Shell processing method, shell, and electronic device

Abstract

The present disclosure relates to a shell processing method, a shell and an electronic device. The shell processing method comprises providing an initial shell, performing a first anodization treatment on the initial shell at a first preset voltage to form a first anodization film layer on a first region of the initial shell, the first anodization film layer having a first color, and performing a repeated anodization treatment on at least one first preset region in the first region. The repeated anodization treatment process comprises removing the first anodization film layer on the surface of the first preset region to form a first region to be processed, and performing an anodization treatment on the first region to be processed. The processing voltage used in the anodization treatment process is continuously increased. The initial voltage of the processing voltage used in the method of the present disclosure is lower than the first preset voltage, which can reduce the impact on the first anodization film layer. During the anodization treatment process, the processing voltage used is continuously increased, which has less impact on the first anodization film layer, improves the film growth speed, improves the production efficiency, and improves the production yield.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of electronic equipment, and in particular to a shell processing method, a shell and an electronic device. BACKGROUND

[0002] With the development of science and technology, electronic equipment is updated and replaced faster, and users have higher and higher requirements for electronic equipment. Not only should the performance of electronic products be guaranteed, but the appearance should also have a design sense, and the reliability requirement of electronic equipment under extreme conditions is also becoming more and more demanding.

[0003] In the face of increasingly fierce market competition, the visual effect of electronic equipment cannot meet the evolving needs of users, and the development of electronic equipment still faces severe challenges. SUMMARY

[0004] To overcome the problems in the related art, the present disclosure provides a shell processing method, a shell and an electronic device.

[0005] According to a first aspect of an embodiment of the present disclosure, a shell processing method is provided, and the processing method comprises:

[0006] providing an initial shell;

[0007] performing first anodic oxidation processing on the initial shell at a first preset voltage, so that a first anodic oxidation film layer is formed on a first region of the initial shell, and the first anodic oxidation film layer has a first color;

[0008] performing repeated anodic oxidation processing on at least one first preset region in the first region, and the repeated oxidation processing process comprises:

[0009] removing the first anodic oxidation film layer on the surface of the first preset region to form a first region to be processed;

[0010] performing oxidation processing on the first region to be processed, and a processing voltage used in the oxidation processing is continuously increased, and a starting voltage of the processing voltage is lower than the first preset voltage;

[0011] wherein the first color and a color formed on the surface of the first region to be processed are different.

[0012] Optionally, the first anodic oxidation processing comprises:

[0013] immersing the initial shell into a first oxidation liquid and applying a first preset voltage by power supply for a first preset duration to form the first anodic oxidation film layer;

[0014] performing dyeing on the first anodic oxidation film layer so that the first anodic oxidation film layer has the first color;

[0015] Sealing the first anodization film layer with the first color.

[0016] Optionally, the oxidation treatment of the region to be processed includes:

[0017] The second anodization treatment is performed on the first region to be processed, and a processing voltage used in the second anodization treatment is continuously increased according to a first voltage increasing rule, the first region to be processed forms a second anodization film layer, and the second anodization film layer has a second color.

[0018] The repeated anodization treatment is performed on at least one second preset region in the first region, and the repeated anodization treatment includes:

[0019] The first anodization film layer on the surface of the second preset region is removed to form a second region to be processed, and / or

[0020] The repeated anodization treatment is performed on at least one third preset region in the first region to be processed, and the repeated anodization treatment includes:

[0021] The second anodization film layer on the surface of the third preset region is removed to form a second region to be processed.

[0022] The oxidation treatment is performed on the second region to be processed, and a processing voltage used in the oxidation treatment is continuously increased.

[0023] The color formed on the surface of the second region to be processed is different from the second color and the first color.

[0024] Optionally, the second anodization treatment of the first region to be processed includes:

[0025] A first conductive potential is formed on the first region to be processed, and the second anodization treatment is performed on the first region to be processed through the first conductive potential.

[0026] Optionally, the first conductive potential formed on the first region to be processed includes:

[0027] The first conductive potential is formed on the first region to be processed in a laser engraving manner.

[0028] Optionally, the second anodization treatment of the first region to be processed includes:

[0029] immersing the initial shell into a second oxidation solution, a processing voltage used in the second anodic oxidation process is continuously increased according to a first voltage increasing rule, and the first processing area is formed with a second anodic oxidation film layer through the first conductive position and for a second preset time duration;

[0030] dyeing the second anodic oxidation film layer to have a second color;

[0031] performing a sealing process on the second anodic oxidation film layer having the second color.

