High-precision positioning and leveling device

Abstract

The application provides a high-precision positioning and leveling device, which comprises a flexible suction disc module, a pre-leveling module and a support plate arranged along the direction of an exposure light source. The flexible suction disc module can generate a normal correction force to drive a target mask to move in the normal direction of the axis of the correction assembly. The pre-leveling module can drive the pre-leveling module and the flexible suction disc to move along an expected trajectory to control the spatial position of the target mask. The other end of the pre-leveling module is connected with the support plate. The pre-alignment (active) of the pre-leveling module and the fine alignment (adaptive, passive) of the flexible suction disc module ensure the stable leveling and gap control of the wafer and the substrate.

Description

Technical Field

[0001] This application belongs to the field of positioning tooling, specifically relating to a high-precision positioning and leveling device. Background Technology

[0002] In the field of photolithography, the accuracy of traditional proximity, contact, and SP projection lithography is greatly affected by the gap between the mask and the substrate, which is typically only tens of nanometers. Maintaining the horizontal alignment between the mask and the substrate under such a small gap requirement is extremely difficult. However, keeping the distance between the mask and the substrate stable and their positions parallel is a prerequisite for achieving optimal lithography results. Therefore, adjusting the distance and position between them is an important issue in this field.

[0003] The prior art US6873087 B1 proposes a method for ensuring a uniform gap between a mask and a substrate through a flexible hinge for nanoimprinting scenarios. The leveling mechanism of this invention includes a pair of flexural members having flexural joints for movement about a pivot point intersecting with first and second orientation axes. The actuator extends or shortens to stretch or contract the flexural members, and peeling and stretching methods are used to maintain the gap between the mask and the substrate.

[0004] The prior art CN108086408B discloses a passive leveling and locking mechanism for use in a lithography apparatus. This device is used in a lithography machine to achieve passive leveling between a mask and a substrate. The device uses a substrate support as a reference. The substrate support pushes the mask upward. After a certain displacement distance, the grating ruler on the mask is zeroed. Then, the mask returns to its initial position under the action of gravity. The grating ruler counts and controls the number of steps of a three-point stepper motor. Through gear meshing, the mask is driven to rise in the Z direction. After the mask is leveled, the stepper motor self-locks, and the electric cylinder performs downward pressure control to complete the fixation of the leveled mask.

[0005] However, neither of the above two methods can achieve mask correction and anti-drop functions, and the adjustment method is limited and the accuracy is low. Summary of the Invention

[0006] To overcome some of the technical problems existing in the background art, this application provides a high-precision positioning and leveling device, which can automatically adjust and fix the relative position of the mask and the substrate, control the gap between the mask and the substrate, and also correct the mask.

[0007] To achieve the above-mentioned technical objectives, the technical solution adopted in this application is as follows:

[0008] A high-precision positioning and leveling device includes, along with, a device arranged along the direction of the exposure light source.

[0009] Flexible suction cup module, pre-leveling module, support plate,

[0010] The flexible suction cup module can adsorb the target mask. The flexible suction cup module is also provided with several orthogonally arranged correction components, which can generate orthogonal correction force and drive the target mask to shift orthogonally in the axial direction of the correction components.

[0011] One end of the pre-leveling module is coupled to the flexible suction cup module. The pre-leveling module is equipped with several driving sensing devices, which drive the pre-leveling module and the flexible suction cup to move along the expected trajectory and control the spatial position of the target mask.

[0012] The other end of the pre-leveling module is connected to the support plate, which serves to support the high-precision positioning and leveling device.

[0013] As a preferred embodiment, the pre-leveling module includes a flexure plate and a fixed bracket, and the driving sensing device includes a first driver and a first sensor.

[0014] The first sensor is mounted on the first driver and is used to receive data and provide feedback to the first driver;

[0015] One end of the first driver is connected to the flexure plate, thereby driving the flexure plate to move, and the other end is connected to the fixed bracket;

[0016] The flex plate is coupled to the flexible suction cup module, which can drive the flexible suction cup module to move.

[0017] Preferably, the driving sensing device is arranged circumferentially at equal intervals on the fixed bracket with the structural center of the high-precision positioning and leveling device as the axis of symmetry.

