A metrological standard

Abstract

The application provides a kind of metrological standard, including working area and identification area, wherein, the working area includes: cross structure four peripheral working area, round hole grid working area, cross structure center working area, combined checkerboard structure working area, siemens star structure working area, transverse oblong grid working area, longitudinal oblong grid working area, ring structure working area and radial round hole combination structure working area;The identification area includes 4:3 map position identification and standard name identification;The metrological standard of the application is the integration of different sizes and different structures, realizes multiple functions of a standard, realizes multiple calibration functions without replacing the calibrator in actual measurement use, eliminates the error caused by replacing the calibrator, and greatly improves the calibration efficiency and production efficiency of the metrological standard.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of micro-nano metrology, and discloses an integrated metrology standard device capable of calibrating line width, period, resolution and pattern distortion. BACKGROUND

[0002] As a kind of transfer standard, metrology standard device can control the machining size precision in manufacturing industry, realize high-precision and traceability characterization, calibrate machining micro-nano tools or parts of machine and related micro-nano measuring instruments, and plays an important role in industrial production and manufacturing industry.

[0003] At present, the structure, value and function of traditional metrology standard device are single, and the standard device needs to be replaced and the structure needs to be searched when calibrating instruments, so the calibration efficiency is low, and the metrology standard device with different structures and values needs to be produced in batches, so the production efficiency is low, and errors are caused by the standard device produced in different batches when used. SUMMARY

[0004] The present application provides a metrology standard device, which solves the problem of low calibration efficiency of the existing metrology standard device.

[0005] In order to achieve the above-mentioned purpose, the technical scheme adopted by the present application is as follows:

[0006] The present application provides a metrology standard device, which includes a working area and a marking area, wherein the working area includes:

[0007] A cross structure working area around the edge resolution of the metrology standard device;

[0008] A circular hole grid working area for calibrating grid transverse period, grid longitudinal period and pattern distortion;

[0009] A cross structure center working area for determining the edge resolution of the center of the metrology standard device;

[0010] A combined chessboard structure working area for line width calibration and edge resolution calibration of different directions and different sizes;

[0011] A Siemens star structure working area for obtaining the spatial frequency response value based on sine wave of each measurement direction, and then calculating the resolution of different directions;

[0012] A transverse rectangular grid working area for calibrating grid transverse period;

[0013] A longitudinal rectangular grid working area for calibrating grid longitudinal period;

[0014] A ring structure working area for calibrating different size line widths in various directions, and

[0015] A radial circular hole combined structure working area for quickly calibrating resolution;

[0016] The identification area comprises 4:3 map position identification and standard name identification.

[0017] Preferably, the 4:3 map position identification is provided with four, and the four 4:3 map position identifications are arranged at the four corners of the base respectively.

[0018] Preferably, the cross structure four-corner working area is provided with four groups, and the four groups of cross structure four-corner working areas are arranged at the four corners of the base respectively;

[0019] Each group of cross structure four-corner working areas comprises three cross structures and two inclined angle identifications, wherein the inclined angles of the three cross structures are distributed in an arithmetic progression of 0°, 30° and 60°; and the two inclined angle identifications are arranged at the right sides of the two cross structures with inclined angles of 30° and 60° respectively.

[0020] Preferably, the cross structure center working area is placed at the center position of the measurement standard, and comprises three cross structures, wherein the inclined angles of the three cross structures are distributed in an arithmetic progression of 0°, 30° and 60°, and the right sides of the two cross structures with inclined angles of 30° and 60° are respectively provided with size guide identifications corresponding to the inclined angles.

[0021] Preferably, the transverse rectangular grid working area is placed directly below the cross structure center working area and arranged in a horizontal structure, and comprises seven kinds of line width size transverse rectangular grid structures, each of which comprises ten rectangular grids.

[0022] The left side of each line width size transverse rectangular grid structure is provided with a size guide identification for indicating the line width size.

[0023] The left and right sides of each line width size transverse rectangular grid structure are provided with two measurement positioning identifications.

[0024] The longitudinal rectangular grid working area has the same structure as the transverse rectangular grid working area and is placed on the left side of the transverse rectangular grid working area and arranged in a vertical direction.

[0025] Preferably, the circular hole grid working area is arranged directly above the cross structure central working area, and includes seven circular hole grid structures with different diameters, each of which includes a plurality of first column circular hole groups and a plurality of second column circular hole groups, which are arranged alternately; wherein the number of circular hole grids in the first column circular hole group is fifteen, and the number of circular hole grids in the second column circular hole group is fourteen.

