An ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy

Abstract

The present invention belongs to the technical field of spectral ellipsometric structures, and specifically relates to an ultra-wideband spectral ellipsometric structure based on Fourier spectroscopy and grating spectroscopy, comprising a near-infrared to mid-wave infrared band polarizing module, a deep ultraviolet to near-infrared band polarizing module, a sample stage, an analyzing module, and a track. The near-infrared to mid-wave infrared band polarizing module, the deep ultraviolet to near-infrared band polarizing module, the sample stage, and the analyzing module are all arranged on the track, and the track is a circular track. The near-infrared to mid-wave infrared band polarizing module and the deep ultraviolet to near-infrared band polarizing module are both provided with a sample stage in the optical path direction, and the analyzing module is arranged in the optical path direction of the sample stage. The present invention sets different polarizing and analyzing modules for different bands, which can realize a single measurement of a spectral band and increase modulation efficiency. In addition, the present invention adds a track design to the analyzing module, so that the structure can automatically measure the transmission or reflection mode for different incident angles of the band.

Description

Technical Field

[0001] The present invention belongs to the technical field of spectral ellipsometric structures, and in particular relates to an ultra-wideband spectral ellipsometric structure based on Fourier spectroscopy and grating spectroscopy. Background Art

[0002] Ellipsometry architecture is designed to enable precise and rapid measurement of the thickness and optical parameters of semiconductors, dielectrics, polymers, metals, and multilayer films on transparent substrates. It can measure not only the thickness and optical constants of single-layer films, but also the thickness and optical constants of individual layers in multilayer films, the roughness of surfaces and interfaces, and the microstructure of materials. Its advantages include high measurement accuracy, non-destructive and non-critical measurements, and the ability to enable real-time monitoring. Consequently, it plays a vital role in improving the accuracy of optoelectronic detection in weaponry, as well as the concealment and corrosion resistance of equipment.

[0003] With the expansion of applications and demands, ellipsometry technology and corresponding instruments have rapidly become a research hotspot for scientific and technological workers around the world.

[0004] The FE-5000S from Japan's Otsuka Electronics Co., Ltd. offers advantages such as short measurement time and high film thickness accuracy, but its measurable spectral range is relatively short, between 300-800nm. The PHE-102 from Angstrom Advanced Technologies, Inc. in the United States, improves on this spectral range, now capable of measuring from 250nm to 1700nm, but this expansion of the spectral range also slows its measurement speed. The ES01 from Beijing's Liangtuo Technology Co., Ltd. improves on its original measurement time, but its test speed and spectral range remain suboptimal. Summary of the Invention

[0005] In view of the problems that existing ellipsometer measurements cannot cover such a wide spectral band from ultraviolet to mid-infrared, the achromatic compensator cannot achieve effective achromatism in such a wide spectral band, and the mechanical rotation of the dual-rotating compensator has moving parts and low modulation frequency, the present invention provides an ultra-wide-band spectral ellipsometer structure based on Fourier spectroscopy and grating spectroscopy, adopts a dual-optical path measurement method to achieve an ultra-wide spectral range, adopts a multi-channel parallel polarization spectroscopy measurement technology based on a rotary compensator and an array spectral detector in the 193nm-2100nm band, and adopts a time-frequency interchange polarization spectroscopy measurement technology based on a multi-azimuth compensator and Fourier infrared spectroscopy splitting mode in the 2100nm-3200nm band.

[0006] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0007] An ultra-wideband spectral ellipsometer structure based on Fourier spectroscopy and grating spectroscopy comprises a near-infrared to mid-wave infrared band polarizing module, a deep ultraviolet to near-infrared band polarizing module, a sample stage, an analyzer module, and a track. The near-infrared to mid-wave infrared band polarizing module, the deep ultraviolet to near-infrared band polarizing module, the sample stage, and the analyzer module are all arranged on the track, which is a circular track. The sample stage is arranged in the optical path direction of the near-infrared to mid-wave infrared band polarizing module and the deep ultraviolet to near-infrared band polarizing module, and the analyzer module is arranged in the optical path direction of the sample stage.

