Lithographic focusing system, lithographic objective, and lithographic apparatus

Abstract

The application discloses a photoetching focusing system, a photoetching objective lens and a photoetching equipment. The photoetching focusing system comprises, from an object side to an image side, a first double-convex spherical lens, a second convex-concave spherical lens, a third convex-concave spherical lens, a fourth double-concave spherical lens, a fifth convex-concave spherical lens, a sixth convex-concave spherical lens, a seventh double-convex spherical lens, an eighth convex-concave spherical lens, a ninth double-concave spherical lens, a tenth double-convex spherical lens, an eleventh double-convex spherical lens, a twelfth double-concave spherical lens, a thirteenth double-convex spherical lens, a fourteenth convex-concave spherical lens, a fifteenth convex-concave spherical lens and a sixteenth convex-concave spherical lens. The optical total length of the photoetching focusing system is controlled within 300 mm, the whole photoetching focusing system is compact in structure, each lens is a spherical lens, the cost and the processing difficulty can be reduced, the resolution can reach 350 nm, and a high-resolution, compact and low-cost photoetching focusing system is provided.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of optical technology, in particular to a photoetch focusing system, a photoetch lens and a photoetch device. BACKGROUND

[0002] In recent years, the further development of equipment in the field of photoetching makes the demand for photoetch lens higher, which not only needs to meet the high resolution requirement of ultraviolet photoetch lens, but also needs to be low in cost and compact in structure. SUMMARY

[0003] The main purpose of the present application is to provide a photoetch focusing system, a photoetch lens and a photoetch device, which aims to provide a high-resolution, compact and low-cost photoetch focusing system.

[0004] To achieve the above purpose, the present application provides a photoetch focusing system, which has an object side and an image side arranged oppositely along the optical axis direction, and comprises a first biconvex lens, a second convex-concave lens, a third convex-concave lens, a fourth biconcave lens, a fifth convex-concave lens, a sixth convex-concave lens, a seventh biconvex lens, an eighth convex-concave lens, a ninth biconcave lens, a tenth biconvex lens, an eleventh biconvex lens, a twelfth biconcave lens, a thirteenth biconvex lens, a fourteenth convex-concave lens, a fifteenth convex-concave lens and a sixteenth convex-concave lens arranged in sequence from the object side to the image side.

[0005] Among them, the concave surface of the second convex-concave lens, the third convex-concave lens, the eighth convex-concave lens, the fourteenth convex-concave lens, the fifteenth convex-concave lens and the sixteenth convex-concave lens is arranged towards the image side, the concave surface of the fifth convex-concave lens and the sixth convex-concave lens is arranged towards the object side, the total optical length TTL of the photoetch focusing system is less than or equal to 300mm, and the resolution of the photoetch focusing system is 350nm.

[0006] Optionally, the optical power of the first biconvex lens is positive.

[0007] The optical power of the second convex-concave lens is positive.

[0008] The optical power of the third convex-concave lens is negative.

[0009] The optical power of the fourth biconcave lens is negative.

[0010] The optical power of the fifth convex-concave lens is positive.

[0011] The optical power of the sixth convex-concave lens is negative.

[0012] The optical power of the seventh biconvex lens is positive.

[0013] The optical power of the eighth convex-concave spherical lens is positive;

[0014] The optical power of the ninth biconcave spherical lens is negative;

[0015] The optical power of the tenth biconvex spherical lens is positive;

[0016] The optical power of the eleventh biconvex spherical lens is positive;

[0017] The optical power of the twelfth biconcave spherical lens is negative;

[0018] The optical power of the thirteenth biconvex spherical lens is positive;

[0019] The optical power of the fourteenth convex-concave spherical lens is positive;

[0020] The optical power of the fifteenth convex-concave spherical lens is positive;

[0021] The optical power of the sixteenth convex-concave spherical lens is positive.

