Integrated Intelligent Plasma Mist Cultivation System

By designing an integrated intelligent plasma water mist cultivation system, combining plasma discharge and water mist cultivation technology, the problems of low space utilization and pollution of traditional planting methods are solved, efficient nitrogen fixation and plant nutrient supply are achieved, and plant growth and environmental protection are promoted.

CN116849111BActive Publication Date: 2025-07-01HUAZHONG UNIV OF SCI & TECH
View PDF 4 Cites 0 Cited by

Patent Information

Application Number
CN202310649129.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-06-02
Publication Date
2025-07-01
Estimated Expiration
2043-06-02

AI Technical Summary

Technical Problem

Traditional soil planting methods have low spatial utilization, high pollution in fertilizer production, and plasma nitrogen fixation technology is insufficient in water mist cultivation, and cannot provide the elements such as phosphorus and potassium required for plant growth.

Method used

An integrated intelligent plasma water mist cultivation system is designed, combining plasma discharge units, intelligent water mist cultivation cabinets, nitrogen fixing water tanks and water storage tanks to generate liquid plasma active substances through plasma discharge, realize nitrogen fixation in water, and provide plants with sufficient nutrients and oxygen through water pumps and atomizers. The system uses a PLC control system and a liquid crystal display for intelligent regulation, automatically adjusts the pH value and conductivity, and replenishes phosphorus and potassium.

Benefits of technology

It improves the nutrient utilization efficiency of plants, promotes plant growth, enhances the ability to resist diseases and pests, reduces the use of fertilizers and pesticides, achieves the effect of saving space and reducing costs, and avoids soil pollution and environmental pollution.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN116849111B_ABST
    Figure CN116849111B_ABST
Patent Text Reader

Abstract

The present invention discloses an integrated intelligent plasma water mist cultivation system, belonging to the field of plasma nitrogen fixation, which includes a plasma discharge unit, an intelligent water mist cultivation cabinet, a nitrogen fixation water tank and a water storage tank. The present invention can achieve efficient air nitrogen fixation and the cyclic supply of plant hydroponics and mist cultivation, and at the same time realize the overall regulation of the water mist cultivation system. Nitrogen fixation is carried out in tap water through the plasma discharge unit, and at the same time harmful bacteria and microorganisms in tap water are disinfected to reduce plant diseases and insect pests; the hydroponics and mist cultivation are alternately started at intervals, and the hydroponics can enable the plant roots to obtain sufficient water and nutrients, while the mist cultivation provides sufficient oxygen for the plant roots to breathe and will not be overly soaked, avoiding the occurrence of root rot and oxygen deficiency phenomena. The present invention can be used in fields such as soilless cultivation, urban agriculture, and horticultural planting, can effectively improve the growth speed and quality of plants, reduce the occurrence of diseases and insect pests, and can achieve efficient planting under limited space conditions.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The present invention belongs to the field of plasma nitrogen fixation, and more specifically, relates to an integrated intelligent plasma water mist cultivation system. Background Art

[0002] With the continuous development of agriculture, people have higher and higher requirements for the plant growth environment, and the traditional soil cultivation method can no longer meet the needs. Hydroponics and aeroponics, as new plant cultivation technologies, have gradually received wide attention. Hydroponics is a technology that immerses the roots of plants in water and adds an appropriate amount of nutrient solution in the water to meet the nutrients required for plant growth. Aeroponics is a technology that grows the roots of plants in the air. By atomizing water and nutrient solution into fine water droplets, and then allowing the roots of plants to absorb the required nutrients by absorbing these water droplets. These two technologies can improve the growth efficiency and yield of plants, and reduce soil and water pollution. At the same time, these technologies can also better control the plant growth environment, including light, temperature, humidity, and oxygen concentration, etc., can adapt to different climate conditions, and can be carried out indoors or outdoors, without being restricted by factors such as season, temperature, and humidity. However, these technologies still have deficiencies in terms of plant nutrition and growth rate. For example, continuous immersion in hydroponics may cause plants to lack oxygen, affecting root respiration; while the nutrients provided by aeroponics may be insufficient to meet the growth needs of plants. At the same time, a certain amount of nitrogen is also required during the growth process of plants. The use of traditional nitrogen fertilizers not only has problems such as waste and pollution, but also is not conducive to the healthy growth of plants. Therefore, how to seek a new and efficient plant growth technology is an urgent problem to be solved currently.

[0003] Low-temperature plasma nitrogen fixation technology is a new nitrogen fixation technology that uses the high energy density and high reactivity of plasma to excite and ionize nitrogen molecules to promote the fixation of nitrogen elements. Nitrogen molecules in the air are impacted by the electrons and ions of the plasma, decomposed into nitrogen atoms and nitrogen ions, and the nitrogen atoms and nitrogen ions combine with other molecules or ions to form compounds such as ammonium salts, nitrous acid, and nitrites. The compounds further react to form compounds such as urea and nitrates, which are ultimately absorbed and utilized by plants. Compared with traditional chemical and biological nitrogen fixation methods, plasma nitrogen fixation has the advantages of high efficiency, mildness, and good controllability. Compared with the traditional Haber-Bosch nitrogen fixation method, plasma nitrogen fixation has higher efficiency and lower energy consumption, and will not cause environmental impact. At the same time, plasma nitrogen fixation also produces a variety of active nitrogen and active oxygen substances, such as peroxynitrous acid, hydrogen peroxide, and hydroxyl radicals. These substances can stimulate the roots of plants and promote their growth, and at the same time have the function of sterilization and disinfection, and can inhibit plant diseases and pests. Therefore, plasma air nitrogen fixation is a potential new nitrogen fixation technology that can be applied to fields such as agriculture and environmental protection. Summary of the Invention

[0004] In view of the deficiencies of the prior art, the object of the present invention is to provide an integrated intelligent plasma water mist cultivation system, aiming to solve the problems of low space utilization rate in traditional soil cultivation methods, large pollution in fertilizer production, insufficient application of current plasma nitrogen fixation technology in water mist cultivation, and the inability of plasma nitrogen fixation to provide elements such as phosphorus and potassium necessary for plant growth.

