Infrared absorbing composition, film, optical filter, solid-state imaging device, image display device, and infrared sensor

Abstract

Provided is an infrared-absorbing composition capable of forming a film having excellent infrared shielding properties, a film, optical filter, solid-state imaging device, image display device, and infrared sensor each of which is formed using the infrared-absorbing composition. The infrared-absorbing composition contains particles of an infrared-absorbing colorant and a solvent, the particles exhibiting two or more absorption maxima in the range of 650 to 1500 nm in the infrared-absorbing composition, and the absorbance at the absorption maximum on the shortest wavelength side in the range is 0.6 to 2.0 when the absorbance at the absorption maximum on the second-shortest wavelength side is set to 1.

Description

TECHNICAL FIELD

[0001] The present application relates to an infrared absorbing composition containing an infrared absorbing dye. Further, the present application relates to a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor each of which is formed using the composition containing the infrared absorbing dye. BACKGROUND

[0002] In a video camera, a digital still camera, a mobile phone with a camera function, and the like, a CCD (Charge Coupled Device), a CMOS (Complementary Metal Oxide Semiconductor), which are solid-state imaging devices of a color image, are used. These solid-state imaging devices use a silicon photodiode having sensitivity to infrared rays at a light-receiving portion thereof. Therefore, an infrared cut filter is sometimes provided to perform visibility correction.

[0003] The infrared cut filter is manufactured using a composition containing an infrared absorbing dye.

[0004] In Patent Literature 1, an invention of a resin composition containing an oxygen-carbon compound and a resin is described, and the uncured product of the resin composition has one or more absorption peaks having a maximum absorption in a range of wavelengths of 600 nm or more and 1100 nm or less, and the cured product of the resin composition has more absorption peaks having a maximum absorption in the range of wavelengths of 600 nm or more and 1100 nm or less than the uncured product.

[0005] PRIOR ART DOCUMENTS

[0006] PATENT LITERATURE

[0007] Patent Literature 1: Japanese Patent Application Laid-Open No. 2018-041047 SUMMARY

[0008] PROBLEMS TO BE SOLVED BY THE INVENTION

[0009] In recent years, further improvement in spectral characteristics is required for a film obtained using a composition containing an infrared absorbing dye. For example, it is required to be able to shield infrared rays and the like in a wide range of wavelength ranges. As a result of intensive studies by the present inventors on the composition described in Patent Literature 1, it has been known that there is room for further improvement in these characteristics in the composition.

[0010] Therefore, an object of the present application is to provide an infrared absorbing composition capable of forming a film excellent in infrared shielding property. Further, a film, an optical filter, a solid-state imaging device, an image display device, and an infrared sensor each of which is formed using the infrared absorbing composition are provided.

[0011] MEANS FOR SOLVING THE PROBLEMS

[0012] The present application provides the following.

[0013] <1> An infrared absorbing composition comprising particles of an infrared absorbing colorant and a solvent,

[0014] The infrared absorbing colorant has two or more absorption maxima in the wavelength range of 650 to 1500 nm in the infrared absorbing composition, and the absorbance at the absorption maximum on the shortest wavelength side in the range is 0.6 to 2.0 when the absorbance at the absorption maximum on the second shortest wavelength side is taken as 1.

[0015] <2> The infrared absorbing composition according to <1>, wherein

[0016] The difference between the absorption maximum on the shortest wavelength side and the absorption maximum on the second shortest wavelength side in the range is 30 to 80 nm.

[0017] <3> The infrared absorbing composition according to <1> or <2>, wherein

[0018] The infrared absorbing colorant is at least one selected from the group consisting of a pyrrolopyrrole compound, a squarine compound, a pyrromethene compound, a croconium compound, and a cyanine compound.

[0019] <4> An infrared absorbing composition comprising particles of an infrared absorbing colorant and a solvent,

[0020] The infrared absorbing colorant is at least one selected from the group consisting of a pyrrolopyrrole compound having one or more groups represented by formula (1) and a group represented by formula (2) and a squarine compound having one or more groups represented by formula (1) and a group represented by formula (2);

[0021] [Chemical Formula 1]

[0022]

[0023] In formula (1), R 1a represents an alkyl group, a halogen atom, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a cyano group, R 1b represents a substituent, n1 represents an integer of 0 to 4, and * represents a bond;

[0024] In formula (2), L 1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, or a connecting group of n2+1 valence or a single bond composed of them, R L1 represents a hydrogen atom, an alkyl group, or an aryl group, X 1 represents an acid group or a basic group, and * represents a bond.

[0025] <5> The infrared absorbing composition according to any one of <1> to <4>, wherein

[0026] The extreme absorption wavelength of the above particle present on the shortest wave side is present on a shorter wave side than the wavelength at which a pigment solution obtained by dissolving an infrared absorbing dye constituting the above particle in a good solvent for the above infrared absorbing dye shows the greatest absorbance.

[0027] <6> The infrared absorbing composition according to any one of <1> to <5>, wherein

[0028] The above particle shows three or more extreme absorption wavelengths in the range of wavelengths of 650 to 1500 nm in the above infrared absorbing composition.

[0029] <7> The infrared absorbing composition according to any one of <1> to <6>, wherein

[0030] The above particle shows a greater number of extreme absorption wavelengths in the range of wavelengths of 650 to 1500 nm in the above infrared absorbing composition than the number of extreme absorption wavelengths in the range of wavelengths of 650 to 1500 nm shown by a pigment solution obtained by dissolving an infrared absorbing dye constituting the above particle in a good solvent for the above infrared absorbing dye.

[0031] <8> The infrared absorbing composition according to any one of <1> to <7>, wherein

[0032] The above infrared absorbing dye is a compound represented by formula (PP-1);

[0033] [Chemical Formula 2]

[0034]

[0035] In the formula, R 1a represents an alkyl group, a halogen atom, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a cyano group,

[0036] R 1b represents a substituent,

[0037] R 2 represents an alkyl group, an aryl group, or a heteroaryl group,

[0038] R 3 , R 4 , R 5 , and R 6 each independently represent a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group, or a heteroaryl group,

[0039] R 7 , and R8 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR 9 R 10 or a metal atom,

[0040] R 9 and R 10 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group,

[0041] R 9 and R 10 may be bonded to each other to form a ring,

[0042] R 7 may be covalently bonded or coordinately bonded to R 3 or R 5

[0043] R 8 may be covalently bonded or coordinately bonded to R 2 , R 4 , or R 6

[0044] L 1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, or a connecting group of n2+1 valence which is a combination thereof or a single bond,

[0045] R L1 represents a hydrogen atom, an alkyl group, or an aryl group,

[0046] X 1 represents an acid group or a basic group,

[0047] n1 represents an integer of 0 to 4,

[0048] n2 represents an integer of 1 or more,

[0049] m represents an integer of 1 or more.

[0050] <9> The infrared ray absorbing composition according to any one of <1> to <8>, further comprising a curable compound.

[0051] <10> The infrared ray absorbing composition according to any one of <1> to <9>, which is used for a light filter or an ink.

[0052] <11> A film which is made using the infrared ray absorbing composition according to any one of <1> to <9>.

[0053] <12> A light filter which comprises the film according to <11>. ​​

[0054] <13> A solid-state imaging element comprising <11> The membrane mentioned above.

[0055] <14> An image display device comprising <11> The membrane mentioned above.

[0056] <15> An infrared sensor comprising <11> The membrane mentioned above.

[0057] Invention Effects

[0058] According to the present invention, an infrared absorbing composition, a membrane, a filter, a solid-state imaging element, an image display device, and an infrared sensor capable of forming a film with excellent infrared shielding properties can be provided. Attached Figure Description

[0059] Figure 1 This is a schematic diagram illustrating one embodiment of an infrared sensor. Detailed Implementation

[0060] The present invention will now be described in detail.

[0061] In this specification, “~” is used to imply that the values ​​recorded before and after it are the lower and upper limits.

[0062] In this specification, the designations of groups (atomic groups) without indicating whether they are substituted or unsubstituted include both unsubstituted and substituted groups (atomic groups). For example, "alkyl" means that it includes not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups).

[0063] In this manual, unless otherwise specified, "exposure" includes not only exposure using light, but also the depiction of particle beams such as electron beams and ion beams. Furthermore, examples of light used in exposure include the bright-line spectrum of mercury lamps, far-ultraviolet light represented by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other photochemical rays or radiation.

[0064] In this specification, "(meth)acrylate" means either or both of acrylate and methyl acrylate, "(meth)acrylic acid" means either or both of acrylic acid and methacrylic acid, and "(meth)acryloyl" means either or both of acryloyl and methacryloyl.

[0065] In this specification, weight-average molecular weight and number-average molecular weight are defined as polystyrene equivalents determined by gel permeation chromatography (GPC).

[0066] In the present specification, Me in a chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

[0067] In the present specification, infrared rays refer to light (electromagnetic waves) having a wavelength of 700 to 2500 nm.

[0068] In the present specification, the total solid content refers to the total mass of components excluding the solvent from the total components of the composition.

[0069] In the present specification, pigments refer to coloring materials that are not easily dissolved in a solvent.

[0070] In the present specification, the term "step" includes not only a single step, but also a case where the step cannot be clearly distinguished from other steps, as long as the intended effect of the step is achieved.

[0071] <Infrared ray absorbing composition>

[0072] A first embodiment of the infrared ray absorbing composition of the present application is

[0073] An infrared ray absorbing composition containing particles of an infrared ray absorbing colorant and a solvent, characterized in that

[0074] The above-mentioned particles exhibit two or more absorption peaks in the wavelength range of 650 to 1500 nm in the infrared ray absorbing composition, and the absorbance at the absorption peak on the shortest wavelength side in the above-mentioned range is 0.6 to 2.0 when the absorbance at the absorption peak on the second shortest wavelength side is set to 1.

[0075] By the first embodiment of the infrared ray absorbing composition of the present application containing the above-mentioned particles, a film having excellent infrared ray shielding properties capable of shielding a wide range of wavelengths of infrared rays can be formed. Furthermore, according to the first embodiment of the infrared ray absorbing composition of the present application, a film capable of shielding a wide range of wavelengths of infrared rays can be formed using only one kind of infrared ray absorbing colorant even if a plurality of kinds of infrared ray absorbing colorants are not used.

[0076] As one embodiment of the particles satisfying the above-mentioned spectral properties, particles of an infrared ray absorbing colorant each having one or more groups represented by formula (1) and a group represented by formula (2) can be given.

[0077] The detailed reason why the use of particles of an infrared ray absorbing colorant having such a structure enables the above-mentioned spectral properties is not clear, but can be inferred as follows.

[0078] In the case where the infrared ray absorbing colorant is dissolved in a solvent and used, it can freely move in the solution, and thus only exhibits an absorption peak derived from a single molecule of the infrared ray absorbing colorant.

[0079] The group represented by formula (2) is a group of a structure having high hydrophilicity, and thus it is presumed that, at the time of dispersion, the infrared-absorbing pigment having the group represented by formula (2) is associated in a manner in which the side of the infrared-absorbing pigment having the group represented by formula (2) faces the solvent side in the infrared-absorbing composition. Also, the group represented by formula (1) has a substituent at the ortho position of the benzene ring, and thus it is presumed that, by the infrared-absorbing pigment having the group represented by formula (1), the infrared-absorbing pigments are not easily overlapped in parallel due to steric hindrance, and are associated in a manner in which the infrared-absorbing pigments are oriented in a tilt with respect to each other with the transition moment arranged in a tilt.

[0080] By the particles of the infrared-absorbing pigment each having one or more groups represented by formula (1) and a group represented by formula (2) described later, in the infrared-absorbing composition, such an associated state (hereinafter, also referred to as a specific state) is formed, the absorption peak of the infrared-absorbing pigment is shifted to the short wave side or the long wave side, as a result, it is presumed that, in addition to the absorption peak derived from a single molecule of the infrared-absorbing pigment, an absorption peak derived from the specific state is expressed, and it is presumed that the above-described spectral characteristics can be achieved.

[0081] Also, a second aspect of the infrared-absorbing composition of the present application is

[0082] An infrared-absorbing composition containing particles of an infrared-absorbing pigment and a solvent, characterized in that

[0083] The above-described infrared-absorbing pigment is at least one selected from a pyrrolopyrrole compound each having one or more groups represented by formula (1) and a group represented by formula (2) and a squarylium compound each having one or more groups represented by formula (1) and a group represented by formula (2).

[0084] By the second aspect of the infrared-absorbing composition of the present application containing the above-described particles, a film excellent in infrared shielding property capable of shielding a wide range of wavelengths of infrared rays can be formed. Also, in the second aspect of the infrared-absorbing composition of the present application, even if a plurality of kinds of infrared-absorbing pigments are not used, a film capable of shielding a wide range of wavelengths of infrared rays can be formed by using only one kind of infrared-absorbing pigment.

[0085] The infrared-absorbing composition of the present application can be used as an ink (ink composition). As the ink composition, printing ink, inkjet ink, and the like can be given. Also, in the case where the infrared-absorbing composition of the present application is used as an ink composition, a solvent containing water can also be used as the solvent. That is, the infrared-absorbing composition of the present application can also be used as an aqueous ink composition. In the case where the infrared-absorbing composition of the present application is used as an ink composition, the solid content concentration of the infrared-absorbing composition is preferably 0.1 to 50% by mass, and more preferably 1 to 30% by mass.

[0086] Further, the infrared absorbing composition of the present application can also be used as a composition for optical filters. As the kind of optical filters, there are infrared cut filters, infrared transmitting filters, and the like. In the case where the infrared absorbing composition of the present application is used as a composition for optical filters, the infrared absorbing composition of the present application also preferably contains a resin. In the case where the infrared absorbing composition of the present application is used as a composition for optical filters, the solid content concentration of the infrared absorbing composition is preferably 1 to 70 mass%, more preferably 2 to 60 mass%.

[0087] Further, the infrared absorbing composition of the present application can also be used as a composition for optical filters. As the kind of optical filters, there are infrared cut filters, infrared transmitting filters, and the like. In the case where the infrared absorbing composition of the present application is used as a composition for optical filters, the infrared absorbing composition of the present application also preferably contains a resin. In the case where the infrared absorbing composition of the present application is used as a composition for optical filters, the solid content concentration of the infrared absorbing composition is preferably 1 to 70 mass%, more preferably 2 to 60 mass%.

[0088] Hereinafter, each component used in the infrared absorbing composition of the present application will be described.

[0089] Particles of Infrared Absorbing Dyes (Specific Particles)

[0090] The infrared absorbing composition of the present application contains particles of an infrared absorbing dye (hereinafter, referred to as specific particles) satisfying the following essential condition 1 or essential condition 2.

[0091] (Essential Condition 1) Particles of an infrared absorbing dye, the infrared absorbing composition of which shows two or more absorption maxima in the wavelength range of 650 to 1500 nm, and the absorbance at the absorption maximum on the shortest wavelength side in the above range is 0.6 to 2.0 when the absorbance at the absorption maximum on the second shortest wavelength side is set to 1. The absorbance at the absorption maximum on the shortest wavelength side in the above range is preferably 0.8 to 1.8, more preferably 1.0 to 1.6 when the absorbance at the absorption maximum on the second shortest wavelength side is set to 1.

[0092] (Essential Condition 2) Particles of an infrared absorbing dye, the infrared absorbing dye being at least one selected from the group consisting of a pyrrolopyrrole compound having one or more groups represented by formula (1) and a group represented by formula (2) and a squarylium compound having one or more groups represented by formula (1) and a group represented by formula (2). The infrared absorbing dye is preferably a pyrrolopyrrole compound having one or more groups represented by formula (1) and a group represented by formula (2).

[0093] [Chemical Formula 3]

[0094]

[0095] In formula (1), R 1a represents an alkyl group, a halogen atom, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a cyano group, R 1b represents a substituent, n1 represents an integer of 0 to 4, and * represents a bonding site;

[0096] In formula (2), L 1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -0-, -S-, -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, or a combination thereof, an n2+1-valent linking group or a single bond, R L1 represents a hydrogen atom, an alkyl group, or an aryl group, X 1 represents an acid group or a basic group, n2 represents an integer of 1 or more, and * represents a linking bond.

[0097] In formula (2), when n2 is an integer of 2 or more, L 1 represents a 3-valent or higher linking group.

[0098] As the halogen atom represented by R 1a , a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom can be given.

[0099] R 1a The number of carbon atoms of the alkyl group represented by R

[0100] R 1a The number of carbon atoms of the alkenyl group represented by R

[0101] R 1a The number of carbon atoms of the alkynyl group represented by R

[0102] R 1a The number of carbon atoms of the aryl group represented by R

[0103] The number of carbon atoms of the heteroaryl group represented by R 1a is preferably 1 to 30, more preferably 1 to 12. As the kind of the heteroatom constituting the heteroaryl group, for example, a nitrogen atom, an oxygen atom, and a sulfur atom can be given. The number of the heteroatom constituting the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, further preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4.

[0104] R 1a The alkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group represented by R

[0105] R in equation (1) 1a Preferably, it is an alkyl, halogen atom, or aryl group, more preferably an alkyl or aryl group, and even more preferably an alkyl group.

[0106] R as in equation (1) 1b Examples of substituents include alkyl, alkenyl, alkynyl, aryl, heteroaryl, alkoxy, aryloxy, heteroaryloxy, acyl, alkyl carbonyl, aryl carbonyl, alkoxy carbonyl, aryloxy carbonyl, acyloxy, amide, alkoxy carbonyl amino, aryloxy carbonyl amino, sulfonyl amino, aminosulfonyl, carbamoyl, alkyl thio, aryl thio, heteroaryl thio, alkyl sulfonyl, aryl sulfonyl, sulfinyl, ureyl, hydroxyl, mercapto, halogen atom, cyano, nitro, imino, silyl, etc., preferably alkyl, alkoxy, aryloxy, or halogen atom. These groups may also have substituents. Substituent T, described later, can be cited as an example of a substituent. Substituents are preferably groups other than those represented by formula (2).

[0107] In equation (1), n1 represents an integer from 0 to 4, preferably an integer from 0 to 2, and more preferably 0.

[0108] L in equation (2) 1 This indicates aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, and -NR. L1 -, -CO-, -COO-, -OCO-, -SO2-, or combinations thereof forming an n2+1 valence linker, R L1 This represents a hydrogen atom, alkyl group, or aryl group. When n2 is 1, L 1 It can also be a single key.

[0109] The aliphatic hydrocarbon group preferably has 1 to 20 carbon atoms, more preferably 2 to 20, even more preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group can be straight-chain, branched, or cyclic. Furthermore, the cyclic aliphatic hydrocarbon group can be monocyclic or polycyclic. The aromatic hydrocarbon group preferably has 6 to 18 carbon atoms, more preferably 6 to 14, and even more preferably 6 to 10. The aliphatic hydrocarbon group may have substituents.

[0110] The aromatic hydrocarbon group preferably has 6 to 18 carbon atoms, more preferably 6 to 14, and even more preferably 6 to 10. The aromatic hydrocarbon group is preferably a monocyclic aromatic hydrocarbon group or a fused ring with 2 to 4 fusion numbers, more preferably a monocyclic aromatic hydrocarbon group. A benzene ring group is preferred as the aromatic hydrocarbon group.

