A method and device for detecting ignition, and ion beam etching equipment

Abstract

This invention provides a method and apparatus for detecting ionization, and an ion beam etching device. It utilizes a probe to acquire and detect the voltage of an RF supply device to obtain a detection signal. The RF supply device provides an RF signal to the quartz barrel and may include an RF power source and an RF coil. The detection point for detecting the RF supply device is located between the RF power source and the RF coil. If the detection signal is a sine wave, it indicates that there is no ionization outside the quartz barrel connected to the RF supply device. If the detection signal has harmonics or distorted waves in addition to the sine wave, it indicates leakage current, thus confirming the presence of ionization outside the quartz barrel connected to the RF supply device. This allows for the detection of ionization by the RF supply device, enabling timely detection of ionization events outside the quartz barrel and allowing for timely responses to such external ionization. Therefore, it allows for more precise control of the etching process.

Description

Technical Field

[0001] This invention relates to the field of semiconductor devices and their manufacturing, and particularly to a ignition detection method and apparatus, and an ion beam etching device. Background Technology

[0002] In the manufacturing process of semiconductor devices, ion beam etching (IBE) involves using a high-energy ion beam generated by an ion source, accelerated by a multi-stage grid, to strike the surface of a wafer. If the atomic binding energy on the wafer surface is lower than the ion incident energy, the solid surface atoms are removed and sputtered off the surface, thus etching the wafer surface material. Inert gases such as Ar+ ions are typically used to process the wafer surface. Since ion beam etching systems are generally equipped with a rotating and revolving stage, the angle at which the ions are incident on the wafer can be adjusted. This allows for modification of the sidewall morphology of the etched surface, resulting in a good etch morphology and excellent device performance.

[0003] An ion beam etching system includes an ion source in a high-vacuum chamber. The ion source comprises an RF coil, a discharge quartz chamber, and a gas source. The gas source provides the gas. After the RF coil is loaded with an RF signal, a high-frequency electromagnetic field is coupled into the discharge quartz chamber via inductive coupling, thereby ionizing the gas entering the quartz chamber. The RF coil is located outside the quartz chamber but inside the vacuum chamber. Since the reaction gas inside the quartz chamber is not sealed, the RF coil outside the quartz chamber may simultaneously ionize the gas outside the quartz chamber, causing energy loss and damage to other components. How to detect the ionization status of the RF coil is an important problem in this field. Summary of the Invention

[0004] In view of this, the purpose of the present invention is to provide a ignition detection method and apparatus, and an ion beam etching device, to detect the ionization of the quartz barrel, so as to more accurately control the etching process.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] This application provides a ignition detection device, including:

[0007] A probe is used to acquire a detection signal by detecting the voltage of the radio frequency (RF) supply device, so as to determine that there is ionization outside the quartz barrel connected to the RF supply device when the waveform of the detection signal has harmonics or distorted waves in addition to a sine wave; the RF supply device includes an RF power supply and an RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil.

[0008] Optionally, the radio frequency providing device further includes a radio frequency matching unit connected between the radio frequency power supply and the radio frequency coil, and the detection point for detecting the radio frequency providing device is located between the radio frequency power supply and the radio frequency coil.

[0009] Optionally, the RF matching unit includes a matching inductor and an adjustable capacitor connected in series, and the detection point for detecting the RF providing device is located between the matching inductor and the adjustable capacitor.

[0010] Optionally, the device further includes:

[0011] The host computer is used to determine that there is ionization outside the quartz barrel connected to the radio frequency providing device when the waveform of the detected signal has harmonics or distorted waves in addition to a sine wave, and to control the radio frequency power supply to stop providing radio frequency signals.

[0012] Optionally, the device further includes:

[0013] An oscilloscope is used to display the waveform of the detected signal.

[0014] Optionally, a voltage divider resistor is provided between the probe and the detection point that detects the radio frequency providing device.

[0015] This invention provides a method for ignition detection, comprising:

[0016] A detection signal is obtained by detecting the voltage of the radio frequency (RF) supply device using a probe; the RF supply device includes an RF power supply and an RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil;

[0017] If the waveform of the detected signal has harmonics or distorted waves in addition to a sine wave, it is determined that there is ionization outside the quartz barrel connected to the radio frequency providing device.

[0018] Optionally, the radio frequency providing device further includes a radio frequency matching unit connected between the radio frequency power supply and the radio frequency coil, and the detection point for detecting the radio frequency providing device is located between the radio frequency power supply and the radio frequency coil.