[0005] To achieve the above object, the present invention provides an integrated plasma-activated mist preparation device, which includes a plurality of plasma discharge units, an intelligent water mist cultivation cabinet, a nitrogen fixation water tank, and a water storage tank; the nitrogen fixation water tank and the water storage tank are located at the bottom of the intelligent water mist cultivation cabinet, the plasma discharge units are fixed on the water tank cover of the nitrogen fixation water tank, and the upper layer of the intelligent water mist cultivation cabinet is distributed with plant cultivation boxes; plasma is generated by discharging through a plurality of plasma discharge units, and liquid-phase plasma active substances such as nitrates, nitrites, and ammonium salts are generated in the nitrogen fixation water tank to achieve the effect of nitrogen fixation in water; the water in the nitrogen fixation water tank is transferred to the water storage tank through a water pump for supplying water and mist to the plant cultivation boxes during the hydroponics and mist cultivation stages, providing sufficient nutrients and oxygen for plants; the entire system is intelligently controlled through the PLC control system and the liquid crystal display screen on the intelligent water mist cultivation cabinet.

[0006] The plasma discharge unit includes: an air inlet, a metal rod-shaped electrode, a glass inner wall, and a glass outer wall. The glass outer wall is a cylindrical glass tube with a sealed bottom end, having an air inlet and a fixed platform above, and a plurality of bubble holes evenly distributed below; the glass inner wall is a glass tube coaxially connected to the glass outer wall, and there is a certain gap between the glass inner wall and the glass outer wall to form a discharge area; the metal rod-shaped electrode is closely attached to the glass inner wall, and is connected to the high-voltage wire above and connected to the high-voltage pole of the power supply.

[0007] The intelligent water mist cultivation cabinet includes: a cabinet body, a plant cultivation box, a water mist cultivation circulation pipeline, an led lighting lamp, an air pump, a power supply, a PLC control system, a display screen, and a water pipe. The cabinet body is a cuboid cabinet with dimensions of 120*70*180 cm; the plant cultivation box is a semi-closed box with a planting groove for fixing and cultivating plants; the water mist cultivation circulation pipeline is a pipeline connecting the water storage tank and the plant cultivation box for the circulating flow of water and mist; the led lighting lamp is used to provide light source for plants to promote their photosynthesis; the air pump is an air pump with an air inlet and an air outlet. The air outlet is used to ventilate the plasma discharge unit to discharge the water between the glass inner wall and the glass outer wall to form a pure air discharge environment, and the air inlet is connected to the inside of the nitrogen fixation water tank to absorb the ozone and nitrogen oxides generated by the discharge and recycle them; the power supply is connected to the metal rod-shaped electrode of the plasma discharge unit to drive the discharge device; the PLC control system is used for the intelligent control of the entire system, and integrates the display and control functions into the display screen.

[0008] The nitrogen-fixing water tank includes fixing holes, a water tank cover, and a water outlet pipe. A plurality of fixing holes are provided on the water tank cover for fixing the plasma discharge unit; the water outlet pipe is used to connect to a storage water tank to transfer the water after plasma nitrogen fixation to the storage water tank.

[0009] The storage water tank includes a water inlet pipe, a water supply channel, a fog supply channel, a water pump, and an atomizer. The water inlet pipe is used to receive the nitrogen-fixed water transported by the nitrogen-fixing water tank; the water supply channel is opened during plant hydroponics to provide water rich in nitrogen elements to the plants through the water mist hydroponics circulation pipeline; the fog supply channel is opened during fog cultivation of plants, and the water in the storage water tank is atomized by the atomizer and circulated in the water mist hydroponics circulation pipeline to provide nutrients and sufficient oxygen to the roots of the plants; the water pump is used to regularly pump the water in the storage water tank into the water supply channel for plant hydroponics; the atomizer is used to atomize the water in the storage water tank and then introduce it into the fog supply channel for circulation.

[0010] Preferably, the glass outer wall of the plasma discharge unit is made of quartz glass, with a diameter of 12 mm and a length of 160 mm; preferably, the outer diameter of the air inlet of the glass outer wall is 6 mm and the length is 20 mm, and the blown gas blows out from the bubble holes between the inner wall and the outer wall of the glass; preferably, a fixing platform is provided directly below the air inlet, with a thickness of 10 mm and a diameter of 20 mm for fixing above the water tank; preferably, there are 5 rows of bubble holes below the glass outer wall, with 3 holes in each row symmetrically distributed along the circumference, and the hole diameter is 1 mm. The air-insulated dielectric barrier discharge is applied to the activated water preparation technology. A metal grounding electrode is inserted into the water, taking all the water in the nitrogen-fixing water tank as the ground electrode, and the metal rod-shaped electrode covered with quartz glass as the anode. High-volume highly active plasma is generated by discharging in the water through 15 discharge channels. On the one hand, a large amount of liquid-phase plasma active substances are directly generated in the water, and on the other hand, the gas-phase plasma active substances can be fully dissolved. In addition, the metal rod-shaped electrode in the water can be partially dissolved in the activated water generated during nitrogen fixation by the plasma discharge device, which can prevent the pH of the water from dropping too low during discharge and at the same time provide the metal elements necessary for plant growth. The plasma nitrogen-fixing device of the present invention has a small and compact structure, is easy to carry, only needs to introduce air during operation, has fast assembly, and high efficiency in replacing the discharge components. It can generate high-concentration liquid-phase active substances and perform efficient and clean nitrogen fixation, thus solving the problems that the traditional soil cultivation method cannot meet the demand for space saving, traditional nitrogen fertilizers are wasted, polluted, and not conducive to the healthy growth of plants. At the same time, the nitrogen-fixing and water mist hydroponics devices are combined with the PLC control system and the display screen and integrated into an integrated intelligent plasma water mist hydroponics system, which has the advantages of saving space, low cost, easy disassembly, and easy operation, and can cultivate various plants anytime and anywhere.

