Main port and substrate processing apparatus using it, and main port cleaning method

Abstract

This invention relates to a main port, a substrate processing apparatus utilizing the same, and a main port cleaning method. A main port is provided, comprising: a housing supported by a bracket and having a space formed therein; a nozzle holder disposed on the upper part of the housing and for supporting a nozzle for spraying process liquid onto a substrate; an inclined surface formed on the lower side of the nozzle holder in the space; an exhaust port for venting fumes formed in the space inside the housing; a flushing supply hole for supplying flushing liquid for removing residual process liquid remaining on the inclined surface from the process liquid sprayed from the nozzle supported by the nozzle holder; a hinge disposed on the lower part of the housing such that the housing and the bracket are hinged together so that they can rotate relative to each other; and a drive member for rotating the housing in a direction parallel to the inclined surface and the bottom surface on which the housing is disposed.

Description

Technical Field

[0001] The present invention relates to a main port and a substrate processing apparatus utilizing the same, as well as a main port cleaning method. Background Technology

[0002] The photolithography process, a part of semiconductor manufacturing, is the process of forming desired patterns on a wafer. The photolithography process is performed in a substrate processing apparatus that continuously performs coating, exposure, and development.

[0003] On one hand, the substrate processing apparatus includes a main port. This main port may be configured to include a support for a nozzle that supports the spraying of coating or developing liquid onto the wafer during the coating or developing process, and a containment space for accommodating the periodically sprayed process liquid to prevent contamination from the process liquid (such as coating or developing liquid) when the nozzle is supported for an extended period. It may also include an exhaust port for discharging fumes generated by the process liquid sprayed from the nozzle, and a supply member for cleaning the sprayed process liquid.

[0004] Figure 1 This is a cross-sectional view showing an example of the main port. It can be configured such that a nozzle holder 20 is provided at the upper part of the housing 10, and a space 30 is provided inside the housing 10. An inclined surface 40 is formed in the space 30 from which the process liquid 2 ejected from the nozzle 1 falls, causing the ejected process liquid to move downwards along the inclined surface 40 into the space 30. When the ejected process liquid 2 remains on the inclined surface 40, forming residual process liquid 3, as... Figure 3 As shown, it needs to be cleaned with rinsing solution 4.

[0005] The existing main port supply consists of a flushing solution 4 that flows over the residual process liquid 3, which presents a problem of requiring a large amount of flushing solution 4 to completely remove the residual process liquid 3. The flushing solution 4 typically uses an organic solvent called a thinner, which, being classified as an environmental pollutant, increases treatment costs if large amounts of thinner are used. Summary of the Invention

[0006] The present invention is proposed to solve the problems of the prior art. The problem to be solved by the present invention is to provide a method for cleaning the main port by minimizing the amount of rinsing fluid used for cleaning the residual process fluid of the main port while effectively cleaning the main port, and to use the method for cleaning the main port.

[0007] As a solution to the aforementioned problems, the present invention provides a main port comprising: a housing supported by a bracket and having a space formed therein; a nozzle holder disposed on the upper part of the housing and used to support a nozzle for spraying process liquid onto a substrate; an inclined surface formed on the lower side of the nozzle holder in the space; an exhaust port for venting fumes formed in the space inside the housing; a flushing supply hole for supplying flushing liquid for removing residual process liquid remaining on the inclined surface from the process liquid sprayed from the nozzle supported by the nozzle holder; a hinge disposed on the lower part of the housing such that the housing and the bracket are hinged together so as to allow the housing and the bracket to rotate relative to each other; and a drive member for rotating the housing in a direction parallel to the inclined surface and the bottom surface on which the housing is disposed.

[0008] The hinge is positioned such that the housing can be rotated sufficiently to allow the residual process liquid to immerse itself in the rinsing liquid.

[0009] The drive component may consist of a cable with one end connected to the upper side of the hinge of the housing and a winch connected to the other end of the cable, or a motor that rotates the housing and a reduction gear that transmits the rotational force of the motor to the housing, or a hydraulic cylinder that includes a rod that is rotatably connected to the housing.

