Self-cleaning heat-insulating decorative board and preparation method thereof

Abstract

The present application relates to the technical field of decorative panels, and specifically discloses a self-cleaning thermal insulation decorative panel and a preparation method thereof. The self-cleaning thermal insulation decorative panel of the present application comprises a reinforcing layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence; wherein the reinforcing layer is a calcium silicate layer; the thermal insulation layer is a rock wool thermal insulation layer; the self-cleaning layer comprises the following raw materials: epoxy resin, polysiloxane-modified silica, ionic liquid, wear-resistant agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid; and the preparation method of the self-cleaning thermal insulation decorative panel of the present application is to first use an adhesive to sequentially stack and bond the reinforcing layer, the thermal insulation layer, and the metal layer, and then apply the self-cleaning coating on the surface of the metal layer, solidify to form a self-cleaning layer, and obtain a self-cleaning thermal insulation decorative panel; the obtained decorative panel has significant self-cleaning performance and excellent wear resistance, and has broad market prospects.

Description

Technical Field

[0001] The present application relates to the technical field of decorative panels, and more specifically, to a self-cleaning thermal insulation decorative panel and a preparation method thereof. Background Art

[0002] In today's society, production activities, automobile and industrial emissions, and the presence of large amounts of dust, smoke, and haze in the environment are severely eroding the surfaces of buildings and various equipment, affecting their aesthetics. However, cleaning these contaminated objects not only requires significant manpower, material, and financial resources, but also uses large amounts of detergents and water, which is detrimental to ecological conservation. Therefore, self-cleaning decorative panels have attracted widespread attention in fields such as construction and new energy. They can significantly reduce the labor and material resources required to clean walls or substrates, and are extremely important for energy conservation, environmental protection, and sustainable development.

[0003] Self-cleaning decorative panels are primarily made by coating the surface of the decorative panels with a self-cleaning coating. Inorganic fillers, such as nanoparticles of titanium dioxide, silicon dioxide, and zinc oxide, are often added to the coating, creating a micro-nanoscale rough structure on the coating surface. When spherical water droplets come into contact with pollutants, the coating surface adsorbs the pollutants, entraining them and rolling them off the surface to achieve the cleaning effect. However, inorganic nanoparticles often have a large specific surface area and high surface energy, making them prone to agglomeration. Furthermore, inorganic nanoparticles have poor compatibility with resins, and phase separation easily occurs after mixing, leading to a decrease in the coating's performance. Currently, inorganic fillers are often surface-functionalized to improve dispersibility and compatibility, but this can reduce the coating's self-cleaning performance. Therefore, there is an urgent need to address the poor self-cleaning performance of existing self-cleaning decorative panels in order to expand their application areas. Summary of the Invention

[0004] In order to solve the problem of poor self-cleaning function of existing decorative panels, the present application provides a self-cleaning thermal insulation decorative panel and a preparation method thereof.

[0005] In the first aspect, the present application provides a self-cleaning thermal insulation decorative panel, which adopts the following technical solution:

[0006] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0007] The self-cleaning layer comprises the following raw materials in parts by weight: 60-100 parts of epoxy resin, 8-15 parts of polysiloxane-modified silica, 6-10 parts of ionic liquid, 1-2 parts of wear-resistant agent, 20-40 parts of curing agent, 0.3-0.5 parts of dispersant, 0.05-0.1 parts of defoaming agent, 0.4-0.7 parts of leveling agent, and 0.5-1.2 parts of film-forming aid.

[0008] Preferably, the self-cleaning layer comprises the following raw materials in parts by weight: 70-90 parts of epoxy resin, 10-13 parts of polysiloxane-modified silica, 7-9 parts of ionic liquid, 1.3-1.7 parts of wear-resistant agent, 25-35 parts of curing agent, 0.35-0.45 parts of dispersant, 0.06-0.08 parts of defoaming agent, 0.5-0.6 parts of leveling agent, and 0.6-1.0 parts of film-forming aid.

[0009] Furthermore, preferably, the self-cleaning layer comprises the following raw materials in parts by weight: 80 parts of epoxy resin, 14 parts of polysiloxane-modified silica, 8 parts of ionic liquid, 1.5 parts of wear-resistant agent, 30 parts of curing agent, 0.4 part of dispersant, 0.07 part of defoaming agent, 0.55 part of leveling agent, and 0.8 part of film-forming aid.