[0011] Preferably, the inner wall of the glass is made of quartz glass, with a diameter of 6 mm and a length of 140 mm, and is coaxially connected to the outer wall of the glass; preferably, the air gap between the inner wall of the glass and the outer wall of the glass is no more than 3 mm to prevent insufficient electric field strength from causing failure to discharge.

[0012] Preferably, in order to reduce the discharge voltage, the thickness of the quartz glass layer of the inner wall of the glass and the outer wall of the glass should not exceed 1 mm.

[0013] Preferably, the metal rod-shaped electrode is made of a metal material with good conductivity, such as copper, steel or tungsten, etc., with a diameter of 4 mm and a length of 160 mm, and is coaxially fixed with the inner wall of the glass. The gap between the two is tightly fitted by pouring solder. The part of the metal rod-shaped electrode above the outer wall of the glass needs to be wrapped with an insulating outer skin with a withstand voltage of more than 20 kV to prevent electric leakage and breakdown.

[0014] Preferably, there are 9 plasma discharge units, and the connection method between every three of them is in parallel.

[0015] Preferably, the power supply is a high-voltage AC power supply, the peak-to-peak voltage is controlled at about 20 kV, and the frequency is 10 kHz. Each power supply drives three parallel plasma discharge units. Preferably, the discharge form of the plasma discharge unit is dielectric barrier discharge. The metal rod-shaped electrode is connected to the high-voltage AC power supply, and the water to be treated serves as the ground electrode.

[0016] Preferably, the metal rod-shaped electrode in the water can be magnesium, zinc, iron, or a combination of several metals.

[0017] Preferably, the air pump is an air pump, the air flow rate is greater than 18 L / min, and each air pump supplies air to three plasma discharge units through a 3-in-1 interface to ensure that the air flow rate at the air inlet of each plasma discharge unit is not less than 6 L / min. Preferably, the air inlet of the air pump is connected to the inside of the nitrogen-fixing water tank to absorb ozone and nitrogen oxides generated by the discharge and recycle them, reducing ozone emissions and waste of nitrogen oxides.

[0018] Preferably, both the nitrogen-fixing water tank and the storage water tank are cube-shaped water tanks with a side length of 30 cm. The whole water tank is made of stainless steel. The water tank cover above the nitrogen-fixing water tank is made of the insulating material polytetrafluoroethylene, which is used to fix and insulate 9 plasma discharge units to provide higher activation efficiency; preferably, the tap water in the nitrogen-fixing water tank does not exceed the height of the water tank cover. Preferably, the LED lighting lamp is a full-spectrum warm white light lamp.

[0019] Preferably, the display screen is a liquid crystal touch screen.

[0020] Preferably, the diameter of the hydroponic mist circulation pipe is 2 cm, and the material is PVC plastic.

[0021] Preferably, the opening time of plant hydroponics and aeroponics is 10 minutes per hour from 8:00 am to 10:00 pm. The two cultivation methods are carried out alternately, and aeroponics starts after hydroponics. From 10:00 pm to 8:00 am the next day, the opening time of plant hydroponics and aeroponics is 3 minutes per hour, and the water supply channel and fog supply channel are closed at other times.

[0022] Preferably, the LED lighting lamp is turned on every day from 8:00 am to 10:00 pm.

[0023] Preferably, the PLC control system integrates the functions of the integrated intelligent plasma hydroponics and aeroponics system onto the display screen. The on / off, voltage magnitude, frequency, and nitrogen fixation time of the LED lighting lamp and air pump can be controlled through the display screen. In addition, the pH value and conductivity of the liquid in the water storage tank can be dynamically displayed, and the pH value and conductivity suitable for plant growth can be set. When the nitrogen-containing liquid in the water storage tank deviates from the pH and conductivity suitable for plant growth, the control switch in the water storage tank performs real-time regulation by automatically adding an appropriate amount of potassium phosphate, while supplementing the plant with the necessary phosphorus and potassium elements for growth.

[0024] Generally speaking, compared with the prior art, the above technical solutions conceived by the present invention can at least achieve the following beneficial effects.

[0025] (1) The present invention combines the plasma nitrogen fixation technology and the plant hydroponics and aeroponics technology into an integrated intelligent plasma hydroponics and aeroponics system. At the same time, it combines hydroponics and aeroponics and utilizes the respective advantages of these two cultivation methods. Hydroponics can provide sufficient water and nutrients for plant roots, while aeroponics can provide sufficient oxygen, so that the plant roots will not be over-soaked and rot, avoiding the occurrence of diseases and hypoxia.

