Color film substrate, display panel and display device

Abstract

The embodiment of the present invention provides a color filter substrate, a display panel and a display device, which relate to the field of display technology. The color filter substrate includes: a substrate; a light shielding layer located on one side of the substrate, the light shielding layer includes a first opening and a black matrix; the color resistance includes a first color resistance, a second color resistance and a third color resistance, along the first direction, the first color resistance is adjacent to the second color resistance, in the direction perpendicular to the plane where the substrate is located, at least part of the first color resistance and the second color resistance are located on both sides of the light shielding layer, wherein along the first direction, the width of the first color resistance can be widened, which not only ensures the normal light output at the first opening, but also reduces the process difficulty, reduces the precision requirements for the process equipment, and solves the problem of difficulty in accurately controlling the width of the color resistance.

Description

[Technical field]

[0001] The present invention relates to the field of display technology, and in particular to a color film substrate, a display panel and a display device. [Background technology]

[0002] With the continuous development of display technology, users have higher and higher requirements for the quality and display effects of display products. Therefore, the market demand for display resolution has increased, and display screens have gradually developed towards high resolution. Especially for the field of virtual reality (VR) display, the demand for near-eye usage scenarios is increasing, and the display resolution requirements are higher, which requires a smaller pixel size to achieve high resolution. Correspondingly, each pixel should have a smaller RGB color resistance size. However, in the current process, it is difficult to accurately control the RGB color resistance line width, and it is difficult to make the size of the RGB color resistance meet the requirements of ultra-high resolution. [Summary of the invention]

[0003] In view of this, the present invention provides a color film substrate, a display panel and a display device, so as to realize the requirement of more sophisticated preparation of the color resist layer.

[0004] The present invention provides a color film substrate, comprising:

[0005] substrate;

[0006] A light shielding layer, the light shielding layer is located on one side of the substrate, and the light shielding layer includes a plurality of first openings and a black matrix;

[0007] Color resists, the color resists comprising first color resists, second color resists, and third color resists, the first color resists being adjacent to the second color resists along the first direction, at least parts of the first color resists and the second color resists being respectively located on both sides of the light shielding layer in a direction perpendicular to the plane where the substrate is located; the color resists at least partially overlap with the first opening in a direction perpendicular to the plane where the substrate is located;

[0008] Wherein, the first direction is parallel to the plane where the substrate is located.

[0009] The present invention also provides a display panel including the color film substrate, comprising:

[0010] An array substrate;

[0011] The above-mentioned color film substrate.

[0012] The present invention also includes a display device including the color film substrate, including:

[0013] The above display panel.

[0014] The present invention has the following beneficial effects:

[0015] The embodiment of the present invention provides a color filter substrate, a display panel and a display device, which relate to the field of display technology. The color filter substrate includes: a substrate; a light shielding layer located on one side of the substrate, the light shielding layer includes a first opening and a black matrix; the color resistance includes a first color resistance, a second color resistance and a third color resistance, along the first direction, the first color resistance is adjacent to the second color resistance, in the direction perpendicular to the plane where the substrate is located, at least part of the first color resistance and the second color resistance are located on both sides of the light shielding layer, wherein along the first direction, the width of the first color resistance can be widened, which not only ensures the normal light output at the first opening, but also reduces the process difficulty, reduces the precision requirements for the process equipment, and solves the problem of difficulty in accurately controlling the width of the color resistance.

Brief Description of the Drawings

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0017] Figure 1 This is a structural schematic diagram of a color film substrate in the prior art.

[0018] Figure 2 yes Figure 1 A cross-sectional view along the direction a-a1;

[0019] Figure 3 is a structural schematic diagram of a color filter substrate provided by an embodiment of the present invention;

[0020] Figure 4 yes Figure 3 A cross-sectional view along the A-A1 direction;

[0021] Figure 5 is another structural schematic diagram of a color filter substrate provided by an embodiment of the present invention;

[0022] Figure 6 yes Figure 5 A cross-sectional view along the B-B1 direction;

[0023] Figure 7 is another structural schematic diagram of the color filter substrate provided by an embodiment of the present invention;

[0024] Figure 8 yes Figure 6 A cross-sectional view along the C-C1 direction;

[0025] Fig. 9 is a schematic diagram of a relative width of a color filter substrate provided by an embodiment of the present invention;

[0026] Fig.10 This is a schematic diagram of the relative position of the color filter substrate provided by an embodiment of the present invention;

[0027] Fig.11 is a schematic diagram of structural changes during the preparation process of the color filter substrate 100 provided in an embodiment of the present invention;

[0028] Fig.12 yes Fig.10 A cross-sectional view along the D-D1 direction;

[0029] Fig.13 yes Fig.10 A cross-sectional view along the E-E1 direction;

[0030] Fig.14 is another structural schematic diagram of a color filter substrate provided by an embodiment of the present invention;

[0031] Fig.15 yes Fig.14 A cross-sectional view along the F-F1 direction;

[0032] Fig.16 is a schematic diagram of a relative width of a color filter substrate provided by an embodiment of the present invention;

[0033] Fig.17 This is a schematic diagram of the relative position of the color filter substrate provided by an embodiment of the present invention;

[0034] Fig.18 is a structural schematic diagram of a display panel provided by an embodiment of the present invention;

[0035] Fig.19 It is a structural schematic diagram of a display device provided by an embodiment of the present invention. [Specific implementation method]

[0036] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0037] It should be noted that specific details are described in the following description to facilitate a full understanding of the present invention. However, the present invention can be implemented in a variety of other ways different from those described herein, and those skilled in the art can make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0038] The terms used in the embodiments of the present invention are only for the purpose of describing specific embodiments, and are not intended to limit the present invention. The singular forms "a", "said" and "the" used in the embodiments of the present invention and the appended claims are also intended to include plural forms, unless the context clearly indicates other meanings.

