Antibacterial method and antibacterial device
By adopting two antibacterial treatment steps and ion treatment steps in cell culture, the problem of sterilization treatment in the prior art is harmful to the human body and difficult to ensure residue-free is solved, and effective maintenance of clean space and pollution prevention is achieved.
Patent Information
- Application Number
- CN202180055814.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2020-08-19
- Filing Date
- 2021-08-12
- Publication Date
- 2025-05-16
- Estimated Expiration
- 2041-08-12
AI Technical Summary
The prior art sterilization treatment method used to maintain a clean space in cell culture is harmful to the human body, and it is difficult to ensure that there is no residue after sterilization treatment, which may lead to contamination.
Antibacterial methods are adopted, including two antibacterial treatment steps and ion treatment steps. In the antibacterial treatment process, light, gas or liquid particles with antibacterial effects are used, and ions are sent to the target space during the ion treatment process. The antibacterial device consists of an antibacterial part, an ion part and a control part, and the control part coordinates the work of both.
This method can effectively maintain the sanitary environment of the object space, ensure that there is no residue after sterilization and reduce the risk of pollution.
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Figure CN116096436B_ABST
Abstract
Description
Technical Field
[0001] The invention relates to an antibacterial method and an antibacterial device. Background Art
[0002] When cell culture is performed, the work is performed in a clean space (sterile space) to prevent contamination. Patent Document 1 discloses an example of a safety cabinet forming a clean space.
[0003] Prior art literature
[0004] Patent Literature
[0005] Patent Document 1: Japanese Patent Application Publication No. 2016-165249 Summary of the invention
[0006] Technical Problems to be Solved by the Invention
[0007] In order to maintain a clean space, sterilization treatment needs to be performed at a time when cell culture is well differentiated. As a sterilization treatment, treatment using formalin, peracetic acid preparation, hydrogen peroxide or ultraviolet light is generally performed. However, such sterilization treatment is harmful to the human body, so it is necessary to ensure that there is no residue of the substance used in the sterilization treatment before the operator enters the clean space after the sterilization treatment. During the time used to ensure that there is no residue of the substance, or when the operator enters the clean space, etc., contamination may be caused in the clean space.
[0008] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide an antibacterial method and an antibacterial device capable of maintaining a good sanitary environment of a target space.
[0009] Technical solutions for solving technical problems
[0010] According to a first aspect of the present invention, the antibacterial method includes at least two antibacterial treatment processes and an ion treatment process. In the antibacterial treatment process, at least one of light with antibacterial effect, gas with antibacterial effect, and liquid particles with antibacterial effect is sent to the target space. In the ion treatment process, ions are sent to the target space. The start time of the ion treatment process is included in the period from the start time of the previous antibacterial treatment process to the start time of the next antibacterial treatment process, and the end time of the ion treatment process is the time after the end time of the previous antibacterial treatment process.
[0011] According to a second aspect of the present invention, an antibacterial device comprises an antibacterial unit, an ion unit and a control unit. The antibacterial unit sends at least one of light with antibacterial effect, gas with antibacterial effect and liquid particles with antibacterial effect to a target space. The ion unit sends ions to the target space. The control unit controls the antibacterial unit and the ion unit.
[0012] Beneficial Effects
[0013] According to the antibacterial method and antibacterial device of the present invention, the sanitary environment of the target space can be well maintained. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] Figure 1 It is a diagram showing the structure of the antibacterial system according to the first embodiment of the present invention.
[0015] Figure 2 1 is a flowchart showing the antibacterial method according to the first embodiment.
[0016] Figure 3 It is a diagram showing the structure of the antibacterial system according to the first embodiment.
[0017] Figure 4 1 is a time chart showing the antibacterial method according to the first embodiment.
[0018] Figure 5 1 is a flowchart showing the antibacterial method according to the first embodiment.
[0019] Figure 6 It is a diagram showing the configuration of an antibacterial system according to a second embodiment of the present invention.
[0020] Figure 7 It is a diagram showing the structure of an antibacterial system according to a third embodiment of the present invention.
[0021] Figure 8 It is a diagram showing the configuration of an antibacterial system according to a fourth embodiment of the present invention. DETAILED DESCRIPTION
[0022] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In addition, the same reference numerals are given to the same or corresponding parts in the drawings, and the description thereof will not be repeated.
