, so that the cleaning operation of the spectrometer nozzle is stopped to avoid scrapping the spectrometer nozzle.

[0058] In one of the embodiments, in one of the embodiments, the present application also provides a spectrometer line nozzle cleaning device, which is implemented by the cleaning method for the spectrometer line nozzle described in any of the above embodiments. In one of the embodiments, the spectrometer line nozzle cleaning device has a functional module corresponding to each step of the cleaning method for the spectrometer line nozzle. The spectrometer line nozzle cleaning device includes a cleaning tank, a cleaning bracket and a cleaning component; the cleaning tank is used to contain the cleaning liquid; the cleaning bracket is arranged in the cleaning tank, and the cleaning bracket is provided with a nozzle slot, and the nozzle slot is used to clamp and install the spectrometer line nozzle; the cleaning component includes an ultrasonic water washing part and a high-pressure pump water washing part, the ultrasonic water washing part is arranged in the cleaning tank, the ultrasonic water washing part is used to ultrasonically wash the spectrometer line nozzle, the high-pressure pump water washing part is connected to the cleaning tank, and the high-pressure pump water washing part is used to high-pressure pump water wash the spectrometer line nozzle. In this embodiment, the energy spectrometer line nozzle located in the nozzle slot is first subjected to ultrasonic water washing treatment. Through the radiation of ultrasonic waves, the microbubbles in the cleaning liquid in the slot are kept vibrating under the action of sound waves, thereby destroying the crystallized pollutants in the energy spectrometer line nozzle, causing fatigue damage to the pollution layer, and finally causing the pollutants to loosen. After that, the loosened pollutants are washed off the energy spectrometer line nozzle by high-pressure flushing, so that the pollutants on the energy spectrometer line nozzle are quickly removed, effectively improving the cleaning efficiency of the energy spectrometer line nozzle. Among them, the ultrasonic water washing part includes an ultrasonic transmitter for generating ultrasonic waves, and the high-pressure pump water washing part includes a high-pressure pump and a high-pressure pipe. The high-pressure pump is connected to the water reservoir to pressurize the cleaning liquid in the water reservoir. The high-pressure pipe is respectively connected to the water reservoir and the cleaning tank to guide the pressurized cleaning liquid to the energy spectrometer line nozzle. In another embodiment, the high-pressure pipe includes a high-pressure water pipe, a high-pressure water inlet hose and a nozzle high-pressure water washing pipe which are interconnected in sequence, the high-pressure water pipe is connected to the water reservoir, and the nozzle high-pressure water washing pipe is connected to the nozzle slot to introduce high-pressure cleaning fluid into the nozzle slot.

[0059] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A method for cleaning a spectrometer line nozzle, characterized in that: The cleaning is performed by using a spectrometer line nozzle cleaning device, the spectrometer line nozzle cleaning device comprising: A cleaning tank, the cleaning tank being used to contain cleaning liquid; A cleaning bracket, the cleaning bracket is arranged in the cleaning tank, the cleaning bracket is provided with a nozzle clamping slot, and the nozzle clamping slot is used for clamping and installing the spectrometer line nozzle; A cleaning component, the cleaning component includes an ultrasonic water washing component and a high-pressure pump water washing component, the ultrasonic water washing component is arranged in the cleaning tank, the ultrasonic water washing component is used to perform ultrasonic water washing on the energy spectrometer line nozzle, the high-pressure pump water washing component is connected to the cleaning tank, and the high-pressure pump water washing component is used to perform high-pressure pump water washing on the energy spectrometer line nozzle; The cleaning method for the spectrometer line nozzle comprises: Place the spectrometer line nozzle into the nozzle slot of the cleaning tank; Performing ultrasonic water washing treatment on the spectrometer line nozzle; Performing a high-pressure pump water washing treatment on the spectrometer line nozzle; Wherein, the ultrasonic water washing treatment is performed on the spectrometer line nozzle, and the following steps are also included before that: Obtaining the positioning distance of the cleaning bracket, the positioning distance is the distance between two adjacent positioning posts on the cleaning bracket, that is, the positioning distance is the position of the positioning posts on the cleaning bracket for positioning and installing the spectrometer nozzle, that is, the positioning distance corresponds to the spacing between the positioning posts on the cleaning bracket, and the positioning posts on the cleaning bracket correspond to the positioning holes on the spectrometer nozzle, which are used to fix the spectrometer nozzle on the cleaning bracket; Detecting whether the positioning distance matches a preset distance, wherein the preset distance is a standard positioning distance, specifically, the preset distance is a hole distance between two adjacent positioning holes of the spectrometer nozzle; When the positioning distance does not match the preset distance, an increase signal is sent to the cleaning control device to continue to increase the area of ​​the nozzle slot of the cleaning bracket; Detecting whether the positioning distance matches the preset distance, and then further comprising the following steps: When the positioning distance matches the preset distance, based on the distance between the positioning distance and the inner wall of the cleaning cylinder, specifically, the distance between two positioning posts parallel to the inner wall of the cleaning cylinder, and the difference in spacing between the two positioning posts and the inner wall of the cleaning cylinder, the offset angle of the positioning post is determined according to the above two values ​​to obtain the sine angle of the positioning post; Detecting whether the sine angle of the positioning column is equal to a preset sine angle, wherein the preset sine angle is a standard sine angle of the positioning column; When the sine angle of the positioning column is not equal to the preset sine angle, a cleaning alarm signal is sent to the cleaning control device.

2. The cleaning method for a spectrometer line nozzle according to claim 1, characterized in that: Placing the spectrometer line nozzle in the nozzle slot of the cleaning tank comprises: Arrange a plurality of the spectrometer line nozzles in sequence on the nozzle slot.

3. The cleaning method for a spectrometer line nozzle according to claim 1, characterized in that: The spectrometer line nozzle is subjected to ultrasonic water washing treatment, comprising: A preset volume of cleaning liquid is injected into the cleaning tank.

4. The cleaning method for a spectrometer line nozzle according to claim 3, characterized in that: The liquid level of the preset volume of cleaning fluid is flush with the spectrometer line nozzle.

5. The cleaning method for a spectrometer line nozzle according to claim 3, characterized in that: A preset volume of cleaning liquid is injected into the cleaning tank, and then the steps include: The ultrasonic water washing unit is turned on to perform ultrasonic water washing.

6. The cleaning method for a spectrometer line nozzle according to claim 5, characterized in that: The ultrasonic washing time is 18 minutes to 22 minutes.

7. The cleaning method for a spectrometer line nozzle according to claim 3, characterized in that: The spectrometer line nozzle is subjected to a high pressure pump water washing treatment, which also includes: The circulating water pipe is opened to return the cleaning liquid in the cleaning tank to the water reservoir.

8. The method for cleaning a spectrometer line nozzle according to claim 7, characterized in that: The spectrometer line nozzle is subjected to a high-pressure pump water washing process, comprising: The high-pressure pump water washing component is turned on to use the cleaning liquid in the water reservoir to wash the spectrometer line nozzle with high pressure.

9. The method for cleaning a spectrometer line nozzle according to claim 8, characterized in that: The opening time of the high-pressure pump water washing part is 4 minutes to 7 minutes.

10. The method for cleaning a spectrometer line nozzle according to claim 9, characterized in that: The opening time of the high-pressure pump water washing part is 5 minutes.

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