A wear-resistant ball polishing device

Abstract

The application discloses a wear-resistant ball polishing device, which comprises a machine body, a polishing assembly, a carrier plate, a first driving assembly and a second driving assembly. The machine body is internally provided with a containing cavity for containing polishing liquid. The carrier plate and the polishing assembly are movably arranged in the containing cavity. The polishing assembly is provided with a grinding disc. The carrier plate is provided with a plurality of recesses for storing wear-resistant balls. The bottom of each recess is provided with an opening. The wear-resistant ball polishing device is driven by the first driving assembly to move up and down on the polishing liquid. When the carrier plate moves down into the polishing liquid, the polishing liquid contacts the wear-resistant balls through the opening at the bottom of the recess, so that the wear-resistant balls are randomly turned over to adjust the polishing position of the wear-resistant balls in the next time, so that the wear-resistant balls are more evenly polished. Meanwhile, the polishing liquid entering the recess through the opening at the bottom of the recess can flush burrs and impurities in the recess, so that the wear-resistant ball surface can be further prevented from being scratched by the burrs and impurities.

Description

Technical Field

[0001] This invention relates to the field of wear-resistant ball polishing devices, and more particularly to a wear-resistant ball polishing device. Background Technology

[0002] After the wear-resistant balls are processed, they need to be ground and polished to give them a better appearance and performance. The polishing equipment has a polishing component and a carrier plate. During the polishing process, the carrier plate is placed in the polishing liquid, the polishing component is moved to contact the wear-resistant balls on the carrier plate, and then the carrier plate is rotated so that the wear-resistant balls are ground and polished by the grinding disc on the polishing component.

[0003] In existing polishing equipment, the grinding disc on the polishing assembly is always in contact with the wear-resistant balls, and the rotation direction of the carrier plate is fixed. Because the rotation direction of the carrier plate is fixed, when the carrier plate rotates, the rotation direction of the wear-resistant balls in the groove of the carrier plate is uniform. In a short period of time, the grinding position of the wear-resistant balls is concentrated, and it is not possible to grind multiple positions of the wear-resistant balls evenly. This results in uneven grinding of the product. At the same time, burrs and other solid metal impurities that are ground off will accumulate in the groove and come into contact with the wear-resistant balls, damaging the surface quality of the wear-resistant balls. This needs to be improved. Summary of the Invention

[0004] To address the technical problems existing in the background art, the present invention proposes a wear-resistant ball polishing device.

[0005] This invention proposes a polishing device for wear-resistant balls, comprising a body, a polishing component, a carrier plate, a first driving component, and a second driving component. The body has a receiving chamber for holding polishing liquid. The carrier plate and the polishing component are both movably installed in the receiving chamber, with the polishing component located above the carrier plate. The polishing component has a grinding disc arranged parallel to the carrier plate. The carrier plate has multiple grooves for storing wear-resistant balls, with openings at the bottom of the grooves. The first driving component can drive the carrier plate to move longitudinally back and forth to switch between moving up and down on the surface of the polishing liquid. When the carrier plate moves upward, it detaches from the polishing liquid, causing the wear-resistant balls in the grooves to come into contact with the grinding disc. The second driving component can drive the polishing component to rotate so that the grinding disc polishes the wear-resistant balls in contact with it.

[0006] Preferably, the grinding assembly specifically includes a mounting frame, a grinding disc, and multiple elastic elements. The mounting frame has a downward-facing mounting groove, and the grinding disc is slidably mounted in the mounting groove. The multiple elastic elements are installed between the grinding disc and the top wall of the mounting groove to elastically impede the longitudinal reciprocating movement of the grinding disc. When the carrier plate rises to the highest position, the multiple elastic elements are in the maximum compression state.

[0007] Preferably, the inner wall of the mounting groove also has a blocking part to restrict the downward movement of the polishing disc.

[0008] Preferably, the inner wall of the groove is irregularly shaped.

[0009] Preferably, the inner wall of the groove is provided with a plurality of grooves extending to its upper and lower end faces.

[0010] Preferably, the first drive assembly specifically includes a first motor, two sprockets, a chain, and a movable joint. The two sprockets are both longitudinally arranged in grooves on the inner wall of the receiving cavity. The chain drive is connected to the two sprockets. The movable joint is hinged to the outer wall of the chain. The first motor is installed outside the machine body. The output shaft of the first motor extends into the receiving cavity and is fixedly connected to one of the sprockets.

[0011] Preferably, the carrier plate has a transversely arranged guide groove on the end face near the first drive assembly, and the movable joint has a slider. The slider is slidably installed in the guide groove. When the movable joint moves along the movement trajectory of the chain, the slider can move laterally and repeatedly in the guide groove. When the movable joint rises to the highest point, the carrier plate is at the highest position.