[0023] [First embodiment]
[0024] Reference Figure 1 Antimicrobial system 100 is described. Figure 1 1 is a diagram showing the structure of an antimicrobial system 100 according to a first embodiment of the present invention. Figure 1As shown, the antimicrobial system 100 is, for example, a cell culture facility for workers to culture cells of multicellular organisms related to regenerative medicine and perform operations related to cell culture. The cells are, for example, cells from animals and plants, and in the first embodiment, artificial pluripotent stem cells (iPS cells). In addition, the antimicrobial system 100 can also be used as a system for culturing cells other than cells used in regenerative medicine.
[0025] Specifically, the antibacterial system 100 includes a workroom 10 and an antibacterial device 50. In addition, the antibacterial system 100 may include a plurality of workrooms 10. In addition, the antibacterial system 100 may include a plurality of antibacterial devices 50.
[0026] The workroom 10 has a plurality of walls 11, a floor 12, and a ceiling 13. A workspace 14 is defined by the plurality of walls 11, the floor 12, and the ceiling 13. The workspace 14 is an example of an object space. The workspace 14 is a space for performing cell culture and operations related to cell culture. A door 15 is provided on at least one of the plurality of walls 11. The door 15 is opened and closed to allow workers to enter and exit the workspace 14.
[0027] For example, a safety cabinet 21, a clean room 22, and a culture room 23 are arranged in the work space 14. The arrangement of the safety cabinet 21, the clean room 22, and the culture room 23 is not particularly limited, and only a part of the safety cabinet 21, the clean room 22, and the culture room 23 may be arranged.
[0028] The antibacterial device 50 includes an antibacterial unit 60 , an ion unit 70 , and a control unit 80 .
[0029] The antibacterial device 50 is disposed at least one of the plurality of wall surfaces 11, the floor 12, and the ceiling 13. Specifically, the antibacterial device 50 is disposed on the ceiling 13.
[0030] The antibacterial unit 60 sends at least one of light with antibacterial effect, gas with antibacterial effect, and liquid particles with antibacterial effect to the work space 14. In other words, the antibacterial unit 60 performs an antibacterial treatment process. In this specification, the concept of antibacterial includes not only killing microorganisms such as bacteria, molds, viruses, etc., but also inhibiting the growth and proliferation of microorganisms.
[0031] Specifically, the antibacterial unit 60 includes an ozone generator and a delivery unit. The ozone generator generates ozone from oxygen molecules (O 2 ) generates ozone (O 3 ) discharge device. Ozone (O 3 ) is an example of a gas having an antibacterial effect. Specifically, the ozone generator includes a pair of discharge electrodes (not shown). As a discharge method, for example, plasma discharge or corona discharge can be cited.
[0032] The ozone (O 3 ) is delivered to the work space 14. The delivery unit is a fan. The fan rotates. The fan generates wind by rotating. The wind generated by the delivery unit includes ozone (O 3 ), the delivery part sends ozone (O 3 ) is delivered to the working space 14. Specifically, the installation position and the air delivery direction of the antibacterial unit 60 are set so that the wind generated by the delivery unit spreads to every corner of the working space 14. As a result, ozone (O 3 ) diffuses to the entire working space 14.
[0033] Ozone (O 3 ) is released into the air and surrounds the surface of microorganisms. 3 ) can inactivate microorganisms and reduce their life activities. 3 ) is an active species with very high oxidizing power. Therefore, when released into not only microorganisms but also humans and cells, it may have adverse effects on humans and cells.
[0034] The ion unit 70 sends ions to the working space 14. In other words, the ion unit 70 performs an ion processing step.
[0035] The antibacterial effect of ions is better than that of ozone (O 3 ) has a weak antibacterial effect. However, ions can inactivate microorganisms and reduce their life activities. In addition, ions have almost no adverse effects on humans and cells.
[0036] Specifically, the ion generating unit is a discharge device that generates ions by discharge. More specifically, the ion generating unit is a discharge device that generates positive ions and negative ions by discharge. In addition, the ion generating unit may also be a discharge device that generates only either positive ions or negative ions by discharge.