[0022] Optionally, the refractive index n1 of the first biconvex spherical lens is 1.49;

[0023] The refractive index n2 of the second convex-concave spherical lens is 1.62;

[0024] The refractive index n3 of the third convex-concave spherical lens is 1.52;

[0025] The refractive index n4 of the fourth biconcave spherical lens is 1.62;

[0026] The refractive index n5 of the fifth concave-convex spherical lens is 1.62;

[0027] The refractive index n6 of the sixth concave-convex spherical lens is 1.46;

[0028] The refractive index n7 of the seventh biconvex spherical lens is 1.46;

[0029] The refractive index n8 of the eighth convex-concave spherical lens is 1.62;

[0030] The refractive index n9 of the ninth biconcave spherical lens is 1.46;

[0031] The refractive index n10 of the tenth biconvex spherical lens is 1.52;

[0032] The refractive index n11 of the eleventh biconvex spherical lens is 1.52;

[0033] The refractive index n12 of the twelfth biconcave spherical lens is 1.46;

[0034] The refractive index n13 of the thirteenth double convex lens is 1.46;

[0035] The refractive index n14 of the fourteenth convex-concave lens is 1.46;

[0036] The refractive index n15 of the fifteenth convex-concave lens is 1.46;

[0037] The refractive index n16 of the sixteenth convex-concave lens is 1.46.

[0038] Optionally, the dispersion coefficient vd1 of the first double convex lens is 70.4;

[0039] The dispersion coefficient vd2 of the second convex-concave lens is 36.4;

[0040] The dispersion coefficient vd3 of the third convex-concave lens is 63.3;

[0041] The dispersion coefficient vd4 of the fourth double concave lens is 36.4;

[0042] The dispersion coefficient vd5 of the fifth concave-convex lens is 90.3;

[0043] The dispersion coefficient vd6 of the sixth concave-convex lens is 90.3;

[0044] The dispersion coefficient vd7 of the seventh double convex lens is 36.4;

[0045] The dispersion coefficient vd8 of the eighth convex-concave lens is 90.3;

[0046] The dispersion coefficient vd9 of the ninth double concave lens is 90.3;

[0047] The dispersion coefficient vd10 of the tenth double convex lens is 63.3;

[0048] The dispersion coefficient vd11 of the eleventh double convex lens is 63.3;

[0049] The dispersion coefficient vd12 of the twelfth double concave lens is 90.3;

[0050] The dispersion coefficient vd13 of the thirteenth double convex lens is 90.3;

[0051] The dispersion coefficient vd14 of the fourteenth convex-concave lens is 67.8;

[0052] The dispersion coefficient vd15 of the fifteenth convex-concave lens is 90.3;

[0053] The dispersion coefficient vd16 of the sixteenth convex-concave lens is 90.3.

[0054] Optionally, the radius of curvature of the object side surface of the first biconvex lens is R1, and the radius of curvature of the image side surface is R2, wherein R1 = 48.765, and R2 = -57.957;

[0055] The radius of curvature of the object side surface of the second biconvex lens is R3, and the radius of curvature of the image side surface is R4, wherein R3 = 18.534, and R4 = 50.541;

[0056] The radius of curvature of the object side surface of the third biconvex lens is R5, and the radius of curvature of the image side surface is R6, wherein R5 = 546.046, and R6 = 8.209;

[0057] The radius of curvature of the object side surface of the fourth biconcave lens is R7, and the radius of curvature of the image side surface is R8, wherein R7 = -9.782, and R8 = 27.185;

[0058] The radius of curvature of the object side surface of the fifth biconcave lens is R9, and the radius of curvature of the image side surface is R10, wherein R9 = -732.448, and R10 = -10.276;

[0059] The radius of curvature of the object side surface of the sixth biconcave lens is R11, and the radius of curvature of the image side surface is R12, wherein R11 = -11.429, and R12 = -17.389;

[0060] The radius of curvature of the object side surface of the seventh biconvex lens is R13, and the radius of curvature of the image side surface is R14, wherein R13 = 51.005, and R14 = -59.578;

[0061] The radius of curvature of the object side surface of the eighth biconcave lens is R15, and the radius of curvature of the image side surface is R16, wherein R15 = 23.716, and R16 = 245.480;

[0062] The radius of curvature of the object side surface of the ninth biconcave lens is R17, and the radius of curvature of the image side surface is R18, wherein R17 = -32.482, and R18 = 43.594;

[0063] The radius of curvature of the object side surface of the tenth biconvex lens is R19, and the radius of curvature of the image side surface is R20, wherein R19 = 114.800, and R20 = -31.952;

[0064] The radius of curvature of the object side surface of the eleventh biconvex lens is R21, and the radius of curvature of the image side surface is R22, wherein R21 = 30.384, and R22 = -240.636;

[0065] The object-side radius of curvature of the twelfth biconcave spherical lens is R23, and the image-side radius of curvature is R24, where R23 = -42.351 and R24 = 38.878.