[0111] The heterocyclic group is preferably a monocyclic or a fused ring having a ring number of 2 to 4. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and further more preferably 3 to 12. As specific examples of the heterocyclic group, there can be mentioned a piperazine ring group, a pyrrolidine ring group, a pyrrole ring group, a piperidine ring group, a pyridine ring group, an imidazole ring group, a pyrazole ring group, an oxazole ring group, a thiazole ring group, a pyrazine ring group, a morpholine ring group, a thiazine ring group, an indole ring group, an isoindole ring group, a benzimidazole ring group, a purine ring group, a quinoline ring group, an isoquinoline ring group, a quinoxaline ring group, a cinnoline ring group, a carbazole ring group, and a group represented by the following formulae (L-1) to (L-7).

[0112] [Chemical Formula 4]

[0113]

[0114] * in the formula represents a bond to X 1 , etc. R represents a hydrogen atom or a substituent. As the substituent, there can be mentioned the substituent T described in the above formula (1).

[0115] The aliphatic hydrocarbon group, the aromatic hydrocarbon group, and the heterocyclic group can also have a substituent. As the substituent, there can be mentioned the groups exemplified as the substituent T described later.

[0116] R L1 The number of carbon atoms of the alkyl group represented by R L1 The alkyl group represented by R

[0117] R L1 The number of carbon atoms of the aryl group represented by R L1 The aryl group represented by R

[0118] As the acid group represented by X 1 in the formula (2), there can be mentioned a sulfonic acid group, a carboxyl group, a phosphoric acid group, a boronic acid group, a sulfone imide group, a sulfonamide group, and a salt thereof. As the atom or atom group constituting the salt, there can be mentioned an alkali metal ion (Li + , Na + , K + , etc.), an alkaline earth metal ion (Ca 2+ , Mg 2+ , etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, a phosphonium ion, and the like.

[0119] X as in equation (2) 1 Examples of basic groups that can be represented include amino groups, pyridyl groups and their salts, ammonium salts, and phthalimide methyl groups. Examples of atoms or groups that constitute salts include hydroxide ions, halide ions, carboxylic acid ions, sulfonic acid ions, and phenyl oxide ions.

[0120] As an amino group, examples include those derived from -NRx 1 Rx 2 The groups and cyclic amino groups are represented.

[0121] By -NRx 1 Rx 2 In the indicated group, Rx 1 and Rx 2 Each group independently represents a hydrogen atom, an alkyl group, or an aryl group, preferably an alkyl group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group can be straight-chain, branched, or cyclic, but straight-chain or branched is preferred, and straight-chain is more preferred. The alkyl group may have substituents. Substituent T, described later, can be cited as an example of a substituent. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have substituents. Substituent T, described later, can be cited as an example of a substituent. Furthermore, Rx 1 With Rx 2 They can bond together to form a ring.

[0122] Examples of cyclic amino groups include pyrrolidinyl, piperidinyl, piperazinyl, and morpholinyl. These groups may also have substituents. Substituent T, described later, can be cited as an example. Specific examples of substituents include alkyl and aryl groups.

[0123] X in equation (2) 1 Preferably, the group is a sulfonic acid group, a phosphoric acid group, a group represented by formula (X-1), a group represented by formula (X-2), a group represented by formula (X-3), or a group represented by formula (X-4), with the sulfonic acid group being more preferably a group represented by formula (X-1) or a group represented by formula (X-3).

[0124] [Chemical Formula 5]

[0125]

[0126] In equations (X-1) to (X-4), R 100 ~R 106 Each can independently represent a hydrogen atom, alkyl group, alkenyl group, or aryl group, R 100 With R 101 They can connect to each other to form rings, where M represents the atoms or groups of atoms that constitute the anions and salts. Examples of M include alkali metal ions (Li...). + Na +, K + alkaline earth metal ions (Ca 2+ , Mg 2+ , etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions, etc.

[0127] n2 of formula (2) represents an integer of 1 or more, preferably an integer of 1 to 3, more preferably 1 or 2, further preferably 1.

[0128] (Substituent T)

[0129] As the substituent T, the following groups can be mentioned. A halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably, an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably, an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably, an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably, an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably, a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably, an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably, an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably, an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably, a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably, an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably, an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably, an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably, a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably, an acyloxy group having 2 to 30 carbon atoms), an amido group (preferably, an amido group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably, an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably, an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably, an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfonamide group (preferably, a sulfonamide group having 0 to 30 carbon atoms), a sulfonamideamino group (preferably, a sulfonamideamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably, a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably, an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably, an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably, a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably, an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably, an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably, an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably, an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably, a heteroarylsulfonyl group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably, a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably, an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably, an arylsulfinyl group having 6 to 30 carbon atoms), a heteroarylsulfinyl group (preferably, a heteroarylsulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably, a ureido group having 1 to 30 carbon atoms), a hydroxyl group, a nitro group, a carboxyl group, a sulfonic acid group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide group, a phosphine group, a mercapto group, a cyano group, an alkylsulfonic acid group, an arylsulfonic acid group, an arylazo group, a heteroarylazo group, a phosphinyl group, a phosphinyl-oxy group, a phosphinylamino group, a silyl group, a hydrazino group, an imino group. These groups are further substituted with a substituent T. As the substituent T, the groups mentioned above can be mentioned.

[0130] The particle satisfying the above necessary condition 1 is preferably a particle of an infrared absorbing dye having one or more groups represented by the above formula (1) and a group represented by the above formula (2), respectively. As the infrared absorbing dye constituting the specific particle satisfying the above necessary condition 1, a pyrrolopyrrole compound, a squarine compound, a pyrromethene compound, a croconium compound, and a cyanine compound can be given, and a pyrrolopyrrole compound and a squarine compound are preferred, and a pyrrolopyrrole compound is more preferred.

[0131] The particle satisfying the above necessary condition 2 preferably further satisfies the characteristics of the above necessary condition 1.

[0132] The specific particle preferably has two or more absorption maxima in the wavelength range of 650 to 1500 nm. The difference (λ2-λ1) between the absorption maximum (λ1) on the shortest wavelength side and the absorption maximum (λ2) on the second shortest wavelength side in the above range is preferably 20 to 90 nm, more preferably 30 to 80 nm, and further preferably 35 to 70 nm. If the difference in the above wavelength is within the above range, a film having excellent infrared shielding properties that can shield a wide range of wavelengths of infrared rays can be formed.

[0133] The absorption maximum on the shortest wavelength side of the specific particle is preferably on the shorter wavelength side than the wavelength at which the absorbance of a dye solution obtained by dissolving the infrared absorbing dye constituting the specific particle in a good solvent for the infrared absorbing dye is the largest, more preferably on the shorter wavelength side by 30 nm or more, and further preferably on the shorter wavelength side by 50 nm or more. By using a particle satisfying such spectral characteristics, a film having a good edge cut of the absorption of infrared rays can be formed. In the present specification, the good solvent for the infrared absorbing dye refers to a solvent in which the solubility of the infrared absorbing dye is 0.1 g or more per 100 g of the solvent at 25°C. The good solvent is preferably a solvent in which the solubility of the infrared absorbing dye is 0.1 g or more per 100 g of the solvent at 25°C, and more preferably a solvent in which the solubility is 0.2 g or more. The type of the good solvent varies depending on the type of the infrared absorbing dye, but for example, dimethyl sulfoxide, chloroform, and the like can be given.

[0134] The specific particle preferably has three or more absorption maxima in the range of 650 to 1500 nm in the infrared absorbing composition. Further, when the absorbance at the absorption maximum on the shorter wavelength side of the second is set to 1, the absorbance at the absorption maximum on the shorter wavelength side of the third is preferably 0.2 to 2, more preferably 0.3 to 1.8, and further preferably 0.4 to 1.5. Further, the difference (λ3-λ2) between the absorption maximum on the shorter wavelength side of the second (λ2) and the absorption maximum on the shorter wavelength side of the third (λ3) is preferably 20 to 100 nm, more preferably 30 to 90 nm, and further preferably 35 to 80 nm. The difference (λ3-λ1) between the absorption maximum on the shorter wavelength side of the first (λ1) and the absorption maximum on the shorter wavelength side of the third (λ3) is preferably 60 to 200 nm, more preferably 70 to 170 nm, and further preferably 80 to 150 nm.

[0135] The specific particle preferably has three or more absorption maxima in the range of 650 to 1500 nm in the infrared absorbing composition. Further, when the absorbance at the absorption maximum on the shorter wavelength side of the second is set to 1, the absorbance at the absorption maximum on the shorter wavelength side of the third is preferably 0.2 to 2, more preferably 0.3 to 1.8, and further preferably 0.4 to 1.5. Further, the difference (λ3-λ2) between the absorption maximum on the shorter wavelength side of the second (λ2) and the absorption maximum on the shorter wavelength side of the third (λ3) is preferably 20 to 100 nm, more preferably 30 to 90 nm, and further preferably 35 to 80 nm. The difference (λ3-λ1) between the absorption maximum on the shorter wavelength side of the first (λ1) and the absorption maximum on the shorter wavelength side of the third (λ3) is preferably 60 to 200 nm, more preferably 70 to 170 nm, and further preferably 80 to 150 nm.

[0136] In addition, in the present specification, the absorbance of the infrared absorbing composition can be measured to find the maximum absorption wavelength and the absorbance of the specific particle in the infrared absorbing composition. Also, in the case where two or more kinds of specific particles are contained in the infrared absorbing composition, the absorbance of the composition from which the specific particle of the kind other than the measurement target is removed is measured to find. For example, in the case of the infrared absorbing composition containing a specific particle A, a specific particle B, a solvent, and other additives, the absorbance of the composition from which the specific particle B is removed from the above infrared absorbing composition is measured to find the maximum absorption wavelength and the absorbance of the specific particle A in the infrared absorbing composition. Also, the absorbance of the composition from which the specific particle A is removed from the above infrared absorbing composition is measured to find the maximum absorption wavelength and the absorbance of the specific particle B in the infrared absorbing composition. Also, in the case where the infrared absorbing composition contains, in addition to the specific particle, a raw material other than the specific particle, such as an infrared absorber other than the specific particle, a colorant, a black colorant, and the like, the absorbance of the composition from which these raw materials are removed from the infrared absorbing composition is measured to find. For example, in the case of the infrared absorbing composition containing a specific particle, an infrared absorber other than the specific particle, a solvent, and other additives, the absorbance of the composition from which the infrared absorber other than the specific particle is removed from the above infrared absorbing composition is measured to find the maximum absorption wavelength and the absorbance of the specific particle in the infrared absorbing composition.

[0137] The solubility of the specific particle in 100 g of water at 25°C is preferably 0.075 g or less, more preferably 0.05 g or less, and further preferably 0.025 g or less.

[0138] The solubility of the specific particle in 100 g of propylene glycol monomethyl ether at 25°C is preferably 0.075 g or less, more preferably 0.05 g or less, and further preferably 0.025 g or less.

[0139] The solubility of the specific particle in 100 g of cyclopentanone at 25°C is preferably 0.075 g or less, more preferably 0.05 g or less, and further preferably 0.025 g or less.

[0140] The infrared absorbing colorant constituting the specific particle is preferably a compound represented by formula (PP-1). That is, the specific particle is preferably a particle of a compound represented by formula (PP-1).

[0141] [Chemical Formula 6]

[0142]

[0143] In the formula, R 1a represents an alkyl group, a halogen atom, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a cyano group,

[0144] R1b represents a substituent,

[0145] R 2 represents an alkyl group, an aryl group or a heteroaryl group,

[0146] R 3 , R 4 , R 5 and R 6 each independently represents a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group or a heteroaryl group,

[0147] R 7 and R 8 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR 9 R 10 or a metal atom,

[0148] R 9 and R 10 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group or a heteroaryloxy group,

[0149] R 9 and R 10 may be bonded to each other to form a ring,

[0150] R 7 may be covalently bonded or coordinately bonded to R 3 or R 5 ,

[0151] R 8 may be covalently bonded or coordinately bonded to R 2 , R 4 or R 6 ,

[0152] L 1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a nitrogen-containing heterocyclic group, -O-, -S-, -NR L1 -, -CO-, -COO-, -OCO-, -SO2- or a connecting group of n2+1 valency or a single bond which is formed by combining them,

[0153] R L1 represents a hydrogen atom, an alkyl group or an aryl group,

[0154] X 1 represents an acid group or a basic group,

[0155] n1 represents an integer of 0 to 4,

[0156] n2 represents an integer of 1 or more,

[0157] m represents an integer of 1 or more.

[0158] wherein n2 is an integer of 2 or more, L 1 represents a linking group of valence 3 or more.

[0159] " -L 1 -(X 1 ) b2 " can be bonded at a position where the formula (PP-1) can be bonded.

[0160] R 1a of the formula (PP-1), R 1b of the formula (PP-1), and n1 have the same meanings as R 1a of the formula (1), R 1b of the formula (1), and n1, and the same preferable ranges.

[0161] L 1 of the formula (PP-1), X 1 of the formula (PP-1), and n2 have the same meanings as L 1 of the formula (2), X 1 of the formula (2), and n2, and the same preferable ranges.

[0162] R 2 represents an alkyl group, an aryl group, or a heteroaryl group, preferably an aryl group or a heteroaryl group, more preferably an aryl group.

[0163] R 2 represented by R 2 is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10.

[0164] R 2 represented by R 2 is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10.

[0165] R 2 represented by R 2 is preferably 1 to 30, more preferably 1 to 12. As the kind of heteroatom constituting the heteroaryl group, for example, a nitrogen atom, an oxygen atom, and a sulfur atom can be given. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3, and more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, and further preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4.

[0166] R 2 represented by R 2 may be unsubstituted or can have a substituent. As the substituent, the groups described in the substituent T above can be given.

[0167] " -L 1 -(X 1 ) n2 " of the formula (PP-1) is preferably bonded to R 2 .

[0168] R 3 , R 4 , R 5 and R 6 each independently represent a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group or a heteroaryl group.

[0169] Preferably, one of R 3 and R 5 represents a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group or an arylsulfinyl group and the other represents a heteroaryl group, more preferably one of R 3 and R 5 represents a cyano group and the other represents a heteroaryl group.

[0170] Preferably, one of R 4 and R 6 represents a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group or an arylsulfinyl group and the other represents a heteroaryl group, more preferably one of R 4 and R 6 represents a cyano group and the other represents a heteroaryl group.

[0171] R 3 to R 6 represent a heteroaryl group. The number of carbon atoms constituting the heteroaryl group represented by R 3 to R 6 is preferably 1 to 30, more preferably 1 to 12. As the kind of heteroatom constituting the heteroaryl group, for example, a nitrogen atom, an oxygen atom and a sulfur atom can be mentioned. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 8, further preferably a monocyclic ring or a condensed ring having a condensation number of 2 to 4. The heteroaryl group can be unsubstituted or can have a substituent. As the substituent, the groups described in the above-mentioned substituent T can be mentioned.

[0172] R 7 and R 8 each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR 9 R 10 or a metal atom, preferably -BR 9 R 10 .

[0173] As the alkyl group, aryl group and heteroaryl group represented by R 7 and R 8 , the groups described in the above-mentioned R 2 are mentioned, and the preferable ranges are the same.

[0174] As the alkyl group, aryl group and heteroaryl group represented by R 7 and R 8As the metal atom represented by M, there can be mentioned magnesium, aluminum, calcium, barium, zinc, tin, aluminum, vanadium, iron, cobalt, nickel, copper, palladium, iridium, platinum, and preferably aluminum, zinc, vanadium, iron, copper, palladium, iridium, and platinum.

[0175] R 9 R 10 R 9 R 10 R and R each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, preferably a halogen atom, an alkyl group, an aryl group, or a heteroaryl group, more preferably a halogen atom, an alkyl group, or an aryl group, and further preferably an aryl group.

[0176] R 9 R 10 As the halogen atom represented by R and R, there can be mentioned a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and preferably a fluorine atom.

[0177] R 9 R 10 The number of carbon atoms of the alkyl group and the alkoxy group represented by R and R is preferably from 1 to 40. The lower limit is more preferably, for example, 3 or more. The upper limit is more preferably, for example, 30 or less, and further preferably 25 or less. The alkyl group and the alkoxy group can be any of a straight chain, a branched chain, and a cyclic structure, and are preferably a straight chain or a branched chain.

[0178] R 9 R 10 The number of carbon atoms of the alkenyl group represented by R and R is preferably from 2 to 40. The lower limit is more preferably, for example, 3 or more. The upper limit is more preferably, for example, 30 or less, and further preferably 25 or less.

[0179] R 9 R 10 The number of carbon atoms of the aryl group and the aryloxy group represented by R and R is preferably from 6 to 20, and more preferably from 6 to 12. The aryl group and the aryloxy group can have a substituent, or can be unsubstituted. As the substituent, there can be mentioned an alkyl group, an alkoxy group, a halogen atom, and the like.

[0180] R 9 R 10 The heteroaryl group and the heteroaryloxy group represented by R and R can be monocyclic or polycyclic. The number of heteroatoms constituting the heteroaryl ring of the heteroaryl group and the heteroaryloxy group is preferably from 1 to 3. The heteroatom constituting the heteroaryl ring is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of carbon atoms constituting the heteroaryl ring is preferably from 3 to 30, more preferably from 3 to 18, further preferably from 3 to 12, and particularly preferably from 3 to 5. The heteroaryl ring is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group and the heteroaryloxy group can have a substituent, or can be unsubstituted. As the substituent, there can be mentioned an alkyl group, an alkoxy group, a halogen atom, and the like.

[0181] R 9 R 10 R of -BR 9with R 10 may be bonded to each other to form a ring. For example, structures represented by the following formulae (B-1) to (B-4) and the like can be given. Hereinafter, Rb represents a substituent, and Rb 1 ~Rb 4 independently represent a hydrogen atom or a substituent, b1 to b3 independently represent an integer of 0 to 4, and * represents a bonding position to the formula (PP-1). As the substituents represented by Rb and Rb 1 ~Rb 4 , the substituents described in the above substituent T can be given, and halogen atom, alkyl group, and alkoxy group are preferred.

[0182] [Chemical Formula 7]

[0183]

[0184] R of the formula (PP-1) 7 may be covalently bonded or coordinately bonded to R 3 or R 5 . R 8 may be covalently bonded or coordinately bonded to R 2 , R 4 , or R 6 .

[0185] m of the formula (PP-1) represents an integer of 1 or more, preferably an integer of 1 to 4, more preferably an integer of 1 to 3, further preferably 1 or 2, and particularly preferably 1.

[0186] The compound represented by the formula (PP-1) is preferably a compound represented by the formula (PP-2).

[0187] [Chemical Formula 8]

[0188]

[0189] R of the formula (PP-2) 1a , R 1b , R 3 to R 8 , L 1 , X 1 , n1, and n2 have the same meanings as R 1a , R 1b , R 3 to R 8 , L 1 , X 1 , n1, and n2 of the formula (PP-1), and the preferred ranges are also the same.

[0190] m1 of the formula (PP-2) represents an integer of 1 to 4, preferably an integer of 1 to 3, more preferably 1 or 2, and particularly preferably 1.

[0191] As specific examples of the compound represented by formula (PP-1), compounds having the structures shown below can be given. In the structural formulas below, Me represents a methyl group, Et represents an ethyl group, and Ph represents a phenyl group.