[0019] Optionally, the RF matching unit includes a matching inductor and an adjustable capacitor connected in series, and the detection point for detecting the RF providing device is located between the matching inductor and the adjustable capacitor.

[0020] Optionally, the method further includes:

[0021] When it is determined that there is ionization outside the quartz barrel connected to the radio frequency supply device, the radio frequency power supply is controlled to stop supplying radio frequency signals.

[0022] This invention provides an ion beam etching apparatus, including an ion source, the ion source comprising:

[0023] Quartz barrel;

[0024] A gas source for supplying process gas to the quartz barrel;

[0025] A radio frequency (RF) supply device is used to generate a high-frequency alternating magnetic field to ionize the process gas and form plasma.

[0026] The aforementioned ignition detection device is used to detect the radio frequency providing device.

[0027] This invention provides a method and apparatus for detecting ionization, and an ion beam etching device. A probe is used to detect the voltage of an RF supply device to obtain a detection signal. The RF supply device provides an RF signal to the quartz barrel and may include an RF power source and an RF coil. The detection point for detecting the RF supply device is located between the RF power source and the RF coil. If the detection signal is a sine wave, it indicates that there is no ionization outside the quartz barrel connected to the RF supply device. If the detection signal has harmonics or distorted waves in addition to the sine wave, it indicates leakage current, thus confirming the presence of ionization outside the quartz barrel connected to the RF supply device. This allows for the detection of ionization by the RF supply device, enabling timely detection of ionization events outside the quartz barrel and allowing for timely responses to such external ionization. Therefore, the etching process can be controlled more precisely. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 This is a schematic diagram of the structure of a ignition detection device provided in an embodiment of this application;

[0030] Figure 2 A schematic diagram of a detection signal provided in an embodiment of this application;

[0031] Figure 3 A schematic diagram of another detection signal provided in an embodiment of this application;

[0032] Figure 4 This is a schematic diagram of another ignition detection device provided in an embodiment of this application;

[0033] Figure 5This is a schematic diagram of another ignition detection device provided in an embodiment of this application;

[0034] Figure 6 This is a schematic diagram of an ion beam etching apparatus provided in an embodiment of this application. Detailed Implementation

[0035] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0036] Many specific details are set forth in the following description in order to provide a full understanding of the invention. However, the invention may also be practiced in other ways different from those described herein, and those skilled in the art can make similar extensions without departing from the spirit of the invention. Therefore, the invention is not limited to the specific embodiments disclosed below.

[0037] Secondly, the present invention will be described in detail with reference to the schematic diagrams. When detailing the embodiments of the present invention, for ease of explanation, the cross-sectional views illustrating the device structure will be partially enlarged, not according to the usual scale. Furthermore, the schematic diagrams are merely examples and should not limit the scope of protection of the present invention. In addition, actual fabrication should include three-dimensional spatial dimensions of length, width, and depth.

[0038] The ion beam etching system includes an ion source in a vacuum chamber. The ion source includes an RF coil, a discharge quartz chamber, and a gas source. The gas source provides gas. After the RF coil is loaded with an RF signal, it couples a high-frequency electromagnetic field into the discharge quartz chamber through inductive coupling, thereby ionizing the gas entering the quartz chamber. The RF coil is located outside the quartz chamber and inside the vacuum chamber. The reaction gas in the quartz chamber is not sealed. Therefore, while the quartz chamber is ignited, the RF coil located outside the quartz chamber may also ionize the gas outside the quartz chamber at the same time, causing energy loss and damage to other devices.

[0039] If the outside of the quartz barrel is ionized by the coil, some radio frequency energy will not couple into the quartz barrel, resulting in energy loss. This directly affects the plasma density inside the quartz barrel, causing process non-repeatability issues. Ionization outside the quartz barrel can also damage other components such as the chamber, coils, and electrical connections. Particles formed from damaged components are very likely to drift into the chamber, causing excessive particle counts, which is fatal for chip processing. Furthermore, since the DC power leads, such as the ion source grid, are exposed on the outside of the quartz barrel, severe ignition on the outside could burn out the DC power supply or even the entire machine's power supply system. Therefore, detecting whether the outside of the ion source quartz barrel is ionized is particularly important.

[0040] How to detect the ionization status of the radio frequency coil and respond promptly to the ionization outside the quartz barrel is an important issue in this field.

