A six-dimensional force sensor with a beam elastic structure capable of realizing sputtering process

By using the sputtering process to sputter strain gauge on the elastic structure of the Shenzi beam of the six-dimensional force sensor and combining the main beam and floating beam design, the stability and accuracy problems caused by the traditional pasting method are solved, and high sensitivity and high precision multi-dimensional force measurement is achieved.

CN116358752BActive Publication Date: 2025-08-26SOUTHEAST UNIV
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Patent Information

Application Number
CN202310345931.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-04-03
Publication Date
2025-08-26
Estimated Expiration
2043-04-03

AI Technical Summary

Technical Problem

The existing multi-dimensional force sensor adopts traditional strain gauge pasting methods to cause low temperature range and reduced performance due to volatile condensation of glue, which affects the stability and accuracy of the sensor.

Method used

The sputtering process is used to sputter the strain gauge on the elastomeric structure of the Shenzi beam of the six-dimensional force sensor, combined with the main beam and floating beam design, forming a Wheatstone bridge, reducing the interdimensional coupling error and internal stress error, and improving the stability and measurement accuracy of the sensor.

Benefits of technology

A high-sensitivity six-dimensional force sensor is realized, which avoids the stability and temperature and humidity resistance of traditional pasting methods, reduces interdimensional coupling errors and internal stress errors caused by assembly, and improves measurement accuracy and overall performance of the sensor.

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Abstract

The present invention discloses a six-dimensional force sensor with a spur beam elastic body structure that can implement a sputtering process. The structure comprises a main beam, a first floating beam, a second floating beam, square corners and strain gauges. 24 strain gauges are sputtered on the main beam and the first floating beam to form multiple groups of Wheatstone bridges. When an input force / torque in a certain dimension acts on the center of the spur beam elastic body, the sensor is deformed, the resistance of the strain gauge at the corresponding position changes, and thus the output voltage of the corresponding bridge changes. At the same time, due to the structural design, the output voltages of the remaining dimensions do not change significantly, effectively reducing inter-dimensional coupling interference, thereby improving the measurement accuracy of the sensor.
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Description

Technical Field

[0001] The present invention belongs to the technical field of sensors, and particularly relates to a cross-shaped beam elastomer structure of a six-axis force sensor capable of realizing a sputtering process. Background Art

[0002] Multi-axis force sensors can simultaneously sense force components and torque components in multiple dimensions of space, thereby obtaining complete force information in complex systems, and are widely used in fields such as force-based haptic human-computer interaction, humanoid robots, aerospace, biomedical research, medical devices, and automobiles. Among them, the resistive strain multi-axis force sensor based on a cross-shaped beam structure is currently the most widely used. The strain gauge is used to convert the deformation generated by the sensor under force into a voltage change to measure the force component and torque component.

[0003] Since most of the currently developed multi-axis force sensors adopt the traditional strain gauge pasting method, there are problems such as a low temperature range and performance degradation caused by the volatilization and condensation of glue. Using the sputtering process can avoid using glue, so it is of great practical significance to sputter strain gauges using the sputtering process. Summary of the Invention

[0004] To solve the above problems, the present invention discloses a cross-shaped beam elastomer structure of a six-axis force sensor capable of realizing a sputtering process, which has the advantages of high sensitivity and low coupling between dimensions, and is suitable for multi-axis force measurement in the aerospace field.

[0005] To achieve the above object, the technical solution of the present invention is as follows:

[0006] A cross-shaped beam elastomer structure of a six-axis force sensor capable of realizing a sputtering process, comprising a main beam, a first floating beam, a second floating beam, square corners, and strain gauges;

[0007] The main beam is composed of 4 rectangular cross beams with a square cross-section; one ends of the 4 rectangular cross beams are connected to each other to form a cross, and the other ends are connected to the first floating beam; force and torque act on the center position of the cross; the first floating beam is composed of 4 rectangular thin-walled beams with a rectangular cross-section; the center of the inner side of the first floating beam is connected to the main beam, and both ends are connected to the square corners; the second floating beam is composed of 4 rectangular thin-walled beams with a rectangular cross-section; the second floating beam is parallel to the main beam in the horizontal position, one end of the second floating beam is connected to the main beam, and the other end is connected to the first floating beam; the axis of the second floating beam is located at the center position of the distance between the main beam in the horizontal position and the first floating beam in the horizontal position; the square corners are 4 columnar bodies with a cuboid structure and a square cross-section; there are 4 connection holes on the square corners for fixing; the main beam is in the middle, the first floating beam is on the periphery, the second floating beam is between the main beam in the horizontal position and the first floating beam in the horizontal position, and the main beam and the second floating beam form a "丰" character.

