Polishing liquid and polishing method for laser gyroscope cavity

Abstract

The application discloses a polishing liquid and a polishing method for a laser gyroscope cavity, and the polishing liquid comprises a polishing liquid and acid-resistant soft abrasive particles, the polishing liquid comprises the following components in mass fraction: HF 5-20%, H2SO4 5-10%, CH3COOH 10-20%, NH4HF 10-20%, disodium ethylenediaminetetraacetate 2-5%, ammonium sulfate 2-5%, and the balance is water; the mass of the acid-resistant soft abrasive particles is 10-20% of the mass of the polishing liquid. The polishing method comprises circulating jet polishing of the polishing liquid at a flow rate of 500-600 mL / min through the laser gyroscope cavity. The polishing liquid can realize one-time polishing of the laser gyroscope cavity during polishing, not only has good polishing effect, but also greatly improves polishing efficiency and greatly reduces polishing cost, and can also avoid the uneven corrosion caused by the traditional polishing method of fixing the cavity.

Description

Technical Field

[0001] This invention belongs to the field of polishing technology for complex cavities of microcrystalline glass, and relates to a polishing slurry and polishing method for laser gyroscope cavities, specifically to a physicochemical polishing slurry and polishing method for laser gyroscope cavities. Background Technology

[0002] A laser gyroscope cavity (hereinafter referred to as the cavity) is a microcrystalline glass optical element with a complex microporous structure. Microcrystalline glass has advantages such as low thermal expansion coefficient, wear resistance, chemical corrosion resistance, low dielectric loss, and high mechanical strength. Figure 1 As shown, a ring-shaped laser channel 100 and four helium-neon storage chambers 200 are formed inside the microcrystalline glass, thus forming the laser gyroscope cavity. The laser gyroscope cavity is the core optical component of the laser gyroscope. In particular, the cavity wall contour and size of the laser channel 100 have a significant impact on the performance of the laser gyroscope. Therefore, the consistency of the inner hole diameter and the surface roughness of the laser channel in the laser gyroscope cavity are required to be extremely high. After the microcrystalline glass is drilled and milled into a cavity, the inner hole wall of the cavity will have a residual machining damage layer and machining stress. Before assembly, the cavity needs to undergo a polishing and cleaning process to remove the residual burrs and sub-damage layers from the machining in the various holes inside the cavity, and to ensure that the surface roughness of the inner hole wall meets the accuracy requirements.

[0003] To achieve the required high-precision surface roughness, traditional laser gyroscope cavity polishing primarily employs a method of physical polishing followed by chemical polishing (HF chemical etching). Physical polishing typically involves threading a polishing rope through a narrow hole and manually or mechanically (referencing Chinese invention patent application 202211498593.X and Chinese utility model patent 202222614006.0) repeatedly pulling the rope to remove large burrs, pits, and other defects within the hole. Chemical polishing generally utilizes the cavity's central hole to fix it horizontally, then immerses the cavity in an acid solution, allowing the etching reaction to complete before lifting it using a handle. This traditional method of physical polishing followed by chemical polishing of laser gyroscope cavities presents the following two problems:

[0004] 1) Using physical polishing followed by chemical polishing is not only time-consuming and labor-intensive, but also has high polishing costs.

[0005] 2) Due to the layer difference phenomenon in acid solutions, that is, the concentration of acid solution is higher closer to the bottom layer and lower closer to the top layer, the traditional method of fixing the cavity in a flat position often leads to uneven corrosion, resulting in inconsistent polishing of the upper and lower parts of the cavity. Summary of the Invention

[0006] The technical problem to be solved by the present invention is to overcome the shortcomings of the prior art and provide a polishing fluid and polishing method for laser gyroscope cavities with good polishing uniformity, high polishing efficiency, low polishing cost and low surface roughness after polishing.

[0007] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:

[0008] A polishing slurry for a laser gyroscope cavity comprises a chemical polishing solution and acid-resistant soft abrasive particles. The chemical polishing solution comprises the following components in the indicated mass fractions: HF 5%–20%, H2SO4 5%–10%, CH3COOH 10%–20%, NH4HF 10%–20%, disodium ethylenediaminetetraacetate 2%–5%, ammonium sulfate 2%–5%, with the balance being water. The acid-resistant soft abrasive particles constitute 10%–20% of the mass of the chemical polishing solution.

[0009] Preferably, in the polishing fluid used for laser gyroscope cavities described above, the molar hardness of the acid-resistant soft abrasive grains is 2 to 3.