[0037] The control unit 80 controls the antibacterial unit 60 and the ion unit 70. The control unit 80 is, for example, a computer. The control unit 80 includes, for example, a processor such as a CPU (Central Processing Unit). Specifically, the control unit 80 switches the antibacterial unit 60 and the ion unit 70 on / off. On means, for example, turning on the power supply. Off means, for example, turning off the power supply.
[0038] Specifically, the control unit 80 turns on the antibacterial unit 60 during the first period, and turns off the antibacterial unit 60 outside the first period. In other words, the control unit 80 performs the ozone (O 3 ) from the antibacterial unit 60 to the work space 14. In addition, the control unit 80 executes the antibacterial treatment process at least twice. For example, the control unit 80 executes the antibacterial treatment process for a predetermined period (for example, 1 day, 1 week).
[0039] Furthermore, the control unit 80 turns on the ion unit 70 during the second period, and turns off the ion unit 70 outside the second period. In other words, the control unit 80 performs the ion processing step of sending ions from the ion unit 70 to the working space 14 during the second period.
[0040] A portion of the second period is included in the period from after the antimicrobial treatment process is performed to before the next antimicrobial treatment process is performed. In other words, a portion of the second period is included in the period from after the antimicrobial treatment process is performed to before the next antimicrobial treatment process immediately after the antimicrobial treatment process is performed. Specifically, the start time of the ion treatment process is included in the period from the start time of the previous antimicrobial treatment process to before the start time of the next antimicrobial treatment process. In detail, the start time of the ion treatment process may be a time before the end time of the previous antimicrobial treatment process, or the same time as the end time of the previous antimicrobial treatment process, or a time after the end time of the previous antimicrobial treatment process. In addition, the end time of the ion treatment process is a time later than the end time of the previous antimicrobial treatment process. In detail, the end time of the ion treatment process may be a time before the start time of the next antimicrobial treatment process, or the same time as the start time of the next antimicrobial treatment process, or a time later than the start time of the next antimicrobial treatment process. The ion treatment step is preferably performed during the entire period from after the antimicrobial treatment step is performed to before the next antimicrobial treatment step is performed. More preferably, the start time of the ion treatment step is before the end time of the previous antimicrobial treatment step.
[0041] Above, as reference Figure 1 As described, according to the first embodiment, the start time of the ion treatment process is included in the period from the start time of the previous antibacterial treatment process to the start time of the next antibacterial treatment process. In addition, the end time of the ion treatment process is a time later than the end time of the previous antibacterial treatment process. In other words, ions are sent to the working space 14 during the period from after the previous antibacterial treatment process is performed to before the next antibacterial treatment process is performed. As a result, during the period from after the previous antibacterial treatment process is performed to before the next antibacterial treatment process is performed, since ions exist in the working space 14, the sanitary environment of the working space 14 can be well maintained.
[0042] Next, refer to Figure 2 , the antibacterial method of the first embodiment is described. Figure 2 is a flow chart showing the antibacterial method of the first embodiment. Figure 2 As shown, the antibacterial method includes processes S1 to S6 . The antibacterial method is performed by the antibacterial system 100 .
[0043] First, in process S1, under the control of the control unit 80, the antibacterial unit 60 starts to generate ozone (O 3 ) is sent to the work space 14 for antibacterial treatment. As a result, ozone (O 3 ).
[0044] Next, in process S2, the antibacterial unit 60 ends the ozone (O 3 ) is sent to the antibacterial treatment process of the working space 14.
[0045] Next, in process S3, the ion unit 70 starts an ion treatment step of sending ions to the working space 14 under the control of the control unit 80. As a result, ions exist in the working space 14.
[0046] Next, in process S4 , under the control of the control unit 80 , the ion unit 70 ends the ion processing step of sending ions into the working space 14 .
[0047] Next, in process S5, under the control of the control unit 80, the antibacterial unit 60 starts to release ozone (O 3 ) is sent to the work space 14 for antibacterial treatment. As a result, ozone (O 3 ).
[0048] Next, in process S6, the antibacterial unit 60 ends the ozone (O 3 ) to the antibacterial treatment step of sending it to the working space 14. Then, the antibacterial method ends.