[0008] The measurement principle of the six-dimensional force sensor is to sputter 24 strain gauges on the main beam and the first floating beam to form 6 groups of Wheatstone bridges, 3 groups on the main beam and 3 groups on the first floating beam. Among them, the first floating beam in the vertical position has a total of 4 strain gauges on the outer wall near the center of the main beam, forming a bridge circuit for measuring the force Fx in the X direction; the first floating beam in the horizontal position has a total of 4 strain gauges on the outer wall near the center of the main beam, forming a bridge circuit for measuring the force Fy in the Y direction; the upper and lower surfaces of the two cross beams in the X direction of the main beam are close to the center platform, forming a bridge circuit for measuring the force Fz in the Z direction; the upper and lower surfaces of the two cross beams in the Y direction of the main beam are away from the center platform, forming a bridge circuit for measuring the torque Mx in the X direction; the upper and lower surfaces of the two cross beams in the X direction of the main beam are away from the center platform, forming a bridge circuit for measuring the torque My in the Y direction; the outer wall of the first floating beam close to the second floating beam has a total of 4 strain gauges, forming a bridge circuit for measuring the torque Mz in the Z direction. When a force / torque of a certain dimension acts on the center of the S-shaped beam, the sensor deforms, and the resistance of the strain gauge at the corresponding position changes, causing the output voltage of the corresponding bridge to change. By measuring the change in voltage, the value of the force / torque of that dimension can be obtained.

[0009] The beneficial effects of the present invention are:

[0010] (1) The six-dimensional force sensor designed by the present invention, which can realize the sputtering process, avoids the problems of low stability and poor temperature and humidity resistance when the multi-dimensional force sensor adopts the patch method, and improves the stability of the sensor.

[0011] (2) The six-dimensional force sensor designed by the present invention, which can realize the sputtering process, is based on the principle of resistance strain, and the sensitive part adopts a rectangular beam structure, which has high measurement sensitivity;

[0012] (3) The six-dimensional force sensor designed by the present invention, which can realize the sputtering process, adopts a combination of a main beam and a floating beam, which effectively reduces the inter-dimensional coupling error and has good measurement accuracy;

[0013] (4) The six-dimensional force sensor designed by the present invention, which can realize the sputtering process, adopts an integrated design, which effectively reduces the internal stress error caused by assembly and improves the sensor accuracy;

[0014] (5) The six-dimensional force sensor designed by the present invention that can realize the sputtering process has a simple structure and is easy to process. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a structural schematic diagram of the Shen-shaped beam of the present invention.

[0016] Figure 2 Schematic diagram of the position of the strain gauge patch of the present invention.

[0017] Figure 3 These are the schematic diagrams of the 6 bridge circuits in the present invention.

[0018] List of attached drawing reference signs:

[0019] Main beam 11, first floating beam 12, second floating beam 13, square corner 14, strain gauge 15. Detailed implementation manners

[0020] The present invention will be further clarified below in conjunction with the attached drawings and specific implementation manners. It should be understood that the following specific implementation manners are only used to illustrate the present invention and not to limit the scope of the present invention.

[0021] For the convenience of describing directions, a spatial Cartesian coordinate system as shown in Figure 1 is established. The present invention proposes a six-dimensional force sensor Shen character beam elastomer structure capable of realizing a sputtering process, including a main beam 11, a first floating beam 12, a second floating beam 13, a square corner 14, and a strain gauge 15;