[0010] By adopting the above-mentioned technical scheme, the self-cleaning thermal insulation decorative panel of the present application is composed of a reinforcing layer, a thermal insulation layer, a metal layer, and a self-cleaning layer, and the raw materials of the self-cleaning layer include epoxy resin, polysiloxane-modified silica, ionic liquid, wear-resistant agent, curing agent, dispersant, defoaming agent, leveling agent, film-forming aid, etc., and the weight of each component is controlled within a certain range to promote interaction between the components to form a coating surface with a micro-nano rough structure, so that the decorative panel has a significant self-cleaning function, and the wear resistance of the decorative panel is also significantly improved; in addition, the self-cleaning layer can protect the metal surface and improve the durability of the metal layer.

[0011] Preferably, the polysiloxane-modified silica comprises the following raw materials in parts by weight: 4-7 parts of nano-silica, 8-10 parts of mercaptosilane coupling agent, 17-22 parts of vinyl-terminated polysiloxane, 1-3 parts of photoinitiator, and 20-40 parts of N,N-dimethylamide.

[0012] Preferably, the polysiloxane-modified silica is prepared by the following method:

[0013] First, nano-silica is ultrasonically dispersed in an ethanol aqueous solution with a mass fraction of 10-30wt%, and then a mercaptosilane coupling agent is added. The mixture is stirred for reaction for 1-2 hours, filtered, and dried to obtain modified silica. The modified silica is then dissolved in N,N-dimethylamide, and vinyl-terminated polysiloxane and a photoinitiator are added to react under ultraviolet light. Finally, the solvent is removed by rotary evaporation, and the mixture is vacuum dried to obtain polysiloxane-modified silica.

[0014] By adopting the above technical solution, the present application first hydrolyzes the mercaptosilane coupling agent to generate silanol groups coated on the surface of the nano-silica to form modified silica. Subsequently, the mercapto groups on the surface of the modified silica undergo a mercaptoene click reaction with the vinyl groups of the vinyl-terminated polysiloxane, so that the polysiloxane is grafted to the surface of the nano-silica in the form of a chemical bond, effectively reducing the surface energy of the nano-silica. The resulting polysiloxane-modified silica can construct a micro-nano layered rough structure similar to the surface structure of a lotus leaf, so that the decorative board has excellent self-cleaning performance.

[0015] Preferably, the mass fraction of the ethanol aqueous solution is 30-40 wt%.

[0016] Preferably, the mass ratio of the nano-silica to the ethanol aqueous solution is 1:3-5.

[0017] Preferably, the viscosity of the vinyl-terminated polysiloxane is 100-1000 Pa.S, and the vinyl content is 0.1-1.5 wt%.

[0018] Preferably, the photoinitiator is one of 2-hydroxy-2-methyl-1-phenyl-1-propyl ketone, benzoin dimethyl ether, and benzophenone.

[0019] Preferably, the mercaptosilane coupling agent is 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and / or γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane.

[0020] Preferably, the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 2-8:5.

[0021] By adopting the above technical solution, the thiol coupling agent of the present application is 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and / or γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane. Both have large steric hindrance and low surface energy group structures, which can not only reduce the surface energy of nano-silica, but also provide thiol groups, which react with the vinyl-terminated polysiloxane to form a hydrophobic microstructure. In addition, a mixture of 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane is used as the mercaptosilane coupling agent, and the mixing ratio of the two is controlled within a certain range. The interaction between the two can enrich the hydrophobic microstructure, which is conducive to further improving the self-cleaning performance of the coating.

[0022] Preferably, the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:1-4.

[0023] By adopting the above technical solution, 1-hydroxyethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide and N-butylpyridinium hexafluorophosphate are both excellent hydrophobic ionic liquids. When mixed in a certain proportion, the two can synergistically enhance their effectiveness. During the coating curing process, they can migrate from the interior of the coating to the surface, thereby forming a certain rough structure and reducing the surface tension of the coating. As a result, the coating exhibits good hydrophobic self-cleaning properties, as well as stain and scrub resistance. At the same time, the ionic liquid and polysiloxane-modified silica can synergize, further enhancing the self-cleaning properties of the coating. In addition, the ionic liquid can significantly improve adhesion to the metal layer, which is beneficial for enhancing the corrosion resistance of the metal layer.

[0024] Preferably, the anti-wear agent is nano zinc oxide and / or nano chromium oxide.

[0025] Preferably, the dispersant is at least one of stearic acid, sodium dodecylbenzenesulfonate, and sodium carboxymethyl cellulose.

[0026] Preferably, the defoaming agent is at least one of BYK-035, BYK-037, and BYK-065.

[0027] Preferably, the leveling agent is at least one of BYK-300, BYK-306, and BYK-333.

[0028] Preferably, the film-forming aid is propylene glycol ethyl ether and / or propylene glycol butyl ether.

[0029] Preferably, the reinforcement layer is a calcium silicate layer.

