HMDS processing mechanism and processing technology

By designing the linear contact support mechanism of the HMDS processing mechanism, and using the finger hooks of the inclined surface or arc-shaped surface to lift the mask, the problem of easy damage or contamination of the mask in the prior art is solved, and higher support stability and safety are achieved.

CN115772653BActive Publication Date: 2025-03-28CHANGZHOU RUIZE MICROELECTRONICS
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Patent Information

Application Number
CN202211484143.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-11-24
Publication Date
2025-03-28
Estimated Expiration
2042-11-24

AI Technical Summary

Technical Problem

The existing mask lifting mechanism has a large contact area with the mask during the lifting process, which can easily lead to damage or contamination of the mask.

Method used

An HMDS treatment mechanism is designed to carry out linear contact support using at least three inclined surfaces or arcuate surfaces of finger hooks to reduce contact area and improve the strength of finger hooks through the design of the support.

Benefits of technology

Effectively prevent damage or contamination of the mask during the lifting process, adapt to masks of various sizes, and maintain support stability within a certain error range.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention relates to an HMDS processing mechanism and a processing process, wherein the HMDS processing mechanism comprises a vacuum chamber and a lifting mechanism, wherein the vacuum chamber has an open side, and the open side is provided with a vacuum gate for closing or opening the vacuum chamber; the lifting mechanism has at least three finger hooks for jointly lifting a mask plate sent into the vacuum chamber, and the finger hooks have an inclined surface and / or an arc surface for linearly contacting the mask plate to support the mask plate. The HMDS processing mechanism of the present invention can transfer the mask plate in a linear contact manner to avoid damage or contamination of the mask plate.
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Description

Technical Field

[0001] The invention relates to the field of mask plate production, and in particular to a HMDS processing mechanism and a processing process. Background Art

[0002] The HMDS coating is applied on the surface of the mask plate in a vacuum chamber. The mask plate is sent into the vacuum chamber from the opening side of the vacuum chamber by a robot or other conveying mechanism. After the lifting mechanism rises to lift the mask plate, the robot or other conveying mechanism leaves the vacuum chamber from the opening side. Then the lifting mechanism descends again to make the mask plate fall to the bottom of the vacuum chamber. In the process of lifting the mask plate, the existing lifting mechanism has a relatively large contact area with the mask plate, which may cause damage or contamination of the mask plate. Summary of the invention

[0003] The technical problem to be solved by the present invention is to overcome the defects of the prior art and provide a HMDS processing mechanism which can transfer the mask in a line contact manner to avoid the mask being damaged or contaminated.

[0004] In order to solve the above technical problems, the technical solution of the present invention is: an HMDS processing mechanism, comprising:

[0005] A vacuum chamber having an open side, wherein the open side is provided with a vacuum gate for closing or opening the vacuum chamber;

[0006] The lifting mechanism has at least three finger hooks for jointly lifting the mask plate sent into the vacuum chamber, and the finger hooks have an inclined surface and / or a curved surface for linearly contacting with the mask plate to support the mask plate.

[0007] In order to further improve the support strength of the finger hook, the finger hook has a supporting portion, the inclined surface and / or the arc surface is configured on the supporting portion, and the supporting portion has a protruding portion that extends downward beyond the mask plate supported by it.

[0008] A specific structure of a lifting mechanism that can ensure the sealing of the vacuum chamber when the lifting drive mechanism is external is further provided, and the lifting mechanism also includes:

[0009] A finger hook connection seat, wherein the bottom plate of the vacuum chamber is provided with a through hole, the finger hook connection seat passes through the through hole, the upper end portion is located in the vacuum chamber, and the lower end portion is located outside the vacuum chamber, and the finger hook is installed at the upper end portion of the finger hook connection seat;

[0010] A lifting drive mechanism, the lifting drive mechanism is connected to the lower end of the finger hook connection seat through a sealing tube connection seat, and is used to drive the finger hook connection seat to rise and fall;

[0011] A sealing tube is sleeved on the finger hook connection seat and covers the outside of the through hole, the upper end of which is sealed and connected to the bottom plate, and the lower end of which is sealed and connected to the sealing tube connection seat. The sealing tube is configured to provide the finger hook connection seat with a degree of freedom of lifting and lowering.

[0012] To further facilitate heating of the mask, the HMDS processing mechanism further includes a hot plate, which is located in the vacuum chamber and is used to heat the mask.

[0013] In order to further isolate the heat, the middle area of ​​the heat plate is used to heat the mask, and liquid cooling channels are arranged around the heat plate.

[0014] After the vacuum gate closes the opening side, the sealing of the vacuum chamber is ensured, and a sealing ring is arranged between the vacuum chamber and the vacuum gate.