[0039] With the continuous development of display technology, users' demand for display resolution has increased, and display screens have gradually developed towards high resolution. Especially for display panels in high-pixel density display devices such as virtual reality (VR), the display panel has high display resolution requirements and requires a smaller pixel size. Correspondingly, a single pixel should have a smaller RGB color resistance size. In the process of preparing RGB color resistance, the color resistance line width needs to be strictly controlled to obtain the required smaller RGB color resistance size. However, the current exposure machine for preparing color resistance has the problem of high production cost and difficulty in making the color resistance line width highly refined. In the process, for example, it is difficult to accurately control the color resistance line width using a Hitachi exposure machine, and it is difficult to make the size of the RGB color resistance meet the requirements of ultra-high resolution.

[0040] Figure 1 is a schematic diagram of a color film substrate in the prior art. Figure 2 yes Figure 1 A cross-sectional view along the a-a1 direction. Figure 1 As shown, the color resist includes a first color resist 1, a second color resist 2 and a third color resist 3, wherein the first color resist 1, the second color resist 2 and the third color resist 3 are color resists of three different color types, and along the first direction, the first color resist 1, the second color resist 2 and the third color resist 3 are adjacent and all color types of color resists are located on the side of the light shielding layer away from the substrate. For high-resolution display panels, in the process of preparing color resists of different colors, it is necessary to accurately control the width of the color resist to prepare RGB color resists of smaller sizes; at the same time, by strictly controlling the width of the color resist to prevent overlapping and mixing of color resists of different colors, this process has high requirements on the precision of the process equipment for preparing the color resist and is difficult to process.

[0041] In this regard, an embodiment of the present invention provides a color filter substrate. Figure 3 A structural schematic diagram of a color filter substrate 100 provided in an embodiment of the present invention, Figure 4 yes Figure 2 A cross-sectional view along the A-A1 direction, such as Figure 3 and Figure 4 As shown, the color filter substrate 100 includes a substrate 10, a light shielding layer 20 and a color resist 30, wherein the light shielding layer 20 is located on one side of the substrate 10, and includes a plurality of first openings 4 and a black matrix 5; the color resist 30 includes a first color resist 1, a second color resist 2, and a third color resist 3, and along a first direction, the first color resist 1 is adjacent to the second color resist 2, and the first direction is parallel to the plane where the substrate 10 is located, and in a direction perpendicular to the plane where the substrate 10 is located, at least part of the first color resist 1 and the second color resist 2 are respectively located on both sides of the light shielding layer 20; along a direction perpendicular to the plane where the substrate is located, the color resist 30 and the first opening 4 at least partially overlap.

[0042] It can be understood that, for the color film substrate 100, the first color resist 1, the second color resist 2 and the third color resist 3 are three types of color resists of different colors, which can filter light of the same color as themselves; the color resist 30 at least partially overlaps with the first opening 4, including the case where the area of ​​the color resist 30 is equal to the area of ​​the first opening 4 and the case where the area of ​​the color resist 30 is larger than the area of ​​the first opening 4. After the position of the first opening 4 is filled with the color resist 30, the light passes through the first opening 4 and is filtered by the color resist 30, so that the light of the same color as the color resist 30 itself can be emitted, thereby achieving a normal display effect.

[0043] In the prior art, in a direction perpendicular to the plane where the substrate 10 is located, the first color resist 1 and the second color resist 2 are arranged on the same side of the light shielding layer 20, including the case where the two color resists are located on the side of the light shielding layer 20 close to the substrate 10 and the case where the two color resists are located on the side of the light shielding layer 20 far from the substrate 10. Taking the case where the two color resists are located on the side of the light shielding layer 20 far from the substrate 10 as an example, Figure 2 As shown, along the first direction, the edge of the first color resist 1 and the edge of the second color resist 2 are adjacent to or mixed and overlapped at the position of the black matrix 502. Along the first direction, if the overlapping width of the color resist is too large, color mixing will occur at the first opening, affecting the emission of light. Therefore, in the process of preparing the color resist, it is necessary to accurately control the width of the two adjacent color resists to avoid color mixing of the two color resists at the first opening.