[0030] Preferably, the insulation layer is a rock wool insulation layer.

[0031] In a second aspect, the present application provides a method for preparing a self-cleaning thermal insulation decorative panel, which adopts the following technical solution:

[0032] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0033] S1. Evenly mix epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid according to weight to obtain a self-cleaning coating;

[0034] S2. First, a bonding reinforcement layer, a thermal insulation layer, and a metal layer are stacked in sequence using an adhesive, and then a self-cleaning coating is applied to the surface of the metal layer and cured to form a self-cleaning layer, thereby obtaining a self-cleaning thermal insulation decorative board.

[0035] By adopting the above technical solution, the preparation method of the self-cleaning thermal insulation decorative board of the present application is simple, the preparation cost is low, it is suitable for industrial production, and the self-cleaning performance of the obtained decorative board is significantly improved.

[0036] In summary, this application has the following beneficial effects:

[0037] 1. The self-cleaning thermal insulation decorative panel of the present application comprises a reinforcing layer, a thermal insulation layer, a metal layer and a self-cleaning layer. The resulting decorative panel has excellent self-cleaning function, and its anti-corrosion and wear resistance are also greatly enhanced.

[0038] 2. The self-cleaning layer of the present application includes epoxy resin, polysiloxane-modified silica, ionic liquid, wear-resistant agent, curing agent, dispersant, defoaming agent, leveling agent, film-forming aid, etc., and the polysiloxane-modified silica and ionic liquid work together to significantly improve the self-cleaning function of the coating. DETAILED DESCRIPTION

[0039] The present application is further described in detail below with reference to the embodiments.

[0040] Preparation Examples 1-12 provide polysiloxane-modified silica and preparation methods thereof.

[0041] Preparation Example 1

[0042] Polysiloxane-modified silica, including the following raw materials: 4 kg of nano-silica, 8 kg of mercaptosilane coupling agent, 17 kg of vinyl-terminated methyl polysiloxane, 1 kg of photoinitiator, 20 kg of N,N-dimethylamide, and 30 kg of ethanol aqueous solution;

[0043] The viscosity of the vinyl-terminated methyl polysiloxane is 100 Pa.s and the vinyl content is 0.1 wt %; the mercaptosilane coupling agent is 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane); the photoinitiator is 2-hydroxy-2-methyl-1-phenyl-1-propyl ketone; and the polysiloxane-modified silica is prepared by the following method:

[0044] First, nano-silica is dispersed in a 10wt% ethanol aqueous solution at an ultrasonic frequency of 30kHz and an ultrasonic power of 450W. After ultrasonic dispersion for 30 minutes, a mercaptosilane coupling agent is added, and the mixture is stirred at a speed of 600r / min for 1 hour, filtered, and dried to obtain modified silica; then, the modified silica is dissolved in N,N-dimethylamide, and terminal vinylmethyl polysiloxane and a photoinitiator are added. The mixture is reacted for 30 minutes under ultraviolet light with a power of 10W and a wavelength of 300nm; finally, the solvent is removed by vacuum rotary evaporation, and the mixture is vacuum dried at 30°C for 10 hours to obtain polysiloxane-modified silica.

[0045] Preparation Example 2

[0046] Polysiloxane-modified silica, including the following raw materials: 4.5 kg of nano-silica, 8.5 kg of mercaptosilane coupling agent, 18 kg of vinyl-terminated methyl polysiloxane, 1.5 kg of photoinitiator, 25 kg of N,N-dimethylamide, and 40 kg of ethanol aqueous solution;

[0047] The viscosity of the vinyl-terminated methyl polysiloxane is 300 Pa.S, and the vinyl content is 0.4 wt %; the mercaptosilane coupling agent is γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane; and the photoinitiator is benzoin dimethyl ether.

[0048] Polysiloxane-modified silica is prepared by the following method:

[0049] First, nano-silica is dispersed in a 15wt% ethanol aqueous solution at an ultrasonic frequency of 40kHz and an ultrasonic power of 460W. After ultrasonic dispersion for 40 minutes, a mercaptosilane coupling agent is added, and the mixture is stirred at a speed of 700r / min for 1.2 hours, filtered, and dried to obtain modified silica; then, the modified silica is dissolved in N,N-dimethylamide, and terminal vinylmethyl polysiloxane and a photoinitiator are added. The mixture is reacted for 350 minutes under ultraviolet light with a power of 15W and a wavelength of 320nm; finally, the solvent is removed by vacuum rotary evaporation, and the mixture is vacuum dried at 32°C for 15 hours to obtain polysiloxane-modified silica.