[0192] [Chemical Formula 9]

[0193]

[0194] [Chemical Formula 10]

[0195]

[0196] [Chemical Formula 11]

[0197]

[0198] The content of the specific particle is preferably 1% by mass or more, more preferably 5% by mass or more, further preferably 10% by mass or more, and particularly preferably 15% by mass or more, in the total solid content of the infrared absorbing composition. Also, the upper limit of the content of the specific particle is preferably 70% by mass or less, more preferably 60% by mass or less, and further preferably 50% by mass or less.

[0199] The infrared absorbing composition can contain only one kind of specific particle, or can contain two or more kinds. In the case of containing two or more kinds, the total amount thereof is preferably within the above range.

[0200] Solvent

[0201] The infrared absorbing composition of the present application contains a solvent. As the solvent, water, an organic solvent can be cited. As the organic solvent, an ester-based solvent, a ketone-based solvent, an alcohol-based solvent, an amide-based solvent, an ether-based solvent, a carbonate-based solvent, a hydrocarbon-based solvent, and the like can be cited. As to details of these, reference can be made to paragraph 0223 of International Publication No. 2015 / 166779, and the content is incorporated into the present specification. Also, a cyclic alkyl-substituted ester-based solvent, a cyclic alkyl-substituted ketone-based solvent can be preferably used. As specific examples of the organic solvent, polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diglyme, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, 2-pentanone, 3-pentanone, 4-heptanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, sulfolane, anisole, 1,4-diacetyloxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (as an alternative name, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, propylene carbonate, methyl isobutyl ketone, and the like can be cited. However, sometimes for environmental reasons and the like, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, and the like) as the organic solvent are preferably reduced (for example, can be set to 50 parts per million (ppm) by mass or less, can be set to 10 ppm by mass or less, can be set to 1 ppm by mass or less, with respect to the total amount of the organic solvent).

[0202] The organic solvent can be used singly or two or more kinds can be used in combination.

[0203] In the case where two or more kinds of organic solvents are contained, as one of the preferable modes in the case where two or more kinds of organic solvents are used in combination, a mode in which a first organic solvent which is an ester-based solvent is used in combination with a second organic solvent which contains at least one kind of organic solvent selected from an ester-based solvent, a ketone-based solvent, an amide-based solvent, an ether-based solvent, a carbonate-based solvent, which is different from the first organic solvent can be cited. In this case, the boiling point of the second organic solvent is preferably 150 to 250°C. Also, the boiling point of the first organic solvent is preferably 100 to 200°C.

[0204] In the present application, an organic solvent having a small amount of metal is preferably used, and the amount of metal in the organic solvent is, for example, preferably 10 parts per billion (ppb) by mass or less. If necessary, an organic solvent in the order of parts per trillion (ppt) by mass can also be used, and such an organic solvent is, for example, provided by TOYO Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

[0205] As a method for removing metal and the like as impurities from the organic solvent, for example, distillation (molecular distillation or thin film distillation, or the like) or filtration using a filter can be given. As the filter pore diameter of the filter used in the filtration, 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less is preferable. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0206] The organic solvent can contain isomers (compounds having the same number of atoms but different structures). Also, the isomers can include only one kind, or can include a plurality of kinds.

[0207] The content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially does not contain peroxide.

[0208] In the case where the infrared absorbing composition of the present application is used as an ink composition, water or a mixed solvent of water and a water-soluble organic solvent is preferably used as the solvent.

[0209] As the water-soluble organic solvent, polyhydric alcohols such as glycerol, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,3-butanediol, and 2,3-butanediol can be given.

[0210] Sugar alcohols;

[0211] Alkyl alcohols having 1 to 4 carbon atoms such as ethanol, methanol, butanol, propanol, and isopropanol;

[0212] Aliphatic diols such as 2-ethyl-2-methyl-1,3-propanediol, 3,3-dimethyl-1,2-butanediol, 2,2-diethyl-1,3-propanediol, 2-ethyl-1,3-hexanediol, and 2,2,4-trimethyl-1,3-pentanediol;

[0213] glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-iso-propyl ether, diethylene glycol mono-iso-propyl ether, ethylene glycol mono-n-butyl ether, ethylene glycol mono-t-butyl ether, diethylene glycol mono-t-butyl ether, triethylene glycol monoethyl ether, 1-methyl-l-methoxybutanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-t-butyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-iso-propyl ether, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-iso-propyl ether, tripropylene glycol monomethyl ether, and the like.

[0214] The proportion of water in the mixed solvent is preferably 30 to 99% by mass, more preferably 40 to 99% by mass, and further preferably 50 to 99% by mass.

[0215] The content of the solvent is preferably 10 to 97% by mass relative to the total amount of the infrared absorbing composition. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, still further preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less. The infrared absorbing composition can contain only one kind of solvent, or can contain two or more kinds of solvents. In the case where two or more kinds of solvents are contained, the total amount thereof is preferably within the above range.

[0216] Other infrared absorbers

[0217] The infrared absorbing composition of the present application can contain an infrared absorber other than the above specific particles (other infrared absorber). By further containing the other infrared absorber, a film capable of shielding infrared rays in a wider wavelength range can be formed. The other infrared absorber can be a dye or a pigment (particle). As the other infrared absorber, pyrrolopyrrole compounds, cyanine compounds, squarine compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, methine azo compounds, anthraquinone compounds, diphthalofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, and the like can be given. As the pyrrolopyrrole compounds, the compounds described in paragraphs 0016 to 0058 of Japanese Patent Application Publication No. 2009-263614, the compounds described in paragraphs 0037 to 0052 of Japanese Patent Application Publication No. 2011-068731, the compounds described in paragraphs 0010 to 0033 of International Publication No. 2015 / 166873, and the like can be given. As the squarine compounds, the compounds described in paragraphs 0044 to 0049 of Japanese Patent Application Publication No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, the compounds described in paragraph 0040 of International Publication No. 2016 / 181987, the compounds described in Japanese Patent Application Publication No. 2015-176046, the compounds described in paragraph 0072 of International Publication No. 2016 / 190162, the compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Publication No. 2016-074649, the compounds described in paragraph 0124 of Japanese Patent Application Publication No. 2017-067963, the compounds described in International Publication No. 2017 / 135359, the compounds described in Japanese Patent Application Publication No. 2017-114956, the compounds described in Japanese Patent No. 6197940, the compounds described in International Publication No. 2016 / 120166, and the like can be given. As the cyanine compounds, the compounds described in paragraphs 0044 to 0045 of Japanese Patent Application Publication No. 2009-108267, the compounds described in paragraphs 0026 to 0030 of Japanese Patent Application Publication No. 2002-194040, the compounds described in Japanese Patent Application Publication No. 2015-172004, the compounds described in Japanese Patent Application Publication No. 2015-172102, the compounds described in Japanese Patent Application Publication No. 2008-088426, the compounds described in paragraph 0090 of International Publication No. 2016 / 190162, the compounds described in Japanese Patent Application Publication No. 2017-031394, and the like can be given.As the ketylium compound, a compound described in Japanese Patent Application Laid-Open No. 2017-082029 can be given. As the iminium compound, for example, a compound described in Japanese Patent Application Laid-Open No. 2008-528706, a compound described in Japanese Patent Application Laid-Open No. 2012-012399, a compound described in Japanese Patent Application Laid-Open No. 2007-092060, a compound described in paragraphs 0048 to 0063 of International Publication No. 2018 / 043564 can be given. As the phthalocyanine compound, a compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, a titanium phthalocyanine oxide described in Japanese Patent Application Laid-Open No. 2006-343631, a compound described in paragraphs 0013 to 0029 of Japanese Patent Application Laid-Open No. 2013-195480, a vanadium phthalocyanine compound described in Japanese Patent No. 6081771 can be given. As the naphthalocyanine compound, a compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153 can be given. As the dithiolene metal complex, a compound described in Japanese Patent No. 5733804 can be given. As the metal oxide, for example, indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide and the like can be given. As to the tungsten oxide, detailed contents can be referred to paragraph 0080 of Japanese Patent Application Laid-Open No. 2016-006476, which is incorporated into the present specification. As the metal boride, lanthanum boride and the like can be given. As the commercially available product of the lanthanum boride, LaB6-F (manufactured by JAPAN NEW METALS CO., LTD.) and the like can be given. Also, as the metal boride, a compound described in International Publication No. 2017 / 119394 can be used. As the commercially available product of the indium tin oxide, F-ITO (manufactured by DOWA HIGHTECH CO., LTD.) and the like can be given.

[0218] Further, as the infrared absorber, a squarylium compound described in Japanese Patent Application Publication No. 2017-197437, a squarylium compound described in Japanese Patent Application Publication No. 2017-025311, a squarylium compound described in International Publication No. 2016 / 154782, a squarylium compound described in Japanese Patent No. 5884953, a squarylium compound described in Japanese Patent No. 6036689, a squarylium compound described in Japanese Patent No. 5810604, a squarylium compound described in paragraphs 0090 to 0107 of International Publication No. 2017 / 213047, a compound containing a pyrrole ring described in paragraphs 0019 to 0075 of Japanese Patent Application Publication No. 2018-054760, a compound containing a pyrrole ring described in paragraphs 0078 to 0082 of Japanese Patent Application Publication No. 2018-040955, a compound containing a pyrrole ring described in paragraphs 0043 to 0069 of Japanese Patent Application Publication No. 2018-002773, a squarylium compound having an aromatic ring at the α position of an amide described in paragraphs 0024 to 0086 of Japanese Patent Application Publication No. 2018-041047, an amide-linked squarylium compound described in Japanese Patent Application Publication No. 2017-179131, a compound having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in Japanese Patent Application Publication No. 2017-141215, a dihydroxycarbazole bis-type squarylium compound described in Japanese Patent Application Publication No. 2017-082029, an asymmetric compound described in paragraphs 0027 to 0114 of Japanese Patent Application Publication No. 2017-068120, a compound containing a pyrrole ring (carbazole type) described in Japanese Patent Application Publication No. 2017-067963, a phthalocyanine compound described in Japanese Patent No. 6251530, and the like can also be used.

[0219] In the case where the infrared absorbing colorant constituting the specific particles is a compound represented by formula (PP-1), the other infrared absorber is preferably a pyrrolopyrrole compound, and more preferably a compound represented by formula (PP-100) from the viewpoint of obtaining more excellent dispersibility and being able to improve the storage stability and the like of the composition.

[0220] [Chemical Formula 12]

[0221]

[0222] In the formula, R 51a and R 51c each independently represent an alkyl group, a halogen atom, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a cyano group,

[0223] R 51b and R 51d each independently represent a substituent,

[0224] R 53 , R 54 , R 55 , and R 56 each independently represent a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group, or a heteroaryl,

[0225] R 57 , and R 58 each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR 59 R 60 , or a metal atom,

[0226] R 59 , and R 60 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group,

[0227] R 59 , and R 60 may be bonded to each other to form a ring,

[0228] R 57 may be covalently or coordinately bonded to R 53 or R 55 ,

[0229] R 58 may be covalently or coordinately bonded to R 54 or R 56 ,

[0230] n1 represents an integer of 0 to 4,

[0231] m1 represents an integer of 0 to 4.

[0232] The meanings of R 51a and R 51c in the formula (PP-100) are the same as those of R 1a in the formula (PP-1), and the preferable ranges are also the same. The meanings of R 51b and R 51d in the formula (PP-100) are the same as those of R 1b in the formula (PP-1), and the preferable ranges are also the same. The meanings of R 53 to R 58 in the formula (PP-100) are the same as those of R 3 to R 8 in the formula (PP-1), and the preferable ranges are also the same. n1 in the formula (PP-100) represents an integer of 0 to 4, preferably an integer of 0 to 2, and more preferably 0. m1 in the formula (PP-100) represents an integer of 0 to 4, preferably an integer of 0 to 2, and more preferably 0.

[0233] Specific examples of other infrared absorbers include infrared absorbing pigments B-1 to B-9 described in the examples described later.

[0234] The content of other infrared absorbers relative to 100 parts by mass of the aforementioned specific particles is preferably 5 to 1000 parts by mass, more preferably 10 to 500 parts by mass, and even more preferably 30 to 300 parts by mass. Furthermore, the total content of the aforementioned specific particles and other infrared absorbers is preferably 1% by mass or more, more preferably 5% by mass or more, and even more preferably 15% by mass or more in the total solid content of the infrared absorbing composition. The upper limit of the total content is preferably 70% by mass or less, more preferably 60% by mass or less, and even more preferably 50% by mass or less.

[0235] Because the infrared absorbing composition of the present invention contains the specific particles described above, it can form a film capable of blocking a wide range of infrared wavelengths even without using other infrared absorbers, and therefore can be substantially free of other infrared absorbers. "Substantially free of other infrared absorbers" means that the content of other infrared absorbers in the total solid component of the infrared absorbing composition is 0.1% by mass or less, preferably 0.05% by mass or less, and more preferably 0.01% by mass or less.

[0236] Pigment Derivatives

[0237] In addition to the specific particles described above, the infrared absorbing composition of the present invention may also contain pigment derivatives. Examples of pigment derivatives include compounds having a structure in which acid groups or basic groups are bonded to a pigment backbone.

[0238] Examples of pigment skeletons constituting pigment derivatives include squaric acid pigment skeletons, pyrrolopyrrole pigment skeletons, diketopyrrolopyrrole pigment skeletons, quinacridone pigment skeletons, anthraquinone pigment skeletons, dianthraquinone pigment skeletons, benzisoindole pigment skeletons, thiazide indigo pigment skeletons, azo pigment skeletons, quinoline yellow pigment skeletons, phthalocyanine pigment skeletons, naphthylphthalocyanine pigment skeletons, dioxazine pigment skeletons, perylene pigment skeletons, pyrene pigment skeletons, benzimidazolone pigment skeletons, benzothiazole pigment skeletons, benzimidazolone pigment skeletons, and benzoxazole pigment skeletons. Squaric acid pigment skeletons, pyrrolopyrrole pigment skeletons, diketopyrrolopyrrole pigment skeletons, phthalocyanine pigment skeletons, quinacridone pigment skeletons, and benzimidazolone pigment skeletons are preferred, and squaric acid pigment skeletons and pyrrolopyrrole pigment skeletons are more preferred.

[0239] Examples of acid groups include sulfonic acid groups, carboxyl groups, phosphate groups, borate groups, sulfonylimide groups, sulfonamide groups, and their salts. Examples of atoms or groups constituting salts include alkali metal ions (Li...). + Na + K +alkali metal ions (Li 2+ , Mg 2+ , etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions, etc.

[0240] As the basic group, amino group, pyridyl group and salts thereof, salts of ammonium group, and phthalimidemethyl group can be mentioned. As the atom or atomic group constituting the salt, hydroxide ion, halide ion, carboxylate ion, sulfonate ion, phenoxide ion, etc. can be mentioned.

[0241] As specific examples of the pigment derivative, compounds described in Japanese Patent Application Publication No. 56-118462, Japanese Patent Application Publication No. 63-264674, Japanese Patent Application Publication No. 01-217077, Japanese Patent Application Publication No. 03-009961, Japanese Patent Application Publication No. 03-026767, Japanese Patent Application Publication No. 03-153780, Japanese Patent Application Publication No. 03-045662, Japanese Patent Application Publication No. 04-285669, Japanese Patent Application Publication No. 06-145546, Japanese Patent Application Publication No. 06-212088, Japanese Patent Application Publication No. 06-240158, Japanese Patent Application Publication No. 10-030063, Japanese Patent Application Publication No. 10-195326, paragraphs 0086 to 0098 of International Publication No. 2011 / 024896, paragraphs 0063 to 0094 of International Publication No. 2012 / 102399 can be mentioned, which are incorporated into the present specification.

[0242] The content of the pigment derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the above specific particle. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. The pigment derivative can be used only one kind, or two or more kinds. When two or more kinds are used, the total amount is preferably within the above range.

[0243] Resin

[0244] The infrared absorbing composition of the present application can contain a resin. The resin is used, for example, for the purpose of dispersing particles of pigments and the like in the infrared absorbing composition or for the purpose of a binder. In addition, a resin mainly used for dispersing particles of pigments and the like is also referred to as a dispersant. However, such a use of the resin is an example, and the resin can also be used for purposes other than such a use.

[0245] The weight average molecular weight (Mw) of the resin is preferably 2000 to 2000000. The upper limit is preferably 1000000 or less, more preferably 500000 or less. The lower limit is preferably 3000 or more, more preferably 5000 or more.

[0246] As the resin, (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenyl resin, polyarylene ether phosphinoxide resin, polyimide resin, polyamide resin, polyamide-imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, and the like can be given. One of these resins can be used alone, or two or more of them can be used in combination. As the cyclic olefin resin, from the viewpoint of improving heat resistance, a norbornene resin is preferred. As a commercial product of the norbornene resin, for example, ARTON series (for example, ARTON F4520) manufactured by JSR CORPORATION, and the like can be given. Also, the resin can use the resin described in the Examples of International Publication No. 2016 / 088645. Also, in the case where the resin has a group containing an ethylenically unsaturated bond, especially a (meth)acryloyl group, in a side chain, it is also preferred that the main chain is bonded to the group containing an ethylenically unsaturated bond via a divalent linking group having an alicyclic structure.

[0247] The infrared absorbing composition of the present application preferably contains a resin having an acid group. The resin having an acid group can be used as an alkali-soluble resin. As for the resin having an acid group (alkali-soluble resin), the description of 0558 to 0571 of Japanese Patent Application Publication No. 2012-208494 (0685 to 0700 of the corresponding U.S. Patent Application Publication No. 2012 / 0235099), the description of 0076 to 0099 of Japanese Patent Application Publication No. 2012-198408 can be referred to, which are incorporated into the present specification. Also, the resin having an acid group can use a commercial product. Also, as a method of introducing an acid group to a resin, there is no particular limitation, for example, the method described in Japanese Patent No. 6349629 can be given. In addition, as a method of introducing an acid group to a resin, the method of introducing an acid group by reacting an acid anhydride with a hydroxyl group generated in the ring-opening reaction of an epoxy group can be given.

[0248] As the kind of the acid group possessed by the resin having an acid group, a carboxyl group, a phosphoric acid group, a sulfonic acid group, a phenolic hydroxyl group, and the like can be given, and a carboxyl group is preferred.

[0249] The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 300 mgKOH / g or less, further preferably 200 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having an acid group is preferably 5000 to 100000. Also, the number average molecular weight (Mn) of the resin having an acid group is preferably 1000 to 20000.

[0250] The resin having an acid group preferably contains a repeating unit having an acid group in a side chain, more preferably contains 5 to 70 mol% of a repeating unit having an acid group in a side chain among all the repeating units of the resin. The upper limit of the content of the repeating unit having an acid group in a side chain is preferably 50 mol% or less, more preferably 30 mol% or less. The lower limit of the content of the repeating unit having an acid group in a side chain is preferably 10 mol% or more, more preferably 20 mol% or more.

[0251] As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by the following formula (ED1) and / or a compound represented by the following formula (ED2) (hereinafter, these compounds are sometimes referred to as "ether dimer".).

[0252] [Chemical Formula 13]

[0253]

[0254] In formula (ED1), R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which can have a substituent.

[0255] [Chemical Formula 14]

[0256]

[0257] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As specific examples of formula (ED2), reference can be made to the description of Japanese Patent Application Laid-Open No. 2010-168539.