[0044] Compared with the conventional color filter substrate, the color filter substrate provided by the embodiment of the present invention has at least part of the first color resist 1 and the second color resist 2 disposed on both sides of the light shielding layer 20 in a direction perpendicular to the plane where the substrate 10 is located. Figure 4 and Figure 6 As shown, in the direction perpendicular to the plane where the substrate 10 is located, when the first color resist 1 and the second color resist 2 are respectively arranged on both sides of the light shielding layer 20, the first color resist 1 is located on the side of the light shielding layer 20 close to the substrate 10 and the first color resist 1 is located on the side of the light shielding layer 20 far from the substrate 10. In the direction perpendicular to the plane where the substrate 10 is located, the first color resist 1 and the second color resist 2 are layered, and the edge of the first color resist 1 and the edge of the second color resist 2 are separated by the black matrix 502. Along the first direction, the width of the first color resist 1 can be made wider, and the edge of the first color resist 1 can be made to coincide with the edge of the black matrix 502 away from the first opening 401. Due to the spacing effect of the black matrix 502, even if the width of the first color resist 1 is widened, the edge of the first color resist 1 and the edge of the second color resist 2 will not be mixed and overlapped, thereby avoiding the problem of color mixing at the position of the first opening 4. Along the first direction, the width of the first color resist 1 can be made wider, thereby reducing the process difficulty of manufacturing the first color resist 1, reducing the precision requirements of the process equipment, and solving the problem of insufficient precision of the process equipment.

[0045] In a possible implementation, Figure 3 to Figure 6 As shown, Figure 5 Another structural schematic diagram of the color filter substrate 100 provided in an embodiment of the present invention is shown in FIG. Figure 6 yes Figure 5 A cross-sectional view along the B-B1 direction, the first color resist 1 includes a plurality of first color resist bars, the second color resist 2 includes a plurality of second color resist bars, along the first direction, the first color resist bars 101 are adjacent to the second color resist bars 201, and in a direction perpendicular to the plane of the substrate, the first color resist bars 101 and the second color resist bars 201 are located on both sides of the light shielding layer 20.

[0046] Optional, such as Figure 3 As shown, the first color resist 1 includes first color resist bars 101 and 102, and the second color resist 2 includes a second color resist bar 201, wherein along the first direction, the first color resist bar 101 is adjacent to the second color resist bar 201, and the color resist 30 is prepared as a long strip of color resist according to different color types. Along the second direction, multiple first openings 4 emitting the same color can be filled at one time, which simplifies the process flow and reduces the production cost; along the first direction, the color resist bars of different colors are arranged regularly, so after the color resist layer is prepared, the surface of the light emitting side of the color filter substrate 100 is smoother, which is conducive to the preparation of subsequent film layers.

[0047] like Figure 4 and Figure 6 As shown, in a direction perpendicular to the plane where the substrate is located, the first color resistance bars 101, 102 and the second color resistance bar 201 are located on both sides of the light shielding layer 20, including a situation in which, in a direction perpendicular to the plane where the substrate 10 is located, the first color resistance bars 101, 102 are located on a side of the light shielding layer 20 close to the substrate 10, and the second color resistance bar 201 is located on a side of the light shielding layer 20 away from the substrate 10, or a situation in which, in a direction perpendicular to the plane where the substrate 10 is located, the first color resistance bars 101, 102 are located on a side of the light shielding layer 20 away from the substrate 10, and the second color resistance bar 201 is located on a side of the light shielding layer 20 close to the substrate 10. In the direction perpendicular to the plane where the substrate 10 is located, the first color barrier strip 101 and the second color barrier strip 201 are made in layers, and the edge of the first color barrier strip 101 and the edge of the second color barrier strip 201 are separated by a black matrix 502. Due to the spacing effect of the black matrix 502, even if the width of the first color barrier strip 101 is widened, the edge of the first color barrier strip 101 and the edge of the second color barrier strip 201 will not be mixed and overlapped. Therefore, along the first direction, the line width of the first color barrier strip 101 can be widened, reducing the difficulty of the preparation process of the first color barrier strip 101 and reducing the precision requirements for the equipment. At the same time, the size of the first opening 4 is Figure 1 The sizes are the same and will not affect the normal light emitting effect of the display panel.

[0048] In a direction perpendicular to the plane of the substrate, the first color block strip 101 and the second color block strip 201 are located on both sides of the light shielding layer 20. Along the first direction, the first color block strip 101 should fill the first opening 401. However, when the line width of the first color block strip 101 is widened, the edge position of the first color block strip 101 is prone to flow. When the first color block strip 101 enters the first opening 402 adjacent to the black matrix 502, the first color block strip 101 and the second color block strip 201 are mixed and overlapped, and cannot play a good light filtering role. This overflow phenomenon will affect the normal light output effect of the display panel.

[0049] like Figure 4 As shown, in a direction perpendicular to the plane where the substrate 10 is located, the first color block strip 101 is located on a side of the light shielding layer 20 close to the substrate 10. When the first color block strip 101 is located on a side of the light shielding layer 20 close to the substrate 10, in a direction perpendicular to the plane where the substrate 10 is located, when the edge position of the first color block strip 101 is covered by the black matrix 502, the first color block strip 101 is not easy to flow to the position of the first opening 402, thereby avoiding the first color block strip 101 and the second color block strip 201 from mixing and overlapping at the position of the first opening 402. In the direction perpendicular to the plane where the substrate 10 is located, the black matrix 501 and the black matrix 502 can cover the edge position of the first color resistance strip 101, that is, lock the boundary of the first color resistance strip 101, prevent the first color resistance strip 101 from overflowing, and ensure that there is no color mixing at the adjacent first openings and normal light output; after the first color resistance strip 101 and the light-shielding layer 20 are prepared, the position of the first opening 4 corresponding to the second color resistance strip 201 is easy to find according to the position of the first opening 4 and the black matrix 5. In the process of making the color resistance located on the side of the light-shielding layer 20 away from the substrate 10, it can be accurately positioned, thereby improving the accuracy of the color resistance position, simplifying the process operation, and simplifying the process flow.