[0026] The left side of each circular hole grid structure with different diameters is provided with a size guide mark for indicating the diameter size of the circular hole grid.

[0027] Preferably, the combined chessboard grid structure working area is arranged on the right side of the transversely long rectangular grid working area, and includes five groups of hollow rhombus structures, which are arranged alternately in up-down direction, wherein the first row, the second row and the third row are arranged alternately to the right, and the fourth row and the fifth row are arranged alternately to the left.

[0028] The hollow part of each hollow rhombus structure is provided with a size guide mark for indicating the width size of the hollow rectangle in each hollow rhombus structure.

[0029] Each of the four edges of each hollow rhombus structure is provided with a direction guide mark, and each direction guide mark points to the center of the hollow rhombus structure in the vertical direction of each edge.

[0030] A row of solid square structures is arranged between the two groups of hollow rhombus structures, and the size of each row of solid square structures decreases in turn.

[0031] Each solid square structure in each row of solid square structures is located at the center position of the four direction guide marks.

[0032] Each of the four edges of each solid square structure is provided with an isosceles triangle, and the top angle of each isosceles triangle faces the center of the solid square structure.

[0033] Preferably, the Siemens star structure working area is arranged directly below the transversely long rectangular grid working area, and includes three Siemens star structures with period values of 36, 72 and 144 respectively.

[0034] Preferably, the ring structure working area is arranged above the circular hole grid working area, and includes a ring structure, which includes a solid circle, and the outer side of the solid circle is provided with ten circular rings with diameters increasing in turn, and the solid circle and the ten circular rings are arranged concentrically.

[0035] The outer circumferential direction of the ring structure is uniformly distributed with four direction guide marks.

[0036] Preferably, the radial circular hole combination structure working area circular hole grid working area is above the working area, and is arranged on the left side of the annular structure working area, and is arranged at the same horizontal position as the annular structure working area; the radial circular hole combination structure working area comprises twelve groups of circular hole structures and a center circular hole, and the twelve groups of circular hole structures are uniformly distributed along the circumference of the center circular hole; each group of circular hole structures is composed of ten circular holes, and the ten circular holes are arranged in a straight line in order from small to large in diameter.

[0037] Compared with the prior art, the beneficial effects of the present application are:

[0038] The present application provides a kind of metrological standard, and periodic calibration function is realized by transverse, longitudinal rectangular grid working area and circular hole grid working area, and at the same time, circular hole grid working area can carry out figure distortion detection;Different direction and different size line width calibration and resolution calibration function are realized by combined checkerboard structure working area;The function of line width calibration in each direction is realized by annular structure working area;Cross structure working area, Siemens star structure working area, radial circular hole combination structure working area realize the function of resolution calibration, wherein, the cross structure working area of four sides and center realizes the edge resolution calibration of different positions, Siemens star structure working area accurately realizes the calibration of resolution in each direction, and radial circular hole combination structure working area quickly realizes the calibration of resolution in each direction;Therefore, the integration of different sizes and different structures realizes the multiple functions of a standard, and in actual measurement use, multiple calibration functions can be realized without replacing calibrator, eliminates the error caused by replacing calibrator, and greatly improves the calibration efficiency and production efficiency of metrological standard. BRIEF DESCRIPTION OF DRAWINGS

[0039] Figure 1 It is the plane schematic view of the metrological standard related to the present application.

[0040] Figure 2 It is the plane schematic view of the upper left corner of 4:3 map position mark of the metrological standard related to the present application.

[0041] Figure 3 It is the plane schematic view of the upper left corner of cross structure four-side working area of the metrological standard related to the present application.

[0042] Figure 4 It is the plane schematic view of the circular hole grid working area of the metrological standard related to the present application.

[0043] Figure 5 It is the A enlarged view of the plane schematic view of the circular hole grid working area of the metrological standard related to the present application.

[0044] Figure 6Cross structure center working area plan view of the metrological standard involved in the present application.

[0045] Figure 7 Combined checkerboard structure working area plan view of the metrological standard involved in the present application.

[0046] Figure 8 B enlarged view of the combined checkerboard structure working area plan view of the metrological standard involved in the present application.

[0047] Figure 9 Siemens star structure working area plan view of the metrological standard involved in the present application.

[0048] Figure 10 C enlarged view of the Siemens star structure working area plan view of the metrological standard involved in the present application.

[0049] Figure 11 Transverse rectangular grid working area plan view of the metrological standard involved in the present application.