[0026] (2) The present invention uses large-area air plasma dielectric barrier discharge in water. Only air is needed to achieve good discharge effect, and the absorption and conversion rate of nitrogen element is high. Compared with the traditional forms of discharging on the water surface such as DC needle-water and plasma jet, the present invention discharges in water through multiple discharge channels to generate highly active plasma, enabling the plasma to fully react with water, greatly improving the nitrogen fixation efficiency. The nitrogen element can be directly dissolved in water for easy absorption and utilization by plants, without the need to use traditional chemical methods for absorption. It solves the problem of uneven and insufficient gas-liquid two-phase contact in the traditional plasma liquid-phase nitrogen fixation process. The present invention realizes efficient air nitrogen fixation by using a plasma discharge unit, fixes the nitrogen in the air into a form that can be utilized by plants, and directly dissolves the fixed nitrogen element in tap water for easy absorption and utilization by plants, thereby improving the nutrient utilization efficiency of plants, effectively promoting plant growth, enhancing the plant's resistance to diseases and pests, reducing the use of chemical fertilizers and pesticides, with low cost, being green and environmentally friendly, and having high energy utilization efficiency, without causing pollution to the environment.

[0027] (3) The present invention conducts intelligent control on the entire hydroponic mist system through PLC automatic control, alternately turns on and off the cycles of hydroponics and mist cultivation, and the system operation is simple and basically fully automated. It realizes the automatic opening and closing of hydroponics and mist cultivation according to the set time intervals, thereby optimizing the plant growth environment. At the same time, the PLC control system can measure the pH value and conductivity of the nitrogen-containing liquid in the water storage tank in real time through the pH probe and conductivity probe in the water storage tank and feedback the results to the display screen. When deviating from the pre-set range of pH value and conductivity suitable for plant growth, the potassium phosphate solution configured outside the water storage tank is automatically added to the water storage tank through a small water pump to make it return to the range suitable for plant growth, while supplementing the plant with the necessary phosphorus and potassium elements for growth, overcoming the deficiency that traditional plasma nitrogen fixation can only provide nitrogen fertilizer for plants.

[0028] (4) The present invention realizes the efficient utilization of vertical space. The entire system adopts a vertical layout. By vertically fixing the plasma nitrogen fixation device and the 4×3 plant cultivation box in the intelligent water mist cultivation cabinet, and both hydroponics and fog cultivation adopt a vertical circulation and flow mode, only 120×70 cm of horizontal space is utilized to achieve efficient plasma nitrogen fixation and planting processes, greatly saving horizontal land occupation compared with traditional soil cultivation. The present invention adopts intelligent regulation and control, which can avoid soil continuous cropping obstacles, weather disasters, and pests and diseases, and there is no heavy metal pollution and no need to apply pesticides, ensuring the quality safety and cleanliness of vegetables. The plasma discharge of this system can also disinfect bacteria in water, effectively reducing plant pests and diseases caused by water pollution. Metal ground electrodes inserted into the water, such as iron, magnesium, zinc, etc., can be partially dissolved in the activated water during plasma discharge, effectively preventing the pH from dropping too low and causing adverse effects on plants. At the same time, the dissolved metal ions can provide trace metal elements for plants to promote their growth. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 FIG. is a schematic structural diagram of the integrated intelligent plasma water mist cultivation system provided by an embodiment of the present invention;

[0030] Figure 2 FIG. is a schematic structural diagram of the plasma discharge unit provided by an embodiment of the present invention;

[0031] Figure 3 FIG. is a schematic structural diagram of the intelligent water mist cultivation cabinet provided by an embodiment of the present invention;

[0032] Figure 4 FIG. is a schematic structural diagram of the nitrogen fixation water tank provided by an embodiment of the present invention;

[0033] Figure 5 FIG. is a schematic structural diagram of the water storage tank provided by an embodiment of the present invention;

[0034] Figure 6 FIG. is a data graph of lettuce grown for 20 days under different cultivation methods;

[0035] In all the accompanying drawings, the same reference numerals are used to denote the same elements or structures, where: 1. Plasma discharge unit, 101. Air inlet, 102. Fixed table, 103. Metal rod-shaped electrode, 104. Inner glass wall, 105. Outer glass wall, 106. Bubble holes, 107. High-voltage electrode; 2. Intelligent water mist cultivation cabinet, 201. Plant cultivation box, 202. Planting trough, 203. Water mist cultivation circulation pipeline, 204. LED lighting lamp, 205. Air pump, 206. Power supply, 207. PLC control system, 208. Display screen, 209. Water pipe, 210. Cabinet body; 3. Nitrogen-fixing water tank, 301. Fixed holes, 302. Water tank cover, 303. Water outlet pipe; 4. Water storage tank, 401. Water inlet pipe, 402. Water supply pipeline, 403. Mist supply channel, 404. Water pump, 405. Atomizer. Detailed implementation manners

[0036] In order to make the objectives, technical solutions and advantages of the present invention more clear and understandable, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0037] Plasma nitrogen fixation is a process of using plasma technology to convert nitrogen gas into nitrogen compounds that can be used for plant growth. In this process, nitrogen gas is exposed to high-energy plasma, which causes the bonds of nitrogen molecules to break and combine with hydrogen or oxygen to form ammonium, nitrate, or nitrite ions. These compounds can be absorbed by plant roots and used by plants as nutrients. Hydroponics is a plant cultivation technique based on placing plants in water and providing essential nutrients, rather than using soil as the growth medium for plants. Hydroponics usually involves placing plant roots in water with appropriate fertilizers and nutrients added for plants to absorb. Aeroponics usually uses water and nutrient solutions to spray the roots of plants through a nebulizer. This technique can increase the absorption efficiency of plants by directly providing water and nutrients to the roots of plants, and at the same time, the humidity of plants can be maintained by the water vapor generated by the nebulizer. Hydroponics and aeroponics techniques are usually used for indoor plant cultivation, especially in the case of no soil or land, such as indoor planting by urban residents. These techniques can also be used for scientific research on aspects such as plant growth and root development, but both techniques also have certain disadvantages and deficiencies. For example, hydroponics may cause plants to lack oxygen, and the nutrient supply of aeroponics is somewhat lacking, etc.