[0050] The third color block 3 includes a plurality of third color block strips 301 and 302. Along the first direction, the second color block strip 201 and the third color block strip 302 are respectively located on both sides of the first color block strip 101. In the direction perpendicular to the plane where the substrate is located, the third color block strip 302 and the second color block strip 201 are located on the same side of the light shielding layer 20. For RGB three-color pixels, the first color block 1 includes a plurality of first color block strips 101 and 102, the second color block 2 includes the second color block strip 201, and the third color block 3 includes the third color block strips 301 and 302. In the direction perpendicular to the plane where the substrate is located, the third color block strip 302 and the second color block strip 201 are arranged in the same layer. Figure 4 and Figure 6As shown, the third color barrier strip 302 and the second color barrier strip 201 are located on the side of the light shielding layer 20 away from the substrate 10, and the third color barrier strip 302 and the second color barrier strip 201 are located on the side of the light shielding layer 20 close to the substrate 10. Taking the third color barrier strip 302 and the second color barrier strip 201 located on the side of the light shielding layer 20 away from the substrate 10 as an example, Figure 4 As shown, the first color barrier strip 101 and the third color barrier strip 302 are made in layers, and the second color barrier strip 201 and the third color barrier strip 302 are made in the same layer. In the direction perpendicular to the plane where the substrate 10 is located, the edge of the third color barrier strip 302 and the edge of the first color barrier strip 101 are separated by the black matrix 501. Even if the width of the first color barrier strip 101 is widened, the edge of the first color barrier strip 101 and the edge of the third color barrier strip 302 will not be mixed and overlapped. Therefore, along the first direction, the edges at both ends of the first color barrier strip 101 are separated from the edges of the second color barrier strip 201 and the edges of the third color barrier strip 302 by the black matrix 502 and the black matrix 501 respectively, and the line width of the first color barrier strip 101 can be widened, which reduces the difficulty of the preparation process of the first color barrier strip 101 and reduces the precision requirements for the equipment. At the same time, the size of the first opening 4 is Figure 1 The sizes are the same and will not affect the normal light emitting effect of the display panel.

[0051] In another possible embodiment, combining Figure 7 and Figure 8 , Figure 7 is another structural schematic diagram of the color filter substrate 100 provided in an embodiment of the present invention. Figure 8 yes Figure 7 A cross-sectional view along the C-C1 direction. For RGBW four-color pixels, the color filter substrate 100 includes a first color block 1, a second color block 2, a third color block 3 and a first opening 4, wherein the first color block 1 includes a plurality of first color block bars 101, the second color block 2 includes second color block bars 201 and 202, the first opening 4 includes a first opening 411 not filled with color blocks, the third color block 3 includes a plurality of third color block bars 301, along the first direction, the third color block bars 301 and the first color block bars 101 include a first opening 411, and in the direction perpendicular to the plane where the substrate 10 is located, the third color block bars 301 and the first color block bars 101 are located on the same side of the light shielding layer 20. Figure 8As shown, in a direction perpendicular to the plane where the substrate 10 is located, the third color block strip 301 and the second color block strip 201 are located on both sides of the light shielding layer 20, and the third color block strip 301 and the first color block strip 101 are located on the same side of the light shielding layer 20, and the edge of the second color block strip 201 and the edge of the third color block strip 301 are separated by the black matrix 501. Even if the width of the third color block strip 301 is widened, the edge of the second color block strip 201 and the edge of the third color block strip 301 will not be mixed and overlapped, and will not affect the normal light output at the first opening 401; along the first direction, the other edge of the third color block strip 301 and the first opening 411 are separated by the black matrix 502. Even if the width of the third color block strip 301 is widened, the other edge of the third color block strip 301 is locked by the black matrix 502 and will not overflow to the first opening 411, and will not affect the normal light output at the first opening 411. Along the first direction, the first color block strip 101 is adjacent to the second color block strip 202. In the direction perpendicular to the plane where the substrate 10 is located, the second color block strip 202 and the first color block strip 101 are located on both sides of the light shielding layer 20. The edge of the second color block strip 202 is separated from the edge of the first color block strip 101 by the black matrix 504. Even if the width of the first color block strip 101 is widened, the edge of the second color block strip 202 and the edge of the first color block strip 101 will not be mixed and overlapped, and will not affect the normal light output at the first opening 404; along the first direction, the other edge of the first color block strip 101 and the first opening 411 are separated by the black matrix 503. Even if the width of the first color block strip 101 is widened, the other edge of the first color block strip 101 is locked by the black matrix 503 and will not overflow to the first opening 411, and will not affect the normal light output at the first opening 411. For this embodiment of the invention, the first color resist strip 101 and the third color resist strip 301 can be made wider at the same time, and the color resists of two color types can be made wider at the same time, which greatly reduces the process difficulty, reduces the precision requirements for the equipment, and reduces the production cost.