[0050] Preparation Example 3

[0051] Polysiloxane-modified silica, including the following raw materials: 6 kg of nano-silica, 9 kg of mercaptosilane coupling agent, 20 kg of vinyl-terminated methyl polysiloxane, 2 kg of photoinitiator, 30 kg of N,N-dimethylamide, and 55 kg of ethanol aqueous solution;

[0052] The viscosity of the vinyl-terminated methyl polysiloxane is 500 Pa.s and the vinyl content is 0.8 wt%. The mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 1:1. The photoinitiator is benzophenone.

[0053] Polysiloxane-modified silica is prepared by the following method:

[0054] First, nano-silica is dispersed in a 20wt% ethanol aqueous solution at an ultrasonic frequency of 65kHz and an ultrasonic power of 480W. After ultrasonic dispersion for 45 minutes, a mercaptosilane coupling agent is added, and the mixture is stirred at a speed of 800r / min for 1.5 hours, filtered, and dried to obtain modified silica; then, the modified silica is dissolved in N,N-dimethylamide, and end-vinylmethyl polysiloxane and a photoinitiator are added. The mixture is reacted for 40 minutes under ultraviolet light with a power of 20W and a wavelength of 350nm; finally, the solvent is removed by vacuum rotary evaporation, and the mixture is vacuum dried at 35°C for 25 hours to obtain polysiloxane-modified silica.

[0055] Preparation Example 4

[0056] Polysiloxane-modified silica, including the following raw materials: 6.5 kg of nano-silica, 9.5 kg of mercaptosilane coupling agent, 20 kg of vinyl-terminated methyl polysiloxane, 2.5 kg of photoinitiator, 35 kg of N,N-dimethylamide, and 70 kg of ethanol aqueous solution;

[0057] The viscosity of the vinyl-terminated methyl polysiloxane is 800 Pa.s and the vinyl content is 1.2 wt%. The mercaptosilane coupling agent is a mixture of 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 2:1. The photoinitiator is benzoin dimethyl ether.

[0058] Polysiloxane-modified silica is prepared by the following method:

[0059] First, nano-silica is dispersed in a 25wt% ethanol aqueous solution at an ultrasonic frequency of 70kHz and an ultrasonic power of 490W. After ultrasonic dispersion for 55 minutes, a mercaptosilane coupling agent is added, and the mixture is stirred at a speed of 900r / min for 1.8 hours, filtered, and dried to obtain modified silica; then, the modified silica is dissolved in N,N-dimethylamide, and end-vinylmethyl polysiloxane and a photoinitiator are added. The mixture is reacted for 55 minutes under ultraviolet light with a power of 25W and a wavelength of 380nm; finally, the solvent is removed by vacuum rotary evaporation, and the mixture is vacuum dried at 38°C for 40 hours to obtain polysiloxane-modified silica.

[0060] Preparation Example 5

[0061] Polysiloxane-modified silica, including the following raw materials: 7 kg of nano-silica, 10 kg of mercaptosilane coupling agent, 22 kg of vinyl-terminated methyl polysiloxane, 3 kg of photoinitiator, 40 kg of N,N-dimethylamide, and 75 kg of ethanol aqueous solution;

[0062] Among them, the viscosity of the terminal vinyl methyl polysiloxane is 1000 Pa.S and the vinyl content is 1.5wt%; the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 1:2; the photoinitiator is benzoin dimethyl ether.

[0063] Polysiloxane-modified silica is prepared by the following method:

[0064] First, nano-silica is dispersed in a 30wt% ethanol aqueous solution at an ultrasonic frequency of 80kHz and an ultrasonic power of 500W. After ultrasonic dispersion for 60 minutes, a mercaptosilane coupling agent is added, and the mixture is stirred at a speed of 1000r / min for 2 hours, filtered, and dried to obtain modified silica; then, the modified silica is dissolved in N,N-dimethylamide, and terminal vinylmethyl polysiloxane and a photoinitiator are added. The mixture is reacted for 60 minutes under ultraviolet light with a power of 30W and a wavelength of 400nm; finally, the solvent is removed by vacuum rotary evaporation, and the mixture is vacuum dried at 40°C for 48 hours to obtain polysiloxane-modified silica.

[0065] Preparation Example 6

[0066] Preparation Example 6 is the same as Preparation Example 1 except that an equal mass of γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane is replaced with 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane).

[0067] Preparation Example 7

[0068] Preparation Example 7 is different from Preparation Example 1 only in that the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 2:5.

[0069] Preparation Example 8

[0070] Preparation Example 8 is different from Preparation Example 1 only in that the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 4:5.

[0071] Preparation Example 9

[0072] Preparation Example 9 is different from Preparation Example 1 only in that the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 8:5.

