Plasma purification module, device, air conditioning equipment and noise control method

Abstract

This application discloses a plasma purification module, device, air conditioning equipment, and noise control method, relating to the field of air conditioning technology, and aims to solve the technical problem of significant operating noise generated by existing plasma purification modules during operation. The plasma purification module of this application includes a dielectric barrier, an electrode, and an insulating limiting member. The dielectric barrier has a through hole along its axial direction. The electrode includes a first electrode, the end of which passes through the through hole and has a gap with the hole wall. At least a portion of the insulating limiting member is located within the gap. The insulating limiting member has a limiting through hole along its own axial direction, the end of which passes through the limiting through hole. The insulating limiting member abuts against the hole wall to limit the position of the first electrode relative to the dielectric barrier. This application can reduce the operating noise generated by the plasma purification module.

Description

Technical Field

[0001] This application relates to the field of air conditioning technology, specifically to a plasma purification module, device, air conditioning equipment, and noise control method. Background Technology

[0002] As people's living standards improve, their demands for indoor environments are also increasing. Common methods to improve indoor environments include closing windows to block urban noise pollution and using air conditioning to regulate indoor temperature and humidity to create a comfortable indoor space. In addition, people are beginning to pursue clean and healthy environments, placing increasing emphasis on the need for indoor microbial purification.

[0003] Currently, air conditioning equipment in related technologies incorporates plasma air purification devices within the indoor unit. These devices include plasma purification modules that utilize the ability to discharge and ionize air to generate large amounts of air-purifying plasma, thus meeting people's needs for indoor comfort and air purification. However, the plasma purification modules generate noticeable operating noise during operation, which may cause discomfort to occupants.

[0004] Therefore, how to reduce the operating noise generated by the plasma purification module during operation has become a technical problem that needs to be solved. Summary of the Invention

[0005] The main objective of this application is to provide a plasma purification module, device, air conditioning equipment, and noise control method, which aims to solve the technical problem of operating noise generated by existing ion purification modules during operation.

[0006] To achieve the above objectives, in a first aspect, this application provides a plasma purification module, which includes a plasma generator. The plasma generator includes a dielectric barrier, an electrode, and an insulating limiting member. The dielectric barrier has a through hole along the axial direction. The electrode includes a first electrode, the end of which passes through the through hole and has a gap with the hole wall.

[0007] At least a portion of the insulating limiting member is located within the gap. The insulating limiting member has a limiting through hole along its own axial direction. The end of the first electrode passes through the limiting through hole. The insulating limiting member abuts against the hole wall of the through hole to limit the position of the first electrode relative to the dielectric barrier.

[0008] The beneficial effects of this application are as follows: By setting up the insulating limiting member, since the end of the first electrode passes through the limiting through hole of the insulating limiting member, and the insulating limiting member abuts against the hole wall, the position of the first electrode relative to the dielectric barrier member is limited. This insulating limiting member helps to confine the first electrode to the central axis of the dielectric barrier member, thereby ensuring the uniformity of the air layer thickness between the first electrode and the hole wall, and reducing the operating noise of the plasma purification module caused by uneven discharge. Furthermore, the insulating limiting member also limits the vibration amplitude of the first electrode during the operation of the plasma purification module, thereby preventing collisions with the quartz tube and further reducing the operating noise of the plasma purification module caused by the vibration of the first electrode.

[0009] Based on the above technical solution, the following improvements can be made to this application.

[0010] Furthermore, the first electrode has a linear structure, and the shape of the through hole is the same as the shape formed by the radial contour of the first electrode; when the insulating limiting member abuts against the hole wall of the through hole, the first electrode is located on the center line of the through hole.

[0011] Furthermore, the centerline of the limiting through hole coincides with the centerline of the through hole, and the geometric center of the first electrode is located on the centerline of the limiting through hole.

[0012] Furthermore, the limiting through hole is located at the geometric center of the insulating limiting member, and / or along the axial direction of the dielectric barrier member, and at least a portion of the structure of the insulating limiting member abuts against the wall of the through hole.

[0013] Furthermore, the plasma purification module also includes a second electrode, which is disposed on the outer wall of the dielectric barrier and forms a discharge region between the first electrode and the dielectric barrier; the insulating limiting member is located outside the discharge region and at one end of the dielectric barrier adjacent to the first electrode.

[0014] Furthermore, the insulating limiting member is configured such that, during the process of the end of the first electrode passing through the limiting through hole, at least a portion of the structure located within the gap undergoes elastic deformation and abuts against the through hole and the first electrode.

[0015] Furthermore, the insulating limiting member includes a flexible member having the limiting through hole, and the end of the flexible member has an elastic abutment portion;

[0016] The elastic abutment portion is located within the gap and is configured to elastically deform toward one side of the hole wall during the process of the end of the first electrode passing through the limiting through hole, so as to clamp onto the radial outer wall of the first electrode and abut against the hole wall of the through hole.

[0017] Furthermore, the diameter of the limiting through hole at the elastic abutment portion is smaller than the wire diameter of the first electrode.

[0018] Furthermore, the outer diameter of the elastic contact portion is larger than the wire diameter of the first electrode and smaller than the diameter of the through hole.

[0019] Furthermore, along the axial direction of the medium blocking member, the length of the elastic abutment portion is less than half the length of the flexible member.

[0020] Furthermore, the flexible member also includes a connecting portion, the elastic abutting portion being connected to the side of the connecting portion facing the axial center of the medium blocking member, and the elastic abutting portion protruding from the connecting portion on the side facing the center line of the limiting through hole.

[0021] Furthermore, the insulating limiting member also includes a limiting sleeve, which is connected to the end of the flexible member away from the elastic abutment portion and abuts against the end face of the medium blocking member.

[0022] Furthermore, a portion of the flexible component is configured such that, during the process of the end of the first electrode passing through the limiting through hole, it undergoes elastic deformation along the axial direction of the dielectric barrier and is drawn into the through hole to form the elastic abutment portion.

[0023] Furthermore, the plasma purification module also includes a boost power supply, which is electrically connected to the electrode.

[0024] Secondly, this application provides a plasma purification device, which includes a housing and a plasma purification module as described in any of the preceding claims, wherein a portion of the structure of the plasma purification module is supported outside the housing.

[0025] Thirdly, this application provides an air conditioning device, which includes an indoor unit. The indoor unit has a casing, a fan, and a plasma purification device as described above. The casing has an air duct, and the plasma purification device and the fan are both located within the air duct.

[0026] Fourthly, this application provides a noise control method for an air conditioning device, applied to the air conditioning device described above, the noise control method comprising:

[0027] Receive air purification commands;

[0028] Determine whether the fan in the indoor unit of the air conditioning equipment is turned on;

[0029] If the fan is on, the plasma purification device in the indoor unit is activated so that the noise generated by the fan masks the operating noise of the plasma purification device.

