Copolymers and methods for making the same
The copolymer prepared by copolymerization of specific structural units and monomers solves the problem of insufficient developability and storage stability of resin compositions at low temperatures, and achieves the formation of cured products with excellent solvent resistance, which are suitable for color filters and image display elements on flexible substrates.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- RESONAC CORP
- Filing Date
- 2021-12-08
- Publication Date
- 2026-06-09
AI Technical Summary
Existing resin compositions have poor developability and storage stability when used as photosensitive materials, and it is difficult to obtain cured products with excellent solvent resistance when thermally cured at low temperatures, especially when forming color filters on flexible substrates, where heat resistance is poor.
A copolymer containing specific structural units (a), hydroxyl structural units (b), and acidic structural units (c) is used to prepare a resin composition that can be cured at 60–90°C. The copolymer has a glass transition temperature below 30°C and includes a photopolymerization initiator and a reactive diluent.
A resin composition with good developability and storage stability at low temperatures has been developed, which can form a cured product with excellent solvent resistance, suitable for color filters on flexible substrates, and improves the performance of image display elements.
Smart Images

Figure CN116745327B_ABST