[0038] Based on the above principles, the embodiments of the present invention provide an integrated intelligent plasma water mist cultivation system, as Figure 1As shown, it includes a plasma discharge unit 1, an intelligent water mist cultivation cabinet 2, a nitrogen-fixing water tank 3, and a water storage tank 4;

[0039] Among them, as Figure 2 shown, the plasma discharge unit 1 includes an air inlet 101, a fixing table 102, a metal rod-shaped electrode 103, a glass inner wall 104, a glass outer wall 105, bubble holes 106, and a high-voltage electrode 107; except for the metal rod-shaped electrode 103, the whole plasma discharge unit 1 is made of a dielectric material, quartz glass. The air inlet 101 above is communicated with the glass outer wall 105 to discharge the water between the glass outer wall 105 and the glass inner wall 104 to provide a discharge environment, and the active gas components are blown out into the liquid to be treated through the bubble holes 106 for sufficient dissolution; the bubble holes are small holes opened on the glass outer wall 105; the metal rod-shaped electrode 103 is made of a metal with good conductivity such as copper or tungsten, and is closely attached to the glass inner wall 104 to prevent the metal rod-shaped electrode 103 from directly discharging to the glass inner wall 104; the exposed part of the metal rod-shaped electrode of the high-voltage electrode 107 needs to be wrapped with an insulating outer skin, and the metal rod-shaped electrode is connected to a high-voltage AC power supply above; the fixing table 102 is a columnar quartz glass protruding in a circle below the air inlet 101 and is used for fixing the plasma discharge unit 1.

[0040] As Figure 3As shown in the figure, the intelligent water mist cultivation cabinet 2 includes a plant cultivation box 201, a planting trough 202, a water mist cultivation circulation pipeline 203, an LED lighting lamp 204, an air pump 205, a power supply 206, a PLC control system 207, a display screen 208, a water pipe 209 and a cabinet body 210; the cabinet body 210 is used to fix the plant cultivation box 201 and the water mist cultivation circulation pipeline 203, and the LED lighting lamp 204, the air pump 205, the power supply 206, the PLC control system 207 and the display screen 208 are all located therein. The plant cultivation box 201 is a 3-row hollow plastic box located above the cabinet body, with a volume of 10L; there are 4 plant cultivation boxes arranged in parallel in each row, and the boxes are connected by the water pipe 209. The plant cultivation box 201 is fixed in the cabinet body 210 through the water mist cultivation circulation pipeline 203; the bottommost plant cultivation box is 60 cm away from the bottom of the cabinet body, and the distance between each row of plant cultivation boxes is 20 cm. The planting trough 202 is a sponge disc with a diameter of 5 cm and a height of 2 cm, located above the plant cultivation box 201, and can fix the plant stem and expose the root in the plant cultivation box. The water mist cultivation circulation pipeline 203 is a pipeline connecting each plant cultivation box, fixed on the inner wall of the cabinet body 210 and connected to the plant cultivation box 201, which can ensure the circulation and collection of the nitrogen-fixing water and mist during hydroponics and mist cultivation. The LED lighting lamp 204 is a full-spectrum warm white light lamp, and each LED lighting lamp is fixed 20 cm above the plant cultivation box and fixed in the cabinet body 210 through a bracket to provide sufficient light for the plants in the plant cultivation box. The air pump 205 is 3 air pumps arranged side by side, placed at the bottom of the cabinet body 210. The air outlet of each air pump is connected to the air inlet 101 of the plasma discharge unit through a 3-in-1 interface, and the air inlet of the air pump is connected to the inside of the nitrogen-fixing water tank 3 to absorb the ozone and nitrogen oxides generated by plasma discharge and recycle them, reducing ozone emissions and promoting the dissolution of nitrogen oxides. The power supply 206 is 3 high-voltage AC power supplies arranged side by side, with a peak-to-peak voltage of 20 kV and a frequency of 10 kHz. Each power supply drives three parallel plasma discharge units. The PLC control system 207 is installed on the right inner wall of the intelligent water mist cultivation cabinet, which can conduct macroscopic control over the entire system and integrate the control functions onto the liquid crystal touch screen 208. The liquid crystal touch screen 208 is installed on the right outer wall of the intelligent water mist cultivation cabinet 2, 150 cm away from the bottom surface of the cabinet body 210, and is connected to the PLC control system 207. It can display in real time parameters such as the conductivity and pH value of the liquid in the water storage tank 4, and can change the voltage, frequency, switch of the power supply and the switch of the air pump by touching the screen.

[0041] As Figure 4As shown in the figure, the nitrogen fixation water tank 3 includes fixing holes 301, a water tank cover 302 and a water outlet pipe 303, and is located at the bottom of the cabinet 210. The water tank cover 302 is made of the insulating and high-temperature resistant material polytetrafluoroethylene, is located above the nitrogen fixation water tank 3, and has 9 fixing holes 301 that are coaxial with and penetrate up and down the fixing platform 102 of the plasma discharge unit. The fixing holes 301 have the same diameter as the fixing platform 102 to clamp and fix the plasma discharge unit 1; a water pump is installed at the water outlet pipe 303, which can regularly transport the liquid in the nitrogen fixation water tank to the storage water tank 4.