[0030] If the fan is in the off state, the plasma purification device shall be started after the fan is turned on.

[0031] Furthermore, after the plasma purification device is activated, the noise control method further includes:

[0032] Adjust the fan speed so that the frequency band of the noise generated by the fan matches the frequency band of the operating noise of the plasma purification device.

[0033] Furthermore, when the fan is turned on, the indoor unit can operate in cooling mode, heating mode, air supply mode, or dehumidification mode.

[0034] Furthermore, the step of starting the fan and then activating the plasma purification device includes:

[0035] The plasma purification device is started after the fan has been running for a preset time.

[0036] Furthermore, after the plasma purification device is activated, the noise control method further includes:

[0037] Upon receiving a command to stop air purification, the plasma purification device is shut down.

[0038] Fifthly, this application provides a noise control device applied to an air conditioning unit, the air conditioning unit including an indoor unit, the noise control device comprising:

[0039] The receiving module is used to receive air purification commands;

[0040] The judgment module is used to determine whether the fan in the indoor unit is turned on;

[0041] The processing module is used to activate the plasma purification device in the indoor unit after the fan is turned on, so that the noise generated by the fan can cover the working noise of the plasma purification device, or to turn on the fan and then activate the plasma purification device when the fan is turned off.

[0042] Sixthly, this application provides an air conditioning device, which includes a memory, a processor, a fan, and a plasma purification device. The memory stores a computer program, and when the processor executes the computer program, it is used to control the operating noise of the plasma purification device using the noise control method described in any of the preceding claims.

[0043] In a seventh aspect, this application provides a computer-readable storage medium storing computer-executable instructions, which, when executed by a processor, implement the noise control method as described in any of the preceding claims.

[0044] The plasma purification device, air conditioning equipment, and noise control method of this application have the beneficial effects of the aforementioned plasma purification module, which will not be elaborated further here. Attached Figure Description

[0045] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0046] Figure 1 This is a partial schematic diagram of a plasma air purification module provided in related technologies;

[0047] Figure 2 A partial schematic diagram of a plasma air purification module provided in an embodiment of this application;

[0048] Figure 3 This is a schematic diagram of the structure of a plasma air purification module provided in an embodiment of this application;

[0049] Figure 4 for Figure 2 A schematic diagram of the insulating limiting component before elastic deformation;

[0050] Figure 5 This is an internal schematic diagram of an insulating limiting member provided in an embodiment of this application;

[0051] Figure 6 for Figure 5 A schematic diagram of the insulating limiting component in the middle from a first-view perspective;

[0052] Figure 7 for Figure 5 A schematic diagram of the insulating limiting component in the middle from a third-person perspective;

[0053] Figure 8 An assembly diagram of another insulating limiting member provided in this application embodiment within a dielectric barrier member;

[0054] Figure 9 for Figure 8 A schematic diagram of the insulating limiting component from another perspective;

[0055] Figure 10 This is a schematic diagram of the structure of a plasma purification device provided in an embodiment of this application;

[0056] Figure 11 This application provides an internal schematic diagram of an indoor unit according to an embodiment of the present application.

[0057] Figure 12 This is a flowchart illustrating a noise control method for an air conditioning device provided in an embodiment of this application.

[0058] Explanation of icon numbers:

[0059] label name label name 100 Plasma purification module 110 plasma generator 111 Medium blocking component 1111 Through hole 112 First electrode 113 Insulating limiter 1131 Limiting through hole 1132 Flexible components 1133 Elastic abutment part 1134 Connection part 1135 Limiting sleeve 114 Second electrode 115 gap 120 Boost power supply 200 Plasma purification device 210 case 220 Filter element 300 insulating tube 400 internal electrode 600 Indoor unit 610 chassis 611 Air duct 620 Fan Detailed Implementation

[0060] The terminology used in the implementation section of this application is for the purpose of explaining specific embodiments of the application only, and is not intended to limit the application.

[0061] High voltage generally refers to voltage levels exceeding 1KV, or it can also refer to voltages above 250V relative to ground.

[0062] Currently, air conditioning equipment is widely used in people's daily lives. As described in the background art, in order to simultaneously meet the needs of indoor comfort and purification, related technologies add a plasma air purification module to the indoor unit of the air conditioning equipment. This allows the air conditioning equipment to regulate the indoor temperature and humidity while simultaneously generating plasma through the discharge of the plasma air purification module to ionize the air, which then comes into contact with indoor microorganisms, thus achieving the purification of indoor microorganisms.

[0063] Dielectric barrier discharge (DBD) is currently a relatively effective form of discharge capable of generating plasma and has been widely used in plasma air purification modules. DBD primarily involves placing an insulating dielectric between two discharge electrodes, forming a dielectric barrier structure. High-voltage discharge through this barrier structure ionizes the air, generating a large amount of plasma. The high-voltage power supply in the plasma air purification module can apply AC high voltage to the two discharge electrodes to achieve DBD.

[0064] The "high voltage" in a high-voltage power supply refers to a relative high voltage, not a fixed high voltage. In plasma air purification modules, the primary function of a high-voltage power supply is to boost the input voltage and output a high AC high voltage. For example, a high-voltage power supply can apply an AC high voltage of up to 2kV to two discharge electrodes to achieve dielectric barrier discharge.

[0065] When the plasma air purification module is working, it continuously generates high-frequency operating sounds during the high-voltage discharge process that breaks down the air. The frequency range of these sounds is generally between 1000-4000Hz. If the discharge is uneven, the operating sound of the plasma air purification module will also be unstable, and it will consistently and continuously generate some operating noise, which will be quite noticeable.

[0066] See Figure 1 As shown, the insulating tube 300 is generally made of quartz or other insulating materials. One end of one of the two electrodes can be inserted into the insulating tube 300 to form an inner electrode 400, which is electrically connected to the output terminal of the high-voltage power supply. Another electrode can be located outside the insulating tube 300 to form an outer electrode. In the plasma air purification module, there is an air gap between the inner electrode 400 and the inner wall of the insulating tube 300.

[0067] The causes of this air gap generally include the following two points:

[0068] The first point is the air gap created by the design. Based on the requirements of the plasma air purification module for functions such as sterilization and virus removal, when designing the dimensions of each component of the plasma air purification module, the design wire diameter of the inner electrode 400 is smaller than the design inner diameter of the insulating tube 300, which inevitably results in an air gap between the inner electrode 400 and the inner wall of the insulating tube 300.