[0073] Preparation Example 10

[0074] Preparation Example 10 is different from Preparation Example 1 only in that the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 1:10.

[0075] Preparation Example 11

[0076] Preparation Example 11 is different from Preparation Example 1 only in that the mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 3:1.

[0077] Preparation Example 12

[0078] Preparation Example 12 is the same as Preparation Example 1 except that an equal amount of γ-mercaptopropyltriethoxysilane is used to replace 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane).

[0079] Examples 1-16 provide self-cleaning thermal insulation decorative panels and methods for preparing the same.

[0080] Example 1

[0081] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0082] The reinforcement layer is a calcium silicate layer; the insulation layer is a rock wool insulation layer; the metal layer is an aluminum alloy layer;

[0083] The self-cleaning layer comprises the following raw materials: 60 kg of epoxy resin, 8 kg of polysiloxane-modified silica, 6 kg of ionic liquid, 1 kg of anti-wear agent, 20 kg of curing agent, 0.3 kg of dispersant, 0.05 kg of defoaming agent, 0.4 kg of leveling agent, and 0.5 kg of film-forming aid; wherein the epoxy resin is E-51; the polysiloxane-modified silica is prepared according to Preparation Example 1; the ionic liquid is prepared by mixing 1-hydroxyethyl-3-methylimidazole bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:1; the anti-wear agent is nano zinc oxide; the curing agent is T31; the dispersant is stearic acid; the defoaming agent is BYK-035; the leveling agent is BYK-300; and the film-forming aid is propylene glycol ethyl ether.

[0084] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0085] S1. Stirring epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid at a speed of 600 r / min for 1 h to obtain a self-cleaning coating;

[0086] S2. First, use an adhesive to stack the bonding reinforcement layer, the thermal insulation layer and the metal layer in sequence, then apply the self-cleaning coating to the surface of the metal layer with a roller, and solidify to form a self-cleaning layer with a dry film thickness of 10 μm to obtain a self-cleaning thermal insulation decorative board.

[0087] Example 2

[0088] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0089] The reinforcement layer is a calcium silicate layer; the insulation layer is a rock wool insulation layer; the metal layer is an aluminum alloy layer;

[0090] The self-cleaning layer comprises the following raw materials: 70 kg of epoxy resin, 12 kg of polysiloxane-modified silica, 7 kg of ionic liquid, 1.3 kg of anti-wear agent, 25 kg of curing agent, 0.35 kg of dispersant, 0.06 kg of defoaming agent, 0.5 kg of leveling agent, and 0.6 kg of film-forming aid; wherein the epoxy resin is E-51; the polysiloxane-modified silica is prepared according to Preparation Example 2; the ionic liquid is prepared by mixing 1-hydroxyethyl-3-methylimidazole bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 1:1; the anti-wear agent is nano-chromium oxide; the curing agent is T31; the dispersant is sodium dodecylbenzenesulfonate; the defoaming agent is BYK-037; the leveling agent is BYK-306; and the film-forming aid is propylene glycol butyl ether.

[0091] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0092] S1. Stirring epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid at a speed of 700 r / min for 1.2 h to obtain a self-cleaning coating;

[0093] S2. First, use an adhesive to stack the bonding reinforcement layer, the thermal insulation layer and the metal layer in sequence, then apply the self-cleaning coating to the surface of the metal layer with a roller, and solidify to form a self-cleaning layer with a dry film thickness of 10 μm to obtain a self-cleaning thermal insulation decorative board.

[0094] Example 3

[0095] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0096] The reinforcement layer is a calcium silicate layer; the insulation layer is a rock wool insulation layer; the metal layer is an aluminum alloy layer;

[0097] The self-cleaning layer comprises the following raw materials: 80 kg of epoxy resin, 14 kg of polysiloxane-modified silica, 8 kg of ionic liquid, 1.5 kg of anti-wear agent, 30 kg of curing agent, 0.4 kg of dispersant, 0.07 kg of defoaming agent, 0.55 kg of leveling agent, and 0.8 kg of film-forming aid; wherein the epoxy resin is E-51; the polysiloxane-modified silica is prepared according to Preparation Example 3; the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazole bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:3; the anti-wear agent is obtained by mixing nano-zinc oxide and nano-chromium oxide in a mass ratio of 1:1; the curing agent is T31; the dispersant is sodium carboxymethyl cellulose; the defoaming agent is BYK-065; the leveling agent is BYK-333; and the film-forming aid is propylene glycol ethyl ether.

