Differential pressure measuring device and substrate processing apparatus comprising the same

CN116313884BActive Publication Date: 2026-11-03SYSTEM ENGINEERING MEGA SOLUTION CO LTD
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Patent Information

Application Number
CN202211469191.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2021-11-23
Filing Date
2022-11-22
Publication Date
2026-11-03
Estimated Expiration
2042-11-22

AI Technical Summary

Technical Problem

In semiconductor manufacturing equipment, reference pressure fluctuations make it impossible to accurately measure pressure differences, making it difficult to manage airflow inside the equipment, and the reference pressure measurement port is susceptible to environmental influences.

Method used

Design a differential pressure measurement device, including a first box unit, a second box unit, and a third box unit, which are set outside the substrate processing equipment. The device is connected to pressure ports at specific and reference positions via connecting pipelines, and uses a controller to maintain a constant differential pressure to avoid environmental influences.

Benefits of technology

It enables precise measurement of differential pressure, prevents fluctuations in reference pressure, reduces environmental impact, and ensures the stability and accuracy of differential pressure measurement.

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Abstract

A substrate processing apparatus is provided, including: an indexing module on which a substrate is loaded or unloaded; a processing module for performing a substrate process on the substrate loaded into the indexing module; a buffer chamber provided between the indexing module and the processing module; and a differential pressure measuring device for measuring a differential pressure between a pressure at a specific position inside the substrate processing apparatus and a pressure at a reference position serving as a reference, wherein the differential pressure measuring device is provided outside the substrate processing apparatus.
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Citation Information

Patent Citations

  • Substrate treatment unit, detecting method of substrate mounting state, and substrate treatment apparatus

    JP2005117007A

  • Test method for substrate treating apparatus

    KR1020180053922A

  • Combination differential and absolute pressure transducer for load lock control

    US20010029889A1