[0050] Figure 12 D enlarged view of the transverse rectangular grid working area plan view of the metrological standard involved in the present application.

[0051] Figure 13 Longitudinal rectangular grid working area plan view of the metrological standard involved in the present application.

[0052] Figure 14 E enlarged view of the longitudinal rectangular grid working area plan view of the metrological standard involved in the present application.

[0053] Figure 15 Annular structure working area plan view of the metrological standard involved in the present application.

[0054] Figure 16 Radiation circle hole combination structure working area plan view of the metrological standard involved in the present application.

[0055] Figure 17 F enlarged view of the metrological standard involved in the present application.

[0056] Figure 18 A group of circle hole structure plan view of the metrological standard involved in the present application.

[0057] In the figure: 1, 4: 3 map position identification; 2, cross structure four around working area; 3, standard name identification; 4, round hole grid working area; 5, cross structure center working area; 6, combined chessboard grid structure working area; 7, Siemens star structure working area; 8, transverse rectangular grid working area; 9, longitudinal rectangular grid working area; 10, ring structure working area; 11, radial round hole combination structure working area; 201, cross structure size guide identification of standard four around working area; 202, cross structure of standard four around working area; 401, round hole grid structure; 402, size guide identification of round hole grid structure; 501, cross structure of standard center working area; 502, cross structure size guide identification of standard center working area; 601, direction guide identification of solid square structure; 602, solid square structure; 603, direction guide identification of hollow rhombus structure; 604, size guide identification of hollow rhombus structure; 605, hollow rhombus structure; 801, transverse rectangular grid structure; 802, size guide identification of transverse rectangular grid structure; 803, measurement positioning identification of transverse rectangular grid structure; 901, longitudinal rectangular grid structure; 902, size guide identification of longitudinal rectangular grid structure; 903, measurement positioning identification of longitudinal rectangular grid structure; 1001, ring structure; 1002, direction guide identification of ring structure. DETAILED DESCRIPTION

[0058] In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system configurations, techniques, etc., in order to provide a thorough understanding of the embodiments of the present application. However, it will be apparent to those skilled in the art that the present application can be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.

[0059] It is to be understood that the terminology "includes", "has", "holds", "contains" and / or "comprising", when used in this specification and in the following claims, indicates the presence of the described features, integers, steps, operations, elements, and / or components, but does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0060] It is also to be understood that the terminology "and / or" when used in this specification and in the following claims, indicates that the associated listed items can be present one or more of the associated listed items, and all possible combinations thereof.

[0061] As used in this application specification and the appended claims, the term "if" may be interpreted, depending on the context, as "when," "once," "in response to determination," or "in response to detection." Similarly, the phrase "if determined" or "if detected [the described condition or event]" may be interpreted, depending on the context, as meaning "once determined," "in response to determination," "once detected [the described condition or event]," or "in response to detection [the described condition or event]."

[0062] Furthermore, in the description of this application and the appended claims, the terms "first," "second," "third," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0063] References to "one embodiment" or "some embodiments" in this specification mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.

[0064] To improve the efficiency of metrological standard transfer and production, it is essential to develop an integrated metrological standard that combines different sizes and structures, enabling calibration of different instrument functions without replacing the original metrological standard. (According to the appendix...) Figures 1 to 18 The specific embodiments of the present invention will be described in detail below, but the present invention is not limited to these embodiments. In order to give the public a thorough understanding of the present invention, specific details are described in detail in the following preferred embodiments.

[0065] like Figures 1 to 18 As shown, the present invention provides a metrological standard, including a working area and a marking area.

[0066] The working areas include the working area around the cross structure 2, the working area of ​​the circular hole grid 4, the working area in the center of the cross structure 5, the working area of ​​the combined checkerboard structure 6, the working area of ​​the Siemens star structure 7, the working area of ​​the horizontal rectangular grid 8, the working area of ​​the vertical rectangular grid 9, the working area of ​​the ring structure 10, and the working area of ​​the radial circular hole combination structure 11; the marking area includes the 4:3 map sheet position marking 1 and the standard instrument name marking 3.

[0067] The cross structure around the working area 2 includes the cross structure size guide mark 201 of the standard around the working area, and the cross structure 202 of the standard around the working area.

[0068] The round hole grid working area 4 includes the round hole grid structure 401 and the size guide mark 402 of the round hole grid structure.

[0069] The cross structure center working area 5 includes the cross structure 501 of the standard center working area and the cross structure size guide mark 502 of the standard center working area.