[0042] As Figure 5 shown in the figure, the storage water tank 4 includes a water inlet pipe 401, a water supply pipe 402, a fog supply channel 403, a water pump 404 and an atomizer 405, and is located on the right side of the nitrogen fixation water tank 3. The water inlet pipe 401 is connected to the water outlet pipe 303 of the nitrogen fixation water tank 3. When the water in the nitrogen fixation water tank 3 is fixed with nitrogen, the activated water after nitrogen fixation flows into the water inlet pipe 401 through the water outlet pipe 303 and is stored in the storage water tank 4, and is used for hydroponics and fog cultivation of plants. The water supply pipe 402 is located inside the storage water tank 4, and a timing water pump is installed below and is turned on during the hydroponics of plants, from 10 minutes before each hour from 8:00 to 22:00 every day and 3 minutes before each hour from 22:00 to 8:00 the next day, and can be adjusted according to the types of cultivated plants. The nitrogen-containing liquid passes through the hydroponics and fog cultivation circulation pipe 203 and flows through the plant cultivation box 201 to provide sufficient water and nitrogen elements for the plants, and then is recycled back to the storage water tank 4 through the water supply pipe 402. The principle of the fog supply channel 403 is similar to that of the water supply pipe 402. An atomizer is installed below and the atomized water vapor is pumped into the plant cultivation box 201 through the hydroponics and fog cultivation circulation pipe 203 to provide part of the nutrients and the oxygen necessary for root respiration of the plants. The opening time of the fog supply channel 403 is after the water supply channel is closed, and it is opened for 10 minutes every hour between 8:00 and 22:00 and then closed, and opened for 3 minutes every hour between 22:00 and 8:00 the next day and then closed. The water inlet of the water pump 404 is located inside the storage water tank 4, and the water outlet is connected to the lower port of the water supply channel. When the hydroponics of plants is turned on, the timing switch automatically opens and starts the water pump 404 to pump the water fixed with nitrogen by plasma in the storage water tank 4 into the hydroponics and fog cultivation circulation pipe 203 and flow into the plant cultivation box to contact the plant roots. The fog outlet of the atomizer 405 is connected to the lower end of the fog supply channel 403. During the fog cultivation stage, the water in the storage water tank is atomized and introduced into the fog supply channel for circulation, and the oxygen supply and nitrogen supply for the plant roots are completed in the plant cultivation box.

[0043] When air is input between the outer glass wall and the inner glass wall through an air pump, the liquid to be processed between the two will discharge from the bubble holes, thus maintaining a discharge environment of pure air between the outer glass wall and the inner glass wall. When the device is connected to an air pump and a high-voltage alternating voltage is applied to the metal rod-shaped electrode, at this time, an insulating dielectric barrier discharge is formed between the metal rod-shaped electrode - inner glass wall - air - outer glass wall - liquid to be processed. Uniform blue-violet discharge filaments will be formed between the outer glass wall and the inner glass wall and extend into the water through the discharge channels formed by the bubble holes, directly discharging to the water surface, which improves the nitrogen fixation efficiency. The metal rod-shaped electrode is connected to the high-voltage pole, and the liquid to be processed acts as the ground electrode. The active components generated by the ionization of air during plasma discharge are blown into the water from the bubble holes along with the air flow and are evenly mixed, making the liquid contain active substances such as nitrates, nitrites, ammonium salts, peroxynitrous acid, hydrogen peroxide, singlet oxygen, etc., which can promote plant growth, provide sufficient nutrient elements for plants, and at the same time can play a certain role in sterilization and disinfection. As the voltage increases, the discharge will be significantly enhanced, generating more active substances, and the temperature rise will also be higher. Considering the overall voltage resistance of the device and the power amplifier of the power supply, the actually adopted voltage is an alternating voltage with a peak-to-peak value of 20 kV and a frequency of 10 kHz.

[0044] The materials of the inner glass wall 104 and the outer glass wall 105 are designed as quartz glass, but it is not limited to this material and can also be made of other media with good insulation.

[0045] The number of the plant incubators 201 includes but is not limited to 12, and the number of the planting grooves on each plant incubator includes but is not limited to 3, and can be flexibly selected according to actual needs.

[0046] In the setting of the above-mentioned plasma discharge unit 1, by using the method of mixing plasma bubbles with water, the dissolution of plasma gas-phase active substances and the conversion into liquid-phase active substances are promoted, ensuring that the active substances generated by air plasma are completely fused with water to form activated water, which improves the efficiency of plasma nitrogen fixation and reduces energy consumption. To ensure that the water between the inner glass wall and the outer glass wall can be completely discharged, the number of the bubble holes should not be too many, and the diameter should be controlled within 2 mm.