[0018] Preferably, the first driver includes one or both of a voice coil motor and a piezoelectric motor.

[0019] Preferably, the end face of the first sensor is in contact with the flex plate.

[0020] Preferably, the first sensor includes one or both of a torque sensor and an optical detector.

[0021] As a preferred embodiment, the corrective component is a flexible hinge.

[0022] Preferably, the flexible hinge consists of four orthogonally arranged flexible hinges.

[0023] Preferably, the flexible hinge is provided with a top interface, which is adapted to the flex plate and can cooperate with the disturbance plate.

[0024] Preferably, the flexible hinge has a notch design.

[0025] As a preferred embodiment, the flexible suction cup module is further provided with a flexible driving device, which is connected to the correction component and can actively provide driving force to the correction component.

[0026] Preferably, the flexible drive device includes a second driver and a second sensor.

[0027] Preferably, the second sensor includes one or more of a barometric pressure sensor, a force sensor, and a laser sensor.

[0028] As a preferred embodiment, the flexible suction cup module adsorbs the target mask through vacuum adsorption.

[0029] As a preferred embodiment, the high-precision positioning and leveling device further includes a positioning mechanism module. The positioning mechanism module can fix the mask on the surface of the flexible suction cup module. The positioning mechanism module includes a fixing component and several sliding components set on the fixing component. The sliding components can make contact with the target mask according to a set movement mode and fix the mask through contact friction.

[0030] As a preferred embodiment, the sliding component is provided with a drive motor, which can generate a centripetal force toward the target mask, causing the sliding component to move centripetally with the target mask, thereby making contact.

[0031] Preferably, the fixing component includes two L-shaped fixing blocks, which can be assembled into a square fixing component.

[0032] Preferably, the sliding component includes four L-shaped sliders, which are disposed at the four corners of the square fixing component.

[0033] Preferably, the sliding component includes two linear sliders, which are vertically orthogonal.

[0034] As a preferred embodiment, the high-precision positioning and leveling device further includes a mask correction mechanism disposed on the upper surface of the support plate. The mask correction mechanism comes into contact with the target mask and can apply a correction force to the target mask in a circumferential direction.

[0035] Preferably, the mask correction mechanism consists of an even number of mask correction mechanism units, with each even number of mask correction mechanism units forming a group of mechanism units, and each group of mechanism units arranged symmetrically in pairs;

[0036] The mask correction mechanism unit includes a power module, a force transmission module, sensors, and a pusher.

[0037] The power module is used to generate power;

[0038] The force transmission module is a flexible mechanism capable of deformation. One end of the force transmission module is connected to the power module, and the other end is connected to one end of the sensor.

[0039] The sensor receives force data to adjust the thrust of the power module, and its other end is connected to the push head.

[0040] The other end of the pusher head contacts the target mask.

[0041] Preferably, the mask correction mechanism consists of 16 mask correction mechanism units, with 4 mask correction mechanism units forming a group of mechanism units, for a total of 4 groups of mechanism units, and each group of mechanism units is arranged symmetrically in pairs.

[0042] Advantages of this application:

[0043] 1. This application discloses a method for aligning a mask and a substrate, a method for positioning and protecting a mask, and a method for correcting a mask in the alignment, leveling, and exposure stages of a photolithography device. The two-stage leveling system, which uses a pre-alignment module (active) and a flexible chuck module (adaptive, passive), ensures stable leveling and gap control between the wafer and the substrate.

[0044] 2. This application effectively reduces the adjustment time after mask replacement through the positioning mechanism module. Through the centering movement of the slider, it can effectively meet the positioning and holding function of masks of different shapes, and realize the secondary protection of the mask in the event of failure of the primary fixing (vacuum or other) to prevent the mask from falling off.