[0010] Preferably, in the aforementioned polishing slurry for laser gyroscope cavities, the acid-resistant soft abrasive particles are added to the chemical polishing slurry within 1 hour before polishing. This mixed polishing slurry is preferably prepared within 1 hour before use; otherwise, the acid-resistant soft abrasive particles are prone to agglomeration.

[0011] The polishing fluid for the laser gyroscope cavity described above preferably includes one or more of polypropylene, polytetrafluoroethylene, polylactic acid, and acrylonitrile-butadiene-styrene copolymer, wherein the particle size of the acid-resistant soft abrasive is 5 μm to 30 μm, preferably with an average particle size of 10 μm.

[0012] As a general technical concept, the present invention also provides a polishing method for a laser gyroscope cavity, comprising the following steps:

[0013] The polishing slurry described above is pumped into the laser gyroscope cavity at a flow rate of 500 mL / min to 600 mL / min to perform cyclic jet polishing on the laser gyroscope cavity.

[0014] The above-mentioned polishing method for laser gyroscope cavities preferably employs a forward and reverse cyclic polishing method to perform cyclic jet polishing on the laser gyroscope cavity. The single polishing time for forward rotation is 20 min to 40 min, the single polishing time for reverse rotation is 20 min to 40 min, and the number of forward and reverse cyclic polishing cycles is 1 to 3.

[0015] Preferably, the polishing method for the laser gyroscope cavity described above is implemented using a fixture, which includes a base, an acid-resistant peristaltic pump, a polishing fluid storage tank, and a cleaning fluid storage tank. The laser gyroscope cavity is mounted on the base. The outlet of the acid-resistant peristaltic pump is connected to the first anode interface of the laser gyroscope cavity. The second anode interface of the laser gyroscope cavity is connected to the return port of the polishing fluid storage tank and the return port of the cleaning fluid storage tank, respectively. The outlet of the polishing fluid storage tank and the outlet of the cleaning fluid storage tank are connected to the inlet of the acid-resistant peristaltic pump, respectively.

[0016] In the above-mentioned polishing method for laser gyroscope cavities, preferably, the inlet of the acid-resistant peristaltic pump is provided with a first main pipe, the first main pipe is provided with a first branch pipe and a second branch pipe, the first branch pipe is connected to the outlet of the polishing fluid storage tank, the second branch pipe is connected to the outlet of the cleaning fluid storage tank, the first branch pipe is provided with a first valve, and the second branch pipe is provided with a second valve.

[0017] In the above-described polishing method for laser gyroscope cavities, preferably, the second anode interface is provided with a second main pipe, the second main pipe is provided with a third branch pipe and a fourth branch pipe, the third branch pipe is connected to the return port of the polishing fluid storage tank, the fourth branch pipe is connected to the return port of the cleaning fluid storage tank, the third branch pipe is provided with a third valve, and the fourth branch pipe is provided with a fourth valve.

[0018] The polishing method for the laser gyroscope cavity described above is preferably as follows: the polishing process is as follows: the first valve and the third valve are opened, the second valve and the fourth valve are closed, the polishing liquid in the polishing liquid storage tank is pumped into the laser gyroscope cavity by the acid-resistant peristaltic pump, the four corner holes of the laser gyroscope cavity are closed, the polishing liquid polishes the laser gyroscope cavity first in a forward rotation, then in a reverse rotation, and after polishing, the polishing liquid is returned to the polishing liquid storage tank;

[0019] The process of cleaning the laser gyroscope cavity is as follows: close the first valve and the third valve, open the second valve and the fourth valve, and pump the cleaning solution in the cleaning solution storage tank into the laser gyroscope cavity through the acid-resistant peristaltic pump. The four corner holes of the laser gyroscope cavity are closed. After the cleaning solution cleans the cavity in the laser gyroscope cavity, it is returned to the cleaning solution storage tank.

[0020] In this invention, the acid-resistant soft abrasive particles are engineering plastic particles, and the Mohs hardness of the engineering plastic particles is usually in the range of 2-3.