[0041] Based on this, embodiments of this application provide a ignition detection method and apparatus, and an ion beam etching device. A probe can be used to detect the voltage of an RF supply device to obtain a detection signal. The RF supply device provides an RF signal to the quartz barrel and may include an RF power source and an RF coil. The detection point for detecting the RF supply device is located between the RF power source and the RF coil. If the detection signal is a sine wave, it indicates that there is no ionization outside the quartz barrel connected to the RF supply device. If the detection signal has harmonics or distorted waves in addition to the sine wave, it indicates leakage current, thus confirming the presence of ionization outside the quartz barrel connected to the RF supply device. This allows for the detection of ionization by the RF supply device, enabling timely detection of ionization events outside the quartz barrel and timely responses to such external ionization, thereby allowing for more precise control of the etching process.

[0042] To better understand the technical solution and effects of the present invention, the specific embodiments will be described in detail below with reference to the accompanying drawings.

[0043] This application provides a ignition detection device, referring to... Figure 1 The diagram shown is a schematic representation of a ignition detection device according to an embodiment of this application. The ignition detection device is used to detect the voltage of an RF supply device to obtain a detection signal. The RF supply device is connected to a quartz barrel. The RF supply device may include an RF power supply (RF GENERATOR) 101 and an RF coil 104. The RF power supply 101 provides an RF signal, and the RF coil 104 generates a high-frequency alternating magnetic field when an RF signal is applied, thereby ionizing the gas in the quartz barrel connected to the RF supply device to form plasma. The RF frequency provided by the RF power supply 101 can be 2MHz, or it can be a commonly used RF frequency in semiconductor processing, such as 13.56MHz or 60MHz.

[0044] In this embodiment, the radio frequency (RF) providing device may further include an RF match 102 connected between the RF power supply 101 and the RF coil 104. The RF match 102 includes a matching inductor 1021 and a first adjustable capacitor 1022 connected in series. Specifically, one end of the matching inductor 1021 is connected to the RF power supply 101, and the other end is connected to the first adjustable capacitor 1022. One end of the first adjustable capacitor is connected to the matching inductor 1021, and the other end serves as the output terminal of the RF match 102, used to connect to the RF coil 104. Alternatively, one end of the first adjustable capacitor is connected to the RF power supply 101, and the other end is connected to the matching inductor 1021. One end of the matching inductor 1021 is connected to the first adjustable capacitor 1022, and the other end serves as the output terminal of the RF match 102, used to connect to the RF coil 104.

[0045] In this embodiment, the RF matching device 102 further includes a second adjustable capacitor 1023 connected to the RF power supply 101. One end of the second adjustable capacitor is connected to the RF power supply 101, and the other end is grounded. That is, the RF signal output by the RF power supply 101 can pass through a first path including the second adjustable capacitor 1023 and a second path including a matching inductor 1021 and a first adjustable capacitor 1022 connected in series. By adjusting the capacitance values ​​of the first adjustable capacitor 1022 and the second adjustable capacitor 1023, the power of the RF signal applied to the RF coil 104 can be adjusted.

[0046] The Qihui detection device includes a probe 401, which is used to acquire the voltage of the radio frequency (RF) supply device to obtain a detection signal. The detection point for detecting the RF supply device is located between the RF power supply 101 and the RF coil 104. When the RF coil 104 ionizes the gas outside the quartz barrel, the gas outside the quartz barrel also acts as a load in the RF signal path, thus affecting the voltage value of the detection point between the RF power supply 101 and the RF coil 104, causing the voltage value to be abnormal. In this way, by detecting the voltage value of the detection point, it is possible to determine whether there is ionization outside the quartz barrel based on the detection signal, which is conducive to timely response.

[0047] Generally speaking, if the vacuum recovery time is short after the chamber is broken and the chamber vacuum level does not meet the ignition requirements, ionization of the quartz barrel is likely to occur. Therefore, a chamber vacuum level of 1*10 is generally required. -4 Ignition requires a mass of mTorr. In this embodiment, the etching process can proceed normally when it is determined that there is no ionization outside the quartz barrel connected to the RF supply device; when it is determined that there is ionization outside the quartz barrel connected to the RF supply device, the etching process needs to be stopped to check whether the vacuum environment in the vacuum chamber meets the ion source ignition requirements.