[0045] 3. Through the mask correction mechanism, unexpected deformation of the mask caused by processing or environmental factors can be corrected manually. Through the feedback of the torque sensor, the push arm of each path can be precisely controlled to change the thrust to achieve precise deformation of each area of ​​the mask surface, obtain better exposure quality, improve the exposure stability of the lithography equipment, increase the leveling accuracy, reduce the leveling process time, and thus improve the problems of pattern distortion and low resolution after exposure. Attached Figure Description

[0046] Figure 1 This is a schematic diagram of the high-precision positioning and leveling device provided in one embodiment of this application;

[0047] Figure 2 This is a schematic diagram of the pre-leveling module provided in one embodiment of this application;

[0048] Figure 3 This is a schematic diagram of the structure of a flexible suction cup module provided in one embodiment of this application;

[0049] Figure 4 This is a schematic diagram of the movement direction of the flexible suction cup module provided in one embodiment of this application;

[0050] Figure 5 This is a schematic diagram of the positioning mechanism module provided in one embodiment of this application;

[0051] Figure 6 This is a schematic diagram of the motion trajectory of the positioning mechanism module provided in one embodiment of this application;

[0052] Figure 7 This is a schematic diagram of the mask correction mechanism provided in one embodiment of this application.

[0053] In the diagram: 1-Support plate; 2-Pre-leveling module; 201-Disturbance plate; 202-Drive sensing device; 203-Fixed bracket; 3-Flexible suction cup module; 301-Suction cup rigid body; 302-Flexible hinge; 4-Mask correction mechanism; 401-Power module; 402-Force transmission module; 403-Sensor; 404-Push head; 5-Positioning mechanism module; 501-Fixed component; 502-Sliding component; 503-Drive motor; 6-Mask. Detailed Implementation

[0054] The features and exemplary embodiments of various aspects of this application will be described in detail below. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain this application and not to limit it. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples.

[0055] like Figure 1 As shown, one embodiment of this application provides a high-precision positioning and leveling device, including a device arranged along the direction of the exposure light source.

[0056] Flexible suction cup module 3, pre-leveling module 2, support plate 1,

[0057] The flexible suction cup module 3 can adsorb the target mask 6. The flexible suction cup module 3 is also provided with several orthogonally arranged correction components, which can generate orthogonal correction force and drive the target mask 6 to shift orthogonally in the axial direction of the correction components.

[0058] One end of the pre-leveling module 2 is coupled to the flexible suction cup module 3. The pre-leveling module 2 is provided with a number of driving sensing devices 202, which can drive the pre-leveling module 2 and the flexible suction cup to move according to the expected trajectory and control the spatial position of the target mask 6.

[0059] The other end of the pre-leveling module 2 is connected to the support plate 1, which serves to support the overall device.

[0060] The working principle of this application is as follows: During the photolithography process, when the mask 6 approaches the substrate, the mask 6 and the substrate come into contact and generate resistance. This resistance will cause the spatial position of the mask 6 to change. However, in actual photolithography engineering, it is required that the mask 6 and the substrate remain parallel and the gap is constant. Therefore, it is necessary to adjust the position between the mask 6 and the substrate, including dual leveling of precise alignment (parallelism) in dimensionality and pre-alignment in gap distance. The dual-level leveling system ensures the stability of the leveling and gap control between the mask 6 and the substrate.

[0061] The pre-leveling module 2 provided in this application serves as a pre-alignment in terms of gap distance, while the flexible suction cup module 3 serves as a precise alignment in the parallel dimension. When the mask 6 approaches the substrate, the mask 6 and the substrate come into contact, generating resistance. This resistance is transmitted to the coupled pre-leveling module 2 through the flexible suction cup module 3. The drive sensing device 202 on the pre-leveling module 2 can calculate the relative displacement of the pre-leveling module based on the magnitude of the torque, thereby determining and controlling the force and direction of action transmitted to the pre-leveling module 2 during operation. This drives the pre-leveling module 2 and the flexible suction cup to move along the expected calculated trajectory, enabling the pre-leveling module 2 to translate along the Z-axis and extend along the R-axis. X ,R Y The yaw motion drives the flexible chuck to translate along the Z-axis to approach or move away from the substrate, thereby controlling the gap distance between the mask 6 and the substrate.

[0062] The flexible suction cup module 3 provided in this application includes several orthogonally arranged correction components. These correction components can generate force through relative rotation, transmission, or their own deformation. The interaction force between the mask and the substrate causes the correction components to deform in the orthogonal direction, driving the flexible suction cup module 3 to correct along the axis of the correction components, thereby achieving precise orthogonal adjustment and directional leveling to keep the mask and substrate parallel. When the mask 6 approaches the substrate, the correction components can compensate for and adjust the uneven resistance generated on the mask 6. The adaptive flexible suction cup is designed to achieve leveling between the mask 6 and the substrate by changing the position of the mask 6 when they are not parallel.

