Mask manufacturing method and mask
By using dual laser heads to simultaneously cut the mask, the problem of burrs generated by laser cutting was solved, the quality of the mask and the yield of OLED evaporation were improved, and the risk of substrate scratches was reduced.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENZHEN KEBAOYUAN TECH CO LTD
- Filing Date
- 2022-03-15
- Publication Date
- 2026-07-03
AI Technical Summary
In existing technologies, defects such as burrs are generated during laser cutting of the mask, which can scratch the OLED substrate and affect the evaporation yield.
A dual-laser head is used to simultaneously cut both sides of the stainless steel sheet to form a mask through-hole pattern, avoiding burr defects caused by single-sided cutting.
It improves the manufacturing quality of the photomask and the yield of OLED evaporation, reduces the risk of substrate scratches, and improves the overall yield of the evaporation process.
Smart Images

Figure CN116590655B_ABST