[0032] Optionally, the oxidation process on the second processing area includes:

[0033] performing a third anodic oxidation process on the second processing area, a processing voltage used in the third anodic oxidation process is continuously increased according to a second voltage increasing rule, and the second processing area is formed with a third anodic oxidation film layer having a third color;

[0034] performing a repeated anodic oxidation process on the initial shell having the first anodic oxidation film layer, the second anodic oxidation film layer, and the third anodic oxidation film layer.

[0035] Optionally, the second voltage increasing rule can be different from the first voltage increasing rule.

[0036] Optionally, the third anodic oxidation process on the second processing area includes:

[0037] forming a second conductive position on the second processing area, and performing a third anodic oxidation process on the second processing area through the second conductive position.

[0038] Optionally, the forming of the second conductive position on the second processing area includes:

[0039] forming the second conductive position on the second processing area in a laser engraving manner.

[0040] Optionally, the third anodic oxidation process on the second processing area includes:

[0041] immersing the initial shell into a third oxidation solution, a processing voltage used in the third anodic oxidation process is continuously increased according to the second voltage increasing rule, and the second processing area is formed with a third anodic oxidation film layer for a third preset time duration;

[0042] dyeing the third anodic oxidation film layer to have the third color;

[0043] performing sealing on the third anodic oxidation film layer with the third color.

[0044] Optionally, the thickness of the first anodic oxidation film layer, the thickness of the second anodic oxidation film layer and the thickness of the third anodic oxidation film layer are the same.

[0045] Optionally, the providing of the initial shell comprises:

[0046] providing a plate material;

[0047] cutting the plate material to form an initial structure;

[0048] physically processing the initial structure to form the initial shell; wherein the physical processing comprises polishing processing or sandblasting processing.

[0049] Optionally, when the initial structure is subjected to sandblasting processing to form the initial shell, the method comprises:

[0050] subjecting the initial structure to sandblasting processing;

[0051] eroding the initial structure subjected to sandblasting processing to make the surface of the initial structure have a polishing layer, thereby forming the initial shell.

[0052] According to a second aspect of the embodiments of the present disclosure, a shell is provided, which is obtained by the shell processing method.

[0053] According to a third aspect of the embodiments of the present disclosure, an electronic device is provided, which comprises the shell as described above.

[0054] The technical solutions provided by the embodiments of the present disclosure can have the following beneficial effects: the initial voltage of the processing voltage used in the method of the present disclosure is lower than the first preset voltage, which can reduce the impact on the first anodic oxidation film layer; during the oxidation processing, the processing voltage used is continuously increased, which has less impact on the first anodic oxidation film layer, speeds up the film forming speed, effectively improves the production efficiency, and improves the production yield. The color formed by the first color and the surface of the first to-be-processed region is different, which improves the appearance of the shell and meets the user's demand for appearance.

[0055] It should be understood that the foregoing general description and the following detailed description are only exemplary and explanatory, and cannot limit the present disclosure. BRIEF DESCRIPTION OF DRAWINGS

[0056] The accompanying drawings, which are incorporated into and form part of the specification, illustrate embodiments consistent with the present disclosure and, together with the specification, serve to explain the principles of the present disclosure.

[0057] Figure 1is a flowchart of a housing processing method according to an exemplary embodiment.

[0058] Figure 2 is a flowchart of a housing processing method according to an exemplary embodiment.

[0059] Figure 3 is a flowchart of a housing processing method according to an exemplary embodiment.

[0060] Figure 4 is a flowchart of a housing processing method according to an exemplary embodiment. DETAILED DESCRIPTION

[0061] The exemplary embodiments will be described in detail herein with reference to the attached drawings. The following description is made with reference to the accompanying drawings in which like reference numerals represent like elements, unless the context dictates otherwise. The following description of exemplary embodiments is not representative of all embodiments consistent with the present application. Instead, they are merely examples of apparatus and methods consistent with some aspects of the present application as detailed in the appended claims.

[0062] With the development of science and technology, the functions and appearances of electronic devices are also constantly upgrading and changing. In particular, higher requirements are proposed for the appearance of electronic devices.

[0063] In the related art, an anodic oxidation treatment is used to form a protective layer on the surface of the housing of an electronic device, and a corresponding color is obtained through a process to improve the appearance effect.