[0070] The combined chessboard grid structure working area 6 includes the direction guide mark 601 of the solid square structure, the solid square structure 602, the direction guide mark 603 of the hollow rhombus structure, the size guide mark 604 of the hollow rhombus structure and the hollow rhombus structure 605.

[0071] The transverse rectangular grid working area 8 includes the transverse rectangular grid structure 801, the size guide mark 802 of the transverse rectangular grid structure and the measurement positioning mark 803 of the transverse rectangular grid structure.

[0072] The longitudinal rectangular grid working area 9 includes the longitudinal rectangular grid structure 901, the size guide mark 902 of the longitudinal rectangular grid structure and the measurement positioning mark 903 of the longitudinal rectangular grid structure.

[0073] The ring structure working area 10 includes the ring structure 1001 and the direction guide mark 1002 of the ring structure.

[0074] The cross structure 202 of the standard around the working area includes three cross structures with horizontal length and vertical shortness, the inclined angles of the three cross structures are distributed according to the arithmetic sequence 0°, 30° and 60°, and the three cross structures are distributed around the 4:3 map position mark 1. The cross structure size guide mark 201 of the standard around the working area is arranged on the right side of the corresponding cross structure.

[0075] The cross structure 501 of the standard center working area includes three cross structures with horizontal length and vertical shortness, the inclined angles of the three cross structures are distributed according to the arithmetic sequence 0°, 30° and 60°, and the three cross structures are distributed horizontally in the center of the working area. The cross structure size guide mark 502 of the standard center working area is arranged on the right side of the corresponding cross structure.

[0076] The size guide mark 402 of the round hole grid structure is distributed horizontally above the round hole grid structure 401.

[0077] The size guide mark 802 of the transverse rectangular grid structure is distributed above the transverse rectangular grid structure 801, and the measurement positioning mark 803 of the transverse rectangular grid structure is distributed on both sides of each different size grid. The measurement positioning mark of each size grid is a directional graphic structure, such as a rectangle, a triangle, a trapezoid, an arrow, etc., which can provide a reference position for measuring and calibrating the grid period. The longitudinal rectangular grid working area is a transverse rectangular grid working area rotated counterclockwise by 90 degrees, and is arranged on the left side of the transverse rectangular grid working area.

[0078] The hollow rhombus structure 605 and the solid square structure 602 are arranged longitudinally in a staggered manner. The size guide mark 604 of the hollow rhombus structure and the direction guide mark 601 of the solid square structure are both directional graphic structures, such as a rectangle, a triangle, a trapezoid, an arrow, etc., which can provide a reference position for measuring and calibrating the structure. The size guide mark 604 of the hollow rhombus structure is distributed at the center of the hollow rhombus structure 605 according to the corresponding size. The direction guide mark 603 of the hollow rhombus structure is vertically directed to the center of the hollow rhombus structure 605 along the four sides of the hollow rhombus structure 605. The direction guide mark 601 of the solid square structure is vertically directed to the center of the solid square structure 602 along the four sides of the solid square structure 602.

[0079] The 4:3 map position mark 1 is arranged at the four corners of the 4:3 map of the metrological standard.

[0080] The direction guide mark 1002 of the ring structure is a directional graphic structure, such as a rectangle, a triangle, a trapezoid, an arrow, etc., which can provide a reference position for measuring and calibrating the structure. The direction guide mark 1002 of the ring structure is directed to the ring structure 1001 along the horizontal and vertical directions.

[0081] The Siemens star structure working area 7 includes Siemens star structures with period values of 36, 72, and 144.

[0082] The radial circular hole combination structure working area 11 is composed of circular hole structures with a period value of 12. The diameters of the circular holes in each group of circular hole structures decrease in an arithmetic progression along the center direction of the radial circular hole combination structure working area 11.

[0083] The integrated metrological standard for realizing line width, period, resolution, and graphic distortion calibration is directly prepared at the center position of a silicon oxide wafer. The specific preparation method is as follows:

[0084] Uniformly coat photoresist on a silicon oxide substrate, then expose and develop, then perform inductively coupled plasma etching, control the cycle number of etching to etch the required structure depth, and finally remove the photoresist to obtain the metrological standard.

[0085] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application is further described in detail below in combination with specific examples and drawings. It should be understood that the specific examples described herein are only used to explain the present application and do not limit the present application.

[0086] Embodiment:

[0087] According to the drawings Figures 1 to 18 , the metrological standard of the present application is realized on a single-side polished silicon oxide wafer of 4mm x 4mm.