[0010] Preferably, the main port further includes a rotation limiting part for limiting the rotation of the housing; more preferably, a limiting surface, which is in contact with the housing, is arranged in the rotation limiting part.

[0011] Preferably, the rinsing solution is a thinner.

[0012] As a second aspect of the present invention, a substrate processing apparatus including the aforementioned main port is provided.

[0013] As a third aspect of the present invention, a main port cleaning method is provided, comprising: an arrangement step, arranging the main port as described in claim 1; a rotation step, rotating the housing in a direction parallel to the inclined surface and the bottom surface; a flushing fluid supply step, supplying flushing fluid to the inclined surface side of the housing through the flushing supply hole while the housing is rotating; a cleaning step, maintaining the process fluid remaining on the inclined surface in a state of being immersed in the flushing fluid supplied in the flushing fluid supply step; and a discharge step, discharging the flushing fluid.

[0014] According to the present invention, a main port cleaning apparatus and a main port cleaning method are provided that can effectively clean the main port with residual process liquid inside the main port while minimizing the use of rinsing fluid containing diluent. Attached Figure Description

[0015] Figure 1 This is a diagram showing an example of an existing main port.

[0016] Figure 2 It is used to explain the support in Figure 1 The diagram shows the process fluid being ejected from the nozzle at the main port.

[0017] Figure 3 It is used to explain Figure 1 The diagram shows the residual process fluid at the main port being cleaned with rinsing fluid.

[0018] Figure 4 This is a diagram illustrating the main port according to a first embodiment of the present invention.

[0019] Figure 5 It is used for explanation Figure 4 The diagram shows the state where the main port supplies flushing fluid while rotating, and the residual process fluid is immersed in the flushing fluid.

[0020] Figure 6 This is a diagram illustrating the main port according to a second embodiment of the present invention.

[0021] Figure 7 as well as Figure 8 This is a diagram illustrating the main port according to a third embodiment of the present invention.

[0022] (Explanation of reference numerals in the attached diagram)

[0023] 10: Housing 20: Nozzle holder

[0024] 30: Space 40: Inclined Surface

[0025] 50: Flushing supply port; 60: Exhaust port

[0026] 70: Hinge Detailed Implementation

[0027] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings, thereby providing specific details for carrying out the present invention.

[0028] First, a first embodiment of the main port of the first form of the present invention will be described.

[0029] Figure 4 This is a diagram illustrating the main port according to a first embodiment of the present invention. Figure 5 It is used for explanation Figure 4 The diagram shows the state where the main port supplies flushing fluid while rotating, and the residual process fluid is immersed in the flushing fluid.

[0030] The main port configuration according to this embodiment includes a housing 10, a nozzle holder 20, an inclined surface 40, an exhaust port 60, a flushing supply hole 50, a hinge 70, a drive member, and a rotation limiting part 100.

[0031] The housing 10 is supported by the bracket D and has a space 30 inside.

[0032] The configuration is irrelevant if the bracket D can support the housing 10 to a degree that allows for sufficient rotation, as described later. Preferably, to support the housing 10 so that it can rotate appropriately, as... Figure 4 As shown, it includes the surface from the bottom to a certain height.

[0033] The nozzle holder 20 is a structure that supports the nozzle. The nozzle is used to spray process liquid onto the substrate, and is also temporarily supported in the nozzle holder 20 when no process liquid is being sprayed onto the substrate. The nozzle holder is a structure for this purpose.

[0034] The process liquid refers to the general term for liquids required in semiconductor processes, such as coating liquid, photosensitive liquid, and developing liquid, as described in the background art.

[0035] like Figure 4 As shown, the inclined surface 40 is an inclined surface formed on the lower side of the nozzle holder 20 in the space. If the process liquid contained in the nozzle supported in the nozzle holder 20 comes into contact with air, contamination may occur. Therefore, the process liquid is periodically sprayed out of the nozzle, and the sprayed process liquid moves along the inclined surface 40 towards the lower side of the space 30.