[0069] The second point is the air gap caused by process errors. Even if the designed wire diameter of the inner electrode 400 is equal to the designed inner diameter of the insulating tube 300, the existence of process errors will still cause the designed wire diameter of the inner electrode 400 to not be exactly equal to the designed inner diameter of the insulating tube 300.

[0070] If the thickness of the air layer in the air gap between the inner electrode 400 and the inner wall of the insulating tube 300 is uneven, it will cause uneven discharge of the plasma air purification module during operation, resulting in relatively obvious working noise.

[0071] Furthermore, during the operation of the plasma air purification module, some electrical energy is converted into kinetic energy during the process of high-voltage discharge breaking down the air. This causes the output terminal of the high-voltage power supply to drive the inner electrode 400 to generate slight vibrations within the insulating tube 300. Upon touching the insulating tube 300, a stable and continuous operating noise is generated, which is vibration noise.

[0072] The operating noise generated by the plasma air purification module is all high frequency (1000-4000Hz), and the frequency range of this operating noise is in the range that the human ear is more sensitive to, which may cause discomfort to people in the room. Therefore, it is necessary to process the operating noise of the plasma air purification module.

[0073] Therefore, how to reduce the operating noise generated by the plasma purification module during operation has become a technical problem that needs to be solved.

[0074] To address this, this application provides a plasma purification module. By setting an insulating limiting component in the plasma purification module, the position of the first electrode relative to the dielectric blocking component in the plasma purification module can be limited. This reduces the operating noise generated by the plasma purification module during operation from both the source and the propagation path, thereby solving the technical problem of excessive operating noise in existing plasma purification modules.

[0075] The structure of the plasma purification module 100 of this application will be further described below with reference to the accompanying drawings.

[0076] See Figure 2 As shown, the plasma purification module 100 includes a plasma generator 110, which includes a dielectric barrier 111, electrodes, and an insulating limiting member 113. The dielectric barrier 111 has a through hole 1111 along its axial direction. The axial direction of the dielectric barrier 111 can be seen in... Figure 2 The X direction is specified. The electrode includes a first electrode 112, the end of which passes through a through hole 1111 and has a gap 115 between it and the wall of the through hole 1111. The first electrode 112 can be understood as an internal electrode in the plasma purification module 100.

[0077] At least a portion of the insulating limiting member 113 is located within the gap 115. The insulating limiting member 113 has a limiting through hole 1131 along its own axial direction, and the end of the first electrode 112 passes through the limiting through hole 1131. The insulating limiting member 113 abuts against the wall of the through hole 1111 to limit the position of the first electrode 112 relative to the dielectric barrier member 111.

[0078] By providing the insulating limiting member 113, it can fill the gap 115, which not only fixes the relative position of the first electrode 112 and the dielectric barrier member 111, but also helps to restrict the first electrode 112 on the central axis of the dielectric barrier member 111, so that the first electrode 112 is at least equal to the gap 115 in the Y direction with the through hole 1111, thus ensuring the uniformity of the air layer thickness in the gap 115 between the first electrode 112 and the through hole 1111 at least along the Y direction, so as to reduce the operating noise of the plasma purification module 100 caused by uneven discharge from the source.

[0079] Furthermore, since the insulating limiting member 113 fills the gap 115, it can also limit the vibration amplitude of the first electrode 112 during the operation of the plasma purification module 100, so as to prevent the first electrode 112 from colliding with the medium blocking member 111, and further reduce the operating noise of the plasma purification module caused by the vibration of the first electrode 112 from the propagation path.

[0080] Therefore, by providing the insulating limiting member 113, the operating noise caused by uneven discharge and vibration of the first electrode 112 can be reduced.

[0081] The dielectric barrier 111 can be a tubular structure made of quartz, polytetrafluoroethylene capillary, or other insulating materials. In this application, the molding material of the dielectric barrier 111 is not further limited. The two ends of the tubular structure are open to facilitate the formation of through holes 1111.

[0082] See Figure 3 As shown, the plasma purification module 100 also includes a second electrode 114, which is disposed on the outer wall of the dielectric barrier 111 and forms a discharge region between the second electrode 112 and the dielectric barrier 111. This allows the plasma purification module 100 to perform dielectric barrier discharge in the discharge region when an AC high voltage is applied to the first electrode 112 and the second electrode 114, generating a large amount of plasma. This plasma then contacts indoor microorganisms to purify them, and simultaneously contacts gaseous pollutants to remove them, thus purifying the indoor air. For example, gaseous pollutants may include, but are not limited to, formaldehyde and volatile organic compounds.

[0083] The insulating limiting member 113 is located outside the discharge area and at one end of the dielectric blocking member 111 adjacent to the first electrode 112, so as to limit the position of the end of the first electrode 112 in the through hole 1111, ensuring that the first electrode 112 has a uniformly thick air layer between the discharge area and the hole wall of the through hole 1111, so as to reduce the operating noise caused by uneven discharge of the plasma purification module.

[0084] Furthermore, since the insulating limiting member 113 is located outside the discharge area, it can also prevent the insulating limiting member 113 from affecting the discharge of the plasma purification module 100 in the discharge area, thereby ensuring the normal operation of the plasma purification module 100.

[0085] The second electrode 114 can be understood as the external electrode in the plasma purification module 100. The second electrode 114 and the first electrode 112 are located at both ends of the dielectric barrier 111 along the axial direction, and the end of the second electrode 114 extends towards the side of the first electrode 112 along the axial direction of the dielectric barrier 111, and has an overlapping area with the part of the first electrode 112 located in the dielectric barrier 111. The overlapping area forms a discharge area so as to realize the dielectric barrier discharge of the plasma purification module 100 in the discharge area.

[0086] It should be noted that since the overlapping area of ​​the first electrode 112 and the second electrode 114 is located within the dielectric barrier 111, the dielectric barrier 111 also overlaps with the first electrode 112 and the second electrode 114 in the overlapping area. The three form a sandwich structure of dielectric barrier of plasma purification module 100 in the overlapping area.

[0087] See Figure 3 As shown, since the second electrode 114 extends towards the first electrode 112 along the axial direction of the dielectric barrier 111, and the end of the first electrode 112 extends towards the second electrode 114 along the axial direction of the dielectric barrier 111, an overlapping region is formed. The ends of both the first electrode 112 and the second electrode 114 in their extending directions are spaced apart from the cross-section of the dielectric barrier 111. Therefore, both ends of the dielectric barrier 111 have regions where the first electrode 112 and the second electrode 114 do not completely overlap. Thus, the insulating limiting member 113 can be located in the non-completely overlapping region of the dielectric barrier 111 near the end of the first electrode 112, allowing the insulating limiting member 113 to limit the first electrode 112 while remaining outside the discharge region.