[0049] Above, as reference Figure 2 As described above, according to the first embodiment, the antibacterial treatment process is performed twice with a predetermined period of time left. In addition, ions are sent to the work space 14 during the period from after the antibacterial treatment process is performed to before the next antibacterial treatment process is performed. As a result, during the period from after the antibacterial treatment process is performed to before the next antibacterial treatment process is performed, the ions are present in the work space 14, so that the sanitary environment of the work space 14 can be well maintained.
[0050] Here, the ion unit 70 will be described. Specifically, the ion unit 70 includes an ion generating unit and an ion sending unit.
[0051] Specifically, the ion generating unit includes a pair of discharge electrodes (not shown). Specifically, a positive voltage is applied to one of the pair of discharge electrodes. When a positive voltage is applied to the discharge electrode, water molecules (H 2 O) is electrolyzed by discharge, mainly generating hydrogen ions H + Then, water molecules in the air (H 2O) gathers around the generated hydrogen ions H+ to form positively charged stable cluster ions H + (H 2 O) m m is a natural number. A stable cluster ion H with positive charge + (H 2 O) m is an example of a positive ion. In addition, the cluster ion H + (H 2 O) m The generation of can be confirmed by time-of-flight decomposition mass spectrometry.
[0052] On the other hand, a negative voltage is applied to the other of the pair of discharge electrodes. If a negative voltage is applied to the discharge electrode, the oxygen molecules (O 2 ) ionizes, mainly generating oxygen molecular ions (superoxide ions) O 2 - Then, water molecules in the air (H 2 O) condenses on the generated oxygen molecular ions (superoxide ions) (O 2 - ) around the formation of negatively charged stable cluster ions O 2 - (H 2 O) n . n is a natural number. Negatively charged stable cluster ion O 2 - (H 2 O) n is an example of a negative ion. 2 - (H 2 O) n The generation of can be confirmed by time-of-flight decomposition mass spectrometry.
[0053] The delivery section sends cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n The delivery unit is a fan. The fan rotates. The fan generates wind by rotating. The wind generated by the delivery unit contains cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n The delivery section can transfer cluster ions H + (H2 O) m and cluster ions O 2 - (H 2 O) n The cluster ions H are sent to the work space 14. Specifically, the installation position and the blowing direction of the ion unit 70 are set so that the wind generated by the sending unit spreads to every corner of the work space 14. As a result, the cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n Spread to the entire working space 14.
[0054] For example, the cluster ion H + (H 2 O) m and cluster ions O 2 - (H 2 O) n When released into the air, it surrounds the surface of microorganisms. Then, it instantly binds to cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n , generating [·OH] (hydroxyl radical) on the surface of microorganisms. Since [·OH] is an active species with high oxidizing power, it can inactivate microorganisms and reduce their life activities.
[0055] Specifically, it is preferred that the ion unit 70 uses cluster ions H in the working space 14 + (H 2 O) m and cluster ions O 2 - (H 2 O) n The concentrations were 7000 / cm 3 The above method supplies cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n If the cluster ion H + (H 2 O) m and cluster ions O 2 - (H 2 O)n The concentrations were 7000 / cm 3 The above can reduce the growth and proliferation of bacteria and viruses.
[0056] In addition, the cluster ion H + (H 2 O) m and cluster ions O 2 - (H 2 O) n The upper limit of the concentration of cluster ions H in the working space 14 may be set according to the type of cells to be cultured before starting cell culture. + (H 2 O) m and cluster ions O 2 - (H 2 O) n Specifically, it is preferred that the ion section 70 makes the cluster ions H in the working space 14 + (H 2 O) m and cluster ions O 2 - (H 2 O) n The concentrations were 1 million / cm 3 Cluster ions H are supplied in the following manner + (H 2 O) m and cluster ions O 2 - (H 2 O) n ,. Cluster ion H + (H 2 O) m and cluster ions O 2 - (H 2 O) n The concentrations were 1 million / cm 3 If the following is done, antibacterial effects can be achieved without causing adverse effects on cells.