[0022] As shown in Figure 1 , the main beam 11 is composed of 4 rectangular cross beams, and its cross-section is square; one ends of the 4 rectangular cross beams are connected to each other to form a cross, and the other ends are connected to the first floating beam 12; forces and torques act on the center position of the cross; the first floating beam 12 is composed of 4 rectangular thin-walled beams, and its cross-section is rectangular; the center of the inner side of the first floating beam 12 is connected to the main beam 11, and both ends are connected to the square corner 14; the second floating beam 13 is composed of 4 rectangular thin-walled beams, and its cross-section is rectangular; the second floating beam 13 is parallel to the main beam 11 in the horizontal position, one end of the second floating beam 13 is connected to the main beam 11, and the other end is connected to the first floating beam 12; the axis of the second floating beam 13 is located at the center position of the distance between the main beam 11 in the horizontal position and the first floating beam 12 in the horizontal position; the square corner 14 is composed of 4 columnar bodies of cuboid structure, and its cross-section is square; there are 4 connection holes on the square corner 14 for fixation; the main beam 11 is in the middle, the first floating beam 12 is on the periphery, the second floating beam 13 is between the main beam 11 in the horizontal position and the first floating beam 12 in the horizontal position, and the main beam 11 and the second floating beam 13 form a "Feng" character;

[0023] Figure 2Shown are the patch positions of a total of 24 strain gauges described in the present invention and the corresponding numbers R1 to R24. All strain gauges are exactly the same except for the numbers, that is, they have the same initial resistance, the resistance decreases when contracting, and the resistance increases when extending. The strain gauges are sputtered at the position where the strain is the largest when each main beam is under stress. Strain gauges R1 and R7 are sputtered on the upper and lower surfaces of the main beam located in the negative X direction rectangular beam close to the center of the cross, strain gauges R3 and R9 are sputtered on the upper and lower surfaces of the main beam located in the positive X direction rectangular beam close to the center of the cross, strain gauges R2 and R8 are sputtered on the upper and lower surfaces of the main beam located in the positive Y direction rectangular beam away from the center of the cross, strain gauges R4 and R10 are sputtered on the upper and lower surfaces of the main beam located in the negative Y direction rectangular beam away from the center of the cross, strain gauges R5 and R11 are sputtered on the upper and lower surfaces of the main beam located in the positive X direction rectangular beam away from the center of the cross, strain gauges R6 and R12 are sputtered on the upper and lower surfaces of the main beam located in the negative X direction rectangular beam away from the center of the cross, strain gauges R13 and R15 are sputtered on the upper and lower surfaces of the first floating beam located in the negative X direction rectangular beam away from the center of the cross Strain gauges R14 and R16 are sputtered on the outer wall of the rectangular thin-walled beam in the positive X direction close to the main beam, strain gauges R17 and R21 are sputtered on the outer wall of the rectangular thin-walled beam in the negative Y direction close to the main beam, strain gauges R19 and R23 are sputtered on the outer wall of the rectangular thin-walled beam in the positive Y direction close to the main beam, strain gauges R18 and R20 are sputtered on the outer wall of the rectangular thin-walled beam in the negative X direction close to the second floating beam, strain gauges R22 and R24 are sputtered on the outer wall of the rectangular thin-walled beam in the positive X direction close to the second floating beam, and all strain gauges are sputtered at the position where the strain is the largest when each beam is subjected to force.

[0024] The measurement principle of the six-dimensional force sensor is that the input force / torque of a certain dimension acts on the center of the S-beam elastic body, causing the sensor to deform, and the resistance of the strain gauge at the corresponding position changes, thereby causing the output voltage of the corresponding bridge to change. At the same time, due to the design of the structure, the output voltage of the remaining dimensions will not change significantly, which effectively reduces the inter-dimensional coupling interference, thereby improving the measurement accuracy of the sensor. Therefore, during use, it is only necessary to measure the voltage change of all 6 channels to obtain the value of the force / torque in each dimension. Let R0 represent the zero-position resistance value of the strain gauge, ΔR Fx , ΔR Fy , ΔR Fz , ΔR Mx , ΔR My , ΔR Mz They represent the resistance change of the strain gauge under the action of Fx, Fy, Fz, Mx, My, and Mz respectively. The change in the output voltage of each channel is as follows:

[0025]

[0026]

[0027]

[0028]

[0029]

[0030]

[0031] It should be noted that the above content merely illustrates the technical idea of ​​the present invention and cannot be used to limit the scope of protection of the present invention. For ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present invention. These improvements and modifications all fall within the scope of protection of the claims of the present invention.