[0008] The near-infrared to mid-wave infrared band polarization module includes a light source for near-infrared to mid-wave infrared band measurement, a Fourier infrared interferometer, a first polarizer, a first motor, and a first aperture. The Fourier infrared interferometer is arranged in the direction of the optical path of the light source for near-infrared to mid-wave infrared band measurement, the first polarizer is arranged in the direction of the optical path of the Fourier infrared interferometer, the first aperture is arranged in the direction of the optical path of the first polarizer, the first polarizer is fixedly connected to the output shaft of the first motor, and the sample stage is arranged in the direction of the optical path of the first aperture.

[0009] The deep ultraviolet to near-infrared band polarization module includes a deep ultraviolet to near-infrared band measurement light source system, a collimation system, a second polarizer, a second motor, and a second aperture. The collimation system is arranged in the optical path direction of the deep ultraviolet to near-infrared band measurement light source system, the second polarizer is arranged in the optical path direction of the collimation system, the second aperture is arranged in the optical path direction of the second polarizer, the second polarizer is fixedly connected to the output shaft of the second motor, and the sample stage is arranged in the optical path direction of the second aperture.

[0010] The polarization analysis module includes a near-infrared to medium-wave infrared band polarization analysis system and a deep ultraviolet to near-infrared band polarization analysis system. The near-infrared to medium-wave infrared band polarization analysis system and the deep ultraviolet to near-infrared band polarization analysis system are arranged in parallel. The near-infrared to medium-wave infrared band polarization analysis system and the deep ultraviolet to near-infrared band polarization analysis system are respectively arranged in the optical path direction of the sample stage.

[0011] The infrared to mid-wave infrared band polarization analysis system includes a near-infrared to mid-infrared band detector, a near-infrared to mid-infrared band polarization analyzer, a near-infrared to mid-infrared band compensator, a third motor, and a third aperture. The near-infrared to mid-infrared band detector is arranged in the optical path direction of the near-infrared to mid-infrared band polarization analyzer, the near-infrared to mid-infrared band polarization analyzer is arranged in the optical path direction of the near-infrared to mid-infrared band compensator, the near-infrared to mid-infrared band compensator is arranged in the optical path direction of the third aperture, the near-infrared to mid-infrared band compensator is fixedly connected to the output shaft of the third motor, and the third aperture is arranged in the optical path direction of the sample stage.

[0012] The deep ultraviolet to near-infrared band polarization analysis system includes a grating spectrum measurement module, a deep ultraviolet to near-infrared band polarization analyzer, a deep ultraviolet to near-infrared band compensator, a fourth motor, and a fourth aperture. The grating spectrum measurement module is arranged in the optical path direction of the deep ultraviolet to near-infrared band polarization analyzer, the deep ultraviolet to near-infrared band polarization analyzer is arranged in the optical path direction of the deep ultraviolet to near-infrared band compensator, the deep ultraviolet to near-infrared band compensator is arranged in the optical path direction of the fourth aperture, the deep ultraviolet to near-infrared band compensator is fixedly connected to the output shaft of the fourth motor, and the fourth aperture is arranged in the optical path direction of the sample stage.

[0013] The grating spectrum measurement module includes a reflector, an optical path collimation system, a first spectrometer, and a second spectrometer. The optical path collimation system and the second spectrometer are respectively arranged in the optical path direction of the reflector, and the first spectrometer is arranged in the optical path direction of the optical path collimation system.

[0014] The near-infrared to mid-infrared band polarizer adopts a mid-infrared wave plate, and the near-infrared to mid-infrared band compensator adopts a mid-infrared quarter-wave plate.

[0015] The deep ultraviolet to near infrared band polarizer adopts Rochon prism, the deep ultraviolet to near infrared band compensator adopts Fresnel prism as phase retarder, the measurable range of the first spectrometer is 1000nm-2100nm, and the measurable range of the second spectrometer is 193nm-1000nm.