[0012] Preferably, it includes at least two first drive components, which are evenly arranged on the inner wall of the receiving cavity.

[0013] Preferably, the second drive component is a second motor, which is mounted on the top of the machine body and its output shaft extends into the receiving cavity and is mounted on the polishing component.

[0014] Preferably, multiple storage slots are evenly provided on the bottom wall of the receiving chamber, and an electromagnetic component is fixedly provided at the bottom of the machine body. The electromagnetic component is used to attract metal particles in the polishing liquid and make them enter the storage slots for storage.

[0015] In the wear-resistant ball polishing device proposed in this invention, the polishing component is fixed above the carrier plate and driven to rotate by the second drive component. The carrier plate is driven to move up and down repeatedly by the first drive component and continuously switch between moving up and down on the surface of the polishing liquid. When the wear-resistant ball on the carrier plate is polished by the grinding disc on the polishing component, the carrier plate moves down into the polishing liquid. The polishing liquid contacts the wear-resistant ball through the opening at the bottom of the groove, giving the wear-resistant ball an upward external force, causing the wear-resistant ball to randomly flip over to adjust the polishing position of the wear-resistant ball for the next polishing. This allows the wear-resistant ball to be polished from multiple angles in a short time, making the polishing more uniform. At the same time, the polishing liquid entering the groove through the opening at the bottom of the groove washes away burrs and other impurities in the groove and carries them into the polishing liquid, which can further prevent burrs and other impurities from scratching the surface of the wear-resistant ball. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of a wear-resistant ball polishing device proposed in this invention;

[0017] Figure 2 This is a partial structural schematic diagram of a wear-resistant ball polishing device proposed in this invention;

[0018] Figure 3 This is a schematic diagram of the groove structure in a wear-resistant ball polishing device proposed in this invention;

[0019] Figure 4 This is a diagram showing the fit between the first driving component and the carrier plate in a wear-resistant ball polishing device proposed in this invention. Detailed Implementation

[0020] like Figure 1 As shown, Figure 1 This is a schematic diagram of one embodiment of the wear-resistant ball polishing device proposed in this invention.

[0021] Reference Figure 1 The present invention proposes a polishing device for wear-resistant balls, comprising a body 1, a polishing component 2, a carrier plate 3, a first driving component 4, and a second driving component 5. The body 1 has a receiving chamber 11 for holding polishing liquid. The carrier plate 3 and the polishing component 2 are both movably installed in the receiving chamber 11, and the polishing component 2 is located above the carrier plate 3. The polishing component 2 has a grinding disc 21, which is arranged parallel to the carrier plate 3. The carrier plate 3 has multiple grooves 31 for storing wear-resistant balls, and the bottom of the grooves 31 has an opening. The first driving component 4 can drive the carrier plate 3 to move longitudinally back and forth to switch it up and down on the surface of the polishing liquid. When the carrier plate 3 moves upward, the carrier plate 3 is separated from the polishing liquid and the wear-resistant balls in the grooves 31 come into contact with the grinding disc 21. The second driving component 5 can drive the polishing component 2 to rotate so that the grinding disc 21 polishes the wear-resistant balls in contact with it.

[0022] In use, multiple wear-resistant balls are placed in multiple grooves 31. The polishing component 2 is rotated by the second drive component 5, and the carrier plate 3 is moved up and down repeatedly by the first drive component 4, continuously switching between the surface of the polishing liquid. When the carrier plate 3 moves upward, the wear-resistant balls are polished by the polishing disc 21 on the polishing component 2. Then, the carrier plate 3 moves downward into the polishing liquid. The polishing liquid contacts the wear-resistant balls through the opening at the bottom of the groove 31, giving the wear-resistant balls an upward external force, causing the wear-resistant balls to randomly flip within the groove 31 to adjust the polishing position of the wear-resistant balls for the next polishing. This allows the wear-resistant balls to be polished from multiple angles in a short time, making the polishing more uniform. At the same time, the polishing liquid entering the groove 31 through the opening at the bottom of the groove 31 washes away burrs and other impurities in the groove 31 and carries them into the polishing liquid, which can further prevent burrs and other impurities from scratching the surface of the wear-resistant balls.

[0023] Since the carrier plate 3 is constantly moving in the longitudinal direction, the contact time between the polishing disc 21 and the wear-resistant balls on the carrier plate 3 is too short, which affects the polishing speed. To solve this problem, the following embodiment is proposed.