[0088] The second electrode 114 may be spirally wound around the dielectric barrier 111 along its axial direction. In other embodiments, the second electrode 114 may be disposed on the outer wall of the dielectric barrier 111 in other ways. For example, the second electrode 114 may also cover the dielectric barrier 111 along its axial direction. In this application, the arrangement of the second electrode 114 on the dielectric barrier 111 is not limited.

[0089] The molding materials for the first electrode 112 and the second electrode 114 may include, but are not limited to, copper, stainless steel, and titanium. No further limitations are made on the molding materials for the first electrode 112 and the second electrode 114.

[0090] See Figure 3As shown, the plasma purification module 100 also includes a boost power supply 120, which is electrically connected to the electrodes. The boost power supply 120 boosts the input voltage (DC), outputs a high voltage, and converts it into AC to provide AC high voltage to the first electrode 112 and the second electrode 114, thereby enabling dielectric barrier discharge in the discharge region of the plasma purification module 100. In this application, the input voltage and output high voltage of the boost power supply 120 are not further limited; specific details can be found in the relevant settings of the plasma purification module 100 on existing air conditioning equipment, and will not be elaborated upon here.

[0091] The first electrode 112 can be electrically connected to the positive terminal of the boost power supply 120, and the second electrode 114 can be electrically connected to the negative terminal of the boost power supply 120, so that under the action of the insulating limiting member 113, the vibration amplitude of the first electrode 112 in the dielectric blocking member 111 driven by the boost power supply 120 is limited.

[0092] In some embodiments, the output waveform of the boost power supply 120 can be a waveform that is compatible with (same as or similar to) a sine wave. By using this method to output pulse waveforms, the boost power supply 120 of this application will reduce the frequency of the sound generated by the plasma generator 110 breaking down the air, making the sound lower and softer, which is more acceptable to the human ear and further improves the working noise situation.

[0093] See Figure 2 As shown, in some embodiments, the first electrode 112 can be a linear structure. For example, both the first electrode 112 and the second electrode 114 can be conductive wire electrodes. The shape of the through hole 1111 is the same as the shape formed by the radial profile of the first electrode 112. For example, the radial profile of the first electrode 112 can be circular, and correspondingly, the through hole 1111 can be a circular hole. Alternatively, without affecting the operation of the plasma purification module 100, the radial profile of the first electrode 112 can be formed in other shapes, and the shape of the through hole 1111 can also change accordingly. Here, the shape formed by the radial profile of the first electrode 112 and the shape of the through hole 1111 are not limited.

[0094] When the insulating limiting member 113 abuts against the wall of the through hole 1111, the first electrode 112 is located on the center line o1 of the through hole 1111, so that the first electrode 112 can be located on the central axis of the dielectric barrier member 111 under the restriction of the insulating limiting member 113, and is relatively fixed to the dielectric barrier member 111. Taking the through hole 1111 as a circular hole as an example, when the first electrode 112 is located on the central axis of the dielectric barrier member 111, the first electrode 112 can have an equal gap 115 with the wall of the through hole 1111 in all radial directions, so as to ensure that the air layer in the gap 115 between the first electrode 112 and the wall of the through hole 1111 in the radial direction has a uniform thickness, so as to further reduce the operating noise of the plasma purification module 100 caused by uneven discharge. The radial direction of the first electrode 112 includes the direction of the dielectric barrier member 1111. Figure 2 Any direction within the plane formed by the Y and Z directions.

[0095] The centerline of the limiting through hole 1131 coincides with the centerline o1 of the through hole 1111, and the geometric center of the first electrode 112 is located on the centerline of the limiting through hole 1131, so that when at least a portion of the insulating limiting member 113 is located within the gap 115 and abuts against the hole wall of the through hole 1111, it can be located on the central axis that restricts the first electrode 112 to the dielectric blocking member 111.

[0096] When the radial contour of the first electrode 112 is circular, the limiting through hole 1131 can also be a circular hole adapted to the wire diameter of the first electrode 112. The diameter of the limiting through hole 1131 can be the same as the wire diameter of the first electrode 112, or it can be smaller than the wire diameter of the first electrode 112. This allows the end of the first electrode 112 to pass through the limiting through hole 1131, thus limiting the position of the first electrode 112 relative to the dielectric barrier 111 by the insulating limiting member 113, while also allowing for greater structural diversity in the insulating limiting member 113.

[0097] See Figure 2 As shown, the limiting through hole 1131 can be located at the geometric center of the insulating limiting member 113, so that the insulating limiting member 113 can have a good abutment effect with the hole wall of the through hole 1111 in different radial directions of the first electrode 112, so as to better limit the first electrode 112 on the central axis of the dielectric blocking member 111.

[0098] Along the axial direction of the dielectric barrier 111, at least a portion of the structure of the insulating limit member 113 abuts against the wall of the through hole 1111, so that while the insulating limit member 113 abuts against the wall of the through hole 1111, the structure of the insulating limit member 113 can be made more diverse.

[0099] Figure 4The diagram illustrates the process of the first electrode 112 passing through the limiting through hole 1131. In this diagram, the insulating limiting member 113 located within the gap 115 does not undergo elastic deformation.

[0100] See Figure 4 and combined Figure 2 As shown, in some embodiments, the insulating limiting member 113 is configured such that, during the process of the end of the first electrode 112 passing through the limiting through hole 1131, at least a portion of the structure located in the gap 115 undergoes elastic deformation and abuts against the through hole 1111 and the first electrode 112, so that when the insulating limiting member 113 fills and is locked in the gap 115, the limiting function of the insulating limiting member 113 is realized, fixing the first electrode 112 in the dielectric barrier member 111 and limiting it on the central axis of the dielectric barrier member 111, so as to reduce the working noise generated by the plasma purification module 100 during operation.

[0101] Furthermore, from Figure 4 It can be seen that a portion of the insulating limiting member 113 is located within the gap 115. When the end of the first electrode 112 has not penetrated through the insulating limiting member 113, the portion of the insulating limiting member 113 located within the gap 115 does not undergo elastic deformation, and there is a gap between it and the wall of the through hole 1111. Therefore, by allowing the insulating limiting member 113 to undergo elastic deformation during the process of the end of the first electrode 112 penetrating the limiting through hole 1131, the assembly of the insulating limiting member 113 within the dielectric barrier member 111 can be facilitated.

[0102] See Figure 4 and combined Figure 2 As shown, the insulating limiting member 113 includes a flexible member 1132 with a limiting through hole 1131, and the end of the flexible member 1132 has an elastic abutment portion 1133. The elastic abutment portion 1133 is located within the gap 115 and is configured to elastically deform towards the hole wall of the through hole 1111 during the process of the end of the first electrode 112 passing through the limiting through hole 1131, so as to clamp the radial outer wall of the first electrode 112 and abut against the hole wall of the through hole 1111, thereby causing the elastic abutment portion 1133 to be engaged within the gap 115, thereby realizing the limiting function of the insulating limiting member 113 and restricting the first electrode 112 on the central axis of the dielectric blocking member 111.

