A vacuum evaporation source structure for liquid

Abstract

The present invention relates to a vacuum evaporation source structure, and in particular to a vacuum evaporation source structure for liquid. The present invention discloses a vacuum evaporation source structure for liquid. For liquid monomers with low saturated vapor pressure (less than 10Pa), the viscosity is 1-30CPS (25°C). The evaporation source design has the following characteristics: 1. It can be continuously supplied, with a liquid pipe and a continuous liquid flow meter design; 2. The flow control is accurate, and the pressure before and after the liquid flow meter is stable; 3. Constant evaporation will not be disturbed by bubbles, etc., and the front end of the atomizer has a defoaming mechanism.

Description

Technical Field

[0001] The invention relates to a vacuum evaporation source structure, in particular to a vacuum evaporation source structure for liquid. Background Art

[0002] The lamination (organic layer / inorganic layer multilayer) process is a typical process for preparing ultra-high barrier films. The monomer material for preparing the organic layer is liquid, and the surface of the monomer film has atomic-level smoothness, which can provide an ideal surface for the deposition of inorganic films. Moreover, after exposure to ultraviolet light, the liquid polymerizes to form a solid film, and the whole process does not destroy the smoothness of its surface. Because this film is liquid, it can fill the defects on the surface, making the surface smooth and flat, and then UV-curing it into a film. In this way, the organic film and the inorganic film are deposited repeatedly, and the product obtained by depositing several pairs (a pair is an organic layer plus an inorganic layer) can achieve ultra-high barrier performance.

[0003] In the prior art, coating technology is generally used to make organic film layers. This technology cannot form a smooth surface at the atomic level. This problem can be solved by depositing a liquid monomer film (acrylate) on the substrate through flash evaporation technology. However, there is no structure of an evaporation source that can be applied to the flash evaporation technology in the prior art. Summary of the invention

[0004] The technical problem solved by the present invention is: to overcome the shortcomings of the prior art and propose a vacuum evaporation source structure for liquids, which can meet the deposition of organic film layers with a laminated structure. The key to preparing organic film layers with liquid monomers is the evaporation source, which can meet the needs of continuous coating in a vacuum environment and meet the needs of ultra-high barrier films.

[0005] The technical solution of the present invention is:

[0006] A vacuum evaporation source structure for liquid, the vacuum evaporation source structure comprising a ventilation and pressure regulating single tank A, a liquid flow meter, an atomizer, a ventilation and pressure regulating single tank B, a heater and a vacuum chamber;

[0007] The ventilation and pressure regulating monomer tank A is used to regulate the pressure of the liquid monomer;

[0008] The ventilation and pressure regulating single tank B is used to adjust the pressure of the atomized gas in the atomizer;

[0009] After the liquid monomer whose pressure is adjusted by the ventilation pressure regulating monomer tank A is controlled by the liquid flow meter, the liquid monomer enters the atomizer to be atomized to form droplets. The atomized droplets are heated and vaporized by the heater and then enter the vacuum chamber. The gas entering the vacuum chamber is used as the liquid source for depositing the liquid monomer film (acrylate) by the flash evaporation technology.

[0010] The liquid monomer is an acrylate, preferably tripropylene glycol diacrylate (TPGDA), neopentyl glycol diacrylate (NPGDA) or diethylene glycol diacrylate (DEGDA);

[0011] The pressure of the liquid monomer is adjusted by introducing nitrogen into the ventilated pressure regulating monomer tank A, so that the pressure range of the liquid monomer is 0.1MPa-0.3MPa; the pressure is adjusted according to the viscosity of the liquid monomer, generally 10CPS (25°C) corresponds to 0.1MPa, and the viscosity range of the liquid monomer is 1-30CPS (25°C);

[0012] The liquid flow meter controls the flow rate in the range of 0.1-10mL / min. The liquid monomer flux is related to the coating process and determines the thickness of the organic film layer;

[0013] The pressure of the atomized gas in the nebulizer is regulated by introducing nitrogen into the ventilation pressure regulating unit tank B, so that the pressure range of the atomized gas is 10-100Pa; the pressure stability is controlled by the ventilation volume.

[0014] The temperature range of the heater is related to the boiling point of the monomer. Generally, the temperature is higher than the boiling point of the monomer under a vacuum pressure of 100 Pa, and the temperature range is from room temperature to 200°C.

[0015] A debubble mechanism is designed at the front end of the atomizer. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray in the atomizer part. At the same time, with the assistance of mechanical vibration, the liquid is formed into uniform small droplets, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, the liquid is easy to vaporize in the low-pressure area, forming bubbles in the pipeline, which affects the uniform entry of the liquid into the atomizer. Designing a debubble mechanism at the front end of the atomizer can effectively avoid the generation of bubbles.

[0016] Beneficial Effects

[0017] (1) The present invention discloses a vacuum evaporation source structure for liquids. For liquid monomers with low saturated vapor pressure (less than 10Pa), the viscosity is 1-30CPS (25°C). The evaporation source design has the following characteristics: 1. It can be continuously supplied, with a liquid pipe and a continuous liquid flow meter design; 2. The flow control is accurate, and the pressure before and after the liquid flow meter is stable; 3. There will be no interference from bubbles and other factors in constant evaporation, and the front end of the atomizer has a defoaming mechanism.