[0021] Compared with the prior art, the advantages of the present invention are as follows:

[0022] 1. This invention provides a polishing slurry (chemical polishing slurry + acid-resistant soft abrasive particles) for laser gyroscope cavities. The chemical polishing slurry is a weakly acidic slurry primarily composed of HF, with an HF concentration of 5%–20%. Compared to conventional polishing slurries for laser gyroscope cavities (above 50%), this significantly reduces the acid concentration, allowing for better control of the corrosion rate and more uniform removal of the complex inner walls of the microcrystals. Combined with the polishing process, this results in a better polishing effect. The disodium ethylenediaminetetraacetate used in the polishing slurry is readily soluble in water and exhibits acidity, providing H₂O to the solution. + The generated ethylenediaminetetraacetic acid (EDTA) ions can form chelates with the metal ions produced during etching (metal oxides are present in the microcrystalline glass), making them more easily soluble in water and reducing the formation of precipitates during polishing. Furthermore, the polishing solution contains ammonium sulfate, ammonium bifluoride, and acetic acid to ensure adequate H+ concentration in the solution. + F - Stability of ion concentration.

[0023] Chinese patent document CN109759942A discloses a chemical abrasive flow polishing method for 3D printed titanium alloys. The method involves preparing a polishing solution by sequentially measuring pure water, methanol, n-butanol, hydrofluoric acid, and nitric acid in a volume ratio of 100:(2-4):(2-4):(5-7):(15-21). Then, 800-mesh α-Al2O3 particles are added to the polishing solution in a solid-liquid ratio of 1g:80mL to obtain the abrasive polishing solution. Although this method claims to reduce the roughness and improve the gloss of 3D printed titanium alloys, the applicant's practice shows that it has the following problems: (1) The polishing slurry of this method uses both hydrofluoric acid and α-Al2O3 particles. Hydrofluoric acid and Al2O3 can react chemically at room temperature to generate AlF3, which is inconsistent with common sense; (2) This method is difficult to apply to the polishing of laser gyroscope cavities because microcrystalline glass is an inorganic non-metallic material. This polishing slurry is effective for metallic materials, but it cannot achieve the same effect on microcrystalline glass materials; (3) Laser gyroscope cavities It has a very complex internal hole structure, while the above literature mainly focuses on external surface polishing and cannot be used for polishing complex internal hole structures; (4) Conventional wear-resistant particles such as alumina and silicon dioxide are hard abrasive particles that are in hard contact when polishing glass surfaces, and the surface is prone to pits and other defects; (5) When conventional chemical polishing liquid is used for polishing laser gyroscope cavities, since existing cavity polishing usually adopts static immersion polishing process, the polishing liquid needs a very high acid concentration to achieve the polishing effect. The acid concentration is usually above 50%. Therefore, existing chemical polishing liquid is difficult to use in the field of laser gyroscope cavity polishing.

[0024] After extensive experimentation, the applicant ultimately adopted soft plastic particles such as polypropylene (PP) and polytetrafluoroethylene (PTFE) as acid-resistant soft abrasives. These abrasives are not corroded in hydrofluoric acid and are unlikely to cause defects on the surface of the glass-ceramic. During polishing, the low-concentration acidic chemical polishing solution softens the surface of the glass-ceramic, while the acid-resistant soft abrasives polish relatively slowly. This reduces surface roughness and removes the surface sub-damage layer. Furthermore, because the corrosion rate is effectively controlled, the uniformity of the removal quality of the complex pore walls of the glass-ceramic cavity is greatly improved, enhancing the consistency of polishing. As the chemical polishing time increases, the concentration of fluorosilicates in the solution increases, which may crystallize and precipitate, adsorbing onto the inner wall of the microcrystals and causing surface defects. The micronuclei composed of micro-abrasive particles can effectively adsorb the fluorosilicates in the solution onto the surface of the abrasive particles, greatly reducing the risk of crystalline salt deposition on the glass surface.

[0025] 2. The polishing method of the present invention adopts chemical polishing liquid + acid-resistant soft abrasive particles + jet polishing for synergistic effect. The present invention uses jet polishing to replace the conventional static immersion polishing process. However, the jet polishing of the present invention is different from the traditional jet polishing. The traditional jet polishing uses a nozzle to spray polishing liquid at high speed. The water flow speed is usually controlled at 30-50m / s to polish the surface of the object. It mainly relies on the high-speed surface impact of wear-resistant particles to polish. However, this invention does not require the impact of high-speed fluid and abrasive particles for polishing. Instead, it uses low-speed jet polishing, with the polishing fluid flow rate being only 500mL / min to 600mL / min (equivalent to 4-6m / s). The low flow rate results in less pressure on the microcrystalline cavity and a smaller pressure difference on the inner wall. Under the different flow rates within the pipe, the polishing removal quality of different inner walls is more stable. At the same time, the low-concentration acidic polishing solution of this invention softens the glass surface, and the acid-resistant soft abrasive particles polish relatively slowly, which can effectively reduce the surface roughness to below 0.1μm. It can also remove the surface sub-damage layer at the same time. That is, it has the advantages of high gloss achieved by physical polishing and low sub-damage layer achieved by chemical polishing. Furthermore, it significantly improves the polishing consistency, which is significantly better than the prior art.