[0052] like Fig. 9 As shown, along the first direction, the width of the first opening 4 is x, the width of the black matrix 5 is m, the width of the first color barrier strip 101 is a, the value range of a is x<a≤x+2m, the width of the second color barrier strip 201 is b, the value range of b is x≤b≤x+m, wherein x>0, m>0. On the one hand, the line width of the first color barrier strip 101 is greater than the width of the corresponding first opening 401, ensuring the normal light emission at the position of the first opening 401, and without affecting the display effect, combining the available space on both sides, the first color barrier strip is made as wide as possible to reduce the difficulty of process manufacturing; on the other hand, the line width of the first color barrier strip 101 is less than or equal to the sum of the widths of the corresponding first opening 501 and the adjacent black matrices 601 and 602, to avoid the first color barrier being too wide, overlapping with other color type color barriers at the adjacent first opening, causing color mixing and affecting light emission.

[0053] Since the color-resist layer has a certain thickness, the light-shielding layer 20 is prepared after the first color-resist strip 101 is prepared. The surface of the light-shielding layer 20 away from the substrate 10 has a certain height difference, which will cause overflow of the color-resist located on the side of the light-shielding layer 20 away from the substrate 10. Therefore, along the first direction, the width of the second color-resist strip 201 adjacent to the first color-resist strip 101 is greater than or equal to the width of the corresponding first opening 402, ensuring normal light emission at the position of the first opening 402, and at the same time, the width of the second color-resist strip 201 is less than or equal to the sum of the corresponding first opening 402 and 1 / 2 of the width of the adjacent black matrices 502 and 503, reducing the height difference between the color-resist layer and the light-shielding layer 20 due to stacking, reducing the angle difference, and slowing down the overflow caused by the angle difference.

[0054] Fig.10 Schematic diagram of the relative position of the color film substrate provided by the embodiment of the present invention. Fig.10 As shown, the orthographic projection of the first color resist strip 101 on the plane where the substrate 10 is located is the first projection A, and the orthographic projection of the first opening 401 corresponding to the first color resist strip 101 and the black matrices 501 and 502 adjacent to it along the first direction on the plane where the substrate is located is the second projection B. Along the first direction, the first projection A is located within the second projection B. In a direction perpendicular to the plane where the substrate 10 is located, the orthographic projection of the first color resistance strip 101 overlaps with the orthographic projection of the first opening 401. In the plane where the substrate 10 is located, the orthographic projection of the first color resistance strip 101 is area A, and the orthographic projections of the first opening 401 and the adjacent black matrices 501 and 502 corresponding to the first color resistance strip 101 are area B, wherein the projection range of area B includes the projection range of area A, indicating that in a direction perpendicular to the plane where the substrate 10 is located, the projection range of the first color resistance strip 101 falls within the projection range of the corresponding first opening 401 and the adjacent black matrices 501 and 502, and along the first direction, the edge of the first color resistance strip 101 is locked by the black matrices 501 and 502, thereby avoiding color mixing of color resistances of different colors at the opening and ensuring normal light emission at the opening position.

[0055] Along the first direction, the second projection B includes a first edge and a second edge; the distance from the first projection A to the first edge is equal to the distance from the first projection A to the second edge. Fig.10As shown, along the first direction, region B includes a first edge and a second edge, a distance from region A to the first edge is d1, and a distance from region A to the second edge is d2, wherein d1=d2. Along the first direction, the distance from the first projection A to the first edge of the B region is equal to the distance from the first projection A to the second edge of the B region, indicating that along the first direction, the distance from the first color block strip 101 to the first edge is equal to the distance from the first color block strip 101 to the second edge. In the direction perpendicular to the plane where the substrate 10 is located, the first opening 401 at the middle position of the B region is covered by the first color block strip 101, ensuring that the first opening 401 position emits light normally. Since the distance from the first color block strip 101 to the first edge is equal to the distance from the first color block strip 101 to the second edge, the first color block strip 101 is located at the center of the B region, and the height from the center area to the edge position of the black matrix 501 and the black matrix 502 is uniformly reduced, thereby reducing the angle difference generated when the first color block strip 101 and the black matrices 501 and 502 are stacked during the preparation process. The surface of the light shielding layer 20 on the side away from the substrate 10 is relatively flat. In the preparation process of the color block strip located on the side of the light shielding layer 20 away from the substrate 10, its overflow phenomenon can be effectively slowed down, which is beneficial to the preparation of subsequent film layers.