[0047] Specifically in this embodiment, the nitrogen-fixing water tank should also include a metal ground electrode directly connected to the surface of the tank body, so that the entire tank body constitutes the potential of the ground electrode, enabling water to participate in the discharge process of the plasma discharge unit 1 as the role of the ground electrode. The material of the metal ground electrode can be iron, zinc or magnesium, and its functions also include: Plasma discharge will cause the pH value of the water in the nitrogen-fixing water tank 3 to decrease. The added metal ground electrode can partially dissolve in water with a lower pH, appropriately increase the pH, and ensure that the pH value of the water is within the suitable pH range for plants. In addition, after the metal ground electrode dissolves into metal elements, it can also provide the trace elements necessary for plant growth, avoiding poor plant growth caused by lack of trace elements. The peak-to-peak value of the current flowing through the entire discharge device is 100 - 150 mA. A current-limiting device can be set between the nitrogen-fixing water tank 3 and the liquid to be treated, and the resistance value of the current-limiting device is 1 MΩ - 5 MΩ. The current-limiting device can effectively maintain the stability of the dielectric barrier discharge and prevent excessive fluctuations in the device voltage and current.

[0048] In the water storage tank 4 of this embodiment, a pH probe and a conductivity probe are also provided, which can real-time measure the pH value and conductivity of the liquid in the water storage tank and feedback the results to the display screen interface. The outside of the water storage tank is connected to a liquid storage box containing a configured 1 mmol / L potassium phosphate solution and a small water pump connecting the liquid storage box and the inside of the water storage tank. Users can preset a range of pH value and conductivity suitable for the growth of the plants to be planted on the display screen. After the pH and conductivity of the nitrogen-containing solution in the water storage tank deviate from this range, the small water pump automatically adds potassium phosphate solution to the water storage tank slowly for real-time adjustment under the control of the PLC control system, so that the pH value and conductivity of the solution return to the range suitable for plant growth. At the same time, the addition of potassium phosphate also provides the necessary phosphorus and potassium elements for plant growth, ensuring the nutrient supply of various elements in the plant leaves and roots.

[0049] In the present invention, the volume of the nitrogen-containing solution that can be prepared in the nitrogen-fixing water tank at one time is 20 L, the initial value of the preparation time is 3 hours, and users can freely set the nitrogen-fixing time according to the types of plants to be planted. The longer the time, the higher the content of nitrogen elements in the water. When the nitrogen-fixing time is 3 hours, the content of nitrogen elements in the water is above 2 mmol / L. Users can control the flow rate during hydroponics and aeroponics on the display screen. After the liquid in the water storage tank is recycled for 7 days, it is necessary to perform plasma nitrogen fixation again in the nitrogen-fixing water tank and replace the nitrogen-containing solution in the water storage tank to prevent the accumulation of harmful substances generated by plant metabolism.

[0050] Perform a water and mist cultivation test on the nitrogen-containing solution prepared by the plasma discharge unit provided in the embodiment of the present invention, and the results are as Figure 6It shows that when the nitrogen fixation time of the plasma nitrogen fixation device provided by the embodiment of the present invention is 3 hours each time and the water mist-cultured lettuce is 20 days old, compared with directly culturing lettuce with tap water, the fresh weight, plant height, leaf length, and root length are increased by 48.2%, 39.5%, 43.7%, and 37.2% respectively, proving that the nitrogen fixation solution prepared by this system has a good promoting effect on the growth of plants.

[0051] The usage method of the integrated intelligent plasma water mist-culturing system provided by the embodiment of the present invention includes the following steps:

[0052] 1. Before plasma nitrogen fixation, first install the overall device and add 20 L of tap water to the nitrogen fixation water tank. Connect the power plug of the system to a 220V power supply. Connect the air pump to the air inlet of the plasma discharge unit and adjust the air volume so that the air flowing through each discharge unit is not less than 6 L / min. Fix the stem of the plant to be cultivated in the planting groove by a sponge disc, and let the root hang naturally above the plant cultivation box.

[0053] 2. Set the system parameters through the display screen, turn on the LED lighting lamp and the power supply, and adjust the peak-to-peak voltage of the power supply to about 20 kV and the frequency to about 10 kHz. Set the nitrogen fixation time, with an initial value of 3 hours, which can be adjusted according to the cultivated plants. Through the display screen, the pH value and conductivity range of the nitrogen-containing solution in the water storage tank can be set to ensure that it is within the range suitable for plant growth. When deviating from this range, the PLC control system will automatically add an appropriate amount of potassium phosphate to the water storage tank for adjustment.

[0054] 3. After each nitrogen fixation is completed in the nitrogen fixation water tank, the nitrogen-containing liquid inside will be pumped into the water storage tank by a water pump. The prepared nitrogen fixation solution can be stored for a long time at room temperature and the nitrogen element content will not decrease. After clicking "start water mist-culturing" on the display screen, the hydroponics and mist-culturing of the plants are controlled by opening and closing the water supply channel and the fog supply channel at the set time respectively. After 7 days of water mist-culturing, it is necessary to replace the tap water for nitrogen fixation again and transfer it to the water storage tank for water mist-culturing.

[0055] 4. After the water mist-culturing of the plants is completed, harvest the plants and a new batch of crops can be replaced. This integrated intelligent plasma water mist-culturing system fully combines the advantages of plasma nitrogen fixation, hydroponics, and mist-culturing, and is intelligently regulated through the PLC control system. This system can be used in multiple cycles and will not cause pollution to the environment, meeting the requirements of green energy conservation and environmental protection under the dual-carbon background.

[0056] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.

[0057] It is easy for those skilled in the art to understand that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention should be included within the protection scope of the present invention.