[0026] 3. Traditional chemical polishing solutions used for laser gyroscope cavities typically have an acid concentration exceeding 50%, resulting in extremely rapid corrosion of the microcrystalline glass (greater than 2 μm / min). This leads to uneven removal of the complex inner walls of the microcrystalline glass and is a static immersion polishing process. General jet polishing requires high-speed ejection of wear-resistant particles, subjecting the cavity to high pressure and resulting in unstable polishing quality of the inner walls. This invention utilizes a specially formulated acidic chemical polishing solution combined with acid-resistant soft abrasives for circulating polishing within a pipe. In the acidic environment, the inner surface material of the cavity softens rapidly, and the flowing acid-resistant soft abrasives quickly rub against the cavity wall to uniformly remove surface imperfections, achieving a high-gloss surface and removing sub-damaged layers. This results in high polishing efficiency, low surface roughness, and good uniformity. The special polishing slurry formula used in this invention has a significantly lower acid concentration than that of traditional polishing slurries, and the polishing slurry is always in a flowing state, so there will be no stratification. The low-speed jet polishing method used in this invention has a lower flow rate than that of traditional high-speed jet polishing. Under the condition of achieving the same polishing quality, the polishing method of this invention has higher polishing consistency, better quality stability, less environmental harm, longer tool life, and higher polishing efficiency.

[0027] In summary, this invention enables one-time polishing of the laser gyroscope cavity, resulting in not only excellent polishing effect and significantly improved polishing efficiency, but also a substantial reduction in polishing cost. Furthermore, it avoids the uneven corrosion that can occur with traditional flat-mounted cavity polishing methods. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the structure of a laser gyroscope cavity.

[0029] Figure 2 This is a schematic diagram of the apparatus used in the polishing method for a laser gyroscope cavity according to Embodiment 1 of the present invention.

[0030] Legend:

[0031] 100. Laser channel; 200. Helium-neon storage chamber; 1. Laser gyroscope cavity; 2. Base; 3. Acid-resistant peristaltic pump; 4. Polishing fluid tank; 5. Cleaning fluid tank; 6. First anode interface; 7. Second anode interface; 8. First main pipe; 9. First branch pipe; 10. Second branch pipe; 11. First valve; 12. Second valve; 13. Second main pipe; 14. Third branch pipe; 15. Fourth branch pipe; 16. Third valve; 17. Fourth valve. Detailed Implementation

[0032] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention. All materials and instruments used in the following embodiments are commercially available.

[0033] Example 1:

[0034] A polishing slurry for a laser gyroscope cavity according to the present invention comprises a chemical polishing solution and acid-resistant soft abrasives. The chemical polishing solution is composed of the following components by mass fraction: HF 12%, H2SO4 8%, CH3COOH 15%, NH4HF 12%, disodium ethylenediaminetetraacetate (EDTA-2Na) 2.8%, ammonium sulfate 3%, and the balance being deionized water. The acid-resistant soft abrasives account for 15% of the mass of the chemical polishing solution. The HF is derived from a 49wt% hydrofluoric acid solution, and the H2SO4 is derived from a 60wt% sulfuric acid solution.

[0035] In this embodiment, the Mohs hardness of the acid-resistant soft abrasive grains is 2 to 3.

[0036] In this embodiment, acid-resistant soft abrasives are added to the chemical polishing solution within 1 hour before polishing.

[0037] In this embodiment, the acid-resistant soft abrasive is made of polytetrafluoroethylene, and the particle size range of the acid-resistant soft abrasive is 5-20 μm, with an average particle size of 10 μm.

[0038] A polishing method for a laser gyroscope cavity according to the present invention, specifically a physicochemical polishing method, using the polishing slurry prepared in this embodiment, includes the following steps:

[0039] The polishing slurry prepared in this embodiment is sent to the laser gyroscope cavity 1 for polishing. The temperature of the polishing slurry is maintained at 30℃~40℃ and the flow rate of the polishing slurry is 500mL / min. First, the forward polishing is performed for 20min, and then the reverse polishing is performed for 20min. The forward and reverse cycles are repeated twice for jet polishing. After polishing, the polishing slurry is discharged and the laser gyroscope cavity 1 is cleaned.