[0015] The present invention also provides a processing process of an HMDS processing mechanism, comprising:

[0016] S1, when the vacuum gate is open, the robot or other conveying mechanism delivers the mask into the vacuum chamber from the opening side;

[0017] S2, the lifting mechanism rises, and at least three finger hooks contact the edge line of the mask plate through the inclined surface or the arc surface to jointly lift the mask plate;

[0018] S3, a robot or other conveying mechanism exits the vacuum chamber from the opening side;

[0019] S4, the lifting mechanism descends, and the mask plate reaches the bottom of the vacuum chamber.

[0020] Furthermore, in the process of filling the vacuum chamber with HMDS, the HMDS is brought into the vacuum chamber by nitrogen bubbling.

[0021] After adopting the above technical solution, the present invention has the following beneficial effects:

[0022] 1. When the vacuum gate is open, the manipulator or other conveying mechanism for placing the mask plate enters the vacuum chamber from the opening side of the vacuum chamber, and the lifting mechanism of the present invention rises, and the mask plate is lifted by the inclined surfaces or curved surfaces of at least three finger hooks, and the manipulator or other conveying mechanism then goes out from the opening side, and the inclined surface or curved surface is in line contact with the mask plate, and the contact area is very small, and it is in line contact with the edge of the mask plate, and will not touch the upper and lower surfaces of the mask plate. The finger hook itself is also relatively thin, and only contacts a small part of the edge of the mask plate, thereby preventing the mask plate from being damaged or contaminated during the process of transferring the mask plate from the manipulator or other conveying mechanism to the vacuum chamber;

[0023] 2. The inclined surface and / or curved surface of the finger hook can adapt to masks of various sizes within a certain range, and allow the mask to have a certain position error after entering the vacuum chamber with the robot or other conveying mechanism;

[0024] 3. The lifting portion of the finger hook of the present invention has a protruding portion that protrudes downward from the mask plate it lifts, so that the finger hook has a strong strength when it is thin, and effectively prevents the lifting portion of the finger hook from breaking or deforming during use;

[0025] 4. The present invention seals the through hole on the bottom plate by a sealing tube, and the sealing tube also provides the lifting mechanism with the freedom of lifting and lowering, effectively preventing the lifting mechanism from passing through the bottom plate of the vacuum chamber and affecting the sealing of the vacuum chamber;

[0026] 5. The hot plate of the present invention is provided with liquid cooling channels around it, which isolate the heat by circulating the coolant and prevent the heat from being transferred to other areas, thereby preventing the surface of other places from having HMDS coating due to temperature rise, thereby avoiding the particle problem after a long time. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a structural schematic diagram of the HMDS processing mechanism of the present invention;

[0028] Figure 2 for Figure 1 A cross-sectional view of

[0029] Figure 3 It is a schematic diagram of the internal structure of the vacuum chamber of the HMDS processing mechanism of the present invention;

[0030] Figure 4 A schematic diagram showing the internal structure of the vacuum chamber of the HMDS processing mechanism of the present invention from another perspective;

[0031] Figure 5 It is a schematic diagram of the structure of the finger hook of the present invention;

[0032] Figure 6 It is a pipeline diagram of the HMDS processing mechanism of the present invention. DETAILED DESCRIPTION

[0033] In order to make the contents of the present invention more clearly understood, the present invention is further described in detail below based on specific embodiments in conjunction with the accompanying drawings.

[0034] Embodiment 1

[0035] like Figure 1 , 2 , 3, 4, 5, and 6, a HMDS processing mechanism includes:

[0036] A vacuum chamber 1 having an open side, wherein the open side is provided with a vacuum gate 2 for closing or opening the vacuum chamber 1;

[0037] The lifting mechanism has at least three finger hooks 3 for jointly lifting the mask plate 4 sent into the vacuum chamber 1 , and the finger hooks 3 have an inclined surface and / or a curved surface for linearly contacting with the mask plate 4 to support the mask plate 4 .

[0038] Specifically, when the vacuum gate 2 is opened, the manipulator or other conveying mechanism for placing the mask plate 4 enters the vacuum chamber 1 from the opening side of the vacuum chamber 1, and the lifting mechanism of the present embodiment rises, and the mask plate 4 is lifted up by the inclined surfaces or curved surfaces of at least three finger hooks 3, and the manipulator or other conveying mechanism then goes out from the opening side, and the inclined surfaces and / or curved surfaces are in line contact with the mask plate 4, and the contact area is very small, and is in line contact with the edges of the mask plate 4, and will not touch the upper and lower surfaces of the mask plate 4, and the finger hooks 3 themselves are also relatively thin, and only contact with a small part of the edges of the mask plate 4, thereby preventing the mask plate from being damaged or contaminated during the process of transferring the mask plate 4 from the manipulator or other conveying mechanism to the vacuum chamber 1; the inclined surfaces and / or curved surfaces of the finger hooks 3 can adapt to mask plates 4 of various sizes within a certain range, and allow the mask plate 4 to have a certain positional error after entering the vacuum chamber 1 with the manipulator or other conveying mechanism.