Claims

1. Integrated intelligent plasma water mist cultivation system, characterized in that, It includes multiple plasma discharge units (1), an intelligent water mist cultivation cabinet (2), a nitrogen-fixing water tank (3), and a water storage tank (4); the nitrogen-fixing water tank (3) and the water storage tank (4) are located at the bottom of the intelligent water mist cultivation cabinet (2), the multiple plasma discharge units (1) are fixed on the water tank cover of the nitrogen-fixing water tank (3), and plant cultivation boxes are distributed in the upper layer of the intelligent water mist cultivation cabinet (2); plasma is generated by the discharge of the multiple plasma discharge units (1), and liquid-phase plasma active substances are generated in the nitrogen-fixing water tank (3) to achieve the effect of nitrogen fixation in water; after the water in the nitrogen-fixing water tank (3) is transferred to the water storage tank (4), it is used to supply water and mist to the plant cultivation boxes during the hydroponics and mist cultivation stages, providing nutrients and oxygen for the plants; The intelligent water mist cultivation cabinet also conducts intelligent regulation and control of the entire system; The plasma discharge unit (1) includes: an air inlet (101), a fixed platform (102), a metal rod-shaped electrode (103), a glass inner wall (104), and a glass outer wall (105). The glass outer wall (105) is a cylindrical glass tube with a sealed bottom end. The glass inner wall (104) is made of an insulating medium, with an air inlet (101) and a fixed platform (102) above, and multiple bubble holes (106) evenly distributed below. The air inlet (101) is connected to the glass outer wall (105); the glass inner wall (104) is coaxially connected to the glass outer wall (105), and a preset gap is left between the two to form a discharge area; the metal rod-shaped electrode (103) is closely attached to the glass inner wall (104) and is connected to the high-voltage pole of the power supply above. When a high-voltage alternating voltage is applied to the metal rod-shaped electrode (103), an insulating dielectric barrier discharge is formed between the metal rod-shaped electrode (103) - glass inner wall (104) - air - glass outer wall (105) - the liquid to be treated, and uniform blue-violet discharge filaments are formed between the glass outer wall (105) and the glass inner wall (104), and extend into the water through the discharge channels formed by the bubble holes.

2. The integrated intelligent plasma water mist cultivation system according to claim 1, wherein The intelligent water mist cultivation cabinet (2) includes: a plant cultivation box (201), a water mist cultivation circulation pipeline (203), an LED lighting lamp (204), an air pump (205), a power supply (206), a PLC control system (207), a display screen (208), a water pipe (209), and a cabinet body (210); the plant cultivation box (201) is a semi-closed box with a planting groove (202) for fixing and cultivating plants; the water mist cultivation circulation pipeline (203) is a pipeline connecting a water storage tank (4) and the plant cultivation box (201) for the circulating flow of water and mist; the LED lighting lamp (204) is used to provide light source for plants to promote their photosynthesis; the air pump (205) is an air pump with an air inlet and an air outlet, and the air outlet is used to ventilate the plasma discharge unit (1) to discharge the water between the glass inner wall (104) and the glass outer wall (105) to form a pure air discharge environment, and the air inlet is connected to the inside of the nitrogen fixation water tank (3) to absorb the ozone and nitrogen oxides generated by the discharge and recycle them; the power supply (206) is connected to the metal rod-shaped electrode (103) of the plasma discharge unit (1); the PLC control system (207) is used for the intelligent control of the whole system and integrates the display and control functions on the display screen (208); the water pipe (209) is used for connecting the plant cultivation boxes (201) in pairs to enable water and mist to flow between the plant cultivation boxes (201) during the hydroponics and mist cultivation stages.

3. The integrated intelligent plasma water mist cultivation system according to claim 2, characterized in that, The nitrogen fixation water tank (3) includes fixing holes (301), a water tank cover (302), and a water outlet pipe (303). The water tank cover (302) is provided with a plurality of fixing holes (301) for fixing the plasma discharge unit (1); the water outlet pipe (303) is used for connecting the water storage tank (4) to transfer the water after plasma nitrogen fixation to the water storage tank (4).

4. The integrated intelligent plasma water mist cultivation system according to claim 3, wherein, The water storage tank (4) includes a water inlet pipe (401), a water supply channel (402), a mist supply channel (403), a water pump (404), and an atomizer (405). The water inlet pipe (401) is used to receive the nitrogen-fixed water transported by the nitrogen fixation water tank (3); the water supply channel (402) is opened during the hydroponics of plants to provide nitrogen-rich water for plants through the water mist cultivation circulation pipeline (203); the mist supply channel (403) is opened during the mist cultivation of plants to atomize the water in the water storage tank (4) through the atomizer (405) and circulate it in the water mist cultivation circulation pipeline (203) to provide nutrients and sufficient oxygen for the roots of plants; the water pump (404) is used to regularly pump the water in the water storage tank (4) into the water supply channel (402) for the hydroponics of plants; the atomizer (405) is used to atomize the water in the water storage tank (4) and then introduce it into the mist supply channel (403) for circulation.

5. The integrated intelligent plasma water mist cultivation system according to claim 1, characterized in that, There are 9 plasma discharge units (1), and the connection mode between every 3 of them is parallel.

6. The integrated intelligent plasma water mist cultivation system according to claim 4, characterized in that, The switching between the hydroponics and mist cultivation modes is controlled by the PLC control system (207).

7. The integrated intelligent plasma water mist cultivation system according to claim 4, characterized in that A pH probe and a conductivity probe are also arranged in the water storage tank (4) for measuring the pH value and conductivity of the liquid in the water storage tank (4) in real time.

Citation Information

Patent Citations

  • Leaf vegetable water planting system and method of low-temperature plasma assisted nutrient solution

    CN115005080A

  • Three -dimensional plant soilless culture device

    CN204949003U

  • Compound cultivation system in greenhouse

    CN205305627U

  • Activated water preparation device

    CN219098838U