[0064] However, the current processing method requires that the oxidation voltage be gradually reduced step by step to process the housing. Otherwise, the oxidation voltage of the later process will impact the formed anodic oxidation film layer. Gradual reduction of the oxidation voltage also results in gradual reduction of the anodic oxidation film layer. The more the anodic oxidation processing times, the more the anodic oxidation film layers formed, and the more difficult it is to pass the reliability test. Moreover, reducing the oxidation voltage slows down the film formation speed, affecting the production efficiency.

[0065] This disclosure proposes a shell processing method. The method includes providing an initial shell, performing a first anodizing treatment on the initial shell using a first preset voltage to form a first anodic oxide film layer in a first region of the initial shell. The first anodic oxide film layer has a first color. The method then performs repeated anodizing treatment on at least one first preset region within the first region. The repeated oxidation process includes removing the first anodic oxide film layer from the surface of the first preset region to form a first region to be processed, and oxidizing the first region to be processed. During the oxidation process, the processing voltage used continuously increases. The first color and the color formed on the surface of the first region to be processed are different. The method in this disclosure uses an initial processing voltage lower than the first preset voltage, which reduces the impact on the first anodic oxide film layer. During the oxidation process, the processing voltage continuously increases, minimizing the impact on the first anodic oxide film layer, accelerating film formation, effectively improving production efficiency, and increasing production yield. Furthermore, the different colors formed on the surface of the first region to be processed enhance the aesthetics of the shell, meeting user requirements for appearance.

[0066] In one exemplary embodiment, a housing processing method is provided for processing a housing, such as the housing of an electronic device. Figure 1 As shown, the shell processing method in this embodiment includes:

[0067] S110, Provide the initial housing.

[0068] In this step, an initial housing is selected to facilitate its processing. The initial housing could be, for example, the back cover of the electronic device to be processed, a camera trim piece to be processed, or the mid-frame of the electronic device to be processed.

[0069] S120. The initial shell is subjected to a first anodic oxidation treatment with a first preset voltage, so that a first anodic oxide film layer is formed in the first region of the initial shell.

[0070] In this step, the initial shell is immersed in a first oxidizing solution and a first preset voltage is applied for a first preset duration, so that a first anodic oxide film layer is formed in the first region of the initial shell; wherein, the first oxidizing solution may be, for example, a sulfuric acid solution with a concentration of 180g / L-200g / L, and is contained in a sulfuric acid tank.

[0071] A first preset voltage is applied by a rectifier, and the parameters such as the first preset voltage, the first preset duration, and the ambient temperature of the first anodizing treatment are controlled by the multi-program control system built into the rectifier. For example, the first preset voltage can be 12.5V-13.5V, the first preset duration can be 45min-60min, and the ambient temperature of the first anodizing treatment can be 18℃-20℃.

[0072] The surface of the first anodic oxidation film layer has a plurality of first recess holes, the first pigment is filled into the plurality of first recess holes, the first recess holes in the first anodic oxidation film layer are dyed, and the first anodic oxidation film layer has the first color.

[0073] The first anodic oxidation film layer with the first color is sealed, the first color is locked in the first recess holes of the first anodic oxidation film layer, and the effect of color fixing is achieved. The sealing can be performed by using a sealing liquid, or the first pigment can be filled into the first recess holes, and the sealing process is performed.

[0074] S130, repeating anodic oxidation treatment is performed on at least one first preset region in the first region.

[0075] In this step, the first region includes at least one first preset region, when a plurality of first preset regions are provided, the plurality of first preset regions can be separately arranged, and the repeating anodic oxidation treatment is performed on at least one first preset region, so as to form a new anodic oxidation film layer.

[0076] In the step S130, the repeating anodic oxidation treatment process includes:

[0077] S1301, the first anodic oxidation film layer on the surface of the first preset region is removed, and a first to-be-processed region is formed.

[0078] In this step, the CNC machine equipment is used to process the initial shell, the first anodic oxidation film layer on the surface of the first preset region is removed, the surface of the initial shell of the first preset region is exposed, and the first to-be-processed region is formed.

[0079] S1302, an oxidation treatment is performed on the first to-be-processed region, and the processing voltage used in the oxidation treatment process is continuously increased.

[0080] In this step, the oxidation treatment is performed on the first to-be-processed region, and the processing voltage used in the oxidation treatment process is continuously increased, so as to shorten the oxidation time and improve the oxidation speed. The starting voltage of the processing voltage is lower than the first preset voltage, and the impact on the first oxidation film layer is effectively reduced.

[0081] The first color and the color formed by the surface of the first to-be-processed region are different, and the shell with diversified colors is formed.