[0103] It should be noted that since the insulating limiting member 113 includes a flexible member 1132, the limiting through hole 1131 is also located on the axial direction of the flexible member 1132, and the axial direction of the flexible member 1132 is the same as the axial direction of the insulating limiting member 113. (See also...) Figure 2 The X direction.

[0104] The flexible component 1132 can be made of a flexible material that is prone to elastic deformation. For example, the flexible material can include, but is not limited to, silicone and rubber.

[0105] See Figure 4 As shown, the diameter d1 of the limiting through hole 1131 at the elastic abutment portion 1133 is smaller than the wire diameter d2 of the first electrode 112, so that there is a certain interference between d1 and d2, so that when the end of the first electrode 112 passes through the elastic abutment portion 1133, the elastic abutment portion 1133 can clamp the radial outer wall of the first electrode 112. Furthermore, as the first electrode 112 continues to pass through in the direction of the dielectric blocking member 111, the elastic abutment portion 1133 can be opened by the compression of the first electrode 112 and undergo elastic deformation towards the hole wall of the through hole 1111, and abut against the hole wall of the through hole 1111, thereby being locked in the gap 115.

[0106] It should be noted that the interference fit needs to be determined based on the diameter of the through hole 1111, the diameter d1 of the hole at the elastic abutment part 1133, the wire diameter d2 of the first electrode 112, and the deformation capacity of the elastic abutment part 1133. For example, in the design of the dimensions of the hole diameter d1 at the elastic abutment part 1133 and the wire diameter d2 of the first electrode 112, the design can be performed according to the following formula:

[0107] (d2-d1) / d2 = 10%

[0108] In this application, the size of the interference is not further limited, as long as it is ensured that the elastic contact portion 1133 can abut against the wall of the through hole 1111 after elastic deformation and clamp onto the radial outer wall of the first electrode 112.

[0109] The outer diameter d4 of the elastic contact portion 1133 is greater than the wire diameter d2 of the first electrode 112 and smaller than the aperture d3 of the through hole 1111, so as to facilitate the assembly of the flexible member 1132 in the through hole 1111.

[0110] The difference between the diameter d3 of the through hole 1111 and the outer diameter d4 of the flexible member 1132 at the elastic abutment portion 1133 is the first difference value, and the difference between the wire diameter d2 of the first electrode 112 and the diameter d1 of the limiting through hole 1131 at the elastic abutment portion 1133 is the second difference value. The first difference value is less than or equal to the second difference value, so that after the elastic abutment portion 1133 undergoes elastic deformation on the side facing the hole wall of the through hole 1111, it can clamp the radial outer wall of the first electrode 112 and abut against the hole wall of the through hole 1111.

[0111] See Figure 5As shown, along the axial direction of the medium blocking member 111, the length L1 of the elastic abutment portion 1133 is less than half the length L2 of the flexible member 1132, so as to avoid the elastic abutment portion 1133 being too long and increasing the assembly difficulty of the insulating limiting member 113 in the through hole 1111.

[0112] It should be noted that this application does not limit the minimum length L1 of the elastic abutment portion 1133, as long as it ensures that the elastic abutment portion 1133 can clamp the radial outer wall of the first electrode 112 and abut against the hole wall of the through hole 1111 after elastic deformation.

[0113] It should be noted that there can be one or more elastic abutment portions 1133. When there is only one elastic abutment portion 1133, it can be an elastic sleeve. When there are multiple elastic abutment portions 1133, the multiple elastic abutment portions 1133 can be evenly distributed along the radial direction of the flexible member 1132 at the end of the flexible member 1132. In this application, the structure and number of elastic abutment portions 1133 are not further limited.

[0114] The flexible member 1132 also includes a connecting portion 1134, and an elastic abutment portion 1133 is connected to the side of the connecting portion 1134 facing the axial center of the medium blocking member 111. The elastic abutment portion 1133 protrudes from the connecting portion 1134 on the side facing the center line of the limiting through hole 1131, so that during the process of the first electrode 112 passing through the medium blocking member 111, it can abut against the elastic abutment portion 1133 and squeeze the elastic abutment portion 1133, so that the lower elastic abutment portion 1133 is opened and elastically deformed relative to the side of the connecting portion 1134 facing the hole wall of the through hole 1111.

[0115] The connecting portion 1134 can also be a tubular structure made of elastic materials such as silicone or rubber, or non-elastic materials such as plastic. The connecting portion 1134 is coaxially connected to the elastic abutment portion 1133. The diameter of the limiting through hole 1131 in the connecting portion 1134 is larger than the wire diameter d2 of the first electrode 112, to ensure that the first electrode 112 can abut against the elastic abutment portion 1133 during the process of the first electrode 112 passing through the dielectric barrier 111. This application does not further limit the structure of the connecting portion 1134.

[0116] See Figure 5 As shown, the insulating limiting member 113 may also include a limiting sleeve 1135. The limiting sleeve 1135 is connected to the end of the flexible member 1132 away from the elastic abutment portion 1133 and abuts against the end face of the medium blocking member 111 to limit the length of the flexible member 1132 in the through hole 1111, so as to avoid the flexible member 1132 from being too long in the through hole 1111 and affecting the normal operation of plasma purification.

[0117] The length of the flexible member 1132 within the through hole 1111 is less than the length of the non-completely overlapping region of the dielectric barrier 111 adjacent to one end of the first electrode 112, so as to ensure that the flexible member 1132 is located outside the discharge region.

[0118] Furthermore, the limiting sleeve 1135 facilitates the installation and removal of the insulating limiting member 113 within the through hole 1111. The limiting sleeve 1135 can also be made of elastic or non-elastic material; please refer to the relevant description of the connecting part 1134 for details, which will not be repeated here.

[0119] The insulating limiting member 113 has chamfers at both ends in the axial direction to facilitate the assembly of the insulating limiting member 113 in the through hole 1111 and the insertion of the first electrode 112 in the insulating limiting member 113.

[0120] Figure 6 and Figure 7 It indicated Figure 5 The structural views of the insulating limiting member 113 from different perspectives are not described in detail here.

[0121] See Figure 8 As shown, in some other embodiments, a portion of the structure of the flexible member 1132 may also be configured such that, during the process of the end of the first electrode 112 passing through the limiting through hole 1131, it undergoes elastic deformation along the axial direction of the dielectric barrier 111 and is carried into the through hole 1111 to form an elastic abutment portion 1133. This elastic abutment portion 1133 then holds the flexible member 1132 in the gap 115 and restricts it on the central axis of the dielectric barrier 111, thereby reducing the operating noise generated by the plasma purification module 100 during operation.