[0056] The embodiment of the present invention further provides a color film substrate. Fig.11 is a schematic diagram of structural changes during the preparation process of the color filter substrate 100 provided in an embodiment of the present invention, Fig.12 yes Fig.10 A cross-sectional view along the D-D1 direction. The color resist includes a plurality of color resist blocks, including color resist block A and color resist block B. In the direction perpendicular to the plane where the substrate 10 is located, color resist block A is located on the side of the light shielding layer 20 close to the substrate 10, and color resist block B is located on the side of the light shielding layer 20 away from the substrate 10; the second direction is perpendicular to the first direction and the second direction is parallel to the plane where the substrate 10 is located. In the second direction, color resist block B is included between color resist blocks A. Fig.12 As shown, the first color blocks 111 and 112 are located on the side of the light shielding layer 20 close to the substrate 10, and are color blocks A. The first color blocks 121 and 122 are located on the side of the light shielding layer 20 away from the substrate 10, and are color blocks B. Along the second direction, the color blocks A 111 and 112 include the color blocks B 121. Fig.11As shown in the color filter substrate 1001 in the figure, along the second direction, a plurality of first openings 4 form first opening columns 40a and 40b, and along the first direction, the first opening columns 40a and 40b are adjacent. In the process of preparing the color filter layer, firstly prepare the color filter blocks 111 and 112 on the side of the light shielding layer 20 close to the substrate 10. Along the second direction, the color filter blocks 111 and 112 include the first opening 401. When the color filter and the light shielding layer 20 are stacked, an angle difference will be generated. The existence of the angle difference will cause the light shielding layer 20 to be away from the light shielding layer 20. The surface height of one side of the substrate 10 is uneven. Since the side of the first opening 401 close to the substrate 10 does not include the color resist, along the first direction, the first opening 401 and the adjacent first opening 402 do not include the angle difference caused by the stacking of the color resist and the light-shielding layer 20. Along the first direction, the height difference between the first opening column 40a and the first opening column 40b can be effectively reduced. The surface of the light-shielding layer 20 away from the substrate 10 is flat. When preparing the color resist on the side of the light-shielding layer 20 away from the substrate 10, the color resist overflow is effectively slowed down.

[0057] Fig.13 yes Fig.11 In a cross-sectional view along the E-E1 direction, the color A block includes a first color A block 112, the first color A block 112 corresponds to the color of the first color block 1, and the orthographic projection of the first color A block 112 is the first projection; the color B block includes a second color B block 211, the second color B block 211 corresponds to the color of the second color block 2, and the orthographic projection of the second color B block 211 is the second projection; along the first direction, the first projection is adjacent to the second projection. Fig.13 As shown, the first color A block 112 is located on the side of the light shielding layer 20 close to the substrate 10, and the second color B block 211 is located on the side of the light shielding layer 20 away from the substrate 10. Along the first direction, the first color A block 112 is adjacent to the second color B block 211. In the direction perpendicular to the plane where the substrate is located, the first color A block 112 and the second color B block 211 are located on both sides of the light shielding layer 20, and the edge of the first color A block 112 and the edge of the second color B block 211 are separated by the black matrix 506. Due to the spacing effect of the black matrix 506, along the first direction, the width of the first color A block 112 can be widened, and the edge of the first color A block 112 and the edge of the second color B block 211 are not mixed and overlapped, thereby avoiding the problem of color mixing at the first opening. At the same time, since the color resist block can correspond to at least one first opening, for the entire display panel, the corresponding first A color resist block 112 can be widened according to the first opening position that has specific requirements on the color resist width, thereby reducing the process difficulty, lowering the requirements for equipment precision, and increasing the flexibility and diversity of color resist preparation.

[0058] Fig.14 is a schematic structural diagram of a color filter substrate 100 provided in an embodiment of the present invention, Fig.15 yes Fig.14A cross-sectional view along the F-F1 direction. The color resist includes a color resist strip 301, which is adjacent to the color resist block along the first direction, and is located on the side of the light shielding layer 20 away from the substrate 10 in the direction perpendicular to the plane where the substrate 10 is located. Fig.14 and Fig.15 As shown, along the first direction, the first A color block 112 is adjacent to the color block strip 301, and the first A color block 112 is adjacent to the second B color block 211. Since the color block strip 301 is located on the side of the light shielding layer 20 away from the substrate 10, and the first A color block 112 is located on the side of the light shielding layer 20 close to the substrate 10, in the direction perpendicular to the plane where the substrate 10 is located, the edge of the color block strip 301 close to the first opening 411 and the edge of the first A color block 112 close to the first opening 412 are separated by the black matrix 511. Due to the spacing effect of the black matrix 511, the first A color block 112 and the color block strip 301 have no color mixing overlap, and in the vertical direction, the first A color block 112 and the second B color block 211 are adjacent to the first opening 412. In a direction perpendicular to the plane where the substrate 10 is located, the edge of the second color block B 211 near the first opening 411 and the edge of the first color block A 112 near the first opening 413 are separated by a black matrix 512. Due to the spacing effect of the black matrix 512, there is no color mixing overlap between the second color block B 211 and the first color block A 112. Therefore, along the first direction, the width of the first color block A 112 can be widened, and the edge position of the first color block A 112 is locked by the black matrices 511 and 512, thereby avoiding color mixing overlap with adjacent color blocks, reducing the difficulty of color block production, reducing process accuracy, and reducing the requirements for equipment accuracy.

[0059] like Fig.15 As shown, along the first direction, the width of the color block A is c, x≤c≤x+2m, and the width of the color block B is c, x≤c≤x+3 / 2m. In the direction perpendicular to the plane where the substrate 10 is located, the color block A 112 corresponds to the first opening 401, and the color block B 121 corresponds to the first opening 402. On the one hand, along the first direction, the width of the color block A 112 is greater than or equal to the width of the first opening 401, ensuring the normal light emission at the position of the first opening 501 and realizing the normal display of the display panel. On the other hand, the line width of the color block A 112 is less than or equal to the sum of the widths of the first opening 401 and the adjacent black matrices 501 and 502 on both sides. Along the first direction, the width of the color block A 112 is widened to reduce the difficulty of process preparation. At the same time, the width of the color block A 112 is limited. Along the first direction, the width of the color block A 112 is prevented from being too wide, overlapping with other color types of color blocks at the adjacent first opening, causing color mixing and affecting light emission.