[0040] The polishing method in this embodiment is implemented using a single tool, such as... Figure 2 As shown, the fixture includes a base 2, an acid-resistant peristaltic pump 3, a polishing slurry tank 4, and a cleaning slurry tank 5. The laser gyroscope cavity 1 is mounted on the base 2. The outlet of the acid-resistant peristaltic pump 3 is connected to the first anode interface 6 on the laser gyroscope cavity 1. The second anode interface 7 on the laser gyroscope cavity 1 is connected to the return port of the polishing slurry tank 4 and the return port of the cleaning slurry tank 5, respectively. The outlet of the polishing slurry tank 4 and the outlet of the cleaning slurry tank 5 are connected to the inlet of the acid-resistant peristaltic pump 3, respectively.

[0041] The present invention uses an acid-resistant peristaltic pump 3 to bring the polishing liquid into the laser gyroscope cavity 1 from the first anode interface 6 and out from the second anode interface 7, both of which utilize the existing openings in the cavity, thus eliminating the need to change the structure of the laser gyroscope cavity.

[0042] In this embodiment, the inlet of the acid-resistant peristaltic pump 3 is provided with a first main pipe 8, the first main pipe 8 is provided with a first branch pipe 9 and a second branch pipe 10, the first branch pipe 9 is connected to the outlet of the polishing liquid storage tank 4, the second branch pipe 10 is connected to the outlet of the cleaning liquid storage tank 5, the first branch pipe 9 is provided with a first valve 11, and the second branch pipe 10 is provided with a second valve 12.

[0043] In this embodiment, the second anode interface 7 is provided with a second main pipe 13, the second main pipe 13 is provided with a third branch pipe 14 and a fourth branch pipe 15, the third branch pipe 14 is connected to the return port of the polishing liquid storage tank 4, the fourth branch pipe 15 is connected to the return port of the cleaning liquid storage tank 5, the third branch pipe 14 is provided with a third valve 16, and the fourth branch pipe 15 is provided with a fourth valve 17.

[0044] In this embodiment, the polishing and cleaning process using the above-mentioned device is as follows:

[0045] (1) Open the first valve 11 and the third valve 16, close the second valve 12 and the fourth valve 17, and pump the polishing liquid in the polishing liquid storage tank 4 to the laser gyroscope cavity 1 through the acid-resistant peristaltic pump 3. The four corner holes of the laser gyroscope cavity 1 are closed. The polishing liquid polishes in the laser gyroscope cavity 1 first in the forward direction, and then in the reverse direction. After polishing, the polishing liquid is returned to the polishing liquid storage tank 4.

[0046] (2) Close the first valve 11 and the third valve 16, open the second valve 12 and the fourth valve 17, and pump the cleaning solution (specifically deionized water) in the cleaning solution storage tank 5 to the laser gyroscope cavity 1 through the acid-resistant peristaltic pump 3. The four corner holes of the laser gyroscope cavity 1 are closed. After the deionized water cleans the cavity in the laser gyroscope cavity 1, it is returned to the cleaning solution storage tank 5.

[0047] Tests showed that the roughness Ra of the polished microcrystalline cavity decreased from 1200nm to 77.33nm, and the transmittance increased from 20% to 82.17%, as detailed in Tables 1 and 2.

[0048] Comparative Example 1 (Chemical Polishing)

[0049] A polishing slurry for laser gyroscope cavities, which differs from Example 1 only in that it does not contain acid-resistant soft abrasives and is only a chemical polishing slurry.

[0050] A polishing method for laser gyroscope cavities, specifically a chemical polishing method, is basically the same as the polishing method in Example 1, except that the polishing liquid is only a chemical polishing liquid.

[0051] After chemical polishing, the surface roughness Ra inside the microcrystalline cavity decreased from 1200 nm to 207.33 nm, and the light transmittance increased from 20% to 62.17%, as detailed in Tables 1 and 2.

[0052] Comparative Example 2 (Physical Polishing)

[0053] A polishing fluid for laser gyroscope cavities, differing from Example 1 only in that the chemical polishing fluid is replaced with deionized water.

[0054] A polishing method for laser gyroscope cavities, specifically a physical polishing method, is basically the same as the polishing method in Example 1, except that the polishing fluid is different.

[0055] After physical polishing, the roughness Ra of the microcrystalline cavity decreased from 1200nm to 890nm, and the transmittance increased from 20% to 44.33%, as detailed in Tables 1 and 2.

[0056] By comparing the three processing techniques in Example 1 and Comparative Examples 1-2, it is clear that the physicochemical polishing method has significant advantages under the same conditions, while abrasive physical polishing alone cannot achieve significant results.