[0063] In one embodiment of this application, such as Figure 2 As shown, the pre-leveling module 2 includes a flexure plate and a fixed bracket 203, and the drive sensing device 202 includes a first driver and a first sensor 403.

[0064] The first sensor 403 is disposed on the first driver and is used to receive data and provide feedback to the first driver;

[0065] One end of the first driver is connected to the flexure plate, thereby driving the flexure plate to move, and the other end is connected to the fixed bracket 203;

[0066] The flex plate is coupled to the flexible suction cup module 3, which can drive the flexible suction cup module 3 to move.

[0067] The fixed bracket 203 and the flexible plate are coupled to form the pre-leveling module 2. The sensor 403 in the drive sensing device 202 receives and analyzes the force, and the driver controls the movement of the components. Through decoupling, the flexible plate can be translated along the Z-axis and extended along the R-axis. X ,R Y The yaw action precisely adjusts the gap. The flex plate is connected to the fixed bracket 203 via a drive sensing device 202, which includes a first driver and a first sensor 403. The first sensor 403 is mounted on the first driver and senses force to drive the movement. In application, the movement of the first driver causes relative movement between the flexible suction cup module 3 and the top of the flex plate. This relative movement causes deformation of the flex plate and drives the flexible suction cup to translate along the Z-axis towards or away from the substrate.

[0068] The decoupled motion can be further explained as follows: Multiple sensors are arranged here (preferably no less than 3, since three points determine a plane). When the data fed back by multiple sensors are the same, it means that the two planes are parallel. When the output signals of multiple sensors are different, the algorithm adjusts the driver to make the outputs of multiple sensors the same. That is, the signals of multiple sensors are input to the controller, and the controller’s built-in transfer function converts the input signals into motion commands for the driver. Finally, the driver is controlled to move to achieve the result that the sensor output signals are consistent (i.e., the two planes are parallel).

[0069] In one embodiment of this application, the drive sensing device 202 is arranged equidistantly circumferentially on the fixed bracket 203 with the structural center of the high-precision positioning and leveling device as the axis of symmetry. This arrangement can ensure the uniformity and accuracy of adjustment.

[0070] In one embodiment of this application, the first driver includes one or both of a voice coil or a piezoelectric motor. Drivers commonly used in the prior art can be used in this application.

[0071] In one embodiment of this application, the end face of the first sensor 403 is attached to the flex plate, which makes the force sensing and control more precise.

[0072] In one embodiment of this application, the first sensor 403 includes one or both of a torque sensor 403 and an optical detector, which can be selected according to the actual application scenario. For example, a commonly used optical detection device such as an interferometer or a torque sensor 403 can be used to measure the gap between the mask 6 and the substrate, and return data to control the first driver, thereby adjusting the gap between the mask 6 and the substrate.

[0073] In one embodiment of this application, such as Figure 3 As shown, the correction component in the flexible suction cup module 3 is a flexible hinge 302, which has the characteristics of no mechanical friction, no gap, and high motion sensitivity.

[0074] In one embodiment of this application, the flexible hinges 302 are four orthogonally arranged flexible hinges 302. Theoretically, more flexible hinges 302 can achieve a more precise adjustment effect. However, considering practical use and device cost, in this application, four flexible hinges 302 are sufficient to achieve the correction purpose. Of course, more relatively related flexible hinges 302 can be set as needed to achieve the required directional axis rotation.

[0075] In actual operation, the flexible hinge 302 in the flexible suction cup module 3 is used to achieve leveling and gap control between the mask 6 and the substrate. The flexible hinge 302 is coupled to the flexible plate through the top interface, and its lower part is connected to the suction cup rigid body 301 of the flexible suction cup module 3. In this embodiment, as... Figure 4 As shown, one set of flexible hinges 302 allows the suction cup rigid body 301 to move around the first orientation axis 302d, and another set of flexible hinges 302 allows the suction cup rigid body 301 to move around the first orientation axis 302e. It should be clarified that in the system provided by the present invention, the orientation rotation axes are orthogonal to the projection plane of the mask 6, and the extension lines of the flexible arms of the flexible hinges 302 intersect the lower surface of the mask 6.