[0060] Since the color resist layer has a certain thickness, the color resist block 112 and the light shielding layer 20 will have an angle difference due to stacking, and the surface height of the light shielding layer 20 away from the substrate 10 is uneven. When preparing the color resist located on the side of the light shielding layer 20 away from the substrate 10, overflow will occur, resulting in color resist mixing at the adjacent first opening, affecting the normal light output of the display panel. Along the first direction, the width of the color block B 121 is greater than or equal to the width of the corresponding first opening 402, and the first opening 402 is filled with the color block B 121 to ensure normal light emission at the position of the first opening 402. At the same time, along the first direction, the width of the color block B 121 is less than or equal to the sum of the widths of the first opening 502 and 3 / 4 of the widths of the adjacent black matrices 502 and 503 on both sides. In the direction perpendicular to the plane where the substrate 10 is located, the overlapping thickness of the color block A 112, the light shielding layer 20 and the color block B 121 is reduced, thereby reducing the angle difference between the color block layer and the light shielding layer 20 caused by stacking, thereby avoiding the overflow phenomenon of the color block located on the side of the light shielding layer 20 away from the substrate 10.

[0061] The orthographic projection of the color block 112 on the plane where the substrate 10 is located is the first projection, and the orthographic projection of the first opening 401 corresponding to the color block 112 on the plane where the substrate 10 is located is the second projection; in the direction perpendicular to the plane where the substrate 10 is located, the center of the first projection coincides with the center of the second projection. Fig.17 The orthographic projection of the color resist block 112 on the plane where the substrate 10 is located is the first projection, and the area of ​​the first projection is area C. In the direction perpendicular to the plane where the substrate 10 is located, the color resist block 112 and the first opening 401 at least partially overlap, and the orthographic projection of the first opening 401 corresponding to the color resist block 112 on the plane where the substrate 10 is located is the second projection, and the area of ​​the second projection is area D, and the center of the area C coincides with the center of the area D. The overlap of the centers of the C area and the D area indicates that along the first direction, the color resist block 112 is located in the central area of ​​the first opening 401 and the adjacent black matrices 501 and 502. Along the first direction, the distance from the color resist block 112 to the edge of the black matrix 501 away from the first opening 401 is equal to the distance from the color resist block 112 to the edge of the black matrix 502 away from the first opening 401, so that the surface height of the light shielding layer 20 away from the substrate 10 is flat, and the overall area of ​​the first opening 401 and the adjacent black matrices 501 and 502 is gradually reduced from the central area to the edge area. When the color resist is arranged on the side of the light shielding layer 20 away from the substrate 10, the angle difference caused by the stacking of the color resist and the light shielding layer is reduced, and the overflow phenomenon caused by the angle difference is avoided. At the same time, along the second direction, the color resist block A 112 is located in the central area of ​​the first opening 401 and the adjacent black matrices 501 and 502. In the second direction, the angle difference caused by the stacking of the color resist layer and the light shielding layer is reduced, and the overflow phenomenon caused by the angle difference is avoided.

[0062] In view of the problems in the prior art that the fineness of the red color resist line width is high, the process technology is difficult, and the precision of the process equipment is difficult to achieve, the first color resist is set to be a red color resist. However, the first color resist is not limited to red color resist, and can also be set to other color types of color resist to solve the problem that the fineness of the line width is high but the precision of the instrument is not enough.

[0063] The embodiment of the present invention further provides a display panel 1000, such as Fig.18 As shown, Fig.18 A schematic diagram of the structure of a display panel provided by an embodiment of the present invention, the display panel includes a color filter substrate 100, an array substrate 300 arranged opposite to the color filter substrate 100, and a liquid crystal 200 located between the array substrate 300 and the color filter substrate 100.

[0064] The specific structure of the color filter substrate 100 has been described in detail in the above embodiment and will not be described again here. The array substrate 300 has multiple pixel areas, and the array substrate 300 may specifically include pixel electrodes, common electrodes, and drive circuits, which are the same as those in the prior art and will not be described again here.

[0065] In addition, the display panel 1000 may further include a backlight source 400 located on the side of the array substrate 300 facing away from the color film substrate 100. The backlight source 400 includes a plurality of light-emitting elements 500, such as a plurality of mini LEDs, to better achieve a high pixel density design, so that the display panel

[0066] It can be better applied in display devices such as VR and AR that have higher requirements on pixel density.

[0067] The embodiment of the present invention further provides a display device 2000, such as Fig.19 As shown, Fig.19 This is a schematic diagram of a structure of a display device provided in an embodiment of the present invention, and the display device includes the above-mentioned display panel 1000. The specific structure of the display panel 1000 has been described in detail in the above-mentioned embodiment, and will not be repeated here. Fig.19 The display device shown is for illustration only, and the display device may be any electronic device with a display function, such as VR, AR, or a mobile phone, computer, etc.