[0024] Reference Figure 1 and Figure 2In a further embodiment, the polishing assembly 2 specifically includes a mounting frame 22, a polishing disc 21, and a plurality of elastic elements 23. The mounting frame 22 has a downward-facing mounting groove 221. The polishing disc 21 is slidably mounted in the mounting groove 221. The plurality of elastic elements 23 are all installed between the polishing disc 21 and the top wall of the mounting groove 221 to elastically impede the longitudinal reciprocating movement of the polishing disc 21. When the carrier plate 3 rises to the highest position, the plurality of elastic elements 23 are in the maximum compression state. The inner wall of the mounting groove 221 also has a blocking part 222 to limit the downward movement of the polishing disc 21.

[0025] In this embodiment, the grinding disc 21 is installed on the mounting groove 221, so that the grinding disc 21 can move longitudinally. During the upward movement of the carrier plate 3, the grinding disc 21 can be pushed upward and the elastic element 23 can be compressed. The compression time of the elastic element 23 is the grinding time of the wear-resistant ball. This setting can further increase the contact time between the wear-resistant ball and the grinding disc 21, thereby improving the polishing speed of the wear-resistant ball.

[0026] Reference Figure 3 In a further embodiment, the inner wall of the groove 31 is irregularly arranged, and a plurality of grooves 311 extending to its upper and lower end faces are formed on the inner wall of the groove 21.

[0027] In this embodiment, the groove is set to an irregular shape. When the carrier plate 3 enters the polishing liquid, it can further ensure the mobility of the wear-resistant ball in the groove and the ability of the wear-resistant ball to randomly rotate, so that the device can polish the wear-resistant ball more evenly. At the same time, grooves 311 are opened on the inner wall of the groove 31. When the carrier plate 3 enters the polishing liquid, the polishing liquid enters the groove 31 from the opening at the bottom of the groove 31. The polishing liquid flows upward relative to the groove 31, and performs the first flushing of metal impurities in the groove 31. When the carrier plate 3 leaves the polishing liquid, part of the polishing liquid leaves the groove 31 from the opening at the bottom of the groove 31, and the remaining part is discharged from the groove 311. At the same time, the groove 311 can carry away metal impurities. During this process, the polishing liquid flows downward relative to the groove 31, and performs the second flushing of metal impurities in the groove 31. This can greatly reduce the residual metal impurities in the groove 31, so as to ensure the surface quality of the wear-resistant ball.

[0028] Reference Figure 4Preferably, the first drive assembly 4 specifically includes a first motor, two sprockets 41, a chain 42, and a movable joint 43. The two sprockets 41 are both longitudinally arranged in the grooves 111 on the inner wall of the receiving chamber 11. The chain 42 is driven and connected to the two sprockets 41. The movable joint 43 is hinged to the outer wall of the chain 42. The first motor is installed outside the body 1. The output shaft of the first motor extends into the receiving chamber 11 and is fixedly connected to one of the sprockets 41. The end face of the carrier plate 3 near the first drive assembly 4 has a transversely arranged guide groove 32. The movable joint 43 has a slider, which is slidably installed in the guide groove 32. When the movable joint 43 moves along the movement trajectory of the chain 42, the slider can move laterally and repeatedly in the guide groove 32. When the movable joint 43 rises to the highest point, the carrier plate 3 is in the highest position.

[0029] In the specific operation of this preferred scheme, the sprocket 41 drives the chain 42 to rotate, causing the movable joint 43 to move back and forth along the sprocket. When the movable joint 43 moves from one side of the sprocket 42 to the other side, the movable joint 43 can make timely lateral movements in the guide groove 32 to ensure the smooth up and down movement of the carrier plate 3. When the movable joint 43 moves upward with the carrier plate 3 to contact the grinding disc 21, the continued upward movement will cause the grinding disc 21 to compress the elastic element 23 and enter the grinding time of the wear-resistant ball. In addition, since there is a horizontal movement process during the contact between the movable joint 43 and the grinding disc 21, the pressure of the wear-resistant ball contacting the grinding disc 21 is large and the time is long, which can further improve the grinding effect of the device on the wear-resistant ball, and at the same time, it can also further improve the grinding efficiency of the wear-resistant ball.

[0030] Reference Figure 1 In the specific structural design, at least two first drive components 4 are included, and they are evenly arranged on the inner wall of the accommodating chamber 11. Multiple first drive components 4 work synchronously, which can make the load on the carrier plate 3 more uniform and further improve the stability of the device operation.

[0031] In the specific structural design, the second drive component 5 is the second motor. The second motor is installed on the top of the machine body, and its output shaft extends into the receiving chamber 11 and is installed on the polishing component 2. The machine body 1 has at least one feeding or unloading window. The interior of the machine body 1 also has a drain nozzle and a cleaning port that connect the inside and outside of the receiving chamber 11.