[0258] As to specific examples of the ether dimer, reference can be made to paragraph 0317 of Japanese Patent Application Laid-Open No. 2013-029760, which is incorporated into the present specification.

[0259] As the resin, it is also preferable to use a resin containing a repeating unit having a polymerizable group. As the polymerizable group, (meth)allyl, (meth)acryloyl and the like can be given.

[0260] As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X).

[0261] [Chemical Formula 15]

[0262]

[0263] In the formula, R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 each independently represent an alkylene group, and n represents an integer of 0 to 15.21 and R 22 The number of carbon atoms of the alkylene group represented by R1is preferably from 1 to 10, more preferably from 1 to 5, further preferably from 1 to 3, and particularly preferably 2 or 3. n represents an integer from 0 to 15, preferably an integer from 0 to 5, more preferably an integer from 0 to 4, and further preferably an integer from 0 to 3.

[0264] As the compound represented by formula (X), a (meth)acrylate modified with an oxirane or an oxetane of p-cumylphenol can be given. As a commercially available product, ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) or the like can be given.

[0265] The infrared absorbing composition of the present application can also contain a resin as a dispersant. As the dispersant, an acidic dispersant (acidic resin), an alkaline dispersant (alkaline resin) can be given. Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is more than the amount of basic groups. As the acidic dispersant (acidic resin), when the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, a resin in which the amount of acid groups is 70 mol% or more is preferred. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably from 10 to 105 mgKOH / g. Further, the alkaline dispersant (alkaline resin) means a resin in which the amount of basic groups is more than the amount of acid groups. As the alkaline dispersant (alkaline resin), when the total amount of the amount of acid groups and the amount of basic groups is set to 100 mol%, a resin in which the amount of basic groups exceeds 50 mol% is preferred. The basic group possessed by the alkaline dispersant is preferably an amino group.

[0266] The resin used as the dispersant is also preferably a graft resin. The details of the graft resin can be referred to the description of paragraphs 0025 to 0094 of Japanese Patent Application Publication No. 2012-255128, which is incorporated into the present specification.

[0267] The resin used as the dispersant is also preferably a polyimine-based dispersant containing a nitrogen atom at least one of a main chain and a side chain. As the polyimine-based dispersant, a resin having a main chain containing a partial structure having a functional group having a pKa of 14 or less and a side chain having an atomic number of 40 to 10,000, and having a basic nitrogen atom at least one of the main chain and the side chain is preferred. The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom that is basic. As for the polyimine-based dispersant, the description of paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128 can be referred to, which is incorporated into the present specification.

[0268] The resin used as the dispersant is also preferably a resin having a structure in which a plurality of polymer chains are bonded to the core. As such a resin, for example, dendrimers (including star polymers) can be given. Also, as specific examples of the dendrimers, the high-molecular-weight compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Publication No. 2013-043962 can be given.

[0269] The resin used as the dispersant is also preferably a resin including a repeating unit having a group containing an ethylenically unsaturated bond in a side chain. The content of the repeating unit having a group containing an ethylenically unsaturated bond in a side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and further preferably 20 to 70 mol%, in all the repeating units of the resin. Also, the dispersant can use the resin described in Japanese Patent Application Publication No. 2018-087939.

[0270] The dispersant can also be obtained as a commercial product, and as such specific examples, the DISPERBYK series manufactured by BYK Japan KK, the SOLSPERSE series manufactured by Lubrizol Japan Limited., the Efka series manufactured by BASF, the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Inc., and the like can be given. Also, the product described in paragraph 0129 of Japanese Patent Application Publication No. 2012-137564 and the product described in paragraph 0235 of Japanese Patent Application Publication No. 2017-194662 can also be used as the dispersant.

[0271] Also, the resin used as the dispersant can use the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077.

[0272] The content of the resin is preferably 1 to 50 mass% in the total solid content of the infrared absorbing composition. The lower limit is preferably 5 mass% or more, and more preferably 7 mass% or more. The upper limit is preferably 40 mass% or less, and more preferably 30 mass% or less.

[0273] Also, in the case where the infrared absorbing composition of the present application contains a resin as a dispersant, the content of the resin as the dispersant is preferably 0.1 to 40 mass% in the total solid content of the infrared absorbing composition. The upper limit is preferably 20 mass% or less, and further preferably 10 mass% or less. The lower limit is preferably 0.5 mass% or more, and further preferably 1 mass% or more. Also, the content of the resin as the dispersant is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the above specific particles. The upper limit is preferably 80 parts by mass or less, and more preferably 60 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

[0274] The infrared absorbing composition of the present application can contain only one resin, or can contain two or more. In the case of containing two or more, the total amount thereof is preferably within the above range.

[0275] Curing compound

[0276] The infrared absorbing composition of the present application can contain a curing compound. As the curing compound, a publicly known compound capable of crosslinking by radicals, acid, or heat can be used. As the curing compound, a compound having a group containing an ethylenic unsaturated bond, a compound having a cyclic ether group, or the like can be mentioned, and a compound having a group containing an ethylenic unsaturated bond is preferred. As the group containing an ethylenic unsaturated bond, a vinyl group, a (methyl)allyl group, a (methyl)acryloyl group, or the like can be mentioned. As the cyclic ether group, an epoxy group, an oxetanyl group, or the like can be mentioned. The curing compound used in the present application is preferably a polymerizable compound, and more preferably a radical polymerizable compound.

[0277] Polymerizable compound

[0278] As the polymerizable compound, any one of a monomer, a prepolymer, an oligomer, or the like in the chemical manner can be used, and a monomer is preferred. The molecular weight of the polymerizable compound is preferably 100 to 3000. The upper limit is more preferably 2000 or less, and further preferably 1500 or less. The lower limit is more preferably 150 or more, and further preferably 250 or more.

[0279] The polymerizable compound is preferably a multifunctional polymerizable monomer. Furthermore, the multifunctional polymerizable monomer is preferably a compound containing three or more groups containing an ethylenic unsaturated bond, more preferably a compound containing three to fifteen groups containing an ethylenic unsaturated bond, and further preferably a compound containing three to six groups containing an ethylenic unsaturated bond. Furthermore, the multifunctional polymerizable monomer is preferably a (meth)acrylate compound of three to fifteen functions, and more preferably a (meth)acrylate compound of three to six functions. As specific examples of the polymerizable compound, the compounds described in paragraphs 0095 to 0108 of Japanese Patent Application Publication No. 2009-288705, paragraph 0227 of Japanese Patent Application Publication No. 2013-029760, paragraphs 0254 to 0257 of Japanese Patent Application Publication No. 2008-292970, paragraphs 0034 to 0038 of Japanese Patent Application Publication No. 2013-253224, paragraph 0477 of Japanese Patent Application Publication No. 2012-208494, Japanese Patent Application Publication No. 2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and Japanese Patent Application Publication No. 2017-194662 can be mentioned, and these contents are incorporated into the present specification.

[0280] As the polymerizable compound, di-pentaerythritol triacrylate (as a commercial product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), di-pentaerythritol tetraacrylate (as a commercial product, KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), di-pentaerythritol penta(meth)acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), di-pentaerythritol hexa(meth)acrylate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; manufactured by Shin Nakamura Chemical Co., Ltd.), and a compound of a structure in which the (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues (for example, SR454, SR499, which are commercially available from SARTOMER Company, Inc.) are preferred. Also, as the polymerizable compound, di-glycerin EO (ethylene oxide) modified (meth)acrylate (as a commercial product, M-460; manufactured by TOAGOSEI CO., Ltd.), pentaerythritol tetraacrylate (manufactured by Shin Nakamura Chemical Co., Ltd., NK Ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI CO., Ltd.), NK Oligo UA-7200 (manufactured by Shin Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-AO (manufactured by KYOEISHA CHEMICAL Co., LTD.), and the like can also be used.

[0281] Also, as the polymerizable compound, it is also preferable to use a 3-functional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane epoxy propane-modified tri(meth)acrylate, trimethylolpropane epoxy ethane-modified tri(meth)acrylate, isocyanuric acid epoxy ethane-modified tri(meth)acrylate, pentaerythritol tri(meth)acrylate. As a commercially available product of the 3-functional (meth)acrylate compound, ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.), and the like can be mentioned.

[0282] The polymerizable compound can also use a compound having an acid group. By using a polymerizable compound having an acid group, the polymerizable compound of the unexposed portion is easily removed at the time of development, and generation of development residue can be suppressed. As the acid group, a carboxyl group, a sulfonic acid group, a phosphoric acid group, and the like can be mentioned, and a carboxyl group is preferable. As a commercially available product of the polymerizable compound having an acid group, ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like can be mentioned. The acid value of the polymerizable compound having an acid group is preferably 0.1 to 40 mgKOH / g, and more preferably 5 to 30 mgKOH / g. If the acid value of the polymerizable compound is 0.1 mgKOH / g or more, the solubility in the developer is good, and if it is 40 mgKOH / g or less, it is advantageous in terms of manufacturing and handling.

[0283] It is also preferable that the polymerizable compound be a compound having a caprolactone structure. As the polymerizable compound having a caprolactone structure, for example, DPCA-20, DPCA-30, DPCA-60, DPCA-120, and the like are commercially available as the KAYARAD DPCA series from Nippon Kayaku Co., Ltd.

[0284] As the polymeric compound, a polymeric compound having an alkylene oxide group can also be used. The polymeric compound having an alkylene oxide group is preferably a polymeric compound having an ethylene oxide group and / or a propylene oxide group, more preferably a polymeric compound having an ethylene oxide group, and further preferably a 3- to 6-functional (meth)acrylate compound having 4 to 20 ethylene oxide groups. As commercially available products of the polymeric compound having an alkylene oxide group, for example, 4-functional (meth)acrylate SR-494 having 4 ethylene oxide groups manufactured by Sartomer Company, Inc., 3-functional (meth)acrylate KAYARAD TPA-330 having 3 isobutylene oxide groups manufactured by Nippon Kayaku Co., Ltd., and the like can be given.

[0285] As the polymeric compound, a polymeric compound having a fluorene skeleton can also be used. As commercially available products of the polymeric compound having a fluorene skeleton, OGSOL FA-0200, EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomer having a fluorene skeleton), and the like can be given.

[0286] As the polymeric compound, a compound substantially containing no environmental regulation substance such as toluene is also preferably used. As commercially available products of such a compound, KAYARAD DPHA LT, KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.), and the like can be given.

[0287] As the polymerizable compound, a urethane acrylate compound described in Japanese Patent No. 48-041708, Japanese Patent Laid-Open No. 51-037193, Japanese Patent No. 02-032293, Japanese Patent No. 02-016765, or a urethane compound having an oxirane skeleton described in Japanese Patent No. 58-049860, Japanese Patent No. 56-017654, Japanese Patent No. 62-039417, Japanese Patent No. 62-039418 is also preferable. Further, a polymerizable compound having an amino structure or a thioether structure in the molecule described in Japanese Patent Laid-Open No. 63-277653, Japanese Patent Laid-Open No. 63-260909, Japanese Patent Laid-Open No. 01-105238 is also preferable. Further, as the polymerizable compound, commercially available products such as UA-7200 (manufactured by Shin Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by KYOEISHA CHEMICAL Co., LTD.) can also be used.

[0288] (compound having a cyclic ether group)

[0289] The compound having a cyclic ether group used as the curable compound is preferably a compound having an epoxy group. As the compound having an epoxy group, a compound having one or more epoxy groups in one molecule, preferably a compound having two or more epoxy groups can be given. The epoxy group is preferably 1 to 100 in one molecule. The upper limit of the epoxy group can be, for example, 10 or less, or 5 or less. The lower limit of the epoxy group is preferably two or more. As the compound having an epoxy group, the compound described in paragraphs 0034 to 0036 of Japanese Patent Laid-Open No. 2013-011869, the compound described in paragraphs 0147 to 0156 of Japanese Patent Laid-Open No. 2014-043556, the compound described in paragraphs 0085 to 0092 of Japanese Patent Laid-Open No. 2014-089408, or the compound described in Japanese Patent Laid-Open No. 2017-179172 can also be used.

[0290] The compound having an epoxy group can be a low molecular compound (e.g., a molecular weight of less than 2000, and further, a molecular weight of less than 1000) or a macromolecule (e.g., in the case of a polymer having a molecular weight of 1000 or more, a weight average molecular weight of 1000 or more). The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and further preferably 3,000 or less.

[0291] As the compound having an epoxy group, an epoxy resin can be preferably used. As the epoxy resin, for example, an epoxy resin of a glycidyl ether compound of a phenol compound, an epoxy resin of a glycidyl ether compound of various novolak resins, an alicyclic epoxy resin, an aliphatic epoxy resin, a heterocyclic epoxy resin, a glycidyl ester epoxy resin, a glycidyl amine epoxy resin, an epoxy resin obtained by glycidylating a halogenated phenol, a fused compound of a silicon compound having an epoxy group and a silicon compound other than the same, a copolymer of a polymerizable unsaturated compound having an epoxy group and another polymerizable unsaturated compound other than the same, and the like can be exemplified. The epoxy equivalent of the epoxy resin is preferably 310 to 3,300 g / eq, more preferably 310 to 1,700 g / eq, and further preferably 310 to 1,000 g / eq. As a commercial product of the compound having a cyclic ether group, for example, EHPE 3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC CORPORATION), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (all of which are manufactured by NOF CORPORATION, and contain an epoxy group-containing polymer), and the like can be exemplified.

[0292] The content of the curable compound in the total solid content of the infrared absorbing composition is preferably 0.1 to 50 mass%. The lower limit is more preferably 0.5 mass% or more, and further preferably 1 mass% or more. The upper limit is more preferably 45 mass% or less, and further preferably 40 mass% or less. The curable compound can be one kind alone or two or more kinds in combination. In the case of two or more kinds in combination, the total of them is preferably within the above range.

[0293] In the case where the infrared absorbing composition of the present application contains a polymerizable compound as the curable compound, the content of the polymerizable compound in the total solid content of the infrared absorbing composition is preferably 0.1 to 50 mass%. The lower limit is more preferably 0.5 mass% or more, and further preferably 1 mass% or more. The upper limit is more preferably 45 mass% or less, and further preferably 40 mass% or less. The polymerizable compound can be one alone or two or more in combination. In the case of two or more in combination, the total of them is preferably within the above range.

[0294] In the case where the infrared absorbing composition of the present application contains a compound having a cyclic ether group as the curable compound, the content of the compound having a cyclic ether group in the total solid content of the infrared absorbing composition is preferably 0.1 to 20 mass%. The lower limit is preferably 0.5 mass% or more, and more preferably 1 mass% or more. The upper limit is preferably 15 mass% or less, and further preferably 10 mass% or less. The compound having a cyclic ether group can be one alone or two or more in combination. In the case of two or more in combination, the total of them is preferably within the above range.

[0295] In the case where the infrared absorbing composition of the present application contains a polymerizable compound and a compound having a cyclic ether group as the curable compound, the content of the compound having a cyclic ether group is preferably 1 to 400 parts by mass, and more preferably 1 to 100 parts by mass, relative to 100 parts by mass of the polymerizable compound.

[0296] Photopolymerization Initiator

[0297] In the case where the infrared absorbing composition of the present application contains a polymerizable compound, the infrared absorbing composition of the present application preferably further contains a photopolymerization initiator. As the photopolymerization initiator, there is no particular limitation, and it can be appropriately selected from publicly known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0298] As the photopolymerization initiator, halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, and the like), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-aminoketone compounds, and the like can be given. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyl triazine compound, a benzyl dimethyl ketal compound, an α-hydroxy ketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a triaryl imidazole dimer, an onium compound, a benzothiazole compound, a benzophenone compound, a phenylethanone compound, a cyclopentadiene-benzene-iron complex, a halomethyl oxadiazole compound, and a 3-aryl-substituted coumarin compound, more preferably a compound selected from the group consisting of an oxime compound, an α-hydroxy ketone compound, an α-aminoketone compound, and an acylphosphine compound, and further preferably an oxime compound. Also, as the photopolymerization initiator, the compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Publication No. 2014-130173, the compounds described in Japanese Patent No. 6301489, the peroxide photopolymerization initiators described in MATERIAL STAGE 37-60p, vol. 19, No. 3, 2019, the photopolymerization initiators described in International Publication No. 2018 / 221177, the photopolymerization initiators described in International Publication No. 2018 / 110179, the photopolymerization initiators described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiators described in Japanese Patent Application Publication No. 2019-044030, and the peroxide initiators described in Japanese Patent Application Publication No. 2019-167313 can be given, and these contents are incorporated into the present specification.

[0299] As commercially available products of the α-hydroxy ketone compounds, there are, for example, Omnirad 184, Omnirad 1173, Omnifad 2959, Omnirad 127 (all manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (all manufactured by BASF). As commercially available products of the α-amino ketone compounds, there are, for example, Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF). As commercially available products of the acyl phosphine compounds, there are, for example, Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF).

[0300] As the oxime compound, there can be mentioned the compound described in Japanese Patent Application Laid-Open No. 2001-233842, the compound described in Japanese Patent Application Laid-Open No. 2000-080068, the compound described in Japanese Patent Application Laid-Open No. 2006-342166, the compound described in J.C.S. Perkin II (1979, pp. 1653-1660), the compound described in J.C.S. Perkin II (1979, pp. 156-162), the compound described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), the compound described in Japanese Patent Application Laid-Open No. 2000-066385, the compound described in Japanese Patent Application Laid-Open No. 2004-534797, the compound described in Japanese Patent Application Laid-Open No. 2017-019766, the compound described in Japanese Patent No. 6065596, the compound described in International Publication No. 2015 / 152153, the compound described in International Publication No. 2017 / 051680, the compound described in Japanese Patent Application Laid-Open No. 2017-198865, the compound described in paragraphs 0025 to 0038 of International Publication No. 2017 / 164127, the compound described in International Publication No. 2013 / 167515, and the like. As specific examples of the oxime compound, there can be mentioned 3-benzoyloxyiminobutane-2-one, 3-acetyloxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetyloxyiminopentane-3-one, 2-acetyloxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutane-2-one, and 2-ethyloxycarbonyloxyimino-1-phenylpropane-1-one, and the like. As commercially available products, there can be mentioned Irgacure-OXE01, Irgacure-OXE02, Irgacure-OXE03, Irgacure-OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, the photopolymerization initiator 2 described in Japanese Patent Application Laid-Open No. 2012-014052). Furthermore, as the oxime compound, it is also preferable to use a compound which is not colored or a compound which is high in transparency and is not easily discolored. As commercially available products, there can be mentioned ADEKA ARKLS NCI-730, NCI-831, NCI-930 (all manufactured by ADEKA CORPORATION), and the like.

[0301] As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. As specific examples of the oxime compound having a fluorene ring, the compounds described in Japanese Patent Application Publication No. 2014-137466 and the compounds described in Japanese Patent No. 06636081 can be given.

[0302] As the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring in a carbazole ring is a naphthalene ring can also be used. As specific examples of such an oxime compound, the compounds described in International Publication No. 2013 / 083505 can be given.

[0303] As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. As specific examples of the oxime compound having a fluorine atom, the compounds described in Japanese Patent Application Publication No. 2010-262028, the compounds 24, 36 to 40 described in Japanese Patent Application Laid-Open No. 2014-500852, and the compound (C-3) described in Japanese Patent Application Laid-Open No. 2013-164471 can be given.