[0068] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

[0069] The above contents are further detailed descriptions of the present invention in combination with specific preferred embodiments, and it cannot be determined that the specific implementation of the present invention is limited to these descriptions. For ordinary technicians in the technical field to which the present invention belongs, several simple deductions or substitutions can be made without departing from the concept of the present invention, which should be regarded as falling within the protection scope of the present invention.

Claims

1. A color film substrate, characterized in that: include: substrate; A light shielding layer, the light shielding layer is located on one side of the substrate, and the light shielding layer includes a plurality of first openings and a black matrix; Color resists, the color resists comprising a first color resist, a second color resist, and a third color resist, wherein the first color resist is adjacent to the second color resist along a first direction, and in a direction perpendicular to a plane where the substrate is located, at least a portion of the first color resist and the second color resist are respectively located on upper and lower sides of the light shielding layer, and an edge of the first color resist and an edge of the second color resist are separated by the black matrix to prevent the edge of the first color resist and the edge of the second color resist from mixing colors at the first opening; Along a direction perpendicular to the plane where the substrate is located, the color resist at least partially overlaps with the first opening; Wherein, the first direction is parallel to the plane where the substrate is located.

2. The color film substrate according to claim 1, characterized in that: The first color resist includes a plurality of first color resist strips, and the second color resist includes a plurality of second color resist strips. Along the first direction, the first color resist strips are adjacent to the second color resist strips. In a direction perpendicular to the plane where the substrate is located, the first color resist strips and the second color resist strips are located on both sides of the light shielding layer.

3. The color film substrate according to claim 2, characterized in that: In a direction perpendicular to the plane where the substrate is located, the first color-resistance strip is located on a side of the light-shielding layer close to the substrate.

4. The color film substrate according to claim 2, characterized in that: The third color resistance includes a plurality of third color resistance bars. Along the first direction, the second color resistance bars and the third color resistance bars are respectively located on both sides of the first color resistance bars. In a direction perpendicular to the plane where the substrate is located, the third color resistance bars and the second color resistance bars are located on the same side of the light shielding layer.

5. The color film substrate according to claim 2, characterized in that: The third color resistance includes a plurality of third color resistance strips. Along the first direction, the third color resistance strips and the first color resistance strips include the first opening. In a direction perpendicular to the plane where the substrate is located, the third color resistance strips and the first color resistance strips are located on the same side of the light shielding layer.

6. The color film substrate according to claim 2, characterized in that: Along the first direction, the width of the first opening is x, the width of the black matrix is ​​m, the width of the first color resist strip is a, x<a≤x+2m, and the width of the second color resist strip is b, x≤a≤x+m, wherein: x>0, m>0.

7. The color film substrate according to claim 6, characterized in that: The orthographic projection of the first color-resistance strip on the plane where the substrate is located is a first projection, and the orthographic projection of the first opening corresponding to the first color-resistance strip and the black matrix adjacent to the first direction on the plane where the substrate is located is a second projection; Along the first direction, the first projection is located within the second projection.

8. The color film substrate according to claim 7, characterized in that: Along the first direction, the second projection includes a first edge and a second edge; Along the first direction, a distance from the first projection to the first edge is equal to a distance from the first projection to the second edge.

9. The color film substrate according to claim 1, characterized in that: The color resist includes a plurality of color resist blocks, including color resist block A and color resist block B. In a direction perpendicular to the plane where the substrate is located, the color resist block A is located on a side of the light shielding layer close to the substrate, and the color resist block B is located on a side of the light shielding layer away from the substrate; Along the second direction, the color B blocks are included between the color A blocks; The second direction is perpendicular to the first direction, and the second direction is parallel to the plane where the substrate is located.

10. The color film substrate according to claim 9, characterized in that: The color A block includes a first color A block, the first color A block corresponds to the color of the first color block, and the orthographic projection of the first color A block is the first projection; the color B block includes a second color B block, the second color B block corresponds to the color of the second color block, and the orthographic projection of the second color B block is the second projection; Along the first direction, the first projection is adjacent to the second projection.

11. The color film substrate according to claim 9, characterized in that: The color resist includes a color resist strip, and along the first direction, the color resist strip is adjacent to the color resist block, and in a direction perpendicular to the plane where the substrate is located, the color resist strip is located on a side of the light shielding layer away from the substrate.

12. The color film substrate according to claim 9, characterized in that: Along the first direction, the width of the color A blocking block is c, x≤c≤x+2m, and the width of the color B blocking block is d, x≤d≤x+3 / 2m.

13. The color film substrate according to claim 12, characterized in that: The orthographic projection of the color resist block on the plane where the substrate is located is a first projection, and the orthographic projection of the first opening corresponding to the color resist block on the plane where the substrate is located is a second projection; In a direction perpendicular to the plane where the substrate is located, the center of the first projection coincides with the center of the second projection.

14. The color film substrate according to claim 1, characterized in that: The first color resist is a red color resist.

15. A display panel, characterized in that: include: An array substrate; The color film substrate according to any one of claims 1 to 14.

16. A display device, characterized in that: Comprising the display panel as claimed in claim 15.

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