[0076] In one embodiment of this application, the flexible hinge 302 is provided with a top interface, which is adapted to the flex plate and can cooperate with the disturbance plate 201, thus having a better fit.

[0077] In one embodiment of this application, the flexible hinge 302 is designed with a notch to provide movement of the rigid suction cup portion in the flexible suction cup module 3 around a rotation axis positioned along the thinnest cross section of the flexible hinge 302.

[0078] In one embodiment of this application, the flexible suction cup module 3 is further provided with a flexible driving device, which is connected to the correction component and can actively provide driving force to the correction component. When the parallel offset is significant in actual working conditions, and automatic adjustment can no longer achieve the desired technical effect, an external flexible driving device can be used to provide external force to achieve the correction effect.

[0079] In one embodiment of this application, the flexible drive device includes a second driver and a second sensor 403.

[0080] In one embodiment of this application, the second sensor 403 includes one or more of a pressure sensor 403, a force sensor 403, and a laser sensor 403. Conventional sensors 403 can be used in this application.

[0081] In one embodiment of this application, the flexible suction cup module 3 adsorbs the target mask 6 by vacuum adsorption, which has a good adsorption effect and leaves no residual adhesive on the surface of the mask 6.

[0082] In one embodiment of this application, the high-precision positioning and leveling device further includes a positioning mechanism module 5. The positioning mechanism module 5 can fix the mask 6 on the surface of the flexible suction cup module 3. The positioning mechanism module 5 includes a fixing component 501 and a plurality of sliding components 502 set on the fixing component 501. The sliding components 502 can make contact with the target mask 6 according to a set movement mode, fix the mask 6 by contact friction, and achieve secondary protection of the mask 6 when the primary fixation (vacuum or other) of the mask 6 fails, preventing the mask 6 from falling off.

[0083] In one embodiment of this application, such as Figure 5 As shown, the sliding component 502 is provided with a drive motor 503, which can generate a centripetal force toward the target mask 6, causing the sliding component 502 to move centripetally toward the target mask 6, thereby making contact.

[0084] The positioning mechanism module 5 is composed of a fixed component 501 and a sliding component 502 coupled together, and is driven by a drive motor 503. The positioning mechanism is coupled to the suction cup rigid body 301 of the flexible suction cup module 3. In actual working conditions, such as... Figure 6 As shown, a typical photolithography system uses a robotic arm or other means to deliver the mask 6 to the pre-alignment position h1. At this time, the positioning mechanism is already in place at h1, and the sliding component 502 is at the maximum stroke position t1 in the X and Y directions. After pre-alignment, the robotic arm delivers the mask 6 to the mask 6 adsorption position h2. Then, the drive motor 503 controls the sliding component 502 to move towards the mask 6 in the centripetal direction. When the torque sensor of the drive motor 503 reaches the preset torque, the movement stops. At this time, the mask 6 reaches the positioning position, and the sliding component 502 is at the stroke position t2. Then, the vacuum adsorption function on the flexible suction cup module 3 is activated to complete the fixation of the mask 6.

[0085] The positioning mechanism module 5 can rely on friction to prevent the mask 6 from falling and being damaged in the event of an unexpected interruption of the vacuum suction cup. At the same time, the positioning mechanism provides a working position for the mask 6 straightening mechanism 4, ensuring the structural conditions for the mask 6 straightening process.

[0086] The maximum travel position t1 is when the positioning mechanism module 5 is fully open and has the largest internal space, to ensure that the mask 6 can be placed inside. t2 is when the positioning mechanism is retracted to the required position.

[0087] In one embodiment of this application, the fixing component 501 includes two L-shaped fixing blocks, which can be spliced ​​together to form a square fixing component 501, which is more suitable for the shape of the mask 6 in actual working conditions.

[0088] In one embodiment of this application, the sliding component 502 includes four L-shaped sliders, which are arranged at the four corners of the square fixing component 501, making it more flexible and providing a better fixing effect.

[0089] In one embodiment of this application, the sliding component 502 includes two linear sliders, which are vertically orthogonal.