[0082] In the method in this embodiment, after the first anodic oxidation film layer is formed, the repeating anodic oxidation treatment is continuously performed on at least one first preset region in the first region. In the repeating anodic oxidation treatment process, the oxidation is performed by using the processing voltage which is continuously increased and the starting voltage of the processing voltage which is lower than the first preset voltage. On the basis of avoiding the impact on the first anodic oxidation film layer, the film can be quickly formed, the oxidation time is shortened, and the oxidation speed is improved.

[0083] In one example embodiment, a shell processing method is used to process a shell, which can be a shell of an electronic device. As shown in the figure, the shell processing method in this embodiment includes: Figure 2

[0084] S210, providing an initial shell.

[0085] S220, performing first anodic oxidation processing on the initial shell at a first preset voltage, so that a first anodic oxidation film layer is formed on a first region of the initial shell.

[0086] S230, performing repeated anodic oxidation processing on at least one first preset region in the first region.

[0087] The repeated anodic oxidation processing in step S230 includes:

[0088] S2301, removing the first anodic oxidation film layer on the surface of the first preset region to form a first region to be processed;

[0089] S2302, performing second anodic oxidation processing on the first region to be processed, and the processing voltage used in the second anodic oxidation processing is constantly increased according to a first voltage increasing rule, so that a second anodic oxidation film layer is formed on the first region to be processed.

[0090] In this step, a first conductive position is formed on the first region to be processed, and the first region to be processed is subjected to the second anodic oxidation processing through the first conductive position.

[0091] A non-critical position is selected in the first region to be processed, and the surface of the first region to be processed at the non-critical position is broken by laser engraving to form a broken anodic surface, which is used as the first conductive position. The first conductive position provides a conductive position for power supply, and the hanging point of the power supply can contact the first conductive position, and then conduct electricity, so that the first region to be processed can generate the second anodic oxidation film layer. The second anodic oxidation film layer has a second color.

[0092] When the second anodic oxidation processing is performed on the first region to be processed, the initial shell with the first anodic oxidation film layer can be immersed in a second oxidation liquid, which can be a sulfuric acid solution with a concentration of 180g / L-200g / L and contained in a sulfuric acid tank.

[0093] The processing voltage is set by the multi-program control system built in the rectifier, and the initial voltage of the processing voltage used in the initial state can be 8V-9V, which is less than the first preset voltage, thereby achieving the effect of voltage reduction processing and avoiding the impact on the first anodic oxidation film layer during the anodic oxidation process, so that the first anodic oxidation film layer is not damaged. ​

[0094] In the pressurized state, the processing voltage used in the second anodization process is continuously increased according to the first voltage increasing rule, and the first conductive potential is passed for a second preset time duration, so that the first to-be-processed region forms a second anodic oxidation film layer. The second preset time duration may be 55 min to 65 min, for example.

[0095] The first voltage increasing rule is to gradually increase the voltage between 8 V and 13 V, and the difference between the two voltage increases is 0.5 V to 1 V. Then, the power supply is stopped after the second anodic oxidation film layer reaches the desired thickness, and the second anodic oxidation process is completed. The first predetermined time duration may be 8 min to 12 min, for example. The environmental temperature of the second anodic oxidation process is 18°C to 20°C, and the film forming effect is the best.

[0096] The film forming time is also related to the surface state of the initial shell. When the surface of the initial shell is a polished material, the environmental temperature of the second anodic oxidation process is 18°C to 20°C, the second preset time duration is 60 min to 65 min, and the processing voltage is gradually increased from 8 V to 12 V, and the aluminum ion content is less than <10 g / L.

[0097] When the surface of the initial shell is a sandblasted material, the environmental temperature of the second anodic oxidation process is 18°C to 20°C, the second preset time duration is 55 min to 60 min, and the processing voltage is gradually increased from 9 V to 13 V, and the aluminum ion content is less than <10 g / L.

[0098] The surface of the second anodic oxidation film layer has a plurality of second pores, the second pigment is filled into the plurality of second pores, the second pores of the second anodic oxidation film layer are dyed, and the second anodic oxidation film layer has a second color. The pH value in the dyeing process is 5 to 6, and the acidity and alkalinity are moderate.

[0099] The second anodic oxidation film layer with the second color is sealed to lock the second color in the second pores of the second anodic oxidation film layer, achieving the effect of color fixing. During sealing, a sealing solution of 10 g / L to 12 g / L can be used for sealing, the sealing environmental temperature is 92°C to 95°C, and the sealing time duration is about 60 min.