[0048] Specifically, if the waveform of the detected signal is a sine wave, it confirms that there is no ionization outside the quartz barrel connected to the radio frequency supply device. Figure 2 The diagram shown is a schematic of a detection signal provided in an embodiment of this application. The horizontal axis represents time, and the vertical axis represents voltage value. The solid line represents the waveform of the detection signal, and the dashed line delineates the maximum and minimum values ​​of the detection signal. As can be seen from the diagram, if the waveform of the detection signal is a sine wave, then there is no ionization outside the quartz barrel. If the waveform of the detection signal has harmonics or distorted waves in addition to the sine wave, then it is determined that there is ionization outside the quartz barrel connected to the radio frequency providing device. (Refer to...) Figure 3 The figure shows another detection signal provided in the embodiment of this application. The horizontal axis represents time and the vertical axis represents voltage value, which represents the waveform of the detection signal. The dashed line delineates the maximum and minimum values ​​of the detection signal. It can be seen from the figure that the waveform of the detection signal contains harmonics, which means that there is ionization outside the quartz barrel.

[0049] In this embodiment, the ignition detection device may further include an oscilloscope 400, which can be used to display the waveform of the detection signal. This allows operators to determine whether ionization exists outside the quartz barrel by observing the oscilloscope 400. When operators determine through the oscilloscope 400 that ionization exists outside the quartz barrel, they can manually stop the etching process.

[0050] In this embodiment, the detection device may further include a host computer. The host computer can analyze the detection signal after acquiring it. If the waveform of the detection signal is a sine wave, it can determine that there is no ionization outside the quartz barrel connected to the RF supply device. If the waveform of the detection signal has harmonics or distorted waves in addition to the sine wave, it can determine that ionization exists outside the quartz barrel connected to the RF supply device. The host computer can also control the RF power supply 101 to stop providing RF signals when it determines that ionization exists outside the quartz barrel connected to the RF supply device, to protect the ion beam etching equipment and avoid problems caused by manual failure to stop the signal in time. The host computer can also issue an alarm when it determines that ionization exists outside the quartz barrel connected to the RF supply device.

[0051] In this embodiment, the probe can be connected to the detection point of the radio frequency providing device to obtain the voltage of the detection point as a detection signal, for reference. Figure 4 The diagram shown is a structural schematic of another ignition detection device provided in this application embodiment. Since the radio frequency signal voltage of the radio frequency supply device is very high, the withstand voltage of the probe 401 can be around 6000Vrms, that is, the probe 401 can be a high voltage probe to prevent damage to the probe 401, as well as to the oscilloscope 400 or the host computer connected to the probe 401.

[0052] In the circuit where a probe is used to detect radio frequency signals from a radio frequency providing device, a voltage divider resistor 402 can also be connected in series, for reference. Figure 5 The diagram shows another ionization detection device provided in this application. The voltage divider resistor 402 can be placed between the probe 401 and the detection point for detecting the radio frequency supply device. The presence of the voltage divider resistor 402 reduces the voltage value detected by the probe, but does not affect the trend of the voltage value detected by the probe 401. Therefore, it changes the voltage value of the detection signal but does not change the waveform of the detection signal, and does not affect the analysis of the ionization results. With the voltage divider resistor 402 present, the withstand voltage of the probe 401 can be relatively low, and the resistance value of the voltage divider resistor 402 can be approximately 100 MΩ.

[0053] In this embodiment of the application, the radio frequency (RF) providing device may further include an RF matching unit connected between the RF power supply and the RF coil. The detection point for detecting the RF providing device is located between the RF power supply and the RF coil. (Refer to...) Figure 1 , Figure 4 and Figure 5 Detection point B in the diagram; the RF supply device includes an RF matching unit connected between the RF power supply and the RF coil. The RF matching unit includes a matching inductor and an adjustable capacitor connected in series. The detection point for testing the RF supply device is located between the matching inductor and the adjustable capacitor. (Refer to...) Figure 1 Detection point A in the diagram. That is, the detection point can be located either in the series circuit of the RF matching unit or at the connection between the RF matching unit's output and the RF coil. This allows the probe to be connected either in the series circuit of the RF matching unit or at the connection between the RF matching unit's output and the RF coil, making probe setup more versatile and suitable for more scenarios. Typically, only one detection point is needed. Figure 1 The dashed line between the probe and detection point B indicates that when the probe is connected to detection point A, the probe does not need to be connected to detection point B.