[0066] The object-side radius of curvature of the thirteenth biconvex spherical lens is R25, and the image-side radius of curvature is R26, where R25 = 672.414 and R26 = -23.579.

[0067] The object-side radius of curvature of the fourteenth convex-concave spherical lens is R27, and the image-side radius of curvature is R28, where R27 = 28.128 and R28 = 111.586.

[0068] The object-side radius of curvature of the fifteenth convex-concave spherical lens is R29, and the image-side radius of curvature is R30, where R29 = 14.162 and R30 = 19.487.

[0069] The object-side radius of curvature of the sixteenth convex-concave spherical lens is R31, and the image-side radius of curvature is R32, where R31 = 10.068 and R32 = 16.775.

[0070] Optionally, the first biconvex spherical lens, the second convex-concave spherical lens, the third convex-concave spherical lens, the fourth biconvex spherical lens, the fifth concave-convex spherical lens, the sixth concave-convex spherical lens, the seventh biconvex spherical lens, the eighth convex-concave spherical lens, the ninth biconvex spherical lens, the tenth biconvex spherical lens, the eleventh biconvex spherical lens, the twelfth biconvex spherical lens, the thirteenth biconvex spherical lens, the fourteenth convex-concave spherical lens, the fifteenth convex-concave spherical lens, and the sixteenth convex-concave spherical lens are all made of glass.

[0071] Optionally, the photolithography focusing system further includes an aperture stop, which is disposed between the tenth biconvex spherical lens and the eleventh biconvex spherical lens.

[0072] Optionally, the object-side numerical aperture NA of the photolithography focusing system is 0.7.

[0073] The present invention also provides a photolithography objective lens, which includes the photolithography focusing system described above.

[0074] The present invention also provides a photolithography apparatus, the photolithography apparatus including the photolithography objective lens described above.

[0075] The technical scheme provided by the application comprises: a first double-convex spherical lens, a second convex-concave spherical lens, a third convex-concave spherical lens, a fourth double-concave spherical lens, a fifth concave-convex spherical lens, a sixth concave-convex spherical lens, a seventh double-convex spherical lens, an eighth convex-concave spherical lens, a ninth double-concave spherical lens, a tenth double-convex spherical lens, an eleventh double-convex spherical lens, a twelfth double-concave spherical lens, a thirteenth double-convex spherical lens, a fourteenth convex-concave spherical lens, a fifteenth convex-concave spherical lens and a sixteenth convex-concave spherical lens are sequentially arranged from the object side to the image side, the optical total length of the photoengraving focusing system is controlled within 300mm through the reasonable arrangement of the sixteen lenses, the photoengraving focusing system has a compact structure, all the lenses are spherical lenses, the cost can be greatly reduced, the processing difficulty is reduced, the assembly sensitivity is low under the premise of ensuring the image quality and reliability, the yield of finished products is improved, the resolution can reach 350nm, and a high-resolution, compact and low-cost photoengraving focusing system is provided. BRIEF DESCRIPTION OF DRAWINGS

[0076] In order to more clearly illustrate the technical schemes in the embodiments of the application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the application, and other drawings can be obtained by those skilled in the art without creative effort on the basis of the drawings shown.

[0077] Figure 1 A perspective view of an embodiment of the photoengraving focusing system provided by the application;

[0078] Figure 2 A point spread function diagram of the photoengraving focusing system in Figure 1

[0079] A point spread function diagram of the photoengraving focusing system in Figure 3 Figure 1 A point spread function diagram of the photoengraving focusing system in

[0080] Figure 4 A point spread function diagram of the photoengraving focusing system in Figure 1

[0081] Explanation of reference numerals:

[0082]

[0083]

[0084] The implementation, functional features and advantages of the application will be further described with reference to the embodiments and the drawings. DETAILED DESCRIPTION

[0085] ​​With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all the embodiments of the present application. Based on the embodiments of the present application, all the other embodiments obtained by a person of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0086] It should be noted that if the embodiments of the present application involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative positional relationship, motion condition, etc. between components in a certain specific posture (as shown in the drawings), and if the specific posture changes, the directional indications also change accordingly.