[0016] The near-infrared to mid-wave infrared band polarization module, the deep ultraviolet to near-infrared band polarization module, the sample stage and the polarization analyzer module are all electrically connected to the host machine.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] The present invention incorporates different polarization and analysis modules for different wavelength bands. It employs a time-frequency interchange polarization spectroscopy measurement technique based on a multi-directional compensator and Fourier transform infrared spectroscopy, as well as a multi-channel parallel polarization spectroscopy measurement technique based on a rotary compensator and an array spectral detector. Unlike the monochromator measurement used in generalized ellipsometers, the present invention enables single-pass measurement of a single spectral band, increasing modulation efficiency. Furthermore, the present invention incorporates a track design for the analysis module, enabling automatic measurement of transmission or reflection modes for different incident angles in different wavelength bands. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] To more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for the embodiments or the description of the prior art. Obviously, the drawings described below are merely exemplary, and those skilled in the art can, without inventive effort, derive other implementation drawings based on the provided drawings.

[0020] The structures, proportions, sizes, etc. illustrated in this specification are intended solely to complement the contents disclosed herein and to facilitate understanding and reading by persons skilled in the art. They are not intended to limit the conditions under which the present invention may be implemented and therefore have no substantive technical significance. Any structural modifications, changes in proportions, or adjustments in sizes, without affecting the efficacy and objectives of the present invention, shall remain within the scope of the technical contents disclosed herein.

[0021] Figure 1 This is a schematic diagram of the structure of the transmission measurement in the near-infrared to mid-infrared band of the present invention;

[0022] Figure 2 This is a schematic diagram of the structure of the reflectance measurement in the near-infrared to mid-infrared band of the present invention;

[0023] Figure 3 This is a schematic diagram of the structure of the transmission measurement in the deep ultraviolet to near infrared band 193nm-1000nm of the present invention;

[0024] Figure 4 This is a schematic diagram of the structure of the transmission measurement in the deep ultraviolet to near infrared band (1000nm-2100nm) of the present invention;

[0025] Figure 5 This is a schematic diagram of the structure of the reflectance measurement in the deep ultraviolet to near infrared band (193nm-1000nm) of the present invention;

[0026] Figure 6 This is a schematic diagram of the structure of the reflectance measurement in the deep ultraviolet to near infrared band of 1000nm-2100nm of the present invention.

[0027] Among them: 1 is the polarization module of near infrared to mid-infrared band, 1-1 is the light source for measurement in near infrared to mid-infrared band, 1-2 is the Fourier infrared interferometer, 1-3 is the first polarizer, 1-4 is the first motor, 1-5 is the first aperture, 2 is the polarization module of deep ultraviolet to near infrared band, 2-1 is the light source system for measurement in deep ultraviolet to near infrared band, 2-2 is the collimation system, 2-3 is the second polarizer, 2-4 is the second motor, 2-5 is the second aperture, 3 is the sample stage, 4 is the polarization analyzer module, 4-1 is the polarization analyzer system of near infrared to mid-infrared band, 4-1-1 is the detector of near infrared to mid-infrared band, 4-1-2 is the near infrared Infrared to mid-infrared band polarization analyzer, 4-1-3 is near-infrared to mid-infrared band compensator, 4-1-4 is the third motor, 4-1-5 is the third aperture, 4-2 is the deep ultraviolet to near-infrared band polarization analyzer system, 4-2-1 is the grating spectrum measurement module, 4-2-1-1 is the reflector, 4-2-1-2 is the optical path collimation system, 4-2-1-3 is the first spectrometer, 4-2-1-4 is the second spectrometer, 4-2-2 is the deep ultraviolet to near-infrared band polarization analyzer, 4-2-3 is the deep ultraviolet to near-infrared band compensator, 4-2-4 is the fourth motor, 4-2-5 is the fourth aperture, 5 is the track, and 6 is the host computer. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only part of the embodiments of this application, not all the embodiments. These descriptions are only to further illustrate the features and advantages of the present invention, rather than to limit the claims of the present invention. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0029] The following embodiments of the present invention are described in further detail with reference to the accompanying drawings and examples. The following embodiments are used to illustrate the present invention but are not intended to limit the scope of the present invention.