[0054] This application provides a detection device that uses a probe to detect the voltage of an RF supply device to obtain a detection signal. The RF supply device provides an RF signal to the quartz barrel and may include an RF power source and an RF coil. The detection point for detecting the RF supply device is located between the RF power source and the RF coil. If the detection signal is a sine wave, it indicates that there is no ionization outside the quartz barrel connected to the RF supply device. If the detection signal has harmonics or distorted waves in addition to the sine wave, it indicates that there is leakage current, thus confirming that there is ionization outside the quartz barrel connected to the RF supply device. In this way, the ionization status of the RF supply device can be detected by detecting the signal, which can promptly detect ionization events outside the quartz barrel and take timely action against such external ionization. Therefore, the etching process can be controlled more precisely.

[0055] Based on the ignition detection device provided in the embodiments of this application, the embodiments of this application also provide an ignition detection method, which is applied to a host computer. Specifically, the method may include:

[0056] S101, the voltage of the radio frequency supply device is detected by the probe 401 to obtain the detection signal; the radio frequency supply device includes a radio frequency power supply 101 and a radio frequency coil 104, and the detection point for detecting the radio frequency supply device is located between the radio frequency power supply 101 and the radio frequency coil 104.

[0057] S102, if the waveform of the detected signal has harmonics or distorted waves in addition to the sine wave, it is determined that there is ionization outside the quartz barrel connected to the radio frequency providing device.

[0058] For details on the structure of the radio frequency providing device and the probe 401, please refer to the foregoing embodiments, which will not be repeated here.

[0059] In this embodiment of the application, the radio frequency (RF) providing device may further include an RF matching unit connected between the RF power supply and the RF coil, and the detection point for detecting the RF providing device is located between the RF power supply and the RF coil; the RF providing device includes an RF matching unit connected between the RF power supply and the RF coil, the RF matching unit includes a matching inductor and an adjustable capacitor connected in series, and the detection point for detecting the RF providing device is located between the matching inductor and the adjustable capacitor.

[0060] In this embodiment, the host computer can analyze the detection signal after acquiring it. If the waveform of the detection signal is a sine wave, it can determine that there is no ionization outside the quartz barrel connected to the RF supply device. If the waveform of the detection signal, in addition to a sine wave, also has harmonics or distorted waves, it can determine that ionization exists outside the quartz barrel connected to the RF supply device. The host computer can also control the RF power supply 101 to stop providing the RF signal when it determines that ionization exists outside the quartz barrel connected to the RF supply device, to protect the ion beam etching equipment and avoid problems caused by manual failure to stop the signal in time. The host computer can also issue an alarm when it determines that ionization exists outside the quartz barrel connected to the RF supply device.

[0061] Based on the ignition detection device provided in the embodiments of this application, the embodiments of this application also provide an ion beam etching device, see reference. Figure 6 The diagram shown is a structural schematic of an ion beam etching apparatus provided in an embodiment of this application. The ion beam etching apparatus includes an ion source, which includes:

[0062] Quartz barrel 106;

[0063] Gas source (GAS) 105 is used to supply process gas to the quartz barrel;

[0064] A radio frequency (RF) supply device is used to generate a high-frequency alternating magnetic field to ionize the process gas and form plasma.

[0065] The ignition detection device is used to detect the radio frequency providing device.

[0066] Specifically, the gas source 105 can supply gas to the quartz barrel 106 under the precise control of the gas flow meter. The radio frequency power supply 101 in the radio frequency supply device provides radio frequency signals to the radio frequency coil 104 through the radio frequency matching device (RF MATCH) 102. When the radio frequency coil 104 is subjected to the radio frequency signal, the high-frequency electromagnetic field is coupled into the quartz barrel 106 through inductive coupling, so that the process gas in the quartz barrel 106 is ionized to form plasma. The process gas can be an inert gas, such as argon.

[0067] The ion source can be placed in the vacuum chamber 100, which may also include a neutralizer (NEUT.) 111, a grid 107 / 108 / 109, and a slide stage 115.

[0068] The grid may include a screen grid 107, an accelerating grid 108, and a protective grid 109 arranged sequentially. The screen grid 107 has a beam emission potential for filtering the ion beam, allowing higher-energy ions to pass through; the beam emission potential is positive. The accelerating grid 108 has an accelerating potential for accelerating the ion beam; the accelerating potential is negative. The protective grid 109 protects the accelerating grid 108 and may be grounded. The screen grid 107 and the accelerating grid 108 are connected to a potential control device 110, which provides the beam emission potential to the screen grid 107 and the accelerating potential to the accelerating grid 108.