[0057] Comparative Example 3 (polishing with hard abrasive grains)

[0058] A polishing fluid for laser gyroscope cavities, which differs from Example 1 only in that the acid-resistant abrasive particles are diamond (SiC) hard abrasive particles (average particle size of 10 μm).

[0059] A polishing method for a laser gyroscope cavity is basically the same as the polishing method in Example 1, except that the polishing fluid is different.

[0060] This polishing fluid produces large scratches on the surface of microcrystalline glass, making it unusable. Due to the high hardness of the abrasive grains, it is only suitable for the grinding stage in glass processing and cannot be used in fine polishing.

[0061] After polishing, the roughness Ra of the microcrystalline cavity decreased from 1200nm to 1085nm, and the transmittance increased from 20% to 33.83%, as detailed in Tables 1 and 2.

[0062] Comparative Example 4 (High-speed jet polishing)

[0063] A polishing method for laser gyroscope cavities is basically the same as the polishing method in Example 1, except that the jet velocity is 5000-6000 mL / min.

[0064] After polishing, the roughness Ra of the microcrystalline cavity decreased from 1200nm to 196nm, and the light transmittance increased from 20% to 72.83%, as detailed in Tables 1 and 2. However, the uniformity of the product wall thickness was very poor, as shown in Table 3.

[0065] Comparative Example 5 (High-concentration acid polishing)

[0066] A polishing method for laser gyroscope cavities is basically the same as the polishing method in Example 1, except that the HF concentration is higher while other proportions remain unchanged. The specific formula is as follows:

[0067] HF 29%, H2SO4 8%, CH3COOH 15%, NH4HF 12%, disodium ethylenediaminetetraacetate 2.8%, ammonium sulfate 3%, balance deionized water.

[0068] After polishing, the roughness Ra of the microcrystalline cavity decreased from 1200nm to 114.33nm, and the transmittance increased from 20% to 76.17%, as detailed in Tables 1 and 2. However, the uniformity of the product wall thickness was very poor, as shown in Table 3.

[0069] Generally, the consistency of product polishing is evaluated by testing multiple points of roughness, light transmittance, and inner wall dimensions, and the standard deviation is used to assess the consistency of product polishing. The test results are shown in Table 1-3.

[0070] Table 1. Transmittance Test Statistics (Unit: %)

[0071]

[0072] Note: The result of the light transmittance test is a percentage, which represents the intensity of light passing through the surface of the object. 0% means completely opaque, and 100% means completely transparent.

[0073] Table 2. Roughness Test Statistics (Unit: nm)

[0074]

[0075] Table 3. Statistics of Inner Wall Dimensions (Unit: mm)

[0076]

[0077] Example 2:

[0078] A polishing slurry for a laser gyroscope cavity according to the present invention comprises a chemical polishing solution and acid-resistant soft abrasives. The chemical polishing solution is composed of the following raw material components in the indicated mass fractions: HF 5%, H2SO4 10%, CH3COOH 16%, NH4HF 18%, disodium ethylenediaminetetraacetate 3%, ammonium sulfate 4%, and the balance being deionized water. The acid-resistant soft abrasives constitute 12% of the mass of the chemical polishing solution. The HF is derived from a 49wt% hydrofluoric acid solution, and the H2SO4 is derived from a 60wt% sulfuric acid solution.

[0079] In this embodiment, the Mohs hardness of the acid-resistant soft abrasive grains is 2 to 3.

[0080] In this embodiment, acid-resistant soft abrasives are added to the chemical polishing solution within 1 hour before polishing.

[0081] In this embodiment, the acid-resistant soft abrasive is polylactic acid, and the particle size of the acid-resistant soft abrasive is 10-25 μm, with an average particle size of 15 μm.

[0082] A polishing method for a laser gyroscope cavity according to the present invention, specifically a physicochemical polishing method, using the polishing slurry prepared in this embodiment, includes the following steps:

[0083] The polishing slurry prepared in this embodiment is sent to the laser gyroscope cavity 1 for polishing. The temperature of the polishing slurry is maintained at 30℃~40℃ and the flow rate of the polishing slurry is 550mL / min. First, the forward polishing is performed for 20min, and then the reverse polishing is performed for 20min. This forward and reverse cycle is repeated twice. After polishing, the polishing slurry is discharged and the laser gyroscope cavity 1 is cleaned.

[0084] The polishing method in this embodiment uses the same tooling as in Embodiment 1.