[0036] During the periodic ejection of process liquid from the nozzle, smoke (Fume) is generated in space 30. Exhaust port 60 is a through hole formed in housing 10 to exhaust this smoke.

[0037] The flushing supply hole 50 is a through hole formed in the housing 10 for supplying flushing fluid, which is used to remove residual process fluid 3 remaining on the inclined surface from the process fluid ejected from the nozzle supported by the nozzle holder 20. Residual process fluid 3 refers to process fluid that, due to its viscosity, does not move along the inclined surface 40 towards the bottom surface of the space 30 and adheres to the inclined surface 40. The accompanying drawings show residual process fluid 3 in a three-dimensional form with a certain height and area; this is for ease of drawing, but in reality, it can remain either as droplets condensed together or as a combination of a relatively wide three-dimensional form and droplets.

[0038] Through the flushing supply hole 50, the flushing fluid 4 flows into the space 30 inside the housing 10 and removes residual process fluid.

[0039] The hinge 70 is arranged on the lower side of the housing 10 to enable the housing 10 and the bracket D to be rotatably hinged together.

[0040] The hinge 70 can be configured to allow the housing 10 to rotate fully so that the residual process liquid 3 is immersed in the rinsing liquid 4. In this embodiment, it is configured on the opposite side of the inclined surface 40 in the lower part of the housing 10 and hinges the corner portions of the housing 10 and the bracket D together.

[0041] The driving member, which is a structure that rotates the housing 10 in a direction parallel to the inclined surface 40 and the bottom surface on which the housing 10 is provided, is configured in this embodiment to include a rope 80 and a winch 90.

[0042] The cable 80, which is connected to the housing 10 at one end and to the winch 90 at the other end, can be made of steel wire.

[0043] The winch 90 serves as a structure for winding or unwinding the rope 80. In this embodiment, if... Figure 4 When the rope is released in the state shown, the shell 10 rotates under gravity and changes as shown. Figure 5 As shown, in the state after cleaning, the rope 80 is wound around the housing 10 and moved to make it... Figure 4 The state shown.

[0044] The rotation limiting part 100 is arranged to limit the rotation of the housing 10 to a certain angle or more, such as... Figure 4 As shown, it can be made similar to the bracket D, and the limiting surface 101 that directly contacts the housing 10 can be arranged.

[0045] The main port according to the second embodiment of the present invention will now be described.

[0046] Figure 6 This is a diagram illustrating the main port according to the second embodiment of the present invention.

[0047] The main port configuration according to this embodiment includes a housing 10, a nozzle holder 20, an inclined surface 40, an exhaust port 60, a flushing supply hole 50, a hinge 70, a drive member, and a rotation limiting part 100.

[0048] The housing 10 is supported by the bracket D and has a space 30 inside.

[0049] The configuration is irrelevant if the bracket D can support the housing 10 to a degree that allows for sufficient rotation, as described later. Preferably, to support the housing 10 so that it can rotate appropriately, as... Figure 4 As shown, it includes the surface from the bottom to a certain height.

[0050] The nozzle holder 20 is a structure that supports the nozzle. The nozzle is used to spray process liquid onto the substrate, and is also temporarily supported in the nozzle holder 20 when no process liquid is being sprayed onto the substrate. The nozzle holder is a structure for this purpose.

[0051] The process liquid refers to the general term for liquids required in semiconductor processes, such as coating liquid, photosensitive liquid, and developing liquid, as described in the background art.

[0052] like Figure 4 As shown, the inclined surface 40 is an inclined surface formed on the lower side of the nozzle holder 20 in the space. If the process liquid contained in the nozzle supported in the nozzle holder 20 comes into contact with air, contamination may occur. Therefore, the process liquid is periodically sprayed out of the nozzle, and the sprayed process liquid moves along the inclined surface 40 towards the lower side of the space 30.

[0053] During the periodic ejection of process liquid from the nozzle, smoke (Fume) is generated in space 30. Exhaust port 60 is a through hole formed in housing 10 to exhaust this smoke.