[0087] In addition, if the embodiments of the present application involve descriptions of "first", "second", etc., the descriptions of "first", "second", etc. are only for description purposes, and cannot be understood as indicating or implying the relative importance of the indicated technical features or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include at least one of the features. In addition, the meaning of "and / or" appearing throughout the text includes three parallel solutions. Taking "A and / or B" as an example, it includes A solution, or B solution, or A and B solutions. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the realization of a person of ordinary skill in the art. When the combination of technical solutions contradicts each other or cannot be realized, it should be considered that the combination of technical solutions does not exist, and is not within the scope of protection claimed by the present application.

[0088] In recent years, further development of equipment in the field of photolithography has made the demand for photolithography lenses higher and higher, which not only needs to meet the high resolution requirement of ultraviolet photolithography objective, but also requires low cost and compact structure.

[0089] To solve the above problems, the present application provides a photolithography focusing system, Figures 1 to 4 The specific embodiments of the photolithography focusing system provided by the present application are provided.

[0090] Please refer to Figure 1The photoetching focusing system has an object side and an image side oppositely arranged along the direction of the optical axis, and comprises, sequentially from the object side to the image side, a first double-convex spherical lens, a second convex-concave spherical lens, a third convex-concave spherical lens, a fourth double-concave spherical lens, a fifth concave-convex spherical lens, a sixth concave-convex spherical lens, a seventh double-convex spherical lens, an eighth convex-concave spherical lens, a ninth double-concave spherical lens, a tenth double-convex spherical lens, an eleventh double-convex spherical lens, a twelfth double-concave spherical lens, a thirteenth double-convex spherical lens, a fourteenth convex-concave spherical lens, a fifteenth convex-concave spherical lens, and a sixteenth convex-concave spherical lens; wherein the concave surfaces of the second convex-concave spherical lens, the third convex-concave spherical lens, the eighth convex-concave spherical lens, the fourteenth convex-concave spherical lens, the fifteenth convex-concave spherical lens, and the sixteenth convex-concave spherical lens are arranged towards the image side, the concave surfaces of the fifth concave-convex spherical lens and the sixth concave-convex spherical lens are arranged towards the object side, the total optical length TTL of the photoetching focusing system is less than or equal to 300 mm, and the resolution of the photoetching focusing system is 350 nm.

[0091] In the technical solution provided by the application, the first double-convex spherical lens, the second convex-concave spherical lens, the third convex-concave spherical lens, the fourth double-concave spherical lens, the fifth concave-convex spherical lens, the sixth concave-convex spherical lens, the seventh double-convex spherical lens, the eighth convex-concave spherical lens, the ninth double-concave spherical lens, the tenth double-convex spherical lens, the eleventh double-convex spherical lens, the twelfth double-concave spherical lens, the thirteenth double-convex spherical lens, the fourteenth convex-concave spherical lens, the fifteenth convex-concave spherical lens, and the sixteenth convex-concave spherical lens are sequentially arranged from the object side to the image side, the total optical length of the photoetching focusing system is controlled within 300 mm through the reasonable arrangement of the sixteen lenses, the structure of the entire photoetching focusing system is compact, each lens adopts a spherical lens, the cost can be greatly reduced, the processing difficulty is reduced, the assembly sensitivity is low under the premise of ensuring the image quality and reliability, the yield of finished products is improved, the resolution can reach 350 nm, and a high-resolution, compact, and low-cost photoetching focusing system is provided.

[0092] It should be noted that when photoetching is needed, the corresponding optical engine is matched to achieve exposure.

[0093] Specifically, in the embodiment, the first double convex lens has a positive optical power; the second convex-concave lens has a positive optical power; the third convex-concave lens has a negative optical power; the fourth double concave lens has a negative optical power; the fifth convex-concave lens has a positive optical power; the sixth convex-concave lens has a negative optical power; the seventh double convex lens has a positive optical power; the eighth convex-concave lens has a positive optical power; the ninth double concave lens has a negative optical power; the tenth double convex lens has a positive optical power; the eleventh double convex lens has a positive optical power; the twelfth double concave lens has a negative optical power; the thirteenth double convex lens has a positive optical power; the fourteenth convex-concave lens has a positive optical power; the fifteenth convex-concave lens has a positive optical power; and the sixteenth convex-concave lens has a positive optical power.