[0018] (2) The vacuum evaporation source structure can continuously supply liquid. The monomer cavity is connected to a nitrogen bottle, and the pressure is controlled by a pressure reducing valve to 0.1MPa-0.3MPa. The liquid flow rate is controlled by a liquid flow meter to 0.1-10ml / min.

[0019] (3) The vacuum evaporation source structure has accurate flow control. The pressure difference before and after the liquid flow meter has a certain influence on the flow display. By loading gas at the front end of the atomizer, the pressure at the output end of the flow meter is adjusted by 10-100Pa, and the pressure at the input end is adjusted by 0.1MPa-0.3MPa according to the viscosity of the liquid.

[0020] (4) The temperature range of the heater is related to the boiling point of the monomer. Generally, the temperature is higher than the boiling point of the monomer (100 Pa), and the temperature range is room temperature to 200°C.

[0021] (5) The vacuum evaporation source structure has a debubbling function. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray to the atomizer part. At the same time, the mechanical vibration is assisted to form uniform small droplets of liquid, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, liquid is easy to vaporize in low-pressure areas, forming bubbles in the pipeline, which affects the uniform entry of liquid into the atomizer. Designing a debubbling mechanism at the front end of the atomizer can effectively avoid the generation of bubbles.

[0022] (6) The use of a vacuum evaporation source structure for liquids can meet the continuous deposition of the organic layer under a vacuum environment, realize roll-to-roll vacuum film formation, improve production efficiency, and have good industrial prospects. The present invention discloses a vacuum evaporation source structure for liquids. For liquid monomers with low saturated vapor pressure (less than 10Pa), the evaporation source design has the following characteristics: 1. It can be continuously supplied, with a liquid pipe and a continuous liquid flow meter design; 2. The flow rate is accurately controlled, and the pressure before and after the liquid flow meter is stable; 3. Constant evaporation will not be disturbed by bubbles, etc., and the front end of the atomizer has a defoaming mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the structure of the vacuum evaporation source of the present invention. DETAILED DESCRIPTION

[0024] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0025] like Figure 1 As shown, a vacuum evaporation source structure for liquid, the vacuum evaporation source structure includes a ventilation and pressure regulating single tank A, a liquid flow meter, an atomizer, a ventilation and pressure regulating single tank B, and a heater;

[0026] The ventilation and pressure regulating monomer tank A is used to regulate the pressure of the liquid monomer;

[0027] The ventilation and pressure regulating single tank B is used to adjust the pressure of the atomized gas in the atomizer;

[0028] After the liquid monomer whose pressure is adjusted by the ventilation pressure regulating monomer tank A is controlled by the liquid flow meter, the liquid monomer enters the atomizer to be atomized to form droplets. The atomized droplets are heated and vaporized by the heater and then enter the vacuum chamber. The gas entering the vacuum chamber is used as the liquid source for depositing the liquid monomer film (acrylate) by the flash evaporation technology.

[0029] The liquid monomer is an acrylate, preferably tripropylene glycol diacrylate (TPGDA), neopentyl glycol diacrylate (NPGDA) or diethylene glycol diacrylate (DEGDA);

[0030] The pressure of the liquid monomer is adjusted by introducing nitrogen into the ventilation pressure regulating monomer tank A so that the pressure range of the liquid monomer is 0.1MPa-0.3MPa;

[0031] The liquid flow meter controls the flow rate in the range of 0.1-10mL / min;

[0032] The pressure of the atomized gas in the atomizer is regulated by introducing nitrogen into the ventilation pressure regulating unit tank B, so that the pressure of the atomized gas ranges from 10 to 100 Pa;

[0033] The temperature range of the heater is from room temperature to 200°C;

[0034] A debubble mechanism is designed at the front end of the atomizer. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray in the atomizer part. At the same time, with the assistance of mechanical vibration, the liquid is formed into uniform small droplets, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, the liquid is easy to vaporize in the low-pressure area, forming bubbles in the pipeline, which affects the uniform entry of the liquid into the atomizer. Designing a debubble mechanism at the front end of the atomizer can effectively avoid the generation of bubbles.

[0035] Example 1

[0036] 1. For the liquid monomer of tripropylene glycol diacrylate (TPGDA), the saturated vapor pressure is 1.6E-3Pa at 25°C, the viscosity is 10-20CPS (25°C), and the boiling point is 109°C at 100Pa.

[0037] 2. The monomer cavity is connected to a nitrogen bottle, and the pressure is controlled to 0.2MPa through the ventilation pressure regulating monomer tank A. The liquid flow rate is controlled to 1ml / min through the liquid flow meter.

[0038] 3. The vacuum evaporation source structure has accurate flow control. The pressure difference before and after the liquid flow meter has a certain influence on the flow display. The pressure at the output end of the flow meter is adjusted by 10-100Pa through the ventilation and pressure regulating monomer tank B.

[0039] 4. The temperature of the heating chamber is set to 120°C.