[0069] The wafer 114 can be placed on the stage 115, which can rotate and revolve. The angle of the wafer 114 can be changed arbitrarily by adjusting the stage 115. The neutralizer 111 can be connected to a neutralizing electron output device (NEUT.COUT.) 112.

[0070] The ion beam ionized in the quartz barrel 106, after being accelerated by the grids 107 / 108 / 109, possesses a certain direction and uniform energy. The accelerated ion beam is reduced to high-energy atoms by electrons emitted from the neutralizer 111. These high-energy atoms directly attack the surface of the wafer 114, achieving an etching effect. The protective grid 109 prevents electrons emitted from the neutralizer 111 from directly hitting the accelerating grid 108, affecting its potential and thus the acceleration effect of the ion beam. The wafer stage 115 allows for arbitrary changes in the angle of the wafer 114, enabling adjustable incident angles of high-energy particles relative to the wafer 114. The wafer stage 115 can be made of a conductive material, allowing it to also function as an electrode for better wafer fixation.

[0071] The various embodiments in this specification are described in a progressive manner. The same or similar parts between the various embodiments can be referred to each other. Each embodiment focuses on describing the differences from other embodiments.

[0072] The above description is merely a preferred embodiment of the present invention. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make many possible variations and modifications to the technical solutions of the present invention using the methods and techniques disclosed above, or modify them into equivalent embodiments with equivalent changes, without departing from the scope of the technical solutions of the present invention. Therefore, any simple modifications, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solutions of the present invention shall still fall within the protection scope of the technical solutions of the present invention.

Claims

1. A ignition detection device, characterized in that, include: A probe is used to detect the voltage of the radio frequency (RF) supply device to obtain a detection signal, so as to determine that there is ionization outside the quartz barrel connected to the RF supply device when the waveform of the detection signal has harmonics or distorted waves in addition to a sine wave; the RF supply device includes an RF power supply and an RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil.

2. The apparatus according to claim 1, characterized in that, The radio frequency (RF) supply device further includes an RF matching unit connected between the RF power supply and the RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil.

3. The apparatus according to claim 2, characterized in that, The radio frequency matching unit includes a matching inductor and an adjustable capacitor connected in series, and the detection point for detecting the radio frequency providing device is located between the matching inductor and the adjustable capacitor.

4. The apparatus according to any one of claims 1-3, characterized in that, The device further includes: The host computer is used to determine that there is ionization outside the quartz barrel connected to the radio frequency providing device when the waveform of the detected signal has harmonics or distorted waves in addition to a sine wave, and to control the radio frequency power supply to stop providing radio frequency signals.

5. The apparatus according to any one of claims 1-3, characterized in that, The device further includes: An oscilloscope is used to display the waveform of the detected signal.

6. The apparatus according to any one of claims 1-3, characterized in that, A voltage divider resistor is provided between the probe and the detection point that detects the radio frequency providing device.

7. A method for detecting ignition, characterized in that, include: A detection signal is obtained by detecting the voltage of the radio frequency (RF) supply device using a probe; the RF supply device includes an RF power supply and an RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil; If the waveform of the detected signal has harmonics or distorted waves in addition to a sine wave, it is determined that there is ionization outside the quartz barrel connected to the radio frequency providing device.

8. The method according to claim 7, characterized in that, The radio frequency (RF) supply device further includes an RF matching unit connected between the RF power supply and the RF coil, and the detection point for detecting the RF supply device is located between the RF power supply and the RF coil.

9. The method according to claim 8, characterized in that, The radio frequency matching unit includes a matching inductor and an adjustable capacitor connected in series, and the detection point for detecting the radio frequency providing device is located between the matching inductor and the adjustable capacitor.

10. The method according to any one of claims 7-9, characterized in that, The method further includes: When it is determined that there is ionization outside the quartz barrel connected to the radio frequency supply device, the radio frequency power supply is controlled to stop supplying radio frequency signals.

11. An ion beam etching apparatus, characterized in that, Includes an ion source, said ion source comprising: Quartz barrel; A gas source for supplying process gas to the quartz barrel; A radio frequency (RF) supply device is used to generate a high-frequency alternating magnetic field to ionize the process gas and form plasma. The ignition detection device according to any one of claims 1-6 is used to detect the radio frequency providing device.

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