[0122] It should be noted that when the end of the first electrode 112 is not inserted, the flexible member 1132 is a cylindrical flexible sleeve. Since the diameter of the limiting through hole 1131 is smaller than the wire diameter of the first electrode 112, during the process of the end of the first electrode 112 being inserted into the limiting through hole 1131 of the flexible member 1132, the side of the flexible member 1132 adjacent to the center of the limiting through hole 1131 will undergo elastic deformation along the axial direction of the medium blocking member 111, so as to bring the part of the flexible member 1132 adjacent to the medium blocking member 111 into the through hole 1111, so that the part of the flexible member 1132 adjacent to the medium blocking member 111 is stretched, forming a connecting part 1134 and an elastic abutment part 1133, thereby locking the flexible member 1132 in the gap 115 through the elastic abutment part 1133 and restricting it on the central axis of the medium blocking member 111.

[0123] Furthermore, the portion of the flexible member 1132 that is not brought into the through hole 1111 is in close contact with the end face of the medium blocking member 111, which limits the length of the flexible member 1132 brought into the through hole 1111 while facilitating the disassembly of the flexible member 1132.

[0124] Figure 9 It indicated Figure 8 The view of the insulating limiting member 113 on the side away from the dielectric barrier member 111 is provided to better understand the structure of the insulating limiting member 113. It should be noted that the structure of the insulating limiting member 113 will not be described in detail here.

[0125] Alternatively, in some embodiments, the insulating limiting member 113 may also be formed of liquid adhesive filled in the gap 115 to fix the position of the first electrode 112 within the through hole 1111. The liquid adhesive may be an antioxidant adhesive. In this case, the diameter of the limiting through hole 1131 of the insulating limiting member 113 is equal to the wire diameter of the first electrode 112. The structure of the insulating limiting member 113 is not further limited in this application.

[0126] Based on the above, this application embodiment also provides a plasma purification device 200, and the structure of the plasma purification device 200 will be further described below with reference to the accompanying drawings.

[0127] See Figure 10 As shown, the plasma purification device 200 may include a housing 210 and a plasma purification module 100 as described above. Part of the structure of the plasma purification module 100 is supported outside the housing 210 so that the airflow comes into contact with the plasma generated by the discharge of the plasma purification module 100, thereby achieving the purpose of purifying indoor microorganisms and gaseous pollutants.

[0128] Furthermore, since the operating noise of the plasma purification module 100 can be reduced by the setting of the insulating limiting member 113, the operating noise of the plasma purification device 200 of this application will also be reduced during operation, so as to reduce the discomfort caused to indoor personnel by the operation of the plasma purification device 200.

[0129] The housing 210 contains a filter element 220, which is a cylindrical structure open at both ends. The filter element 220 may include a filter screen or other structures. The filter element 220 is located outside the housing 210. The plasma generator 110 may be located inside the filter element 220 so that when the airflow passes through the filter element 220, it can come into contact with the plasma generated by the discharge of the plasma purification module 100, thereby achieving the purpose of purifying indoor microorganisms and gaseous pollutants.

[0130] It should be noted that the cylindrical filter can also perform preliminary filtration of the airflow passing through the plasma purification module.

[0131] The boost power supply 120 can be located inside the housing 210 to prevent the plasma purification module 100 from affecting the boost power supply 120 when it discharges.

[0132] Based on the above, this application provides an air conditioning device, which can be a wall-mounted air conditioning device, a floor-standing air conditioning device, a ducted air conditioning device, etc. No further limitation is made on the type of air conditioning device herein.

[0133] The following section will take ducted air conditioning equipment as an example to further explain the structure of air conditioning equipment.

[0134] See Figure 11 As shown, the air conditioning equipment may include an indoor unit 600, which has a housing 610, a fan 620, and the aforementioned plasma purification device 200. The housing 610 contains an air duct 611, and both the plasma purification device 200 and the fan 620 are located within the air duct 611. When operating, the fan 620 generates airflow within the air duct 611, allowing the airflow to come into contact with the plasma generated by the plasma purification device 200, thereby purifying indoor microorganisms and gaseous pollutants. Alternatively, by flowing air through the filter element 220, the plasma within the air duct 611 can be introduced into the indoor space where the indoor unit 600 is located, further purifying the indoor air.

[0135] The housing 610 has an air inlet and an air outlet connected by an air duct 611. The air inlet can also be called the return air end. The plasma purification device 200 can be located on the side of the air duct 611 adjacent to the air inlet. This is to avoid condensation on the plasma purification device 200 and to ensure that the plasma generated by the plasma purification device 200 is fully carried into the airflow and comes into contact with the airflow, thereby achieving a better purification effect.

[0136] The indoor unit 600 also includes an electrical control box for controlling its operating status. The indoor unit's operating status can include standby mode, cooling mode, heating mode, fan mode, dehumidification mode, or purification and sterilization mode. In cooling, heating, fan, and dehumidification modes, the fan is always on.

[0137] The air conditioning unit may also include an outdoor unit connected to the indoor unit 600. When the air conditioning unit is running, the indoor unit 600 draws heat from the room into its interior through refrigerant circulation, then carries the refrigerant to the outdoor unit for heat exchange, ultimately releasing the heat from the room to the outside, thereby achieving indoor cooling or heating. For details on the structure and working principle of the air conditioning unit, please refer to the relevant descriptions in existing air conditioning equipment documentation; they will not be elaborated upon here.

[0138] This application also provides a noise control method for an air conditioning device, applied to the air conditioning device described above, so as to control the noise generated by the indoor unit 600 of the air conditioning device in the purification and sterilization mode, thereby reducing the discomfort of indoor occupants.

[0139] See Figure 12 As shown, the noise control methods include:

[0140] Step S100: Receive air purification command;

[0141] Step S200: Determine the on / off status of the fan in the indoor unit of the air conditioning equipment;

[0142] Step S300: If the fan is on, start the plasma purification device in the indoor unit so that the noise generated by the fan covers the working noise of the plasma purification device.

[0143] Step S400: If the fan is off, turn on the fan and then start the plasma purification device.

[0144] Thus, upon receiving an air purification command, the settings in steps S200, S300, and S400 ensure that the fan 620 in the indoor unit 600 remains on when the plasma purification device 200 is activated. Since the fan 620 in the indoor unit 600 generates some noise while running, this noise will still be present indoors.