[0040] 5. The vacuum evaporation source structure has a debubbling function. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray to the atomizer part. At the same time, the mechanical vibration is assisted to form uniform small droplets of liquid, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, the liquid is easy to vaporize in the low-pressure area, forming bubbles in the pipeline, which affects the uniform entry of the liquid into the atomizer and causes the vacuum pressure fluctuation at the atomizer position. By adding a depth-adjustable needle in the catheter, adjusting the depth of the needle to control the opening size, the generation of bubbles in the pipeline is suppressed, and the vacuum pressure of the atomizer is stabilized at 10-100°C.

[0041] Example 2

[0042] 1. For the liquid monomer of neopentyl glycol diacrylate (NPGDA), the saturated vapor pressure is 2Pa (25°C), the viscosity is 10-15CPS (25°C), and the temperature is 96°C (100Pa).

[0043] 2. The monomer cavity is connected to a nitrogen bottle, and the pressure is controlled to 0.2MPa through the ventilation pressure regulating monomer tank A. The liquid flow rate is controlled to 10ml / min through the liquid flow meter.

[0044] 3. The vacuum evaporation source structure has accurate flow control. The pressure difference before and after the liquid flow meter has a certain influence on the flow display. By loading gas at the front end of the atomizer, the pressure at the output end of the flow meter is adjusted to 10-100Pa.

[0045] 4. The temperature of the heating chamber is set to 110°C.

[0046] 5. The vacuum evaporation source structure has a debubbling function. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray to the atomizer part. At the same time, the mechanical vibration is assisted to form uniform small droplets of liquid, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, the liquid is easy to vaporize in the low-pressure area, forming bubbles in the pipeline, which affects the uniform entry of the liquid into the atomizer. A depth-adjustable needle is added to the catheter, and the depth of the needle is adjusted to control the opening size, inhibiting the generation of bubbles in the pipeline, so that the vacuum pressure of the atomizer is stabilized at 10-100°C.

[0047] Example 3

[0048] 1. For the liquid monomer of diethylene glycol diacrylate (DEGDA), the saturated vapor pressure is 0.27 Pa (25°C), the viscosity is 5-10 CPS (25°C), and the temperature is 162°C (100 Pa).

[0049] 2. The monomer cavity is connected to a nitrogen bottle, and the pressure is controlled to 0.1MPa through the ventilation pressure regulating monomer tank A. The liquid flow rate is controlled to 5ml / min through the liquid flow meter.

[0050] 3. The vacuum evaporation source structure has accurate flow control. The pressure difference before and after the liquid flow meter has a certain influence on the flow display. By loading gas at the front end of the atomizer, the pressure at the output end of the flow meter is adjusted to 10-100Pa.

[0051] 4. The temperature of the heating chamber is set to 180°C.

[0052] 5. The vacuum evaporation source structure has a debubbling function. Since the atomizer is connected to the vacuum chamber, there is a pressure difference, and the liquid forms a vacuum spray to the atomizer part. At the same time, the mechanical vibration is assisted to form uniform small droplets of liquid, which are vaporized in the heating chamber and evenly deposited on the base film of the vacuum chamber. However, the liquid is easy to vaporize in the low-pressure area, forming bubbles in the pipeline, which affects the uniform entry of the liquid into the atomizer. A depth-adjustable needle is added to the catheter, and the depth of the needle is adjusted to control the opening size, inhibiting the generation of bubbles in the pipeline, so that the vacuum pressure of the atomizer is stabilized at 10-100°C.

[0053] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. The evaporation source structure of the present invention is universal for acrylic acid ester liquid monomers with a saturated vapor pressure of less than 10Pa.

Claims

1. A vacuum evaporation source structure for liquid, characterized in that: The vacuum evaporation source structure includes a ventilation and pressure regulating monomer tank A, a liquid flow meter, an atomizer, a ventilation and pressure regulating monomer tank B, a heater and a vacuum chamber; The ventilation and pressure regulating monomer tank A is used to regulate the pressure of the liquid monomer; The ventilation and pressure regulating single tank B is used to adjust the pressure of the atomized gas in the atomizer; After the pressure of the liquid monomer is adjusted by the ventilation and pressure regulating monomer tank A, the liquid monomer enters the atomizer to be atomized to form droplets. The atomized droplets are heated and vaporized by the heater and then enter the vacuum chamber. The gas entering the vacuum chamber is used as a liquid source for depositing a liquid monomer film by flash evaporation technology; The liquid monomer is tripropylene glycol diacrylate, neopentyl glycol diacrylate or diethylene glycol diacrylate; The pressure of the liquid monomer is adjusted by introducing nitrogen into the ventilation pressure regulating monomer tank A so that the pressure range of the liquid monomer is 0.1MPa-0.3MPa; The liquid flow meter controls the flow rate in the range of 0.1-10mL / min; The pressure of the atomized gas in the atomizer is regulated by introducing nitrogen into the ventilation pressure regulating unit tank B, so that the pressure of the atomized gas ranges from 10 to 100 Pa; the pressure is controlled to be stable by the ventilation volume; The temperature range of the heater is 110~200℃; The front end of the atomizer is designed with a debubbling mechanism, which also assists mechanical vibration.

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