[0100] S2303, at least one second preset region in the first region and / or at least one third preset region in the first to-be-processed region are subjected to repeated anodization processing.

[0101] In this step, the first region includes at least one second preset region, and the plurality of second preset regions can be separately arranged. The at least one second preset region is subjected to repeated anodization processing to form a new anodic oxidation film layer; and / or,

[0102] The first to-be-processed region comprises at least one third preset region, and multiple third preset regions can be arranged separately. The at least one third preset region is subjected to repeated anodic oxidation treatment, so as to form a new anodic oxidation film layer.

[0103] In the step S2303, the repeated oxidation treatment process comprises:

[0104] In the step S23031, the first anodic oxidation film layer on the surface of the second preset region and / or the second anodic oxidation film layer on the surface of the third preset region are removed, so as to form a second to-be-processed region.

[0105] In this step, the initial shell with the first anodic oxidation film layer and the second anodic oxidation film layer is processed by using a CNC machine.

[0106] In one example, the first anodic oxidation film layer on the surface of the second preset region is removed, so that the surface of the initial shell of the second preset region is exposed, so as to form the second to-be-processed region; or, the second anodic oxidation film layer on the surface of the third preset region is removed, so that the surface of the initial shell of the third preset region is exposed, so as to form the second to-be-processed region, and the integrity of the other region is ensured.

[0107] In another example, the first anodic oxidation film layer on the surface of the second preset region and the second anodic oxidation film layer on the surface of the third preset region are removed, so that the surface of the initial shell of the second preset region and the surface of the initial shell of the third preset region are exposed, so as to form the second to-be-processed region. The boundaries of the first anodic oxidation film layer and the second anodic oxidation film layer are re-planned, the flatness of the boundaries of the first anodic oxidation film layer and the second anodic oxidation film layer is ensured, and the visual effect is improved.

[0108] In the step S23032, the second to-be-processed region is subjected to oxidation treatment, and the processing voltage used in the oxidation treatment process is continuously increased.

[0109] In this step, the second to-be-processed region is subjected to oxidation treatment, and the processing voltage used in the oxidation treatment process is continuously increased, so as to shorten the oxidation time and improve the oxidation speed. The color formed on the surface of the second to-be-processed region is different from the second color and the first color, so as to form a multi-color shell and meet the user's demand for appearance.

[0110] In the method in this embodiment, after the first anodic oxidation film layer is formed, the first anodic oxidation film layer in the first preset region is removed, so as to provide a first to-be-processed region for the second anodic oxidation film layer. When the initial shell is subjected to the second anodic oxidation treatment, the processing voltage is continuously increased according to the first voltage increasing rule, so as to gradually increase the voltage, so as to weaken the impact of the instantaneous voltage in the second anodic oxidation treatment on the first anodic oxidation film layer, avoid breaking the first anodic oxidation film layer, and cause the powdering phenomenon, and effectively improve the production yield.

[0111] In one example embodiment, a shell processing method is used to process a shell, such as a shell of an electronic device. As shown in the figure, the shell processing method in this embodiment includes: Figure 3

[0112] S310, providing an initial shell.

[0113] S320, performing first anodic oxidation processing on the initial shell at a first preset voltage, so that a first anodic oxidation film layer is formed on a first region of the initial shell.

[0114] S330, performing repeated anodic oxidation processing on at least one first preset region in the first region.

[0115] The repeated oxidation processing in step S230 includes:

[0116] S3301, removing the first anodic oxidation film layer on the surface of the first preset region to form a first region to be processed;

[0117] S3302, performing second anodic oxidation processing on the first region to be processed, and the processing voltage used in the second anodic oxidation processing is constantly increased according to a first voltage increasing rule, so that a second anodic oxidation film layer is formed on the first region to be processed.

[0118] S3303, performing repeated anodic oxidation processing on at least one second preset region in the first region and / or at least one third preset region in the first region to be processed.

[0119] S33031, removing the first anodic oxidation film layer on the surface of the second preset region and / or the second anodic oxidation film layer on the surface of the third preset region to form a second region to be processed.

[0120] S33032, performing third anodic oxidation processing on the second region to be processed, and the processing voltage used in the third anodic oxidation processing is constantly increased according to a second voltage increasing rule, so that a third anodic oxidation film layer is formed on the second region to be processed.

[0121] In this step, a second conductive position is formed on the second region to be processed, and the second region to be processed is processed for the third time through the second conductive position.