[0098] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0099] S1. Stirring epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid at a speed of 800 r / min for 1.5 h to obtain a self-cleaning coating;

[0100] S2. First, use an adhesive to stack the bonding reinforcement layer, the thermal insulation layer and the metal layer in sequence, then apply the self-cleaning coating to the surface of the metal layer with a roller, and solidify to form a self-cleaning layer with a dry film thickness of 10 μm to obtain a self-cleaning thermal insulation decorative board.

[0101] Example 4

[0102] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0103] The reinforcement layer is a calcium silicate layer; the insulation layer is a rock wool insulation layer; the metal layer is an aluminum alloy layer;

[0104] The self-cleaning layer includes the following raw materials: 90 kg of epoxy resin, 13 kg of polysiloxane-modified silica, 9 kg of ionic liquid, 1.7 kg of anti-wear agent, 35 kg of curing agent, 0.45 kg of dispersant, 0.08 kg of defoaming agent, 0.6 kg of leveling agent, and 1.0 kg of film-forming aid; wherein the epoxy resin is E-51; the polysiloxane-modified silica is prepared according to Preparation Example 4; the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazole bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:3.5; the anti-wear agent is obtained by mixing nano-zinc oxide and nano-chromium oxide in a mass ratio of 2:1; the curing agent is T31; the dispersant is obtained by mixing stearic acid and sodium dodecylbenzenesulfonate in a mass ratio of 1:1; the defoaming agent is BYK-035; the leveling agent is BYK-300; and the film-forming aid is propylene glycol ethyl ether.

[0105] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0106] S1. Stirring epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid at a speed of 900 r / min for 1.8 h to obtain a self-cleaning coating;

[0107] S2. First, use an adhesive to stack the bonding reinforcement layer, the thermal insulation layer and the metal layer in sequence, then apply the self-cleaning coating to the surface of the metal layer with a roller, and solidify to form a self-cleaning layer with a dry film thickness of 10 μm to obtain a self-cleaning thermal insulation decorative board.

[0108] Example 5

[0109] The self-cleaning thermal insulation decorative panel comprises a reinforcement layer, a thermal insulation layer, a metal layer, and a self-cleaning layer in sequence;

[0110] The reinforcement layer is a calcium silicate layer; the insulation layer is a rock wool insulation layer; the metal layer is an aluminum alloy layer;

[0111] The self-cleaning layer includes the following raw materials: 100 kg of epoxy resin, 15 kg of polysiloxane-modified silica, 10 kg of ionic liquid, 2 kg of anti-wear agent, 10 kg of curing agent, 0.5 kg of dispersant, 0.1 kg of defoaming agent, 0.7 kg of leveling agent, and 1.2 kg of film-forming aid;

[0112] The epoxy resin is E-51; the polysiloxane-modified silica is prepared according to Preparation Example 5; the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 1:2; the anti-wear agent is obtained by mixing nano-zinc oxide and nano-chromium oxide in a mass ratio of 1:2; the curing agent is T31; the dispersant is sodium dodecylbenzenesulfonate; the defoaming agent is BYK-035; the leveling agent is BYK-300; and the film-forming aid is propylene glycol butyl ether.

[0113] The preparation method of the self-cleaning thermal insulation decorative board comprises the following steps:

[0114] S1. Stirring epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid at a speed of 1000 r / min for 2 h to obtain a self-cleaning coating;

[0115] S2. First, use an adhesive to stack the bonding reinforcement layer, the thermal insulation layer and the metal layer in sequence, then apply the self-cleaning coating to the surface of the metal layer with a roller, and solidify to form a self-cleaning layer with a dry film thickness of 10 μm to obtain a self-cleaning thermal insulation decorative board.

[0116] Example 6

[0117] Example 6 is different from Example 1 only in that the polysiloxane-modified silica is prepared according to Preparation Example 6.

[0118] Example 7

[0119] Example 7 is different from Example 1 only in that the polysiloxane-modified silica is prepared according to Preparation Example 7.

[0120] Example 8

[0121] Example 8 is different from Example 1 only in that the polysiloxane-modified silica is prepared according to Preparation Example 8.

[0122] Example 9

[0123] Example 9 is different from Example 1 only in that the polysiloxane-modified silica is prepared according to Preparation Example 9.

[0124] Example 10

[0125] Example 10 is different from Example 1 only in that the polysiloxane-modified silica is prepared by Preparation Example 10.

[0126] Example 11

[0127] Example 11 is the same as Example 1 except that the polysiloxane-modified silica is prepared according to Preparation Example 11.

[0128] Example 12

[0129] Example 12 is different from Example 1 only in that the polysiloxane-modified silica is prepared by Preparation Example 12.

[0130] Example 13

[0131] Example 13 is different from Example 1 in that the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:3.

[0132] Example 14

[0133] Example 14 is different from Example 1 in that the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 1:2.