[0088] The specific preparation method of the integrated metrological standard realizing line width, period, resolution and pattern distortion calibration functions is as follows:

[0089] Uniformly photoresist is etched on the silicon oxide substrate, then exposed and developed, and then inductively coupled plasma etching is performed. The required structure depth is etched by controlling the cycle number of etching. Finally, the photoresist is removed to obtain metrological standards of different value sizes and different structures. The preparation process is simple and the preparation efficiency is high.

[0090] The 4:3 map position mark 1 is used to determine the 4:3 map edge when calibrating the edge resolution. It is composed of four groups of patterns, each group including a rectangular structure, an isosceles triangle structure and the text 4:3, distributed at the four corners of a 3mm x 4mm rectangular panel, the center of the rectangular panel coincides with the center of the metrological standard, the top angle of each isosceles triangle points to the rectangular of the group, and each group of text 4:3 is located below the isosceles triangle of the group. The length of the rectangular is 0.02mm and the width is 0.2mm. The base length of the isosceles triangle is 0.09mm and the height on the base is 0.17mm.

[0091] The standard name mark 3 can be used to determine the placement direction of the metrological standard, which is provided at the upper side near the edge of the metrological standard. The design font length is 1.13mm and the height is 0.07mm.

[0092] The cross structure four surrounding work areas 2 are composed of four groups of patterns, each group including three kinds of cross structures with horizontal length and vertical shortness and corresponding inclination angle marks. The horizontal segment length of the cross structure is 3mm and the width is 0.2mm. The vertical segment length of the cross structure is 2mm and the width is 0.2mm. The inclination angles of the three kinds of cross structures are distributed in an arithmetic sequence of 0°, 30° and 60°, and are provided around each group of patterns of the 4:3 map position mark 1.

[0093] The cross structure size guide mark 201 of the working area around the standard includes the numbers 30 and 60, which are arranged on the right side of the corresponding cross structure to indicate the inclination angle of the corresponding cross structure, and the font height is 0.05 mm and the width is 0.02 mm.

[0094] The cross structure with an inclination angle of 0° is arranged on one side of the base of each isosceles triangle.

[0095] The cross structure with an inclination angle of 60° is arranged on one side of the cross structure with an inclination angle of 0° and close to the center of the measurement standard.

[0096] The cross structure with an inclination angle of 30° is arranged on the side of the cross structure with an inclination angle of 60° away from the center of the measurement standard.

[0097] According to the cross structure around the working area 2, the edge resolution around the measurement standard is calculated based on the edge-based spatial frequency of the 4:3 map.

[0098] The central working area 5 of the cross structure consists of a group of patterns, including three kinds of cross structures with horizontal length and vertical shortness, the horizontal segment length of the cross structure is 3 mm and the width is 0.2 mm, the vertical segment length of the cross structure is 2 mm and the width is 0.2 mm, and the inclination angles of the three kinds of cross structures are distributed in an arithmetic sequence of 0°, 30° and 60°, which are arranged in the center of the measurement standard.

[0099] The cross structure size guide mark 502 of the central working area of the standard includes the numbers 30 and 60, which are arranged on the right side of the corresponding cross structure to indicate the inclination angle of the corresponding cross structure, and the font height is 0.05 mm and the width is 0.02 mm. The edge resolution of the center of the measurement standard is obtained by measuring and calculating the edge-based spatial frequency of the 4:3 map, and the cross structure with an inclination angle of 0° is used to realize the determination of the horizontal direction and the vertical direction of the measurement standard.

[0100] The transverse rectangular grid working area 8 is used to calibrate the transverse period of the grid, and the transverse rectangular grid structure 801 includes seven kinds of line width sizes, and each specification of the rectangular grid structure contains ten rectangular grids, which are 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm and 2 μm, and the periods are 40 μm, 30 μm, 20 μm, 16 μm, 12 μm, 8 μm and 4 μm, respectively.

[0101] The length of the transverse rectangular grid with a line width of 20 μm, 15 μm and 10 μm is 100 μm.

[0102] The length of the transverse rectangular grid with a line width of 8 μm, 6 μm and 4 μm is 50 μm.

[0103] The length of the transverse rectangular grid with a line width of 2 μm is 20 μm.

[0104] The size guide mark 802 of the transverse rectangular grid structure includes the numbers 20, 15, 10, 8, 6, 4, 2, the design font width is 0.009 mm, the height is 0.02 mm, and is arranged above the left side of the corresponding size grid structure, indicating that the line width of the rectangular grid structure in the transverse rectangular grid structure 801 is 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm, and 2 μm.