[0039] like Figure 5 As shown, the finger hook 3 has a supporting portion, the inclined surface and / or the arc surface are arranged on the supporting portion, and the supporting portion has a protruding portion 31 that protrudes downwardly from the supported mask plate 4. With such a configuration, the finger hook 3 has a strong strength even when it is thin, and effectively prevents the supporting portion of the finger hook 3 from breaking or deforming during use.

[0040] like Figure 1 , 2 As shown in , 3 and 4, the lifting mechanism further includes:

[0041] The finger hook connection seat 5, the bottom plate 11 of the vacuum chamber 1 is provided with a through hole, the finger hook connection seat 5 passes through the through hole, the upper end portion is located inside the vacuum chamber 1, and the lower end portion is located outside the vacuum chamber 1, and the finger hook 3 is installed at the upper end portion of the finger hook connection seat 5;

[0042] A lifting drive mechanism 6, wherein the lifting drive mechanism 6 is connected to the lower end of the finger hook connection seat 5 through a sealing tube connection seat 8, and is used to drive the finger hook connection seat 5 to rise and fall;

[0043] The sealing tube 7 is sleeved on the finger hook connection seat 5 and covers the outside of the through hole, the upper end of which is sealed and connected to the bottom plate 11, and the lower end of which is sealed and connected to the sealing tube connection seat 8. The sealing tube 7 is configured to provide the finger hook connection seat 5 with freedom of lifting and lowering.

[0044] Specifically, in this embodiment, the through hole on the bottom plate 11 is sealed by the sealing tube 7 , and the sealing tube 7 also provides the lifting mechanism with the freedom of lifting and lowering, thereby effectively preventing the lifting mechanism from passing through the bottom plate 11 of the vacuum chamber 1 and affecting the sealing of the vacuum chamber 1 .

[0045] In this embodiment, the sealing tube 7 may be a corrugated tube, a telescopic tube, or other flexible tubes.

[0046] In this embodiment, the lifting mechanism may also be entirely located within the vacuum chamber 1 .

[0047] In this embodiment, the lifting drive mechanism 6 can be an electric cylinder, a hydraulic cylinder, etc.

[0048] like Figure 2 , 3 As shown in FIG. 4 , the HMDS processing mechanism further includes a hot plate 9 , which is located in the vacuum chamber 1 and is used to heat the mask 4 .

[0049] like Figure 2 , 6 As shown, the middle area of ​​the heat plate 9 is used to heat the mask plate 4 , and liquid cooling channels 91 are arranged around the heat plate 9 .

[0050] Specifically, the heat plate 9 of this embodiment is surrounded by liquid cooling channels 91, which isolate the heat by circulating coolant to prevent the heat from being transferred to other areas, thereby preventing the surface of other places from being coated with HMDS due to temperature rise, thereby avoiding particle problems after a long time.

[0051] like Figure 2 As shown, a sealing ring is arranged between the vacuum chamber 1 and the vacuum gate 2. With such arrangement, after the vacuum gate 2 closes the opening side, the sealing of the vacuum chamber 1 can be better ensured.

[0052] Embodiment 2

[0053] A processing process of the HMDS processing mechanism as described in the first embodiment includes:

[0054] S1, when the vacuum gate 2 is open, the robot or other conveying mechanism delivers the mask 4 into the vacuum chamber 1 from the opening side;

[0055] S2, the lifting mechanism rises, and at least three finger hooks 3 contact the edge line of the mask plate 4 through the inclined surface or the arc surface to jointly lift the mask plate;

[0056] S3, a robot or other conveying mechanism exits the vacuum chamber 1 from the opening side;

[0057] S4, the lifting mechanism descends, and the mask plate 4 reaches the bottom of the vacuum chamber.

[0058] In this embodiment, the vacuum chamber 1 without the mask plate is filled with N2; after the mask plate 4 is placed in the vacuum chamber 1, N2 is turned off, vacuum is drawn, and HMDS is brought into the vacuum chamber 1 by nitrogen bubbling; after the hot plate 9 is heated to the use temperature and the HMDS treatment is completed, vacuum is drawn and N2 is filled again. During the heating process of the hot plate 9, circulating coolant is passed into the liquid cooling channel 91.