[0145] Therefore, when the fan 620 and the plasma purification device 200 are turned on at the same time, the noise generated by the fan 620 can cover the working noise generated by the plasma purification device 200. Thus, based on the insulating limit member 113, the noise control method of this application can further reduce the working noise generated by the plasma purification device 200 and reduce the discomfort of people in the room.

[0146] In step S100, the air purification command can be an instruction to activate air purification. For example, the air purification command can be issued by an indoor occupant, or by the indoor unit 600 when it detects that the indoor environmental quality is lower than a preset value, or under other circumstances.

[0147] It should be noted that since the plasma generator 110 is the device that generates plasma in the plasma purification device 200, starting the plasma purification device 200 in the indoor unit can be understood as starting the plasma generator 110 so that the plasma generator 110 can work to generate plasma.

[0148] After the plasma purification device 200 is started, noise control methods may also include:

[0149] Adjust the wind speed of the fan 620 so that the frequency band of the noise generated by the fan 620 is compatible (same or similar) with the frequency band of the working noise of the plasma purification device 200, so that the noise generated by the operation of the fan 620 can cover the working noise generated by the plasma purification device 200 as much as possible, thereby reducing the working noise generated by the plasma purification device 200.

[0150] It should be noted that, since the technology for controlling the noise of the air conditioning fan 620 is relatively mature, the noise generated by the fan 620 during operation can be controlled within a small range. Therefore, after increasing the fan speed of the fan 620, the original operating noise of the fan 620 can be covered and reduced to a certain extent.

[0151] When the fan 620 is on, the indoor unit 600 can operate in either cooling, heating, ventilation, or dehumidification mode. In other words, the purification and sterilization mode of the indoor unit 600 can be activated simultaneously with any of the cooling, heating, ventilation, or dehumidification modes. This ensures that the indoor unit 600 has multiple selectable operating modes when the plasma purification device 200 is started, preventing the activation of the plasma purification device 200 from affecting the normal operation of the indoor unit 600.

[0152] After turning on the fan 620, start the plasma purification device 200, including:

[0153] After the fan 620 starts for a preset time, the plasma purification device 200 is then started so that the ozone generated when the plasma purification device 200 starts working can be quickly diluted by the airflow generated by the fan 620, so as to avoid the ozone concentration at the air outlet of the indoor unit 620 being too high when the plasma purification device 200 and the fan 620 are turned on at the same time.

[0154] For example, the preset time may include, but is not limited to, 5s-30s. In application, the preset time can be adjusted according to needs to avoid excessively high ozone concentration at the air outlet of the indoor unit 600 in the initial airflow.

[0155] After the plasma purification device 200 is started, the noise control methods also include:

[0156] Upon receiving a command to stop air purification, the plasma purification device 200 is turned off to prevent it from continuing to generate plasma, and the purification and sterilization mode of the indoor unit 600 is turned off.

[0157] After the purification and sterilization mode of the indoor unit 600 is turned off, the fan 620 can return to its initial state. For example, the fan 620 can return to its initial on state before the purification and sterilization mode is turned on, or the fan 620 can return to its initial off state before the purification and sterilization mode is turned on.

[0158] Based on the above, this application embodiment also provides a noise control device applied to the aforementioned air conditioning equipment. As described above, the air conditioning equipment includes an indoor unit 600, and the noise control device includes:

[0159] The receiving module is used to receive air purification commands;

[0160] The judgment module is used to determine whether the fan 620 in the indoor unit is turned on;

[0161] The processing module is used to start the plasma purification device 200 in the indoor unit 600 after the fan 620 is turned on, so that the noise generated by the fan 620 covers the working noise of the plasma purification device 200, or to start the plasma purification device 200 after turning on the fan 620 when the fan 620 is turned off.

[0162] Based on the insulating limiter 113, the noise control device of this application can control the fan 620 to start before the plasma purification device 200, so that the noise generated by the operation of the fan 620 can cover the working noise generated by the plasma purification device 200, thereby further reducing the working noise generated by the plasma purification device 200 and reducing the discomfort of people in the room.

[0163] It should be noted that the indoor unit 600 contains a control circuit board in its electrical control box, and the noise control device can be considered as part of the structure within the control circuit board.

[0164] This application also provides an air conditioning device, which includes a memory, a processor, a fan, and a plasma purification device 200. The memory stores a computer program. Specifically, the computer program may include program code, which includes computer operation instructions. The memory may include high-speed RAM or non-volatile memory.

[0165] When the processor executes the computer program, it is used to control the operating noise of the plasma purification device 200 using any of the noise control methods described above.

[0166] The processor may be a central processing unit (CPU), an application-specific integrated circuit (ASIC), or one or more integrated circuits configured to implement the embodiments of this application.

[0167] This application also provides a chip that includes a processor and a memory.

[0168] The processor is used to retrieve and run computer programs from memory, enabling the device with the chip installed to execute the control logic corresponding to the noise control method described above.

[0169] This application provides a computer-readable storage medium, which may include various media capable of storing program code, such as a USB flash drive, a portable hard drive, a read-only memory (ROM), a random access memory (RAM), a magnetic disk, or an optical disk. The computer-readable storage medium stores computer-executable instructions, which, when executed by a processor, implement the noise control method described above.

[0170] This application also provides a program that, when executed by a processor, performs the noise control method provided in the above method embodiments.

[0171] This application also provides a program product, such as a computer-readable storage medium, which stores instructions that, when run on a computer, cause the computer to execute the noise control method provided in the above-described method embodiments.

[0172] The aforementioned computer-readable medium may be included in the aforementioned electronic device; or it may exist independently and not assembled into the electronic device.

[0173] The aforementioned computer-readable medium carries one or more programs, which, when executed by the electronic device, cause the electronic device to perform the methods shown in the above embodiments, such as the noise control method provided in the above method embodiments.

[0174] The program carried on a computer-readable medium may be written in one or more programming languages ​​or a combination thereof to perform the operations of this disclosure. These programming languages ​​include object-oriented programming languages—such as Java, Smalltalk, and C++—and conventional procedural programming languages—such as the "C" language or similar programming languages. The program code may be executed entirely on the user's computer, partially on the user's computer, as a standalone software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In cases involving remote computers, the remote computer may be connected to the user's computer via any type of network—including a Local Area Network (LAN) or a Wide Area Network (WAN)—or may be connected to an external computer (e.g., via the Internet using an Internet service provider).

[0175] In the above embodiments, implementation can be achieved, in whole or in part, through software, hardware, firmware, or any combination thereof. When implemented in software, it can be implemented, in whole or in part, as a computer program product. A computer program product includes one or more computer instructions. When the computer program instructions are loaded and executed on a computer, all or part of the processes or functions according to the method embodiments of this application are generated.