[0085] Tests showed that the roughness Ra of the polished microcrystalline cavity decreased from 1200nm to below 80nm, and the light transmittance increased from 20% to over 80%.

[0086] Example 3:

[0087] A polishing slurry for a laser gyroscope cavity according to the present invention comprises a chemical polishing solution and acid-resistant soft abrasives. The chemical polishing solution is composed of the following raw material components in the indicated mass fractions: HF 20%, H2SO4 6%, CH3COOH 12%, NH4HF 16%, disodium ethylenediaminetetraacetate 2.5%, ammonium sulfate 4%, and the balance being deionized water. The acid-resistant soft abrasives constitute 18% of the mass of the chemical polishing solution. The HF is derived from a 49wt% hydrofluoric acid solution, and the H2SO4 is derived from a 60wt% sulfuric acid solution.

[0088] In this embodiment, the Mohs hardness of the acid-resistant soft abrasive grains is 2 to 3.

[0089] In this embodiment, acid-resistant soft abrasives are added to the chemical polishing solution within 1 hour before polishing.

[0090] In this embodiment, the acid-resistant soft abrasive is an acrylonitrile-butadiene-styrene copolymer with a particle size of 15-25 μm and an average particle size of 20 μm.

[0091] A polishing method for a laser gyroscope cavity according to the present invention, specifically a physicochemical polishing method, using the polishing slurry prepared in this embodiment, includes the following steps:

[0092] The polishing slurry prepared in this embodiment is sent to the laser gyroscope cavity 1 for polishing. The temperature of the polishing slurry is maintained at 30℃~40℃ and the flow rate of the polishing slurry is 580mL / min. First, the forward polishing is performed for 20min, and then the reverse polishing is performed for 20min. This forward and reverse cycle is repeated twice. After polishing, the polishing slurry is discharged and the laser gyroscope cavity 1 is cleaned.

[0093] The polishing method in this embodiment uses the same tooling as in Embodiment 1.

[0094] Tests showed that the roughness Ra of the polished microcrystalline cavity decreased from 1200nm to below 80nm, and the light transmittance increased from 20% to over 80%.

[0095] Example 4:

[0096] A polishing slurry for a laser gyroscope cavity according to the present invention comprises a chemical polishing solution and acid-resistant soft abrasives. The chemical polishing solution is composed of the following raw material components in the indicated mass fractions: HF 18%, H2SO4 solution 8%, CH3COOH 12%, NH4HF 17%, disodium ethylenediaminetetraacetate 2%, ammonium sulfate 3%, and the balance being deionized water. The acid-resistant soft abrasives constitute 10% of the mass of the chemical polishing solution. The HF is derived from a 49wt% hydrofluoric acid solution, and the H2SO4 is derived from a 60wt% sulfuric acid solution.

[0097] In this embodiment, the Mohs hardness of the acid-resistant soft abrasive grains is 2 to 3.

[0098] In this embodiment, acid-resistant soft abrasives are added to the chemical polishing solution within 1 hour before polishing.

[0099] In this embodiment, the acid-resistant soft abrasive is made of polypropylene, with a particle size of 20-30 μm and an average particle size of 25 μm.

[0100] A polishing method for a laser gyroscope cavity according to the present invention, specifically a physicochemical polishing method, using the polishing slurry prepared in this embodiment, includes the following steps:

[0101] The polishing slurry prepared in this embodiment is sent to the laser gyroscope cavity 1 for polishing. The temperature of the polishing slurry is maintained at 30℃~40℃ and the flow rate of the polishing slurry is 600mL / min. First, the forward polishing is performed for 20min, and then the reverse polishing is performed for 20min. This forward and reverse cycle is repeated twice. After polishing, the polishing slurry is discharged and the laser gyroscope cavity 1 is cleaned.

[0102] The polishing method in this embodiment uses the same tooling as in Embodiment 1.

[0103] Tests showed that the roughness Ra of the polished microcrystalline cavity decreased from 1200nm to below 80nm, and the light transmittance increased from 20% to over 80%.

[0104] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make many possible variations and modifications to the technical solutions of the present invention using the methods and techniques disclosed above, or modify them into equivalent embodiments with equivalent changes, without departing from the spirit and technical essence of the present invention. Therefore, any simple modifications, equivalent substitutions, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solutions of the present invention shall still fall within the protection scope of the technical solutions of the present invention.