[0304] As the photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is also preferably provided as a dimer. As specific examples of the oxime compound having a nitro group, the compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249, paragraphs 0008 to 0012 and paragraphs 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, and ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION) can be given.

[0305] As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. As specific examples, OE-01 to OE-75 described in International Publication No. 2015 / 036910 can be given.

[0306] As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. As such a photopolymerization initiator, the compounds described in International Publication No. 2019 / 088055 can be given.

[0307] Specific examples of the oxime compound preferably used in the present application are shown below, but the present application is not limited to these.

[0308] [Chemical Formula 16]

[0309]

[0310] [Chemical Formula 17]

[0311]

[0312] The oxime compound preferably has an absorption wavelength maximum in the range of 350 to 500 nm, more preferably in the range of 360 to 480 nm. Also, from the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300000, further preferably 2000 to 300000, and particularly preferably 5000 to 200000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to use a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) and to measure at a concentration of 0.01 g / L using ethyl acetate solvent.

[0313] As the photopolymerization initiator, a 2-functional or 3-functional or more photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, 2 or more radicals are generated from one molecule of the photoradical polymerization initiator, and thus good sensitivity can be obtained. Also, in the case of using a compound having an asymmetric structure, the crystallinity decreases and the solubility to solvents and the like is improved, and the composition becomes less likely to precipitate over time, and thus the stability of the composition over time can be improved. As specific examples of the 2-functional or 3-functional or more photoradical polymerization initiator, mention can be made of the dimers of the oxime compounds described in Japanese Patent Application Publication No. 2010-527339, Japanese Patent Application Publication No. 2011-524436, International Publication No. WO 2015 / 004565, paragraphs 0407 to 0412 of Japanese Patent Application Publication No. 2016-532675, International Publication No. WO 2017 / 033680, paragraphs 0039 to 0055, the compounds (E) and (G) described in Japanese Patent Application Publication No. 2013-522445, Cmpd1 to 7 described in International Publication No. WO 2016 / 034963, the oxime ester-based photoinitiators described in Japanese Patent Application Publication No. 2017-523465, paragraph 0007, the photoinitiators described in Japanese Patent Application Publication No. 2017-167399, paragraphs 0020 to 0033, the photopolymerization initiator (A) described in Japanese Patent Application Publication No. 2017-151342, paragraphs 0017 to 0026, the oxime ester photoinitiators described in Japanese Patent No. 6469669, and the like.

[0314] The content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 30% by mass, and further preferably 1 to 20% by mass, in the total solid content of the infrared absorbing composition. The infrared absorbing composition can contain only one photopolymerization initiator, or can contain two or more. In the case of containing two or more, the total amount thereof is preferably within the above range.

[0315] Coloring agent

[0316] The infrared absorbing composition of the present application can contain a color coloring agent. In the present application, the color coloring agent refers to a coloring agent other than a white coloring agent and a black coloring agent. The color coloring agent is preferably a coloring agent having an absorption wavelength in the range of a wavelength of 400 nm or more and less than 650 nm.

[0317] As the color coloring agent, a red coloring agent, a green coloring agent, a blue coloring agent, a yellow coloring agent, a violet coloring agent, and an orange coloring agent can be given. The color coloring agent can be a pigment or a dye. A pigment and a dye can be used in combination. Furthermore, the pigment can be any one of an inorganic pigment and an organic pigment. Furthermore, a material in which an organic chromophore is substituted for a part of an inorganic pigment or an organic-inorganic pigment can also be used in the pigment. By substituting an organic chromophore for an inorganic pigment or an organic-inorganic pigment, hue design can be easily performed.

[0318] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and further preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the infrared absorbing composition is good. In the present application, the primary particle diameter of the pigment can be obtained by observing the primary particles of the pigment with a transmission electron microscope and calculating from the obtained image photograph. Specifically, the projected area of the primary particles of the pigment is calculated, and the circle equivalent diameter corresponding thereto is calculated as the primary particle diameter of the pigment. Furthermore, the average primary particle diameter in the present application is set to the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, the primary particles of the pigment refer to independent particles that have not been aggregated.

[0319] The color coloring agent preferably contains a pigment. The content of the pigment in the color coloring agent is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and particularly preferably 90% by mass or more. As the pigment, the pigments shown below can be given.

[0320] C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine-based), 233 (quinoline-based), 234 (aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), and the like (the above are yellow pigments),

[0321] C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, and the like (the above are orange pigments),

[0322] C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (Xanthene-based, Organo Ultramarine, Bluish Red), 295 (monoazo-based), 296 (diazo-based), 297 (aminoketone), etc. (above, red pigments),

[0323] C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine-based), 65 (phthalocyanine-based), 66 (phthalocyanine-based), etc. (above, green pigments),

[0324] C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (Xanthene-based), etc. (above, violet pigments),

[0325] C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo-based), 88 (methine-based), etc. (above, blue pigments).

[0326] Further, as the green pigment, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms in one molecule, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms can be used. As specific examples, the compounds described in International Publication No. 2015 / 118720 can be given. Further, as the green pigment, the compounds described in Chinese Patent Application No. 106909027, the phthalocyanine compounds having the phosphoric acid ester described in International Publication No. 2012 / 102395 as a ligand, the phthalocyanine compounds described in Japanese Patent Application Publication No. 2019-008014, the phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, the compounds described in Japanese Patent Application Publication No. 2019-038958, and the like can also be used.

[0327] Further, as the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. As specific examples, the compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Application Publication No. 2011-157478 can be given.

[0328] Also, as the yellow pigment, it is possible to use the compound described in Japanese Patent Application Publication No. 2017-201003, the compound described in Japanese Patent Application Publication No. 2017-197719, the compound described in paragraphs 0011 to 0062, 0137 to 0276 of Japanese Patent Application Publication No. 2017-171912, the compound described in paragraphs 0010 to 0062, 0138 to 0295 of Japanese Patent Application Publication No. 2017-171913, the compound described in paragraphs 0011 to 0062, 0139 to 0190 of Japanese Patent Application Publication No. 2017-171914, the compound described in paragraphs 0010 to 0065, 0142 to 0222 of Japanese Patent Application Publication No. 2017-171915, the quinoline yellow compound described in paragraphs 0011 to 0034 of Japanese Patent Application Publication No. 2013-054339, the quinoline yellow compound described in paragraphs 0013 to 0058 of Japanese Patent Application Publication No. 2014-026228, the isoindoline compound described in Japanese Patent Application Publication No. 2018-062644, the quinoline yellow compound described in Japanese Patent Application Publication No. 2018-203798, the quinoline yellow compound described in Japanese Patent Application Publication No. 2018-062578, the quinoline yellow compound described in Japanese Patent No. 6432076, the quinoline yellow compound described in Japanese Patent Application Publication No. 2018-155881, the quinoline yellow compound described in Japanese Patent Application Publication No. 2018-111757, the quinoline yellow compound described in Japanese Patent Application Publication No. 2018-040835, the quinoline yellow compound described in Japanese Patent Application Publication No. 2017-197640, the quinoline yellow compound described in Japanese Patent Application Publication No. 2016-145282, the quinoline yellow compound described in Japanese Patent Application Publication No. 2014-085565, the quinoline yellow compound described in Japanese Patent Application Publication No. 2014-021139, the quinoline yellow compound described in Japanese Patent Application Publication No. 2013-209614, the quinoline yellow compound described in Japanese Patent Application Publication No. 2013-209435, the quinoline yellow compound described in Japanese Patent Application Publication No. 2013-181015, the quinoline yellow compound described in Japanese Patent Application Publication No. 2013-061622, the quinoline yellow compound described in Japanese Patent Application Publication No. 2013-032486, the quinoline yellow compound described in Japanese Patent Application Publication No. 2012-226110, the quinoline yellow compound described in Japanese Patent Application Publication No. 2008-074987, the quinoline yellow compound described in Japanese Patent Application Publication No. 2008-081565, the quinoline yellow compound described in Japanese Patent Application Publication No. 2008-074986, the quinoline yellow compound described in Japanese Patent Application Publication No. 2008-074985,The quinoline yellow compound described in Japanese Patent Application Publication No. 2008-050420, the quinoline yellow compound described in Japanese Patent Application Publication No. 2008-031281, the quinoline yellow compound described in Japanese Patent Application Publication No. 48-032765, the quinoline yellow compound described in Japanese Patent Application Publication No. 2019-008014, the quinoline yellow compound described in Japanese Patent No. 6607427, the compound described in Korean Patent Publication No. 10-2014-0034963, the compound described in Japanese Patent Application Publication No. 2017-095706, the compound described in Taiwan Patent Application Publication No. 201920495, the compound described in Japanese Patent No. 6607427, the compound described in Japanese Patent Application Publication No. 2020-033525, the compound described in Japanese Patent Application Publication No. 2020-033524, the compound described in Japanese Patent Application Publication No. 2020-033523, the compound described in Japanese Patent Application Publication No. 2020-033522, the compound described in Japanese Patent Application Publication No. 2020-033521, the compound described in International Publication No. 2020 / 045200, the compound described in International Publication No. 2020 / 045199, and the compound described in International Publication No. 2020 / 045197. Also, from the viewpoint of improving the color value, it is also preferable to use a substance in which these compounds are polymerized.

[0329] As the red pigment, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in Japanese Patent Application Publication No. 2017-201384, a diketopyrrolopyrrole compound described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838, a diketopyrrolopyrrole compound described in International Publication No. 2012 / 102399, a diketopyrrolopyrrole compound described in International Publication No. 2012 / 117965, a naphtholazo compound described in Japanese Patent Application Publication No. 2012-229344, and the like can also be used. Also, as the red pigment, a compound having a structure in which an aromatic ring group having a group in which an oxygen atom, a sulfur atom, or a nitrogen atom is bonded is bonded to a diketopyrrolopyrrole skeleton can also be used.

[0330] In the present application, a dye can also be used in the color colorant. There is no particular limitation on the dye, and a publicly known dye can be used. For example, a pyrazole azo-based dye, an anilino azo-based dye, a triarylmethane-based dye, an anthraquinone-based dye, an anthrapyridone-based dye, a benzylidene-based dye, an oxonol-based dye, a pyrazolotriazole azo-based dye, a pyridone azo-based dye, a cyanine-based dye, a phenothiazine-based dye, a pyrrolopyrazolomethine-based dye, a xanthene-based dye, a phthalocyanine-based dye, a benzopyran-based dye, an indigo-based dye, a pyrromethene-based dye, and the like can be given. Also, a thiazole compound described in Japanese Patent Application Publication No. 2012-158649, an azo compound described in Japanese Patent Application Publication No. 2011-184493, and an azo compound described in Japanese Patent Application Publication No. 2011-145540 can also be preferably used in the dye.

[0331] In the case where the infrared absorbing composition of the present application contains a color colorant, the content of the color colorant is preferably 1 to 50% by mass in the total solid components of the infrared absorbing composition of the present application. In the case where the infrared absorbing composition of the present application contains two or more color colorants, the total amount of them is preferably within the above range.

[0332] Colorant that transmits infrared rays and shields visible light

[0333] The infrared absorbing composition of the present application can also contain a colorant that transmits infrared rays and shields visible light (hereinafter, also referred to as a colorant that shields visible light). The infrared absorbing composition containing the colorant that shields visible light can be preferably used as an infrared absorbing composition for forming an infrared transmitting filter.

[0334] The colorant that shields visible light is preferably a colorant that absorbs light in the wavelength region from violet to red. Also, the colorant that shields visible light is preferably a colorant that shields light in the wavelength region of 450 to 650 nm. Also, the colorant that shields visible light is preferably a colorant that transmits light in the wavelength region of 900 to 1500 nm. The colorant that shields visible light preferably satisfies at least one of the following (A) and (B).

[0335] (A): contains two or more color colorants, and black is formed with a combination of the two or more color colorants.

[0336] (B): contains an organic black colorant.

[0337] As the color colorant, the above-described color colorant can be given. As the organic black colorant, for example, a bis-benzofuranone compound, a methine azo compound, a perylene compound, an azo compound, and the like can be given, and a bis-benzofuranone compound, a perylene compound are preferable. As the bis-benzofuranone compound, a compound described in Japanese Patent Application Laid-Open No. 2010-534726, Japanese Patent Application Laid-Open No. 2012-515233, Japanese Patent Application Laid-Open No. 2012-515234, and the like can be given, and for example, can be obtained as "Irgaphor Black" manufactured by BASF Corporation. As the perylene compound, a compound described in paragraphs 0016 to 0020 of Japanese Patent Application Laid-Open No. 2017-226821, C.I. Pigment Black 31, 32, and the like can be given. As the methine azo compound, a compound described in Japanese Patent Application Laid-Open No. H01-170601, Japanese Patent Application Laid-Open No. H02-034664, and the like can be given, and for example, can be obtained as "CHROMOFINE BLACK A1103" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd.

[0338] As the combination of the color colorants when black is formed in combination of two or more kinds of color colorants, for example, the following (1) to (8) can be given.

[0339] (1) A mode containing a yellow colorant, a blue colorant, a violet colorant, and a red colorant.

[0340] (2) A mode containing a yellow colorant, a blue colorant, and a red colorant.

[0341] (3) A mode containing a yellow colorant, a violet colorant, and a red colorant.

[0342] (4) A mode containing a yellow colorant and a violet colorant.

[0343] (5) A mode containing a green colorant, a blue colorant, a violet colorant, and a red colorant.

[0344] (6) A mode containing a violet colorant and an orange colorant.

[0345] (7) A mode containing a green colorant, a violet colorant, and a red colorant.

[0346] (8) A mode containing a green colorant and a red colorant.

[0347] In the case where the infrared absorbing composition of the present application contains a visible light shielding colorant, the content of the visible light shielding colorant is preferably 1 to 50 mass% in the total solid content of the infrared absorbing composition. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, further preferably 20 mass% or more, and particularly preferably 30 mass% or more.

[0348] 《Surface active agent》

[0349] The infrared absorbing composition of the present application preferably contains a surface active agent. As the surface active agent, various surface active agents such as a fluorine-based surface active agent, a nonionic surface active agent, a cationic surface active agent, an anionic surface active agent, a silicone-based surface active agent, and the like can be used. The surface active agent is preferably a fluorine-based surface active agent or a silicone-based surface active agent. As the surface active agent, the surface active agents described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779 can be mentioned, and the content thereof is incorporated into the present specification. The surface active agent can also be used as a dispersant for specific particles.

[0350] As the fluorine-based surfactant, the surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Publication No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014 / 017669), and the like, the surfactants described in paragraphs 0117 to 0132 of Japanese Patent Application Publication No. 2011-132503, and the like, are recited in the present specification. As commercially available products of the fluorine-based surfactant, for example, MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-41, R-41-LM, R-01, R-40, R-40-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all manufactured by DIC CORPORATION), FLUORAD FC430, FC431, FC171 (all manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all manufactured by AGC INC.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (all manufactured by OMNOVA SOLUTIONS INC.), Futurgent 710FM, 610FM, 601AD, 601ADH2, 602A, 215M, 245F (all manufactured by NEOS CO., LTD), and the like can be given.

[0351] Further, as the fluorine-based surfactant, an acrylic compound having a molecular structure having a functional group containing a fluorine atom, and the functional group portion containing the fluorine atom is cleaved and the fluorine atom is volatilized when heat is applied, can be preferably used. As such a fluorine-based surfactant, the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), NIKKEI Industry News (February 23, 2016)), for example, MEGAFACE DS-21 can be given.

[0352] Also, a fluorine-based surfactant is preferably a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Such a fluorine-based surfactant can be exemplified by the fluorine-based surfactants described in Japanese Patent Application Publication No. 2016-216602, the contents of which are incorporated into the present specification.

[0353] A fluorine-based surfactant can also be a block polymer. A fluorine-based surfactant can also be preferably a fluorine-containing high molecular compound containing a repeating unit derived from a (meth)acrylate compound having a fluorine atom and a repeating unit derived from a (meth)acrylate compound having 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy, propyleneoxy). Also, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of Japanese Patent Application Publication No. 2010-032698, the following compounds are also exemplified as the fluorine-based surfactants used in the present application.

[0354] [Chemical Formula 18]

[0355]

[0356] The weight average molecular weight of the above compound is preferably 3000 to 50000, for example, 14000. In the above compound, the % indicating the proportion of the repeating unit is a mole %.

[0357] Also, a fluorine-based surfactant can be a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in a side chain. As specific examples, there can be exemplified the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of Japanese Patent Application Publication No. 2010-164965, MEGAFACE RS-101, RS-102, RS-718K, RS-72-K, and the like manufactured by DIC Corporation. Also, a fluorine-based surfactant can be the compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Publication No. 2015-117327.

[0358] As the nonionic surfactant, glycerin, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (e.g., glycerin propoxylate, glycerin ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, nonylphenol polyoxyethylene ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF Corporation), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), Solsperse 20000 (manufactured by Lubrizol Japan Limited.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), PIONIN D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Olfine E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), and the like can be given.

[0359] As the cationic surfactant, tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridinium salts, imidazolium salts, and the like can be given. As specific examples, dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, stearylaminomethylpyridinium chloride, and the like can be given.

[0360] As the anionic surfactant, dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium laurylsulfate, sodium alkyl diphenyl ether disulfonate, sodium alkylnaphthalenesulfonate, sodium dialkylsulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkylsulfosuccinate, sodium stearate, sodium oleate, sodium salt of t-octylphenoxypolyethoxyethyl sulfate, and the like can be given.

[0361] As the silicone-based surfactant, for example, Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (all of which are manufactured by Dow Corning Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all of which are manufactured by Momentive performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all of which are manufactured by Shin-Etsu Chemical Co., Ltd.), BYK307, BYK323, BYK330 (all of which are manufactured by BYK Chemie GmbH), and the like can be given.

[0362] The content of the surfactant is preferably 0.001 to 1 mass%, more preferably 0.001 to 0.5 mass%, and further preferably 0.001 to 0.2 mass% in the total solid content of the infrared absorbing composition.

[0363] Also, in the case where the surfactant is used as a dispersant for the specific particles, the content of the surfactant is preferably 1 to 200 mass parts, more preferably 2 to 100 mass parts, and further preferably 5 to 50 mass parts with respect to 100 mass parts of the specific particles.

[0364] The infrared absorbing composition can contain only one kind of surfactant, or can contain two or more kinds. In the case where two or more kinds are contained, the total amount thereof is preferably within the above range.

[0365]

[0366] The infrared absorbing composition of the present application can contain a polymerization inhibitor. As the polymerization inhibitor, hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylpyrocatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-t-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxylamine salt (ammonium salt, cerium salt, etc.), and the like can be given, and p-methoxyphenol is preferable. The content of the polymerization inhibitor is preferably 0.0001 to 5 mass% in the total solid content of the infrared absorbing composition. The infrared absorbing composition can contain only one kind of polymerization inhibitor, or can contain two or more kinds. In the case where two or more kinds are contained, the total amount thereof is preferably within the above range.​

[0367] Silane coupling agent

[0368] The infrared absorbing composition of the present application can contain a silane coupling agent. In the present specification, the silane coupling agent refers to a silane compound having a hydrolyzable group and a functional group other than the same. Also, the hydrolyzable group refers to a substituent directly bonded to a silicon atom and capable of generating a siloxane bond through at least either one of a hydrolysis reaction and a condensation reaction. As the hydrolyzable group, for example, a halogen atom, an alkoxy group, an acyloxy group, and the like can be given, and an alkoxy group is preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Also, as the functional group other than the hydrolyzable group, for example, a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, a phenyl group, and the like can be given, and a (meth)acryloyl group and an epoxy group are preferred. As the silane coupling agent, the compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Publication No. 2009-288703, the compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Publication No. 2009-242604 can be given, and these contents are incorporated into the present specification. The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, and more preferably 0.05 to 10.0% by mass, in the total solid content of the infrared absorbing composition. The infrared absorbing composition can contain only one kind of silane coupling agent, or can contain two or more kinds. In the case of containing two or more kinds, the total amount thereof is preferably within the above range.