[0090] In one embodiment of this application, the high-precision positioning and leveling device further includes a mask 6 correction mechanism 4 disposed on the upper end surface of the support plate 1. The mask 6 correction mechanism 4 has a certain height, can make contact with the target mask 6, and can apply a correction force to the target mask 6 in the circumferential direction.

[0091] In one embodiment of this application, such as Figure 7 As shown, the mask 6 correction mechanism 4 is composed of an even number of mask 6 correction mechanism 4 units, and each even number of mask 6 correction mechanism 4 units forms a group of mechanism units, with each group of mechanism units arranged symmetrically in pairs;

[0092] The mask 6 correction mechanism 4 unit includes a power module 401, a force transmission module 402, a sensor 403, and a pusher 404.

[0093] The power module 401 is used to generate power;

[0094] The force transmission module 402 is a flexible mechanism capable of deformation. One end of the force transmission module 402 is connected to the power module 401, and the other end is connected to one end of the sensor 403.

[0095] The sensor 403 receives force data to adjust the thrust of the power module 401, and its other end is connected to the push head 404;

[0096] The other end of the pusher 404 contacts the target mask 6.

[0097] In one embodiment of this application, the mask 6 correction mechanism 4 is composed of 16 mask 6 correction mechanism 4 units, with each group of 4 mask 6 correction mechanism 4 units forming a group of mechanism units, for a total of 4 groups of mechanism units, and each group of mechanism units is symmetrically arranged in pairs.

[0098] In actual operation, the power module 401 pushes the upper part of the force transmission module 402, transferring the thrust through the flexible structure of the force transmission module 402 to its end. The thrust is then transmitted to the outer wall of the mask 6 via the sensor 403 and the pusher head 404. This device receives resistance data from the force sensor 403 to control and adjust the thrust of the power module 401. It also uses a motion deformation decoupling algorithm to decouple and control the surface deformation of the mask 6, maintaining the stability of the mask 6's corrected deformation for a relatively long period. The power module 401 sets a thrust threshold; when the data from the force sensor 403 reaches the threshold, the thrust is restored to the preset value.

[0099] In one specific embodiment, the mask 6 is fixed to the flexible chuck module 3 by vacuum adsorption (or other means), bringing the mask 6 into contact with the wafer. When the mask 6 approaches the substrate, the mask 6 and the substrate come into contact and generate resistance. This resistance is transmitted to the flex plate through the flexible chuck module 3. The force applied to the flex plate is received by the first sensor 403 on the first driver. The first sensor 403 can analyze the resistance transmitted to the first driver, thereby determining and controlling the resistance transmitted to the first driver during operation, thus controlling the distance between the mask 6 and the substrate. The flexible chuck module 3 fixes the mask 6, generating a pure tilting motion without significant lateral movement at the surface of the mask 6. The flexible hinge 302 generates a precise position in the rotation direction of the orientation axis, thereby controlling parallelism, but has high stiffness in directions where lateral movement or rotation is undesirable.

[0100] This application provides an adaptive device that allows movement to occur without any user or programmable controller intervention; that is, the system can self-correct to the appropriate position by the resistance generated by the contact between the mask 6 and the substrate. The operation of the flexible suction cup module 3 is activated by direct or indirect contact with the substrate. The two orientation axes of the flexible suction cup module 3 are orthogonal to each other, and the two orthogonal torsional compliance values ​​of the flexible hinge 302 are set to be the same.

[0101] The flexible chuck module 3 is designed to adjust the position of the mask 6 and control the gap between them when the mask 6 is not parallel to the substrate. When the mask 6 contacts the substrate (or photoresist), the flexible hinge 302 can compensate for the uneven resistance generated on the mask 6 and maintain the parallel position between the mask 6 and the substrate for a sufficiently long time to ensure the required exposure time for different doses. The system of this invention is mounted and fixed on the support plate 1. During exposure, all movement along the XY plane is performed by the support plate 1 driving the substrate.