[0094] Specifically, in the embodiment, the first double convex lens has a refractive index n1 = 1.49; the second convex-concave lens has a refractive index n2 = 1.62; the third convex-concave lens has a refractive index n3 = 1.52; the fourth double concave lens has a refractive index n4 = 1.62; the fifth convex-concave lens has a refractive index n5 = 1.62; the sixth convex-concave lens has a refractive index n6 = 1.46; the seventh double convex lens has a refractive index n7 = 1.46; the eighth convex-concave lens has a refractive index n8 = 1.62; the ninth double concave lens has a refractive index n9 = 1.46; the tenth double convex lens has a refractive index n10 = 1.52; the eleventh double convex lens has a refractive index n11 = 1.52; the twelfth double concave lens has a refractive index n12 = 1.46; the thirteenth double convex lens has a refractive index n13 = 1.46; the fourteenth convex-concave lens has a refractive index n14 = 1.46; the fifteenth convex-concave lens has a refractive index n15 = 1.46; and the sixteenth convex-concave lens has a refractive index n16 = 1.46.

[0095] Specifically, in the optical lens, the dispersion of light can cause undesirable chromatic aberration, resulting in a blurred effect or "color edge" around the observed object. In order to make the photolithography focusing system have better imaging quality, in the embodiment, the dispersion coefficient vd1 of the first double convex spherical lens is 70.4; the dispersion coefficient vd2 of the second convex-concave spherical lens is 36.4; the dispersion coefficient vd3 of the third convex-concave spherical lens is 63.3; the dispersion coefficient vd4 of the fourth double concave spherical lens is 36.4; the dispersion coefficient vd5 of the fifth concave-convex spherical lens is 90.3; the dispersion coefficient vd6 of the sixth concave-convex spherical lens is 90.3; the dispersion coefficient vd7 of the seventh double convex spherical lens is 36.4; the dispersion coefficient vd8 of the eighth convex-concave spherical lens is 90.3; the dispersion coefficient vd9 of the ninth double concave spherical lens is 90.3; the dispersion coefficient vd10 of the tenth double convex spherical lens is 63.3; the dispersion coefficient vd11 of the eleventh double convex spherical lens is 63.3; the dispersion coefficient vd12 of the twelfth double concave spherical lens is 90.3; the dispersion coefficient vd13 of the thirteenth double convex spherical lens is 90.3; the dispersion coefficient vd14 of the fourteenth convex-concave spherical lens is 67.8; the dispersion coefficient vd15 of the fifteenth convex-concave spherical lens is 90.3; and the dispersion coefficient vd16 of the sixteenth convex-concave spherical lens is 90.3. The dispersion coefficient is used to measure the degree of light dispersion of a transparent medium, and the Abbe number is an index used to represent the dispersion ability of a transparent medium. The larger the dispersion coefficient (Abbe number), the less obvious the dispersion, and the better the imaging quality of the lens. In the embodiment, the dispersion coefficients of the lenses are controlled at high values, so that the dispersion of the photolithography focusing system is not obvious, and the imaging quality of the lens is good.