Claims

1. A six-dimensional force sensor with a spherical beam elastic structure capable of implementing a sputtering process, characterized by: It includes a main beam (11), a first floating beam (12), a second floating beam (13), a square corner (14) and a strain gauge (15); The main beam (11) consists of 4 rectangular cross beams with a square cross section; One end of the 4 rectangular cross beams is connected to each other to form a cross, and the other end is connected to the first floating beam (12); Forces and torques act on the center of the cross; The first floating beam (12) consists of 4 rectangular thin-walled beams with a rectangular cross section; The center of the inner side of the first floating beam (12) is connected to the main beam (11), and both ends are connected to the square corner (14); The second floating beam (13) consists of 4 rectangular thin-walled beams with a rectangular cross section; The second floating beam (13) is parallel to the main beam (11) in the horizontal position. One end of the second floating beam (13) is connected to the main beam (11), and the other end is connected to the first floating beam (12); The axis of the second floating beam (13) is located at the center of the distance between the main beam (11) in the horizontal position and the first floating beam (12) in the horizontal position; The square corner (14) is 4 columnar bodies with a cuboid structure and a square cross section; There are 4 connecting holes on the square corner (14) for fixing; The main beam (11) is in the middle, the first floating beam (12) is on the periphery, the second floating beam (13) is between the main beam (11) in the horizontal position and the first floating beam (12) in the horizontal position, and the main beam (11) and the second floating beam (13) form a "丰" character; There are 24 strain gauges (15) with their patch positions and corresponding numbers R1 to R24; all strain gauges are exactly the same except for the numbers, that is, they have the same initial resistance, the resistance decreases when contracting, and the resistance increases when extending; strain gauges R1 and R7 are sputtered on the upper and lower surfaces of the main beam (11) located in the negative X direction rectangular beam close to the center table, strain gauges R3 and R9 are sputtered on the upper and lower surfaces of the main beam (11) located in the positive X direction rectangular beam close to the center table, strain gauges R2 and R8 are sputtered on the upper and lower surfaces of the main beam (11) located in the positive Y direction rectangular beam away from the center table, strain gauges R4 and R10 are sputtered on the upper and lower surfaces of the main beam (11) located in the negative Y direction rectangular beam away from the center table, strain gauges R5 and R11 are sputtered on the upper and lower surfaces of the main beam (11) located in the positive X direction rectangular beam away from the center table, strain gauges R6 and R12 are sputtered on the upper and lower surfaces of the main beam (11) located in the negative X direction rectangular beam away from the center table, The strain gauges R13 and R15 are sputtered on the outer side wall of the first floating beam (12) located in the negative X direction and the rectangular thin-walled beam close to the main beam (11); the strain gauges R14 and R16 are sputtered on the outer side wall of the first floating beam (12) located in the positive X direction and the rectangular thin-walled beam close to the main beam (11); the strain gauges R17 and R21 are sputtered on the outer side wall of the first floating beam (12) located in the negative Y direction and the rectangular thin-walled beam close to the main beam (11); the strain gauges R19 and R23 are sputtered on the outer side wall of the first floating beam (12) located in the negative Y direction and the rectangular thin-walled beam close to the main beam (11); The floating beam (12) is located on the outer side wall of the rectangular thin-walled beam in the positive Y direction close to the main beam (11); the strain gauges R18 and R20 are sputtered on the outer side wall of the first floating beam (12) located on the negative X direction close to the second floating beam (13); the strain gauges R22 and R24 are sputtered on the outer side wall of the first floating beam (12) located on the positive X direction close to the second floating beam (13); all the strain gauges are sputtered at the position where the strain is the largest when each beam is subjected to force.

2. The measurement principle of the six-dimensional force sensor with a sputtering process-capable spherical beam elastic structure according to claim 1, characterized in that: An input force / torque in a certain dimension acts on the center of the S-beam elastic body, causing the sensor to deform and the resistance of the strain gauge at the corresponding position to change, thereby changing the output voltage of the corresponding bridge. At the same time, due to the structural design, the output voltage of the other dimensions does not change significantly, effectively reducing inter-dimensional coupling interference and thus improving the measurement accuracy of the sensor.

Citation Information

Patent Citations

  • Integrated multi-dimensional force sensor based on thin film sputtering technology

    CN114720028A

  • Micro-miniature combined type multi-dimensional force sensor structure

    CN114894364A