[0105] The measurement positioning mark 803 of the transverse rectangular grid structure includes seven groups of structures, each group including four isosceles triangles with a base length of 0.006 mm and a base height of 0.005 mm, arranged on both sides of each group of different size transverse rectangular grid structures, two on one side, and the top angle of the isosceles triangle pointing to the transverse rectangular grid, the isosceles triangle being used to determine the effective range of measurement, arranged at 80% of the overall length of each group of transverse rectangular grids, and providing a reference position for measuring and calibrating the grid period.

[0106] The longitudinal rectangular grid working area 9 is a transverse rectangular grid working area 8 rotated counterclockwise by 90 degrees, and the longitudinal rectangular grid working area 9 is used for calibrating the longitudinal period of the grid.

[0107] The circular hole grid working area 4 is used for calibrating the transverse and longitudinal periods and the pattern distortion of the grid, and the circular hole grid structure 401 includes seven diameter sizes, namely 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm, and 2 μm, the first column of holes of each diameter has fifteen holes, the second column has fourteen holes, the two columns are arranged in an interlaced manner with an interlaced interval of one diameter length, and ten groups are repeated.

[0108] The size guide mark 402 of the circular hole grid structure includes the numbers 20, 15, 10, 8, 6, 4, 2, the design font width is 0.009 mm, the height is 0.02 mm, and is arranged above the left side of the corresponding size grid structure, indicating that the diameter size of the circular hole grid in the circular hole grid structure 401 is 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm, and 2 μm.

[0109] The combined chessboard structure working area 6 is used for line width calibration and edge resolution calibration in different directions and different sizes, and includes five groups of same hollow rhombus structures 605. The five groups of same hollow rhombus structures are staggered, three groups are staggered to the right side and two groups are staggered to the left side. Each hollow rhombus is composed of four same size rectangles, the length of the rectangle is 0.07mm, and the width is different. The width of the rectangle in each group of hollow rhombus structures from right to left is 20μm, 15μm, 10μm, 8μm, 6μm, 4μm, and 2μm.

[0110] The size guide mark 604 of the hollow rhombus structure includes numbers 20, 15, 10, 8, 6, 4, and 2. The design font width is 0.004mm, the height is 0.02mm, and there are five groups. The size guide mark 604 is arranged at the center of the corresponding size hollow rhombus structure, and indicates that the width of the rectangle in each hollow rhombus structure is 20μm, 15μm, 10μm, 8μm, 6μm, 4μm, and 2μm.

[0111] The direction guide mark 603 of the hollow rhombus structure points to the center of the hollow rhombus structure 605 in the vertical direction of the four sides of the hollow rhombus structure 605. The direction guide mark 603 of the hollow rhombus structure is a straight line structure formed by a plurality of different size isosceles triangles. According to the straight line formed by the isosceles triangle, the field of view can be quickly moved during calibration, so that the position of the calibration structure can be quickly found. The larger size isosceles triangle points to the rectangle with larger width of the hollow rhombus structure, and the smaller size isosceles triangle points to the rectangle with smaller width of the hollow rhombus structure. The continuity and coordination between the isosceles triangle and the hollow rhombus structure are improved when the structure is found in the field of view.

[0112] The base length of the isosceles triangle of the direction guide mark 603 corresponding to the hollow rhombus structure with size guide mark 604 of numbers 6, 4, and 2 is 6μm, 4μm, and 2μm respectively, the length of the base height is 5μm, 3μm, and 2μm respectively, and the number of isosceles triangles in each straight line formed by the isosceles triangle is 5, 8, and 19 respectively.

[0113] The base length of the isosceles triangle of the direction guide mark 603 corresponding to the hollow rhombus structure with size guide mark 604 of numbers 20, 15, 10, and 8 is 6μm, and the length of the base height is 5μm. The number of isosceles triangles in each straight line formed by the isosceles triangle is 5, 4, 3, and 3 respectively.

[0114] The five groups of same solid square structures 602 are staggered, two groups to the right and two groups to the left, and are arranged in the middle of the staggered hollow diamond structures. The side length of each group of solid squares from right to left is 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm, and 2 μm. The size of the structure is designed to correspond to the length of the hollow diamond structure.