[0096] Specifically, in the embodiment, the radius of curvature of the object side of the first lenticular lens is R1, and the radius of curvature of the image side is R2, wherein R1=48.765, R2=-57.957; the radius of curvature of the object side of the second lenticular lens is R3, and the radius of curvature of the image side is R4, wherein R3=18.534, R4=50.541; the radius of curvature of the object side of the third lenticular lens is R5, and the radius of curvature of the image side is R6, wherein R5=546.046, R6=8.209; the radius of curvature of the object side of the fourth lenticular lens is R7, and the radius of curvature of the image side is R8, wherein R7=-9.782, R8=27.185; the radius of curvature of the object side of the fifth lenticular lens is R9, and the radius of curvature of the image side is R10, wherein R9=-732.448, R10=-10.276; the radius of curvature of the object side of the sixth lenticular lens is R11, and the radius of curvature of the image side is R12, wherein R11=-11.429, R12=-17.389; the radius of curvature of the object side of the seventh lenticular lens is R13, and the radius of curvature of the image side is R14, wherein R13=51.005, R14=-59.578; the radius of curvature of the object side of the eighth lenticular lens is R15, and the radius of curvature of the image side is R16, wherein R15=23.716, R16=245.480; the radius of curvature of the object side of the ninth lenticular lens is R17, and the radius of curvature of the image side is R18, wherein R17=-32.482, R18=43.594; the radius of curvature of the object side of the tenth lenticular lens is R19, and the radius of curvature of the image side is R20, wherein R19=114.800, R20=-31.952; the radius of curvature of the object side of the eleventh lenticular lens is R21, and the radius of curvature of the image side is R22, wherein R21=30.384, R22=-240.636; the radius of curvature of the object side of the twelfth lenticular lens is R23, and the radius of curvature of the image side is R24, wherein R23=-42.351, R24=38.878; the radius of curvature of the object side of the thirteenth lenticular lens is R25, and the radius of curvature of the image side is R26, wherein R25=672.414, R26=-23.579; the radius of curvature of the object side of the fourteenth lenticular lens is R27, and the radius of curvature of the image side is R28, wherein R27=28.128, R28=111.586; the radius of curvature of the object side of the fifteenth lenticular lens is R29, and the radius of curvature of the image side is R30, wherein R29=14.162, R30=19.487; the radius of curvature of the object side of the sixteenth lenticular lens is R31, and the radius of curvature of the image side is R32, wherein R31=10.068, R32 = 16.775.

[0097] Specifically, in order to make the photolithography focusing system have better stability, in the embodiment, the material of the first double convex spherical lens, the second convex-concave spherical lens, the third convex-concave spherical lens, the fourth double concave spherical lens, the fifth concave-convex spherical lens, the sixth concave-convex spherical lens, the seventh double convex spherical lens, the eighth convex-concave spherical lens, the ninth double concave spherical lens, the tenth double convex spherical lens, the eleventh double convex spherical lens, the twelfth double concave spherical lens, the thirteenth double convex spherical lens, the fourteenth convex-concave spherical lens, the fifteenth convex-concave spherical lens, and the sixteenth convex-concave spherical lens is glass. In this way, by reasonably distributing the optical power of the lenses and considering the matching of the thermal expansion coefficients of the glass materials, the photolithography focusing system can clearly image under a working environment of 20±1℃, ensuring a high yield advantage of processing and assembly, and further reducing the cost.

[0098] Specifically, the photolithography focusing system further comprises a diaphragm, which is arranged between the tenth double convex spherical lens and the eleventh double convex spherical lens. The diaphragm can adjust the light flux according to the actual situation, so as to adjust the resolution of the photolithography focusing system. It should be noted that the greater the light flux, the higher the resolution.

[0099] Specifically, the numerical aperture NA of the object side of the photolithography focusing system is 0.7, so that the photolithography focusing system can achieve a resolution of 350 nm.

[0100] Specifically, in the embodiment, the surface type, the radius of curvature, and the thickness interval of the lenses are shown in the following table:

[0101]

[0102]

[0103] Figure 2 a MTF curve diagram of the photolithography focusing system in a 365±10 nm waveband is shown, Figure 3 a point spread diagram of the photolithography focusing system in a 365±10 nm waveband is shown, Figure 4 a distortion diagram and a field curvature diagram of the photolithography focusing system in a 365±10 nm waveband are shown.

[0104] As shown in the above diagrams, the spherical aberration, the field curvature, and the distortion of the photolithography focusing system in the embodiment can be well corrected.

[0105] In conclusion, the photoetching focusing system can realize the maximum optical effective diameter of 40mm, the optical total length of no more than 400mm, the object side numerical aperture of 0.7, the exposure / observation area of 1mm*1mm, the wavelength of 365±10nm, and the ultraviolet photoetching with the resolution of 350nm by connecting a 365±5nm pipe diameter when photoetching is needed.

[0106] In addition, the application further provides a photoetching objective lens, which comprises the photoetching focusing system in the above technical solution.