Claims

1. A high-precision positioning and leveling device, characterized in that: This includes a flexible suction cup module, a pre-leveling module, and a support plate positioned along the direction of the exposure light source. The flexible suction cup module can adsorb the target mask. The flexible suction cup module is also provided with several orthogonally arranged correction components, which can generate orthogonal correction force and drive the target mask to shift orthogonally in the axial direction of the correction components. The correction components are flexible hinges. One end of the pre-leveling module is coupled to the flexible suction cup module. The pre-leveling module is equipped with several driving sensing devices, which can drive the pre-leveling module and the flexible suction cup module to move along the expected trajectory and control the spatial position of the target mask. The pre-leveling module includes a flexure plate and a fixed bracket, and the driving sensing device includes a first driver and a first sensor. The first sensor is mounted on the first driver and is used to receive data to provide feedback to the first driver; One end of the first driver is connected to the flexure plate, thereby driving the flexure plate to move, and the other end is connected to the fixed bracket; The flex plate is coupled to the flexible suction cup module, which can drive the flexible suction cup module to move; The other end of the pre-leveling module is connected to the support plate.

2. The high-precision positioning and leveling device according to claim 1, characterized in that: The drive sensing device is arranged equidistantly circumferentially on the fixed bracket with the structural center of the high-precision positioning and leveling device as the axis of symmetry.

3. The high-precision positioning and leveling device according to claim 1, characterized in that: The first driver includes one or both of a voice coil or a piezoelectric motor, and / or the end face of the first sensor is in contact with a flexure plate, and / or the first sensor includes one or both of a torque sensor or an optical detector.

4. The high-precision positioning and leveling device according to claim 1, characterized in that: The flexible hinge consists of four orthogonally arranged flexible hinges.

5. The high-precision positioning and leveling device according to claim 4, characterized in that: The flexible hinge is provided with a top interface, which is adapted to the flex plate and can cooperate with the disturbance plate.

6. The high-precision positioning and leveling device according to claim 1, characterized in that: The flexible suction cup module is also equipped with a flexible driving device, which is connected to the correction component and can actively provide driving force to the correction component.

7. The high-precision positioning and leveling device according to claim 6, characterized in that: The flexible drive device includes a second driver and a second sensor.

8. The high-precision positioning and leveling device according to claim 7, characterized in that: The second sensor includes one or more of a barometric pressure sensor, a force sensor, and a laser sensor.

9. The high-precision positioning and leveling device according to claim 1, characterized in that: The flexible suction cup module adsorbs the target mask through vacuum adsorption.

10. The high-precision positioning and leveling device according to claim 1, characterized in that: The high-precision positioning and leveling device also includes a positioning mechanism module. The positioning mechanism module can fix the mask on the surface of the flexible suction cup module. The positioning mechanism module includes a fixed component and several sliding components set on the fixed component. The sliding components make contact with the mask according to a set movement method.

11. The high-precision positioning and leveling device according to claim 10, characterized in that: The sliding component is equipped with a drive motor.

12. The high-precision positioning and leveling device according to claim 10, characterized in that: The fixing component includes two L-shaped fixing blocks, which can be assembled into a square fixing component.

13. The high-precision positioning and leveling device according to claim 12, characterized in that: The sliding component includes four L-shaped sliders, which are disposed at the four corners of the square fixing component; or, The sliding component includes two linear sliders, which are vertically orthogonal.

14. The high-precision positioning and leveling device according to claim 1, characterized in that: The high-precision positioning and leveling device also includes a mask correction mechanism disposed on the upper surface of the support plate. The mask correction mechanism comes into contact with the target mask and can apply a correction force to the target mask in a circumferential direction.

15. The high-precision positioning and leveling device according to claim 14, characterized in that: The mask correction mechanism consists of an even number of mask correction mechanism units, with each even number of mask correction mechanism units forming a group of mechanism units, and each group of mechanism units is arranged symmetrically in pairs; The mask correction mechanism unit includes a power module, a force transmission module, sensors, and a pusher. The power module is used to generate power; The force transmission module is a flexible mechanism capable of deformation. One end of the force transmission module is connected to the power module, and the other end is connected to one end of the sensor. The sensor receives force data to adjust the thrust of the power module, and its other end is connected to the push head. The other end of the pusher head contacts the target mask.

16. The high-precision positioning and leveling device according to claim 15, characterized in that: The mask correction mechanism consists of 16 mask correction mechanism units, with 4 mask correction mechanism units forming a group of mechanism units, for a total of 4 groups of mechanism units, and each group of mechanism units is arranged symmetrically in pairs.

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