[0057] Next, refer to Figure 3 , the antibacterial method of the first embodiment is described in detail. Figure 3 1 is a diagram showing the structure of the antimicrobial system 100 according to the first embodiment. Figure 3 As shown, the antibacterial device 50 further includes an ozone discharge unit 90 .
[0058] The ozone discharge unit 90 discharges ozone (O 3) is discharged from the working space 14. Specifically, the ozone discharge unit 90 is a fan. The fan rotates. The fan generates wind by rotating.
[0059] The control unit 80 switches the ozone discharge unit 90 on and off. Specifically, the control unit 80 turns on the ozone discharge unit 90 for a predetermined period after the first period. In other words, the control unit 80 performs the ozone discharge (O) for a predetermined period after the first period. 3 As a result, no ozone (O 3 ). Therefore, there may be a person in the work space 14. Specifically, an ozone detector or the like is used to measure the ozone (O 3 ) concentration, ozone (O 3 ) becomes below the safe reference value, the operator enters the working space 14.
[0060] Next, refer to Figure 4 and Figure 5 , the antibacterial method of the first embodiment is described in detail. Figure 4 is a time table showing the antibacterial method of the first embodiment. Figure 4 As shown, the antibacterial method includes: an antibacterial treatment step P1, a discharge treatment step P2, an ion treatment step P3, an operation P4, and a storage treatment step P5. The antibacterial method is executed by the antibacterial system 100.
[0061] In operation P4, the operator performs operations related to cell culture in the operation space 14. Operation P4 is performed outside the first period. In other words, during the first period, the operator is not present in the operation space 14. As a result, the operator is not exposed to ozone (O 3 )’s adverse effects.
[0062] In the preservation treatment step P5, cells of multicellular organisms related to regenerative medicine are preserved and cultured in the work space 14. The preservation treatment step P5 is performed outside the first period. In other words, during the first period, the cells are not present in the work space 14. As a result, the cells are not exposed to ozone (O 3 )’s adverse effects.
[0063] Figure 5 1 is a flowchart showing the antibacterial method according to the first embodiment. The antibacterial method includes processes S101 to S112.
[0064] like Figure 4 and Figure 5 As shown in FIG. 1 , the antibacterial treatment step P1 starts at time t1. Specifically, in step S101, the antibacterial unit 60 starts to release ozone (O 3) is sent to the work space 14. As a result, ozone (O 3 ).
[0065] Next, at time t2, the ion treatment step P3 is started. Specifically, in step S102, under the control of the control unit 80, the ion unit 70 starts to treat the cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n As a result, cluster ions H are present in the working space 14. + (H 2 O) m and cluster ions O 2 - (H 2 O) n .
[0066] Next, the antibacterial treatment step P1 is terminated at time t3. Specifically, in step S103, the antibacterial unit 60 terminates the ozone (O 3 ) is sent to the working space 14.
[0067] Next, the discharge process P2 is started at time t3. Specifically, in process S104, under the control of the control unit 80, the ozone discharge unit 90 starts to discharge ozone (O 3 ) is discharged from the working space 14.
[0068] Next, the discharge process step P2 is terminated at time t4. Specifically, in process S105, the ozone discharge unit 90 terminates the discharge of ozone (O 3 ) is exhausted from the work space 14. As a result, no ozone (O 3 ).
[0069] Next, at time t4, operation P4 starts. Specifically, in process S106, the operator performs operation P4 related to cell culture in the work space 14. Specifically, the operator enters the work space 14 by opening and closing the door 15. Cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n Present in work space 14 together with the staff.
[0070] Next, at time t5, the operation P4 is completed. Specifically, in process S107, the operator performs the operation P4 related to cell culture in the operation space 14 and the operation P4 is completed. Specifically, the cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n The operator is present in the work space 14 together. The operator comes out of the work space 14 by opening and closing the door 15.
[0071] Next, the storage process step P5 is started at time t5. Specifically, in process S108, cell culture is started in the work space 14. Specifically, the cluster ions H + (H 2 O) m and cluster ions O 2 - (H 2 O) n It exists in the working space 14 together with the cells.
[0072] Next, the storage process step P5 is terminated at time t6. Specifically, in process S109, the cell culture in the work space 14 is terminated. + (H 2 O) m and cluster ions O 2 - (H 2 O) n It exists in the working space 14 together with the cells.