[0369] Ultraviolet absorber

[0370] The infrared absorbing composition can contain an ultraviolet absorber. As the ultraviolet absorber, a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, a merocyanine dye, and the like can be given. As specific examples of such compounds, the compounds described in paragraphs 0038 to 0052 of Japanese Patent Application Publication No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Publication No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Application Publication No. 2013-068814, and paragraphs 0061 to 0080 of Japanese Patent Application Publication No. 2016-162946 can be given, and these contents are incorporated into the present specification. As commercially available products of the ultraviolet absorber, the Tinuvin series and the Uvinul series manufactured by BASF Corporation, and the like can be given. Also, as the benzotriazole compound, the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016) can be given. Also, the ultraviolet absorber can use the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016 / 181987. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, and more preferably 0.05 to 25% by mass, in the total solid content of the infrared absorbing composition. The infrared absorbing composition can contain only one kind of ultraviolet absorber, or can contain two or more kinds. In the case of containing two or more kinds, the total amount thereof is preferably within the above range.

[0371] Antioxidants

[0372] The infrared absorbing composition of the present application can contain an antioxidant. As the antioxidant, a phenol compound, a phosphite compound, a sulfide compound, or the like can be given. As the phenol compound, any phenol compound called a phenol-based antioxidant can be used. As the preferred phenol compound, a hindered phenol compound can be given. A compound having a substituent at a position (ortho position) adjacent to a phenolic hydroxyl group is preferred. As the above substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. Also, an antioxidant having a phenol group and a phosphite group in the same molecule is also preferred. Also, a phosphorus-based antioxidant can also be preferably used as the antioxidant. As the phosphorus-based antioxidant, tris[2-[[2,4,8,10-tetra(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, or the like can be given. As the commercially available product of the antioxidant, for example, ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330 (all manufactured by ADEKA Corporation), or the like can be given. Also, the antioxidant can also use the compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compound described in International Publication No. 2017 / 006600, the compound described in International Publication No. 2017 / 164024. The content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, in the total solid content of the infrared absorbing composition. The infrared absorbing composition can contain only one kind of antioxidant, or can contain two or more kinds. In the case of containing two or more kinds, the total amount thereof is preferably within the above range.

[0373] <Other Components>

[0374] The infrared absorbing composition of the present application can contain, as needed, a sensitizer, a curing accelerator, a filler, a thermal curing accelerator, a plasticizer, and other auxiliary agents (for example, electrically conductive particles, a filler, an antifoaming agent, a flame retardant, a leveling agent, a release accelerator, a perfume, a surface tension modifier, a chain transfer agent, and the like). The properties of the film, such as the physical properties, can be adjusted by appropriately containing these components. As for these components, for example, the description of paragraphs 0183 and thereafter of Japanese Patent Application Publication No. 2012-003225 (paragraph 237 of the corresponding U.S. Patent Application Publication No. 2013 / 0034812), the description of paragraphs 0101 to 0104 and 0107 to 0109 of Japanese Patent Application Publication No. 2008-250074, and the like can be referred to, and these contents are incorporated into the present specification. Also, the infrared absorbing composition of the present application can contain, as needed, a latent antioxidant. As the latent antioxidant, a compound whose site that functions as an antioxidant is protected by a protecting group and the protecting group is detached by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid / base catalyst and functions as an antioxidant can be mentioned. As the latent antioxidant, the compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and Japanese Patent Application Publication No. 2017-008219 can be mentioned. As a commercially available product of the latent antioxidant, ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION), and the like can be mentioned.

[0375] Also, in the case where the infrared absorbing composition of the present application is used as various inks such as an inkjet ink or a printing ink, as other additives, a lubricant, a filler, an antifoaming agent, a gelling agent, a thickening agent, a specific resistance adjusting agent, a coating film forming agent, a color fading preventing agent, a preservative, an antirust agent, and the like can be incorporated. As these additives, the additives described in paragraphs 0163 to 0170 of Japanese Patent Application Publication No. 2014-024980 can be mentioned, and these contents are incorporated into the present specification.

[0376] <Storage container>

[0377] As the storage container of the infrared absorbing composition of the present application, there is no particular limitation, and a publicly known storage container can be used. Also, as the storage container, in order to suppress the mixing of impurities into the raw material or the infrared absorbing composition, a multilayer bottle in which the inner wall of the container is composed of six kinds of six layers of resins or a bottle in which six kinds of resins are provided in a seven-layer structure is also preferably used. As such a container, for example, the container described in Japanese Patent Application Publication No. 2015-123351 can be mentioned. Also, in order to prevent the elution of metal from the inner wall of the container, improve the storage stability of the infrared absorbing composition, or suppress the deterioration of components, and the like, the inner wall of the container is preferably made of glass or stainless steel, or the like.

[0378] <Method for producing infrared absorbing composition>

[0379] The infrared absorbing composition of the present application can be produced by mixing the above-mentioned components. In producing the infrared absorbing composition, all the components can be simultaneously dissolved or dispersed in a solvent to produce the infrared absorbing composition, or two or more kinds of solutions or dispersions in which the components are appropriately adjusted can be produced in advance as needed, and they can be mixed at the time of use (at the time of coating) to produce the infrared absorbing composition.

[0380] In producing the infrared absorbing composition, a process for dispersing particles is preferably included. As a mechanical force used in the dispersion of particles, compression, extrusion, impact, shear, cavitation, and the like can be given. As specific examples of these processes, a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand mill, a flow jet mixer, high-pressure wet-type microparticulation, ultrasonic dispersion, and the like can be given. Furthermore, in the pulverization of particles in the sand mill (bead mill), it is preferable to perform the treatment under conditions in which the pulverization efficiency is improved by using small-diameter beads, increasing the filling rate of the beads, or the like. Furthermore, it is preferable to remove coarse particles after the pulverization treatment by filtration, centrifugal separation, or the like. Furthermore, as the process for dispersing particles and the disperser, the process and the disperser described in "Dispersion Technology Complete Set, published by JOHOKIKI CO., LTD., July 15, 2005" or "Comprehensive Data Set of Dispersion Technology Centering on Suspensions (Solid / Liquid Dispersion Systems) and Practical Applications in Industry, published by Business Development Center Publishing Department, October 10, 1978", or paragraph 0022 of Japanese Patent Application Publication No. 2015-157893 can be preferably used. Furthermore, in the process for dispersing particles, the fine treatment of particles can be performed in a salt milling process. The materials, equipment, treatment conditions, and the like used in the salt milling process can be given by reference to the descriptions of Japanese Patent Application Publication No. 2015-194521 and Japanese Patent Application Publication No. 2012-046629, for example.

[0381] In producing the infrared absorbing composition, a filter is preferably used to filter the infrared absorbing composition for the purpose of removing foreign matter or reducing defects, and the like. As the filter, a filter used for a filtration use or the like from old times can be used without particular limitation. For example, a filter using a fluororesin such as polytetrafluoroethylene (PTFE), a polyamide resin such as nylon (for example, nylon-6, nylon-6,6), a polyethylene, a polypropylene (PP), or the like (including a high-density, ultrahigh-molecular-weight polyolefin resin) can be given. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferable.

[0382] The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. As for the pore size of the filter, the nominal value of the filter manufacturer can be referred to. As for the filter, various filters provided by Nihon Pall Corporation (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), and KITZ MICROFILTER Corporation, etc. can be used.

[0383] Also, as the filter, a fibrous filter material is preferably used. As the fibrous filter material, for example, polypropylene fiber, nylon fiber, glass fiber, etc. can be given. As a commercial product, SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD. can be given.

[0384] When a filter is used, different filters (e.g., a first filter and a second filter, etc.) can be combined. At this time, the filtration with each filter can be performed only once, or two or more times. Also, filters of different pore sizes can be combined within the above range. Also, the filtration with the first filter can be performed only on the dispersion liquid, and the filtration with the second filter can be performed after mixing other components.

[0385] <Membrane>

[0386] Next, the film of the present application will be described. The film of the present application is obtained from the above-described infrared absorbing composition of the present application. The film of the present application can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and can be preferably used for a near-infrared cut filter for the light-receiving side of a solid-state imaging element (for example, a near-infrared cut filter for a wafer-level lens or the like), a near-infrared cut filter for the back side (the side opposite to the light-receiving side) of a solid-state imaging element, a near-infrared cut filter for an ambient light sensor (for example, an illuminance sensor that senses the illuminance or the color tone of the environment in which an information terminal device is disposed and adjusts the color tone of a display or a sensor for color correction that adjusts the color tone), and the like. In particular, it can be preferably used as a near-infrared cut filter in the light-receiving side of a solid-state imaging element. Also, it can be used for a near-infrared cut filter for an infrared sensor that detects an object by detecting light having a wavelength of 700 to 1550 nm, and the like. Also, by using an infrared absorbing composition containing a colorant that transmits infrared light and shields visible light, it can also be used for forming an infrared transmitting filter that transmits only near-infrared light of a specific wavelength or more. For example, an infrared transmitting filter that shields light having a wavelength of 400 to 900 nm and can transmit near-infrared light having a wavelength of 900 nm or more can also be formed. The film of the present application can have a pattern, or can be a film without a pattern (a flat film). Also, the film of the present application can be used by being laminated on a support, or can be used by being peeled off from the support. As the support, a semiconductor substrate such as a silicon substrate, a transparent substrate, and the like can be mentioned.

[0387] On the semiconductor substrate serving as the support, a charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, and the like can be formed. Also, a black matrix that separates each pixel can be formed on the semiconductor substrate. Also, in order to improve adhesion to the upper layer, prevent diffusion of substances, or planarize the surface of the substrate, a primer layer can be provided on the semiconductor substrate as needed.

[0388] As the transparent substrate used as the support, there is no particular limitation as long as it is composed of a material capable of transmitting at least visible light. For example, a substrate composed of glass, resin, or the like can be given. As the resin, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer, norbornene resins, acrylic resins such as polyacrylate and polymethyl methacrylate, polyurethane resins, vinyl chloride resins, fluororesins, polycarbonate resins, polyvinyl butyral resins, and polyvinyl alcohol resins can be given. As the glass, soda lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass can be given. As the copper-containing glass, copper-containing phosphate glass and copper-containing fluorophosphate glass can be given. A commercially available product can also be used as the copper-containing glass. As the commercially available product of the copper-containing glass, NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.) and the like can be given.

[0389] The thickness of the film of the present application can be appropriately adjusted according to the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

[0390] In the case where the film of the present application is used as an infrared cut filter, the film of the present application preferably has an absorption maximum wavelength in the range of wavelengths of 650 to 1500 nm (preferably, wavelengths of 700 to 1300 nm, and more preferably, wavelengths of 700 to 1000 nm). Further, the average transmittance of light having wavelengths of 400 to 600 nm is preferably 50% or more, more preferably 70% or more, and further preferably 80% or more, and particularly preferably 85% or more. Further, the transmittance in all ranges of wavelengths of 400 to 600 nm is preferably 50% or more, more preferably 70% or more, and further preferably 80% or more. Further, the transmittance of the film of the present application at at least one point in the range of wavelengths of 650 to 1500 nm (preferably, wavelengths of 700 to 1300 nm, and more preferably, wavelengths of 700 to 1000 nm) is preferably 15% or less, more preferably 10% or less, and further preferably 5% or less. Further, the ratio (Al / A2) of the maximum value Al of the absorbance in the range of wavelengths of 400 to 600 nm to the absorbance A2 at the absorption maximum wavelength existing on the shortest wavelength side in the range of wavelengths of 650 to 1500 nm is preferably 0.30 or less, more preferably 0.20 or less, further preferably 0.15 or less, and particularly preferably 0.10 or less.

[0391] In the case where the film of the present application is used as an infrared transmitting filter, the film of the present application preferably has a maximum value of transmittance in the range of wavelengths of 400 to 830 nm of 20% or less (preferably 15% or less, more preferably 10% or less) and a minimum value of transmittance in the range of wavelengths of 1100 to 1500 nm of 70% or more (preferably 75% or more, more preferably 80% or more). The film of the present application used as an infrared transmitting filter preferably satisfies any one of the following (1) to (4) of spectral characteristics.

[0392] (1): A maximum value of transmittance in the range of wavelengths of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and a minimum value of transmittance in the range of wavelengths of 900 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

[0393] (2): A maximum value of transmittance in the range of wavelengths of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and a minimum value of transmittance in the range of wavelengths of 1000 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

[0394] (3): A maximum value of transmittance in the range of wavelengths of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and a minimum value of transmittance in the range of wavelengths of 1100 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

[0395] (4): A maximum value of transmittance in the range of wavelengths of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and a minimum value of transmittance in the range of wavelengths of 1200 to 1500 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

[0396] The film of the present application can also be used in combination with a color filter including a color colorant. The color filter can be produced using a coloring composition including a color colorant. In the case where the film of the present application is used as an infrared cut filter and the film of the present application is used in combination with a color filter, it is preferable that the color filter be disposed on the optical path of the film of the present application. For example, it is preferable that the film of the present application and the color filter be laminated to be used as a laminate. In the laminate, the film of the present application and the color filter can or can not be adjacent in the thickness direction. In the case where the film of the present application and the color filter are not adjacent in the thickness direction, the film of the present application can be formed on a support different from the support on which the color filter is formed, or other components (for example, a microlens, a flattening layer, and the like) constituting a solid-state imaging element can be interposed between the film of the present application and the color filter.

[0397] The film of the present application can be used for various devices such as a solid-state imaging element of a CCD (Charge Coupled Device), a CMOS (Complementary Metal Oxide Semiconductor), and the like, an infrared ray sensor, an image display device, and the like.

[0398] <Method for manufacturing film>

[0399] The film of the present application can be manufactured via a step of coating the infrared ray absorbing composition of the present application.

[0400] As the support, the above-described supports can be mentioned. As the coating method of the infrared ray absorbing composition, publicly known methods can be used. For example, a dropping method (liquid droplet coating), a slit coating method, a spray coating method, a roll coating method, a spin coating method (spin coating), a flow coating method, a slit and spin method, a pre-wetting method (for example, the method described in Japanese Patent Application Publication No. 2009-145395), an inkjet (for example, an on-demand method, a piezoelectric method, a thermal method), an ejection system printing such as a nozzle jet, a flexographic printing, a screen printing, a gravure printing, a reverse offset printing, a metal mask printing method, and the like can be mentioned. As the applicable method in the inkjet, there is no particular limitation, and for example, the method described in "Expansion & Use of Inkjet - Infinite Possibilities in Patents -, February 2005, Sumitbe Techon Research Co., Ltd." (especially, pages 115 to 133) or the methods described in Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japanese Patent Application Publication No. 2006-169325, and the like can be mentioned.

[0401] The infrared ray absorbing composition layer formed by coating the infrared ray absorbing composition can be subjected to drying (pre-baking). In the case where pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The pre-baking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. The drying can be performed by a hot plate, an oven, or the like.

[0402] The layer of the infrared absorbing composition after the pre-baking can also be subjected to post-baking. By performing the post-baking, the ratio of the absorbance at the maximum absorption wavelength on the shortest wavelength side to the change in the aggregation of the particles of the infrared absorbing dye generated at the time of the post-baking or the absorbance at the maximum absorption wavelength on the second shortest wavelength side within the range of wavelengths from 650 to 1500 nm can be further reduced. In the case where the post-baking is performed, the post-baking temperature is preferably from 100 to 180°C, more preferably from 120 to 160°C. The post-baking time is preferably from 10 to 3000 seconds, more preferably from 40 to 2500 seconds, and further preferably from 300 to 1200 seconds. The post-baking can be performed using a hot plate, an oven, or the like.

[0403] The method for producing the film can further include a step of forming a pattern. As the method for forming a pattern, a method for forming a pattern using photolithography or a method for forming a pattern using dry etching can be mentioned, and a method for forming a pattern using photolithography is preferred. In the case where the film of the present application is used as a flat film, the step of forming a pattern can not be performed. Hereinafter, the step of forming a pattern will be described in detail.

[0404] (Case where a pattern is formed by photolithography)

[0405] The method for forming a pattern by photolithography preferably includes a step of exposing the layer of the infrared absorbing composition formed by applying the infrared absorbing composition of the present application in a pattern shape (exposure step) and a step of developing and removing the layer of the infrared absorbing composition of the unexposed portion to form a pattern (development step). As needed, a step of baking the developed pattern (post-baking step) can be provided. Hereinafter, each step will be described.

[0406] <Exposure step>

[0407] In the exposure step, the layer of the infrared absorbing composition is exposed in a pattern shape. For example, by using a stepper, a scanner, or the like, the layer of the infrared absorbing composition is exposed through a mask having a prescribed mask pattern, whereby the exposure can be performed in a pattern shape. By this, the exposed portion can be cured.

[0408] As the radiation (light) that can be used at the time of the exposure, g-rays, i-rays, and the like can be mentioned. Furthermore, light having a wavelength of 300 nm or less (preferably light having a wavelength of from 180 to 300 nm) can also be used. As the light having a wavelength of 300 nm or less, KrF rays (wavelength 248 nm), ArF rays (wavelength 193 nm), and the like can be mentioned, and KrF rays (wavelength 248 nm) are preferred. Furthermore, a light source having a long wavelength of 300 nm or more can also be used.

[0409] Also, at the time of exposure, exposure can be performed by continuous irradiation of light, or exposure can be performed by pulse irradiation (pulse exposure). In addition, pulse exposure refers to an exposure method in which irradiation and suspension of light are repeated in a short time (e.g., sub-millisecond) cycle.

[0410] The irradiation amount (exposure amount) is preferably, for example, 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 . As for the oxygen concentration at the time of exposure, it can be appropriately selected, and exposure can be performed, for example, in a low-oxygen environment in which the oxygen concentration is 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially no oxygen), or in a high-oxygen environment in which the oxygen concentration exceeds 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume), in addition to exposure in the atmosphere. Also, the exposure illuminance can be appropriately set, and it can be selected, for example, from the range of 1000 W / m 2 to 100,000 W / m 2 (e.g., 5000 W / m 2 , 15000 W / m 2 , or 35000 W / m 2 ). The oxygen concentration and the exposure illuminance can be appropriately combined, and, for example, it can be set to 10% by volume of oxygen concentration and 10000 W / m 2 of illuminance, 35% by volume of oxygen concentration and 20000 W / m 2 of illuminance, or the like.

[0411]

[0412] Next, the infrared absorbing composition layer of the unexposed portion is removed by development to form a pattern. The development of the infrared absorbing composition layer of the unexposed portion can be performed using a developing solution. As a result, the infrared absorbing composition layer of the unexposed portion in the exposure step is dissolved by the developing solution, and only the photocured portion remains on the support. The temperature of the developing solution is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. Also, in order to improve the residue removal properties, the process of throwing away the developing solution every 60 seconds and further supplying a new developing solution can be repeated several times.