[0134] Example 15

[0135] Example 15 is different from Example 1 in that the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 10:1.

[0136] Example 16

[0137] Example 16 is different from Example 1 in that the ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 1:10.

[0138] In order to verify the performance of the self-cleaning thermal insulation decorative board provided by the present application, the applicant set up comparative examples 1-5, among which: comparative example 1

[0139] Comparative Example 1 is the same as Example 1, except that an equal amount of nano-silica is used to replace the polysiloxane-modified silica.

[0140] Comparative Example 2

[0141] Comparative Example 2 is the same as Example 1, except that an equal amount of polysiloxane is used to replace the polysiloxane-modified silica; and the polysiloxane is vinyl-terminated methyl polysiloxane with a viscosity of 100 Pa.s and a vinyl content of 0.1 wt%.

[0142] Comparative Example 3

[0143] Comparative Example 3 is the same as Example 1, except that a mixture of nano-silica and polysiloxane in a mass ratio of 1:1 is used to replace the polysiloxane-modified silica; and the polysiloxane is vinyl-terminated methyl polysiloxane with a viscosity of 100 Pa.S and a vinyl content of 0.1 wt%.

[0144] Comparative Example 4

[0145] Comparative Example 4 is the same as Example 1, except that an equal amount of polysiloxane-modified silica is used to replace the ionic liquid.

[0146] Comparative Example 5

[0147] Comparative Example 5 is the same as Example 1, except that an equal amount of ionic liquid is used to replace the polysiloxane-modified silica.

[0148] The main properties of the self-cleaning thermal insulation decorative panels in Examples 1-16 and Comparative Examples 1-5 were tested respectively, and the following parameters were obtained, as shown in Table 1:

[0149] The contact angle test refers to the national standard GB / T 30447-2013. The abrasion resistance test: RCA paper tape abrasion test, referring to the American standard ASTM F2357-2010, uses an RCA paper tape abrasion tester to test the abrasion resistance of the coating. The pencil hardness test refers to the national standard GB / T 6739-2006.

[0150] Table 1:

[0151]

[0152] It can be seen from the data shown in Table 1 above that the comprehensive performance of the self-cleaning thermal insulation decorative panels obtained in Examples 1-16 of the present application is far superior to the decorative panels obtained in Comparative Examples 1-5, and they have excellent self-cleaning performance, good wear resistance and high hardness.

[0153] It can be seen from Examples 1, 6-11 that the polysiloxane-modified silica of Examples 1 and 6 is prepared by Preparation Examples 1 and 6, and the mercaptosilane coupling agent is 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) or γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy) silane; the polysiloxane-modified silica of Examples 7-11 is prepared by Preparation Examples 7-11, and the mercaptosilane coupling agent is a mixture of 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy) silane. The self-cleaning performance of the decorative panels obtained in Examples 7-11 is better than that of Examples 1 and 6.

[0154] In addition, the hydrophobic angle and oleophobic angle of the self-cleaning layer of the decorative panels obtained in Examples 7-9 are larger than those in Examples 10 and 11, indicating that the mixing ratio of 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane is controlled between 2-8:5, which is more helpful to improve the hydrophobicity and wear resistance of polysiloxane-modified silica.

[0155] It can be seen from Examples 1, 6 and 12 that the polysiloxane-modified silica of Example 12 is prepared by Preparation Example 12, and the mercaptosilane coupling agent is γ-mercaptopropyltriethoxysilane; compared with Examples 1 and 6, the self-cleaning performance of the decorative board obtained in Example 12 is poor.

[0156] It can be seen from Examples 1, 13-16 that the ionic liquids of Examples 1, 13, and 14 are obtained by mixing 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonyl imide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:1-4. Compared with Examples 15 and 16, the self-cleaning performance of the decorative panels obtained in Examples 1, 13, and 14 is significantly improved, indicating that the mixing ratio of 1-hydroxyethyl-3-methylimidazolium bistrifluoromethanesulfonyl imide and N-butylpyridinium hexafluorophosphate is between 2:1-4, and the hydrophobic performance of the obtained ionic liquid is better.

[0157] It can be seen from Example 1 and Comparative Examples 1-3 that the polysiloxane-modified silica of Examples 1 and 6 is prepared by Preparation Example 1, and the polysiloxane and nano-silica are connected by chemical bonds. Compared with Comparative Examples 1-3, the polysiloxane-modified silica can significantly improve the self-cleaning performance of the decorative board.

[0158] It can be seen from Example 1 and Comparative Examples 4 and 5 that the polysiloxane-modified silica and ionic liquid used in Example 1 have higher self-cleaning performance, wear resistance and hardness than those of Comparative Examples 4 and 5, indicating that the polysiloxane-modified silica and ionic liquid work synergistically to improve the overall performance of the decorative board.