[0054] The flushing supply hole 50 is a through hole formed in the housing 10 for supplying flushing fluid, which is used to remove residual process fluid 3 remaining on the inclined surface from the process fluid ejected from the nozzle supported by the nozzle holder 20. Residual process fluid 3 refers to process fluid that, due to its viscosity, does not move along the inclined surface 40 towards the bottom surface of the space 30 and adheres to the inclined surface 40. The accompanying drawings show residual process fluid 3 in a three-dimensional form with a certain height and area; this is for ease of drawing, but in reality, it can remain either as droplets condensed together or as a combination of a relatively wide three-dimensional form and droplets.

[0055] Through the flushing supply hole 50, the flushing fluid 4 flows into the space 30 inside the housing 10 and removes residual process fluid.

[0056] The hinge 70 is arranged on the lower side of the housing 10 to enable the housing 10 and the bracket D to be rotatably hinged together.

[0057] The hinge 70 can be configured to allow the housing 10 to rotate fully so that the residual process liquid 3 is immersed in the rinsing liquid 4. In this embodiment, it is configured on the opposite side of the inclined surface 40 in the lower part of the housing 10 and hinges the corner portions of the housing 10 and the bracket D together.

[0058] The drive member is a structure that rotates the housing 10 in a direction parallel to the inclined surface 40 and the bottom surface on which the housing 10 is provided. In this embodiment, it is configured to include a motor 110 and a reduction gear 120.

[0059] The driving force of the motor 110 is transmitted to the housing 10 through the reduction gear section 120, thereby driving the housing 10.

[0060] The motor 110 is manufactured to provide an appropriate torque that matches the weight of the housing 10.

[0061] The state of the rotating housing 10 by the motor 110 and Figure 5 The states shown are essentially the same, therefore no accompanying drawings are provided.

[0062] The rotation limiting part 100 is arranged to limit the rotation of the housing 10 to a certain angle or more, such as... Figure 4 As shown, it can be made similar to the bracket D, and the limiting surface 101 that directly contacts the housing 10 can be arranged.

[0063] The main port according to the third embodiment of the present invention will now be described.

[0064] Figure 7 as well as Figure 8 This is a diagram illustrating the main port according to a third embodiment of the present invention.

[0065] The main port configuration according to this embodiment includes a housing 10, a nozzle holder 20, an inclined surface 40, an exhaust port 60, a flushing supply hole 50, a hinge 70, and a drive component.

[0066] The housing 10 is supported by the bracket D and has a space 30 inside.

[0067] The configuration is irrelevant if the bracket D can support the housing 10 to a degree that allows for sufficient rotation, as described later. Preferably, to support the housing 10 so that it can rotate appropriately, as... Figure 4 As shown, it includes the surface from the bottom to a certain height.

[0068] The nozzle holder 20 is a structure that supports the nozzle. The nozzle is used to spray process liquid onto the substrate, and is also temporarily supported in the nozzle holder 20 when no process liquid is being sprayed onto the substrate. The nozzle holder is a structure for this purpose.

[0069] The process liquid refers to the general term for liquids required in semiconductor processes, such as coating liquid, photosensitive liquid, and developing liquid, as described in the background art.

[0070] like Figure 4 As shown, the inclined surface 40 is an inclined surface formed on the lower side of the nozzle holder 20 in the space. If the process liquid contained in the nozzle supported in the nozzle holder 20 comes into contact with air, contamination may occur. Therefore, the process liquid is periodically sprayed out of the nozzle, and the sprayed process liquid moves along the inclined surface 40 towards the lower side of the space 30.

[0071] During the periodic ejection of process liquid from the nozzle, smoke (Fume) is generated in space 30. Exhaust port 60 is a through hole formed in housing 10 to exhaust this smoke.