Claims

1. A polishing fluid for laser gyroscope cavities, characterized in that, The device includes a chemical polishing solution and acid-resistant soft abrasives. The chemical polishing solution comprises the following components by mass fraction: HF 5%–20%, H2SO4 5%–10%, CH3COOH 10%–20%, NH4HF 10%–20%, disodium ethylenediaminetetraacetate 2%–5%, ammonium sulfate 2%–5%, and the balance being water. The acid-resistant soft abrasives account for 10%–20% of the mass of the chemical polishing solution. The acid-resistant soft abrasives have a Mohs hardness of 2–3 and are not corroded in hydrofluoric acid. The acid-resistant soft abrasive particles include one or more of polypropylene, polytetrafluoroethylene, polylactic acid, and acrylonitrile-butadiene-styrene copolymer, and the particle size of the acid-resistant soft abrasive particles is 5μm to 30μm.

2. The polishing fluid for laser gyroscope cavities according to claim 1, characterized in that, The acid-resistant soft abrasive grains are added to the chemical polishing solution within 1 hour before polishing.

3. A polishing method for a laser gyroscope cavity, characterized in that, Includes the following steps: The polishing slurry as described in claim 1 or 2 is passed through the laser gyroscope cavity (1) at a flow rate of 500 mL / min to 600 mL / min to perform cyclic jet polishing on the laser gyroscope cavity (1).

4. The polishing method for a laser gyroscope cavity according to claim 3, characterized in that, The laser gyroscope cavity (1) was polished by cyclic jet polishing using a forward and reverse rotation method. The polishing time for a single polishing cycle was 20 min to 40 min, and the polishing time for a single polishing cycle was 20 min to 40 min. The number of cycles of forward and reverse rotation polishing was 1 to 3.

5. The polishing method for a laser gyroscope cavity according to claim 3 or 4, characterized in that, The polishing method is implemented using a fixture, which includes a base (2), an acid-resistant peristaltic pump (3), a polishing fluid storage tank (4), and a cleaning fluid storage tank (5). The laser gyroscope cavity (1) is mounted on the base (2). The outlet of the acid-resistant peristaltic pump (3) is connected to the first anode interface (6) of the laser gyroscope cavity (1). The second anode interface (7) of the laser gyroscope cavity (1) is connected to the return port of the polishing fluid storage tank (4) and the return port of the cleaning fluid storage tank (5), respectively. The outlet of the polishing fluid storage tank (4) and the outlet of the cleaning fluid storage tank (5) are connected to the inlet of the acid-resistant peristaltic pump (3), respectively.

6. The polishing method for a laser gyroscope cavity according to claim 5, characterized in that, The inlet of the acid-resistant peristaltic pump (3) is provided with a first main pipe (8), the first main pipe (8) is provided with a first branch pipe (9) and a second branch pipe (10), the first branch pipe (9) is connected to the outlet of the polishing liquid storage tank (4), the second branch pipe (10) is connected to the outlet of the cleaning liquid storage tank (5), the first branch pipe (9) is provided with a first valve (11), and the second branch pipe (10) is provided with a second valve (12).

7. The polishing method for a laser gyroscope cavity according to claim 6, characterized in that, The second anode interface (7) is provided with a second main pipe (13), the second main pipe (13) is provided with a third branch pipe (14) and a fourth branch pipe (15), the third branch pipe (14) is connected to the return port of the polishing liquid storage tank (4), the fourth branch pipe (15) is connected to the return port of the cleaning liquid storage tank (5), the third branch pipe (14) is provided with a third valve (16), and the fourth branch pipe (15) is provided with a fourth valve (17).

8. The polishing method for a laser gyroscope cavity according to claim 7, characterized in that, The polishing process is as follows: open the first valve (11) and the third valve (16), close the second valve (12) and the fourth valve (17), and pump the polishing liquid in the polishing liquid storage tank (4) to the laser gyroscope cavity (1) through the acid-resistant peristaltic pump (3). The four corner holes of the laser gyroscope cavity (1) are closed. The polishing liquid polishes in the laser gyroscope cavity (1) first in the forward direction, and then in the reverse direction. After polishing, the polishing liquid is returned to the polishing liquid storage tank (4). The process of cleaning the laser gyroscope cavity (1) is as follows: close the first valve (11) and the third valve (16), open the second valve (12) and the fourth valve (17), and pump the cleaning fluid in the cleaning fluid storage tank (5) into the laser gyroscope cavity (1) through the acid-resistant peristaltic pump (3). The four corner holes of the laser gyroscope cavity (1) are closed. After the cleaning fluid cleans the cavity in the laser gyroscope cavity (1), it is returned to the cleaning fluid storage tank (5).

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