[0159] This specific embodiment is merely an explanation of the present application and is not a limitation of the present application. After reading this specification, those skilled in the art may make non-creative modifications to the present embodiment as needed, but as long as they are within the scope of the claims of the present application, they are protected by the patent law.

Claims

1. Self-cleaning thermal insulation decorative panel, characterized in that: The invention comprises a reinforcing layer, a thermal insulation layer, a metal layer and a self-cleaning layer in sequence; the self-cleaning layer comprises the following raw materials in parts by weight: 60-100 parts of epoxy resin, 8-15 parts of polysiloxane-modified silica, 6-10 parts of ionic liquid, 1-2 parts of wear-resistant agent, 20-40 parts of curing agent, 0.3-0.5 parts of dispersant, 0.05-0.1 parts of defoaming agent, 0.4-0.7 parts of leveling agent and 0.5-1.2 parts of film-forming aid; the polysiloxane-modified silica comprises the following raw materials in parts by weight: 4-7 parts of nano-silica, 8-10 parts of mercaptosilane coupling agent, 17-22 parts of vinyl-terminated polysiloxane, 1-3 parts of photoinitiator and 20-40 parts of N,N-dimethylamide; the polysiloxane-modified silica is prepared by the following method: firstly, the nano-silica is reacted with the silicon dioxide to form a film; secondly, the nano-silica is reacted with the silicon dioxide to form a film; thirdly, the nano-silica is reacted with the silicon dioxide to form a film; fourthly, the nano-silica is reacted with the silicon dioxide to form a film; fourthly, the nano-silica is reacted with the silicon dioxide to form a film; fourthly, the nano-silica is reacted with the silicon dioxide to form a film; fifth ... Silicon is ultrasonically dispersed in an ethanol aqueous solution with a mass fraction of 10-30wt%, and then a mercaptosilane coupling agent is added. The mixture is stirred for reaction for 1-2h, filtered, and dried to obtain modified silica. The modified silica is then dissolved in N,N-dimethylamide, and a vinyl-terminated polysiloxane and a photoinitiator are added to react under ultraviolet light. Finally, the solvent is removed by rotary evaporation, and the mixture is vacuum-dried to obtain polysiloxane-modified silica. The mercaptosilane coupling agent is obtained by mixing 3-mercaptopropylethoxybis(tridecyl-pentaethoxy-siloxane) and γ-mercaptopropyl-ethoxybis(propyl-hexapropoxy)silane in a mass ratio of 2-8:

5. The ionic liquid is obtained by mixing 1-hydroxyethyl-3-methylimidazole bistrifluoromethanesulfonimide and N-butylpyridinium hexafluorophosphate in a mass ratio of 2:1-4.

2. The self-cleaning heat-insulating decorative panel according to claim 1, characterized in that: The self-cleaning layer comprises the following raw materials in parts by weight: 70-90 parts of epoxy resin, 10-13 parts of polysiloxane-modified silica, 7-9 parts of ionic liquid, 1.3-1.7 parts of wear-resistant agent, 25-35 parts of curing agent, 0.35-0.45 parts of dispersant, 0.06-0.08 parts of defoaming agent, 0.5-0.6 parts of leveling agent, and 0.6-1.0 parts of film-forming aid.

3. The self-cleaning heat-insulating decorative panel according to claim 1, characterized in that: The self-cleaning layer comprises the following raw materials in parts by weight: 80 parts of epoxy resin, 14 parts of polysiloxane-modified silica, 8 parts of ionic liquid, 1.5 parts of wear-resistant agent, 30 parts of curing agent, 0.4 part of dispersant, 0.07 part of defoaming agent, 0.55 part of leveling agent, and 0.8 part of film-forming aid.

4. The self-cleaning heat-insulating decorative panel according to claim 1, characterized in that: The anti-wear agent is nano zinc oxide and / or nano chromium oxide.

5. A method for preparing the self-cleaning thermal insulation decorative board according to any one of claims 1 to 4, characterized in that: The following steps are involved: S1. Evenly mix epoxy resin, polysiloxane-modified silica, ionic liquid, anti-wear agent, curing agent, dispersant, defoaming agent, leveling agent, and film-forming aid according to weight to obtain a self-cleaning coating; S2. First, a bonding reinforcement layer, a thermal insulation layer, and a metal layer are stacked in sequence using an adhesive, and then a self-cleaning coating is applied to the surface of the metal layer and cured to form a self-cleaning layer, thereby obtaining a self-cleaning thermal insulation decorative board.

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