[0122] A non-critical position is selected in the second region to be processed, and the surface of the non-critical position in the second region to be processed is engraved to form a broken anodic surface, which is used as the second conductive position. The second conductive position provides a conductive position for power supply, and the hanging point of the power supply can contact the second conductive position, and then conduct electricity, so that the second region to be processed can generate the third anodic oxidation film layer. The third anodic oxidation film layer has a third color. ​

[0123] When the third anodization treatment is performed on the second to-be-processed area, the initial shell with the first anodization film layer and the second anodization film layer can be immersed into a third oxidizing liquid, which can be, for example, a sulfuric acid solution with a concentration of 180 g / L to 200 g / L and is contained in a sulfuric acid tank, and has a good corrosiveness.

[0124] The processing voltage is set by a multi-program control system built in the rectifier, and the initial voltage of the processing voltage used in the initial state can be, for example, 8 V to 9 V, which is not only less than the first preset voltage, but also less than the maximum voltage value of the processing voltage used in the second anodization treatment after voltage boosting, thereby further achieving the effect of voltage reduction processing and avoiding the impact on the first anodization film layer and the second anodization film layer during the anodization process, so that the first anodization film layer and the second anodization film layer are not damaged.

[0125] In the pressurized state, the processing voltage used in the third anodization treatment is continuously increased according to the second voltage boosting rule, and the second to-be-processed area is formed with a third anodization film layer by the second conductive potential for a third preset time length. The third preset time length can be, for example, 55 min to 65 min.

[0126] The second voltage boosting rule can be different from the first voltage boosting rule. The second voltage boosting rule is to gradually boost the voltage between 8 V and 13 V, the difference between the two voltage boosting is 1 V to 1.5 V, and the boosting is continued for a second predetermined time length, until the third anodization film layer reaches the desired thickness, the power supply is stopped, and the third anodization treatment is completed. The instantaneous voltage of the step-by-step voltage boosting is small, the current is also small, and the impact on the first anodization film layer and the second anodization film layer is small. The second predetermined time length can be, for example, 8 min to 12 min, and the environmental temperature of the third anodization treatment is 18°C to 20°C, and the film forming effect is the best.

[0127] The film forming time is related to the surface state of the initial shell, which has been described in detail in the above embodiments and will not be repeated here. The film forming time is also related to the thickness and color of the anodization film layer. The lighter the color of the anodization film layer, the thinner the anodization film layer, and the shorter the film forming time. The darker the color of the anodization film layer, the thicker the anodization film layer, and the longer the film forming time.

[0128] It should be noted that the second voltage boosting rule and the first voltage boosting rule can also be the same, which can further ensure that the first anodization film layer and the second anodization film layer are not impacted.

[0129] The surface of the third anodization film layer has a plurality of third recessed holes, the third pigment is filled into the plurality of third recessed holes, the third recessed holes of the third anodization film layer are dyed, and the third anodization film layer has a third color.

[0130] The third anodization film layer with the third color is sealed, the third color is locked in the third concave hole of the third anodization film layer, and the solidification effect is achieved.

[0131] S33033, the initial shell with the first anodization film layer, the second anodization film layer and the third anodization film layer is subjected to repeated anodization treatment.

[0132] In this step, the initial shell with the first anodization film layer, the second anodization film layer and the third anodization film layer is subjected to repeated anodization treatment to form a fourth anodization film layer. The treatment method is the same as that of the third anodization film layer described above, and will not be repeated here.

[0133] Of course, it can be understood that the present application is not limited to forming the first anodization film layer, the second anodization film layer, the third anodization film layer and the fourth anodization film layer, but also can form a fifth anodization film layer, and so on, even an N anodization film layer. When N anodization film layers are needed, each anodization film layer can select a corresponding area, remove the original anodization film layer in the corresponding area, so as to perform anodization treatment on the corresponding area to form a new anodization film layer. The color of the anodization film layer in each area can be different, so that the shell forms a colorful state, and meets the user's demand for appearance.

[0134] The method in the embodiment increases the processing voltage according to the second voltage increasing rule, the instantaneous voltage is small, the current is also small, the impact on the first anodization film layer and the second anodization film layer is small, the thickness of the first anodization film layer, the thickness of the second anodization film layer and the thickness of the third anodization film layer can be the same, the flatness of the shell is guaranteed, and the shell is not concave-convex, which affects the photosensitive effect. And the shell forms a shell with multiple anodization film layers, which realizes the colorful design concept.