[0072] The flushing supply hole 50 is a through hole formed in the housing 10 for supplying flushing fluid, which is used to remove residual process fluid 3 remaining on the inclined surface from the process fluid ejected from the nozzle supported by the nozzle holder 20. Residual process fluid 3 refers to process fluid that, due to its viscosity, does not move along the inclined surface 40 towards the bottom surface of the space 30 and adheres to the inclined surface 40. The accompanying drawings show residual process fluid 3 in a three-dimensional form with a certain height and area; this is for ease of drawing, but in reality, it can remain either as droplets condensed together or as a combination of a relatively wide three-dimensional form and droplets.

[0073] Through the flushing supply hole 50, the flushing fluid 4 flows into the space 30 inside the housing 10 and removes residual process fluid.

[0074] The hinge 70 is arranged on the lower side of the housing 10 to enable the housing 10 and the bracket D to be rotatably hinged together.

[0075] The hinge 70 can be configured to allow the housing 10 to rotate fully so that the residual process liquid 3 is immersed in the rinsing liquid 4. In this embodiment, it is configured between the lower side of the housing 10.

[0076] The hinge 70 consists of a first component 71 that is coupled to the lower part of the housing 10, a second component 72 disposed on the upper part of the bracket D, and a hinge pin 73 that passes through the first component 71 and the second component 72.

[0077] The driving member is a structure that rotates the housing 10 in a direction parallel to the inclined surface 40 and the bottom surface on which the housing 10 is provided. In this embodiment, it is a hydraulic cylinder 130.

[0078] As shown, the rod 131 of the hydraulic cylinder 130 can be rotatably coupled to the housing 10, and the cylinder can be rotatably coupled to the bracket D.

[0079] If the hydraulic cylinder 130 is used as a driving component, then... Figure 4 Unlike the rope 80 or winch 90 shown, the housing 10 does not need to be rotated by gravity, so it is not necessary to set the hinge 70 at the corner of the bracket D, nor is it necessary to have a rotation limiting part.

[0080] The following is a description of the main port cleaning method utilizing the aforementioned main port, as a second aspect of the present invention.

[0081] The main port cleaning method according to this embodiment includes a layout step, a rotation step, a flushing fluid supply step, a cleaning step, and a discharge step.

[0082] The arrangement steps are to arrange the aforementioned ( Figures 4 to 7 (See the steps for the main port)

[0083] The rotation step is a step of rotating the housing 10 in a direction parallel to the inclined surface 40 and the bottom surface in order to clean the aforementioned main port. Performing the rotation step means that cleaning is required, which means that the residual process liquid 3 remaining on the inclined surface 40 exceeds a certain amount.

[0084] The housing 10 rotates via a drive component. If Figure 4 When the winch 90 at the main port shown releases the cable 80, the housing 10 rotates due to gravity. Figure 6 The main port shown rotates the housing 10 via the driving force of the motor 110. Figure 7 As the rod 131 of the hydraulic cylinder 130 at the main port moves, the housing 10 is rotated by applying pressure to the housing 10.

[0085] The state in which the housing 10 is rotated by the aforementioned rotation step is as follows: Figure 5 as well as Figure 8 As shown.

[0086] The flushing fluid supply step is a step in which flushing fluid is supplied through the flushing supply hole 50 while the housing 10 is rotated.

[0087] The cleaning step is a step of cleaning the residual process liquid 3 by keeping the residual process liquid 3 remaining on the inclined surface 40 immersed in the rinsing liquid 4 for a period of time.

[0088] The discharge step is a step in which the residual process liquid 3 and the rinsing liquid 4, which have been cleaned by the rinsing solution, are discharged together after the cleaning step is completed.

[0089] The final form of the present invention is a substrate processing apparatus, characterized by including the aforementioned main port, and since the main port has been sufficiently described, further description is omitted.

[0090] The foregoing has described several forms of the present invention and embodiments thereof, providing specific details for carrying out the present invention. The technical concept of the present invention is not limited to the described embodiments and can be embodied in various forms without departing from the scope of the technical concept of the present invention.