[0073] Next, the ion treatment step P3 is terminated at time t6. Specifically, in step S110, the ion section 70 terminates sending the cluster ions H to the work space 14 under the control of the control section 80. + (H 2 O) m and cluster ions O 2 - (H 2 O) n Specifically, by opening and closing the door 15 , an operator enters and exits the working space 14 to take out cultured cells from the working space 14 .
[0074] Next, at time t6, the antibacterial treatment step P1 is started. Specifically, in step S111, the antibacterial unit 60 starts to release ozone (O 3 ) is sent to the work space 14. As a result, ozone (O 3 ).
[0075] Next, the antibacterial treatment step P1 is terminated at time t7. Specifically, in step S112, the antibacterial unit 60 terminates the ozone (O 3 ) is sent to the working space 14. Then, the antibacterial method ends.
[0076] Above, as reference Figure 5 As described, according to the first embodiment, when the ion treatment process P3 is performed after the antimicrobial treatment process P1 is performed and before the next antimicrobial treatment process P1 is performed, the operator performs the operation P4 related to cell culture and performs the preservation treatment process P5. As a result, in the work space 14 where the sanitary environment is well maintained, the operator performs the operation P4 and the preservation treatment process P5 can be performed. In detail, after the antimicrobial treatment process P1, the ion treatment process P3 is continued at the work stage when the operator enters the room to perform the operation. As a result, even if the microorganisms contaminate the work space 14 when the operator enters the room, the microorganisms can be exterminated or the growth and proliferation of the microorganisms can be suppressed, and the sanitary environment of the work space 14 can be well maintained.
[0077] [Second embodiment]
[0078] Next, refer to Figure 6 The antibacterial system 200 of the second embodiment of the present invention is described. In addition, the antibacterial system 200 of the second embodiment is different from the first embodiment in that it is provided with an operating room. In addition, the antibacterial system 200 of the second embodiment is different from the first embodiment in that it is provided with a plurality of ultraviolet light source units 260. Hereinafter, with respect to the second embodiment, matters different from the first embodiment are described, and descriptions of portions repeated with the first embodiment are omitted.
[0079] Figure 6 2 is a diagram showing the structure of an antimicrobial system 200 according to a second embodiment of the present invention. Figure 6 As shown, antimicrobial system 200 is, for example, an operating room used by a physician for operating on a patient.
[0080] In the work space 14 , for example, a surgical instrument 221 is arranged.
[0081] The antibacterial device 50 includes a plurality of ultraviolet light source units 260. Each of the plurality of ultraviolet light source units 260 includes an ultraviolet light source. The ultraviolet light source emits ultraviolet light. Ultraviolet light is an example of light having an antibacterial effect. Specifically, the location and number of the ultraviolet light source units 260 are set so that the ultraviolet light is spread throughout every corner of the work space 14. As a result, the ultraviolet light is irradiated to the entire work space 14.
[0082] When ultraviolet light is irradiated to microorganisms, it can inactivate them and reduce their life activities. In addition, the energy of ultraviolet light is very high, so it may have adverse effects not only on microorganisms but also on humans and cells if it is irradiated to humans and cells.
[0083] Specifically, the control unit 80 turns on the ultraviolet light source unit 260 during the first period and turns off the ultraviolet light source unit 260 outside the first period. In other words, the control unit 80 performs the antibacterial treatment process of irradiating the work space 14 with ultraviolet light from the ultraviolet light source unit 260 during the first period.
[0084] Above, as reference Figure 6 As described above, according to the second embodiment, the antibacterial treatment process of irradiating the work space 14 with ultraviolet light is performed at intervals of a predetermined period (e.g., one day or one week). In addition, cluster ions H are sent to the work space 14 during the period from after the antibacterial treatment process is performed to before the next antibacterial treatment process is performed. + (H 2 O) m and cluster ions O 2 - (H 2 O) n As a result, due to the presence of cluster ions H in the working space 14 + (H 2 O) m and cluster ions O 2 - (H 2 O) n Therefore, it is possible to suppress the presence of microorganisms in the work space 14. In addition, during the irradiation of ultraviolet light, since there is no ozone (O 3 ) such as residues of substances, and thus can enter from the moment the ultraviolet light source unit 260 is disconnected.