[0135] In one example embodiment, a shell processing method is used to process a shell, which can be a shell of an electronic device. As shown in Figure 4 The shell processing method in the embodiment includes:

[0136] S410, providing a plate material.

[0137] In this step, the plate material can be selected from an aluminum alloy raw material made of aluminum trioxide material. The raw material is cut to select one plate material for further processing.

[0138] S420, cutting the plate material to form an initial structure.

[0139] In this step, the initial structure is cut into a target shape by using a CNC machining device to form the initial structure.

[0140] S430, the initial structure is physically processed to form the initial shell.

[0141] In this step, the initial structure is physically processed by using a CNC machining device to form the initial shell. The physical processing may be polishing or sandblasting of the initial structure.

[0142] When polishing is used, the initial structure is polished to form the initial shell with a bright surface.

[0143] When sandblasting is used, the initial structure is sandblasted and the sandblasted initial structure is etched to form the initial shell with a matte surface.

[0144] In the sandblasting process, a chemical polishing process is also required to improve the metallic luster of the initial shell. The main component of the chemical polishing process is sulfuric acid or phosphoric acid, which is heated to about 90°C and polished for 30-50 seconds to release the luster of the aluminum alloy of the initial shell. Otherwise, after sandblasting, the surface of the aluminum alloy is in a diffuse reflection state, which looks dull and ugly, affecting the visual effect of the initial shell.

[0145] S440, the initial shell is subjected to a first anodic oxidation process at a first preset voltage to form a first anodic oxidation film layer on the first region of the initial shell.

[0146] S450, at least one first preset region in the first region is subjected to a repeated anodic oxidation process.

[0147] The repeated oxidation process in step S450 includes:

[0148] S4501, the first anodic oxidation film layer on the surface of the first preset region is removed to form a first region to be processed.

[0149] S4502, the first region to be processed is subjected to an oxidation process, and the processing voltage used in the oxidation process is continuously increased.

[0150] The method in this embodiment processes the plate into an initial shell according to the expected processing, then performs dyeing to ensure the integrity of the preset pattern and avoid damaging the preset pattern, thereby affecting the aesthetics of the shell.

[0151] The shell processing method provided by the present disclosure utilizes the first voltage boosting rule to perform the second anodization treatment on the initial shell, and utilizes the second voltage boosting rule to perform the third anodization treatment on the initial shell, so that the instantaneous voltage of the second anodization treatment and the third anodization treatment is small, the current is also small, the impact on the first anodization film layer and the second anodization film layer is small, the first anodization film layer and the second anodization film layer are prevented from being broken down or even powdered, and a more reliable and reliable test solution is provided for anodization.

[0152] The film forming method under the first voltage boosting rule and the second voltage boosting rule has small instantaneous voltage and small current, small damage to the anodization film layer, avoids the powdering phenomenon, and makes each anodization film layer have the same thickness, thereby ensuring the surface flatness.

[0153] The present disclosure also provides a shell, which is processed by the shell processing method in any of the above embodiments, so that the shell realizes a colorful shell, improves the aesthetics and seniority of the shell, and meets the needs of users.

[0154] The present disclosure also provides an electronic device, which includes the shell in the above embodiments. The electronic device is, for example, a mobile phone, a tablet computer, a wearable device, or the like, so as to improve the aesthetics of the electronic device and the hand feeling when the user holds the electronic device, and improve the user experience.

[0155] Other embodiments of the application will be apparent to those skilled in the art from consideration of the specification and practice of the application disclosed herein. It is intended that the specification and examples be considered as exemplary only, with the true scope and spirit of the application being indicated by the following claims.

[0156] It should be understood that the application is not limited to the precise construction that has been described above and shown in the accompanying drawings, and that various modifications and changes can be made by those skilled in the art without departing from the scope of the application. The scope of the application is limited only by the appended claims.

Claims

1. A method for processing a shell, characterized in that, The processing method includes: Provide initial housing; The initial shell is subjected to a first anodic oxidation treatment with a first preset voltage, so that a first anodic oxide film layer is formed in a first region of the initial shell, and the first anodic oxide film layer has a first color; At least one first preset region in the first region is subjected to repeated anodizing treatment, the repeated anodizing treatment process comprising: Remove the first anodic oxide film layer from the surface of the first preset area to form the first area to be processed; The first area to be processed is subjected to oxidation treatment. During the oxidation treatment, the processing voltage used is continuously increased, and the starting voltage of the processing voltage is lower than the first preset voltage. The first color and the color formed on the surface of the first area to be processed are different; The oxidation treatment of the first area to be processed, wherein the processing voltage used during the oxidation treatment is continuously increased, includes: The first area to be processed is subjected to a second anodizing treatment. During the second anodizing treatment, the processing voltage used is continuously increased according to the first voltage increase rule, and the voltage is increased step by step. A second anodized film layer is formed in the first area to be processed, and the second anodized film layer has a second color.