Claims

1. A main port, comprising: The shell is supported by a bracket and has a space inside; The nozzle holder is arranged in the upper part of the housing above the space and is used to support the nozzle that sprays the process liquid onto the substrate. An inclined surface is formed on the lower side of the nozzle holder portion in the space; An exhaust port is used to exhaust smoke formed in the internal space of the housing; The flushing supply hole is flushed to supply flushing fluid, which is used to remove residual process fluid remaining on the inclined surface from the process fluid ejected from the nozzle supported in the nozzle holder. A hinge, arranged at the lower part of the housing, allows the housing and the support to be hinged together so as to enable rotation between them; and A driving component rotates the housing so that the inclined surface is parallel to the bottom surface on which the housing is located.

2. The main port according to claim 1, wherein, The hinge is positioned such that the housing can be rotated sufficiently to allow the residual process liquid to immerse itself in the rinsing liquid.

3. The main port according to claim 1, wherein, The drive component includes a cable with one end connected to the upper side of the hinge of the housing and a winch connected to the other end of the cable.

4. The main port according to claim 1, wherein, The drive component includes a motor that rotates the housing and a reduction gear that transmits the rotational force of the motor to the housing.

5. The main port according to claim 1, wherein, The driving component is a hydraulic cylinder, which includes a rod that is rotatably coupled to the housing.

6. The main port according to claim 3, wherein, The main port also includes a rotation limiting part for limiting the rotation of the housing.

7. The main port according to claim 4, wherein, The main port also includes a rotation limiting part for limiting the rotation of the housing.

8. The main port according to claim 6, wherein, The rotation limiting part has a surface that abuts against the housing, which is called the limiting surface.

9. The main port according to claim 1, wherein, The rinsing solution is a diluent.

10. A substrate processing apparatus having a main port, the main port comprising: The shell is supported by a bracket and has a space inside; The nozzle holder is arranged in the upper part of the housing above the space and is used to support the nozzle that sprays the process liquid onto the substrate. An inclined surface is formed on the lower side of the nozzle holder portion in the space; An exhaust port is used to exhaust smoke formed in the internal space of the housing; The flushing supply hole is flushed to supply flushing fluid, which is used to remove residual process fluid remaining on the inclined surface from the process fluid ejected from the nozzle supported in the nozzle holder. A hinge, arranged in the lower part of the housing on the side opposite to the inclined surface, connects the housing and the support hinge; and A driving component rotates the housing so that the inclined surface is parallel to the bottom surface on which the housing is located.

11. The substrate processing apparatus according to claim 10, wherein, The hinge is positioned such that the housing can be rotated sufficiently to allow the residual process liquid to immerse itself in the rinsing liquid.

12. The substrate processing apparatus according to claim 10, wherein, The drive component includes a cable with one end connected to the upper side of the hinge of the housing and a winch connected to the other end of the cable.

13. The substrate processing apparatus according to claim 10, wherein, The drive component includes a motor that rotates the housing and a reduction gear that transmits the rotational force of the motor to the housing.

14. The substrate processing apparatus according to claim 10, wherein, The driving component is a hydraulic cylinder, which includes a rod that is rotatably coupled to the housing.

15. The substrate processing apparatus according to claim 12, wherein, The main port also includes a rotation limiting part for limiting the rotation of the housing.

16. The substrate processing apparatus according to claim 13, wherein, The main port also includes a rotation limiting part for limiting the rotation of the housing.

17. The substrate processing apparatus according to claim 15, wherein, The rotation limiting part has a surface that abuts against the housing, which is called the limiting surface.

18. The substrate processing apparatus according to claim 10, wherein, The rinsing solution is a diluent.

19. A method for cleaning a main port, comprising: Arrangement steps, including arranging the main port according to any one of claims 1 to 9; The rotation step involves rotating the housing in a direction parallel to the inclined surface and the bottom surface. In the flushing fluid supply step, while the housing is rotating, flushing fluid is supplied to the inclined side of the housing through the flushing supply hole; The cleaning step maintains the residual process liquid on the inclined surface in a state where it is immersed in the rinsing liquid supplied in the rinsing liquid supply step; as well as The flushing solution is then drained.

20. The main port cleaning method according to claim 19, wherein, The rinsing solution is a diluent.

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