[0085] [Third Embodiment]
[0086] Next, refer to Figure 7 The antibacterial system 300 of the third embodiment of the present invention is described. In addition, the antibacterial system 300 of the third embodiment is different from the first embodiment in that it is a food factory. In addition, the antibacterial device 50 of the third embodiment is different from the first embodiment in that it has a liquid injection unit 360 and a liquid tank 390. Hereinafter, with respect to the third embodiment, matters different from the first embodiment are described, and descriptions of portions repeated with the first embodiment are omitted.
[0087] Figure 7 FIG. 3 is a diagram showing the structure of an antimicrobial system 300 according to a third embodiment of the present invention. Figure 7 As shown, the antimicrobial system 300 is used, for example, in a food factory where workers perform processing using yeast.
[0088] For example, factory equipment 321 is arranged in the workspace 14 .
[0089] The antibacterial device 50 includes a liquid ejection unit 360 and a liquid tank 390. The liquid ejection unit 360 is a device that ejects, for example, ethanol as liquid particles from the liquid tank 390. Ethanol is an example of liquid particles having an antibacterial effect.
[0090] Specifically, the installation position and the spraying direction of the liquid spraying unit 360 are set so that the liquid particles are spread to every corner of the working space 14. As a result, ethanol is diffused throughout the working space 14.
[0091] When ethanol is released into the air, it surrounds the surface of microorganisms. Ethanol can inactivate microorganisms and reduce their life activities. In addition, ethanol can have adverse effects not only on microorganisms, but also on humans and yeast if released.
[0092] Specifically, the control unit 80 turns on the liquid injection unit 360 during the first period, and turns off the liquid injection unit 360 outside the first period. In other words, the control unit 80 performs the antibacterial treatment process of injecting ethanol from the liquid injection unit 360 into the work space 14 during the first period.
[0093] Above, as reference Figure 7 As described above, according to the third embodiment, the antibacterial treatment process of spraying ethanol into the work space 14 is performed at a predetermined interval (e.g., 1 day, 1 week). In addition, cluster ions H are sent to the work space 14 during the period from after the antibacterial treatment process is performed to before the next antibacterial treatment process is performed. + (H 2 O) m and cluster ions O 2 - (H 2 O) n As a result, due to the presence of cluster ions H in the working space 14 + (H 2 O) m and cluster ions O 2 - (H 2 O) n , so the sanitary environment of the working space 14 can be well maintained.
[0094] [Fourth Embodiment]
[0095] Next, refer to Figure 8The antimicrobial system 400 of the fourth embodiment of the present invention is described. In addition, the antimicrobial system 400 of the fourth embodiment is different from the first embodiment in that it is in a storage container. Hereinafter, the fourth embodiment will be described for matters different from the first embodiment, and the description of the parts repeated with the first embodiment will be omitted.
[0096] Figure 8 4 is a diagram showing the structure of an antimicrobial system 400 according to a fourth embodiment of the present invention. Figure 8 As shown, the antimicrobial system 400 is, for example, a storage container for storing food SA.
[0097] Specifically, the antibacterial system 400 includes a storage container 410 and an antibacterial device 50 .
[0098] The storage container 410 has a plurality of walls 411, a bottom wall 412, and an upper wall 413. The storage space 414 is defined by the plurality of walls 411, the bottom wall 412, and the upper wall 413. The storage space 414 is an example of an object space. The storage space 414 is a space for storing food. A door 415 is provided on at least one wall 411 among the plurality of walls 411. By opening and closing the door 415, food SA is taken in and out of the storage space 414.
[0099] The antibacterial device 50 is disposed at at least one of the plurality of wall surfaces 411 , the bottom wall 412 , and the upper wall 413 . Specifically, the antibacterial device 50 is disposed at the upper wall 413 .
[0100] Above, as reference Figure 8 As described above, according to the fourth embodiment, ozone (O 3 ) is sent to the storage space 414. In addition, during the period from the execution of the antibacterial treatment step to the execution of the next antibacterial treatment step, cluster ions H are sent to the storage space 414. + (H 2 O) m and cluster ions O 2 - (H 2 O) n As a result, due to the presence of cluster ions H in the storage space 414 + (H 2 O) m and cluster ions O 2 - (H 2 O) n , therefore the sanitary environment of the receiving space 414 can be well maintained.