[0176] A computer can be a general-purpose computer, a special-purpose computer, a computer network, or other programmable device. Computer instructions can be stored in a computer-readable storage medium or transmitted from one computer-readable storage medium to another. For example, computer instructions can be transmitted from one website, computer, server, or data center to another via wired (e.g., coaxial cable, fiber optic, digital subscriber line (DSL)) or wireless (e.g., infrared, wireless, microwave, etc.) means. A computer-readable storage medium can be any available medium that a computer can access, or a data storage device such as a server or data center that integrates one or more available media. Available media can be magnetic media (e.g., floppy disks, hard disks, magnetic tapes), optical media (e.g., DVDs), or semiconductor media (e.g., solid-state drives (SSDs)).

[0177] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0178] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0179] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0180] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0181] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0182] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.

Claims

1. A plasma purification module, characterized in that, The device includes a plasma generator, which comprises a dielectric barrier, electrodes, and insulating limiting members for noise reduction. The dielectric barrier has a through hole along the axial direction, and the electrodes include a first electrode, the end of which passes through the through hole and has a gap with the hole wall. At least a portion of the insulating limiting member is located within the gap. The insulating limiting member has a limiting through hole along its own axial direction. The end of the first electrode passes through the limiting through hole. The insulating limiting member abuts against the hole wall of the through hole to limit the position of the first electrode relative to the dielectric barrier.

2. The plasma purification module according to claim 1, characterized in that, The first electrode has a linear structure, and the shape of the through hole is the same as the shape formed by the radial contour of the first electrode; When the insulating limiting member abuts against the wall of the through hole, the first electrode is located on the center line of the through hole.

3. The plasma purification module according to claim 2, characterized in that, The centerline of the limiting through hole coincides with the centerline of the through hole, and the geometric center of the first electrode is located on the centerline of the limiting through hole.

4. The plasma purification module according to claim 1, characterized in that, The limiting through hole is located at the geometric center of the insulating limiting member, and / or, Along the axial direction of the medium blocking member, at least a portion of the insulating limiting member abuts against the wall of the through hole.

5. The plasma purification module according to claim 1, characterized in that, It also includes a second electrode, which is disposed on the outer wall of the dielectric barrier and forms a discharge region between the first electrode and the dielectric barrier. The insulating limiting member is located outside the discharge region and at one end of the dielectric barrier member adjacent to the first electrode.

6. The plasma purification module according to any one of claims 1-5, characterized in that, The insulating limiting member is configured such that, during the process of the end of the first electrode passing through the limiting through hole, at least a portion of the structure located within the gap undergoes elastic deformation and abuts against the through hole and the first electrode.

7. The plasma purification module according to claim 6, characterized in that, The insulating limiting member includes a flexible member having the limiting through hole, and the end of the flexible member has an elastic abutment portion; The elastic abutment portion is located within the gap and is configured to elastically deform toward one side of the hole wall during the process of the end of the first electrode passing through the limiting through hole, so as to clamp onto the radial outer wall of the first electrode and abut against the hole wall of the through hole.

8. The plasma purification module according to claim 7, characterized in that, The diameter of the limiting through hole at the elastic contact portion is smaller than the wire diameter of the first electrode.

9. The plasma purification module according to claim 7, characterized in that, The outer diameter of the elastic contact portion is greater than the wire diameter of the first electrode, but smaller than the diameter of the through hole.

10. The plasma purification module according to claim 7, characterized in that, Along the axial direction of the medium blocking member, the length of the elastic abutment portion is less than half the length of the flexible member.

11. The plasma purification module according to claim 7, characterized in that, The flexible component further includes a connecting portion, wherein the elastic abutting portion is connected to the side of the connecting portion facing the axial center of the medium blocking component, and the elastic abutting portion protrudes from the connecting portion on the side facing the center line of the limiting through hole.

12. The plasma purification module according to claim 7, characterized in that, The insulating limiting member further includes a limiting sleeve, which is connected to the end of the flexible member away from the elastic abutment portion and abuts against the end face of the medium blocking member.

13. The plasma purification module according to claim 7, characterized in that, The flexible component is configured such that, during the process of the end of the first electrode passing through the limiting through hole, it undergoes elastic deformation along the axial direction of the dielectric barrier and is drawn into the through hole to form the elastic abutment portion.

14. The plasma purification module according to any one of claims 1-5, characterized in that, It also includes a boost power supply, which is electrically connected to the electrode.

15. A plasma purification device, characterized in that, It includes a housing and a plasma purification module as described in any one of claims 1-14, wherein a portion of the structure of the plasma purification module is supported on the outside of the housing.

16. An air conditioning device, characterized in that, The device includes an indoor unit, which has a housing, a fan, and a plasma purification device as described in claim 15. The housing has an air duct, and the plasma purification device and the fan are both located within the air duct.

17. A noise control method for an air conditioning device, characterized in that, The noise control method, applied to the air conditioning equipment of claim 16, comprises: Receive air purification commands; Determine whether the fan in the indoor unit of the air conditioning equipment is turned on; If the fan is on, the plasma purification device in the indoor unit is activated so that the noise generated by the fan masks the operating noise of the plasma purification device. If the fan is in the off state, the plasma purification device shall be started after the fan is turned on.

18. The noise control method according to claim 17, characterized in that, After the plasma purification device is activated, the noise control method further includes: Adjust the fan speed so that the frequency band of the noise generated by the fan matches the frequency band of the operating noise of the plasma purification device.

19. The noise control method according to claim 17, characterized in that, When the fan is on, the indoor unit can operate in cooling mode, heating mode, air supply mode, or dehumidification mode.

20. The noise control method according to claim 17, characterized in that, The step of starting the fan and then activating the plasma purification device includes: The plasma purification device is started after the fan has been running for a preset time.

21. The noise control method according to claim 17, characterized in that, After the plasma purification device is activated, the noise control method further includes: Upon receiving a command to stop air purification, the plasma purification device is shut down.

22. A noise control device, characterized in that, The noise control device, applied to the air conditioning equipment of claim 16, comprises: The receiving module is used to receive air purification commands; The judgment module is used to determine whether the fan in the indoor unit is turned on; The processing module is used to activate the plasma purification device in the indoor unit after the fan is turned on, so that the noise generated by the fan can cover the working noise of the plasma purification device, or to turn on the fan and then activate the plasma purification device when the fan is turned off.

23. An air conditioning device, characterized in that, The device includes a memory, a processor, a fan, and a plasma purification device. The memory stores a computer program, and when the processor executes the computer program, it controls the operating noise of the plasma purification device using the noise control method described in any one of claims 17-21.

24. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores computer-executable instructions, which, when executed by a processor, implement the noise control method as described in any one of claims 17-21.

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