[0059] The traditional method is to spray HMDS solution onto the mask plate 4, which wastes the solution. The present embodiment adopts a gas phase method to greatly save the amount of HMDS.

[0060] Figure 6 This is a pipeline diagram of the HMDS processing mechanism. The vacuum chamber 1 is provided with multiple vacuum ports and multiple gas-liquid inlets. The vacuum pipe is connected to the multiple vacuum ports. The HMDS supply pipe and the nitrogen filling pipe are connected in parallel to form a pipe group, one end of which is connected to the multiple gas-liquid inlets, and the other end is connected to the N2 main line. The vacuum pipe, HMDS supply pipe, nitrogen filling pipe and N2 main line are respectively provided with solenoid valves.

[0061] Based on the above ideal embodiments of the present invention, the relevant staff can make various changes and modifications without departing from the technical concept of the present invention through the above description. The technical scope of the present invention is not limited to the contents of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A HMDS processing mechanism, characterized in that: include: A vacuum chamber (1), the vacuum chamber (1) having an open side, the open side being provided with a vacuum gate (2) for closing or opening the same; A lifting mechanism, the lifting mechanism comprising at least three finger hooks (3) for jointly lifting a mask plate (4) sent into the vacuum chamber (1), the finger hooks (3) comprising an inclined surface and / or an arcuate surface for linearly contacting the mask plate (4) to support the mask plate (4); the finger hooks (3) comprising a lifting portion, the inclined surface and / or the arcuate surface being arranged on the lifting portion, the lifting portion comprising a protruding portion (31) extending downwardly beyond the mask plate (4) lifted by the finger hooks (3); A hot plate (9), the hot plate (9) is located in the vacuum chamber (1), the middle area of ​​the hot plate (9) is used to heat the mask (4), and liquid cooling channels (91) are arranged around the hot plate (9); wherein, The lifting mechanism rises, and at least three finger hooks (3) contact the edge lines of the mask plate (4) through the inclined surface or the arc surface to jointly lift the mask plate; the lifting mechanism descends, and the mask plate (4) reaches the hot plate at the bottom of the vacuum chamber (1); The vacuum chamber (1) is provided with a plurality of vacuum ports and a plurality of gas-liquid inlets, the vacuum pipe being connected to the plurality of vacuum ports, a tube group formed by a HMDS supply pipe and a nitrogen filling pipe being connected in parallel, one end of which is connected to the plurality of gas-liquid inlets, and the other end of which is connected to a N2 main pipe, and the vacuum pipe, the HMDS supply pipe, the nitrogen filling pipe and the N2 main pipe are respectively provided with solenoid valves.

2. The HMDS processing mechanism according to claim 1, characterized in that: The lifting mechanism further comprises: A finger hook connection seat (5), wherein the bottom plate (11) of the vacuum chamber (1) is provided with a through hole, the finger hook connection seat (5) passes through the through hole, the upper end portion is located inside the vacuum chamber (1), and the lower end portion is located outside the vacuum chamber (1), and the finger hook (3) is mounted on the upper end portion of the finger hook connection seat (5); A lifting drive mechanism (6), the lifting drive mechanism (6) being connected to the lower end of the finger hook connection seat (5) via a sealing tube connection seat (8) and being used for driving the finger hook connection seat (5) to lift and lower; A sealing tube (7), wherein the sealing tube (7) is sleeved on the finger hook connection seat (5) and covers the outside of the through hole, wherein the upper end is sealedly connected to the bottom plate (11), and the lower end is sealedly connected to the sealing tube connection seat (8), and the sealing tube (7) is configured to provide the finger hook connection seat (5) with a degree of freedom of lifting and lowering.

3. The HMDS processing mechanism according to claim 1, characterized in that: A sealing ring is arranged between the vacuum chamber (1) and the vacuum gate (2).

4. A processing process of the HMDS processing mechanism according to any one of claims 1 to 3, characterized in that: include: S1, when the vacuum gate (2) is open, a robot or other conveying mechanism conveys the mask (4) into the vacuum chamber (1) from the opening side; S2, the lifting mechanism rises, and at least three finger hooks (3) contact the edge lines of the mask plate (4) through the inclined surface or the arc surface to jointly lift the mask plate; S3, a robot or other conveying mechanism exits the vacuum chamber (1) from the opening side; S4, the lifting mechanism descends, and the mask plate (4) reaches the bottom of the vacuum chamber (1).

5. The processing process of the HMDS processing mechanism according to claim 4, characterized in that: In the process of filling the vacuum chamber (1) with HMDS, the HMDS is brought into the vacuum chamber (1) by nitrogen bubbling.

Citation Information

Patent Citations

  • Proximity exposure device and exposure method thereof

    CN106773557A