[0115] The direction indicating mark 601 of the solid square structure is composed of isosceles triangles of different sizes. Each solid square is surrounded by four isosceles triangles, and the top angle of the isosceles triangle points to the center of the four sides of the solid square to determine the calibration direction. The base length of the isosceles triangle pointing to the solid square with a side length of 20 μm, 15 μm, 10 μm, 8 μm, 6 μm, 4 μm, and 2 μm is 4 μm, 4 μm, 2 μm, 2 μm, 2 μm, 1 μm, and 1 μm, respectively, and the height of the base is 3 μm, 3 μm, 2 μm, 2 μm, 2 μm, 1 μm, and 1 μm, respectively. The isosceles triangle is arranged to determine the position of the calibration measurement.

[0116] The Siemens star working area 7 is used to measure the spatial frequency response value based on the sine wave in each direction, and then the resolution in different directions is obtained. According to the applicable different resolution, the Siemens star working area 7 is designed with a Siemens star with a period value of 36, 72, and 144. In the Siemens star with a period value of 36, the length of the base of the isosceles triangle is 0.0175 mm, and the height is 0.2 mm. In the Siemens star with a period value of 72, the length of the base of the isosceles triangle is 0.0087 mm, and the height is 0.2 mm. In the Siemens star with a period value of 144, the length of the base of the isosceles triangle is 0.00435 mm, and the height is 0.2 mm.

[0117] The ring structure working area 10 is used to calibrate the line width of different sizes in each direction. The ring structure 1001 is composed of ten same circular rings with the same center and one solid circle. The center of the solid circle and the circular ring coincide. The diameter of the solid circle is 0.002 mm. The inner diameter of the 10 circular rings increases in order from small to large, i.e., 0.01 mm, 0.03 mm, 0.05 mm, 0.07 mm, 0.09 mm, 0.11 mm, 0.13 mm, 0.15 mm, 0.17 mm, and 0.19 mm. The outer diameter increases in order from small to large, i.e., 0.02 mm, 0.04 mm, 0.06 mm, 0.08 mm, 0.1 mm, 0.12 mm, 0.14 mm, 0.16 mm, 0.18 mm, and 0.2 mm.

[0118] The direction indicating mark 1002 of the ring structure comprises four same isosceles triangles, the top angle of the isosceles triangle points to the center of the ring structure 1001, and is used for determining the calibration positioning position; the horizontal direction and the vertical direction of the ring structure 1001 are each provided with two direction indicating marks, the length of the base of the isosceles triangle is 0.01 mm, and the height of the base is 0.009 mm.

[0119] The working area 11 of the radial hole combination structure is used for fast resolution calibration, and is composed of a center hole and a period value 12 hole structure, wherein the period value 12 hole structure is twelve groups of hole structures, and the twelve groups of hole structures are uniformly distributed along the circumference of the center hole.

[0120] Each group of hole structures is composed of ten holes, and the ten holes are arranged in a straight line in order from small to large in diameter. The diameters of the ten holes from small to large are 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm and 0.01 mm.

[0121] The diameter of the center hole is 0.001 mm.

[0122] The diameters of the circles where the centers of the holes in the innermost circle are located to the circles where the centers of the holes in the outermost circle are located are 0.01 mm, 0.04 mm, 0.07 mm, 0.1 mm, 0.13 mm, 0.16 mm, 0.19 mm, 0.22 mm, 0.25 mm and 0.28 mm.

[0123] The integration of different structures of different measurement sizes in the application realizes the calibration of instrument line width, period, resolution and the calibration of pattern distortion, realizes the integration of multiple functions, and improves the calibration efficiency and production efficiency of the measurement standard device.

[0124] The above-described embodiments are only used to illustrate the technical solutions of the present application, but not limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement to part of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application, and should be included in the protection scope of the present application.

Claims

1. A metrological standard, characterised in that, It comprises a working area and an identification area, wherein the working area comprises: a cross structure peripheral working area (2) for determining the edge resolution around the gauge; a round hole grid working area (4) for grid lateral period, grid longitudinal period and pattern distortion calibration; a cross structure center working area (5) for determining the edge resolution at the center of the gauge; a combined chessboard structure working area (6) for line width calibration and edge resolution calibration of different directions and different sizes; a Siemens star structure working area (7) for obtaining the spatial frequency response value based on sine wave in each measurement direction, and then calculating the resolution in different directions; a lateral rectangular grid working area (8) for calibrating the grid lateral period; a longitudinal rectangular grid working area (9) for calibrating the grid longitudinal period; a ring structure working area (10) for calibrating line width of different directions and different sizes, and a radial round hole combined structure working area (11) for rapid calibration of resolution. The identification area comprises a 4:3 map position identification (1) and a gauge name identification (3).