[0413] ​As the developing solution, an organic solvent, an alkaline developing solution, or the like can be given, and an alkaline developing solution is preferably used. As the alkaline developing solution, an aqueous alkaline solution (alkaline developing solution) in which an alkali agent is diluted with pure water is preferably used. As the alkali agent, for example, an organic alkaline compound such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene, or the like, or an inorganic alkaline compound such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, sodium metasilicate, or the like is given. In terms of the environment and safety, the alkali agent is preferably a compound having a large molecular weight. The concentration of the alkali agent in the aqueous alkaline solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Furthermore, the developing solution can further contain a surfactant. As the surfactant, a nonionic surfactant is preferable. From the viewpoint of convenient transportation and storage, the developing solution can be temporarily produced as a concentrated solution and diluted to the desired concentration at the time of use. The dilution ratio is not particularly limited, and for example, it can be set to a range of 1.5 to 100 times. Furthermore, it is also preferable to perform a pure water cleaning (rinsing) after development. Furthermore, the rinsing is preferably performed by supplying a rinsing solution to the composition layer after development while rotating the support on which the composition layer after development is formed. Furthermore, it is also preferable to perform the rinsing by moving a nozzle that discharges the rinsing solution from the center portion of the support to the peripheral portion of the support. At this time, the nozzle can be moved while gradually reducing the moving speed of the nozzle when moving from the center portion of the support to the peripheral portion of the nozzle. By performing the rinsing in this way, it is possible to suppress the in-plane deviation of the rinsing. Furthermore, the same effect can also be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the center portion of the support to the peripheral portion of the support.

[0414] After development, it is preferable to perform an additional exposure process, a heating process (post-baking) after drying. The additional exposure process, the post-baking is a curing process after development for completely performing curing. The heating temperature at the time of post-baking is preferably, for example, 100 to 240°C, and more preferably 200 to 240°C. The post-baking of the developed film can be performed in a continuous or intermittent manner using a heating mechanism such as a hot plate or a convection oven (hot air circulation type dryer), a high-frequency heating machine, or the like in a manner that becomes the above-described conditions. In the case where the additional exposure process is performed, the light used for exposure is preferably light having a wavelength of 400 nm or less. Furthermore, the additional exposure process can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0415] (Case where pattern formation is performed by dry etching method)

[0416] The pattern formation by the dry etching method can be performed by, for example, curing the infrared absorbing composition layer formed by applying the above-described infrared absorbing composition on a support to form a cured product layer, then forming a patterned resist layer on the cured product layer, and then performing dry etching on the cured product layer using an etching gas with the patterned resist layer as a mask. When forming the resist layer, a pre-baking process is preferably performed. With regard to the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of Japanese Patent Application Publication No. 2013-064993 can be referred to, and the content is incorporated into the present specification.

[0417] <Filter>

[0418] The filter of the present application has the above-described film of the present application. As a kind of filter, an infrared cut filter, an infrared transmitting filter, and the like can be given.

[0419] The filter of the present application can have, in addition to the above-described film of the present application, a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like. As the ultraviolet absorbing layer, for example, the absorbing layer described in paragraphs 0040 to 0070 and paragraphs 0119 to 0145 of International Publication No. 2015 / 099060 can be given. As the dielectric multilayer film, the dielectric multilayer film described in paragraphs 0255 to 0259 of Japanese Patent Application Publication No. 2014-041318 can be given. As the copper-containing layer, a glass substrate formed of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (layer containing a copper complex) can also be used. As the copper-containing glass substrate, copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like can be given. As commercially available products of copper-containing glass, NF-50 (manufactured by AGC TECHNO GLASS CO., LTD.), BG-60, BG-61 (manufactured by Schott AG), CD5000 (manufactured by HOYA GROUP), and the like can be given.

[0420] <Solid-state imaging element>

[0421] The solid-state imaging element of the present application contains the above-described film of the present application. As a configuration of the solid-state imaging element, a configuration having the film of the present application is given, and there is no particular limitation as long as it is a configuration that functions as a solid-state imaging element. For example, the following configurations can be given.

[0422] is configured as follows: a plurality of photodiodes that constitute light-receiving regions of a solid-state imaging device and a transfer electrode formed of polysilicon or the like are provided on a support body, a light-shielding film formed of tungsten or the like that has an opening only in a light-receiving portion of the photodiode is provided on the photodiodes and the transfer electrode, a device protective film formed of silicon nitride or the like that is formed so as to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode is provided on the light-shielding film, and the film of the present application is provided on the device protective film. In addition, it can also be configured such that a light condensing mechanism (for example, a microlens or the like. The same applies hereinafter) is provided on the device protective film and on the lower side (the side closer to the support body) of the film of the present application or such that a light condensing mechanism is provided on the film of the present application. Furthermore, the color filter can also have a structure in which a film that forms each pixel is embedded in a space that is separated by a partition wall, for example, in a lattice shape. In this case, the refractive index of the partition wall is preferably lower than the refractive index of each pixel. As an example of an imaging device having such a structure, devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577 can be given.

[0423] <image display device>

[0424] The image display device of the present application contains the film of the present application. As the image display device, a liquid crystal display device or an organic electroluminescence (organic EL) display device, etc. can be given. As to the definition or details of the image display device, for example, it is described in "Electronic Display Devices (A. Sasaki, Kogyo Chosakai Publishing Co., Ltd., 1990)" or "Display Devices (J. Ibuki, Sangyo Tosho Publishing Co., Ltd., 1989)", etc. Also, as to the liquid crystal display device, for example, it is described in "Next Generation Liquid Crystal Display Technology (edited by R. Uchida, Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present application can be applied is not particularly limited, and for example, various modes of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology" can be applied. The image display device can have a white organic EL element. As the white organic EL element, a tandem structure is preferable. As to the tandem structure of the organic EL element, it is described in Japanese Patent Application Laid-Open No. 2003-045676, "The Front Line of Organic EL Technology Development - High Brightness, High Precision, Long Life, and Skill Collection -", Technical Information Institute Co., Ltd., pp. 326 to 328, 2008, etc. The spectrum of the white light emitted from the organic EL element preferably has a strong emission peak in the blue region (430 to 485 nm), the green region (530 to 580 nm), and the yellow region (580 to 620 nm). More preferably, in addition to these emission peaks, it further has an emission peak in the red region (650 to 700 nm).

[0425] <Infrared sensor>

[0426] The infrared sensor of the present application contains the above-mentioned film of the present application. As to the configuration of the infrared sensor, it is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present application will be described with reference to the drawings.

[0427] Figure 1 In the drawing, the symbol 110 is a solid-state imaging element. On the imaging region of the solid-state imaging element 110, an infrared cut filter 111 and an infrared transmitting filter 114 are disposed. Also, on the infrared cut filter 111, a color filter 112 is disposed. On the incident light hv side of the color filter 112 and the infrared transmitting filter 114, a microlens 115 is disposed. A planarization layer 116 is formed so as to cover the microlens 115.

[0428] The infrared cut filter 111 can be formed using the infrared-absorbing composition of the present application. The spectral characteristics of the infrared cut filter 111 can be selected according to the emission wavelength of the infrared light-emitting diode (infrared LED) used. The color filter 112 is a color filter formed with pixels that transmit and absorb light of specific wavelengths in the visible region, and is not particularly limited, and a conventionally known color filter for pixel formation can be used. For example, a color filter formed with pixels of red (R), green (G), and blue (B) can be used. For example, reference can be made to the description in paragraphs 0214 to 0263 of Japanese Patent Application Publication No. 2014-043556, which is incorporated into the present specification. The infrared-transmitting filter 114 can have characteristics selected according to the emission wavelength of the infrared LED used.

[0429] Figure 1 In the infrared sensor shown, an infrared cut filter (other infrared cut filter) different from the infrared cut filter 111 can be further provided on the planarization layer 116. As the other infrared cut filter, an infrared cut filter having a layer containing copper and / or a dielectric multilayer film, and the like can be given. As to details of these, the above-described content can be given. Also, as the other infrared cut filter, a dual band pass filter can be used.

[0430] Embodiment

[0431] Hereinafter, the present application will be further described with reference to an embodiment. The materials, amounts used, proportions, processing contents, processing steps, and the like shown in the following embodiment can be appropriately changed without departing from the gist of the present application.

[0432] <Example of synthesis of infrared-absorbing dye A-1>

[0433] Infrared-absorbing dye A-1 was synthesized according to the following scheme. In the following structural formula, Me represents a methyl group, and Ph represents a phenyl group.

[0434] [Chemical Formula 19]

[0435]

[0436] (Synthesis of compound a)

[0437] Compound a was synthesized according to the method described in Tetrahedron 62 (2006) 6018-6028, using 2-methylbenzoyl ethyl acetate (manufactured by Tokyo Chemical Industry Co., Ltd.) as a starting material.

[0438] (Synthesis of compound b)

[0439] Compound b was synthesized according to the method described in paragraph 0342 of International Publication No. 2016 / 194527, using 4-(1-methylheptyloxy)benzonitrile and Compound a as starting materials.

[0440] (Synthesis of Compound c)

[0441] Compound c was synthesized according to the method described in Chemistry-A European Journal, 2009, vol. 15, #19, p. 4857-4864.

[0442] (Synthesis of Compound d)

[0443] Compound d was synthesized according to the method described in paragraph 0072 of Japanese Patent No. 6353060.

[0444] (Synthesis of Compound e)

[0445] Compound e was synthesized according to the method described in paragraph 0072 of Japanese Patent No. 6353060.

[0446] (Synthesis of infrared absorbing colorant A-1)

[0447] After 3.0 parts by mass of Compound e, 1.75 parts by mass of potassium carbonate, and 36 parts by mass of dimethylacetamide (DMAc) were stirred, 3.0 parts by mass of butane sulfonic acid lactone and 4 parts by mass of DMAc were added, and stirring was performed at room temperature for 10 minutes. The external temperature was raised to 95°C and heating was performed for 3 hours. Next, the internal temperature was allowed to cool to 30°C, and the precipitated crystals were sieved. The obtained crystals were added to 30 parts by mass of 4 mol / L hydrochloric acid aqueous solution while maintaining the internal temperature at 30°C or lower, and stirring was performed at room temperature for 30 minutes. The operation of sieving the precipitated crystals was performed twice. The obtained crystals were added to 60 parts by mass of ethyl acetate, and heating was performed under reflux for 30 minutes. The internal temperature was allowed to cool to 30°C, and the operation of sieving the crystals was performed twice. The obtained crystals were dried by air blowing at 50°C for 24 hours, and 2.0 parts by mass of Compound A-1 was obtained.

[0448] <Examples of synthesis of infrared absorbing colorants A-2 to A-7>

[0449] Infrared absorbing colorants A-2 to A-7 were synthesized by the same method as the synthesis of infrared absorbing colorant A-1.

[0450] <Evaluation of solubility of infrared absorbing colorants>

[0451] The infrared absorbing pigments listed in the table below were added to the test solvents listed in the table below, which were adjusted to 25°C at atmospheric pressure. After stirring for 1 hour, the solubility of each infrared absorbing pigment in the test solvent at 25°C was determined. The solubility of the infrared absorbing pigments was evaluated using the following criteria: Case A was judged as a good solvent, and Case B as a poor solvent. In the poor solvent, the infrared absorbing pigments existed in particulate form. Additionally, PGMEA, listed in the test solvent column of the table below, is an abbreviation for propylene glycol monomethyl ether acetate.

[0452] A: The amount of infrared absorbing pigment that dissolves in 100g of solvent at 25℃ is more than 0.1g.

[0453] B: The amount of infrared absorbing pigment dissolved in 100g of solvent at 25℃ is less than 0.1g.

[0454] [Table 1]

[0455]

[0456] [Table 2]

[0457]

[0458] <Maximum absorption wavelength of infrared-absorbing pigments in good solvents>

[0459] Each infrared absorbing pigment was dissolved in the solvent (good solvent) listed in the table below to prepare an infrared absorbing pigment with a concentration of 2.5 × 10⁻⁶. -6 The absorption spectrum of a pigment solution with a concentration of mol / L was measured. The number of maximum absorption wavelengths in the wavelength range of 650–1500 nm and the wavelength (λmax) showing the maximum absorbance are shown in the table below.

[0460] [Table 3]

[0461]

[0462] The structures of infrared absorbing pigments A-1 to A-7 and comparative pigments 1 to 3 are as follows. In the following structural formulas, Me represents methyl and Ph represents phenyl.

[0463] [Chemical Formula 20]

[0464]

[0465] [Chemical Formula 21]

[0466]

[0467] [Chemical Formula 22]

[0468]

[0469] Preparation of the infrared absorbing compositions of Examples 1 to 5 and Comparative Examples 1 and 2

[0470] The raw materials described in the following table were mixed, filtered using a nylon filter (manufactured by NIHON PALL Corporation) having a pore size of 0.45 μm, and an infrared absorbing composition was prepared. In addition, in Examples 1 to 5 and Comparative Examples 1 and 2, the infrared absorbing colorant was present in the infrared absorbing composition in the form of particles. Further, a dispersion liquid was prepared as follows. The infrared absorbing colorant of the kind described in the column of the dispersion liquid of the following table, the surfactant, and the solvent were mixed in the amounts described in the column of the dispersion liquid of the following table, and 500 parts by mass of zirconia beads having a diameter of 0.1 mm were further added. After treatment by a planetary ball mill at 300 rpm for 5 hours, the zirconia beads were separated by filtration, and a dispersion liquid was prepared.

[0471] [Table 4]

[0472]

[0473] Surfactant 1: sodium dodecylbenzenesulfonate (NEOGEN SC, manufactured by DKS Co., Ltd.)

[0474] Surfactant 2: dodecylbenzenesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)

[0475] Resin 1: 20 mass% aqueous solution of polyvinyl alcohol

[0476] Preparation of the infrared absorbing compositions of Examples 6 to 27

[0477] The raw materials described in the following table were mixed, filtered using a nylon filter (manufactured by NIHON PALL Corporation) having a pore size of 0.45 μm, and the infrared absorbing compositions of Examples 6 to 27 were prepared. In each of the infrared absorbing compositions, the infrared absorbing colorant was present in the form of particles. Further, a dispersion liquid was prepared as follows. The infrared absorbing colorant of the kind described in the column of the dispersion liquid of the following table, the dispersant, and the solvent were mixed in the amounts described in the column of the dispersion liquid of the following table, and 230 parts by mass of zirconia beads having a diameter of 0.3 mm were further added. The mixture was dispersed using a paint shaker for 8 hours, and the beads were separated by filtration, and a dispersion liquid was prepared.

[0478] Preparation of the infrared absorbing composition of Comparative Example 3

[0479] To a resin solution obtained by dissolving a resin described in the following table in a solvent described in the following table, an infrared absorbing colorant described in the following table was added to be dissolved, and insoluble components and the like were removed by filtration, whereby a resin composition was obtained. In the composition of Comparative Example 3, Comparative Colorant 3 was dissolved in the solvent in which the infrared absorbing colorant was dissolved.

[0480] [Table 5]

[0481]

[0482] [Table 6]

[0483]

[0484] (Solvent)

[0485] S-1: Propylene glycol monomethyl ether acetate

[0486] S-2: Cyclopentanone

[0487] S-3: Propylene carbonate

[0488] S-4: Cyclohexyl acetate

[0489] S-5: Methyl isobutyl ketone

[0490] (Dispersant)

[0491] C-1: A resin having the following structure (the values attached to the main chain are molar ratios, and the values attached to the side chains are the number of repeating units. Weight average molecular weight 21000, acid value 36.0 mgKOH / g, amine value 47.0 mgKOH / g)

[0492] [Chemical Formula 23]

[0493]

[0494] C-2: A resin having the following structure (the values attached to the main chain are molar ratios, and the values attached to the side chains are the number of repeating units. Weight average molecular weight 38000, acid value 99.1 mgKOH / g)

[0495] [Chemical Formula 24]

[0496]

[0497] (Resin)

[0498] P-1: A resin having the following structure (the values attached to the main chain are molar ratios. Weight average molecular weight 10000, acid value = 69.2 mgKOH / g)

[0499] [Chemical Formula 25]

[0500]

[0501] P-2: Copolymer of allyl methacrylate (AMA) and methacrylic acid (MAA) (composition ratio (mass ratio): AMA / MAA = 80 / 20, weight average molecular weight 15000)

[0502] P-3: Copolymer of α-allyloxymethyl methacrylate (AOMA) and N-phenyl maleimide (PME) (composition ratio (mass ratio): AOMA / PME = 66 / 34, weight average molecular weight 31600)

[0503] P-4: Copolymer of methyl methacrylate (MMA) and glycidyl methacrylate (GMA) (composition ratio (mass ratio): MMA / GMA = 50 / 50, weight average molecular weight 25000)

[0504] (Curable compound)

[0505] M-1: Mixture of compounds of the following structures (molar ratio of the left-hand compound to the right-hand compound is 7:3)

[0506] [Chemical Formula 26]

[0507]

[0508] M-2: Compound of the following structure

[0509] [Chemical Formula 27]

[0510]

[0511] M-3: EPICLON N-695 (Cresol novolak type epoxy resin, manufactured by DIC CORPORATION)

[0512] M-4: EHPE3150 (1,2-epoxy-4-(2-oxiranylmethyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol, manufactured by Daicel Corporation)

[0513] (Photo-polymerization initiator)

[0514] F-1: Compound of the following structure

[0515] [Chemical Formula 28]

[0516]

[0517] F-2: Compound of the following structure

[0518] [Chemical Formula 29]

[0519]

[0520] (Surfactant)

[0521] G-1: Compound of the following structure (weight average molecular weight 14000, the value of % indicating the proportion of repeating units is mol %)

[0522] [Chemical Formula 30]

[0523]

[0524] G-2: KF-6001 (silicone surfactant, manufactured by Shin-Etsu Chemical Co., Ltd.)

[0525] G-3: PolyFox PF6320 (fluorine surfactant, manufactured by OMNOVA SOLUTIONS INC.)

[0526] (Polymerization inhibitor)

[0527] H-1: p-methoxyphenol

[0528] <Maximum absorption wavelength and absorbance>

[0529] The absorption spectrum of each infrared absorbing composition was measured, and the number of maximum absorption wavelengths present in the range of wavelengths 650 to 1500 nm, the maximum absorption wavelength present on the shortest wavelength side among the maximum absorption wavelengths present in the range of wavelengths 650 to 1500 nm (λ1), the maximum absorption wavelength present on the second shortest wavelength side among the maximum absorption wavelengths present in the range of wavelengths 650 to 1500 nm (λ2), and the value of absorbance at the maximum absorption wavelength (λ1) when the absorbance at the maximum absorption wavelength (λ2) is taken as 1 were each determined. In addition, in the infrared absorbing compositions of Examples 1 to 18 and Comparative Examples 1 to 3, the characteristics of the maximum absorption wavelengths and absorbances in the range of wavelengths 650 to 1500 nm were derived from the infrared absorbing pigments A-1 to A-7 and comparative pigments 1 to 3 contained in each infrared absorbing composition.