[0107] The application further provides a photoetching device, which comprises the photoetching objective lens in the above technical solution.

[0108] The above description is only the preferred embodiments of the application, and does not limit the patent scope of the application, and any equivalent structural transformation, direct / indirect application in other related technical fields within the concept of the application and the content of the application specification and drawings are included in the patent protection scope of the application.

Claims

1. A lithography focusing system, characterized by, The photoetching focusing system has an object side and an image side oppositely arranged along the optical axis direction, and is composed of a first biconvex lens, a second convex-concave lens, a third convex-concave lens, a fourth biconcave lens, a fifth convex-concave lens, a sixth convex-concave lens, a seventh biconvex lens, an eighth convex-concave lens, a ninth biconcave lens, a tenth biconvex lens, an eleventh biconvex lens, a twelfth biconcave lens, a thirteenth biconvex lens, a fourteenth convex-concave lens, a fifteenth convex-concave lens and a sixteenth convex-concave lens arranged in sequence from the object side to the image side. The concave surface of the second convex-concave lens, the third convex-concave lens, the eighth convex-concave lens, the fourteenth convex-concave lens, the fifteenth convex-concave lens and the sixteenth convex-concave lens is arranged towards the image side, the concave surface of the fifth convex-concave lens and the sixth convex-concave lens is arranged towards the object side, the total optical length TTL of the photoetching focusing system is less than or equal to 300 mm, and the resolution of the photoetching focusing system is 350 nm.

2. The photolithography focusing system of claim 1, wherein, The first biconvex lens has a positive refractive power. The second convex-concave lens has a positive refractive power. The third convex-concave lens has a negative refractive power. The fourth biconcave lens has a negative refractive power. The fifth convex-concave lens has a positive refractive power. The sixth convex-concave lens has a negative refractive power. The seventh biconvex lens has a positive refractive power. The eighth convex-concave lens has a positive refractive power. The ninth biconcave lens has a negative refractive power. The tenth biconvex lens has a positive refractive power. The eleventh biconvex lens has a positive refractive power. The twelfth biconcave lens has a negative refractive power. The thirteenth biconvex lens has a positive refractive power. The fourteenth convex-concave lens has a positive refractive power. The fifteenth convex-concave lens has a positive refractive power. The sixteenth convex-concave lens has a positive refractive power.

3. The photolithography focusing system of claim 1, wherein, The first biconvex lens has a refractive index n1=1.

49. The second convex-concave lens has a refractive index n2=1.

62. The third convex-concave lens has a refractive index n3=1.

52. The fourth biconcave lens has a refractive index n4=1.

62. The fifth convex-concave lens has a refractive index n5=1.

62. The sixth convex-concave lens has a refractive index n6=1.

46. The seventh biconvex lens has a refractive index n7=1.

46. The eighth convex-concave lens has a refractive index n8=1.

62. The ninth biconcave lens has a refractive index n9=1.

46. The tenth biconvex lens has a refractive index n10=1.

52. The eleventh biconvex lens has a refractive index n11=1.

52. The twelfth biconcave lens has a refractive index n12=1.

46. The thirteenth biconvex lens has a refractive index n13=1.

46. The fourteenth convex-concave lens has a refractive index n14=1.

46. The fifteenth convex-concave lens has a refractive index n15=1.

46. The sixteenth convex-concave lens has a refractive index n16=1.

46.

4. The photolithography focusing system of claim 1, wherein, A dispersion coefficient vd1 of the first double convex lens is 70.4; A dispersion coefficient vd2 of the second convex-concave lens is 36.4; A dispersion coefficient vd3 of the third convex-concave lens is 63.3; A dispersion coefficient vd4 of the fourth double concave lens is 36.4; A dispersion coefficient vd5 of the fifth concave-convex lens is 90.3; A dispersion coefficient vd6 of the sixth concave-convex lens is 90.3; A dispersion coefficient vd7 of the seventh double convex lens is 36.4; A dispersion coefficient vd8 of the eighth convex-concave lens is 90.3; A dispersion coefficient vd9 of the ninth double concave lens is 90.3; A dispersion coefficient vd10 of the tenth double convex lens is 63.3; A dispersion coefficient vd11 of the eleventh double convex lens is 63.3; A dispersion coefficient vd12 of the twelfth double concave lens is 90.3; A dispersion coefficient vd13 of the thirteenth double convex lens is 90.3; A dispersion coefficient vd14 of the fourteenth convex-concave lens is 67.8; A dispersion coefficient vd15 of the fifteenth convex-concave lens is 90.3; A dispersion coefficient vd16 of the sixteenth convex-concave lens is 90.