[0032] After prolonged use, the polishing fluid in the containment chamber 11 will mix with a large amount of metallic impurities, which will affect the rinsing effect of the polishing fluid. To solve this problem, the following solution is proposed.

[0033] To reduce the amount of metal particles mixed in the polishing fluid, multiple collection slots are evenly provided on the bottom wall of the receiving chamber 11. An electromagnetic component 6 is fixedly provided at the bottom of the machine body 1. The electromagnetic component 6 is used to attract metal particles in the polishing fluid and make them enter the collection slots for storage.

[0034] Since the wear-resistant ball is made of an iron-containing alloy, it is magnetic and can be attracted by the electromagnetic component 6. The electromagnetic component 6 is an electromagnet. When in use, the electromagnet is turned on to attract the metal impurities in the polishing liquid downwards and collect them in the collection tank on the bottom wall of the receiving chamber 11, preventing metal particles from mixing in the polishing liquid and affecting the clearing effect of the polishing liquid. When it is necessary to clean the metal particles in the collection tank, the electromagnet is turned off.

[0035] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A wear-resistant ball polishing device, characterized in that, The assembly includes a body (1), a polishing component (2), a carrier plate (3), a first drive component (4), and a second drive component (5). The body (1) has a receiving chamber (11) for holding polishing liquid. The carrier plate (3) and the polishing component (2) are both movably installed in the receiving chamber (11), and the polishing component (2) is located above the carrier plate (3). The polishing component (2) has a grinding disc (21) on it. The grinding disc (21) is arranged parallel to the carrier plate (3). The carrier plate (3) has multiple grooves (31) for storing wear-resistant balls. The bottom of the grooves (31) has an opening. The first drive component (4) can drive the carrier plate (3) to move longitudinally back and forth so that it switches up and down on the surface of the polishing liquid. When the carrier plate (3) moves upward, the carrier plate (3) is separated from the polishing liquid and the wear-resistant balls in the grooves (31) come into contact with the grinding disc (21). The second drive component (5) can drive the polishing component (2) to rotate so that the grinding disc (21) polishes the wear-resistant balls that are in contact with it. The inner wall of the groove (31) is irregularly arranged; multiple grooves (311) extending to its upper and lower end faces are provided on the inner wall of the groove (21). Multiple storage slots are evenly provided on the bottom wall of the receiving chamber (11). An electromagnetic component (6) is fixedly provided at the bottom of the body (1). The electromagnetic component (6) is used to attract metal particles in the polishing liquid and store them in the storage slot. The grinding assembly (2) specifically includes a mounting frame (22), a grinding disc (21), and multiple elastic elements (23). The mounting frame (22) has a downward-facing mounting groove (221). The grinding disc (21) is slidably installed in the mounting groove (221). Multiple elastic elements (23) are installed between the grinding disc (21) and the top wall of the mounting groove (221) to elastically resist the reciprocating movement of the grinding disc (21) in the longitudinal direction. When the carrier plate (3) rises to the highest position, the multiple elastic elements (23) are in the maximum compression state.

2. The wear-resistant ball polishing device according to claim 1, characterized in that, The inner wall of the mounting groove (221) also has a blocking part (222) to restrict the downward movement of the polishing disc (21).

3. The wear-resistant ball polishing device according to claim 1, characterized in that, The first drive assembly (4) specifically includes a first motor, two sprockets (41), a chain (42), and a movable joint (43). The two sprockets (41) are arranged longitudinally in the groove (111) on the inner wall of the receiving chamber (11). The chain (42) is driven and connected to the two sprockets (41). The movable joint (43) is hinged and installed on the outer wall of the chain (42). The first motor is installed outside the machine body (1). The output shaft of the first motor extends into the receiving chamber (11) and is fixedly connected to one of the sprockets (41).

4. The wear-resistant ball polishing device according to claim 3, characterized in that, The carrier plate (3) has a transversely arranged guide groove (32) on the end face near the first drive assembly (4). The movable joint (43) has a slider, which is slidably installed in the guide groove (32). When the movable joint (43) moves along the movement trajectory of the chain (42), the slider can move laterally and repeatedly in the guide groove (32). When the movable joint (43) rises to the highest point, the carrier plate (3) is in the highest position.

5. The wear-resistant ball polishing device according to claim 4, characterized in that, It includes at least two first drive components (4), which are evenly arranged on the inner wall of the receiving chamber (11).

6. The wear-resistant ball polishing device according to claim 1, characterized in that, The second drive assembly (5) is a second motor, which is mounted on the top of the machine body and its output shaft extends into the receiving chamber (11) and is mounted on the polishing assembly (2).

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