[0530] <Manufacture of cured film>

[0531] (Method for manufacturing cured film using infrared absorbing composition of Examples 1 to 5, 18, and Comparative Examples 1 to 3)

[0532] Using a spin coater, the infrared absorbing compositions of Examples 1-5, 18, and Comparative Examples 1-3 were coated onto a glass substrate (manufactured by Corning Incorporated Co., Ltd., "1737"), and subjected to initial drying by heating on a hot plate at 100°C for 120 seconds (pre-baking). Afterwards, the substrate was purged with nitrogen at 50°C in an inert oven for 30 minutes, then heated to 150°C over approximately 10 minutes, and further dried at 150°C under nitrogen for 30 minutes to obtain a cured film.

[0533] (Manufacturing Example 2) Method for manufacturing a cured film using the infrared absorbing compositions of Examples 6-12, 21, 24, and 27

[0534] Using a spin coater, the infrared absorbing compositions of Examples 6–12, 21, 24, and 27 were coated onto a glass substrate (manufactured by Corning Incorporated Co., Ltd., “1737”) and pre-baked using a hot plate at 100°C for 120 seconds. Subsequently, an i-ray stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.) was used at 500 mJ / cm². 2 The entire surface was exposed to the specified exposure level. Next, using a developer (CD-2060, manufactured by FUJIFILM Electronic Materials Co., Ltd.), a 60-second spin-dip development was performed at 23°C. Following this, the surface was rinsed with pure water and then spin-dried. Finally, a 300-second heat treatment (post-baking) at 200°C was applied to obtain a cured film.

[0535] (Manufacturing Example 3) Method for manufacturing a cured film using the infrared absorbing compositions of Examples 13-17

[0536] Using a spin coater, the infrared absorbing compositions of Examples 13-17 were coated onto a glass substrate (manufactured by Corning Incorporated Co., Ltd., "1737"), and pre-baked using a hot plate at 100°C for 120 seconds. Then, a cured film was obtained by pre-baking using a hot plate at 200°C for 480 seconds.

[0537] (Manufacturing Example 4) Method for manufacturing a cured film using the infrared absorbing compositions of Examples 19, 20, 22, 23, 25, and 26

[0538] The infrared absorbing compositions of Examples 19, 20, 22, 23, 25, and 26 were coated on a glass substrate (manufactured by Corning Incorporated Co., Ltd., "1737") using a spin coater, and a heating treatment (pre-baking) was performed using a hot plate at 120°C for 600 seconds. Further, a heating treatment (post-baking) was performed using a hot plate at 200°C for 480 seconds, and a cured film was obtained.

[0539] <evaluation of spectral characteristics>

[0540] (slope shape)

[0541] By the above-mentioned production method of the cured film, the film thickness of the cured film was adjusted so that the transmittance at the longest wavelength (λ SH60 ) in which the transmittance at the shortest wavelength side of λ SH60 ) was 60% was measured. The difference (λ SH60 ) between λ SH60 ) was calculated, and the slope shape was evaluated by the following criteria. As a result, it was shown that the smaller the above-mentioned wavelength difference, the better the corner cut of the infrared absorption and the more selective the infrared shielding.

[0542] - evaluation criteria -

[0543] A: (λ SH60 ) ≤ 50 nm

[0544] B: 50 nm < (λ SH60 ) ≤ 70 nm

[0545] C: 70 nm < (λ SH60 )

[0546] (infrared shielding property)

[0547] By the above-mentioned production method of the cured film, the film thickness of the cured film was adjusted so that the transmittance at the wavelength (λ LH20 ) at which the value of the maximum absorbance in the range of wavelengths from 650 to 1500 nm was shown was 1%, and the wavelength (λ SH20 ) at which the transmittance at the longest wavelength side of λ LH20 ) was 20% and the wavelength (λ SH20 ) at which the transmittance at the shortest wavelength side of λ LH20 ) was 20% was measured. The difference (λ SH20 ) between λ LH20 and λ SH20 was calculated, and the infrared shielding property was evaluated by the following criteria. As a result, it was shown that the larger the above-mentioned wavelength difference, the more the infrared in a wide wavelength range could be shielded.

[0548] Evaluation Criteria

[0549] A: (λ LH20 - λ SH20 ) ≥ 110 nm

[0550] B: 85 nm ≤ (λ LH20 - λ SH20 ) < 110 nm

[0551] C: 60 nm ≤ (λ LH20 - λ SH20 ) < 85 nm

[0552] D: (λ LH20 - λ SH20 ) < 60 nm

[0553] (Heat resistance)

[0554] A heat plate was used to heat the cured film having a thickness of 1.0 μm obtained in the above at 200°C for 3 hours. The transmittance of light having a wavelength of 400 to 2000 nm with respect to the film before and after the heating was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation). The change in transmittance in the wavelength at which the change in transmittance was the largest in the range of wavelengths of 400 to 1500 nm before and after the heating was calculated from the following equation, and the change in transmittance was evaluated by the following criteria. It can be said that the smaller the change in transmittance, the more excellent the heat resistance.

[0555] Change in transmittance = |transmittance after light irradiation - transmittance before light irradiation|

[0556] Evaluation Criteria

[0557] A: The change in transmittance was less than 3%.

[0558] B: The change in transmittance was 3% or more and less than 5%.

[0559] C: The change in transmittance was 5% or more and less than 10%.

[0560] D: The change in transmittance was 10% or more.

[0561] (Light resistance)

[0562] The cured film of thickness 1.0 μm obtained in the above was placed on a discoloration tester equipped with an ultrahyperxenon lamp (200,000 Lux), and light of 200,000 Lux was irradiated for 55 hours under conditions without using an ultraviolet cut filter. Next, the transmittance spectrum of the film after light irradiation was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation). The change in transmittance in the wavelength of 400 nm to 2,000 nm where the change in transmittance before and after light irradiation was the largest was calculated from the following formula, and the heat resistance was evaluated by the following criteria.

[0563] Change in transmittance = | (transmittance after light irradiation - transmittance before light irradiation) |

[0564] - Evaluation Criteria -

[0565] A: Change in transmittance is less than 3%.

[0566] B: Change in transmittance is 3% or more and less than 5%.

[0567] C: Change in transmittance is 5% or more and less than 10%.

[0568] D: Change in transmittance is 10% or more.

[0569] [Table 7]

[0570]

[0571] As shown in the above table, the infrared ray absorbing compositions of the Examples had good slope shapes and excellent infrared ray shielding properties. Also, in the infrared ray absorbing compositions of the Examples, the infrared ray absorbing pigments A-1 to A-7 were present in the infrared ray absorbing compositions in the form of particles. Also, in the infrared ray absorbing compositions of the Examples, these particles had two or more absorption wavelengths in the range of wavelengths of 650 to 1,500 nm. Also, when the absorbance at the second shortest wavelength side (λ2) was set to 1, the absorbance (Z1) at the shortest wavelength side (λ1) in the above range was 0.6 to 2.0. Also, the difference (λ2-λ1) between the shortest wavelength side (λ1) and the second shortest wavelength side (λ2) was in the range of 30 to 80 nm. Also, if Table 3 is referred to together, the value of λ1 in the infrared ray absorbing compositions of Examples 1 to 27 was in the shorter wavelength side than the wavelength (λmax) showing the value of the largest absorbance in the pigment solutions prepared by dissolving the infrared ray absorbing pigments A-1 to A-7 in a good solvent (dimethyl sulfoxide) respectively.

[0572] On the other hand, in Comparative Example 3, the cured film had a very large absorption wavelength at 749 nm and 920 nm, but the wavelength difference was as large as 100 nm or more, and the infrared shielding property was insufficient.

[0573] By using the cured film of the infrared absorbing composition of Example 6 for an infrared sensor, noise can be further reduced.

[0574] (Example 28)

[0575] In Example 6, when preparing the dispersion liquid, 1.7 parts by mass of infrared absorbing dye B-1 and 2.0 parts by mass of ultraviolet absorber UV-1 were further added, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 6, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 28 had the same slope shape as in Example 6. Also, regarding the infrared shielding property, it was more excellent than in Example 6, and was evaluated as A.

[0576] (Example 29)

[0577] In Example 9, when preparing the dispersion liquid, 1.7 parts by mass of infrared absorbing dye B-2 and 2.0 parts by mass of ultraviolet absorber (Tinuvin 326, 2-(5-chloro-2-benzotriazolyl)-6-tert-butyl-p-cresol, manufactured by BASF Corporation) were further added, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 9, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 29 had the same slope shape as in Example 9. Also, regarding the infrared shielding property, it was more excellent than in Example 9, and was evaluated as A.

[0578] (Example 30)

[0579] In Example 10, when preparing the dispersion liquid, 1.7 parts by mass of infrared absorbing dye B-3 and 2.0 parts by mass of ultraviolet absorber (Tinuvin 477, hydroxyphenyl triazine-based compound, manufactured by BASF Corporation) were further added, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 10, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 30 had the same slope shape as in Example 10. Also, regarding the infrared shielding property, it was more excellent than in Example 10, and was evaluated as A.

[0580] (Example 31)

[0581] In Example 11, the dispersion liquid was prepared further by adding 1.7 parts by mass of infrared absorbing dye B-4 and 2.0 parts by mass of ultraviolet absorber (Tinuvin 460, hydroxyphenyltriazine compound, manufactured by BASF Corporation), and otherwise, the infrared absorbing composition was produced in the same manner as in Example 11, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 31 had the same slope shape as in Example 11. Also, regarding the infrared shielding property, it was more excellent than in Example 11, and was evaluated as A.

[0582] (Example 32)

[0583] In Example 12, the dispersion liquid was prepared further by adding 1.7 parts by mass of infrared absorbing dye B-5 and 2.0 parts by mass of ultraviolet absorber (Tinuvin 405, hydroxyphenyltriazine compound, manufactured by BASF Corporation), and otherwise, the infrared absorbing composition was produced in the same manner as in Example 12, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 32 had the same slope shape as in Example 12. Also, regarding the infrared shielding property, it was more excellent than in Example 12, and was evaluated as A.

[0584] (Example 33)

[0585] In Example 14, the dispersion liquid was prepared further by adding 1.7 parts by mass of infrared absorbing dye B-2, 0.3 parts by mass of infrared absorbing dye B-6, and 9.0 parts by mass of ultraviolet absorber (Tinuvin 479, hydroxyphenyltriazine compound, manufactured by BASF Corporation), and otherwise, the infrared absorbing composition was produced in the same manner as in Example 14, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 33 had the same slope shape as in Example 14. Also, regarding the infrared shielding property, it was more excellent than in Example 14, and was evaluated as A.

[0586] (Example 34)

[0587] In Example 15, the dispersion liquid was prepared further by adding 1.7 parts by mass of infrared absorbing dye B-3, 0.3 parts by mass of infrared absorbing dye B-7, and 9.0 parts by mass of ultraviolet absorber (Uvinul 3050, dihydroxybenzophenone compound, manufactured by BASF Corporation), and otherwise, the infrared absorbing composition was produced in the same manner as in Example 15, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 34 had the same slope shape as in Example 15. Also, regarding the infrared shielding property, it was more excellent than in Example 15, and was evaluated as A.

[0588] (Example 35)

[0589] In Example 16, further, 1.7 parts by mass of infrared absorbing dye B-4, 0.3 parts by mass of infrared absorbing dye B-8, and 9.0 parts by mass of ultraviolet absorber (Tinuvin 477, hydroxyphenyl triazine-based compound, manufactured by BASF Corporation) were mixed at the time of preparing the dispersion liquid, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 16, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 35 had the same slope shape as in Example 16. Also, regarding the infrared shielding property, it was more excellent than in Example 16, and was evaluated as A.

[0590] (Example 36)

[0591] In Example 17, further, 1.7 parts by mass of infrared absorbing dye B-5, 0.3 parts by mass of infrared absorbing dye B-9, and 9.0 parts by mass of ultraviolet absorber (Uvinul 3049, dihydroxybenzophenone-based compound, manufactured by BASF Corporation) were mixed at the time of preparing the dispersion liquid, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 17, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 36 had the same slope shape as in Example 17. Also, regarding the infrared shielding property, it was more excellent than in Example 17, and was evaluated as A.

[0592] (Example 37)

[0593] In Example 14, further, 1.7 parts by mass of infrared absorbing dye B-10, 0.3 parts by mass of infrared absorbing dye B-6, and 9.0 parts by mass of ultraviolet absorber Uvinul 3050 (dihydroxybenzophenone-based compound, manufactured by BASF Corporation) were mixed at the time of preparing the dispersion liquid, and otherwise, the infrared absorbing composition was produced in the same manner as in Example 14, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 37 had the same slope shape as in Example 14. Also, regarding the infrared shielding property, it was more excellent than in Example 14, and was evaluated as A.

[0594] (Example 38)

[0595] In Example 20, further, 1.7 parts by mass of infrared absorbing dye B-10, 0.3 parts by mass of infrared absorbing dye B-6, and 9.0 parts by mass of ultraviolet absorber Tinuvin 477 (hydroxyphenyltriazine-based compound, manufactured by BASF Corporation) were mixed in preparing the dispersion liquid, and otherwise, the infrared absorbing composition was manufactured in the same manner as in Example 20, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 38 had the same slope shape as in Example 20. Also, regarding the infrared shielding property, it was more excellent than in Example 20, and was evaluated as A.

[0596] (Example 39)

[0597] In Example 21, further, 1.7 parts by mass of infrared absorbing dye B-10, 0.3 parts by mass of infrared absorbing dye B-6, and 9.0 parts by mass of ultraviolet absorber Tinuvin 479 (hydroxyphenyltriazine-based compound, manufactured by BASF Corporation) were mixed in preparing the dispersion liquid, and otherwise, the infrared absorbing composition was manufactured in the same manner as in Example 21, and each property was evaluated by the same method as described above. The infrared absorbing composition of Example 39 had the same slope shape as in Example 21. Also, regarding the infrared shielding property, it was more excellent than in Example 21, and was evaluated as A.

[0598] Infrared absorbing dyes B-1 to B-10 are each a compound having the structure shown below.

[0599] [Chemical Formula 31]

[0600]

[0601] [Chemical Formula 32]

[0602]

[0603] Ultraviolet absorber UV-1 is a compound having the structure shown below.

[0604] [Chemical Formula 33]

[0605]

[0606] Explanation of symbols

[0607] 110 - solid-state imaging element, 111 - infrared cut filter, 112 - color filter, 114 - infrared transmission filter, 115 - microlens, 116 - planarization layer.

Claims

1. An infrared absorbing composition comprising infrared absorbing pigment particles and a solvent. The particles exhibit two or more maximum absorption wavelengths in the infrared absorption composition within the wavelength range of 650 nm to 1500 nm. When the absorbance at the second short-wavelength maximum absorption wavelength within this range is set to 1, the absorbance at the shortest-wavelength maximum absorption wavelength is 0.6 to 2.

0. The infrared-absorbing pigment is a compound represented by formula (PP-1). In the formula, R 1a Indicates alkyl, halogen, alkenyl, ynyl, aryl, heteroaryl, or cyano groups. R 1b Indicates substituent, R 2 R indicates alkyl, aryl, or heteroaryl. 2 With -L 1 -(X) 1 ) n2 bonding, R 3 R 4 R 5 and R 6 Each can independently represent a cyano group, acyl group, alkoxycarbonyl group, alkylsulfinyl group, arylsulfinyl group, or heteroaryl group. R 7 and R 8 Each of the following can be independently represented: hydrogen atom, alkyl group, aryl group, heteroaryl group, -BR group. 9 R 10 Or metal atoms, R 9 and R 10 Each of these can be independently represented by a hydrogen atom, halogen atom, alkyl group, alkenyl group, aryl group, heteroaryl group, alkoxy group, aryloxy group, or heteroaryloxy group. R 9 and R 10 They can be arbitrarily bonded together to form a ring. R 7 Optional with R 3 Or R 5 Covalent bonding or coordination bonding R 8 Optional with R 2 R 4 Or R 6 Covalent bonding or coordination bonding L 1 This indicates aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, and -NR. L1 -, -CO-, -COO-, -OCO-, -SO2-, or combinations thereof forming n2+1 valence linkers or single bonds. R L1 Indicates hydrogen atom, alkyl or aryl, X 1 Indicates an acidic or basic group. n1 represents an integer from 0 to 4. n2 represents an integer greater than or equal to 1. m represents an integer greater than or equal to 1.

2. The infrared absorbing composition according to claim 1, wherein, Within this range, the difference between the maximum absorption wavelength on the shortest wavelength side and the maximum absorption wavelength on the second short wavelength side is 30 nm to 80 nm.

3. An infrared absorbing composition comprising infrared absorbing pigment particles and a solvent. The infrared-absorbing pigment is a compound represented by formula (PP-1). In the formula, R 1a Indicates alkyl, halogen, alkenyl, ynyl, aryl, heteroaryl, or cyano groups. R 1b Indicates substituent, R 2 R indicates alkyl, aryl, or heteroaryl. 2 With -L 1 -(X) 1 ) n2 bonding, R 3 R 4 R 5 and R 6 Each can independently represent a cyano group, acyl group, alkoxycarbonyl group, alkylsulfinyl group, arylsulfinyl group, or heteroaryl group. R 7 and R 8 Each of the following can be independently represented: hydrogen atom, alkyl group, aryl group, heteroaryl group, -BR group. 9 R 10 Or metal atoms, R 9 and R 10 Each of these can be independently represented by a hydrogen atom, halogen atom, alkyl group, alkenyl group, aryl group, heteroaryl group, alkoxy group, aryloxy group, or heteroaryloxy group. R 9 and R 10 They can be arbitrarily bonded together to form a ring. R 7 Optional with R 3 Or R 5 Covalent bonding or coordination bonding R 8 Optional with R 2 R 4 Or R 6 Covalent bonding or coordination bonding L 1 This indicates aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, and -NR. L1 -, -CO-, -COO-, -OCO-, -SO2-, or combinations thereof forming n2+1 valence linkers or single bonds. R L1 Indicates hydrogen atom, alkyl or aryl, X 1 Indicates an acidic or basic group. n1 represents an integer from 0 to 4. n2 represents an integer greater than or equal to 1. m represents an integer greater than or equal to 1.

4. The infrared absorbing composition according to any one of claims 1 to 3, wherein, The maximum absorption wavelength of the particles, located on the shortest wavelength side, is located further on the shorter wavelength side than the wavelength at which the pigment solution, formed by dissolving the infrared-absorbing pigment constituting the particles in a good solvent of the infrared-absorbing pigment, exhibits maximum absorbance.

5. The infrared absorbing composition according to any one of claims 1 to 3, wherein, The particles exhibit at least three maximum absorption wavelengths in the infrared absorption composition within the wavelength range of 650 nm to 1500 nm.

6. The infrared absorbing composition according to any one of claims 1 to 3, wherein, The number of maximum absorption wavelengths exhibited by the particles in the infrared absorbing composition in the wavelength range of 650 nm to 1500 nm is greater than the number of maximum absorption wavelengths exhibited by a pigment solution formed by dissolving the infrared absorbing pigment constituting the particles in a good solvent of the infrared absorbing pigment in the wavelength range of 650 nm to 1500 nm.

7. The infrared absorbing composition according to any one of claims 1 to 3, further comprising a curing compound.

8. The infrared absorbing composition according to any one of claims 1 to 3, used in a filter or ink.

9. A membrane made using the infrared absorbing composition according to any one of claims 1 to 7.

10. A filter comprising the membrane of claim 9.

11. A solid-state imaging element comprising the membrane of claim 9.

12. An image display device comprising the membrane of claim 9.

13. An infrared sensor comprising the membrane of claim 9.

Images