2. A metrological standard according to claim 1, characterised in that The four 4:3 map position identifications (1) are arranged at the four corners of the base respectively.

3. A metrological standard according to claim 1, characterised in that The four sets of cross structure peripheral working areas (2) are arranged at the four corners of the base respectively. Each set of cross structure peripheral working areas (2) comprises three cross structures and two inclination angle identifications, wherein the inclination angles of the three cross structures are distributed in an arithmetic sequence of 0°, 30° and 60°; and the two inclination angle identifications are arranged at the right side of the two cross structures with inclination angles of 30° and 60° respectively.

4. A metrological standard according to claim 1, characterised in that The cross structure center working area (5) is arranged at the center of the gauge, comprising three cross structures with inclination angles distributed in an arithmetic sequence of 0°, 30° and 60°, and size guide identifications corresponding to the inclination angles are arranged at the right side of the two cross structures with inclination angles of 30° and 60° respectively.

5. A metrological standard according to claim 1, characterised in that The lateral rectangular grid working area (8) is arranged directly below the cross structure center working area (5) and arranged in a horizontal structure, comprising seven kinds of lateral rectangular grid structures (801) with different line width sizes, and each kind of lateral rectangular grid structure (801) comprises ten rectangular grids. The left side of each kind of lateral rectangular grid structure (801) is provided with a size guide identification (802) for indicating the line width size. The left and right sides of each kind of lateral rectangular grid structure (801) are provided with two measurement positioning identifications (803). The longitudinal rectangular grid working area (9) is identical in structure with the lateral rectangular grid working area (8) and arranged at the left side of the lateral rectangular grid working area (8) in a vertical direction.

6. A metrological standard according to claim 1, characterised in that The circular hole grid working area (4) is arranged directly above the cross structure central working area (5), and includes seven circular hole grid structures (401) with different diameters, each of which includes a plurality of first column hole groups and a plurality of second column hole groups, which are arranged alternately; wherein the number of circular hole grids in the first column hole group is fifteen, and the number of circular hole grids in the second column hole group is fourteen; The left side of each circular hole grid structure (401) is provided with a size indicating mark (402) for indicating the diameter size of the circular hole grid.

7. A metrological standard according to claim 1, characterised in that The combined chessboard grid structure working area (6) is arranged on the right side of the transversely long rectangular grid working area (8), and includes five groups of hollow rhombic structures (605), which are arranged alternately in up and down directions, wherein the first, second and third rows are arranged alternately to the right, and the fourth and fifth rows are arranged alternately to the left; The hollow part of each hollow rhombic structure (605) is provided with a size indicating mark (604) for indicating the width size of the hollow rectangle in each hollow rhombic structure; Each of the four edges of each hollow rhombic structure (605) is provided with a direction indicating mark (603), and each direction indicating mark (603) points to the center of the hollow rhombic structure (605) along the vertical direction of each edge; A row of solid square structures (602) is arranged between the two groups of hollow rhombic structures (605), and the size of each row of solid square structures (602) decreases in turn; Each solid square structure (602) in each row of solid square structures (602) is located at the center position of the four direction indicating marks (603); Each solid square structure (602) is provided with an isosceles triangle on each of the four edges, and the top angle of each isosceles triangle faces the center of the solid square structure (602).

8. A metrological standard according to claim 1, characterised in that, The Siemens star structure working area (7) is arranged directly below the transversely long rectangular grid working area (8), and includes three Siemens star structures with period values of 36, 72 and 144 respectively.

9. A metrological standard according to claim 1, characterised in that, The ring structure working area (10) is arranged above the circular hole grid working area (4), and includes a ring structure (1001), which includes a solid circle, and the outer side of the solid circle is provided with ten circular rings with diameters increasing in turn, and the solid circle and the ten circular rings are arranged concentrically; The outer circumferential direction of the ring structure (1001) is uniformly distributed with four direction indicating marks.

10. A metrological standard according to claim 1, characterised in that, The radial circular hole combination structure working area (11) is arranged above the circular hole grid working area (4) and on the left side of the ring structure working area (10), and is arranged at the same horizontal position as the ring structure working area (10); the radial circular hole combination structure working area (11) includes twelve circular hole structures and a center circular hole, and the twelve circular hole structures are uniformly distributed along the circumferential direction of the center circular hole; each circular hole structure is composed of ten circular holes, and the ten circular holes are arranged in a straight line in order from small to large in diameter.

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