[0030] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. Throughout this application, unless otherwise specified, "plurality" means two or more.

[0031] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0032] In this embodiment, if Figure 1-6 As shown, it consists of a near-infrared to mid-wave infrared polarization module 1, a deep ultraviolet to near-infrared polarization module 2, a sample stage 3, an analyzer module 4, and a track 5. To meet the requirements of ultra-wideband measurement and both transmission and reflection measurements, this embodiment adopts a dual-optical parallel measurement method.

[0033] In this embodiment, if Figure 1-2 The figure shows the optical path diagram for testing in the near-infrared to mid-infrared band. Figure 1 The sample on the middle sample stage 3 is for transmission measurement. Figure 2 The sample on the middle sample stage 3 is tested for reflection. In the near-infrared to mid-infrared band measurement, the light source 1-1 passes through the Fourier infrared interferometer 1-2, the first polarizer 1-3, the first motor 1-4, the first aperture 1-5, the sample stage 3, the third aperture 4-1-5, the near-infrared to mid-infrared band compensator 4-1-3, the near-infrared to mid-infrared band analyzer 4-1-2, and the near-infrared to mid-infrared band detector 4-1-1, and is finally uploaded to the host computer 6 for data analysis. The spectral range, film thickness range, and accuracy of traditional ellipsometers are relatively small. A single light source cannot achieve such a wide spectral band requirement. In order to meet the requirements of both transmission and reflection measurement, and to ensure the system detection sensitivity and high spectral resolution, the structure of the present invention will adopt a continuous polychromatic light source and a high-resolution spectrometer. Because a single continuous polychromatic light source cannot fully cover the deep ultraviolet to near-infrared wavelength range, the project requires two polychromatic light sources for color synthesis in the near-infrared to mid-infrared range. By rotating the backlit deuterium and tungsten lamps and using a quartz lens to overlap the tungsten and deuterium lamps, the required spectral range is met. In the near-infrared to mid-infrared range, light source 1-1 utilizes Fourier transform infrared interferometer 1-2 for measurement.

[0034] In this embodiment, if Figure 3-6 Optical path diagram for testing in the deep ultraviolet to near infrared band. Figure 3 For deep ultraviolet to near infrared band 193nm-1000nm sample transmission measurement, Figure 5This is a deep ultraviolet to near-infrared (DUV) to near-infrared (NIR) reflectance measurement of samples in the 193nm-1000nm range. In this DUV to NIR measurement, light source system 2-1 passes through collimation system 2-2, collimation system 2-2, second polarizer 2-3, second aperture 2-5, sample stage 3, third aperture 4-1-5, NIR to MIR compensator 4-1-3, NIR to MIR analyzer 4-1-2, reflector 4-2-1-1, and second spectrometer 4-2-1-4. The measurable range of second spectrometer 4-2-1-4 must include 193nm-1000nm. The data is ultimately uploaded to host computer 6 for analysis.

[0035] In this embodiment, Figure 4 For deep ultraviolet to near infrared band 1000nm-2100nm sample transmission measurement, Figure 6 This is a deep ultraviolet to near-infrared (DUV) to near-infrared (NIR) reflectance measurement for samples in the 1000nm-2100nm range. In this DUV to NIR measurement, the light source system 2-1 passes through the collimation system 2-2, the collimation system 2-2, the second polarizer 2-3, the second aperture 2-5, the sample stage 3, the third aperture 4-1-5, the NIR to MIR compensator 4-1-3, the NIR to MIR analyzer 4-1-2, the reflector 4-2-1-1, the optical path collimation system 4-2-1-2, and the first spectrometer 4-2-1-3. The spectrometer 4-2-1-3 must cover a measurable range of 1000nm-2100nm. The data is ultimately uploaded to the host computer 6 for analysis.

[0036] Furthermore, preferably, the near-infrared to mid-infrared band polarizer 4-1-2 adopts a mid-infrared wave plate, the near-infrared to mid-infrared band compensator 4-1-3 adopts a mid-infrared quarter-wave plate, the deep ultraviolet to near-infrared band polarizer 4-2-2 adopts a Rochon prism, and the deep ultraviolet to near-infrared band compensator 4-2-3 adopts a Fresnel prism as a phase delay device.