[0101] The embodiments of the present invention are described above with reference to the accompanying drawings. However, the present invention is not limited to the above-mentioned embodiments, and can be implemented in various ways without departing from the scope of its purpose. In addition, various inventions can be formed by appropriately combining the multiple components disclosed in the above-mentioned embodiments. For example, several components can also be deleted from all the components shown in the embodiments. Furthermore, components across different embodiments can also be appropriately combined. For ease of understanding, the accompanying drawings are schematically represented mainly by the components, and the thickness, length, number, spacing, etc. of the components shown in the drawings are different from the actual ones due to the convenience of making the drawings. In addition, the speed, material, shape, size, etc. of the components shown in the above-mentioned embodiments are an example, and are not particularly limited. Various changes can be made within the scope of the composition of the present invention.
[0102] As reference Figure 1 to Figure 5 As described above, in the first embodiment, the ion treatment process is performed once during the period from the execution of the antibacterial treatment process to the execution of the next antibacterial treatment process, but the present invention is not limited thereto. During the period from the execution of the antibacterial treatment process to the execution of the next antibacterial treatment process, the ion treatment may be performed multiple times. In other words, during the period from the execution of the antibacterial treatment process to the execution of the next antibacterial treatment process, the control unit 80 may repeatedly turn on and off the ion unit 70.
[0103] (2) In the first embodiment, the antibacterial unit 60 generates ozone (O 3 ) is sent to the working space 14, but the present invention is not limited thereto. The antibacterial unit 60 can send hydrogen peroxide gas to the working space 14.
[0104] (3) In the third embodiment, the liquid ejection unit 360 is a device that ejects ethanol as liquid particles, but the present invention is not limited thereto. The liquid ejection unit 360 may be a device that ejects formalin as liquid particles.
[0105] Industrial Applicability
[0106] The invention can be used in the field of antibacterial methods and antibacterial devices.
[0107] Description of Reference Numerals
[0108] 14: Object Space
[0109] 50: Antibacterial device
[0110] 60: Antibacterial Department
[0111] 70: Ion Department
[0112] 80: Control Department
Claims
1. An antibacterial method, characterized in that: The antibacterial method comprises: at least two antibacterial treatment steps, sending at least one of a gas having an antibacterial effect and liquid particles having an antibacterial effect into the target space; an ion processing step of sending ions into the target space; and an exhaust treatment step of exhausting the gas or the liquid particles from the target space, The start time of the ion treatment process is later than the start time of the previous antibacterial treatment process, and is earlier than the end time of the previous antibacterial treatment process. The end time of the ion treatment process is later than the end time of the previous antimicrobial treatment process, The discharge processing step starts after a start time of the ion processing step and ends before an end time of the ion processing step.
2. The antibacterial method according to claim 1, characterized in that: The antibacterial effect of the gas and the liquid particles is stronger than the antibacterial effect of the ions. During execution of the antimicrobial treatment process, no worker is present in the target space.
3. The antibacterial method according to claim 2, characterized in that: During execution of the ion treatment process, the operator performs work in the target space.
4. The antibacterial method according to any one of claims 1 to 3, characterized in that: The start time of the ion treatment step is earlier than the end time of the antimicrobial treatment step.
5. An antibacterial portion, characterized in that: It has: an antibacterial unit that delivers at least one of a gas having an antibacterial effect and liquid particles having an antibacterial effect into a target space; an ion unit that sends ions into the target space; a discharge unit that discharges the gas or the liquid particles from the target space; as well as a control unit that controls the discharge unit, the antibacterial unit, and the ion unit, The control unit controls the ion unit to start sending the ions to the target space after the antibacterial unit starts sending the at least one ion to the target space and before the sending is completed. The control unit causes the ion unit to stop sending the ions to the target space after the antibacterial unit stops sending the at least one ion to the target space. The control unit controls the discharge unit to discharge the gas or the liquid particles from the target space after the ion unit starts to discharge the ions into the target space and before the discharge of the ions is terminated.
Citation Information
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