3.

5. The photolithography focusing system of claim 1, wherein, A curvature radius of an object side surface of the first double convex lens is R1, and a curvature radius of an image side surface is R2, wherein R1=48.765, and R2=-57.957; A curvature radius of an object side surface of the second convex-concave lens is R3, and a curvature radius of an image side surface is R4, wherein R3=18.534, and R4=50.541; A curvature radius of an object side surface of the third convex-concave lens is R5, and a curvature radius of an image side surface is R6, wherein R5=546.046, and R6=8.209; A curvature radius of an object side surface of the fourth double concave lens is R7, and a curvature radius of an image side surface is R8, wherein R7=-9.782, and R8=27.185; A curvature radius of an object side surface of the fifth concave-convex lens is R9, and a curvature radius of an image side surface is R10, wherein R9=-732.448, and R10=-10.276; A curvature radius of an object side surface of the sixth concave-convex lens is R11, and a curvature radius of an image side surface is R12, wherein R11=-11.429, and R12=-17.389; A curvature radius of an object side surface of the seventh double convex lens is R13, and a curvature radius of an image side surface is R14, wherein R13=51.005, and R14=-59.578; A curvature radius of an object side surface of the eighth convex-concave lens is R15, and a curvature radius of an image side surface is R16, wherein R15=23.716, and R16=245.480; A curvature radius of an object side surface of the ninth double concave lens is R17, and a curvature radius of an image side surface is R18, wherein R17=-32.482, and R18=43.594; A radius of curvature of an object side surface of the tenth double convex spherical lens is R19, and a radius of curvature of an image side surface is R20, wherein R19=114.800, and R20=-31.952; A radius of curvature of an object side surface of the eleventh double convex spherical lens is R21, and a radius of curvature of an image side surface is R22, wherein R21=30.384, and R22=-240.636; A radius of curvature of an object side surface of the twelfth double concave spherical lens is R23, and a radius of curvature of an image side surface is R24, wherein R23=-42.351, and R24=38.878; A radius of curvature of an object side surface of the thirteenth double convex spherical lens is R25, and a radius of curvature of an image side surface is R26, wherein R25=672.414, and R26=-23.579; A radius of curvature of an object side surface of the fourteenth convex-concave spherical lens is R27, and a radius of curvature of an image side surface is R28, wherein R27=28.128, and R28=111.586; A radius of curvature of an object side surface of the fifteenth convex-concave spherical lens is R29, and a radius of curvature of an image side surface is R30, wherein R29=14.162, and R30=19.487; A radius of curvature of an object side surface of the sixteenth convex-concave spherical lens is R31, and a radius of curvature of an image side surface is R32, wherein R31=10.068, and R32=16.

775.

6. The photolithography focusing system of claim 1, wherein, Materials of the first double convex spherical lens, the second convex-concave spherical lens, the third convex-concave spherical lens, the fourth double concave spherical lens, the fifth concave-convex spherical lens, the sixth concave-convex spherical lens, the seventh double convex spherical lens, the eighth convex-concave spherical lens, the ninth double concave spherical lens, the tenth double convex spherical lens, the eleventh double convex spherical lens, the twelfth double concave spherical lens, the thirteenth double convex spherical lens, the fourteenth convex-concave spherical lens, the fifteenth convex-concave spherical lens, and the sixteenth convex-concave spherical lens are all glass.

7. The photolithography focusing system of claim 1, wherein, The photolithography focusing system further comprises a diaphragm, which is arranged between the tenth double convex spherical lens and the eleventh double convex spherical lens.

8. The photolithography focusing system of claim 1, wherein, A numerical aperture of the photolithography focusing system is 0.

7.

9. A lithography objective, characterized in that The photolithography focusing system according to any one of claims 1 to 8.

10. A lithographic apparatus, characterized in that, The photolithography focusing system according to claim 9.

Images