[0037] Furthermore, the functions of the host computer 6 in this embodiment mainly include controlling the ultraviolet, near-infrared, and visible spectrometer, the output of the infrared detector, the automatic rotation of the compensator and the automatic switching of the reflector, the control of the two polarizer motors, the power supply of the light source intensity, the scanning time and optical path difference control of the Fourier interferometer, the angle control of the polarization arm, and the angle control of the stage. Among them, each control motor can independently realize initialization, relative pulse displacement, and engineering unit displacement. The control system can set parameters such as speed, acceleration, deceleration, offset, and limit polarity. Data processing mainly includes the measurement of each element of the sample Mueller matrix in thin film thickness measurement. This is obtained by calculating and analyzing the amplitude of the signal at different frequencies, and then measuring information such as film thickness.

[0038] In terms of data processing, this embodiment adds the near-infrared to mid-infrared band compared to the generalized ellipsometer. Completing the broad spectrum data processing in a single measurement would significantly increase measurement time. Therefore, the spectral data is measured in segments, first measuring the DUI portion and then the MIR portion. The resulting data is temporarily stored in memory until the end of each measurement cycle. After the deep ultraviolet to near-infrared and near-infrared to mid-infrared bands are fully measured, the two sets of results are integrated for relevant data processing and fitting operations.

[0039] The above only describes in detail the preferred embodiments of the present invention, but the present invention is not limited to the above embodiments. Various changes can be made within the knowledge of ordinary technicians in this field without departing from the purpose of the present invention, and various changes should be included in the scope of protection of the present invention.

Claims

1. An ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy, characterized by: The invention comprises a near-infrared to mid-wave infrared band polarizing module (1), a deep ultraviolet to near-infrared band polarizing module (2), a sample stage (3), a polarizing analyzer module (4), and a track (5). The near-infrared to mid-wave infrared band polarizing module (1), the deep ultraviolet to near-infrared band polarizing module (2), the sample stage (3), and the polarizing analyzer module (4) are all arranged on the track (5). The track (5) is a circular track. The near-infrared to mid-wave infrared band polarizing module (1), the deep ultraviolet to near-infrared band polarizing module (2) A sample stage (3) is provided in the direction of the optical path of the sample stage (3); the polarization analyzer module (4) is provided in the direction of the optical path of the sample stage (3); the polarization analyzer module (4) includes a near-infrared to mid-wave infrared band polarization analyzer system (4-1) and a deep ultraviolet to near-infrared band polarization analyzer system (4-2); the near-infrared to mid-wave infrared band polarization analyzer system (4-1) and the deep ultraviolet to near-infrared band polarization analyzer system (4-2) are provided in parallel, and the near-infrared to mid-wave infrared band polarization analyzer system (4-1) and the deep ultraviolet to near-infrared band polarization analyzer system (4-2) are provided in parallel. The polarization systems (4-2) are respectively arranged in the light path direction of the sample stage (3); the deep ultraviolet to near infrared band polarization analysis system (4-2) includes a grating spectrum measurement module (4-2-1), a deep ultraviolet to near infrared band polarization analyzer (4-2-2), a deep ultraviolet to near infrared band compensator (4-2-3), a fourth motor (4-2-4), and a fourth aperture (4-2-5); the grating spectrum measurement module (4-2-1) is arranged in the light path direction of the deep ultraviolet to near infrared band polarization analyzer (4-2-2) The deep ultraviolet to near infrared band polarizer (4-2-2) is arranged in the light path direction of the deep ultraviolet to near infrared band compensator (4-2-3), the deep ultraviolet to near infrared band compensator (4-2-3) is arranged in the light path direction of the fourth aperture (4-2-5), the deep ultraviolet to near infrared band compensator (4-2-3) is fixedly connected to the output shaft of the fourth motor (4-2-4), and the fourth aperture (4-2-5) is arranged in the light path direction of the sample stage (3).

2. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 1, characterized in that: The near-infrared to mid-wave infrared band polarization module (1) comprises a near-infrared to mid-wave infrared band measurement light source (1-1), a Fourier infrared interferometer (1-2), a first polarizer (1-3), a first motor (1-4), and a first aperture (1-5); the near-infrared to mid-wave infrared band measurement light source (1-1) is provided with a Fourier infrared interferometer (1-2) in the light path direction; the Fourier infrared interferometer (1-2) is provided with a first polarizer (1-3) in the light path direction; the first polarizer (1-3) is provided with a first aperture (1-5) in the light path direction; the first polarizer (1-3) is fixedly connected to the output shaft of the first motor (1-4); and the sample stage (3) is provided in the light path direction of the first aperture (1-5).

3. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 1, characterized in that: The deep ultraviolet to near infrared band polarization module (2) comprises a deep ultraviolet to near infrared band measurement light source system (2-1), a collimation system (2-2), a second polarizer (2-3), a second motor (2-4), and a second aperture (2-5); the collimation system (2-2) is arranged in the light path direction of the deep ultraviolet to near infrared band measurement light source system (2-1); the second polarizer (2-3) is arranged in the light path direction of the collimation system (2-2); the second aperture (2-5) is arranged in the light path direction of the second polarizer (2-3); the second polarizer (2-3) is fixedly connected to the output shaft of the second motor (2-4); and the sample stage (3) is arranged in the light path direction of the second aperture (2-5).

4. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 1, characterized in that: The infrared to mid-wave infrared band polarization analyzer system (4-1) comprises a near-infrared to mid-infrared band detector (4-1-1), a near-infrared to mid-infrared band polarization analyzer (4-1-2), a near-infrared to mid-infrared band compensator (4-1-3), a third motor (4-1-4), and a third aperture (4-1-5). The near-infrared to mid-infrared band detector (4-1-1) is arranged in the optical path direction of the near-infrared to mid-infrared band polarization analyzer (4-1-2). The near-infrared to mid-infrared band polarizer (4-1-2) is arranged in the optical path direction of the near-infrared to mid-infrared band compensator (4-1-3), and the near-infrared to mid-infrared band compensator (4-1-3) is arranged in the optical path direction of the third aperture (4-1-5). The near-infrared to mid-infrared band compensator (4-1-3) is fixedly connected to the output shaft of the third motor (4-1-4), and the third aperture (4-1-5) is arranged in the optical path direction of the sample stage (3).

5. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 1, characterized in that: The grating spectrum measurement module (4-2-1) comprises a reflector (4-2-1-1), an optical path collimation system (4-2-1-2), a first spectrometer (4-2-1-3), and a second spectrometer (4-2-1-4); the optical path collimation system (4-2-1-2) and the second spectrometer (4-2-1-4) are respectively arranged in the optical path direction of the reflector (4-2-1-1), and the first spectrometer (4-2-1-3) is arranged in the optical path direction of the optical path collimation system (4-2-1-2).

6. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 4, characterized in that: The near-infrared to mid-infrared band polarizer (4-1-2) adopts a mid-infrared wave plate, and the near-infrared to mid-infrared band compensator (4-1-3) adopts a mid-infrared quarter-wave plate.

7. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 5, characterized in that: The deep ultraviolet to near-infrared band polarizer (4-2-2) adopts a Rochon prism, the deep ultraviolet to near-infrared band compensator (4-2-3) adopts a Fresnel prism as a phase retarder, the measurable range of the first spectrometer (4-2-1-3) is 1000nm-2100nm, and the measurable range of the second spectrometer (4-2-1-4) is 193nm-1000nm.

8. The ultra-wideband spectral ellipsometry structure based on Fourier spectroscopy and grating spectroscopy according to claim 1, characterized in that: The near-infrared to mid-wave infrared band polarization module (1), the deep ultraviolet to near-infrared band polarization module (2), the sample stage (3) and the polarization analyzer module (4) are all electrically connected to the host computer (6).

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