2. The shell processing method according to claim 1, characterized in that, The first anodizing process includes: The initial shell is immersed in a first oxidizing solution and a first preset voltage is applied for a first preset duration to form the first anodic oxide film layer. The first anodic oxide film is dyed to give it a first color. The first anodic oxide film layer with the first color is sealed.

3. The shell processing method according to claim 1, characterized in that, The method further includes: At least one second preset region in the first region is subjected to repeated anodizing treatment, the repeated anodizing treatment process comprising: Remove the first anodic oxide film layer from the surface of the second preset area to form a second area to be processed, and / or, At least one third preset region in the first processing area is subjected to repeated anodizing treatment, the repeated anodizing treatment process including: Remove the second anodic oxide film layer from the surface of the third preset area to form a second area to be processed; The second area to be processed is subjected to oxidation treatment, and the processing voltage used in the oxidation treatment process is continuously increased; The color formed on the surface of the second area to be processed is different from both the second color and the first color.

4. The shell processing method according to claim 3, characterized in that, The second anodizing treatment of the first area to be processed includes: A first conductive site is formed in the first area to be processed, and a second anodizing treatment is performed on the first area to be processed through the first conductive site.

5. The shell processing method according to claim 4, characterized in that, The step of forming a first conductive potential in the first region to be processed includes: A first conductive site is formed in the first area to be processed using laser engraving.

6. The shell processing method according to claim 4, characterized in that, The second anodizing treatment of the first area to be processed includes: The initial shell is immersed in the second oxidizing solution. During the second anodizing process, the processing voltage used is continuously increased according to the first voltage increase rule for a second preset time. Through the first conductive position, the first area to be processed forms a second anodized film layer. The second anodic oxide film is dyed to give it a second color; The second anodic oxide film layer with the second color is sealed.

7. The shell processing method according to claim 3, characterized in that, The oxidation treatment of the second area to be processed, wherein the processing voltage used during the oxidation treatment is continuously increased, includes: The second area to be processed is subjected to a third anodizing treatment. During the third anodizing treatment, the processing voltage used is continuously increased according to a second voltage boosting rule. A third anodized film layer is formed in the second area to be processed. The third anodized film layer has a third color. The initial shell having a first anodic oxide film layer, a second anodic oxide film layer, and a third anodic oxide film layer is subjected to repeated anodic oxide treatment.

8. The shell processing method according to claim 7, characterized in that, The second boost rule may be different from the first boost rule.

9. The shell processing method according to claim 7, characterized in that, The third anodizing treatment of the second area to be processed includes: A second conductive site is formed in the second area to be processed, and the second area to be processed is subjected to a third anodizing treatment through the second conductive site.

10. The shell processing method according to claim 9, characterized in that, The step of forming a second conductive potential in the second region to be processed includes: A second conductive site is formed in the second area to be processed using laser engraving.

11. The shell processing method according to claim 9, characterized in that, The third anodizing treatment of the second area to be processed includes: The initial shell is immersed in the third oxidizing solution. During the third anodizing process, the processing voltage used is continuously increased according to the second voltage increase rule for a third preset duration, so that the second area to be processed forms a third anodized film layer. The third anodic oxide film is dyed to give it a third color. The third anodic oxide film layer with the third color is sealed.

12. The shell processing method according to claim 7, characterized in that, The thickness of the first anodic oxide film, the thickness of the second anodic oxide film, and the thickness of the third anodic oxide film are the same.

13. The shell processing method according to claim 1, characterized in that, The provision of the initial housing includes: Provide sheet materials; The sheet material is cut to form an initial structure; The initial structure is subjected to physical processing to form an initial shell; wherein the physical processing includes polishing or sandblasting.

14. The shell processing method according to claim 13, characterized in that, When the initial structure is sandblasted to form an initial shell, it includes: The initial structure is then subjected to sandblasting. The initial structure, which has been sandblasted, is etched to give the surface of the initial structure a polished layer, thereby forming an initial shell.

15. A housing, characterized in that, The shell is obtained by the shell processing method according to any one of claims 1-14.

16. An electronic device, characterized in that, The electronic device includes the housing as described in claim 15.

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