Control system and control method
CN116974220BActive Publication Date: 2026-08-28HITACHI LTD
Patent Information
- Application Number
- CN202310249936.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2022-04-28
- Filing Date
- 2023-03-15
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2043-03-15
AI Technical Summary
Technical Problem
然而,根据该专利文献4所记载的技术,未必能够得到控制所需的充分的精度,期望进一步提高控制的精度
Benefits of technology
[0015]根据本公开的一个方式,控制的精度提高。
✦ Generated by Eureka AI based on patent content.
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Figure CN116974220B_ABST
Abstract
The present application provides a control system and a control method, and provides a technique for improving control accuracy. The control system has: a first control device that performs FF control on a control target using a first control output obtained by multiplying a factor value of a variation factor by a control gain; a second control device that calculates a second control output by multiplying the factor value by the control gain, calculates a third control output by integrating a deviation between an actual value and a target value of a state quantity, and performs FF control on the control target using the second control output and integral control using the third control output; a selection device that selects which control device to perform control on the control target; an unobservable variation factor prediction device that calculates an estimated factor value from the state quantity; and a control device switching determination device that determines which control device to select based on the estimated factor value.
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Citation Information
Patent Citations
Enclosure
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